Dual-station polishing pressure balance device

By designing a double-station polishing pressure balance device including a fixed base, a lift base, a lift mechanism and a pressure sensor in a double-station polishing machine, the problem of polishing imbalance is solved, and the workpiece stress and product quality are achieved Improvement.

CN112059886BActive Publication Date: 2025-02-18湖南宇环精密制造有限公司
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
CN202011051467.0
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2020-09-29
Publication Date
2025-02-18
Estimated Expiration
2040-09-29

AI Technical Summary

Technical Problem

During the polishing process, the existing double-station polishing machines have accumulated assembly errors and consumable thickness tolerances, resulting in different polishing strengths at the two workpiece parts, resulting in the problems of polishing imbalance and product inconsistency.

Method used

A double-station polishing pressure balance device is designed, including a fixed machine base, a lifting mechanism, a pair of pressure sensors and a pair of clamping tooling. Through the cooperation of the lifting mechanism and pressure sensor, the polishing force of each workpiece is monitored and adjusted in real time to ensure that the polishing force on both sides is consistent.

Benefits of technology

The workpieces on the two clamping tools are consistent in their stress, achieving balance in polishing force, ensuring consistent processing of workpieces, improving product quality, and simple and reliable structure.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN112059886B_ABST
    Figure CN112059886B_ABST
Patent Text Reader

Abstract

The invention discloses a double-station polishing pressure balancing device, comprising a fixed machine base, a lifting machine base, a lifting mechanism, a pair of pressure sensors and a pair of clamping tools, the lifting mechanism is installed on the fixed machine base, the lifting machine base is installed on the lifting mechanism, a pair of pressure sensors are respectively installed on the fixed machine base and the lifting machine base, a pair of clamping tools are respectively installed on the pair of pressure sensors, and the pair of pressure sensors and the lifting mechanism are connected by signals. The pressure balancing device has the advantages of simple and reliable structure and can improve product quality.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The invention mainly relates to the technical field of polishing machines, and in particular to a double-station polishing pressure balancing device. Background Art

[0002] With the continuous popularization and upgrading of electronic products, the demand for glass display screens is increasing, and the quality requirements are getting higher and higher. Therefore, the glass grinding and polishing process has also developed rapidly, and higher requirements have been put forward for polishing machines. In order to improve the polishing efficiency, the glass shells of 3C products such as mobile phones are generally processed by single-station, double-station or multi-station polishing machines.

[0003] Single-station polishing has low efficiency because it only processes one workpiece. Multi-station polishing can polish multiple workpieces at the same time, which is highly efficient. However, the workpieces at each station need to be polished consistently, which is difficult, especially for high-end 3C products. However, two-station polishing equipment takes into account both efficiency and consistency, so it is deeply loved by factories.

[0004] The current double-station polishing machine has two workpiece parts that are polished. When polishing, the two workpiece parts move with the overall movement of the equipment workbench at the same time. The two tooling discs are driven by a reduction motor or two reduction motors to rotate separately. Due to the accumulation of assembly errors and the thickness tolerance of consumables, the workpiece parts on the two tooling discs are polished at different forces, resulting in unbalanced polishing on both sides, resulting in inconsistent products. Summary of the invention

[0005] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide a double-station polishing pressure balancing device which has a simple and reliable structure and can improve product quality.

[0006] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0007] A double-station polishing pressure balancing device includes a fixed machine base, a lifting machine base, a lifting mechanism, a pair of pressure sensors and a pair of clamping tools. The lifting mechanism is installed on the fixed machine base, and the lifting machine base is installed on the lifting mechanism. A pair of pressure sensors are respectively installed on the fixed machine base and the lifting machine base. A pair of clamping tools are respectively installed on a pair of pressure sensors. The pair of pressure sensors and the lifting mechanism are connected by signals.

[0008] As a further improvement of the above technical solution:

[0009] The lifting mechanism includes a lifting servo motor, a transmission screw and a lifting block. The lifting servo motor is fixed on a fixed base. The transmission screw is connected to the output end of the lifting servo motor. The lifting block is threadedly connected to the transmission screw. The lifting base is installed on the lifting block.

[0010] A vertical guide rail is installed on the fixed machine base, and the lifting machine base is slidably connected with the vertical guide rail.

[0011] The clamping tool comprises a support member and a clamp, wherein the support member is mounted on a corresponding pressure sensor, and the clamp is mounted on a corresponding support member.

[0012] The support member comprises a rotary driving member and a turntable, the rotary driving member is mounted on the corresponding pressure sensor, the turntable is connected to the output end of the corresponding rotary driving member, and the clamp is mounted on the corresponding turntable.

