Electric pulse processing device and method

Abstract

The invention provides an electric pulse processing device and method, and belongs to the technical field of material processing, the electric pulse processing device comprises a base, two clamping pieces, a power supply, a pulse generator and a resistance regulator; two first fixing parts and a second fixing part are arranged at the upper end of the base, the base is made of an insulating material, and a sample is mounted on the second fixing part; the clamping piece is fixedly connected to the two first fixing parts; the clamping piece is a piece made of a conductive material, and two clamping ends of the clamping piece are respectively clamped on a sample; the power supply is connected with the two clamping pieces and forms a conductive path with the sample; the pulse generator is connected to the conductive path; a control switch connected to the conductive path is arranged on the pulse generator; the resistance regulator is connected to the conductive path and used for regulating the current of the conductive path. According to the electric pulse treatment device, the performance improvement effect of the metal material can be improved, and an electron microscope can be easily used for micromechanism research.

Description

Technical Field

[0001] This application belongs to the field of materials processing technology, and more specifically, relates to an electrical pulse processing device and method. Background Technology

[0002] Electro-pulse treatment, as a novel metal material processing technology, has attracted widespread attention in the scientific community due to its unique electroplastic effect, leading to its widespread application in material-assisted cutting, assisted rolling, assisted stretching, and post-processing. Compared to traditional heat treatment techniques, the latter has significant limitations: it is only suitable for small-sized materials, limiting the processing of large parts, and is time-consuming and energy-intensive. Electro-pulse treatment, with its core advantages of high efficiency and low energy consumption, has rapidly become a research focus, and has already achieved significant results in the processing of aluminum, magnesium, titanium, and other alloy materials. This technology can improve metal properties in multiple ways, including refining grains, controlling precipitates, promoting recrystallization, and reducing inclusion size in the molten metal state.

[0003] The superior performance of electrical pulses stems from their instantaneous high-energy characteristics and unique non-thermal effects. Instantaneous high energy can instantly raise the overall temperature of materials, significantly accelerating atomic motion and providing ample energy for various phase transitions; combined with non-thermal effects, this allows for dramatic changes in the properties of the treated material within mere seconds. Currently, when applying electrical pulse effects to materials, there are still many gaps in the study of the microscopic mechanisms of these effects, and modification schemes based on transmission electron microscopes face challenges such as high cost and technical barriers. Summary of the Invention

[0004] The purpose of this application is to provide an electrical pulse processing device and method to solve the technical problem that the microscopic mechanism cannot be studied when materials are processed by electrical pulse effect in the prior art.

[0005] To achieve the above objectives, the technical solution adopted in this application is: to provide an electrical pulse processing device, comprising: The base has two first fixing parts at its upper end and a second fixing part located between the two first fixing parts; the base is made of insulating material; the sample is mounted on the second fixing part. Two clamping components are provided, and each is fixedly connected to one of the two first fixing parts. The clamping ends of the two clamping components are located on adjacent sides and correspond to the second fixing parts. The clamping components are made of conductive material, and the two clamping ends are respectively clamped onto the sample. A power source is connected to the two clamping members and forms a conductive path with the sample; A pulse generator is connected to the conductive path; the pulse generator is equipped with a control switch connected to the conductive path for generating pulse current; A resistor regulator, connected to the conductive path, is used to adjust the current in the conductive path. The sample is held in place using the two clamping ends. The power supply, the pulse generator, and the resistor regulator are activated to perform electrical pulse processing. After cooling, the sample is placed on an electron microscope for observation.

[0006] In one possible implementation, the clamping member includes hinged force-applying rods, and one of the force-applying rods is fixedly connected to the corresponding first fixing part; the adjacent ends of the two force-applying rods form the clamping end.

[0007] In one possible implementation, the first fixing part includes a first fixing block and a cover plate mounted on the first fixing block. The first fixing block has a receiving groove for accommodating one of the force-applying rods, and the cover plate is used to fix the force-applying rod to the first fixing block.

[0008] In one possible implementation, the second fixing part includes a second fixing block and a fixing plate mounted on the second fixing block. The fixing plate is arranged vertically, and the ends of the two force-applying rods fixedly mounted on the first fixing part are respectively fixedly connected to both sides of the fixing plate.

[0009] In one possible implementation, the resistor regulator has multiple resistor modules arranged in parallel and independently, each resistor module including at least one resistor, and the number of resistors in the multiple resistor modules is different, with the resistors in the same resistor module being connected in parallel.

