Spray cleaning device and method for glass substrate

Abstract

The invention belongs to the technical field of jet cleaning, and discloses a jet cleaning device and method for a glass substrate, the device comprises a spray rod and a nozzle, the spray rod is fixedly installed at the upper end of the glass substrate, a plurality of connecting holes are formed in the spray rod, the spray rod is fixedly connected with the nozzle, and the included angle between the spray rod and the glass substrate is 1030 degrees; the problem of fragmentation caused by excessive impact on a glass substrate is avoided while the cleaning strength is guaranteed, a flow guide cavity is formed in the nozzle, the ratio of the curvature radius of the flow guide cavity to the diameter of an outlet is larger than or equal to 1.1 and smaller than or equal to 1.2, the flowing state of a cleaning medium in the nozzle is effectively adjusted, and then the spraying effect is optimized; the surface roughness of the nozzle is 0.8 mu m, attachment points of particles on the surface of the nozzle are reduced, the contact angle is 100 degrees, the adhesive force of liquid on the surface of the nozzle is reduced, and the particle adsorption probability can be remarkably reduced through combination of the two.

Description

Technical Field

[0001] This invention belongs to the technical field of jet cleaning devices, and relates to a jet cleaning device and method for glass substrates. Background Technology

[0002] In the semiconductor display and microelectronics manufacturing industry, the surface cleanliness of glass substrates is one of the key factors determining product yield and performance. Currently, vertical nozzle devices are widely used in mainstream glass substrate cleaning equipment due to their simple structure and ease of operation. However, in actual production, the impact force of vertical nozzle devices is only 0.12N, while the industry requires an impact force of ≥0.25N to effectively remove stubborn particles ≥1μm from the substrate surface. This significant lack of impact force results in the inability to completely remove stubborn particles, directly causing the substrate surface cleanliness to fail to meet standards, and creating potential quality problems for subsequent processes such as coating and photolithography.

[0003] Secondly, the vertical nozzle spray creates a symmetrical flow field, resulting in a water film retention time of up to 2.5 seconds on the substrate surface. During the water film retention process, 0.3μm microparticles in the environment and cleaning solution are easily redeposited on the substrate surface. The secondary deposition rate was found to be >12%. The substrate after secondary contamination needs to be cleaned again, which not only increases the production process and time cost, but may also damage the substrate surface due to repeated cleaning.

[0004] Finally, according to the testing requirements of SEMI standard M73-1104, when cleaning ultra-thin substrates, the vertical nozzle device has a substrate fragmentation rate of ≥0.5% due to uneven jet force distribution and unreasonable substrate support. The excessive fragmentation rate not only wastes raw materials, but also seriously affects production efficiency and cannot meet the current manufacturing requirements of high precision and high yield.

[0005] The solution of increasing the pump pressure to 0.3MPa to enhance the nozzle's impact force has several drawbacks. Increasing the pump pressure causes the cleaning fluid to enter a turbulent state (Reynolds number Re > 2300). This turbulence disperses the impact force of the cleaning fluid, resulting in a 15% decrease in actual impact force and failing to achieve the expected cleaning effect. Furthermore, increasing the pump pressure requires modifications to existing pipelines, pumps, and other equipment, with modification costs exceeding 3000 yuan, making the modification cost-effective.

[0006] In summary, current vertical nozzle devices in the glass substrate cleaning field have multiple technical shortcomings in terms of cleaning power, resistance to secondary contamination, and compatibility with ultra-thin substrates, and existing improvement solutions cannot achieve synergistic improvement in multi-dimensional performance. Summary of the Invention

[0007] In view of the shortcomings of the existing technology, the purpose of this invention is to provide a spray cleaning apparatus and method for glass substrates.

[0008] To achieve the above objectives, the present invention adopts the following technical solution: This invention provides a spray cleaning device for glass substrates, comprising a spray bar and a nozzle. The spray bar is fixedly mounted on the upper end of the glass substrate, and has several connecting holes for fixed connection with the nozzle. The included angle between the spray bar and the glass substrate is 10°. 30°; The nozzle is provided with a flow guide cavity, and the ratio of the radius of curvature of the flow guide cavity to the outlet diameter is:

[0009] in, Let be the radius of curvature of the guide cavity. This refers to the outlet diameter.