[0013] The rotary drive member includes a rotary servo motor and a cam divider, the cam divider is mounted on a corresponding pressure sensor, the rotary servo motor is connected to an input shaft of the corresponding cam divider, and the turntable is mounted on an output shaft of the corresponding cam divider.

[0014] Compared with the prior art, the advantages of the present invention are:

[0015] The double-station polishing pressure balancing device of the present invention comprises a fixed machine base, a lifting machine base, a lifting mechanism, a pair of pressure sensors and a pair of clamping fixtures. The lifting mechanism is installed on the fixed machine base, the lifting machine base is installed on the lifting mechanism, a pair of pressure sensors are respectively installed on the fixed machine base and the lifting machine base, a pair of clamping fixtures are respectively installed on the pair of pressure sensors, and the pair of pressure sensors and the lifting mechanism are connected by signals. When the device is working, the workpieces on the two clamping fixtures are polished and polished by the polishing disc. At this time, the two pressure sensors will obtain a set of pressure data. Since the pressure sensor on the fixed machine base is fixed, the obtained data can be compared with the data in the system library. The system can debug the polishing disc to control the force of the fixed clamping fixture. Therefore, the data of the pressure sensor on the lifting seat will be compared with the data of the pressure sensor on the fixed machine base. When a deviation is found, the lifting mechanism will drive the lifting seat to drive the corresponding clamping fixture to lift, so as to achieve the same force on the workpieces on the two clamping fixtures, achieve the balance of polishing force on both sides, and achieve the same workpiece processing. Its structure is simple and reliable, and the product quality is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a structural schematic diagram of the double-station polishing pressure balancing device of the present invention.

[0017] The symbols in the figure represent:

[0018] 1. Fixed machine base; 11. Vertical guide rail; 2. Lifting machine base; 3. Lifting mechanism; 31. Lifting servo motor; 32. Transmission screw; 33. Lifting block; 4. Pressure sensor; 5. Clamping tooling; 51. Support member; 511. Rotating drive member; 5111. Rotating servo motor; 5112. Cam divider; 512. Turntable; 52. Fixture. DETAILED DESCRIPTION

[0019] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0020] like Figure 1 As shown, an embodiment of the double-station polishing pressure balancing device of the present invention includes a fixed machine base 1, a lifting machine base 2, a lifting mechanism 3, a pair of pressure sensors 4 and a pair of clamping tools 5. The lifting mechanism 3 is installed on the fixed machine base 1, the lifting machine base 2 is installed on the lifting mechanism 3, a pair of pressure sensors 4 are respectively installed on the fixed machine base 1 and the lifting machine base 2, a pair of clamping tools 5 are respectively installed on the pair of pressure sensors 4, and the pair of pressure sensors 4 and the lifting mechanism 3 are connected by signals. When the device is working, the workpieces on the two clamping fixtures 5 are polished and ground by the polishing disc. At this time, the two pressure sensors 4 will obtain a set of pressure data. Since the pressure sensor 4 on the fixed machine base 1 is fixed, the data obtained can be compared with the data in the system library. The system can debug the polishing disc to control the force applied to the fixed clamping fixture 5. Therefore, the data of the pressure sensor 4 on the lifting machine base 2 will be compared with the data of the pressure sensor 4 on the fixed machine base 1. When a deviation is found, the lifting mechanism 3 will drive the lifting machine base 2 to drive the corresponding clamping fixture 5 to rise and fall, thereby achieving consistent force on the workpieces on the two clamping fixtures 5, achieving balanced polishing force on both sides, and achieving consistent workpiece processing. Its structure is simple and reliable, and improves product quality.

[0021] In this embodiment, the lifting mechanism 3 includes a lifting servo motor 31, a transmission screw 32 and a lifting block 33. The lifting servo motor 31 is fixedly mounted on the fixed machine base 1, the transmission screw 32 is connected to the output end of the lifting servo motor 31, the lifting block 33 is threadedly connected to the transmission screw 32, and the lifting base 2 is installed on the lifting block 33. In this structure, the lifting servo motor 31 drives the transmission screw 32 to rotate after receiving a signal, and the lifting block 33 will rise and fall on the transmission screw 32, thereby driving the lifting base 2 to rise and fall, and finally driving the corresponding clamping tool 5 to rise and fall.

[0022] In this embodiment, a vertical guide rail 11 is installed on the fixed machine base 1, and the lifting machine base 2 is slidably connected with the vertical guide rail 11. The vertical guide rail 11 is provided to guide and constrain the lifting machine base 2, thereby ensuring the smoothness and stability of lifting.

