Coating device and coating method
By setting up an anode device in the vacuum chamber to regulate the plasma density on the plasma raceway, the problem of poor axial film thickness uniformity of the target material was solved, thereby improving the utilization rate of the target material and the film thickness uniformity.
Patent Information
- Application Number
- PCT/CN2025/088441
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-05-07
- Filing Date
- 2025-04-11
- Publication Date
- 2025-11-13
AI Technical Summary
During large-area coating, the film thickness uniformity of the target material along the axial direction is poor, and the etching rate at the end of the target material is much higher than that at the middle, resulting in low target material utilization.
An anode device is set in the vacuum chamber, including a first anode and a second anode arranged sequentially along the axial direction of the target material. The potential of the first anode is higher than that of the second anode. By adjusting the plasma density on the plasma raceway, the difference in etching rate between the end and middle of the target material is reduced.
The utilization rate of the target material was optimized, the uniformity of film thickness along the axial direction of the target material was improved, the difference in etching rate between the end and middle of the target material was reduced, and the utilization rate of the target material was improved.