Elastic membrane and substrate holding device

Abstract

The present invention provides an elastic membrane and a substrate holding device, wherein the elastic membrane can suppress the deviation of the deformation of the elastic membrane in the circumferential direction and can be easily installed on the head body of the substrate holding device. The elastic membrane (10) of the present invention is used for a substrate holding device (1). The elastic membrane (10) has an abutting portion (11) that abuts against a substrate (W) and presses the substrate (W) against a polishing pad (19), and an edge peripheral wall (33) extending from the peripheral end of the abutting portion (11). The edge peripheral wall (33) has an edge peripheral wall lip (33b) that is sandwiched between the head body (2) of the substrate holding device (1) and an edge mounting component (47) used to fix the edge peripheral wall (33) to the head body (2). At least a portion of the surface of the edge peripheral wall lip (33b) is roughened.

Description

Technical Field

[0001] The present invention relates to an elastic membrane for a substrate holding device of a polishing device. In addition, the present invention relates to a substrate holding device having the elastic membrane. Background Art

[0002] The grinding device used for CMP comprises a grinding table (Japanese: grinding table) for supporting a grinding pad, and a substrate holding device for holding a substrate such as a wafer. The substrate holding device is sometimes also called a top ring or a grinding head. When such a grinding device is used to grind a substrate, the substrate is held by the substrate holding device while the substrate is pressed against the grinding surface of the grinding pad at a predetermined pressure. At this time, the surface of the substrate is ground by making the grinding table and the substrate holding device move relative to each other so that the substrate and the grinding surface are brought into sliding contact.

[0003] When the relative pressing force between the substrate being polished and the polishing surface of the polishing pad is not uniform over the entire surface of the substrate, insufficient polishing or excessive polishing may occur in accordance with the pressing force applied to each part of the substrate. Therefore, in order to make the pressing force on the substrate uniform, a pressure chamber formed by a soft elastic film (diaphragm) is provided at the bottom of the substrate holding device, and a fluid such as air is supplied to the pressure chamber, so that the substrate is pressed against the polishing surface of the polishing pad through the elastic film by the fluid pressure.

[0004] Such a substrate holding device, for example, comprises: a head body for pressing the substrate against the polishing surface of the polishing pad, the elastic membrane mounted on the head body, a mounting component for fixing the elastic membrane to the head body, and a retaining ring for surrounding the substrate held on the head body via the elastic membrane. When the elastic membrane is fixed to the head body by means of the mounting component, at least one pressure chamber is formed by the elastic membrane. Such an elastic membrane is a consumable and requires regular maintenance and / or replacement. For this reason, the elastic membrane is configured to be attachable to and detachable from the head body by means of the mounting component.

[0005] Prior art literature

[0006] Patent Literature

[0007] Patent Document 1: U.S. Patent No. 8808062

[0008] Patent Document 2: U.S. Patent No. 9452505

[0009] Patent Document 3: U.S. Patent No. 8454413

[0010] Patent Document 4: Japanese Patent Application Publication No. 2006-159392

[0011] Problems to be solved by the invention

[0012] However, the elastic membrane is generally formed of a material such as rubber that is not only flexible but also highly viscous. For this reason, when the operator fixes the elastic membrane to the head body by means of the mounting component, it is sometimes difficult to properly fix the elastic membrane to the head body by making a part of the elastic membrane close to the head body and / or the mounting component. More specifically, if a part (or multiple parts) of the elastic membrane is in close contact with the head body and / or the mounting component, the close contact part may stretch other parts of the elastic membrane, causing deviation in the deformation of the elastic membrane in the circumferential direction. In other words, the elastic membrane mounted on the head body may deform unevenly in its circumferential direction.

[0013] When polishing a substrate, a fluid having a predetermined pressure is supplied to a pressure chamber formed by the elastic membrane. Therefore, if the elastic membrane is deformed in a circumferential direction, the elastic membrane may not expand uniformly in the circumferential direction, and as a result, the uniformity of the polishing rate in the circumferential direction of the substrate may be deteriorated.

[0014] To prevent the above-mentioned inconvenience, if the operator fixing the elastic membrane to the head body needs to eliminate the deviation in the deformation of the elastic membrane in the circumferential direction, the operator's burden and labor will increase, and it will take a long time to fix the elastic membrane to the head body. Summary of the invention

[0015] Therefore, an object of the present invention is to provide an elastic membrane which can suppress the variation of deformation of the elastic membrane in the circumferential direction and can be easily mounted on a head body of a substrate holding device. Furthermore, an object of the present invention is to provide a substrate holding device having such an elastic membrane.

[0016] Technical means to solve problems

[0017] In one form, an elastic membrane is provided for use in a substrate holding device, wherein the elastic membrane comprises: an abutment portion that abuts against a substrate to press the substrate against a polishing pad; and an edge wall that extends from a peripheral end portion of the abutment portion, the edge wall having an edge wall lip that is clamped between a head body of the substrate holding device and an edge mounting component for fixing the edge wall to the head body, and at least a portion of the surface of the edge wall lip is roughened.

[0018] In one embodiment, the edge peripheral wall includes an edge peripheral wall body extending from the abutment portion and connected to the edge peripheral wall lip portion, and a contact surface of the edge peripheral wall body with the edge mounting member is also roughened.

[0019] In one form, the elastic membrane also has at least one inner circumferential wall, which is arranged radially inward of the edge circumferential wall and extends from the abutment portion. The inner circumferential wall has an inner circumferential wall lip, which is clamped between the head body and an internal mounting component used to fix the inner circumferential wall to the head body, and at least a portion of the surface of the inner circumferential wall lip is roughened.

[0020] In one embodiment, the inner peripheral wall includes an inner peripheral wall body extending from the abutment portion and connected to the inner peripheral wall lip portion, and a contact surface of the inner peripheral wall body with the inner mounting component is also roughened.

[0021] In one embodiment, the surface of the elastic film is roughened overall.

[0022] In one form, a substrate holding device is provided, which comprises: an elastic membrane that forms at least one pressure chamber for pressing a substrate; a head body that fixes the elastic membrane; and at least one mounting component that fixes the elastic membrane to the head body, the elastic membrane comprising: an abutment portion that abuts against the substrate to press the substrate against a polishing pad; and an edge wall that extends from a peripheral end portion of the abutment portion, the edge wall having an edge wall lip that is sandwiched between the head body and an edge mounting component that is one of the mounting components, and at least a portion of the surface of the edge wall lip is roughened.

[0023] In one form, the surface of the edge mounting member is covered with a friction reducing film.

[0024] In one form, a substrate holding device is provided, which comprises: an elastic membrane that forms at least one pressure chamber for pressing the substrate; a head body that fixes the elastic membrane; and at least one mounting component that fixes the elastic membrane to the head body, the elastic membrane comprising: an abutment portion that abuts against the substrate to press the substrate against a polishing pad; and an edge wall that extends from the peripheral end portion of the abutment portion, the edge wall having an edge wall lip that is sandwiched between the head body and an edge mounting component that is one of the mounting components, the surface of the edge mounting component opposite to the edge wall lip and / or the surface of the head body being roughened.

[0025] In one form, an elastic membrane is provided for a substrate holding device, wherein the elastic membrane comprises: an abutting portion that abuts against a substrate to press the substrate against a polishing pad; and an edge wall that extends from a peripheral end portion of the abutting portion, and has an edge wall lip portion at an upper portion of the edge wall, the edge wall lip portion being clamped between a head body of the substrate holding device and an edge mounting component for fixing the edge wall to the head body, the edge wall lip portion having a plurality of edge wall protrusions that engage with a first recess formed in the edge mounting component and / or a second recess formed in the head body, and the edge wall protrusions are arranged at equal intervals along the circumference of the edge wall.

[0026] In one form, the edge wall protrusion is a longitudinal edge protrusion protruding from the upper surface or the lower surface of the edge wall lip.

[0027] In one form, the peripheral edge wall protrusion is a lateral edge protrusion protruding from a top end of the peripheral edge wall lip toward a radial direction of the peripheral edge wall.

[0028] In one form, several of the edge wall protrusions are longitudinal edge protrusions protruding from the upper surface or the lower surface of the edge wall lip, and the remaining edge wall protrusions are lateral edge protrusions protruding from the top of the edge wall lip toward the radial direction of the edge wall.

