A method and system for laser chemical etching grayscale step structure products

Abstract

The present invention relates to a method and system for laser chemical etching of products with grayscale stepped structures. The method comprises processing a glass surface with a laser to obtain a primary processed product; and chemically etching the primary processed product to obtain a product with a grayscale stepped structure. The present invention uses a laser to form a pattern on the glass surface, altering the physical and chemical properties of the glass surface and underlying materials, and then chemically etching the product with an alkaline etching solution, thereby producing the product with a grayscale stepped structure. This method enables the efficient preparation of optical microdevices with grayscale stepped structures.

Description

Technical Field

[0001] The present invention relates to a glass processing method, and more particularly to a method and a system for processing grayscale stepped structure products using laser chemical etching. Background Art

[0002] Glass is an important chemically stable amorphous, brittle, transparent material widely used in consumer electronics and biomedicine. Due to its chemical stability and brittleness, glass is particularly well-suited for laser micromachining. There are two main processing methods: dry methods for direct material removal, such as cutting, drilling, and surface engraving, which achieve high-quality and efficient processing. Wet methods involve laser-induced chemical etching. Due to the high toxicity of HF (hydrofluoric acid) solutions, current chemical etching solutions primarily utilize low-toxic alkaline solutions. Laser-treated glass exhibits a significantly higher corrosion rate than untreated glass.

[0003] Currently, dry laser processing is generally used to prepare optical microdevices with grayscale step structures, such as surface microlens arrays. However, in order to achieve continuous structural changes in the processing of gradient step structures, the motion control of the laser beam requires very high requirements and the efficiency is low.

[0004] Therefore, it is necessary to design a new method to efficiently prepare optical microdevices with grayscale step structures. Summary of the Invention

[0005] The purpose of the present invention is to overcome the defects of the prior art and provide a method and system for laser chemical etching of grayscale stepped structure products.

[0006] To achieve the above-mentioned object, the present invention adopts the following technical solution: a method for laser chemical etching a grayscale stepped structure product, comprising:

[0007] Use laser to process the glass surface to obtain the primary processed product;

[0008] Chemical etching is applied to the pre-processed product to obtain a product with a grayscale stepped structure.

[0009] A further technical solution is: the process of processing the glass surface with laser to obtain a primary processed product includes:

[0010] An ultraviolet laser beam is used to process the desired pattern on the glass surface to obtain a primary processed product.

[0011] A further technical solution is: the wavelength of the ultraviolet laser beam is 343nm to 355nm, or the wavelength of the ultraviolet laser beam is 266mm, or the wavelength of the ultraviolet laser beam is 213mm.

[0012] A further technical solution is: the pulse width of the ultraviolet laser beam is 250fs to 950fs, or the pulse width of the ultraviolet laser beam is not greater than 15ps, or the pulse width of the ultraviolet laser beam is not greater than 10ns.

[0013] A further technical solution is: chemically etching the pre-processed product to obtain a product with a grayscale stepped structure, comprising:

[0014] An alkaline etching solution is used to chemically etch the pattern of the primary processed product to obtain a product with a grayscale stepped structure.

[0015] Its further technical solution is: the alkaline corrosive liquid is a KOH aqueous solution.

[0016] Its further technical solution is: the corrosion temperature of the alkaline corrosive solution is 97°C.

[0017] The present invention also provides a system for laser chemical etching to process grayscale step structure products. The system is suitable for the above-mentioned method of laser chemical etching to process grayscale step structure products, including a chemical etching tank, a laser, a processing component and a mobile machine. The processing component and the laser are respectively located on the mobile machine, the laser is connected to the processing component, and the chemical etching tank is located on one side of the mobile machine.

[0018] A further technical solution is: the processing component includes a beam expander, a galvanometer and a field lens connected in sequence, and the processing component also includes a lens, and the lens is connected to the beam expander.

[0019] A further technical solution is: the processing component also includes a first reflector and a second reflector, the first reflector is connected between the beam expander and the galvanometer, and the first reflector is connected to the lens through the second reflector.

[0020] The beneficial effects of the present invention compared with the prior art are: the present invention uses laser to process the pattern to be processed on the glass surface, changes the physical and chemical properties of the material on the glass surface and the underlying layer, and uses alkaline etching liquid to perform chemical etching, thereby processing a product with a grayscale step structure, thereby achieving efficient preparation of optical microdevices with a grayscale step structure.

[0021] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0023] Figure 1 A schematic flow chart of a method for laser chemical etching a grayscale stepped structure product provided in a specific embodiment of the present invention;

[0024] Figure 2 A schematic block diagram of a system for laser chemical etching a grayscale stepped structure product provided by a specific embodiment of the present invention;

[0025] Figure 3 A schematic structural diagram of a method for laser chemical etching a grayscale stepped structure product provided by a specific embodiment of the present invention;

[0026] Figure 4 A schematic structural diagram of laser processing of a glass surface according to a specific embodiment of the present invention;

[0027] Figure 5 A schematic structural diagram of chemical etching provided for a specific embodiment of the present invention. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making any creative efforts shall fall within the scope of protection of the present invention.

