Apparatus for increasing flux from an ampoule

Abstract

Ampoules for semiconductor manufacturing precursors and methods of use are provided. The ampoule includes a container with an inlet port and an outlet port. The inlet port has a showerhead at its end within the container. The showerhead has at least two angled nozzles that direct the flow of gas within the cavity so that the gas flow is not perpendicular to the surface of the liquid in the ampoule.

Description

[Technical Field]

[0001] FIELD OF THE DISCLOSURE The present disclosure relates generally to methods of forming contacts for semiconductor devices, and more particularly to processes for forming self-aligned contacts with critical dimension control. [Background technology]

[0002] The semiconductor industry uses an increasingly diverse range of chemicals provided in liquid or solid form for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The precursors are typically inside a closed container or ampoule with a single inlet and a single outlet.

[0003] Precursors with low vapor pressure often use a carrier gas to transport the vapor from the ampoule to the process reactor. Two types of ampoules are typically used for these types of processes: bubblers, in which the inlet carrier gas enters a tube submerged in the precursor, and cross-flow ampoules, in which the carrier gas passes through the headspace of the ampoule. Bubblers cannot be used due to precursor entrainment, and cross-flow ampoules cannot be used in some situations because the precursor flux does not meet the process parameters.

[0004] Therefore, there is a need in the art for an ampoule and method that provides a higher flux of precursor than a crossflow ampoule. Summary of the Invention

[0005] One or more embodiments of the present disclosure are directed to an ampoule for semiconductor manufacturing precursors. The ampoule comprises a container having a bottom, sidewalls, and a lid that enclose a cavity. An inlet port is fluidly connected to the cavity. The inlet port has a showerhead at an end of the inlet port located within the cavity. The showerhead includes at least two angled nozzles that direct a gas flow such that the gas flow is not perpendicular to the surface of the liquid when the liquid is present in the container. An outlet port is fluidly connected to the cavity.

[0006] A further embodiment of the present disclosure is directed to an ampoule for semiconductor manufacturing precursors. The ampoule comprises a container having a bottom, sidewalls, and a lid that enclose a cavity. An inlet port is in fluid communication with the cavity. The inlet port has a showerhead at an end of the inlet port that is located within the cavity. The showerhead includes three angled nozzles that independently direct gas flow from each nozzle, measured relative to a line perpendicular to the surface of the liquid, when liquid is present in the container. An outlet port is in fluid communication with the cavity.

[0007] A further embodiment of the present disclosure is directed to a method for providing a precursor flow. A carrier gas flows through an inlet port of a precursor ampoule having a liquid precursor therein. The carrier gas flow is directed within the ampoule with a showerhead at the end of the inlet port. The showerhead includes at least two angled nozzles that direct the gas flow at an angle that is not perpendicular to the surface of the liquid precursor. The carrier gas and precursor exit the ampoule through an outlet port.

[0008] In order that the above-mentioned features of the present invention may be understood in detail, a more particular description of the present invention summarized above can be made by reference to embodiments, some of which are illustrated in the accompanying drawings. It should be noted, however, that the appended drawings illustrate only typical embodiments of the present invention and are not to be considered as limiting its scope, since the present invention is susceptible to other equally effective embodiments. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a cross-sectional view of an ampoule according to one or more embodiments of the present disclosure. [Figure 2] This is the enlarged area 2 of FIG. [Figure 3] FIG. 1 is a partial cross-sectional view of an ampoule according to one or more embodiments of the present disclosure. [Figure 4] FIG. 1 is a schematic diagram of an ampoule and tubing according to one or more embodiments of the present disclosure. DETAILED DESCRIPTION OF THE INVENTION

[0010] In the accompanying figures, similar components and / or features may have the same reference label. Additionally, various components of the same type may be distinguished by the reference label being followed by a dash and a second label that distinguishes between the similar components. When only a first reference label is used in the specification, the description is applicable to any one of the similar components having the same first reference label, regardless of the second reference label. Cross-hatch shading of components in the figures is intended to aid in the visualization of different parts and does not necessarily indicate different components.

[0011] Before describing several exemplary embodiments of the invention, it is to be understood that the invention is not limited to the details of structure or process steps set forth in the following description. The invention is capable of other embodiments and of being practiced or carried out in various ways.

[0012] Some embodiments of the present disclosure advantageously provide ampoules with higher flux than cross-flow ampoules. Some embodiments advantageously provide ampoules with gas flow that does not bubble through the liquid precursor. Some embodiments advantageously provide gas flow that is not perpendicular to the precursor surface.

[0013] In some embodiments, a showerhead is provided at the entrance to the ampoule with multiple nozzles angled toward the liquid therein, and a distance between the liquid level and the showerhead is maintained such that the showerhead is not submerged in the liquid.

[0014] 1 shows an ampoule 100 for use with semiconductor manufacturing reagents. The term "precursor" is used to describe the contents of ampoule 100 and refers to any reagent that enters the process environment.

