Beam energy monitoring device suitable for high-energy ion implanter
By introducing a high-resolution analytical aperture and energy detection Faraday in a high-energy ion implanter, the problem of uneven ion energy at the beam center was solved, achieving high-precision beam energy monitoring, improving wafer implantation quality, and simplifying system design.
Patent Information
- Application Number
- CN202511968899.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-24
- Publication Date
- 2026-05-01
AI Technical Summary
In existing high-energy ion implanters, there is a large energy difference between the central ion beam and the ion beam that deviates from the center, resulting in uneven implantation energy. Furthermore, the beam focusing and scanning processes are highly complex, and existing monitoring devices cannot meet the accuracy requirements.
A high-resolution analytical aperture and a high-resolution energy detection Faraday are employed. The detection channel is controlled by a beam blocking component. The high-resolution analytical aperture filters the beam center ions before the beam enters the analytical aperture, and the high-resolution energy detection Faraday monitors the beam energy intensity after filtering in real time.
It improves the energy accuracy of the injected wafer, reduces the difficulty of beam focusing and scanning, enhances wafer quality, and reduces system complexity and maintenance costs through modular design.
Smart Images
Figure CN121964460A_ABST
Abstract
Description
A beam energy monitoring device suitable for high-energy ion implanters Technical Field
[0001] This invention relates to the field of semiconductor ion implantation equipment technology, and more specifically to a beam energy monitoring device suitable for high-energy ion implanters. Background Technology
[0002] In ion implantation, the intensity (current) and uniformity of the ion beam are direct parameters that determine the process effect. Therefore, accurate and reliable monitoring of the ion beam is crucial for process control and product quality. Compared to high-current and medium-current implanters, high-energy ion implanters have smaller ion beam intensity and bandwidth but carry more energy. Therefore, it is necessary to research a beam monitoring mechanism suitable for high-energy ion implanters to provide accurate feedback on the beam intensity, which will facilitate subsequent processes.
[0003] Existing ion implantation mechanisms monitor beam intensity using analytical apertures and energy detection Faradays. However, high-energy ion implanters have small beam bandwidths, and the analytical apertures cannot meet the process requirements for beam selection. Specifically, this manifests as: (1) Implantation energy accuracy issues: In existing ion implantation mechanisms, energy detection Faradays are set up along the ion beam path. However, the Faradays can only detect beam energy intensity and do not have the function of selecting ion beams at the beam center. Since there is a significant energy difference between ion beams that are off-center and those at the center, the implantation energy will be uneven when implanting the wafer, resulting in implantation accuracy issues.
[0004] (2) The beam focusing and scanning of ion beams is more difficult: Ions that are off the beam center of the high-energy ion implanter have higher energy. If the beam center is not screened and monitored, a more complex beam optical system is required, such as a quadruple lens and electrostatic scanning to focus and scan the beam, which increases the complexity of the system. Summary of the Invention
[0005] The technical problem to be solved by the present invention is to provide a beam energy monitoring device suitable for high-energy ion implanters that is compact in structure, easy to operate and has high measurement accuracy, in order to overcome the shortcomings of the prior art.
[0006] To solve the above-mentioned technical problems, the technical solution adopted by the present invention is as follows: a beam energy monitoring device suitable for a high-energy ion implanter, comprising a cavity, a beam blocking component disposed through the top of the cavity, and an analytical aperture, a high-resolution analytical aperture, and a high-resolution energy detection Faraday disposed through the cavity; a detection channel is provided on the side of the cavity, and the beam blocking component is used to control the opening and closing of the detection channel; the high-resolution analytical aperture is disposed between the beam blocking component and the analytical aperture, and filters the central ions of the beam before the beam enters the analytical aperture; the high-resolution energy detection Faraday is disposed after the analytical aperture, and is used to detect the energy intensity of the filtered beam in real time.