[0030] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like to indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0031] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature identified as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0032] In the present invention, unless otherwise expressly specified or limited, terms such as "mounted," "connected," "connect," and "fixed" should be understood broadly. For example, they may refer to connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0033] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Furthermore, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0034] In the description of this specification, the reference terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" mean that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic expressions of the above terms should not be understood as necessarily referring to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in this specification.

[0035] See also Figure 1 , Figure 1The embodiment of the present invention provides a method for laser chemical etching to process grayscale step structure products. The method can be used to process optical micro devices with grayscale step structures, such as surface microlens arrays. Current laser-induced chemical etching processing is mainly used for processing high aspect ratio microstructures. Its principle is to utilize the high transmittance of glass 90 to laser, use the shaped beam of ultrafast laser to achieve material destruction inside the glass 90 through multi-photon absorption inside the glass 90, and then use chemical etching liquid to corrode the modified glass 90 to achieve the designed structure and device. One of the advantages of laser chemical etching is the controllable gradual process. Therefore, laser-induced chemical etching of the surface of glass 90 can efficiently realize the processing of products with grayscale step structures.

[0036] See also Figure 1 The above-mentioned method of laser chemical etching for processing grayscale step structure products includes the following steps S110 to S120.

[0037] S110 , processing the surface of the glass 90 by using a laser to obtain a primary processed product.

[0038] In this embodiment, the pre-processed product refers to a product obtained by processing the surface of the glass 90 with a pattern to be processed using a laser, so that the pattern to be processed appears on the surface of the glass 90 .

[0039] like Figure 4 As shown, when the laser processes the surface of the glass 90, due to the Gaussian distribution of the laser beam, the intensity of the material removal area and the material modification area diffuses outward from the focus, and is continuously distributed from strong to weak.

[0040] Specifically, an ultraviolet laser beam is used to process a desired pattern on the surface of the glass 90 to obtain a primary processed product.

[0041] In this embodiment, the wavelength of the ultraviolet laser beam is 343 nm to 355 nm. Of course, in other embodiments, the wavelength of the ultraviolet laser beam can also be 266 nm or 213 nm, which can be selected according to actual conditions.

[0042] In this embodiment, the pulse width of the ultraviolet laser beam is 250 fs to 950 fs. In other embodiments, the pulse width of the ultraviolet laser beam may be no greater than 15 ps or no greater than 10 ns, which may be selected based on actual conditions.

[0043] Setting the ultraviolet laser beam with the above wavelength and pulse width can allow the laser to change the physical and chemical properties of the surface of the glass 90 and the underlying material, forming a precursor material layer that can be chemically corroded.

[0044] S120, chemically etching the pre-processed product to obtain a product with a grayscale stepped structure.

[0045] In this embodiment, the product with a grayscale staircase structure refers to a product with gradually changing steps, such as a surface microlens array.

[0046] like Figure 5 As shown, specifically, an alkaline etching solution is used to chemically etch the pattern of the primary processed product to obtain a product with a grayscale stepped structure.

[0047] In this embodiment, the alkaline etching solution is a KOH aqueous solution. Specifically, the concentration of the KOH aqueous solution is 90%. Of course, in other embodiments, the concentration of the KOH aqueous solution is other concentrations ranging from 85% to 95%.

[0048] In this embodiment, the corrosion temperature of the alkaline etching solution is 97° C. In other embodiments, the corrosion temperature of the alkaline etching solution may be 25° C. to 100° C.

[0049] By using the alkaline etching solution of the above-mentioned concentration and etching temperature, the distribution of the modified layer can be controlled by utilizing the laser beam intensity distribution or necessary beam shaping, and ultimately the designed structure / shape can be achieved by controlling the etching process. The controllability and efficiency are high, and batch production of controllable glass 90 surface micro devices can be achieved.

[0050] like Figure 3 As shown, laser light interacts with glass 90, altering the physical and chemical properties of the surface and underlying materials, forming a precursor layer capable of chemical etching. The distribution of the modified layer is controlled by adjusting the laser beam intensity distribution, or by shaping the beam as necessary. Ultimately, the etching process achieves the desired structure / shape, resulting in high controllability and efficiency, enabling the mass production of controllable microdevices on the surface of glass 90. Although the laser spot is typically micrometer-sized, the modified area of ​​the material is significantly larger, yet its distribution remains consistent with the beam.

[0051] The above-mentioned method of laser chemical etching to process grayscale step structure products uses a laser to process the pattern to be processed on the surface of glass 90, changes the physical and chemical properties of the material on the surface of glass 90 and the underlying layer, and uses an alkaline etching solution for chemical etching, thereby processing a grayscale step structure product, thereby realizing the efficient preparation of optical micro-devices with grayscale step structures.