[0029] In one form, the elastic membrane also has at least one inner circumferential wall, which is arranged on the radial inner side of the edge circumferential wall and extends from the abutment portion. The upper portion of the inner circumferential wall has an inner circumferential wall lip, which is clamped between the head body and an internal mounting component used to fix the inner circumferential wall to the head body. The inner circumferential wall lip has a plurality of inner circumferential wall protrusions, which are engaged with a third recess formed on the edge mounting component and / or a fourth recess formed on the head body. The inner circumferential wall protrusions are arranged at equal intervals along the circumference of the inner circumferential wall.

[0030] In one form, the inner peripheral wall protrusion is a longitudinal inner protrusion protruding from the upper surface or the lower surface of the inner peripheral wall lip.

[0031] In one form, the inner peripheral wall protrusion is a transverse inner protrusion protruding from a top end of the inner peripheral wall lip toward a radial direction of the inner peripheral wall.

[0032] In one form, several of the inner circumferential wall protrusions are longitudinal internal protrusions protruding from the upper surface or the lower surface of the inner circumferential wall lip, and the remaining inner circumferential wall protrusions are transverse internal protrusions protruding from the top of the inner circumferential wall lip toward the radial direction of the inner circumferential wall.

[0033] In one embodiment, a substrate holding device is provided, which comprises: an elastic membrane that forms at least one pressure chamber for pressing a substrate; a head body that fixes the elastic membrane; and at least one mounting component that fixes the elastic membrane to the head body, the elastic membrane being the above-mentioned elastic membrane.

[0034] Effects of the Invention

[0035] According to the present invention, the contact area of ​​the lip of the edge peripheral wall with the edge mounting component and / or the contact area of ​​the lip of the edge peripheral wall with the head body is reduced compared to the case where the surface of the lip of the edge peripheral wall is not roughened. As a result, the elastic film is prevented from being in close contact with the edge mounting component and / or the head body. Therefore, the elastic film can be smoothly and easily moved relative to the edge mounting component and / or the head body, so that the elastic film can be easily fixed to the head body while suppressing the deviation of the deformation of the elastic film in the circumferential direction.

[0036] Furthermore, according to the present invention, the elastic membrane is fixed to the head body in a state where a plurality of edge peripheral wall protrusions arranged at equal intervals along the circumferential direction of the edge peripheral wall are embedded in the first recess and / or the second recess. Therefore, the elastic membrane can be fixed to the head body while suppressing the deformation of the elastic membrane in the circumferential direction to a minimum. Furthermore, when the elastic membrane is fixed to the head body by means of the mounting member, the plurality of edge peripheral wall protrusions guide the head body and / or the edge mounting member to function. Therefore, the elastic membrane can be easily mounted to the head body. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 It is a schematic diagram which shows the polishing apparatus which concerns on one Embodiment.

[0038] Figure 2 This is a schematic cross-sectional view of a substrate holding device according to one embodiment.

[0039] Figure 3 Yes means Figure 2 An enlarged cross-sectional view of a portion of the elastic membrane is shown.

[0040] Figure 4 yes Figure 2 An enlarged cross-sectional view of the vicinity of the second mounting ring is shown.

[0041] Figure 5This is a diagram showing the roughened surface of the edge peripheral wall lip of the elastic film.

[0042] Figure 6 It is a figure which shows the roughened surface of the elastic film which concerns on another embodiment.

[0043] Figure 7 This is a diagram clearly showing a roughened surface of an elastic film according to still another embodiment.

[0044] Figure 8 This is a diagram clearly showing a roughened surface of an elastic film according to still another embodiment.

[0045] Fig. 9 It is a schematic cross-sectional view showing a substrate holding device according to another embodiment.

[0046] Fig.10 Yes means Fig. 9 An enlarged cross-sectional view of a portion of the elastic membrane is shown.

[0047] Fig.11 yes Fig. 9 An enlarged cross-sectional view of the vicinity of the second mounting ring is shown.

[0048] Fig.12 yes Fig. 9 A-A line cross-section diagram.

[0049] Fig.13 It is an enlarged cross-sectional view of the vicinity of the edge peripheral wall of the elastic membrane according to another embodiment.

[0050] Fig.14 yes Fig.13 Bottom view of the elastic membrane is shown.

[0051] Fig.15 It is an enlarged cross-sectional view of the vicinity of the edge peripheral wall of the elastic membrane according to still another embodiment.

[0052] Fig.16 It is a schematic diagram showing an enlarged view of an edge peripheral wall of an elastic membrane according to still another embodiment.

[0053] Explanation of symbols

[0054] 1 Substrate holding device (polishing head)

[0055] 2 head body

[0056] 3 retaining ring

[0057] 10 Elastic membrane (diaphragm)

[0058] 11 Butt part

[0059] 16a, 16b, 16c, 16d Pressure chamber

[0060] 18 Grinding device

[0061] 19 Abrasive pad

[0062] 27 Head shaft

[0063] 30, 31, 32 Inner wall

[0064] 30a, 31a, 32a Inner peripheral wall body

[0065] 30b, 31b, 32b Inner peripheral wall lip

[0066] 30c, 31c, 32c Sealing protrusions

[0067] 32d Lateral internal protrusion

[0068] 32d', 32d” longitudinal internal protrusions

[0069] 33 Edge wall

[0070] 33a Edge wall body

[0071] 33b Lip of edge wall

[0072] 33c Sealing protrusion

[0073] 33e Lateral edge protrusion

[0074] 33e', 33e” longitudinal edge protrusions

[0075] 40 Control device

[0076] 45 Internal mounting ring (internal mounting part)

[0077] 47 Edge mounting ring (edge ​​mounting component)

[0078] 54, 55 Seal recess

[0079] 60 First recess

[0080] 61 Second recess

[0081] 62 Third recess

[0082] 63 Fourth recess DETAILED DESCRIPTION

[0083] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0084] Figure 1 1 is a diagram showing a grinding device according to one embodiment. Figure 1As shown, the polishing apparatus includes a polishing table 18 supporting a polishing pad 19, and a substrate holding device 1 for holding a wafer W as an example of a substrate and pressing the wafer W against the polishing pad 19 on the polishing table 18. In the following description, the substrate holding device 1 is referred to as a "polishing head 1".

[0085] The grinding table 18 is connected to a device motor 29 disposed below the grinding table 18 via a device shaft 18a and can rotate around the device shaft 18a. A grinding pad 19 is attached to the upper surface of the grinding table 18, and a surface 19a of the grinding pad 19 constitutes a grinding surface for grinding the wafer W. A grinding liquid supply nozzle 25 is provided above the grinding table 18, and a grinding liquid Q is supplied to the grinding pad 19 on the grinding table 18 through the grinding liquid supply nozzle 25.

[0086] The grinding head 1 includes a head body 2 for pressing the wafer W against the grinding surface 19a, and a retaining ring 3 for holding the wafer W so that the wafer W does not fly out of the grinding head 1. The grinding head 1 is connected to a head shaft 27, and the head shaft 27 moves up and down relative to the head arm 64 through an up and down movement mechanism 81. The grinding head 1 is lifted and lowered as a whole relative to the head arm 64 and positioned by the up and down movement of the head shaft 27. A swivel joint 82 is installed at the upper end of the head shaft 27.

[0087] The up-and-down movement mechanism 81 for moving the head shaft 27 and the grinding head 1 up and down comprises: a bridge member 84 rotatably supporting the head shaft 27 via a bearing 83, a ball screw 88 mounted on the bridge member 84, a support platform 85 supported by a support column 86, and a servo motor 90 provided on the support platform 85. The support platform 85 supporting the servo motor 90 is fixed to the head arm 64 via the support column 86.

[0088] The ball screw 88 includes a screw shaft 88a connected to the servo motor 90 and a nut 88b screwed with the screw shaft 88a. The head shaft 27 moves up and down integrally with the bridge member 84. Therefore, when the servo motor 90 is driven, the bridge member 84 moves up and down through the ball screw 88, thereby causing the head shaft 27 and the grinding head 1 to move up and down.

[0089] The head shaft 27 is connected to the rotating cylinder 66 by a key (not shown). The rotating cylinder 66 is provided with a timing pulley 67 on its outer periphery. A head motor 68 is fixed to the head arm 64, and the timing pulley 67 is connected to a timing pulley 70 provided on the head motor 68 by means of a timing belt 69. Therefore, by driving the head motor 68 to rotate, the rotating cylinder 66 and the head shaft 27 are rotated integrally by means of the timing pulley 70, the timing belt 69 and the timing pulley 67, and the grinding head 1 is rotated. The head arm 64 is supported by an arm shaft 80 rotatably supported on a frame (not shown). The grinding device is provided with a control device 40, and the control device 40 controls each device in the device headed by the head motor 68 and the servo motor 90.

