Mask, mask device and mask design optimization method

Abstract

The present disclosure relates to a mask, a mask device and a mask design optimization method. The mask includes: a pattern area and a second rib located at the edge of the pattern area, the pattern area includes: a plurality of openings, adjacent openings are separated by a first rib; wherein at least one of the plurality of openings has a non-straight first side, two second sides intersecting the first side, and a third side located on the opposite side of the first side and intersecting the second side, an opening for compensating the tensile deformation of the first side is provided on the second rib, an extension line of the two second sides extending toward the second rib along a first direction intersects with the second rib to obtain a first area, the opening is at least located in the first area, the first direction is parallel to the second side, and a second direction perpendicular to the first direction is parallel to the third side.

Description

Technical Field

[0001] The present disclosure relates to the field of display element design and manufacturing, and in particular to a mask plate, a mask device and a mask plate design optimization method. Background Art

[0002] A special-shaped screen refers to a display screen with an irregular or asymmetrical display area, such as an asymmetric upper edge and lower edge of the display screen. In the manufacturing process of the special-shaped screen, a support mask with a corresponding special-shaped opening area is used in the related technology to deposit the luminescent material at the corresponding position of the substrate by evaporation. Summary of the invention

[0003] The inventors have discovered through research that the supporting mask plate in the related art is limited by the irregular shape of the opening area and the low manufacturing precision. When stretched and welded to the frame of the mask device, the irregular opening area on the supporting mask plate is prone to deviate from the designed position, resulting in reduced evaporation precision, which in turn leads to undesirable conditions such as mixed colors on the manufactured display screen.

[0004] In view of this, the embodiments of the present disclosure provide a mask, a mask device, and a mask design optimization method, which can reduce the uneven deformation of the opening area of ​​the mask when the mask is stretched.

[0005] In one aspect of the present disclosure, a mask is provided, comprising:

[0006] Pattern area, including:

[0007] a plurality of openings, adjacent openings being separated by a first rib; and

[0008] a second rib located at an edge of the pattern area;

[0009] Among them, at least one of the multiple openings has a first side, two second sides intersecting with the non-straight first side, and a third side located on the opposite side of the first side and intersecting with the second side, and an opening for compensating for tensile deformation of the first side is provided on the second rib, and an extension line of the two second sides extending toward the second rib along the first direction intersects with the second rib to obtain a first area, and the opening is at least located within the first area.

[0010] In some embodiments, the first direction is parallel to the second side, and a second direction perpendicular to the first direction is parallel to the third side.

[0011] In some embodiments, the multiple openings are distributed in an array, some or all of the openings in each column of openings have the first side extending approximately along a second direction, the second direction is parallel to the row direction of the array, and the openings are provided in the first area corresponding to each column of openings on the second rib.

[0012] In some embodiments, the multiple openings have the same shape and size, and the second side edges of the multiple openings are parallel to the first direction, the first direction is parallel to the column direction of the array, and the number, shape and size of the openings set in the first area of ​​the second rib corresponding to each column of openings are the same.

[0013] In some embodiments, the length of the first side in the second direction is less than the length of each of the second side and is equal to the length of the third side.

[0014] In some embodiments, the first side includes: two straight sections and a recessed section recessed toward the inner side of the opening relative to the straight sections, the two ends of the recessed section are respectively connected to the two straight sections, the opening is symmetrical relative to the center line of the recessed section, and the center line of the recessed section is parallel to the first direction.

[0015] In some embodiments, the recessed section is located in the middle of the first side.

[0016] In some embodiments, the recessed section is in a zigzag or arc shape.

[0017] In some embodiments, a length of the opening located at the second rib in the second direction is smaller than a length of the first side in the second direction, and is larger than a length of the recessed section in the second direction.

[0018] In some embodiments, the length of the opening located at the second rib in the second direction is 40-60 mm, and the length of the recessed section in the second direction is 3-35 mm.

[0019] In some embodiments, at least two openings corresponding to each column of openings on the second rib are arranged at intervals in the first direction.

[0020] In some embodiments, the width of the second rib in the first direction is 20-70 mm, the width of each opening in the first direction is 0.6-1 mm, and the width of the first rib in the first direction is 10-15 mm.

[0021] In some embodiments, the non-straight side includes: two straight sections and a recessed section recessed toward the inside of the opening relative to the straight sections, the two ends of the recessed section are respectively connected to the two straight sections, and the width of the recessed section in the first direction is 0.5 to 8 mm.

[0022] In some embodiments, the center distance between adjacent openings in the first direction is 4-8 mm.

[0023] In some embodiments, the opening is in a rectangular or crescent shape, and the convex direction of two arc sides of the crescent shape is opposite to the concave direction of the concave section.

[0024] In some embodiments, the opening is a through hole.

[0025] In some embodiments, an extending direction of the opening is substantially parallel to the second direction.

[0026] In some embodiments, the opening is also provided on the first rib connected to the first side edge, and the extension lines of the two second sides extending toward the first rib along the first direction intersect with the first rib to obtain a second area, and the opening is at least located in the second area.