[0015] Ampoule 100 includes a container 110 having a base 112, a sidewall 114, and a lid 116 that encloses a cavity 118. An inlet port 120 and an outlet port 130 are in fluid communication with cavity 118.

[0016] Inlet port 120 is generally configured to be connectable to a gas source and may have a suitable threaded or sealed connection. Inlet port 120 has a passageway 121 with an inner diameter that defines a cross-sectional width of passageway 121, as shown in Figures 1 and 2. Passageway 121 has a bottom end 125 that may be curved, tapered, or flat-ended.

[0017] The inlet port 120 has a showerhead 122 at an end 123 of the inlet port 120 that is located within the cavity 118. The showerhead 122 is the portion of the inlet port 120 that is located between a bottom end 125 of the passageway 121 and the end 123 of the inlet port 120. The showerhead 122 includes at least two angled nozzles 140 that direct a flow of gas 141. The number of nozzles 140 in the showerhead 122 can be in the range of about 2 to about 24, or in the range of about 2 to about 18, or in the range of about 2 to about 12, or in the range of about 2 to about 10, or in the range of about 2 to about 8, or in the range of about 2 to about 6, or in the range of about 2 to about 4. In some embodiments, the showerhead 122 has three nozzles 140.

[0018] Nozzles 140 are configured to provide an angled stream of gas 141 as measured relative to a line perpendicular to a surface 151 of liquid 150 within ampoule 100. Referring to Figures 2 and 3, each nozzle 140 has an axis 144 oriented at an angle θ relative to a line 145 perpendicular to surface 151.

[0019] The angle θ can be any suitable angle that is not perpendicular to the surface 151 of the liquid 150. Each nozzle 140 can have a different angle θ than the other nozzles 140. In some embodiments, the angle θ is greater than 1°, 2°, 3°, or 4° relative to a line 145 perpendicular to the surface 151. In some embodiments, the angle θ is in the range of about 2° to about 25°, or in the range of about 2.5° to about 15°, or in the range of about 3° to about 12°, or in the range of about 4° to about 10°, or in the range of about 5° to about 7°. In some embodiments, the flow of gas exiting the nozzle is not perpendicular to the surface 151 of the liquid 150 in the container 110.

[0020] An outlet port 130 is also in fluid communication with the cavity 118 of the vessel 110. The outlet port 130 is generally configured to be connectable to a line that allows gases exiting the vessel 110 to flow to a processing chamber (or other component). The outlet port 130 may have a threaded connection that allows a gas line to be connected.

[0021] In some embodiments, as shown in FIG. 1 , the lid 116 is a separate component from the bottom 112 and sidewall 114. The lid 116 may be connected to the sidewall 114 of the container 110 using a removable bolt that passes through an appropriately shaped opening 160. The opening 160 may have a threaded portion to allow for easy connection of a threaded bolt. The bolt can be removed to remove the lid 116 from the container 110 so that the precursor in the container 110 can be changed or added. In some embodiments, the container 110 includes an O-ring 162 disposed between the lid 116 and the sidewall 114 to form a fluid-tight seal.

[0022] In some embodiments, as shown in FIG. 4 , the lid 116 can be integrally formed with the sidewall 114 and bottom 112 of the container 110. Different piping configurations can be connected to the lid 116 so that the ampoule 100 can be added to a process chamber. In some embodiments, an inlet line 170 is connected to the inlet port 120. An inlet valve 172 can be located on the inlet line 170 between a gas source 175 and the inlet port 120. The inlet valve 172 can be integrally formed with the lid 116 or can be connected to the lid 116 as a separate component. An outlet tube 180 can be connected to the outlet port 130. The outlet tube 180 in some embodiments includes an outlet valve 182 located between the outlet port 130 and a processing chamber 185. The inlet valve 172 and the outlet valve 182 can be used to isolate the ampoule 100 so that the contents of the cavity 118 are isolated from the environment outside the container 110. In some embodiments, there are multiple valves along the inlet line 170 and / or the outlet line 180. The valves 172, 182 can be manual valves or pneumatic valves.

[0023] In some embodiments, ampoule 100 includes a liquid 150 in cavity 118. Liquid 150 may be a precursor for use in semiconductor manufacturing processes. In some embodiments, liquid 150 includes dicobalt hexacarbonyl tert-butylacetylene (CCTBA).

[0024] 3, the distance D of the showerhead 122 to the surface 151 of the liquid 150 can change with time and precursor use. As the precursor is used, the volume within the vessel 110 decreases, thereby increasing the distance D. The distance D is sufficient to prevent the showerhead 122 from contacting or submerging in the liquid 150.

[0025] In some embodiments, the gas flow 141 through the inlet port 120 and showerhead 122 is sufficient to disrupt the liquid / gas interface of the liquid precursor without bubbling. In some embodiments, disrupting the liquid / gas interface forms dimples 153 on the surface 151 of the liquid 150. The dimples 153 can have a depth of up to about 3 mm. In some embodiments, the dimples have a depth of about 0.1 mm or more (measured from the surface 151). In some embodiments, the dimples 153 have a depth of about 2.5 mm, 2 mm, 1.5 mm, 1 mm, or 0.5 mm or less. As the level of the liquid 150 decreases, the gas flow 141 can be adjusted during processing to maintain sufficient disruption of the liquid / gas interface. The gas flow 141 in some embodiments has a maximum velocity sufficient to prevent condensation of the liquid 150 at the outlet port 130.