[0007] As a further improvement of the present invention, the high-resolution analysis aperture includes: a second screening graphite, a first support shaft, a second mounting flange, a first mounting plate, and a first drive mechanism; the second mounting flange is sealed to the side of the cavity, the first mounting plate is connected to the second mounting flange, and the first drive mechanism is disposed on the first mounting plate; the second screening graphite is disposed in the cavity, and the second screening graphite has through holes for screening the beam; one end of the first support shaft is connected to the second screening graphite, and the other end of the first support shaft is dynamically sealed through the second mounting flange and connected to the first drive mechanism; under the drive of the first drive mechanism, the first support shaft drives the second screening graphite to perform linear reciprocating motion in the cavity.
[0008] As a further improvement of the present invention, the first driving mechanism includes: a cylinder, a clamping block, a linear bearing, and a sealing assembly; the cylinder and the linear bearing are both mounted on the first mounting plate, and the sealing assembly is mounted on the second mounting flange, the sealing assembly being used to achieve dynamic sealing between the first support shaft and the second mounting flange; the first support shaft passes through the second mounting flange, the sealing assembly, and the linear bearing in sequence, and is then connected to the clamping block, the output end of the cylinder being connected to the clamping block; under the drive of the cylinder, the clamping block drives the first support shaft to perform linear reciprocating motion.
[0009] As a further improvement of the present invention, the first support shaft is provided with a cooling channel inside, the end of the first support shaft passes through the clamping block and is connected to the interface valve block, and the side of the interface valve block is provided with a second cooling pipe to realize the entry and exit of the cooling medium into and out of the first support shaft.
[0010] As a further improvement of the present invention, the sealing assembly includes: a sealing ring mounting seat, a U-shaped sealing ring, a sealing spacer, and an O-ring; the sealing ring mounting seat is fixedly connected to the second mounting flange, and an O-ring is provided between the sealing ring mounting seat and the second mounting flange; the first support shaft passes through the sealing ring mounting seat, and a sealing spacer is provided between the first support shaft and the sealing ring mounting seat, and U-shaped sealing rings are provided at both ends of the sealing spacer.
[0011] As a further improvement of the present invention, the sealing assembly further includes a support bearing and a retaining ring for the bore. The support bearing is disposed between the first support shaft and the sealing ring mounting seat to support the first support shaft. The end of the support bearing is provided with a retaining ring for the bore to prevent axial movement of the first support shaft.
[0012] As a further improvement of the present invention, the high-resolution energy detection Faraday cup includes: a Faraday cup, a second support shaft, a third mounting flange, a second mounting plate, and a second drive mechanism; the third mounting flange is sealed to the side of the cavity, the second mounting plate is connected to the third mounting flange, and the second drive mechanism is disposed on the second mounting plate; the Faraday cup is disposed in the cavity and is connected to an external detection circuit via a cable to measure the magnitude of the beam current, thereby reflecting the beam energy intensity; one end of the second support shaft is connected to the Faraday cup, and the other end of the second support shaft is dynamically sealed through the third mounting flange and connected to the second drive mechanism; driven by the second drive mechanism, the second support shaft drives the Faraday cup to perform linear reciprocating motion within the cavity.
[0013] As a further improvement of the present invention, the analytical aperture includes a first mounting flange, a first screening graphite, and a shielding plate; the shielding plate is used to shield the beam, the first screening graphite is disposed on the shielding plate, and the center of the first screening graphite has a through hole for filtering the beam; one end of the shielding plate is connected to the first mounting flange, and the first mounting flange is connected to the side of the cavity to fix the shielding plate in the cavity.
[0014] As a further improvement of the present invention, the shielding plate is provided with a first cooling pipe to achieve cooling of the shielding plate.
[0015] Compared with the prior art, the advantages of the present invention are as follows: 1. The beam energy monitoring device of the present invention, applicable to high-energy ion implanters, filters ions at the beam center by setting a high-resolution analytical aperture and monitors the current magnitude by energy detection Faraday, thereby completing the energy detection of the beam center of the high-energy ion implanter, ensuring the energy accuracy of the implanted wafer, reducing the difficulty of ion beam focusing and scanning, and improving the quality of the implanted wafer; moreover, the beam shielding component, analytical aperture, high-resolution analytical aperture, and high-resolution energy detection Faraday can all adopt a modular design, which is easy to mass-produce and implement.