[0010] In one possible implementation, a support base is also included on one side of the base, and the power supply, the pulse generator, the control switch and the resistor regulator are all mounted on the support base.

[0011] In one possible implementation, it further includes a current sensor connected to the conductive path, an oscilloscope connected to the current sensor, and a computer connected to the oscilloscope.

[0012] The beneficial effects of the electrical pulse processing device provided in this application are as follows: Compared with the prior art, the base of the electrical pulse processing device in this application is made of insulating material, which not only avoids current leakage affecting the processing accuracy, but also achieves precise positioning of the components and samples through two first fixing parts at the top and a second fixing part in the middle. The second fixing part is specifically used to place the sample, ensuring the stability of the sample position during processing. The two first fixing parts provide the mounting foundation for the conductive clamping parts, ensuring the stability of the conductive path. The two clamping parts are made of conductive material, and their clamping ends are arranged opposite each other and correspond to the second fixing parts, which can tightly clamp the two ends of the sample to form reliable contact, ensuring current conduction. The power supply, pulse generator, and resistor regulator are sequentially connected to the conductive path formed by the clamping parts and the sample. The pulse generator replaces the traditional conventional current supply method, and can generate a pulse current that meets the requirements in conjunction with the control switch, solving the problem of insufficient processing effect of conventional current. The resistor regulator can flexibly adjust the current magnitude of the path, realizing precise control of the pulse current parameters.

[0013] During operation, first place the sample to be processed stably on the second fixing part of the base, ensuring that the sample is centered and aligned with the clamping ends of the two clamping parts. Then, fix the two conductive clamping parts to the two first fixing parts of the base respectively, and adjust the clamping ends to ensure that they tightly clamp both ends of the sample, ensuring good contact and no looseness. Next, connect the power supply to the two clamping parts, confirm that the pulse generator and resistor regulator are correctly connected to the conductive path, and check that the control switch on the pulse generator is in the off position. According to the sample material and processing requirements, preset an appropriate current value through the resistor regulator, and then turn on the power supply and turn on the pulse generator. The control switch allows the pulsed current to be conducted to the sample through the clamping device. The instantaneous high-energy characteristics of the pulse generator are used to rapidly raise the sample temperature, accelerate atomic motion, and superimpose non-thermal effects to cause changes in the sample's properties such as grain refinement and precipitation phase regulation in a short period of time. At the same time, the current magnitude is finely adjusted in real time by the resistor regulator to ensure that the processing effect reaches the expected level. After the processing is completed, the power supply, pulse generator and resistor regulator are turned off. After the sample cools naturally to room temperature, it is directly transferred to an electron microscope to observe the microstructure, without relying on a modified transmission electron microscope, thus reducing the cost and technical threshold of microscopic mechanism research.

[0014] In this way, by using a pulse generator to provide pulsed current and adjusting the parameters of a resistor regulator, the instantaneous high energy and non-thermal effects of the electrical pulse are effectively enhanced, significantly improving the performance of metallic materials. This approach can achieve multiple objectives, including grain refinement, precipitate control, and inclusion size reduction. Furthermore, it boasts high processing efficiency and low energy consumption, aligning with the core advantages of electrical pulse technology. It is also adaptable to processing samples of different sizes, overcoming, to some extent, the limitations of traditional heat treatment for handling large parts. After cooling, the sample can be easily removed from the two clamps and placed under an electron microscope for microscopic mechanism studies.

[0015] Another object of this application is to provide an electrical pulse processing method, employing any of the above-mentioned electrical pulse processing apparatuses, comprising: S1: Cut the sample into circular slices and thin them until thin areas appear on the sample; S2: Install the sample onto the second fixing part and clamp it at both ends of the sample using the two clamping ends; S3: Adjust the resistance of the resistor regulator, turn on the power supply to form the conductive path to perform electrical pulse processing on the sample, and adjust the duty cycle parameter of the output electrical pulse of the pulse generator to 10-30%, frequency 1-100Hz, and processing time 0.1-1s; S4: Cool the sample to room temperature and perform a second electrical pulse treatment on the sample; operate the resistor regulator to reduce the resistance value, adjust the duty cycle parameter of the output electrical pulse of the pulse generator to 20-60%, frequency 1-100Hz, and processing time 1-3s; S5: Cool the sample to room temperature and observe it using an electron microscope.

