A glass mirror capable of being tempered off-site and a preparation method thereof

Abstract

The present invention provides a glass mirror that can be tempered off-site and a preparation method thereof, and relates to the technical field of architectural coated glass. The glass mirror provided by the present invention comprises a glass substrate, an enhanced reflection layer, a metal layer and a protective layer arranged on the glass substrate in sequence from the inside to the outside; the enhanced reflection layer is a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside or a titanium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, and the total thickness of the enhanced reflection layer is 80 to 170 nm; the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer, and the thickness of the metal layer is 30 to 75 nm; the protective layer comprises one or two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer, and the thickness of the protective layer is 40 to 80 nm. The glass mirror provided by the present invention has strong antioxidant ability, long service life, no pollution, high film firmness, safety, can be tempered off-site; it also has high reflectivity; and the preparation process is simple.

Description

Technical Field

[0001] The invention relates to the technical field of architectural coated glass, and in particular to a glass mirror capable of being tempered off-site and a preparation method thereof. Background Art

[0002] Existing glass mirrors mainly rely on aluminum or silver films on the glass surface for reflection, but these two metals are easily oxidized in the atmosphere and have a short lifespan. In order to protect the aluminum or silver films on the glass surface, a thick layer of protective paint is usually sprayed on the outside of the film layer, but the paint is harmful to human health and causes air pollution; moreover, due to the presence of protective paint, there is no way to temper the glass mirror, and the strength of the glass mirror is low, which brings safety risks and may cause harm to personnel once damaged. Summary of the invention

[0003] In view of this, the present invention aims to provide a glass mirror that can be tempered off-site and a preparation method thereof. The glass mirror provided by the present invention has strong anti-oxidation ability, long service life, no pollution, high film firmness, safety, and can be tempered off-site.

[0004] In order to achieve the above-mentioned object of the invention, the present invention provides the following technical solutions:

[0005] The present invention provides a glass mirror that can be tempered off-site, comprising a glass substrate, an enhanced reflection layer, a metal layer and a protective layer arranged on the glass substrate in sequence from the inside to the outside;

[0006] The enhanced reflection layer is a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a titanium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside; the total thickness of the enhanced reflection layer is 80 to 170 nm;

[0007] The metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30 to 75 nm;

[0008] The protective layer comprises one or two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40-80 nm.

[0009] Preferably, when the enhanced reflection layer is a niobium oxide layer and a silicon oxide layer sequentially arranged from the inside to the outside, the thickness of the niobium oxide layer and the silicon oxide layer are independently 30 to 85 nm.

[0010] Preferably, when the enhanced reflection layer is a titanium oxide layer and a silicon oxide layer sequentially arranged from the inside to the outside, the thickness of the titanium oxide layer and the silicon oxide layer are independently 30 to 85 nm.

[0011] Preferably, the molar ratio of nickel to chromium in the nickel-chromium alloy in the metal layer is 20:80.

[0012] Preferably, when the protective layer includes two layers, the protective layer is a silicon oxide layer and a niobium oxide layer arranged in sequence from the inside to the outside, or a titanium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a silicon oxide layer and a titanium oxide layer arranged in sequence from the inside to the outside.

[0013] Preferably, when the protective layer includes two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer, the thickness of each single layer of the two layers is independently 20 to 50 nm.

[0014] The present invention provides a method for preparing a glass mirror that can be tempered off-site as described in the above scheme, comprising the following steps:

[0015] By adopting the magnetron sputtering method, an enhanced reflection layer, a metal layer and a protective layer are sputtered in sequence from the inside to the outside on the glass substrate to obtain a glass mirror that can be tempered off-site.

[0016] Preferably, the vacuum degree of the sputtering is 1.0×10 -4 Pa~5.0×10 -7 Pa.

[0017] Preferably, when sputtering the niobium oxide layer, the sputtering target is a Nb2O5 target, the sputtering gas is argon and oxygen, and the volume ratio of argon to oxygen is 1:0.1;

[0018] When sputtering the silicon oxide layer, the sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and oxygen, and the volume ratio of argon to oxygen is 1:1;

[0019] When sputtering the titanium oxide layer, the sputtering target is a TiO2 target, the sputtering gas is argon and oxygen, and the volume ratio of argon to oxygen is 1:0.1;

[0020] When sputtering the nickel-chromium alloy layer, the sputtering target is a nickel-chromium alloy target, and the sputtering gas is argon;

[0021] When sputtering the metal titanium layer, the sputtering target is a metal titanium target, and the sputtering gas is argon;

[0022] When the metal chromium layer is sputtered, the sputtering target is a metal chromium target, and the sputtering gas is argon;

[0023] When sputtering the silicon nitride layer, the sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and nitrogen, and the volume ratio of argon to nitrogen is 1.2:1;

[0024] The molar ratio of silicon to aluminum in the silicon-aluminum alloy target is 98:2, and the molar ratio of nickel to chromium in the nickel-chromium alloy target is 20:80.