[0027] In some embodiments, the number of the openings disposed on each of the first ribs connected to the first side edge is one.

[0028] In another aspect of the present disclosure, a mask device is provided, comprising:

[0029] Framework; and

[0030] The aforementioned mask is arranged on the frame.

[0031] In some embodiments, the mask device further comprises:

[0032] A fine mask plate is arranged on the frame;

[0033] Wherein, the mask is configured to support the fine mask.

[0034] In another aspect of the present disclosure, a method for optimizing the design of a mask is provided, comprising:

[0035] Selecting at least a portion of a layout design drawing of a mask to be optimized for modeling to obtain a mask model, wherein in the layout design drawing, the mask to be optimized includes a pattern area and a second rib located at an edge of the pattern area, the pattern area includes a plurality of openings, and adjacent openings are separated by a first rib;

[0036] Performing a stretching simulation on the mask model, and determining, according to the simulation result, an opening among the plurality of openings that satisfies a condition that a local relative offset of a side edge in a first direction exceeds a first preset threshold as a reference opening, wherein the first direction is a stretching direction during the stretching simulation;

[0037] An opening is provided on the second rib in the layout design diagram, an extension line of the side edge of the reference opening extending toward the second rib along the first direction intersects with the second rib to obtain a first area, and the opening is at least located in the first area.

[0038] In some embodiments, the design optimization method further includes:

[0039] If it is determined according to the simulation results that the local relative offset of the side of the reference opening exceeds a second preset threshold, and the second preset threshold is greater than the first preset threshold, an opening is also set on the first rib in the layout design diagram, and an extension line of the side of the reference opening along the first direction toward the first rib connected to the reference opening intersects with the first rib to obtain a second area, and the opening is at least located within the second area.

[0040] In some embodiments, the step of modeling includes:

[0041] Selecting 1 / 4 of the layout design drawing for modeling, wherein the 1 / 4 is cut from any corner point of the layout design drawing;

[0042] After optimizing the selected part of the layout design diagram, the method further includes:

[0043] According to the optimization method for the 1 / 4 portion, the 3 / 4 portion of the layout design drawing that has not been selected is optimized.

[0044] Therefore, according to the embodiment of the present disclosure, by providing an opening in the second rib corresponding to the opening having the first side, the stress distribution balance of the mask when subjected to actual stretching can be improved, thereby reducing the uneven deformation of the opening in the pattern area of ​​the mask when the mask is stretched. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] The accompanying drawings, which constitute a part of the specification, illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure.

[0046] The present disclosure may be more clearly understood from the following detailed description with reference to the accompanying drawings, in which:

[0047] Figure 1 is a schematic diagram of a process flow of an embodiment of a method for optimizing the design of a mask disclosed in the present invention;

[0048] Figure 2 is an example of a layout design drawing of a mask to be optimized used in an embodiment of the mask design optimization method disclosed in the present invention;

[0049] Figure 3 Yes Figure 2 A schematic diagram showing modeling of the upper left 1 / 4 portion (within the dotted box) of the layout design example and performing stretching simulation;

[0050] Figure 4 is based on Figure 3 A deformation cloud diagram of the first rib between two adjacent opening areas of the corresponding mask model in the stretching direction after stretching simulation;

[0051] Figure 5 is a schematic diagram of providing an opening on the second rib according to an embodiment of the design optimization method of the mask disclosed in the present invention;

[0052] Figure 6 yes Figure 5 The enlarged image of the area selected by the ellipse in the middle;

[0053] Figure 7 It is a schematic diagram comparing the deformation curves of the first rib of the mask model before and after optimization during the stretching simulation;

[0054] Figure 8 and Fig. 9 Schematic diagrams of the warping deformation of the mask before optimization and the mask after optimization when stretched and welded to the frame;

[0055] Fig.10 is a flow chart of another embodiment of the mask design optimization method disclosed in the present invention;

[0056] Fig.11 It is a schematic diagram of modeling a part of another mask layout design example and performing a stretching simulation;

[0057] Fig.12 yes Fig.11 The enlarged image of the area selected by the ellipse in the middle;

[0058] Fig.13 is a schematic diagram of a planar structure of an embodiment of a mask device disclosed in the present invention;

[0059] Fig.14 FIG. 4 is a schematic diagram of a planar structure of another embodiment of a mask device according to the present disclosure.

[0060] It should be understood that the size of each part shown in the accompanying drawings is not drawn according to the actual proportional relationship. In addition, the same or similar reference numerals represent the same or similar components. DETAILED DESCRIPTION

[0061] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. The description of the exemplary embodiments is merely illustrative and is in no way intended to limit the present disclosure and its application or use. The present disclosure can be implemented in many different forms and is not limited to the embodiments described herein. These embodiments are provided to make the present disclosure thorough and complete and to fully express the scope of the present disclosure to those skilled in the art. It should be noted that unless otherwise specifically stated, the relative arrangement of the components and steps, the composition of the materials, the numerical expressions and the numerical values ​​set forth in these embodiments should be interpreted as being merely exemplary and not as limiting.