[0090] The polishing head 1 is configured to hold a wafer W on the lower surface of the polishing head 1. The head arm 64 is configured to be able to rotate about the arm shaft 80, and the polishing head 1 holding the wafer W on the lower surface is moved from the receiving position of the wafer W to the upper position of the polishing table 18 by the rotation of the head arm 64.

[0091] The polishing of the wafer W is performed as follows. The polishing head 1 and the polishing table 18 are rotated respectively, and the polishing liquid Q is supplied to the polishing pad 19 from the polishing liquid supply nozzle 25 provided above the polishing table 18. In this state, the polishing head 1 is lowered to a predetermined position (predetermined height), and the wafer W is pressed against the polishing surface 19a of the polishing pad 19 at this predetermined position. The wafer W is in sliding contact with the polishing surface 19a of the polishing pad 19, thereby polishing the surface of the wafer W.

[0092] Next, refer to Figure 2 An example of the structure of the polishing head 1 will be described. Figure 2 1 is a schematic cross-sectional view of a polishing head (substrate holding device) 1 according to one embodiment. Figure 2 As shown, the polishing head 1 has a structure for placing the wafer W on the polishing surface 19a (see Figure 1 ) is pressed by the head body 2, and the retaining ring 3 is arranged around the wafer W. The retaining ring 3 is connected to the head body 2, and the head body 2 and the retaining ring 3 are configured to rotate integrally by the rotation of the head shaft 27. In addition, the head body 2 and the retaining ring 3 are configured to rotate integrally by the vertical movement mechanism 81 (refer to Figure 1 ) operates to move up and down integrally with the head shaft 27. The head body 2 is formed of a resin such as engineering plastic (eg, PEEK).

[0093] The retainer ring 3 is arranged to surround the elastic film 10 fixed to the head body 2 and the wafer W held by the head body 2 via the elastic film 10. The retainer ring 3 holds the wafer W so that the wafer W does not fly out of the polishing head 1 during polishing.

[0094] An elastic film 10 is fixed to the lower surface of the head body 2 so as to contact the back surface (i.e., the surface opposite to the surface to be polished) of the wafer W. The lower surface of the elastic film 10 constitutes a substrate holding surface 10a. The elastic film 10 has a plurality of ( Figure 2 There are four (4) annular peripheral walls 30, 31, 32, and 33, and these peripheral walls 30 to 33 are arranged concentrically.

[0095] In this embodiment, the polishing head 1 has two mounting parts 45 and 47 for fixing the elastic membrane 10 to the head body 2. The two mounting parts 45 and 47 are mounting rings having a substantially annular shape, and in the following description, the mounting part 45 is sometimes referred to as a "first mounting ring 45" and the mounting part 47 is sometimes referred to as a "second mounting ring 47".

[0096] The upper ends of the peripheral walls 30 to 33 are fixed to the lower surface of the head body 2 by means of two mounting rings 45 and 47. More specifically, the upper ends of the peripheral walls 30 and 31 are fixed to the lower surface of the head body 2 by means of the first mounting ring 45, and the upper ends of the peripheral walls 32 and 33 are fixed to the lower surface of the head body 2 by means of the second mounting ring 47. These mounting rings 45 and 47 can be detachably fixed to the head body 2 by means of fasteners such as screws (not shown). Therefore, when the fasteners are released, the mounting rings 45 and 47 are separated from the head body 2, and the elastic membrane 10 can be removed from the head body 2.

[0097] Four pressure chambers are formed between the elastic membrane 10 and the head body 2 by the peripheral walls 30 to 33, namely, a circular central pressure chamber 16a located in the center, an annular edge pressure chamber 16d located at the outermost periphery, and intermediate pressure chambers 16b and 16c located between the central pressure chamber 16a and the edge pressure chamber 16d.

[0098] These pressure chambers 16a to 16d are connected to the pressure regulating device 65 via the rotary joint 82, and fluid (for example, air) is supplied through the fluid lines 73 extending from the pressure regulating device 65 to each of the pressure chambers 16a to 16d. The pressure regulating device 65 is connected to the control device 40, and the pressures in the four pressure chambers 16a to 16d can be independently adjusted.

[0099] In addition, the pressure regulating device 65 may also form a negative pressure in the pressure chambers 16a to 16d. In this way, in the polishing head 1, by adjusting the pressure of the fluid supplied to each pressure chamber 16a to 16d formed between the head body 2 and the elastic membrane 10, the pressing force applied to the wafer W can be adjusted for each region of the wafer W.

[0100] The elastic membrane 10 is formed of a soft rubber material having excellent strength and durability, such as ethylene propylene diene rubber (EPDM), polyurethane rubber, and silicone rubber. Such an elastic membrane 10 is not only flexible but also has high viscosity. Each pressure chamber 16a to 16d is also connected to an atmosphere opening mechanism (not shown), and the pressure chambers 16a to 16d can also be opened to the atmosphere.

[0101] Next, Figure 2 The elastic membrane 10 shown is described in more detail. Figure 3 Yes means Figure 2 FIG. 1 is an enlarged cross-sectional view of a portion of the elastic membrane 10 shown. More specifically, Figure 3 A schematic cross section of a half of the elastic membrane 10 divided by a vertical plane including the central axis CL of the elastic membrane 10 is shown. Figure 4 yes Figure 2 The enlarged cross-sectional view of the vicinity of the second mounting ring 47 (ie, the vicinity of the peripheral edge wall described later) is shown.

[0102] Figure 3 The elastic film 10 shown has a circular contact portion 11 that contacts the back surface of the wafer W, and four annular peripheral walls 30 to 33 connected to the contact portion 11. The contact portion 11 contacts the back surface of the wafer W and presses the wafer W against the polishing pad 19. That is, the lower surface of the contact portion 11 functions as the substrate holding surface 10a. The annular peripheral walls 30 to 33 extend upward from the upper surface of the contact portion 11.

[0103] The peripheral wall 33 is the outermost peripheral wall, and extends upward from the peripheral end of the abutment portion 11. In this specification, the peripheral wall 33 is referred to as the "edge peripheral wall 33". In addition, in this specification, the peripheral wall arranged radially inside the edge peripheral wall 33 is referred to as the inner peripheral wall. Figure 3 In the example shown, three peripheral walls 30, 31, and 32 are configured as inner peripheral walls. In the following description, the peripheral wall 30 is sometimes referred to as the "first inner peripheral wall 30", the peripheral wall 31 is sometimes referred to as the "second inner peripheral wall 31", and the peripheral wall 32 is sometimes referred to as the "third inner peripheral wall 32". In addition, the number of inner peripheral walls is not limited to the example shown in the figure. For example, the elastic membrane 10 may have the edge peripheral wall 33 and one inner peripheral wall, or may have the edge peripheral wall 33 and two or more inner peripheral walls. Alternatively, the elastic membrane 10 may have no inner peripheral wall and only have the edge peripheral wall 33.

[0104] The peripheral wall 33 has a peripheral wall body 33a extending from the abutting portion 11, and a peripheral wall lip 33b connected to the peripheral wall body 33a. Figure 3 In the example shown, the edge wall body 33a extends upward from the abutment portion 11 in the vertical direction, and the edge wall lip 33b extends from the top of the edge wall body 33a in the horizontal direction. The edge wall body 33a extends in an annular shape around the central axis CL (that is, around the entire circumference of the abutment portion 11), and the edge wall lip 33b is formed in a flange shape over the entire circumference of the edge wall body 33a. A sealing protrusion 33c is provided on the lower surface of the edge wall lip 33b. The sealing protrusion 33c is formed on the lower surface of the top end of the edge wall lip 33b, and is formed in an annular shape over the entire circumference of the edge wall lip 33b.

[0105] In addition, the edge wall 33 may also have a baffle 33d extending from the connection point between the edge wall body 33a and the edge wall lip 33b. The baffle 33d extends over the entire circumference of the edge wall 33. The baffle 33d has a baffle body 145 with an inverted U-shaped cross section and a baffle lip 146 extending horizontally from the top of the baffle body 145. The baffle lip 146 is sandwiched between the head body 2 and the baffle ring 3 (see Figure 4 ).

[0106] like Figure 4As shown, the edge wall lip 33b is a part of the edge wall 33 sandwiched between the second mounting ring 47 and the head body 2. Therefore, the edge wall lip 33b is formed on the upper part of the edge wall 33 except the baffle 33d. In other words, the edge wall lip 33b is connected to the upper end of the edge wall body 33a. When the second mounting ring 47 is fixed to the head body 2 by fasteners such as screws (not shown) in a state where the edge wall lip 33b is sandwiched between the head body 2 and the second mounting ring 47, the edge wall 33 is fixed to the head body 2. Therefore, the second mounting ring 47 functions as an edge mounting component for fixing the edge wall 33 to the head body 10.