[0016] 2. The beam energy monitoring device of the present invention, applicable to high-energy ion implanters, includes a graphite plate in the high-resolution analytical aperture that can block the beam center. Through holes on the graphite plate perform initial screening of ions at the beam center. The screened ion beam passes through the analytical aperture to the high-resolution energy detection Faraday. The Faraday detects the beam intensity in real time. When the central beam intensity meets the requirements, the movement of the high-resolution analytical aperture and the high-resolution energy detection Faraday can be controlled according to process requirements. At the same time, the high-resolution energy detection Faraday and the high-resolution analytical aperture adopt the same driving structure, reducing costs and improving maintainability. Attached Figure Description
[0017] Figure 1 is a simplified diagram of beam motion in a specific embodiment of the present invention; Figure 2 is a schematic diagram of the overall structure of the beam energy monitoring device in a specific embodiment of the present invention; Figure 3 is a side view schematic diagram of the beam energy monitoring device in a specific embodiment of the present invention; Figure 4 is a schematic diagram of the structure of the analysis aperture in a specific embodiment of the present invention; Figure 5 is a schematic diagram of the structure of the high-resolution analysis aperture in a specific embodiment of the present invention; Figure 6 is a schematic diagram of the cross-sectional structure of the high-resolution analysis aperture in a specific embodiment of the present invention; Figure 7 is a schematic diagram of the structure of the high-resolution energy detection Faraday in a specific embodiment of the present invention; Figure 8 is a flowchart of beam energy monitoring in a specific embodiment of the present invention.
[0018] Legend: 1. Cavity; 2. Analytical aperture; 3. High-resolution analytical aperture; 4. High-resolution energy detection Faraday crystal; 5. Beam shielding component; 100. Beam; 101. Detection channel; 201. Handle; 202. First cooling pipe; 203. First mounting flange; 204. First screening graphite; 205. Shielding plate; 301. Second screening graphite; 302. First support shaft; 303. Second mounting flange; 304. First mounting plate; 3 05. Cylinder; 306. Interface valve block; 307. Second cooling pipe; 308. Clamping block; 309. Linear bearing; 310. Sealing assembly; 311. Sealing ring mounting seat; 312. U-shaped sealing ring; 313. Support bearing; 314. Sealing spacer; 315. Hole retaining ring; 316. O-ring seal; 401. Faraday cup; 402. Second support shaft; 403. Cable; 404. Third mounting flange; 405. Second mounting plate. Detailed Implementation
[0019] The present invention will be further described below with reference to the accompanying drawings and specific preferred embodiments, but this does not limit the scope of protection of the present invention.
[0020] In the description of this invention, it should be understood that the terms "side", "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention.
[0021] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more unless otherwise explicitly specified.
[0022] As shown in Figures 1, 2, and 3, the beam energy monitoring device of the present invention, applicable to a high-energy ion implanter, includes a cavity 1, a beam blocking component 5 disposed through the top of the cavity 1, and an analytical aperture 2, a high-resolution analytical aperture 3, and a high-resolution energy detection Faraday 4 disposed through the cavity 1. A detection channel 101 is provided on the side of the cavity 1, and the beam blocking component 5 is used to control the opening and closing of the detection channel 101. The high-resolution analytical aperture 3 is disposed between the beam blocking component 5 and the analytical aperture 2, screening the central ions of the beam 100 before it enters the analytical aperture 2. The high-resolution energy detection Faraday 4 is disposed after the analytical aperture 2, blocking the beam from passing through and forming a current. By detecting the magnitude of the current, the energy intensity of the beam 100 is monitored in real time, ensuring the energy accuracy of the implanted wafer, reducing the difficulty of ion beam focusing and scanning, and improving the quality of the implanted wafer. It should be noted that in this embodiment, the beam blocking component 5 adopts a conventional configuration in the art, which will not be described in detail here. When the beam blocking component 5 is turned on, the detection channel 101 is in the conducting state.