[0010] Furthermore, the radius of curvature of the guide cavity For: 5 0.5mm, the outlet diameter 4.2 0.1mm.

[0011] Furthermore, the included angle between the spray bar and the glass substrate is 18°. 22°.

[0012] Furthermore, the surface roughness of the nozzle 0.8 μm, the contact angle of the nozzle 100°.

[0013] Furthermore, the nozzle operates at a flow rate of 0.4... 0.8L / min, impact force 0.28N.

[0014] Furthermore, the operating pressure of the nozzle is 0.2. 0.25 m / min.

[0015] Furthermore, the included angle between the spray bar and the glass substrate is 10°. At 30°, the distance between the nozzle and the substrate glass is 50. 5mm.

[0016] Furthermore, the thickness of the substrate glass 0.5mm, the angle between the spray bar and the substrate glass is 25 degrees. 2°.

[0017] Furthermore, the spacing between two adjacent spray bars is 120. 135mm.

[0018] The present invention also provides a jet cleaning method for glass substrates, based on the above-described jet cleaning apparatus for glass substrates, comprising the following steps: The spray bar is fixedly installed on the upper end of the glass substrate, and the included angle between the spray bar and the glass substrate is 10°. The nozzle is fixedly connected to the spray bar via a connecting hole at a 30° angle; cleaning medium is introduced into the spray bar and sprayed onto the glass substrate from the nozzle's outlet diameter; the glass substrate's transport speed is 1.5 km / h. 2.0 m / min.

[0019] Compared with the prior art, the present invention has the following beneficial technical effects: This invention discloses a jet cleaning device for glass substrates, wherein the included angle between the spray bar and the glass substrate is set to 10°. At 30°, while ensuring cleaning power, excessive impact on the glass substrate is avoided to prevent breakage. The ratio of the curvature radius of the guide cavity to the outlet diameter is greater than or equal to 1.1 and less than 1.2, which can effectively adjust the flow state of the cleaning medium in the nozzle and thus optimize the spraying effect.

[0020] This invention discloses a jet cleaning device for glass substrates, wherein the radius of curvature of the guide cavity inside the nozzle is... For: 5 0.5mm, outlet diameter 4.2 A thickness of 0.1 mm allows the cleaning medium to maintain a Reynolds number of Re=1800 within the nozzle. The laminar flow state at 2200 provides a more stable flow characteristic and a more concentrated spray direction for the cleaning medium, thereby enhancing its ability to remove contaminants from the surface of the glass substrate.

[0021] This invention provides a jet cleaning device for glass substrates, wherein the surface roughness of the nozzle is... 0.8μm, and contact angle 100°. Low surface roughness reduces the adhesion points of particles on the nozzle surface, and a large contact angle reduces the adhesion of liquid on the nozzle surface. The combination of the two can significantly reduce the probability of particle adsorption.

[0022] This invention provides a jet cleaning device for glass substrates, wherein the nozzle operates at a flow rate of 0.4... 0.8L / min, impact force 0.28N, while ensuring the cleaning effect, reduces the vertical impact force on the glass substrate, avoiding the glass substrate from breaking due to excessive impact force.

[0023] This invention provides a jet cleaning apparatus for glass substrates, wherein the substrate glass thickness is... When the thickness is 0.5mm, the angle between the spray bar and the substrate glass is adjusted to 25±2°. By optimizing the spray bar angle and the flow field of the cleaning medium, the vertical impact force is controlled within... 0.12N, reducing substrate breakage rate.