[0107] The second mounting ring 47 is provided with a sealing recess 55 into which the sealing protrusion 33c is inserted. The sealing recess 55 is formed over the entire circumference of the second mounting ring 47 corresponding to the sealing protrusion 33c. When the peripheral edge wall 33 is mounted on the head body 2, the sealing protrusion 33c is inserted into the sealing recess 55. In this state, when the second mounting ring 47 is mounted on the head body 2 using a fastener (not shown), the sealing protrusion 33c is pressed against the sealing recess 55, thereby sealing the gap between the second mounting ring 47 and the peripheral edge wall lip 33b.

[0108] The third inner peripheral wall 32 also includes a third inner peripheral wall body 32a extending from the contact portion 11, and a third inner peripheral wall lip 32b connected to the third inner peripheral wall body 32a. The third inner peripheral wall body 32a also extends in an annular shape around the central axis CL, and the third inner peripheral wall lip 32b is formed in a flange shape over the entire circumference of the third inner peripheral wall body 32a. The third inner peripheral wall body 32a is composed of an inclined portion 130 extending radially inwardly and obliquely upward from the contact portion 11, a horizontal portion 131 connected to the inclined portion 130 and extending radially inwardly, and a vertical portion 132 connected to the horizontal portion 131 and extending vertically from the horizontal portion 131. The third inner peripheral wall lip 32b is connected to the top end of the vertical portion 132 of the third inner peripheral wall body 32a, and extends in a horizontal direction from the top end to the radial outside. The third inner peripheral wall 32 also includes a sealing protrusion 32c formed in an annular shape over the entire circumference of the third inner peripheral wall lip 32b.

[0109] The third inner peripheral wall lip 32b is a part of the third inner peripheral wall 32 sandwiched between the second mounting ring 47 and the head body 2, and is formed on the upper part of the third inner peripheral wall 32. In other words, the third inner peripheral wall lip 32b is connected to the top of the third inner peripheral wall body 32a. The second mounting ring 47 functions as an edge mounting component relative to the above-mentioned edge peripheral wall 33, and functions as an internal mounting component for fixing the third inner peripheral wall 32 to the head body 2 relative to the third inner peripheral wall 32. For this purpose, the second mounting ring 47 also has a sealing recess 54 formed corresponding to the sealing protrusion 32c of the third inner peripheral wall 32. The sealing recess 54 is formed over the entire circumference of the second mounting ring 47. When the second mounting ring 47 is mounted on the head body 2 by a fastener not shown in the figure, the third inner peripheral wall lip 32b is sandwiched between the head body 2 and the second mounting ring 47, thereby fixing the third inner peripheral wall 32 to the head body 2. Furthermore, the sealing protrusion 32 c of the third inner peripheral wall 32 is pressed against the sealing recess 54 , thereby sealing the gap between the second mounting ring 47 and the third inner peripheral wall lip portion 32 b .

[0110] like Figure 3 As shown, the first inner peripheral wall 30 has the same shape as the third inner peripheral wall 32, and the second inner peripheral wall 31 is different from the third inner peripheral wall 32 in that the second inner peripheral wall lip 31b does not extend radially outward but radially inward. Specifically, the first inner peripheral wall 30 has a first inner peripheral wall body 30a extending upward from the abutment portion 11, and a first inner peripheral wall lip 30b connected to the first inner peripheral wall body 30a, and the second inner peripheral wall 31 has a second inner peripheral wall body 31a extending upward from the abutment portion 11, and a second inner peripheral wall lip 31b connected to the second inner peripheral wall body 31a. The first inner peripheral wall body 30a and the second inner peripheral wall body 31a extend in an annular shape around the central axis CL. The first inner peripheral wall lip 30b is formed in a flange shape over the entire circumference of the first inner peripheral wall body 30a, and the second inner peripheral wall lip 31b is formed in a flange shape over the entire circumference of the second inner peripheral wall body 31a.

[0111] The first inner peripheral wall body 30a is composed of an inclined portion 110 extending radially inwardly and obliquely upwardly from the contact portion 11, a horizontal portion 111 connected to the inclined portion 110 and extending radially inwardly, and a vertical portion 112 connected to the horizontal portion 111 and extending vertically from the horizontal portion 111. The second inner peripheral wall body 31a is composed of an inclined portion 120 extending radially inwardly and obliquely upwardly from the contact portion 11, a horizontal portion 121 connected to the inclined portion 120 and extending radially inwardly, and a vertical portion 122 connected to the horizontal portion 121 and extending vertically from the horizontal portion 121.

[0112] Furthermore, the first inner peripheral wall 30 has a sealing protrusion 30 c formed in an annular shape over the entire circumference of the first inner peripheral wall lip 30 b , and the second inner peripheral wall 31 has a sealing protrusion 31 c formed in an annular shape over the entire circumference of the second inner peripheral wall lip 31 b .

[0113] The first mounting ring 45 functions as an internal mounting member for mounting the first inner peripheral wall 30 and the second inner peripheral wall 31 to the head body 2 (see Figure 2 ). The first mounting ring 45 also has two sealing recesses for respectively fitting the sealing protrusion 30c of the first inner peripheral wall 30 and the sealing protrusion 31c of the second inner peripheral wall 31. These sealing recesses are also formed over the entire circumference of the first mounting ring 45. When the first mounting ring 45 is fixed to the head body 2 by a fastener not shown in the figure, the first inner peripheral wall lip 30b and the second inner peripheral wall lip 31b are sandwiched between the head body 2 and the first mounting ring 45, thereby fixing the first inner peripheral wall 30 and the second inner peripheral wall 31 to the head body 2. In addition, the sealing protrusion 30c of the first inner peripheral wall 30 is pressed against the sealing recess on one side, and at the same time, the sealing protrusion 31c of the second inner peripheral wall 31 is pressed against the sealing recess on the other side. As a result, the gap between the first mounting ring 45 and the first inner peripheral wall lip 30b is sealed, and at the same time, the gap between the first mounting ring 45 and the second inner peripheral wall lip 31b is sealed.

[0114] As described above, the elastic membrane 10 is not only flexible but also highly sticky. Therefore, when the elastic membrane 10 is fixed to the head body 2 by means of the mounting rings 45 and 47, a portion (or a plurality of portions) of the peripheral walls 30 to 33 of the elastic membrane 10 may be in close contact with the head body 2 and / or the mounting rings 45 and 47. In this case, other portions may be stretched by the in close contact portion of the elastic membrane 10, causing deviation in the circumferential deformation of the elastic membrane 10. In particular, when the edge peripheral wall 33 located at the outermost peripheral portion of the elastic membrane 10 is in close contact with the head body 2 and / or the second mounting ring 47, the deviation in the circumferential deformation of the elastic membrane 10 becomes greater.

[0115] Therefore, in the present embodiment, at least a portion of the surface of the peripheral wall lip portion 33 b is roughened so that the peripheral wall lip portion 33 b of the peripheral wall 33 can move smoothly relative to the head body 2 and / or the second mounting ring 47 . Figure 5 FIG. 1 is a diagram showing the roughened surface of the edge peripheral wall lip 33b of the elastic membrane 10. Figure 5 In FIG. 1 , the roughened surface of the edge peripheral wall lip portion 33 b is depicted with a thick line.

[0116] In this specification, "surface roughening" means forming a plurality of protrusions and / or a plurality of recesses on the surface. The protrusions and / or recesses may be arranged regularly on the surface, or may be arranged irregularly (or randomly) on the surface. The shape of the protrusions and the shape of the recesses are arbitrary, for example, they may be hemispherical, conical, pyramidal, cylindrical, prism-shaped, etc. The height of the protrusions (i.e., the distance from the surface to the uppermost part of the protrusions), and the depth of the recesses (i.e., the distance from the surface to the lowermost part of the recesses) are also arbitrary. For example, the protrusions may be fine protrusions having a height of about 10 μm, and similarly, the recesses may be fine recesses having a depth of about 10 μm.

[0117] The method for roughening the surface of the elastic film 10 is also arbitrary. For example, the surface of the elastic film 10 to be roughened may be subjected to various surface treatments such as sandblasting, wet sandblasting, or roughening using a tool such as a brush.