[0016] In one possible implementation, in S3, a current sensor is arranged on the conductive path, and an oscilloscope is connected to the current sensor, and a computer is connected to the oscilloscope.

[0017] In one possible implementation, in S1, the sample is cut into circular pieces using an electrical discharge wire cutting device, and the sample is polished with sandpaper. Then, the sample is thinned using ion thinning or dual-jet thinning methods.

[0018] The electrical pulse processing method provided in this application employs an electrical pulse processing device. It uses a two-step gradient pulse parameter to accurately match the evolution law of material properties, and relies on the supporting device to achieve precise parameter control and stable processing, thus solving the problems of fuzzy parameters and unstable effects in traditional processing. The combination of preprocessing and secondary processing not only ensures the uniformity of processing, but also provides clear observation samples for microscopic mechanism research without relying on expensive modified equipment, reducing research costs. At the same time, it provides a feasible operational paradigm for the industrial application of electrical pulse processing technology. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1This is a schematic diagram of the electrical pulse processing device provided in the embodiments of this application; Figure 2 This is a schematic diagram showing the connection between the base and the clamping member provided in an embodiment of this application; Figure 3 This is a schematic diagram illustrating the working principle of the electrical pulse processing method provided in the embodiments of this application.

[0021] The following are the labeling elements in the figure: 10. Base; 11. First fixing part; 12. Second fixing part; 13. First fixing block; 14. Cover plate; 15. Receiving groove; 16. Second fixing block; 17. Fixing plate; 20. Clamping component; 21. Clamping end; 22. Force rod; 30. Power supply; 40. Pulse generator; 50. Resistance regulator; 60. Support base; 70. Current sensor; 71. Oscilloscope. Detailed Implementation

[0022] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0023] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0024] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0025] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0026] Please see Figures 1 to 3The electrical pulse processing device provided in this application will now be described. An electrical pulse processing device includes a base 10, clamping members 20, a power supply 30, a pulse generator 40, and a resistance regulator 50. The base 10 has two first fixing parts 11 and a second fixing part 12 located between the two first fixing parts 11 at its upper end. The base 10 is made of insulating material. A sample is mounted on the second fixing part 12. There are two clamping members 20, each fixedly connected to one of the two first fixing parts 11. The clamping ends 21 of the two clamping members 20 are located on adjacent sides and correspond to the second fixing part 12. The clamping members 20 are made of conductive material. The two clamping ends 21 are respectively clamped onto the sample; the power supply 30 is connected to the two clamping parts 20 and forms a conductive path with the sample; the pulse generator 40 is connected to the conductive path; the pulse generator 40 is equipped with a control switch connected to the conductive path to generate pulse current; the resistor regulator 50 is connected to the conductive path to adjust the current magnitude of the conductive path; the sample is clamped onto the sample using the two clamping ends 21, and the power supply 30, pulse generator 40 and resistor regulator 50 are started to perform electrical pulse processing; after cooling, the sample is placed on an electron microscope for observation.

[0027] Compared with existing technologies, the electrical pulse processing device provided in this application uses an insulating material for the base 10, which avoids current leakage affecting processing accuracy. It also achieves precise positioning of the components and samples through two first fixing parts 11 at the top and a second fixing part 12 in the middle. The second fixing part 12 is specifically used to place the sample, ensuring its stable position during processing. The two first fixing parts 11 provide the mounting base for the conductive clamping parts 20, ensuring the stability of the conductive path. The two clamping parts 20 are made of conductive material, with their clamping ends 21 positioned opposite each other and corresponding to the second fixing parts 12, tightly clamping both ends of the sample to form reliable contact, ensuring current conduction. The power supply 30, pulse generator 40, and resistor regulator 50 are sequentially connected to the conductive path formed by the clamping parts 20 and the sample. The pulse generator 40 replaces the traditional conventional current supply method, and in conjunction with a control switch, can generate a pulse current that meets the requirements, solving the problem of insufficient processing effect of conventional current. The resistor regulator 50 can flexibly adjust the current magnitude of the path, achieving precise control of the pulse current parameters.