[0024] This invention provides a jet cleaning device for glass substrates, wherein the distance between two adjacent spray bars is 120 mm. With a 135mm diameter, the cleaning coverage and overlap are optimized to ensure that every area on the glass substrate surface is thoroughly and evenly cleaned, avoiding incomplete or excessive cleaning in certain areas. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the structure of a jet cleaning device for glass substrates according to the present invention. Figure 2 This is a schematic diagram of the nozzle structure in an embodiment of the present invention; Figure 3 This is a comparison chart of the secondary deposition rate of particles in embodiments of the present invention; Figure 4 The image shows a comparison of CFD flow field simulations in an embodiment of the present invention, with the flow field on the left representing the traditional scheme and the flow field on the right representing the present invention.

[0026] Figure label: 2- Nozzle. Detailed Implementation

[0027] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0028] Example 1 This invention discloses a spray cleaning device for glass substrates, comprising: a spray bar and a nozzle 2. The spray bar is fixedly installed on the upper end of the glass substrate, and has several connecting holes for fixed connection with the nozzle 2. The included angle between the spray bar and the glass substrate is 10°. 30°; The nozzle 2 is provided with a flow guiding cavity, and the ratio of the radius of curvature of the flow guiding cavity to the outlet diameter is:

[0029] in, Let be the radius of curvature of the guide cavity. This refers to the outlet diameter.

[0030] Specifically, the spray bar is fixedly installed on the upper end of the glass substrate. To ensure comprehensive and uniform cleaning coverage, the spray bar is provided with several connection holes, which are fixedly connected to the nozzles 2, allowing the nozzles 2 to be stably installed on the spray bar and spray the cleaning medium onto the glass substrate at a preset angle and position. The included angle between the spray bar and the glass substrate is set to 10°. At 30°, this ensures effective cleaning while avoiding excessive impact on the glass substrate, which could lead to breakage. Nozzle 2, serving as the spraying terminal for the cleaning medium, has an internal guide cavity. The ratio of the radius of curvature of the guide cavity to the outlet diameter is:

[0031] When the ratio of the radius of curvature of the guide cavity to the outlet diameter is greater than or equal to 1.1 and less than 1.2, it can effectively regulate the flow state of the cleaning medium in the nozzle, thereby optimizing the spraying effect.

[0032] The spacing between two adjacent spray bars is set to 120. 135mm. When the angle between the spray bar and the glass substrate is 10°. At 30°, combined with the spray bar spacing setting, the cleaning coverage overlap rate reaches ≥20%, such as... Figure 2 As shown, the coverage overlap rate ensures that every area of ​​the glass substrate is thoroughly cleaned, avoiding cleaning dead spots and thus improving the overall cleaning quality.

[0033] Radius of curvature of the inner guide cavity of nozzle 2 For: 5 0.5mm, outlet diameter 4.2 0.1mm allows the cleaning medium to maintain a Reynolds number Re=1800 within nozzle 2. The laminar flow state at 2200°C. The cleaning medium in the laminar flow state has more stable flow characteristics and a more concentrated jet direction. Compared with the structure of traditional cleaning devices, it can increase the impact force by 133%, which greatly enhances the ability to remove contaminants from the surface of glass substrates.

[0034] Nozzle 2 is made of either PEEK (polyetheretherketone) or PVDF (polyvinylidene fluoride). Both materials possess excellent properties, meeting the stringent requirements of glass substrate cleaning processes. PEEK exhibits excellent high-temperature resistance, corrosion resistance, and mechanical strength, while PVDF excels in chemical corrosion resistance, aging resistance, and insulation properties. Simultaneously, the surface roughness of nozzle 2... 0.8μm, and contact angle 100°. Lower surface roughness reduces the number of adhesion points for particles on the nozzle surface, while a larger contact angle reduces the adhesion of liquid to the nozzle surface. The combination of these two factors significantly reduces the probability of particle adsorption. Combined with high-speed water-based ink cleaning, this can improve the secondary deposition rate of particles. 5%, such as Figure 3 As shown, this effectively prevents particles from re-adhering to the glass substrate surface during the cleaning process, thus avoiding affecting the cleaning effect.

[0035] Nozzle 2 was placed in SC1 solution for a 1000-hour corrosion test, and the results showed a weight loss rate. The 0.02% indicates that nozzle 2 can maintain stable structural performance during long-term contact with SC1 cleaning solution and is not prone to corrosion damage, thereby extending the service life of the nozzle and reducing the maintenance cost of the equipment.