[0118] However, the elastic film 10 is generally formed by hardening the rubber material that flows into the molding die. For this purpose, the inner surface of the molding die corresponding to the surface of the elastic film 10 to be roughened may be subjected to the above-mentioned surface treatment such as sandblasting. In this case, the elastic film 10 having the roughened surface formed at the desired position can be obtained by simply removing the elastic film 10 from the molding die. That is, the elastic film 10 having the roughened surface at the desired position can be manufactured inexpensively and easily. In one embodiment, the inner surface of the molding die corresponding to the surface of the elastic film 10 to be roughened may be subjected to the so-called "wrinkling process".

[0119] exist Figure 5 In the example shown, the entire surface of the peripheral wall lip 33b is roughened. That is, the entire surface of the peripheral wall lip 33b including the upper surface, the lower surface, and the connecting surface connecting the upper surface and the lower surface is roughened. Since the sealing protrusion 33c is provided on the lower surface of the peripheral wall lip 33b, the surface of the sealing protrusion 33c is also roughened.

[0120] In one embodiment, the surface of the peripheral wall lip 33b may be roughened instead of the entire surface thereof. Instead, at least a portion of the surface of the peripheral wall lip 33b may be roughened. For example, only the upper surface or the lower surface of the peripheral wall lip 33b may be roughened. Alternatively, only the upper surface of the peripheral wall lip 33b and the lower surface excluding the sealing protrusion 33c may be roughened.

[0121] By roughening the edge peripheral wall lip 33b, the contact area of ​​the edge peripheral wall lip 33b with the head body 2 and / or the contact area of ​​the edge peripheral wall lip 33b with the second mounting ring 47 is reduced compared to the case where the edge peripheral wall lip 33b is a flat surface without irregularities. As a result, even if the elastic film 10 has high viscosity, it is possible to suppress the edge peripheral wall lip 33b from adhering to the head body 2 and / or the second mounting ring 47. Therefore, since the edge peripheral wall lip 33b can be smoothly and easily moved relative to the head body 2 and / or the second mounting ring 47, it is possible to suppress the deviation of the deformation of the elastic film 10 in the circumferential direction and to easily fix the elastic film 10 to the head body 2.

[0122] exist Figure 5 In the embodiment shown, the surface of the edge peripheral wall lip portion 33b is roughened, but the present invention is not limited to this embodiment. Hereinafter, an embodiment of the elastic membrane 10 in which not only the surface of the edge peripheral wall lip portion 33b but also the surface of other portions is roughened will be described. The structure not particularly described is the same as that of the above embodiment, and therefore, its repeated description will be omitted.

[0123] Figure 6 FIG. 2 is a diagram showing a roughened surface of an elastic film 10 according to another embodiment. Figure 6 The roughened surface of the elastic film 10 is also indicated by a thick line.

[0124] exist Figure 6 In the example shown, not only the entire surface of the peripheral wall lip portion 33b is roughened, but also the inner peripheral surface of the peripheral wall body 33a is roughened. The inner peripheral surface of the peripheral wall body 33a is a surface that contacts or may contact the outer peripheral surface of the second mounting ring 47 when the elastic membrane 10 is mounted on the head body 2. Therefore, by also roughening the inner peripheral surface of the peripheral wall body 33a, it is possible to suppress the peripheral wall body 33a from being in close contact with the second mounting ring 47. As a result, the peripheral wall body 33a can be smoothly and easily moved relative to the second mounting ring 47, so that not only the deviation of the deformation of the elastic membrane 10 in the circumferential direction can be suppressed, but also the elastic membrane 10 can be easily fixed to the head body 2.

[0125] like Figure 6 As shown, the third inner peripheral wall lip 32b of the third inner peripheral wall 32 may also be roughened. Figure 6In the example shown, the surface of the third inner peripheral wall lip 32b is roughened as a whole. In one embodiment, the surface of the third inner peripheral wall lip 32b may not be roughened as a whole, but at least a portion of the surface of the third inner peripheral wall lip 32b may be roughened. For example, only the upper surface or the lower surface of the third inner peripheral wall lip 32b may be roughened, or the upper surface of the third inner peripheral wall lip 32b and the lower surface excluding the sealing protrusion 32c may be roughened.

[0126] In addition, the inner and outer peripheral surfaces of the vertical portion 132 of the third inner peripheral wall body 32a may be roughened. The inner peripheral surface of the vertical portion 132 of the third inner peripheral wall body 32a is a surface that contacts the head body 2 when the elastic membrane 10 is mounted on the head body 2, or a surface that may contact the head body 2 when the elastic membrane 10 is mounted on the head body 2. The outer peripheral surface of the vertical portion 132 of the third inner peripheral wall body 32a is a surface that contacts the second mounting ring 47 when the elastic membrane 10 is mounted on the head body 2, or a surface that may contact the second mounting ring 47 when the elastic membrane 10 is mounted on the head body 2. Therefore, by also roughening the inner and outer peripheral surfaces of the third inner peripheral wall body 32a, it is possible to suppress the third inner peripheral wall body 32a from being in close contact with the head body 2 and the second mounting ring 47. As a result, the third inner peripheral wall body 32 a can be smoothly and easily moved relative to the head body 2 and the second mounting ring 47 , thereby suppressing the variation in the circumferential deformation of the elastic membrane 10 and easily fixing the elastic membrane 10 to the head body 2 .

[0127] Figure 7 FIG. 2 is a diagram showing a roughened surface of an elastic film 10 according to another embodiment. Figure 7 The roughened surface of the elastic film 10 is also indicated by a thick line.

[0128] exist Figure 7 In the example shown, not only the entire surface of the edge peripheral wall lip 33b and the entire surface of the third inner peripheral wall lip 32b are roughened, but also the entire surface of the first inner peripheral wall lip 30b and the entire surface of the second inner peripheral wall lip 31b are roughened. In the example shown, the surfaces of the first inner peripheral wall lip 30b, the second inner peripheral wall lip 31b, and the third inner peripheral wall lip 32b are roughened, respectively, but the present invention is not limited to this embodiment. For example, any one or two surfaces of the first inner peripheral wall lip 30b, the second inner peripheral wall lip 31b, and the third inner peripheral wall lip 32b may be roughened. In addition, similar to the above-mentioned edge peripheral wall lip 33b and the third inner peripheral wall lip 32b, at least a portion of the first inner peripheral wall lip 30b and at least a portion of the second inner peripheral wall lip 31b may be roughened.

[0129] according to Figure 7 In the example shown, the first inner peripheral wall lip 30b and the second inner peripheral wall lip 31b can be smoothly and easily moved relative to the head body 2 and / or the first mounting ring 45. Therefore, the deviation of the deformation of the elastic membrane 10 in the circumferential direction can be further suppressed, and the elastic membrane 10 can be more easily fixed to the head body 2.

[0130] like Figure 7 As shown by the bold double-dashed line in FIG. 3 , the inner and outer circumferential surfaces of the vertical portion 112 of the first inner circumferential wall body 30a can be roughened, and the inner and outer circumferential surfaces of the vertical portion 122 of the second inner circumferential wall body 31a can be roughened. In addition, the inner circumferential surface of the edge circumferential wall body 33a of the edge circumferential wall 33 can be roughened, and the inner and outer circumferential surfaces of the vertical portion 132 of the third circumferential wall body 32a can be roughened.

[0131] The inner circumferential surface of the vertical portion 112 of the first inner circumferential wall body 30a and the outer circumferential surface of the vertical portion 122 of the second inner circumferential wall body 31a are surfaces that come into contact with the head body 2 when the elastic membrane 10 is mounted on the head body 2, or surfaces that may come into contact with the head body 2 when the elastic membrane 10 is mounted on the head body 2. The outer circumferential surface of the vertical portion 112 of the first inner circumferential wall body 30a and the inner circumferential surface of the vertical portion 122 of the second inner circumferential wall body 31a are surfaces that come into contact with the first mounting ring 45 when the elastic membrane 10 is mounted on the head body 2, or surfaces that may come into contact with the first mounting ring 45 when the elastic membrane 10 is mounted on the head body 2. Therefore, by roughening the inner circumferential surface and the outer circumferential surface of the vertical portion 112 of the first inner circumferential wall body 30a and the inner circumferential surface and the outer circumferential surface of the vertical portion 122 of the second inner circumferential wall body 31a, it is possible to suppress the first inner circumferential wall body 30a and the second inner circumferential wall body 31a from being in close contact with the head body 2 and the first mounting ring 45. As a result, the first inner circumferential wall body 30a and the second inner circumferential wall body 31a can be smoothly and easily moved relative to the head body 2 and the first mounting ring 45, thereby further suppressing the deviation of the circumferential deformation of the elastic membrane 10 and making it easier to mount the elastic membrane 10 on the head body 2.