[0025] The invention provides a glass mirror that can be tempered off-site, comprising a glass substrate, an enhanced reflection layer, a metal layer and a protective layer arranged on the glass substrate in sequence from the inside to the outside; the enhanced reflection layer is a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a titanium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside; the total thickness of the enhanced reflection layer is 80 to 170 nm; the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30 to 75 nm; the protective layer comprises one or two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40 to 80 nm. The glass mirror provided by the present invention replaces the commonly used aluminum film or silver film with a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer, which has the effect of increasing density and hardness, and significantly improves the service life of the glass mirror; the present invention uses one or two layers of silicon oxide layer, niobium oxide layer, titanium oxide layer and silicon nitride layer as a protective layer to replace the conventional protective paint, which is not only pollution-free, but also can better protect the metal layer. During the tempering process, the glass body needs to be heated to about 700°C and needs to be rapidly cooled. The protective layer can not only ensure the bonding strength with the metal layer during the tempering process, but also effectively isolate the corrosion of the metal layer by oxygen, and the material properties of the protective layer itself do not change; in addition, the present invention first arranges a niobium oxide layer or a titanium oxide layer on the glass substrate, and then arranges a silicon oxide layer, and the formed enhanced reflection layer has the characteristics of enhancing reflection and improving brightness. Therefore, the glass mirror provided by the present invention has strong antioxidant ability, long service life, no pollution, high strength, safety, can be tempered in a different place; and also has high reflectivity and brightness.

[0026] The invention provides a method for preparing the off-site tempered glass mirror, which is simple to operate and easy to mass produce. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 This is a structural diagram of a glass mirror that can be tempered off-site provided by the present invention, wherein 1 is a glass substrate, 2 is an enhanced reflection layer, 3 is a metal layer, and 4 is a protective layer. DETAILED DESCRIPTION

[0028] The present invention provides a glass mirror that can be tempered off-site, comprising a glass substrate, an enhanced reflection layer, a metal layer and a protective layer arranged on the glass substrate in sequence from the inside to the outside;

[0029] The enhanced reflection layer is a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a titanium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside; the total thickness of the enhanced reflection layer is 80 to 170 nm;

[0030] The metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30 to 75 nm;

[0031] The protective layer comprises one or two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40-80 nm.

[0032] The off-site tempered glass mirror provided by the present invention comprises a glass substrate. The present invention has no special requirements for the glass substrate, and any glass substrate well known to those skilled in the art can be used, such as a common glass substrate or an ultra-white glass substrate.

[0033] The off-site tempered glass mirror provided by the present invention comprises an enhanced reflection layer arranged on the glass substrate. In the present invention, the total thickness of the enhanced reflection layer is preferably 98 to 144 nm. In the present invention, when the enhanced reflection layer is a niobium oxide layer and a silicon oxide layer arranged sequentially from the inside to the outside, the thickness of the niobium oxide layer and the silicon oxide layer is preferably independently 30 to 85 nm, more preferably independently 30 to 72 nm; when the enhanced reflection layer is a titanium oxide layer and a silicon oxide layer arranged sequentially from the inside to the outside, the thickness of the titanium oxide layer and the silicon oxide layer is independently 30 to 85 nm, more preferably independently 30 to 72 nm. In the present invention, a niobium oxide layer or a titanium oxide layer is first arranged on the glass substrate, and then a silicon oxide layer is arranged, and the enhanced reflection layer formed has the characteristics of enhanced reflection and improved brightness.

[0034] The off-site tempered glass mirror provided by the present invention comprises a metal layer arranged on the enhanced reflective layer, wherein the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer. In the present invention, the thickness of the metal layer is preferably 49 to 70 nm; the molar ratio of nickel to chromium in the nickel-chromium alloy in the metal layer is 20:80. The present invention replaces the commonly used aluminum film or silver film with a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer, which has the effect of increasing density and hardness, and significantly prolonging the service life of the glass mirror.