[0028] During operation, first, place the sample to be processed stably on the second fixing part 12 of the base 10, ensuring that the sample is centered and aligned with the clamping ends 21 of the two clamping members 20. Then, fix the two conductive clamping members 20 to the two first fixing parts 11 of the base 10 respectively, and adjust the clamping ends 21 to tightly clamp both ends of the sample, ensuring good contact and no looseness. Next, connect the power supply 30 to the two clamping members 20, confirm that the pulse generator 40 and the resistor regulator 50 are correctly connected to the conductive path, and check that the control switch on the pulse generator 40 is in the off state. According to the sample material and processing requirements, preset an appropriate current value through the resistor regulator 50, and then turn on the power supply 30. Turn on the control switch of the pulse generator 40 so that the pulse current is conducted to the sample through the clamp 20. Utilize the instantaneous high-energy characteristics of the pulse generator 40 to rapidly raise the sample temperature, accelerate atomic motion, and superimpose non-thermal effects to cause changes in the sample's properties such as grain refinement and precipitate phase regulation in a short time. At the same time, the current magnitude is finely adjusted in real time by the resistor regulator 50 to ensure that the processing effect reaches the expected level. After the processing is completed, turn off the power supply 30, the pulse generator 40 and the resistor regulator 50. After the sample cools naturally to room temperature, it can be directly transferred to an electron microscope to observe the microstructure without relying on a modified transmission electron microscope, thus reducing the cost and technical threshold of microscopic mechanism research.

[0029] In this way, by using the pulse generator 40 to provide pulse current and the parameter control of the resistor regulator 50, the instantaneous high energy and non-thermal effects of the electrical pulse are effectively enhanced, significantly improving the performance of metallic materials. This achieves multiple objectives such as grain refinement, precipitate control, and reduction of inclusion size, while also offering high processing efficiency and low energy consumption, aligning with the core advantages of electrical pulse technology. Furthermore, it is adaptable to processing samples of different sizes, overcoming to some extent the limitations of traditional heat treatment for large parts. After cooling, the sample can be easily removed from the two clamps 20 and placed on an electron microscope for microscopic mechanism research.

[0030] The insulating base 10 and the precise clamping structure ensure the safety and stability of the processing. The operation process is standardized and controllable. The processed samples can be directly observed under a microscope, providing equipment support for the further promotion and application of electrical pulse processing technology in material-assisted cutting, rolling, stretching and post-processing scenarios.

[0031] Please see Figure 1 and Figure 2As a specific embodiment of the electrical pulse processing device provided in this application, the clamping member 20 includes hinged force-applying rods 22, and one force-applying rod 22 is fixedly connected to the corresponding first fixing part 11; the close ends of the two force-applying rods 22 form a clamping end 21; the clamping member 20 adopts a hinged force-applying rod 22 structure to adapt to the installation requirements of the first fixing part 11 of the device base 10, wherein one force-applying rod 22 is fixed to the corresponding first fixing part 11, and the close ends of the two force-applying rods 22 form a clamping end 21, and the whole is made of conductive material to ensure that the current is smoothly conducted to the sample.

[0032] During operation, the movable force-applying lever 22 is moved to open the clamping end 21. After placing the sample in the second fixing part 12, the force-applying lever 22 is closed to clamp both ends of the sample tightly, ensuring close contact. This method eliminates the need for complex fixing structures, offers flexible opening and closing, and can accommodate samples of different sizes. It also provides a stable clamping grip to prevent loosening during processing, which could affect conductivity stability. This simplifies the operation process while ensuring efficient pulse current conduction. Combined with the overall structure of the device, it improves processing reliability. Furthermore, the simple structure makes it easy to manufacture, reducing the device's manufacturing cost.

[0033] An elastic element such as a spring can be installed between the two force-applying rods 22 to ensure that the two force-applying rods 22 tightly clamp the sample.

[0034] Please see Figure 1 and Figure 2 As a specific embodiment of the electrical pulse processing device provided in this application, the first fixing part 11 is composed of a first fixing block 13 and a cover plate 14. The structure is adapted to the installation and fixing of the clamping member 20 and the force-applying rod 22. The receiving groove 15 on the first fixing block 13 can accurately accommodate a force-applying rod 22, while the cover plate 14 plays a limiting and fixing role, ensuring that the force-applying rod 22 is stably assembled in the first fixing part 11.

[0035] During operation, first place one of the force-applying rods 22 of the clamping component 20 into the receiving groove 15 of the first fixing block 13. After adjusting it to the corresponding position, install the cover plate 14 on the first fixing block 13 to firmly fix the force-applying rod 22 and prevent displacement during processing. This design achieves precise positioning and stable fixing of the force-applying rod 22 through a split structure, ensuring the clamping stability of the clamping end 21 on the sample and the smooth current conduction. It is easy to disassemble and assemble and adapts to the installation requirements of the force-applying rod 22. The structure is simple and easy to process, while improving the overall assembly flexibility of the device, reducing maintenance costs, and further ensuring the reliability of electrical pulse processing.