[0023] As shown in Figure 4, the analysis aperture 2 includes a first mounting flange 203, a first screening graphite 204, and a shielding plate 205. The shielding plate 205 is used to shield the beam. The first screening graphite 204 is disposed on the shielding plate 205, and a through hole is provided in the center of the first screening graphite 204 for filtering the beam. One end of the shielding plate 205 is connected to the first mounting flange 203, and the first mounting flange 203 is connected to the side of the cavity 1 to fix the shielding plate 205 inside the cavity 1.
[0024] Furthermore, the shielding plate 205 is provided with a first cooling pipe 202 to cool the shielding plate 205 and the first screening graphite 204.
[0025] As shown in Figures 5 and 6, the high-resolution analysis aperture 3 includes: a second screening graphite 301, a first support shaft 302, a second mounting flange 303, a first mounting plate 304, and a first drive mechanism. The second mounting flange 303 is sealed to the side of the cavity 1, the first mounting plate 304 is connected to the second mounting flange 303, and the first drive mechanism is mounted on the first mounting plate 304. The second screening graphite 301 is disposed inside the cavity 1 and has through holes for screening the beam. One end of the first support shaft 302 is connected to the second screening graphite 301, and the other end of the first support shaft 302 is dynamically sealed through the second mounting flange 303 and connected to the first drive mechanism. Driven by the first drive mechanism, the first support shaft 302 drives the second screening graphite 301 to perform linear reciprocating motion within the cavity 1.
[0026] As shown in Figure 5, the first driving mechanism includes a cylinder 305, a clamping block 308, a linear bearing 309, and a sealing assembly 310. Both the cylinder 305 and the linear bearing 309 are mounted on the first mounting plate 304, and the sealing assembly 310 is mounted on the second mounting flange 303. The sealing assembly 310 is used to achieve a dynamic seal between the first support shaft 302 and the second mounting flange 303. The first support shaft 302 passes sequentially through the second mounting flange 303, the sealing assembly 310, and the linear bearing 309 before connecting to the clamping block 308. The output end of the cylinder 305 is connected to the clamping block 308. Driven by the cylinder 305, the clamping block 308 drives the first support shaft 302 in a linear reciprocating motion, thereby enabling the second screening graphite 301 to screen the beam.
[0027] Furthermore, the first support shaft 302 is provided with a cooling channel inside, the end of the first support shaft 302 passes through the clamping block 308 and is connected to the interface valve block 306, and the side of the interface valve block 306 is provided with a second cooling pipe 307 to realize the entry and exit of the cooling medium into the first support shaft 302, thereby realizing the cooling of the first support shaft 302 and the second screening graphite 301.
[0028] As shown in Figure 6, the sealing assembly 310 includes: a sealing ring mounting base 311, a U-shaped sealing ring 312, a sealing spacer 314, and an O-ring 316. The sealing ring mounting base 311 is fixedly connected to the second mounting flange 303, and an O-ring 316 is provided between the sealing ring mounting base 311 and the second mounting flange 303 to achieve a static seal between them. A first support shaft 302 passes through the sealing ring mounting base 311, and a sealing spacer 314 is provided between the first support shaft 302 and the sealing ring mounting base 311. U-shaped sealing rings 312 are provided at both ends of the sealing spacer 314 to achieve a dynamic seal between the sealing ring mounting base 311 and the first support shaft 302.
[0029] In this embodiment, a boss is used for positioning between the first support shaft 302 and the second screening graphite 301. The first support shaft 302 adopts an L-shaped design and is welded from seamless steel pipe to avoid the beam blocking component 5.
[0030] Furthermore, the sealing assembly 310 also includes a support bearing 313 and a retaining ring 315 for the bore. The support bearing 313 is disposed between the first support shaft 302 and the sealing ring mounting seat 311 to support the first support shaft 302. The end of the support bearing 313 is provided with a retaining ring 315 for the bore to prevent axial movement of the first support shaft 302. The support bearing 313 also prevents the first support shaft 302 from scratching the U-shaped sealing ring 312 during movement.