[0036] To adapt to cleaning needs under different working conditions, the angle between the spray bar and the glass substrate is adjusted to 18 degrees. At 22°, an adjustment accuracy of ±0.5° is achieved via a graduated flange, such as... Figure 1 As shown. Ensure the angle between the spray bar and the glass substrate remains within the optimal range to guarantee stable and consistent cleaning results.

[0037] As shown in Table 1, compared with the traditional solution, the present invention has achieved significant improvements and optimizations in terms of impact force, particle deposition rate, OLED substrate fragmentation rate, and single-unit modification cost.

[0038] Regarding impact force, the traditional solution delivers only 0.12N, while the present invention achieves an impact force of 0.28N. 0.35N, an improvement of up to +133%, supported by the following basis: Figure 4 As shown, strong impact force can more effectively remove stubborn contaminants from the surface of glass substrates, improving cleaning efficiency and quality.

[0039] Regarding the deposition rate of particles ≥0.3μm, the conventional method achieves a particle deposition rate of 12.3%, while this invention can control it to ≤5%, a reduction of -59%, supported by the following evidence: Figure 3 As shown, a lower particle deposition rate results in a cleaner glass substrate surface after cleaning, meeting the production requirements of high-precision glass substrates and reducing product defect rates caused by particle contamination.

[0040] Regarding the OLED substrate breakage rate, the traditional solution has a breakage rate of 0.5%, while this invention achieves ≤0.1%, a reduction of -80%. This was confirmed through continuous testing of 3000 substrates and meets the requirements of the SEMI M73-1104 standard. The low breakage rate significantly reduces production costs, improves production efficiency, and avoids economic losses caused by substrate breakage.

[0041] Regarding the cost of upgrading a single unit, the traditional solution costs over 3,000 yuan, while the cost of upgrading this invention is less than 500 yuan, a reduction of -83%. Specifically, the cost of nozzle 2 is 450 yuan, and the cost of flange is 50 yuan. This low cost makes this invention easier to promote and apply in existing production lines, saving companies a significant amount of money on equipment upgrades.

[0042] Table 1

[0043] When the thickness of the substrate glass When the thickness is 0.5mm, the angle between the spray bar and the substrate glass is adjusted to 25±2°. By optimizing the spray bar angle and the flow field of the cleaning medium, the vertical impact force is controlled within... 0.12N, thereby ensuring a low substrate breakage rate. 0.1%, its vector analysis is as follows Figure 4 As shown in the figure. In terms of material selection, PEEK material nozzles were chosen. While ensuring resistance to SC1 solution corrosion, the low surface energy of the nozzles reduces adsorption damage between the nozzles and the glass substrate, further protecting the integrity of the glass substrate.

[0044] Example 2 This invention provides a spray cleaning device for glass substrates, adjusting the spacing between two adjacent spray bars to 127.5 mm, combined with 18 The 22° spray bar angle further optimizes the cleaning coverage and overlap rate, ensuring that every area on the glass substrate surface is thoroughly and evenly cleaned, avoiding incomplete or excessive cleaning in certain areas.

[0045] Nozzle 2 was selected from PVDF material. PVDF material has excellent chemical corrosion resistance, high temperature resistance, and mechanical stability, enabling it to withstand various harsh environmental conditions during glass substrate cleaning. To ensure that the curvature radius of curvature and outlet diameter of nozzle 2 meet design requirements, they were precisely calibrated using a coordinate measuring machine. The calibration results show that the curvature radius of curvature of the flow guide cavity is 5. With a diameter of 0.5mm and an outlet diameter of 4.2mm, the ratio of the curvature radius of the guide cavity to the outlet diameter is guaranteed to be greater than or equal to 1.1 and less than or equal to 1.2, thereby maintaining the laminar flow state of the cleaning medium in the nozzle and ensuring the impact force and cleaning effect.