[0035] The off-site tempered glass mirror provided by the present invention includes a protective layer arranged on the metal layer. In the present invention, the protective layer includes one or two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; in the present invention, when the protective layer includes two layers, the protective layer is preferably a silicon oxide layer and a niobium oxide layer arranged in sequence from the inside to the outside, or a titanium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside, or a silicon oxide layer and a titanium oxide layer arranged in sequence from the inside to the outside. In the present invention, the total thickness of the protective layer is 40 to 80 nm, preferably 50 to 60 nm. In the present invention, when the protective layer includes two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer, the thickness of each single layer of the two layers is independently preferably 20 to 50 nm, more preferably 25 to 30 nm. The present invention uses one or two of silicon oxide layer, niobium oxide layer, titanium oxide layer and silicon nitride layer as protective layer to replace conventional protective paint, which is not only pollution-free but also can better protect the metal layer, so that the glass mirror has the characteristics of anti-oxidation and long service life.

[0036] The glass mirror provided by the present invention has strong anti-oxidation ability, long service life, no pollution, high strength, safety, can be tempered in a different place, and also has high reflectivity and brightness.

[0037] The present invention provides a method for preparing a glass mirror that can be tempered off-site as described in the above scheme, comprising the following steps:

[0038] By adopting the magnetron sputtering method, an enhanced reflection layer, a metal layer and a protective layer are sputtered in sequence from the inside to the outside on the glass substrate to obtain a glass mirror that can be tempered off-site.

[0039] The present invention has no special requirements for the device used in the magnetron sputtering method, and a magnetron sputtering device well known to those skilled in the art can be used. The present invention has no special requirements for the specific operation method of the magnetron sputtering method, and an operation method well known to those skilled in the art can be used. In the present invention, the vacuum degree of the sputtering is preferably 1.0×10 -4 Pa~5.0×10 -7 Pa, more preferably 5.0×10 -5 Pa.

[0040] In the present invention, when sputtering a niobium oxide layer, the sputtering target is preferably a Nb2O5 target, the sputtering gas is preferably argon and oxygen, the volume ratio of the argon and oxygen is preferably 1:0.1, and in an embodiment of the present invention, the introduction amounts of the argon and oxygen are preferably 500sccm and 50sccm, respectively; during the sputtering process, the argon atoms of the argon gas collide with the Nb2O5 target on the target position in an ionized state, and the Nb2O5 is sputtered and deposited to form a niobium oxide layer. Because part of the niobium oxide loses oxygen atoms during the sputtering process, a small amount of oxygen is added.

[0041] In the present invention, when sputtering a silicon oxide layer, the sputtering target is preferably a silicon-aluminum alloy target, and the sputtering gas is preferably argon and oxygen. In the present invention, the molar ratio of silicon and aluminum in the silicon-aluminum alloy target is preferably 98:2; the volume ratio of argon and oxygen is preferably 1:1. In an embodiment of the present invention, the amount of argon and oxygen introduced is preferably 500 sccm, respectively. During the sputtering process, the argon atoms of the argon gas collide with the silicon-aluminum alloy on the target in an ionized state, and the Si atoms in the silicon-aluminum alloy are sputtered out and oxidized into silicon oxide when encountering oxygen, and a silicon oxide layer is formed after deposition (the aluminum content in the silicon-aluminum alloy target is very low, and generally in the oxidation process, the aluminum oxide content is negligible, and the content in the film layer is also very low and has almost no effect).

[0042] In the present invention, when sputtering a titanium oxide layer, the sputtering target is preferably a TiO2 target, the sputtering gas is preferably argon and oxygen, the volume ratio of the argon and oxygen is preferably 1:0.1, and in the embodiment of the present invention, the amount of the argon and oxygen introduced is preferably 500 sccm and 50 sccm, respectively. During the sputtering process, the argon atoms of the argon gas collide with the TiO2 on the target in an ionized state, and the TiO2 is sputtered out and deposited to form a titanium oxide layer. Because part of the titanium oxide loses oxygen atoms during the sputtering process, a small amount of oxygen is added.

[0043] In the present invention, when sputtering a nickel-chromium alloy layer, the sputtering target is preferably a nickel-chromium alloy target, and the sputtering gas is preferably argon. In the present invention, the molar ratio of nickel to chromium in the nickel-chromium alloy target is preferably 20:80. In an embodiment of the present invention, the amount of argon introduced is preferably 1000 sccm. During the sputtering process, argon atoms of the argon gas collide with the nickel-chromium alloy on the target in an ionized state, and Ni atoms and Cr atoms in the nickel-chromium alloy are sputtered out, and a nickel-chromium alloy layer is formed after deposition.