[0132] Figure 8 FIG. 2 is a diagram showing a roughened surface of an elastic film 10 according to another embodiment. Figure 8 In FIG. 1 , the roughened surface of the elastic film 10 is also indicated by a thick line. Figure 8In the example shown, the surface of the elastic membrane 10 is roughened as a whole. With such a structure, since the elastic membrane 10 can be smoothly and easily moved relative to the head body 2 and the mounting rings 45 and 47, the deviation of the deformation of the elastic membrane 10 in the circumferential direction can be suppressed, and the elastic membrane 10 can be easily fixed to the head body 2. In addition, since the surface of the elastic membrane 10 is roughened as a whole, the surface treatment of the elastic membrane 10 is easy, and the elastic membrane 10 can be manufactured at a low cost. For example, since the inner surface of the molding die of the elastic membrane 10 only needs to be subjected to a surface treatment such as sandblasting, wet sandblasting, or roughening treatment using a tool such as a brush, the molding die can be easily manufactured, and the molding die and the elastic membrane 10 can be manufactured at a low cost.

[0133] In addition, the surface of the first mounting ring 45 and / or the second mounting ring 47 may be covered with a friction-reducing film. In this specification, "friction-reducing film" is a general term for a film formed of a low-friction material, and "low-friction material" refers to a material having a smaller friction coefficient with respect to the elastic film 10 than the material of the mounting rings 45 and 47 (mounting components) and the material of the head body 2. The low-friction material is not particularly limited as long as the friction coefficient with respect to the elastic film 10 is smaller than that of the material of the mounting components 45 and 47 and the head body 2, and is, for example, a fluororesin such as Teflon (registered trademark).

[0134] Such a friction reducing film may be formed on the entire surface of the mounting rings 45 and 47, or may be formed only on the surface in contact with the elastic membrane 10 or the surface that may come into contact with the elastic membrane 10. The friction reducing film can effectively reduce the tight contact between the elastic membrane 10, the mounting rings 45 and 47, and the head body 2, thereby making it possible for the lips 30b, 31b, 32b, and 33b of the elastic membrane 10 to move more smoothly and easily relative to the mounting rings 45 and 47.

[0135] In the above-mentioned embodiment, a part or a plurality of parts of the surface of the elastic membrane 10 are roughened, or the entire surface of the elastic membrane 10 is roughened, so as to reduce the contact area between the elastic membrane 10 and the head body 2 and / or the contact area between the elastic membrane 10 and the mounting rings 45 and 47. Thus, the elastic membrane 10 can be smoothly moved relative to the head body 2 and the mounting rings 45 and 47. However, the same effect can be obtained by roughening the surface of the mounting rings 45 and 47 facing the elastic membrane 10 and / or the surface of the head body 2.

[0136] Specifically, replace Figure 5 to Figure 7In the figure, the parts of the elastic membrane 10 indicated by the thick solid line and the two-dot chain line are not roughened, but the surfaces of the mounting rings 45 and 47 and the surface of the head body 2 opposite to these parts are roughened. In this case, the surface of the elastic membrane 10 is a flat surface without protrusions and / or recesses as a whole. The roughening of the surfaces of the mounting rings 45 and 47 and / or the surface of the head body 2 is performed by, for example, sandblasting, wet sandblasting, or roughening using a tool such as a brush. In one embodiment, the surfaces of the mounting rings 45 and 47 and the surface of the head body 2 may be roughened by corrugation.

[0137] Next, refer to Fig. 9 Another example of the structure of the polishing head 1 will be described. Fig. 9 It is a schematic cross-sectional view of a polishing head (substrate holding device) 1 according to another embodiment. Fig.10 Yes means Fig. 9 More specifically, Fig.10 A schematic cross section of a half of the elastic membrane 10 divided by a vertical plane including the central axis CL of the elastic membrane 10 is shown. Fig.11 yes Fig. 9 An enlarged cross-sectional view of the vicinity of the second mounting ring is shown, Fig.12 yes Fig. 9 The structure of this embodiment which is not particularly described is the same as that of the above-described embodiment, and the repeated description thereof will be omitted.

[0138] In this embodiment, the edge peripheral wall lip portion 33b of the edge peripheral wall 33 has a plurality of edge peripheral wall protrusions 33e protruding radially inward from its top end (inner peripheral end). Fig.12 As shown in FIG. 1 , the edge wall lip 33b of the present embodiment has six edge wall protrusions 33e arranged at equal intervals along the circumferential direction of the edge wall 33. Each edge wall protrusion 33e is Fig.12 The horizontal cross section shown has an arc shape and protrudes horizontally from the top of the edge lip 33b radially inward of the edge 33. In the following description, the radially protruding edge protrusion 33e of the edge lip 33b is sometimes referred to as a "lateral edge protrusion 33e".

[0139] like Fig.11 and Fig.12 As shown, the second mounting ring 47 has a plurality of (in Fig.12 The recesses 60 are six in number. These recesses 60 have a shape corresponding to the lateral edge protrusions 33e and are arranged at equal intervals along the circumferential direction of the second mounting ring 47.

[0140] When the elastic membrane 10 is fixed to the head body 2 via the mounting rings 45 and 47, the lateral edge protrusions 33e provided on the lip portion 33b of the circumferential edge wall 33 are fitted into the recessed portion 60 formed in the second mounting ring 47. In this state, the second mounting ring 47 is fixed to the head body 2 by a fastener such as a screw (not shown), thereby fixing the circumferential edge wall 33 to the head body 2. That is, the circumferential edge wall 33 is fixed to the head body 2 via the second mounting ring 47 in a state where the plurality of lateral edge protrusions 33e arranged along the circumferential direction of the circumferential edge wall 33 are fitted into the recessed portion 60 formed in the second mounting ring 47. Therefore, the circumferential edge wall 33 can be fixed to the head body 2 while suppressing the deformation of the circumferential direction of the circumferential edge wall 33 to a minimum.

[0141] Furthermore, when the elastic membrane 10 is fixed to the head body 2 via the mounting rings 45 and 47, the plurality of peripheral edge wall protrusions 33e act to guide the second mounting ring 47. Therefore, the elastic membrane 10 can be easily mounted on the head body 2. In order to easily insert the lateral edge protrusions 33e into the recessed portion 60, the lateral edge protrusions 33e preferably have a tapered shape whose cross-sectional area decreases toward the top end thereof.

[0142] exist Fig.11 and Fig.12 In the example shown, there are six lateral edge protrusions 33e and six recesses 60 corresponding to these lateral edge protrusions 33e, but the number of lateral edge protrusions 33e and the number of recesses 60 are not limited to this example. The number of lateral edge protrusions 33e and the number of recesses 60 can be arbitrary as long as they are arranged at equal intervals in the circumferential direction of the edge peripheral wall 33. Preferably, the number of lateral edge protrusions 33e and the number of recesses 60 are in the range of 2 to 8. In addition, the lateral edge protrusions 33e are arranged at equal intervals in the circumferential direction of the edge peripheral wall 33. Fig.11 The vertical cross section shown has a conical shape. Fig.12 The horizontal cross section shown in the figure has an arc shape, but the shape of the lateral edge protrusion 33e is not limited to this example. For example, the lateral edge protrusion 33e can also have a rectangular parallelepiped shape or a triangular shape when viewed in a vertical cross section. Preferably, the lateral edge protrusion 33e is rotationally symmetrical with the central axis CL as the symmetry axis (see Fig.12 ).

[0143] like Fig.10 and Fig.11 As shown, the third inner peripheral wall lip 32b of the third inner peripheral wall 32 may also have a plurality of inner peripheral wall protrusions 32d protruding horizontally from its top end (outer peripheral end) radially outward of the inner peripheral wall 33. In the following description, the inner peripheral wall protrusions 32d protruding radially of the third inner peripheral wall 32 are sometimes referred to as "lateral inner protrusions 32d".

[0144] The third inner peripheral wall lip 32b involved in this embodiment has a plurality of lateral inner protrusions 32d arranged at equal intervals along the circumference of the third inner peripheral wall 32. The number of lateral inner protrusions 32d is arbitrary as long as it is arranged at equal intervals in the circumference of the third inner peripheral wall 32, similarly to the lateral edge protrusions 33e, and is preferably in the range of 2 to 8. In addition, the shape of the lateral inner protrusion 32d is also arbitrary as well as the lateral edge protrusion 33e. Preferably, the lateral inner protrusion 32d has a cone whose cross-sectional area decreases toward its top. Preferably, the lateral inner protrusion 32d is rotationally symmetric with the central axis CL as the axis of symmetry.