[0062] The words "first", "second" and similar words used in this disclosure do not indicate any order, quantity or importance, but are only used to distinguish different parts. The words "include" or "comprise" and similar words mean that the elements before the word include the elements listed after the word, and do not exclude the possibility of including other elements. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0063] In the present disclosure, when a specific device is described as being located between a first device and a second device, there may or may not be an intermediate device between the specific device and the first device or the second device. When a specific device is described as being connected to other devices, the specific device may be directly connected to the other device without an intermediate device, or may not be directly connected to the other device but have an intermediate device.

[0064] All terms (including technical terms or scientific terms) used in the present disclosure have the same meanings as those understood by ordinary technicians in the field to which the present disclosure belongs, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries, such as general dictionaries, should be interpreted as having meanings consistent with their meanings in the context of the relevant technology, and should not be interpreted in an idealized or extremely formal sense, unless explicitly defined herein.

[0065] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered as part of the specification.

[0066] In the production process of organic light-emitting diode (OLED) panels, the mask device for vacuum evaporation is a crucial component. The quality of the mask device directly affects the production cost and product quality. In some related technologies, the mask device for evaporation may include a frame, a supporting mask plate and a fine metal mask plate, and the supporting mask plate and the fine metal mask plate are welded to the frame in sequence. When the opening area of ​​the supporting mask plate exceeds a certain offset from the designed position, the organic light-emitting materials evaporated by the adjacent supporting metal mask plates and the fine metal mask plates will produce color interference when emitting light, resulting in adverse conditions such as color mixing when the manufactured display device displays.

[0067] The manufacture of special-shaped screens requires the use of a support mask with a special-shaped opening area, and this support mask needs to be stretched and welded to the frame so that the fine metal mask can be welded later. Under the action of the tensile force, the support mask is limited by the irregular shape and low manufacturing precision. When stretched and welded to the frame, the special-shaped opening area on the special-shaped mask is easy to deviate from the designed position, resulting in reduced evaporation precision, resulting in poor display color mixing of the manufactured display device, and even affecting the yield of the entire batch of products.

[0068] In view of this, the embodiments of the present disclosure provide a mask, a mask device, and a mask design optimization method, which can reduce the uneven deformation of the opening area of ​​the mask when the mask is stretched.

[0069] Figure 1 It is a flow chart of an embodiment of the mask design optimization method disclosed in the present invention. Figure 2 This is an example of a layout design drawing of a mask to be optimized used in an embodiment of the mask design optimization method disclosed in the present invention. Figure 3 Yes Figure 2 Schematic diagram of modeling the upper left 1 / 4 part (in the dotted box) of the layout design drawing example and performing stretching simulation. Figure 4 is based on Figure 3 Deformation cloud diagram of the first rib between two adjacent opening areas of the corresponding mask model in the stretching direction after stretching simulation.

[0070] refer to Figure 1 In some embodiments, the mask design optimization method includes steps S100 to S300.

[0071] In step S100, at least a portion of the layout design drawing of the mask to be optimized is selected for modeling to obtain a mask model. Figure 2The example of the layout design diagram is shown, in which the mask 20 to be optimized may include a pattern area and a second rib 23 located at the edge of the pattern area. The pattern area includes a plurality of openings 21 , and adjacent openings 21 are separated by first ribs 22 .

[0072] exist Figure 2 In the embodiment, a plurality of openings 21 can be arranged in sequence along mutually perpendicular x-axis and y-axis, respectively, to form an array of openings. The size and shape of the openings 21 can be designed as required. For the support mask, the shape and size of the openings 21 can be consistent with the actual display area of ​​the display device. For example, for a mobile terminal with a sensor element disposed in the top area of ​​the display screen, the opening can be designed to have an inwardly protruding portion adapted to the shape of the display screen, and the protruding portion corresponds to the arrangement area of ​​the sensor element.

[0073] When optimizing the design of the mask, the overall layout design of the mask to be optimized can be modeled to obtain the mask model. In some embodiments, if the layout design is relatively symmetrical, a part of the layout design can be selected for modeling to obtain the mask model, thereby reducing the amount of data during model calculation and improving efficiency.

[0074] exist Figure 2 In the embodiment, the shapes and sizes of the plurality of openings 21 are the same or substantially the same, and are distributed at equal intervals along the x-axis and the y-axis. Accordingly, in some embodiments, during the modeling process, a 1 / 4 portion of the layout design diagram may be selected (see Figure 2 The 1 / 4 portion is cut from any corner point of the layout design diagram.

[0075] Although the upper and lower edges of the opening 21 along the y-axis are asymmetric, the impact is relatively limited because the asymmetric size accounts for a very small proportion of the overall size of the opening 21. In this way, the layout design diagram selected by the dotted line can be mirrored once or twice relative to the midline parallel to the x-axis and the midline parallel to the y-axis to approximately obtain the other 3 / 4 of the layout design diagram.