[0036] The force-applying rod 22 of the clamping member 20 has an insulating surface layer, thereby being stably mounted together with the first fixing block 13 and the cover plate 14.

[0037] Please see Figure 1 and Figure 2As a specific embodiment of the electrical pulse processing device provided in this application, the second fixing part 12 is composed of a second fixing block 16 and a vertically arranged fixing plate 17. The fixing plate 17 is assembled on the second fixing block 16, and its two sides are used to fix the ends of one force-applying rod 22 of each of the two clamping members 20, forming a symmetrical and stable assembly structure.

[0038] During operation, first, the fixing plate 17 is vertically installed on the second fixing block 16 and firmly fixed. Then, the ends of the corresponding force-applying rods 22 of the two clamping parts 20 are respectively connected to both sides of the fixing plate 17, ensuring symmetrical positioning and tight connection. The vertical fixing plate 17 achieves symmetrical positioning of the clamping parts 20, ensuring that the clamping end 21 is accurately aligned with the sample, improving clamping stability and current conduction consistency. The structure has strong adaptability and is easy to assemble. At the same time, it strengthens the overall structural rigidity of the device, avoiding the impact of force displacement on the effect during processing. It is simple to manufacture and takes into account both practicality and reliability.

[0039] Please see Figure 1 and Figure 3 As a specific embodiment of the electrical pulse processing device provided in this application, the resistor regulator 50 has multiple parallel and independently arranged resistor modules. Each resistor module includes at least one resistor, and the number of resistors in the multiple resistor modules is different. The resistors in the same resistor module are connected in parallel. The resistor regulator 50 adopts a design of multiple sets of parallel and independent resistor modules. Each set of modules contains at least one resistor, and the number of resistors in each set of modules is different. The resistors in the same module are arranged in parallel, and a tap switch is used to realize circuit on / off control and current regulation.

[0040] During operation, based on the sample material, processing requirements, and preset current parameters, the tap switch selects the module with the corresponding number of resistors. The resistance difference between different modules changes the total circuit resistance, thereby precisely controlling the current magnitude. This allows for diverse pulse current outputs when paired with a pulse generator 40. The target current can be quickly obtained through module switching, offering high adjustment accuracy and fast response. The parallel structure ensures module stability, adapting to the processing needs of different metal materials. The simple structure facilitates maintenance, reduces adjustment difficulty, and enhances the controllability of electrical pulse processing parameters, optimizing processing results.

[0041] Please see Figure 1 and Figure 3 As a specific embodiment of the electrical pulse processing device provided in this application, it also includes a support base 60 located on one side of the base 10. The power supply 30, pulse generator 40, control switch and resistor regulator 50 are all mounted on the support base 60. The support base 60 located on one side of the base 10 is specially used for the integrated installation of the power supply 30, pulse generator 40, control switch and resistor regulator 50, so as to realize the partitioned layout of electrical components and base 10.

[0042] During operation, each electrical component is sequentially fixed to the support base 60, and then connected to the corresponding clamping parts 20 on the base 10 via wires to form a complete conductive path. After connection, the installation firmness of the components and the integrity of the wiring are checked. This design allows for centralized storage of electrical components, avoiding messy and tangled wiring, improving operational safety and device tidiness, facilitating component inspection and maintenance, shortening wiring distance to ensure current conduction stability, and not occupying the operating space of the base 10, nor affecting sample clamping and processing. The structure is compact and reasonable, balancing practicality and convenience.

[0043] Please see Figure 1 and Figure 3 As a specific embodiment of the electrical pulse processing device provided in this application, it also includes a current sensor 70 connected to the conductive path, an oscilloscope 71 connected to the current sensor 70, and a computer connected to the oscilloscope 71. The three form a complete monitoring link to realize real-time monitoring of pulse waveforms and signal visualization processing. In operation, the current sensor 70 is first connected to the conductive path, and then the oscilloscope 71 and the computer are connected in sequence. The equipment is debugged to ensure smooth signal transmission. After starting the electrical pulse processing device, the monitoring equipment is turned on simultaneously to collect pulse signals in real time and visualize them on the computer.