[0145] The second mounting ring 47 has a plurality of recesses 62 formed corresponding to the lateral inner protrusions 32d. When the elastic membrane 10 is fixed to the head body 2 by means of the mounting rings 45 and 47, the plurality of lateral inner protrusions 32d arranged along the circumference of the third inner peripheral wall 32 are embedded in the recesses 62 formed in the second mounting ring 47. In this state, the third inner peripheral wall 32 is fixed to the head body 2 by means of the second mounting ring 47.

[0146] Since the elastic membrane 10 has not only the lateral edge protrusion 33 e of the edge peripheral wall lip 33 b but also the lateral inner protrusion 32 d of the third inner peripheral wall lip 32 b , the deviation of the deformation of the elastic membrane 10 in the circumferential direction can be effectively suppressed.

[0147] In addition, if Fig.10 As shown by the dot-dash line, the first inner circumferential wall lip 30b of the first inner circumferential wall 30 and the second inner circumferential wall lip 31b of the second inner circumferential wall 31 may also have a plurality of lateral inner protrusions 30d and 31d protruding radially from the top end thereof. The lateral inner protrusion 30d of the first inner circumferential wall lip 30b protrudes radially outward and horizontally from the top end of the first inner circumferential wall lip 30b, and the lateral inner protrusion 31d of the second inner circumferential wall lip 31b protrudes radially inward and horizontally from the top end of the second inner circumferential wall lip 31b. The lateral inner protrusion 30d of the first inner circumferential wall lip 30b has the same structure as the lateral inner protrusion 32d of the third inner circumferential wall lip 32b. The lateral inner protrusion 31d of the second inner circumferential wall lip 31b has the same structure as the lateral inner protrusion 32d of the third inner circumferential wall lip 32b, except that the protrusion direction is different from that of the lateral inner protrusion 32d of the third inner circumferential wall lip 32b.

[0148] The first mounting ring 45 has a plurality of recesses formed corresponding to the lateral inner protrusions 30d of the first inner peripheral wall lip 30b, and a plurality of recesses formed corresponding to the lateral inner protrusions 31d of the second inner peripheral wall lip 31b. When the elastic membrane 10 is fixed to the head body 2 via the mounting rings 45 and 47, the plurality of lateral inner protrusions 30d arranged along the circumference of the first inner peripheral wall 30 and the plurality of lateral inner protrusions 31d arranged along the circumference of the second inner peripheral wall 31 are respectively fitted into the plurality of recesses formed in the first mounting ring 45. In this state, the first inner peripheral wall 30 and the second inner peripheral wall 31 are fixed to the head body 2 via the first mounting ring 45.

[0149] In this way, not only the edge peripheral wall lip 33b, but also the first inner peripheral wall lip 30b, the second inner peripheral wall lip 31b, and the third inner peripheral wall lip 32b may each have a lateral inner protrusion 30d, 31d, 32d. In one embodiment, any one or two of the first inner peripheral wall lip 30b, the second inner peripheral wall lip 31b, and the third inner peripheral wall lip 32b may have a lateral inner protrusion. With such a structure, the deviation of the deformation of the elastic membrane 10 in the circumferential direction can be more effectively suppressed. In addition, the lateral inner protrusion 30d of the first inner peripheral wall lip 30b and the lateral inner protrusion 31d of the second inner peripheral wall lip 31b act to guide relative to the first mounting ring 45, so that the elastic membrane 10 can be more easily fixed to the head body 2.

[0150] Fig.13 It is an enlarged cross-sectional view of the vicinity of the edge peripheral wall 33 of the elastic membrane 10 according to another embodiment. Fig.14 yes Fig.13 The bottom view of the elastic membrane 10 is shown. Fig.14 In the drawing, the lip portions 30b to 33b of the peripheral walls 30 to 33 are extracted and drawn. The structures not particularly described are the same as those in the above-mentioned embodiment, and thus their repeated description is omitted.

[0151] Fig.13 and Fig.14 The edge peripheral wall lip 33b of the edge peripheral wall 33 shown in the figure has a plurality of (at Fig.14 In the following description, the edge protrusion 33e' that protrudes downward from the lower surface of the edge peripheral wall lip 33b is sometimes referred to as a "longitudinal edge protrusion 33e'".

[0152] A plurality of longitudinal edge protrusions 33e' are arranged at equal intervals in the radial direction of the edge peripheral wall 33. The second mounting ring 47 has a plurality of recesses 60 formed corresponding to the plurality of longitudinal edge protrusions 33e'. The number of longitudinal edge protrusions 33e' and the number of recesses 60 are arbitrary, as long as they are arranged at equal intervals in the circumferential direction of the edge peripheral wall 33, similar to the lateral edge protrusions 33e, and are preferably in the range of 2 to 8. In addition, the shape of the longitudinal edge protrusion 33e' is also arbitrary, similar to the lateral edge protrusion 33e. Preferably, the longitudinal edge protrusion 33e' has a tapered shape whose cross-sectional area decreases toward its top end (see Fig.13 ), has an arc shape when observed in horizontal cross section (refer to Fig.14 ) In addition, it is preferred that the plurality of longitudinal edge protrusions 33e' are rotationally symmetric with the central axis CL as an axis of symmetry.

[0153] In the present embodiment, the plurality of longitudinal edge protrusions 33e' arranged along the circumferential direction of the edge peripheral wall 33 are also fixed to the head body 2 by means of the second mounting ring 47 while being fitted into the recessed portion 60 formed in the second mounting ring 47. Therefore, the edge peripheral wall 33 can be fixed to the head body 2 while suppressing the deformation of the edge peripheral wall 33 in the circumferential direction to a minimum. In addition, when the elastic membrane 10 is fixed to the head body 2 by means of the mounting rings 45 and 47, the plurality of longitudinal edge protrusions 33e' guide the second mounting ring 47. Therefore, the elastic membrane 10 can be easily mounted on the head body 2. In this way, the edge peripheral wall protrusions may protrude downward from the lower surface of the edge peripheral wall lip 33b like the longitudinal edge protrusions 33e'.

[0154] like Fig.13 and Fig.14 As shown, the third inner peripheral wall lip 32b of the third inner peripheral wall 32 may also have a plurality of (at Fig.14 In the following description, the inner protrusions 32d' that protrude downward from the lower surface of the third inner peripheral wall lip 32b are sometimes referred to as "vertical inner protrusions 32d'".

[0155] A plurality of longitudinal internal protrusions 32d' are arranged at equal intervals along the circumferential direction of the third inner peripheral wall 32. The second mounting ring 47 has a plurality of recesses 62 formed corresponding to the plurality of longitudinal internal protrusions 32d'. The number of the longitudinal internal protrusions 32d' and the number of the recesses 62 are also arbitrary, as long as they are arranged at equal intervals in the circumferential direction of the third inner peripheral wall 32, similar to the longitudinal edge protrusions 33e', and are preferably in the range of 2 to 8. In addition, the shape of the longitudinal internal protrusions 32d' is also arbitrary, similar to the longitudinal edge protrusions 33e'. Preferably, the longitudinal internal protrusions 32d' have a tapered shape whose cross-sectional area decreases toward its top end (see Fig.13), has an arc shape when observed in horizontal cross section (refer to Fig.14 ) In addition, it is preferred that the plurality of longitudinal inner protrusions 32d' are rotationally symmetrical with the central axis CL as an axis of symmetry.

[0156] like Fig.14 As shown by the dotted lines, the first inner circumferential wall lip 30b of the first inner circumferential wall 30 and the second inner circumferential wall lip 31b of the second inner circumferential wall 31 may also have a plurality of longitudinal inner protrusions 30d', 31d' protruding downward from the lower surface thereof. The longitudinal inner protrusion 30d' of the first inner circumferential wall lip 30b and the longitudinal inner protrusion 31d' of the second inner circumferential wall lip 31b have the same structure as the longitudinal inner protrusion 32d' of the third inner circumferential wall lip 32b. Although not shown in the figure, the first mounting ring 45 has a plurality of recesses formed corresponding to the longitudinal inner protrusion 30d' of the first inner circumferential wall lip 30b and a plurality of recesses formed corresponding to the longitudinal inner protrusion 31d' of the second inner circumferential wall lip 31b.