[0076] In step 200, a stretching simulation is performed on the established mask model, and a reference opening in the mask is determined according to the simulation result. The reference opening here refers to an opening that satisfies the condition that the local relative offset of the side in the first direction exceeds a first preset threshold value during the stretching simulation.

[0077] refer to Figure 3 , the first direction can be defined as the stretching direction during stretching simulation, that is Figure 3 The tensile force F in the tensile simulation can act on Figure 2On each pin 24 outside the edge of the middle mask, the direction of the tensile force F is the tensile direction, which is consistent with the y-axis direction.

[0078] by Figure 3 Taking the opening 21 in the figure as an example, the stretching direction is the y-axis direction. In this direction, if the local relative offset of the upper side or the lower side of the opening 21 exceeds the first preset threshold, the opening 21 can be defined as a reference opening. The local relative offset can be the offset of the local side itself relative to other parts during the stretching simulation. The first preset threshold can be set according to factors such as the material of the mask and the position of the opening area.

[0079] When simulating the stretching of the mask model, due to the uneven side edges or asymmetric upper and lower side edges of the opening 21, there are differences in the local relative offset amounts at different parts of the side edges. Figure 4 In the embodiment, the upper side of the opening 21 has a trapezoidal concave section that is concave inward. Figure 4 The deformation cloud diagram of the first rib between adjacent openings in the tensile direction is displayed in different grayscales. The deformation of the first rib portion A corresponding to the trapezoidal concave segment can reach 1.167e -1 ~1.333e -1 mm, while the deformation of the relatively straight parts on both sides of the trapezoidal concave section corresponding to the position B is 1.000e -1 ~1.167e -1 mm, which is less than the deformation at position A. It can be seen that the stress is concentrated on the position of the first rib corresponding to the trapezoidal concave section.

[0080] Figure 5 It is a schematic diagram of setting an opening on the second rib according to an embodiment of the design optimization method of the mask disclosed in the present invention. Figure 6 yes Figure 5 A magnified image of the area selected by the ellipse. Figure 7 It is a schematic diagram comparing the deformation curves of the first rib of the mask model before and after optimization during stretching simulation.

[0081] The concentration of stress causes deformation of the opening 21. In order to suppress the degree of such deformation, in step S300, an opening 25 may be provided on the second rib 23 in the layout design diagram. An extension line extending from the side of the reference opening along the first direction toward the second rib 23 intersects with the second rib 23 to obtain a first area E1, and the opening 25 is at least located in the first area E1.

[0082] In some embodiments, the opening is preferably a through hole that penetrates in the normal direction of the mask. The opening can be formed by etching. Making it into a through hole can reduce the difficulty of etching, reduce the complexity of the process, and can also reduce the local warping of the mask in the normal direction of the mask to a certain extent, and reduce the risk of foreign matter generated by friction between the warped part and the substrate. In other embodiments, the opening can also be a blind hole.

[0083] refer to Figure 5 and Figure 6 , an opening 25 may be provided on the second rib 23 corresponding to the opening 21 defined as the reference opening in the layout design drawing, thereby obtaining an optimized layout design drawing of the mask 20 ′.

[0084] The step of providing openings on the second rib 23 may include: providing a plurality of openings 25 in the first area E1, and the plurality of openings are arranged at intervals along the first direction. Figure 6 Each reference opening area may be provided with four openings 25 in the first area E1 along the y-axis direction. The number and spacing of the openings 25 may be adjusted and optimized multiple times according to the simulation results.

[0085] exist Figure 6 In the embodiment, the upper side of the opening 21 is a non-straight first side 26, and the two sides of the first side 26 respectively have two straight sections 26a. A recessed section 26b in the shape of a broken line is formed in the middle of the first side 26, and the two ends of the recessed section 26b are respectively connected to the two straight sections 26a. Figure 7 , Figure 7 The horizontal axis in is the different distances from one end to the other end of the side of the opening area, and the vertical axis is the deformation (i.e., offset) compared to the unstretched simulation state. The simulation results of the mask without opening 25 on the second rib (before optimization) and the mask with opening 25 (after optimization) are compared. Figure 7 It can be seen that the deformation amounts of the deformation curve D1 of the first rib before optimization and the deformation curve D2 of the first rib after optimization are relatively close at both ends, while the deformation amount of the concave section 26b is significantly different. The deformation amount of the concave section 26b in the middle of the first rib before optimization can reach more than 0.122mm, while the deformation amount of the convex 26b of the concave section of the first rib after optimization is reduced to 0.12mm.

[0086] In the above embodiment, by modeling and stretching simulation of the layout design drawing of the mask to be optimized, determining the reference opening with a larger local offset under the stretched state, and setting an opening in the first area on the second rib corresponding to the projection of the reference opening, the stress distribution balance of the mask when subjected to actual stretching can be improved, thereby reducing the uneven deformation of the opening of the mask when the mask is stretched, thereby reducing the degree to which the opening deviates from the design position and improving the evaporation accuracy.