[0026] Throughout this specification, references to "one embodiment," "a particular embodiment," "one or more embodiments," or "an embodiment" mean that a particular feature, structure, material, or characteristic described in connection with an embodiment is included in at least one embodiment of the invention. Thus, the appearances of phrases such as "in one or more embodiments," "in a particular embodiment," "in one embodiment," or "in an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment of the invention. Furthermore, particular features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments.

[0027] Although the present invention has been described herein with reference to particular embodiments, it is to be understood that these embodiments are merely illustrative of the principles and applications of the present invention. It will be apparent to those skilled in the art that various modifications and variations can be made in the method and apparatus of the present invention without departing from the spirit and scope of the invention. Therefore, it is intended that the present invention cover modifications and variations that come within the scope of the appended claims and their equivalents.

Claims

1. a container having a bottom, sidewalls, and a lid enclosing a cavity; an inlet port in fluid communication with the cavity, the inlet port having at least two angled nozzles through an end of the inlet port located within the cavity; the at least two angled nozzles are configured to direct a flow of carrier gas such that the flow of carrier gas is not perpendicular to a surface of the liquid precursor when the liquid precursor is present in the vessel; and an outlet port on the surface of the liquid precursor in fluid communication with the cavity; a gas source for providing an adjustable flow of carrier gas such that the flow of the carrier gas is sufficient to disrupt a liquid / gas interface of the liquid precursor present in the vessel without bubbling; a lower end of the carrier gas flow defined by all of the at least two angled nozzles is in direct fluid communication with the surface of the liquid precursor; the at least two angled nozzles are located within a showerhead, the end of the inlet port is located a first orthogonal distance from the lid and the outlet port is located a second orthogonal distance from the lid, the first orthogonal distance being greater than the second orthogonal distance, and the directed flow of the carrier gas disrupts the liquid / gas interface to form dimples having a depth of about 0.1 to 3 mm on the surface of the liquid precursor; the flow of the carrier gas has a maximum velocity to prevent condensation of precursor at the output port; Ampoules for semiconductor manufacturing precursors.

2. 10. The ampoule of claim 1, wherein the at least two angled nozzles are independently angled in the range of about 2° to about 25° as measured relative to a line perpendicular to the surface of the liquid precursor when the liquid precursor is present.

3. 10. The ampoule of claim 1, wherein the at least two angled nozzles are independently angled in the range of about 5° to about 7° as measured relative to a line perpendicular to the surface of the liquid precursor when the liquid precursor is present.

4. An ampoule as described in claim 1, wherein the number of the at least two angled nozzles is in the range of 2 to 4.

5. An ampoule as described in claim 1, wherein the number of the at least two angled nozzles is three.

6. 6. The ampoule of claim 1, wherein the lid is integrally formed with the sidewall and bottom of the container.

7. 6. The ampoule of claim 1, wherein the lid is a separate component from the base and sidewall.

8. 8. The ampoule of claim 7, wherein the lid is connected to the sidewall of the container using a removable bolt.

9. 9. The ampoule of claim 8, further comprising an O-ring disposed between the lid and the side wall.

10. 6. The ampoule of claim 1, further comprising a liquid precursor within the cavity.

11. The ampoule of claim 10, wherein the liquid precursor comprises dicobalt hexacarbonyl tert-butylacetylene.

12. An ampoule as described in claim 1, wherein the flow of the carrier gas is directed toward the liquid / gas interface, disturbing the liquid / gas interface, and the dimples have a depth of approximately 1 mm or less.

13. flowing a carrier gas from a gas source through an inlet port of a precursor ampoule having a liquid precursor therein; directing a flow of the carrier gas within the ampoule through at least two angled nozzles through an end of the inlet port to direct the flow of the carrier gas at an angle that is not perpendicular to a surface of the liquid precursor, the flow of the carrier gas being sufficient to disturb a liquid / gas interface of the liquid precursor exiting a container without bubbling, the disturbance of the liquid / gas interface by the directed flow of the carrier gas forming dimples having a depth of about 0.1 to 3 mm on the surface of the liquid precursor; allowing the carrier gas and precursor to flow out of the ampoule through an exit port above the surface of the liquid precursor; Including, the end of the inlet port is located a first orthogonal distance from a lid, the outlet port is located a second orthogonal distance from the lid, the first orthogonal distance is greater than the second orthogonal distance, a lower end of the carrier gas flow defined by all of the at least two angled nozzles is in direct fluid communication with the surface of the liquid precursor, and the carrier gas flow has a maximum velocity to prevent condensation of the precursor at the outlet port. A method for providing a precursor flow.

14. 14. The method of claim 13, wherein the at least two angled nozzles are located in a showerhead.

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