[0044] In the present invention, when the metal titanium layer is sputtered, the sputtering target is a metal titanium target, and the sputtering gas is argon. In the present invention, the amount of argon introduced is preferably 1000 sccm. During the sputtering process, argon atoms of the argon gas collide with the metal titanium on the target in an ionized state, and the titanium atoms are sputtered out, and a metal titanium layer is formed after deposition.

[0045] In the present invention, when the metal chromium layer is sputtered, the sputtering target is a metal chromium target, and the sputtering gas is argon. In the present invention, the amount of argon introduced is preferably 1000 sccm. During the sputtering process, argon atoms of the argon gas collide with the metal chromium on the target in an ionized state, and the chromium atoms are sputtered out, and the metal chromium layer is formed after deposition.

[0046] In the present invention, when sputtering a silicon nitride layer, the sputtering target is preferably a silicon-aluminum alloy target, and the sputtering gas is preferably argon and nitrogen. In the present invention, the molar ratio of silicon and aluminum in the silicon-aluminum alloy target is preferably 98:2; the volume ratio of argon and nitrogen is preferably 1.2:1. In an embodiment of the present invention, the amount of argon and oxygen introduced is preferably 600sccm and 500sccm, respectively. During the sputtering process, the argon atoms of the argon gas collide with the silicon-aluminum alloy on the target in an ionized state, and the Si atoms in the silicon-aluminum alloy are sputtered out and encounter nitrogen to form silicon nitride, and a silicon nitride layer is formed after deposition (the aluminum content in the silicon-aluminum alloy target is very low. Generally, in the nitridation process, the content of aluminum nitride is negligible, and the content in the film layer is also very low and has almost no effect).

[0047] The method for preparing the off-site tempered glass mirror provided by the invention is simple to operate and easy to mass produce.

[0048] The glass mirror capable of being tempered off-site and the preparation method thereof provided by the present invention are described in detail below in conjunction with the embodiments, but they should not be construed as limiting the protection scope of the present invention.

[0049] Example 1

[0050] Place the glass substrate into the chamber of the magnetron sputtering equipment and evacuate the chamber to a vacuum degree of 1.0×10 -4 Pa, first plate the first target - niobium oxide target (Nb2O5), add argon and oxygen, the volume ratio is 1:0.1 (argon 500sccm, oxygen 50sccm), the film thickness is 35nm; then plate the second target - silicon aluminum alloy target (Si and Al molar ratio is 98:2), add argon and oxygen, the volume ratio is 1:1 (argon 500sccm, oxygen 500sccm), the film thickness is 70nm, and an enhanced reflection layer is formed on the glass substrate;

[0051] A third target, a nickel-chromium alloy target (a molar ratio of Ni to Cr of 20:80), is plated on the enhanced reflective layer, pure argon gas (1000 sccm) is added, and the film thickness is 70 nm to form a metal layer on the enhanced reflective layer;

[0052] The fourth target, a silicon-aluminum alloy target (the molar ratio of Si and Al is 98:2), is plated on the metal layer, and argon and oxygen are added in a volume ratio of 1:1 (500 sccm of argon and 500 sccm of oxygen), and the film thickness is 20nm; then the fifth target, a niobium oxide target (Nb2O5), is plated, and argon and oxygen are added in a volume ratio of 1:0.1 (500 sccm of argon and 50 sccm of oxygen), and the film thickness is 20nm, forming a protective layer on the metal layer, and finally a glass mirror that can be tempered remotely is obtained.

[0053] Example 2

[0054] Place the glass substrate into the chamber of the magnetron sputtering equipment and evacuate the chamber to a vacuum degree of 1.0×10 -4 Pa, first plate the first titanium oxide target (TiO2), add argon and oxygen, the volume ratio is 1:0.1 (argon 500sccm, oxygen 50sccm), the film thickness is 35nm; then plate the second target - silicon aluminum alloy target (Si and Al molar ratio is 98:2), add argon and oxygen, the volume ratio is 1:1 (argon 500sccm, oxygen 500sccm), the film thickness is 70nm, so as to form an enhanced reflection layer on the glass substrate;

[0055] A third target, a nickel-chromium alloy target (Ni:Cr molar ratio of 20:80) was plated on the enhanced reflective layer, pure argon gas (1000 sccm) was added, and the film thickness was 70 nm to form a metal layer on the enhanced reflective layer;

[0056] The fourth target, a silicon-aluminum alloy target (the molar ratio of Si and Al is 98:2), is plated on the metal layer, and argon and oxygen are added in a volume ratio of 1:1 (500 sccm of argon and 500 sccm of oxygen), and the film thickness is 20nm; then the fifth target, a niobium oxide target (Nb2O5), is plated, and argon and oxygen are added in a volume ratio of 1:0.1 (500 sccm of argon and 50 sccm of oxygen), and the film thickness is 20nm, forming a protective layer on the metal layer, and finally a glass mirror that can be tempered remotely is obtained.