[0087] For a mask whose opening is mirror-symmetrical in a second direction (eg, the x-axis direction) perpendicular to the first direction, reference Figure 6 In some embodiments, when the opening is provided on the second rib, it is preferred that the opening 25 is symmetrical with respect to the center line 25a of the recessed section 26b, and the center line 25a of the recessed section is parallel to the first direction. This can make the stress distribution of the mask more balanced when it is stretched. Figure 5 and Figure 6 In the embodiment, the shape of the opening is a rectangle. In other embodiments, the shape of the opening can also be other shapes, such as a crescent shape or an ellipse.

[0088] Figure 8 and Fig. 9 Figure 1 is a schematic diagram of the warping deformation of the mask before optimization and the mask after optimization when being stretched and welded to the frame.

[0089] refer to Figure 8 For the support mask, in order to reduce the sagging caused by high temperature and gravity, the support mask needs to be welded to the frame in a stretched state. After welding, the tension of the support mask acts on the frame. On the one hand, the frame can resist the elastic recovery of the mask after the tension is released, and on the other hand, the frame will deform and warp under the tension of the support mask. Figure 8 It can be seen that the frame supporting the mask before optimization will be warped significantly.

[0090] For the optimized mask, the second rib rigidity of the mask can be reduced by setting openings in the second rib, so that each part of the mask can reach the designed position under a smaller tensile force, thereby reducing the tensile force of the mask, and correspondingly reducing the tensile force of the mask on the frame, thereby reducing the warping of the frame after welding, which is conducive to further improving the evaporation accuracy. Fig. 9 It can be seen that after the optimized mask is stretched and welded to the frame, the warping deformation of the frame is compared with Figure 8 Somewhat alleviated.

[0091] Fig.10 It is a flow chart of another embodiment of the mask design optimization method according to the present disclosure. Fig.11 It is a schematic diagram of modeling a part of another mask layout design example and performing a stretching simulation. Fig.12 yes Fig.11 A magnified image of the area selected by the ellipse.

[0092] refer to Fig.10 , compared to Figure 1Embodiment, some embodiments of the design optimization method further include step S400. Step S400 can be performed before, after, and simultaneously with step S300. In step S400, if it is determined according to the simulation results that the local relative offset exceeds a second preset threshold, and the second preset threshold is greater than the first preset threshold, an opening 27 is also set on the first rib in the layout design diagram. The extension line of the first rib connected to the reference opening intersects with the first rib to obtain a second area E2. The opening 27 is at least located within the second area E2. In some embodiments, the opening is preferably a through hole that penetrates in the normal direction of the mask. In other embodiments, the opening may also be a blind hole.

[0093] For example, the first preset threshold of the local relative offset can be set to 0.006 mm, and the second preset threshold can be set to 0.008 mm. When the simulation result after the stretching simulation shows that the local relative offset exceeds 0.006 mm and is less than or equal to 0.008 mm, the corresponding opening can be determined as a reference opening, and an opening is set on the corresponding second rib. If the local relative offset exceeds 0.008 mm, an opening is set not only on the corresponding second rib, but also on the corresponding first rib. In some embodiments, if the simulation results of the mask show that the local relative offset of some openings meets different thresholds, the opening can be selectively set according to the local relative offset.

[0094] refer to Fig.11 and Fig.12 In some embodiments, the upper side of the opening 21' of the selected 1 / 4 mask is the first side 26', and the two sides of the first side 26' are respectively provided with two straight sections 26a'. A concave arc-shaped concave section 26b' is formed in the middle of the first side 26', and the two ends of the concave section 26b' are respectively connected to the two straight sections 26a'. Compared with the concave arc-shaped concave section 26b', the concave arc-shaped concave section 26b' is Figure 6 The middle broken line-shaped recessed section 26b is more likely to cause stress concentration on the first rib 22, thereby forming a more obvious local relative offset. In order to reduce the local relative offset, in addition to providing an opening on the second rib 23, an opening can also be provided on the first rib 22. The shape of the opening can be rectangular, crescent-shaped or semicircular.

[0095] For a mask with narrow first ribs 22 between adjacent openings 21', it is preferred to provide a single opening 27 on the second region of the first rib where the reference openings in the layout design are connected. The single opening 27 can cooperate with the opening 25' on the second rib 22 to improve the stress distribution balance of the mask when it is actually stretched, and on the other hand, it can avoid excessively weakening the rigidity of the first rib 22, so as to prevent it from being greatly deformed or warped when the mask is stretched.

[0096] exist Fig.11 and Fig.12 In the embodiment, a crescent-shaped opening 25' may be provided on the second rib 23. A crescent-shaped opening is a closed shape having two arc sides, and the convex direction of the two arc sides of the crescent is opposite to the concave direction of the concave section. In other words, the distance from the two ends of the crescent-shaped opening to the straight section of the first side is smaller than the distance from the middle of the crescent-shaped opening to the straight section. Figure 6 The opening 25 is shown as being rectangular.