[0031] As shown in Figure 7, the high-resolution energy detection Faraday cup 4 includes: a Faraday cup 401, a second support shaft 402, a third mounting flange 404, a second mounting plate 405, and a second drive mechanism. The third mounting flange 404 is sealed to the side of the cavity 1, the second mounting plate 405 is connected to the third mounting flange 404, and the second drive mechanism is mounted on the second mounting plate 405. The Faraday cup 401 is disposed inside the cavity 1 and is connected to an external detection circuit via a cable 403. A beam 100 bombards the Faraday cup 401, generating a high potential. The external detection circuit forms a closed loop with the Faraday cup 401 via the cable 403 to generate a current. By measuring the magnitude of the beam current, the beam energy intensity is reflected. One end of the second support shaft 402 is connected to the Faraday cup 401, and the other end of the second support shaft 402 is dynamically sealed through the third mounting flange 404 and connected to the second drive mechanism. Driven by the second drive mechanism, the second support shaft 402 drives the Faraday cup 401 to perform linear reciprocating motion within the cavity 1.
[0032] It should be noted that in this embodiment, the structure of the second drive mechanism is the same as that of the first drive mechanism, and will not be described again here.
[0033] In this embodiment, the high-resolution energy detection Faraday 4, high-resolution analysis aperture 3, and analysis aperture 2 work together to complete the beam screening. At the beginning of the machine startup, the piston rods of the cylinders of the high-resolution energy detection Faraday 4 and the high-resolution analysis aperture 3 are in the retracted state. The Faraday cup 401, the first screening graphite 204, and the second screening graphite 301 are all on the beam path corresponding to the detection channel 101. The first screening graphite 204 and the second screening graphite 301 are used to screen the beam center ions, and the Faraday cup 401 is used to measure the beam center energy intensity. When the intensity meets the requirements, the electrical system controls the piston rods of the cylinders of the high-resolution energy detection Faraday 4 and the high-resolution analysis aperture 3 to extend, so that the Faraday cup 401 and the second screening graphite 301 exit the beam path. The beam 100 then enters the subsequent mechanism for focusing and scanning, etc. The flowchart is shown in Figure 8.
[0034] The above description is merely a preferred embodiment of the present invention. The scope of protection of the present invention is not limited to the above embodiments. All technical solutions falling within the scope of the present invention's concept are within the scope of protection of the present invention. It should be noted that for those skilled in the art, any improvements and modifications made without departing from the principles of the present invention should also be considered within the scope of protection of the present invention.
Claims
1. A beam energy monitoring device suitable for high-energy ion implanters, characterized in that, The device includes a cavity (1), a beam blocking component (5) that runs through the top of the cavity (1), and an analytical aperture (2), a high-resolution analytical aperture (3), and a high-resolution energy detection Faraday (4) that run through the cavity (1). A detection channel (101) is provided on the side of the cavity (1), and the beam blocking component (5) is used to control the opening and closing of the detection channel (101). The high-resolution analytical aperture (3) is located between the beam blocking component (5) and the analytical aperture (2) to screen the beam center ions before the beam (100) enters the analytical aperture (2). The high-resolution energy detection Faraday (4) is located after the analytical aperture (2) to detect the energy intensity of the screened beam (100) in real time.
2. The beam energy monitoring device for a high-energy ion implanter according to claim 1, characterized in that, The high-resolution analysis aperture (3) includes: a second screening graphite (301), a first support shaft (302), a second mounting flange (303), a first mounting plate (304), and a first driving mechanism; the second mounting flange (303) is sealed to the side of the cavity (1), the first mounting plate (304) is connected to the second mounting flange (303), and the first driving mechanism is disposed on the first mounting plate (304); the second screening graphite (301) is disposed in the cavity (1), and the second screening graphite (301) is provided with through holes for screening the beam (100); one end of the first support shaft (302) is connected to the second screening graphite (301), and the other end of the first support shaft (302) is dynamically sealed through the second mounting flange (303) and connected to the first driving mechanism; under the drive of the first driving mechanism, the first support shaft (302) drives the second screening graphite (301) to perform linear reciprocating motion in the cavity (1).