[0052] In one embodiment, see Figure 2 , Figure 2A schematic block diagram of a system for laser chemical etching processing of grayscale step structure products provided in an embodiment of the present invention is applicable to the above-mentioned method; the system for laser chemical etching processing of grayscale step structure products includes a chemical etching tank (not shown in the figure), a laser 10, a processing component and a mobile machine 20, the processing component and the laser 10 are respectively located on the mobile machine 20, the laser 10 is connected to the processing component, and the chemical etching tank is located on one side of the mobile machine 20.

[0053] The chemical etching tank is provided with alkaline etching solution. A glass 90 is placed on the movable platform 20 .

[0054] After the laser 10 emits a laser beam and transmits it through the processing component, it performs laser processing on the surface of the glass 90 located on the mobile machine 20. After the processing is completed, the mobile machine 20 will drive the pre-processed product to a designated position and obtain alkaline etching liquid from the chemical etching tank for chemical etching, thereby processing a product with a grayscale step structure, realizing batch production of controllable glass 90 surface micro-devices.

[0055] In one embodiment, see Figure 2 The above-mentioned processing component includes a beam expander 30, a galvanometer 50 and a field lens 60 connected in sequence. The processing component also includes a lens 80, which is connected to the beam expander 30.

[0056] In one embodiment, see Figure 2 The above-mentioned processing component also includes a first reflector 40 and a second reflector 70 . The first reflector 40 is connected between the beam expander 30 and the galvanometer 50 . The first reflector 40 is connected to the lens 80 through the second reflector 70 .

[0057] The laser beams emitted by the laser 10 are all expanded by the beam expander 30. The beam expander is used to expand the diameter of the parallel input beam to a larger parallel output beam, and then enter the galvanometer 50 after being deflected by the first reflector 40, and then focused by the field lens 60 and projected onto the glass 90 set on the surface of the movable platform to realize the processing mode of scanning by the galvanometer 50; in addition, the laser beam will also be reflected at the first reflector 40 and then reflected twice by the second reflector 70, and focused by the lens 80 and projected onto the glass 90 set on the surface of the movable platform to realize the static focusing processing mode. The above two processing modes are combined with the movement of the movable platform to complete the engraving of the pattern to be processed.

[0058] In this embodiment, the laser 10 is but not limited to an ultraviolet laser 10, and the ultraviolet laser 10 removes and modifies the surface of the glass 90. The ultraviolet laser beam is emitted by the laser.

[0059] In this embodiment, the lens 80 is a short-focus lens 80 , and the focal length of the short-focus lens 80 is less than 60 mm.

[0060] In this embodiment, the laser 10 , the beam expander 30 , the first reflector 40 , and the second reflector 70 constitute a static focusing structure.

[0061] In this embodiment, the movable platform 20 is but not limited to an XYZ three-axis movable platform 20. The chemical etching tank is a temperature-controllable etching tank within the range of room temperature to 100°C.

[0062] The above-mentioned system for laser chemical etching to process grayscale step structure products uses a laser 10 to emit laser light, and then performs scanning and static focusing on the surface of the glass 90 through the processing component using a galvanometer 50, thereby changing the physical and chemical properties of the material on the surface of the glass 90 and the underlying layer, and uses the alkaline etching liquid in the chemical etching tank to perform chemical etching, thereby processing a grayscale step structure product, and realizing the efficient preparation of optical micro-devices with a grayscale step structure.

[0063] It should be noted that technical personnel in the relevant field can clearly understand that the specific implementation process of the above-mentioned system for laser chemical etching processing of grayscale step structure products can refer to the corresponding description in the aforementioned method embodiment of laser chemical etching processing of grayscale step structure products. For the convenience and conciseness of the description, it will not be repeated here.

[0064] The above examples are merely provided to further illustrate the technical content of the present invention for easier understanding by the reader, but do not limit the implementation of the present invention to these examples. Any extension or re-creation of the technology based on the present invention shall be protected by the present invention. The scope of protection of the present invention shall be determined by the claims.

Claims

1. A method for laser chemical etching a grayscale stepped structure product, characterized in that: include: Use laser to process the glass surface to obtain the primary processed product; Chemically etching the pre-processed product to obtain a product with a grayscale stepped structure; The process of processing the glass surface by laser to obtain a primary processed product includes: Use ultraviolet laser beam to process the required pattern on the glass surface to obtain the primary processed product; The wavelength of the ultraviolet laser beam is 343 nm to 355 nm, and the pulse width of the ultraviolet laser beam is 250 fs to 950 fs; Alternatively, the wavelength of the ultraviolet laser beam is 266 mm, and the pulse width of the ultraviolet laser beam is no greater than 15 ps; Alternatively, the wavelength of the ultraviolet laser beam is 213 mm, and the pulse width of the ultraviolet laser beam is no greater than 10 ns; The chemical etching is applied to the pre-processed product to obtain a product with a grayscale stepped structure, comprising: Chemically etching the pattern of the pre-processed product with an alkaline etching solution to obtain a product with a grayscale stepped structure; The alkaline corrosive solution is a KOH aqueous solution; The corrosion temperature of the alkaline etching solution is 97°C.

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