[0044] Please provide parameters Figures 1 to 3 This application also provides an electrical pulse processing method, which employs any one of the above-described electrical pulse processing devices, including: S1: Cut the sample into circular slices and thin them until thin areas appear on the sample; S2: Install the sample onto the second fixing part 12 and clamp it at both ends of the sample using the two clamping ends 21; S3: Adjust the resistance of the resistor regulator 50, turn on the power supply 30 to form a conductive path to perform electrical pulse processing on the sample, adjust the duty cycle parameter of the output electrical pulse of the pulse generator 40 to 10-30%, the frequency to 1-100Hz, and the processing time to 0.1-1s. S4: Cool the sample to room temperature and perform a second electrical pulse treatment on the sample; operate the resistor regulator 50 to reduce the resistance value, adjust the duty cycle parameter of the output electrical pulse of the pulse generator 40 to 20-60%, frequency 1-100Hz, and processing time 1-3s. S5: Cool the sample to room temperature and observe it using an electron microscope.

[0045] The electric pulse processing method provided in this application adopts the above-mentioned electric pulse processing device, which uses a gradient two-step pulse processing method. By precisely controlling the parameters and standardizing the operation process, it maximizes the instantaneous high energy and non-thermal effect of the electric pulse, and achieves an efficient combination of metal material performance optimization and microscopic mechanism research. The steps are closely connected and highly targeted.

[0046] During operation, the sample is first pretreated by cutting it into circular slices and thinning it to create thin regions. This facilitates stable clamping by the subsequent clamping device 20 to form a reliable conductive path, allows the electrical pulse to be applied more evenly to the sample, and provides a suitable morphology for subsequent electron microscopy observation of the microstructure, avoiding obstruction of the observation field by thick samples. The thin regions in the sample range from 50 to 200 nm.

[0047] Subsequently, the sample is installed using the second fixing part 12 and the clamping part 20. The sample is placed in the second fixing part 12, and the two conductive clamping ends 21 are adjusted to tightly clamp the two ends of the sample to ensure good contact and no looseness, laying the foundation for stable current conduction in the future, which is in line with the design intention of the device's insulating base 10 and conductive clamping structure.

[0048] Then, the first electrical pulse treatment is performed. A suitable resistance value is preset by the resistor regulator 50, and the power supply 30 is turned on to form a conductive path. At the same time, the duty cycle of the pulse generator 40 is adjusted to 10-30%, the frequency is 1-100Hz, and the processing time is controlled to 0.1-1s. This combination of parameters can initially activate the atomic motion inside the sample through low duty cycle and short pulse duration, providing initial energy for phase transformation and recrystallization, and avoiding damage to the sample structure caused by a single high-intensity treatment.

[0049] After the initial treatment, the sample is cooled to room temperature before a second treatment is performed. The circuit current is increased by reducing the resistance value of the resistor regulator by 50, the duty cycle is increased to 20-60%, the frequency is maintained at 1-100Hz, and the treatment time is extended to 1-3s. The gradient parameter design can deepen the electric pulse effect, and the grains are further refined and the precipitated phase is controlled by the higher duty cycle and current. The superimposed non-thermal effects achieve significant optimization of sample performance, making up for the shortcomings of traditional single parameter treatment.

[0050] Finally, after cooling the samples to room temperature, the microstructure was observed using an electron microscope. The two-step gradient pulse parameter method accurately matches the evolution of material properties, and with the support of a dedicated device, precise parameter control and stable processing are achieved, solving the problems of fuzzy parameters and unstable results in traditional processing. The combination of pretreatment and secondary processing ensures processing uniformity and provides clear observation samples for microscopic mechanism research, eliminating the need for expensive equipment modifications, reducing research costs, and providing a practical operational paradigm for the industrial application of electrical pulse processing technology.

[0051] Please see Figure 3As a specific implementation of the electrical pulse processing method provided in this application, in S3, a current sensor 70 is arranged on the conductive path, and an oscilloscope 71 is connected to the current sensor 70, and a computer is connected to the oscilloscope 71, thereby realizing real-time monitoring of pulse waveforms and signal visualization processing.