[0046] To reduce the probability of particle adsorption on the nozzle surface, the surface of nozzle 2 was precision polished. The surface roughness of the polished nozzle was measured using a laser interferometer, and the results showed that the surface roughness... With a diameter of 0.6 μm, the particle size is further reduced, decreasing the adhesion of particles to the nozzle surface and lowering the risk of particles being redeposited onto the glass substrate surface with the cleaning medium.

[0047] The spray bar is connected using an M6×1.25 threaded fluororubber seal. The fluororubber seal has a specific upper temperature resistance limit. The 100℃ temperature setting allows it to adapt to temperature changes in the cleaning medium during the cleaning process, preventing leaks caused by aging or failure of the sealing ring due to temperature increases. A 24-hour sealing test of the nozzle at 0.25MPa pressure showed no leakage, indicating that this sealing method meets the sealing requirements of the device during long-term use, ensuring a stable and continuous spray of the cleaning medium from the nozzle and avoiding problems such as insufficient cleaning pressure, reduced cleaning effect, and waste of cleaning medium due to leakage.

[0048] SC1 solution was selected as the cleaning medium, as it possesses excellent detergency and compatibility. The proportions of each component in the SC1 solution were set as follows: : : The ratio of the cleaning solution to the nozzle is 1:1:5, ensuring effective cleaning while minimizing corrosion to the glass substrate and nozzle. The temperature of the cleaning solution is controlled at 75°C. Setting the temperature to 2℃ increases the activity of the cleaning solution, enhances its cleaning power, and avoids equipment damage or changes in solution properties caused by excessively high temperatures.

[0049] The working pressure of nozzle 2 is set to 0.22 MPa. At a working pressure of 0.01 MPa, the flow rate of nozzle 2 is 0.6 L / min, and the transmission speed of the glass substrate is controlled at 1.8 m / min. The transmission speed is coordinated with parameters such as cleaning flow rate and impact force to ensure that the glass substrate can be thoroughly cleaned during the transmission process. This ensures that the cleaning is not incomplete due to excessive transmission speed, nor does it affect production efficiency due to excessively slow transmission speed.

[0050] The results of laser particle size analysis on 500 cleaned glass substrates showed a secondary deposition rate of 4.5%. With a concentration of 0.3%, secondary particle deposition is effectively controlled, ensuring the cleaning quality of the glass substrate.

[0051] Nozzle 2 was subjected to a 1000-hour corrosion test according to ASTM D543 standard, and the weight loss rate was 0.015%. To highlight the superiority of PVDF material, it was compared with PVC material. Under the same 1000-hour corrosion test conditions, the weight loss rate of PVC material was 0.2%, which is much higher than that of PVDF material (0.015%).

[0052] Example 3 This invention provides a spray cleaning device for glass substrates with a thickness of 0.4mm. The angle between the spray bar and the glass substrate is adjusted to 25±1° to ensure the cleaning effect while minimizing the vertical impact force on the glass substrate and preventing the glass substrate from breaking due to excessive impact force.

[0053] Nozzle 2 was selected from PEEK material. Besides its excellent corrosion resistance and mechanical strength, PEEK material also has low surface energy, which reduces the adsorption between the nozzle and the glass substrate, thereby minimizing adsorption damage to the thin glass substrate. The contact angle of nozzle 2 was tested according to GB / T 30447 standard, and the test results showed that the contact angle of nozzle 2 was 102°.

[0054] The working pressure of nozzle 2 is set to 0.20 MPa. By reducing the working pressure, the impact force of the cleaning medium sprayed onto the glass substrate surface can be reduced. Simultaneously, the flow rate of nozzle 2 is adjusted to 0.45 L / min, and the transport speed of the glass substrate is controlled at 1.6 m / min. Through the synergistic optimization of working pressure, nozzle flow rate, and substrate transport speed, the optimal interaction between the cleaning medium and the glass substrate can be achieved.

[0055] The above parameter combination was verified by flow field simulation analysis. The results showed that the vertical impact force was ≤0.12N, which effectively prevented the glass substrate from breaking during the cleaning process and provided a reliable guarantee for the safe cleaning of thin glass substrates.