[0157] In this way, not only the edge peripheral wall lip 33b, but also the first inner peripheral wall lip 30b, the second inner peripheral wall lip 31b and the third inner peripheral wall lip 32b may each have a longitudinal inner protrusion 30d', 31d', 32d'. In one embodiment, any one or two of the first inner peripheral wall lip 30b, the second inner peripheral wall lip 31b and the third inner peripheral wall lip 32b may have a longitudinal inner protrusion. With such a structure, the deviation of the deformation of the elastic membrane 10 in the circumferential direction can be more effectively suppressed. In addition, the longitudinal inner protrusion 30d' of the first inner peripheral wall lip 30b and the longitudinal inner protrusion 31d' of the second inner peripheral wall lip 31b act to guide relative to the first mounting ring 45, so that the elastic membrane 10 can be more easily fixed to the head body 2.

[0158] Fig.15 FIG. 1 is an enlarged cross-sectional view of the vicinity of the edge peripheral wall 33 of the elastic membrane 10 according to yet another embodiment. Fig.13 and Fig.14 The embodiments shown are the same, so repeated descriptions thereof are omitted.

[0159] Fig.15 The edge wall lip 33b of the edge wall 33 shown has a plurality of longitudinal edge protrusions 33e" protruding upward from its upper surface. In the present embodiment, the plurality of longitudinal edge protrusions 33e" are also arranged at equal intervals along the circumference of the edge wall 33. The head body 2 has a plurality of recesses 61 formed corresponding to the longitudinal edge protrusions 33e".

[0160] In the present embodiment, the edge wall 33 is fixed to the head body 2 by means of a second mounting ring 47 while a plurality of longitudinal edge protrusions 33e" arranged along the circumference of the edge wall 33 are embedded in a recess 61 formed in the head body 2. In this case, the edge wall 33 can be fixed to the head body 2 while minimizing the circumferential deformation of the edge wall 33. In addition, when the elastic membrane 10 is fixed to the head body 2 by means of the mounting rings 45, 47, the plurality of longitudinal edge protrusions 33e" act to guide the head body 2. Therefore, the elastic membrane 10 can be easily mounted on the head body 2. In this way, the edge wall protrusions may protrude upward from the upper surface of the edge wall lip 33b like the longitudinal edge protrusions 33e".

[0161] like Fig.15 As shown, the third inner circumferential wall lip 32b of the third inner circumferential wall 32 may also have a longitudinal inner protrusion 32d" protruding from its upper surface, and the head body 2 has a plurality of recesses 63 formed corresponding to the longitudinal inner protrusion 32d". Although not shown in the figure, the first inner circumferential wall lip 30b of the first inner circumferential wall 30 and the second inner circumferential wall lip 31b of the second inner circumferential wall 31 may also respectively have a longitudinal inner protrusion protruding from its upper surface. In this case, the head body 2 has a plurality of recesses formed corresponding to the longitudinal inner protrusion of the first inner circumferential wall lip 30b and the longitudinal inner protrusion of the second inner circumferential wall lip 31b. In one embodiment, any one or two of the first inner circumferential wall lip 30b, the second inner circumferential wall lip 31b, and the third inner circumferential wall lip 32b may have a longitudinal inner protrusion.

[0162] Such a structure can also effectively suppress the deviation of the deformation of the elastic membrane 10 in the circumferential direction. In addition, the longitudinal inner protrusions of the first inner peripheral wall lip 30b and the longitudinal inner protrusions of the second inner peripheral wall lip 31b also guide the head body 2, so that the elastic membrane 10 can be easily fixed to the head body 2.

[0163] Fig.16 1 is a schematic diagram showing an enlarged view of the peripheral edge wall 33 of the elastic membrane 10 according to still another embodiment. The structure of this embodiment which is not particularly described is the same as that of the above-described embodiment, and thus a repeated description thereof will be omitted.

[0164] Fig.16 The edge wall 33 shown in the figure has an edge wall body 33a extending obliquely upward from the peripheral end of the abutting portion 11, and an edge wall lip 33b extending from the top of the edge wall body 33a. In the above-mentioned embodiment, the edge wall body 33a extends upward in the vertical direction from the peripheral end of the abutting portion 11, but the present invention is not limited to these embodiments. The shape of the edge wall body 33a is arbitrary, for example, it can also be as follows Fig.16 Extending obliquely upward as shown.

[0165] also, Fig.16 The edge wall lip 33b of the edge wall 33 shown in the figure has an edge protrusion 33e" protruding upward from its upper surface. Fig.16 As shown by the dotted line, the edge lip 33b may have an edge protrusion 33e' protruding downward from the lower surface of the edge lip 33b, or may have a lateral edge protrusion 33e protruding radially from the top of the edge lip 33b.

[0166] Although not shown in the figure, the shapes of the inner peripheral wall bodies 30a, 31a, 32a of the inner peripheral walls 30, 31, 32 are also arbitrary, and may be as follows: Fig.16 Like the edge peripheral wall 33 shown in the figure, it extends obliquely upward from the contact portion 11. In addition, the shapes of the inner peripheral wall bodies 30a, 31a, 32a of the inner peripheral walls 30, 31, 32 may be the same as or different from each other.

[0167] In the above-mentioned embodiment, the edge wall lip 33b of the edge wall 33 has any one of the lateral edge protrusion 33e, the longitudinal edge protrusion 33e', and the longitudinal edge protrusion 33e", but the present invention is not limited to these embodiments. For example, the edge wall lip 33b can have two of the lateral edge protrusion 33e, the longitudinal edge protrusion 33e', and the longitudinal edge protrusion 33e", or can have all of these protrusions 33e, 33e', and 33e". Similarly, each inner wall lip 30b~32b can have a lateral inner protrusion protruding radially from the top of each inner wall lip 30b~32b, a longitudinal inner protrusion protruding from the upper surface of each inner wall lip 30b~32b, and two of the longitudinal inner protrusions protruding from the lower surface of each inner wall lip 30b~32b, or can have all of these protrusions.

[0168] The above-mentioned embodiments are recorded for the purpose of enabling the present invention to be implemented by persons with common knowledge in the technical field described in the present invention. Various modifications of the above-mentioned embodiments can be made by persons skilled in the art, and the technical concept of the present invention is also applicable to other embodiments. Therefore, the present invention is not limited to the described embodiments, but should be interpreted as the broadest scope of the technical concept defined by the scope of the claim for protection.

Claims

1. An elastic membrane for a substrate holding device, characterized in that: have: an abutting portion that abuts against a substrate to press the substrate against the polishing pad; and an edge peripheral wall extending from a peripheral end portion of the abutting portion, The edge peripheral wall has an edge peripheral wall lip portion at the upper portion thereof, and the edge peripheral wall lip portion is sandwiched between the head body of the substrate holding device and an edge mounting component for fixing the edge peripheral wall to the head body. The edge peripheral wall lip has a plurality of edge peripheral wall protrusions, and the edge peripheral wall protrusions are engaged with the first recess formed in the edge mounting member and / or the second recess formed in the head body. The edge wall protrusions are arranged at equal intervals along the circumference of the edge wall. The edge wall protrusion is a lateral edge protrusion protruding from the top end of the edge wall lip toward the radial direction of the edge wall.

2. The elastic membrane according to claim 1, characterized in that The device further comprises at least one inner peripheral wall, which is arranged radially inward of the edge peripheral wall and extends from the abutment portion. An inner peripheral wall lip is provided at the upper portion of the inner peripheral wall, and the inner peripheral wall lip is sandwiched between the head body and an internal mounting component for fixing the inner peripheral wall to the head body. The inner peripheral wall lip has a plurality of inner peripheral wall protrusions, and the inner peripheral wall protrusions are engaged with the third recess formed in the edge mounting member and / or the fourth recess formed in the head body. The inner peripheral wall protrusions are arranged at equal intervals along the circumferential direction of the inner peripheral wall.

3. The elastic membrane according to claim 2, characterized in that The inner peripheral wall protrusion is a longitudinal inner protrusion protruding from the upper surface or the lower surface of the inner peripheral wall lip.

4. The elastic film according to claim 2, characterized in that The inner peripheral wall protrusion is a lateral inner protrusion protruding from the top end of the inner peripheral wall lip toward the radial direction of the inner peripheral wall.

5. The elastic film according to claim 2, characterized in that Some of the inner peripheral wall protrusions are longitudinal inner protrusions protruding from the upper surface or the lower surface of the inner peripheral wall lip, The remaining inner peripheral wall protrusions among the inner peripheral wall protrusions are lateral inner protrusions that protrude from the top end of the inner peripheral wall lip toward the radial direction of the inner peripheral wall.

6. A substrate holding device, characterized in that: have: an elastic membrane forming at least one pressure chamber for pressing the substrate; a head body to which the elastic membrane is fixed; and at least one mounting member, the mounting member fixing the elastic membrane to the head body, The elastic film is the elastic film according to any one of claims 1 to 5.

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