[0023] In this embodiment, the clamping tool 5 includes a support member 51 and a fixture 52. The support member 51 is mounted on the corresponding pressure sensor 4, and the fixture 52 is mounted on the corresponding support member 51. In this structure, the support member 51 provides an installation and support basis for the fixture 52, and the fixture 52 is used to clamp the workpiece.

[0024] In this embodiment, the support member 51 includes a rotary drive member 511 and a turntable 512. The rotary drive member 511 is mounted on the corresponding pressure sensor 4. The turntable 512 is connected to the output end of the corresponding rotary drive member 511. The fixture 52 is mounted on the corresponding turntable 512. In this structure, the rotary drive member 511 can drive the turntable 512 to rotate, thereby realizing the rotation of the workpiece and ensuring the polishing quality.

[0025] In this embodiment, the rotary drive member 511 includes a rotary servo motor 5111 and a cam divider 5112. The cam divider 5112 is mounted on the corresponding pressure sensor 4. The rotary servo motor 5111 is connected to the input shaft of the corresponding cam divider 5112. The rotary disk 512 is mounted on the output shaft of the corresponding cam divider 5112. In this structure, the cam divider 5112 ensures the rotation of the rotary disk 512 on the one hand, and strengthens the rigidity of the overall structure on the other hand.

[0026] Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any technician familiar with the art can make many possible changes and modifications to the technical solution of the present invention by using the technical content disclosed above without departing from the scope of the technical solution of the present invention, or modify it into an equivalent embodiment of equivalent changes. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention should fall within the scope of protection of the technical solution of the present invention.

Claims

1. A double-station polishing pressure balancing device, characterized in that: The invention comprises a fixed machine base (1), a lifting machine base (2), a lifting mechanism (3), a pair of pressure sensors (4) and a pair of clamping fixtures (5), wherein the lifting mechanism (3) is mounted on the fixed machine base (1), the lifting machine base (2) is mounted on the lifting mechanism (3), the pair of pressure sensors (4) are respectively mounted on the fixed machine base (1) and the lifting machine base (2), and the pair of clamping fixtures (5) are respectively mounted on the pair of pressure sensors (4). The pair of pressure sensors (4) and the lifting mechanism (3) are connected by signals, and the workpieces on the two clamping fixtures (5) are polished and ground by a polishing disc. At this time, the two pressure sensors (4) will obtain a set of pressure data, which are compared with the data in the system library. The system debugs the polishing disc to control the force applied to the fixed clamping fixture (5). The data of the pressure sensor (4) on the lifting machine base (2) is compared with the data of the pressure sensor (4) on the fixed machine base (1). When a deviation is found, the lifting mechanism (3) will drive the lifting machine base (2) to drive the corresponding clamping fixture (5) to rise and fall.

2. The double-station polishing pressure balancing device according to claim 1 is characterized in that: The lifting mechanism (3) comprises a lifting servo motor (31), a transmission screw (32) and a lifting block (33); the lifting servo motor (31) is fixedly mounted on a fixed base (1); the transmission screw (32) is connected to an output end of the lifting servo motor (31); the lifting block (33) is threadedly connected to the transmission screw (32); and the lifting base (2) is mounted on the lifting block (33).

3. The double-station polishing pressure balancing device according to claim 2 is characterized in that: A vertical guide rail (11) is installed on the fixed machine base (1), and the lifting machine base (2) is slidably connected to the vertical guide rail (11).

4. The double-station polishing pressure balancing device according to any one of claims 1 to 3, characterized in that: The clamping tool (5) comprises a support member (51) and a clamp (52); the support member (51) is mounted on a corresponding pressure sensor (4); and the clamp (52) is mounted on a corresponding support member (51).

5. The double-station polishing pressure balancing device according to claim 4 is characterized in that: The support member (51) comprises a rotary drive member (511) and a turntable (512); the rotary drive member (511) is mounted on a corresponding pressure sensor (4); the turntable (512) is connected to an output end of the corresponding rotary drive member (511); and the clamp (52) is mounted on the corresponding turntable (512).

6. The double-station polishing pressure balancing device according to claim 5 is characterized in that: The rotary drive member (511) comprises a rotary servo motor (5111) and a cam divider (5112); the cam divider (5112) is mounted on a corresponding pressure sensor (4); the rotary servo motor (5111) is connected to an input shaft of the corresponding cam divider (5112); and the rotary disk (512) is mounted on an output shaft of the corresponding cam divider (5112).

Citation Information

Patent Citations

  • Double-station polishing pressure balancing device

    CN212553266U