Device and method for removing solid particles in ultrahigh pure ethyl silicate steel cylinders

Abstract

The invention discloses a device for removing solid particles in the ultrahigh pure ethyl silicate steel cylinders. Compared with the prior art, dual loops are adopted for filtering, the two steel cylinders can be treated at the same time, and the treatment efficiency of the steel cylinders is improved; repeated filtering replaces cleaning of a large amount of high-purity water, no waste liquid isgenerated, and the steel cylinders do not need to be subjected to water removal treatment; the treatment time of the steel cylinders is reduced, and the usage level is low; the device is reasonable in structural design and simple in operation, and the metal impurity content can be strictly controlled within the acceptable range; and meanwhile, a tail gas adsorption column can be further arranged,and the problem of environment pollution of tail gas emission is solved.

Description

technical field

[0001] The invention relates to the technical field of ultra-high-purity ethyl orthosilicate, in particular to a device and method for removing solid particles in an ultra-high-purity ethyl orthosilicate cylinder. Background technique

[0002] With the development of the semiconductor industry, it puts forward higher requirements for the main processes of ion implantation, diffusion, epitaxial growth and lithography; the critical dimension in the semiconductor process technology is getting smaller and smaller, according to the latest report, it has reached 3nm; integration The components and connections in the circuit are very small, so if they are polluted by solid particles such as dust particles and metal particles during the manufacturing process, it is easy to cause damage to the circuit function in the chip, forming a short circuit or open circuit, making the integrated circuit Failure and formation of affected geometric features. Therefore, it is nece...

Examples

Embodiment 1

[0064] use figure 2 The device shown is mainly composed of filters, high-purity nitrogen cylinders, qualified product cylinders, untreated cylinders, cylinder scales, vacuum pumps, tail gas adsorption columns, gas distribution panels and corresponding connecting pipelines, valves and instruments.

[0065] The process consists of qualified product washing and filtering, vacuuming, and tail gas adsorption units. Charge a certain amount of qualified tetraethyl orthosilicate into the steel cylinder 1 to be treated in advance. In the first step, the pressure of high-purity nitrogen is adjusted to 15-20 psig through the pressure regulating valve of the steel cylinder; Valve, after flushing high-purity nitrogen gas into cylinder 2 to be processed to a pressure of 1 to 5 psig, close the valve liquid phase valve and valve 14 of cylinder 2 to be processed; the third step is to open the gas phase valve and valve 15 of cylinder 2 to be processed, and The gas in the steel cylinder 2 is ...

technical field

[0001] The invention relates to the technical field of ultra-high-purity ethyl orthosilicate, in particular to a device and method for removing solid particles in an ultra-high-purity ethyl orthosilicate cylinder. Background technique

[0002] With the development of the semiconductor industry, it puts forward higher requirements for the main processes of ion implantation, diffusion, epitaxial growth and lithography; the critical dimension in the semiconductor process technology is getting smaller and smaller, according to the latest report, it has reached 3nm; integration The components and connections in the circuit are very small, so if they are polluted by solid particles such as dust particles and metal particles during the manufacturing process, it is easy to cause damage to the circuit function in the chip, forming a short circuit or open circuit, making the integrated circuit Failure and formation of affected geometric features. Therefore, it is nece...

Examples

Embodiment 1

[0064] use figure 2 The device shown is mainly composed of filters, high-purity nitrogen cylinders, qualified product cylinders, untreated cylinders, cylinder scales, vacuum pumps, tail gas adsorption columns, gas distribution panels and corresponding connecting pipelines, valves and instruments.

[0065] The process consists of qualified product washing and filtering, vacuuming, and tail gas adsorption units. Charge a certain amount of qualified tetraethyl orthosilicate into the steel cylinder 1 to be treated in advance. In the first step, the pressure of high-purity nitrogen is adjusted to 15-20 psig through the pressure regulating valve of the steel cylinder; Valve, after flushing high-purity nitrogen gas into cylinder 2 to be processed to a pressure of 1 to 5 psig, close the valve liquid phase valve and valve 14 of cylinder 2 to be processed; the third step is to open the gas phase valve and valve 15 of cylinder 2 to be processed, and The gas in the steel cylinder 2 is ...

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