[0056] The cleaning process was performed on 3,000 glass substrates with a thickness of 0.4 mm. The test results showed that the fragmentation rate was 0.1%, which is much lower than the 0.5% of the traditional solution, and can meet the needs of mass cleaning production of thin glass substrates.

[0057] The surface of the cleaned glass substrate was observed using SEM (scanning electron microscopy), and the removal rate of 0.1μm particles was 91.7%. This effectively removes tiny particles from the surface of the glass substrate, meeting the stringent requirements for surface cleanliness of high-precision thin glass substrates.

[0058] The nozzle 2 was immersed in the cleaning medium SC1 solution for 1500 hours, and the weight loss rate was 0.018%. This indicates that it can maintain stable structure and performance during long-term cleaning operations, thus extending the service life of the nozzle 2.

[0059] Example 4 A 3000-hour continuous operation test was conducted to assess the stability, reliability, and durability of the components of the jet cleaning device for glass substrates during long-term continuous operation. This continuous operation test simulates the long-term uninterrupted operation of the device in actual production, providing a more realistic reflection of its long-term performance and offering reliable performance data support for its practical application.

[0060] During a 3000-hour continuous operation test, continuous monitoring and recording were conducted. The stability reached 98.5%, meeting the requirements for continuous equipment operation in actual production, reducing production interruptions due to equipment failure, and improving production efficiency. The stability reached 98.5% during the 3000-hour continuous operation test. Traditionally, replacing the high-pressure pump and its associated piping costs over 3000 yuan, while this application only requires replacing nozzle 2 and the flange. The cost of nozzle 2 is 450 yuan per unit, and the cost of the flange is 50 yuan per set, significantly reducing costs.

[0061] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

Claims

1. A spray cleaning device for glass substrates, characterized in that: The spray bar is fixedly installed at the upper end of the glass substrate, and a plurality of connecting holes are arranged on the spray bar and fixedly connected with the spray nozzle (2). 30°; a flow guide cavity is arranged in the nozzle (2), the ratio of the curvature radius of the flow guide cavity to the outlet diameter is: wherein, R is the radius of curvature of the flow guide cavity, D is the diameter of the outlet.

2. The spray cleaning device for glass substrates according to claim 1, characterized in that: The curvature radius of the flow guide cavity is: 5 0.5mm, the outlet diameter is: 4.2 0.1mm.

3. The spray cleaning device for glass substrates according to claim 1, characterized in that: The included angle between the spray bar and the glass substrate is 18 22°.

4. The spray cleaning device for glass substrates according to claim 1, characterized in that: Surface roughness of the nozzle (2) 0.8 μm, contact angle of the nozzle (2) 100°.

5. The spray cleaning device for glass substrates according to claim 4, characterized in that: The nozzle (2) has a flow rate of 0.4 0.8 L / min, striking force 0.28 N.

6. The spray cleaning device for glass substrates according to claim 5, characterized in that: The working pressure of the nozzle (2) is 0.2 0.25 MPa.

7. The spray cleaning device for glass substrates according to claim 1, characterized in that: The included angle between the spray bar and the glass substrate is 10 30°, the distance between the nozzle (2) and the substrate glass is 50 5mm.

8. The spray cleaning device for glass substrates according to claim 1, characterized in that: The thickness of the substrate glass 0.5 mm, the angle between the spray bar and the substrate glass is 25 2°.

9. The spray cleaning device for glass substrates according to claim 1, characterized in that: The distance between two adjacent spray bars is 120 135 mm.

10. A method for spray cleaning of a glass substrate, characterized by, The spray cleaning device for glass substrates according to any one of claims 1-9, comprising the following steps: The spray rod is fixedly installed at the upper end of the glass substrate, and the included angle between the spray rod and the glass substrate is 10 30°, the nozzle (2) is fixedly connected with the spray rod through the connecting hole. cleaning medium is supplied into the spray bar, and the cleaning medium is sprayed from the outlet diameter of the nozzle (2) to the glass substrate; The glass substrate has a transport speed of 1.5 2.0 m / min.

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