[0097] In each embodiment of the above-mentioned mask design optimization method, if the mask model is modeled from a part of the layout design drawing, then based on the symmetry of the layout design drawing, other parts of the layout design drawing that are not selected can be optimized accordingly according to the optimization method for the selected part. Figure 2 As mentioned above, the selected part of the layout design (i.e., the 1 / 4 part selected by the dotted line) can be approximately obtained by one or two mirror images relative to the midline parallel to the x-axis and the midline parallel to the y-axis to obtain the other unselected parts. Therefore, when Figure 5 After the optimized part of the layout design drawing is selected, the optimization method can be extended to the entire layout design drawing to improve the efficiency of the optimization design, that is, the openings 25 are respectively set along the second rib in the first direction and along the second rib in the opposite direction of the first direction in all the openings 21. Similarly, the openings 27 set on the first rib can also be extended from the selected part of the layout design drawing to the unselected part.

[0098] Fig.13 FIG. 4 is a schematic diagram of a planar structure of a mask device according to an embodiment of the present disclosure.

[0099] refer to Fig.13 In some embodiments, the mask device includes: a frame 10 and a mask plate 20'. The mask plate 20' can be manufactured using the layout design drawing of the mask plate obtained by optimizing the design optimization method of the present disclosure. The mask plate 20' is set on the frame 10, for example, in a state where the mask plate 20' is stretched, a plurality of pins 24 outside the edge of the mask plate 20' are welded to the upper surface of the frame 10.

[0100] In some other embodiments, the mask device may further include a fine mask. The fine mask is disposed on the frame, and the mask 20' may be configured to support the fine mask, that is, the mask is a supporting mask. In addition to supporting the fine mask, the mask 20' may also shield a portion of the fine mask so that the evaporated material can be deposited on the corresponding display area on the substrate.

[0101] refer to Figure 5 , Figure 6 and Fig.13 In some embodiments, the mask includes: a pattern area and a second rib 23 located at the edge of the pattern area. The pattern area includes: a plurality of openings 21, and adjacent openings 21 are separated by a first rib 22. At least one opening 21 of the plurality of openings 21 has a first side 26, two second sides 21a intersecting the first side 26, and a third side 21b located on the opposite side of the first side 26 and intersecting the second side 21a.

[0102] The second rib 23 is provided with an opening 25 for compensating the stretching deformation of the first side 26. The extension line of the two second side edges 21a extending along the first direction toward the second rib 23 intersects with the second rib 23 to obtain a first area E1. The opening is at least located in the first area E1. The first direction is parallel to the second side edge 21a, and the second direction perpendicular to the first direction is parallel to the third side edge 21b. Here, the first direction can be the stretching direction during the stretching simulation in the embodiment of the design optimization method of the mask, that is, Fig.13 The y-axis direction in the Fig.13 The x-axis direction in .

[0103] In some embodiments, the opening 25 is preferably a through hole that penetrates in the normal direction of the mask. In other embodiments, the opening 25 may also be a blind hole. The opening 25 on the second rib 23 can improve the stress distribution balance of the mask when it is actually stretched, thereby reducing the uneven deformation of the pattern area of ​​the mask when the mask is stretched. In addition, the stiffness of the second rib of the mask can be reduced so that each part of the mask can reach the designed position under a smaller tensile force, thereby reducing the tensile force of the stretched mask, and correspondingly reducing the tensile force of the mask on the frame, thereby reducing the warping of the frame after welding is completed, which is conducive to further improving the evaporation accuracy.

[0104] exist Fig.13 In the embodiment, the plurality of openings 21 may be distributed in an array. All the openings 21 in each column of openings 21 (in other embodiments, some of the openings 21) have the first side 26 extending substantially along the second direction. The second direction is parallel to the row direction of the array, and the openings 25 are provided in the first area E1 corresponding to each column of openings 21 on the second rib 23.

[0105] The shapes and sizes of the plurality of openings 21 are the same, and the second side edges 21a of the plurality of openings 21 are parallel to the first direction, the first direction is parallel to the column direction of the array, and the number, shape and size of the openings arranged in the first area E1 corresponding to each column of openings 21 on the second rib 23 are the same. In this way, the stress at each position of the mask plate can be more balanced when it is actually stretched, and the uneven deformation degree of the openings of the mask plate can be reduced.

[0106] According to the shape of the display area of ​​the display device to be manufactured, in some embodiments, the length of the first side 26 in the second direction can be smaller than the length of each second side 21 a and equal to the length of the third side 21 b.

[0107] refer to Figure 6 In some embodiments, the first side 26 includes: two straight sections 26a and a recessed section 26b that is recessed toward the inner side of the opening 21 relative to the straight sections 26a. The two ends of the recessed section 26b are respectively connected to the two straight sections 26a, and the opening 25 is symmetrical relative to the center line 25a of the recessed section 26b, and the center line 25a of the recessed section 26b is parallel to the first direction. By making the opening 25 symmetrical relative to the center line 25a of the recessed section 26b, the opening 25 can more effectively reduce the local relative offset of the recessed section 26b.