[0052] As a specific implementation of the electrical pulse processing method provided in this application, in step S1, the sample is cut into circular pieces using an electrical discharge wire cutting device, and then polished with sandpaper. Next, the sample is thinned using either ion thinning or dual-jet thinning. During operation, the sample is first cut into regular circular pieces using electrical discharge wire cutting to ensure uniform size. Then, the sample surface is polished with sandpaper to remove cutting burrs, oxide layers, and impurities. Finally, ion thinning or dual-jet thinning is selected based on the sample material until a thin area appears in the sample. This process improves sample flatness and surface quality, ensures stable subsequent clamping, and ensures uniform electrical pulse application. The two thinning methods are suitable for different metal sample characteristics, balancing processing efficiency and effectiveness, providing clear samples for subsequent microscopic observation, and avoiding pretreatment defects from affecting the overall experimental accuracy and reliability.

[0053] The above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. An electrical pulse processing device, characterized in that, include: The base has two first fixing parts at its upper end and a second fixing part located between the two first fixing parts; the base is made of insulating material. The sample is mounted on the second fixing part; Two clamping components are provided, and each is fixedly connected to one of the two first fixing parts. The clamping ends of the two clamping components are located on adjacent sides and correspond to the second fixing parts. The clamping components are made of conductive material, and the two clamping ends are respectively clamped onto the sample. A power source is connected to the two clamping members and forms a conductive path with the sample; A pulse generator is connected to the conductive path; the pulse generator is equipped with a control switch connected to the conductive path for generating pulse current; A resistor regulator, connected to the conductive path, is used to adjust the current in the conductive path. The sample is clamped using the two clamping ends, and the power supply, the pulse generator, and the resistor regulator are activated to perform electrical pulse processing. After cooling, the sample was observed under an electron microscope.

2. The electrical pulse processing device as described in claim 1, characterized in that, The clamping member includes hinged force-applying rods, and one of the force-applying rods is fixedly connected to the corresponding first fixing part; the close ends of the two force-applying rods form the clamping end.

3. The electrical pulse processing device as described in claim 2, characterized in that, The first fixing part includes a first fixing block and a cover plate installed on the first fixing block. The first fixing block has a receiving groove for accommodating one of the force-applying rods, and the cover plate is used to fix the force-applying rod to the first fixing block.

4. The electrical pulse processing device as described in claim 2, characterized in that, The second fixing part includes a second fixing block and a fixing plate mounted on the second fixing block. The fixing plate is arranged vertically, and the ends of the two force-applying rods fixedly mounted on the first fixing part are respectively fixedly connected to both sides of the fixing plate.

5. The electrical pulse processing device as described in claim 1, characterized in that, The resistor regulator has multiple resistor modules arranged in parallel and independently. Each resistor module includes at least one resistor, and the number of resistors in the multiple resistor modules is different. The resistors in the same resistor module are connected in parallel.

6. The electrical pulse processing device as described in claim 1, characterized in that, It also includes a support base located on one side of the base, and the power supply, the pulse generator, the control switch and the resistor regulator are all mounted on the support base.

7. The electrical pulse processing device as described in claim 1, characterized in that, It also includes a current sensor connected to the conductive path, an oscilloscope connected to the current sensor, and a computer connected to the oscilloscope.

8. A method for processing electrical pulses, characterized in that, The electrical pulse processing apparatus according to any one of claims 1-7 comprises: S1: Cut the sample into circular slices and thin them until thin areas appear on the sample; S2: Install the sample onto the second fixing part and clamp it at both ends of the sample using the two clamping ends; S3: Adjust the resistance of the resistor regulator, turn on the power supply to form the conductive path to perform electrical pulse processing on the sample, and adjust the duty cycle parameter of the output electrical pulse of the pulse generator to 10-30%, frequency 1-100Hz, and processing time 0.1-1s; S4: Cool the sample to room temperature and perform a second electrical pulse treatment on the sample; operate the resistor regulator to reduce the resistance value, adjust the duty cycle parameter of the output electrical pulse of the pulse generator to 20-60%, frequency 1-100Hz, and processing time 1-3s; S5: Cool the sample to room temperature and observe it using an electron microscope.

9. The electrical pulse processing method as described in claim 8, characterized in that, In S3, a current sensor is arranged on the conductive path, and an oscilloscope is connected to the current sensor, and a computer is connected to the oscilloscope.

10. The electrical pulse processing method as described in claim 8, characterized in that, In S1, the sample is cut into circular pieces using an electrical discharge wire cutting device, and then sanded with sandpaper. Finally, the sample is thinned using ion thinning or double-spray thinning methods.

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