Magnetic substrate and coil component including magnetic substrate

By optimizing the thickness ratio of silica and chromium/alumina oxide films through controlled heat treatment, the magnetic substrate achieves enhanced insulation and permeability, addressing the insulation challenges in conventional magnetic substrates.

JP2025153820APending Publication Date: 2025-10-10TAIYO YUDEN KK
1 Cites 0 Cited by

Patent Information

Application Number
JP2024056473
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-03-29
Publication Date
2025-10-10

AI Technical Summary

Technical Problem

Conventional magnetic substrates using oxide films for insulation on metal magnetic particles face challenges with insufficient insulation and magnetic permeability due to uneven oxide film thickness, particularly with Cr oxide films being thicker than Si oxide films, leading to inadequate electrical insulation between particles.

Method used

A magnetic substrate design with a thicker first oxide film primarily composed of silica and a thinner second oxide film primarily composed of chromium oxide or alumina, ensuring improved insulation by controlling the heat treatment process to enhance the thickness of the silica-based oxide films relative to chromium or alumina films.

Benefits of technology

The design achieves improved insulating properties and magnetic permeability by optimizing the thickness ratio of silica and chromium/alumina oxide films, enhancing electrical insulation and filling rate of metal magnetic particles within the substrate.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

To provide a magnetic substrate in which the insulating properties of metal magnetic particles are improved.SOLUTION: A magnetic substrate according to an embodiment includes a plurality of metal magnetic particles containing Fe, Si, and the element α, a first oxide film covering the surface of each of the plurality of metal magnetic particles, and a second oxide film covering the surface of the first oxide film. The first oxide film is primarily composed of an oxide of Si. The second oxide film is primarily composed of an oxide of the element α. A first thickness indicating the thickness of the first oxide film is thicker than a second thickness indicating the thickness of the second oxide film.SELECTED DRAWING: Figure 5
Need to check novelty before this filing date? Find Prior Art