[0108] According to the shape of the display area of ​​the display device to be manufactured, in some embodiments, the recessed section 26b may be located in the middle of the first side 26, and accordingly the opening 25 is also symmetrical with respect to the center line of the non-straight side 26. In other embodiments, the opening 25 may be straight, and its extending direction is substantially parallel to the second direction. For example, the shape of the opening is rectangular and parallel to the second direction.

[0109] exist Figure 6 In some embodiments, the recessed section 26b may be in a folded line shape. Fig.12 , the recessed section 26b' may be in an arc shape. When an opening is provided on the second rib 23 of the mask, it is preferred that the length of the opening 25 located on the second rib 23 in the second direction is less than the length of the first side 26 in the second direction, and is greater than the length of the recessed section 26b in the second direction. At this time, the opening 25 does not intersect with the extension line of the tensile force F, thereby avoiding obvious deformation of the opening 25 during stretching, and the opening 25 that is longer than the recessed section 26b can more effectively improve the influence of the recessed section 26b on the local relative offset. Specifically, the length of the opening located on the second rib 23 in the second direction may be 40 to 60 mm, and correspondingly, the length of the recessed section 26b in the second direction is 3 to 35 mm.

[0110] In order to more effectively improve the local relative offset of the opening and reduce the stiffness of the second rib, refer to Figure 6 In some embodiments, at least two openings corresponding to each column of openings 21 on the second rib 23 are arranged at intervals in the first direction, for example Figure 6 In some embodiments, the width of the second rib 23 in the first direction may be 20-70 mm, the width of the first rib 22 in the first direction may be 10-15 mm, and the width of the recessed section 26b in the first direction may be 0.5-8 mm.

[0111] Accordingly, the width and center spacing of each opening in the first direction can be determined based on the simulation data and the actual material position on the fine mask. Specifically, the width of each opening in the first direction can be set to 0.6 to 1 mm, and the center spacing of adjacent openings in the first direction can be set to 4 to 8 mm.

[0112] Fig.14 FIG. 4 is a schematic diagram of a planar structure of another embodiment of a mask device according to the present disclosure.

[0113] refer to Fig.14 and Fig.12 In some embodiments, the shape of the opening may also be a crescent shape, and the convex direction of the two arc sides of the crescent shape is opposite to the concave direction of the concave section. In other embodiments, the plurality of openings 25 provided in the first area E1 of the second rib 23 may include openings of two or more different shapes.

[0114] exist Fig.12 In the embodiment, the first side 26' has an arc-shaped concave section 26b', which is shorter in the second direction than the straight sections 26a' at both ends, so that its local relative offset is smaller than that of the concave section 26b'. Figure 6 The local relative offset of the broken line-shaped recessed section 26b is larger. Fig.12 , the opening 27 may also be provided on the first rib 22 connected to the first side 26. The extension line of the two second side edges 21a extending along the first direction toward the first rib 22 intersects with the first rib 22 to obtain a second area E2, and the opening 27 is at least located in the second area E2. The relevant size and position of the opening 27 can refer to the opening 25 located in the first area E1. The opening 27 can effectively improve the local relative offset of the recessed section 26b'.

[0115] In order to avoid excessively weakening the rigidity of the first rib 22 , it is preferred that the number of the openings provided on each of the first ribs 22 connected to the first side edge 26 is one.

[0116] The above-mentioned mask embodiments can be applied to the mask device, and the opening positions arranged on the first rib and the second rib of the mask correspond to the solid material area of ​​the fine mask to prevent excess material from leaking out of the evaporation material. Both the support mask and the fine mask can be made of metal.

[0117] So far, various embodiments of the present disclosure have been described in detail. In order to avoid obscuring the concept of the present disclosure, some details known in the art are not described. Based on the above description, those skilled in the art can fully understand how to implement the technical solution disclosed here.

[0118] Although some specific embodiments of the present disclosure have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present disclosure. It should be understood by those skilled in the art that the above embodiments may be modified or some technical features may be replaced by equivalents without departing from the scope and spirit of the present disclosure. The scope of the present disclosure is defined by the appended claims.

Claims

1. A mask, comprising: Pattern area, including: a plurality of openings, adjacent openings being separated by a first rib; and a second rib located at an edge of the pattern area; At least one of the plurality of openings has a non-straight first side, two second sides intersecting the first side, and a third side located on the opposite side of the first side and intersecting the second side, an opening for compensating for tensile deformation of the first side is provided on the second rib, and an extension line of the two second sides extending toward the second rib along the first direction intersects with the second rib to obtain a first area, and the opening is at least located in the first area; The first side includes: two straight sections and a recessed section recessed toward the inner side of the opening relative to the straight section, and both ends of the recessed section are respectively connected to the two straight sections; the length of the opening located on the second rib in the second direction is smaller than the length of the first side in the second direction, and larger than the length of the recessed section in the second direction.