3. The beam energy monitoring device for a high-energy ion implanter according to claim 2, characterized in that, The first driving mechanism includes: a cylinder (305), a clamping block (308), a linear bearing (309), and a sealing assembly (310); the cylinder (305) and the linear bearing (309) are both mounted on the first mounting plate (304), and the sealing assembly (310) is mounted on the second mounting flange (303). The sealing assembly (310) is used to achieve dynamic sealing between the first support shaft (302) and the second mounting flange (303); the first support shaft (302) passes through the second mounting flange (303), the sealing assembly (310), and the linear bearing (309) in sequence, and is then connected to the clamping block (308). The output end of the cylinder (305) is connected to the clamping block (308); under the drive of the cylinder (305), the clamping block (308) drives the first support shaft (302) to perform linear reciprocating motion.
4. The beam energy monitoring device for a high-energy ion implanter according to claim 3, characterized in that, The first support shaft (302) has a cooling channel inside. The end of the first support shaft (302) passes through the clamping block (308) and is connected to the interface valve block (306). The side of the interface valve block (306) is provided with a second cooling pipe (307) to realize the entry and exit of the cooling medium into and out of the first support shaft (302).
5. The beam energy monitoring device for a high-energy ion implanter according to claim 3, characterized in that, The sealing assembly (310) includes: a sealing ring mounting seat (311), a U-shaped sealing ring (312), a sealing spacer (314), and an O-ring (316); the sealing ring mounting seat (311) is connected and fixed to the second mounting flange (303), and an O-ring (316) is provided between the sealing ring mounting seat (311) and the second mounting flange (303); the first support shaft (302) passes through the sealing ring mounting seat (311), and a sealing spacer (314) is provided between the first support shaft (302) and the sealing ring mounting seat (311), and U-shaped sealing rings (312) are provided at both ends of the sealing spacer (314).
6. The beam energy monitoring device for a high-energy ion implanter according to claim 5, characterized in that, The sealing assembly (310) further includes a support bearing (313) and a retaining ring (315) for the bore. The support bearing (313) is disposed between the first support shaft (302) and the sealing ring mounting seat (311) for supporting the first support shaft (302). The end of the support bearing (313) is provided with a retaining ring (315) for the bore to prevent the first support shaft (302) from moving axially.
7. The beam energy monitoring device for a high-energy ion implanter according to any one of claims 1 to 6, characterized in that, The high-resolution energy detection Faraday (4) includes: a Faraday cup (401), a second support shaft (402), a third mounting flange (404), a second mounting plate (405), and a second drive mechanism; the third mounting flange (404) is sealed to the side of the cavity (1), the second mounting plate (405) is connected to the third mounting flange (404), and the second drive mechanism is disposed on the second mounting plate (405); the Faraday cup (401) is disposed inside the cavity (1), and the Faraday cup (402) is disposed inside the cavity (1). 01) Connected to an external detection circuit via cable (403) to measure the current magnitude of the beam (100) and thus reflect the energy intensity of the beam (100); one end of the second support shaft (402) is connected to the Faraday cup (401), and the other end of the second support shaft (402) is connected to the second drive mechanism after passing through the third mounting flange (404) with a dynamic seal; under the drive of the second drive mechanism, the second support shaft (402) drives the Faraday cup (401) to perform linear reciprocating motion in the cavity (1).
8. The beam energy monitoring device for a high-energy ion implanter according to any one of claims 1 to 6, characterized in that, The analytical aperture (2) includes a first mounting flange (203), a first screening graphite (204), and a shielding plate (205); the shielding plate (205) is used to shield the beam (100), the first screening graphite (204) is disposed on the shielding plate (205), and the center of the first screening graphite (204) is provided with a through hole for screening the beam (100); one end of the shielding plate (205) is connected to the first mounting flange (203), and the first mounting flange (203) is connected to the side of the cavity (1) so that the shielding plate (205) is fixed inside the cavity (1).
9. The beam energy monitoring device for a high-energy ion implanter according to claim 8, characterized in that, The shielding plate (205) is provided with a first cooling pipe (202) to achieve cooling of the shielding plate (205).