2. The mask according to claim 1, wherein: The first direction is parallel to the second side, and a second direction perpendicular to the first direction is parallel to the third side.

3. The mask according to claim 1, wherein: The multiple openings are distributed in an array, and some or all of the openings in each column have the first side extending approximately along a second direction, the second direction is parallel to the row direction of the array, and the openings are provided in the first area corresponding to each column of openings on the second rib.

4. The mask according to claim 3, wherein: The shapes and sizes of the multiple openings are the same, and the second side edges of the multiple openings are parallel to the first direction, the first direction is parallel to the column direction of the array, and the number, shape and size of the openings arranged in the first area of ​​the second rib corresponding to each column of openings are the same.

5. The mask according to claim 3, wherein: The length of the first side in the second direction is smaller than the length of each of the second side and is equal to the length of the third side.

6. The mask according to claim 1, wherein: The opening is symmetrical with respect to a center line of the recessed section, and the center line of the recessed section is parallel to the first direction.

7. The mask according to claim 1, wherein: The recessed section is located in the middle of the first side.

8. The mask according to claim 1, wherein: The concave section is in a broken line shape or an arc shape.

9. The mask according to claim 1, wherein: The length of the opening located at the second rib in the second direction is 40-60 mm, and the length of the recessed section in the second direction is 3-35 mm.

10. The mask according to claim 3, wherein: At least two openings corresponding to each column of openings on the second rib are arranged at intervals in the first direction.

11. The mask according to claim 10, wherein: The width of the second rib in the first direction is 20-70 mm, the width of each opening in the first direction is 0.6-1 mm, and the width of the first rib in the first direction is 10-15 mm.

12. The mask according to claim 10, wherein: The width of the recessed section in the first direction is 0.5-8 mm.

13. The mask according to claim 10, wherein: The center distance between adjacent openings in the first direction is 4-8 mm.

14. The mask according to claim 1, wherein: The shape of the opening is rectangular or crescent-shaped, and the convex direction of the two arc edges of the crescent-shaped is opposite to the concave direction of the concave section.

15. The mask according to claim 1, wherein: The opening is a through hole.

16. The mask according to claim 3, wherein: An extending direction of the opening is substantially parallel to the second direction.

17. The mask according to any one of claims 1 to 16, wherein: The opening is also provided on the first rib connected to the first side edge, and the extension lines of the two second side edges extending toward the first rib along the first direction intersect with the first rib to obtain a second area, and the opening is at least located in the second area.

18. The mask according to claim 17, wherein: The number of the openings arranged on each of the first ribs connected to the first side edge is one.

19. A mask device, comprising: frame; and The mask according to any one of claims 1 to 18 is arranged on the frame.

20. The mask device according to claim 19, further comprising: A fine mask plate is arranged on the frame; Wherein, the mask is configured to support the fine mask.

21. A method for optimizing the design of a mask, comprising: Selecting at least part of a layout design drawing of a mask to be optimized for modeling to obtain a mask model, wherein in the layout design drawing, the mask to be optimized includes a pattern area and a second rib located at an edge of the pattern area, the pattern area includes a plurality of openings, adjacent openings are separated by a first rib, at least one of the plurality of openings has a non-straight first side, two second sides intersecting the first side, and a third side located on an opposite side of the first side and intersecting the second side, the first side includes: two straight sections and a concave section concave toward an inner side of the opening relative to the straight section, and two ends of the concave section are respectively connected to the two straight sections; Performing a stretching simulation on the mask model, and determining, according to the simulation result, an opening among the plurality of openings that satisfies a condition that a local relative offset of a side edge in a first direction exceeds a first preset threshold as a reference opening, wherein the first direction is a stretching direction during the stretching simulation; An opening is provided on the second rib in the layout design diagram, an extension line of the side edge of the reference opening extending toward the second rib along the first direction intersects with the second rib to obtain a first area, and the opening is at least located in the first area; Wherein, the length of the opening located at the second rib in the second direction is smaller than the length of the first side in the second direction, and is larger than the length of the recessed section in the second direction.

22. The design optimization method according to claim 21, further comprising: If it is determined according to the simulation results that the local relative offset of the side of the reference opening exceeds a second preset threshold, and the second preset threshold is greater than the first preset threshold, an opening is also set on the first rib in the layout design diagram, and an extension line of the side of the reference opening along the first direction toward the first rib connected to the reference opening intersects with the first rib to obtain a second area, and the opening is at least located within the second area.

23. The design optimization method according to claim 21 or 22, wherein: The modeling steps include: Selecting 1 / 4 of the layout design drawing for modeling, wherein the 1 / 4 is cut from any corner point of the layout design drawing; After optimizing the selected part of the layout design diagram, the method further includes: According to the optimization method for the 1 / 4 portion, the 3 / 4 portion of the layout design drawing that has not been selected is optimized.

Images