[0057] Example 3

[0058] Place the glass substrate into the chamber of the magnetron sputtering equipment and evacuate the chamber to a vacuum degree of 1.0×10 -4 Pa, first plate the first niobium oxide target (Nb2O5), add argon and oxygen, the volume ratio is 1:0.1 (argon 500sccm, oxygen 50sccm), the film thickness is 35nm; then plate the second target - silicon aluminum alloy target (Si and Al molar ratio is 98:2), add argon and oxygen, the volume ratio is 1:1 (argon 500sccm, oxygen 500sccm), the film thickness is 70nm, so as to form an enhanced reflection layer on the glass substrate;

[0059] A third target, a nickel-chromium alloy target (Ni:Cr molar ratio of 20:80) was plated on the enhanced reflective layer, pure argon gas (1000 sccm) was added, and the film thickness was controlled to be 70 nm to form a metal layer on the enhanced reflective layer;

[0060] A fourth target, a silicon-aluminum alloy target (the molar ratio of Si and Al is 98:2), is plated on the metal layer, and argon and nitrogen are added in a volume ratio of 1.2:1 (600 sccm of argon and 500 sccm of oxygen). The thickness of the silicon nitride film is 50 nm. A protective layer is formed on the metal layer, and finally a glass mirror that can be tempered remotely is obtained.

[0061] Example 4

[0062] Place the glass substrate into the chamber of the magnetron sputtering equipment and evacuate the chamber to a vacuum degree of 1.0×10 -4 Pa, first plate the first niobium oxide target (Nb2O5), add argon and oxygen, the volume ratio is 1:0.1 (argon 500sccm, oxygen 50sccm), the film thickness is 35nm; then plate the second target - silicon aluminum alloy target (Si and Al molar ratio is 98:2), add argon and oxygen, the volume ratio is 1:1 (argon 500sccm, oxygen 500sccm), the film thickness is 70nm, so as to form an enhanced reflection layer on the glass substrate;

[0063] A third target, a titanium target (Ti), is plated on the enhanced reflective layer, pure argon gas (1000 sccm) is added, and the film thickness is 60 nm to form a metal layer on the enhanced reflective layer;

[0064] The fourth target, a silicon-aluminum alloy target (the molar ratio of Si and Al is 98:2), is plated on the metal layer, and argon and oxygen are added in a volume ratio of 1:1 (500 sccm of argon and 500 sccm of oxygen), and the film thickness is 20nm; then the fifth target, a niobium oxide target (Nb2O5), is plated, and argon and oxygen are added in a volume ratio of 1:0.1 (500 sccm of argon and 50 sccm of oxygen), and the film thickness is 20nm, forming a protective layer on the metal layer, and finally a glass mirror that can be tempered remotely is obtained.

[0065] The glass mirrors prepared in Examples 1 to 4 were tested for performance before and after tempering. The tempering conditions were: heating temperature 680-700°C, heating time 240-270s, cooling air pressure 1.8 KPa / cm 2 , cooling time 160 ~ 200s, performance test results are shown in Table 1:

[0066] Table 1 Performance test results of glass mirrors prepared in Examples 1 to 4 before and after tempering

[0067] Experimental content Example 1 Example 2 Example 3 Example 4 Reflectivity before tempering, % 73.2 73.5 73.4 65.2 Reflectivity after tempering, % 71.4 58 62 52 Salt spray test after tempering Level 10 Level 10 Level 8 Level 8 100-grid test before tempering 5B 5B 5B 5B 100-grid test after tempering 5B 4B 4B 4B

[0068] In Table 1, the reflectivity measurement instrument used is the GSTR spectral transmission and reflection online scanning measurement system; the reflectivity test results show that the reflectivity of the glass mirror provided by the present invention is still relatively high after being tempered, indicating that the glass mirror provided by the present invention can be tempered and has a good tempering effect;

[0069] The salt spray test is based on GB / 6458-86 (neutral salt spray test standard) and GB / T6461-2002 (rating of samples and test pieces after corrosion test on metal substrates and other inorganic coatings). The test time is 950 hours. It can be seen from the salt spray test that the glass mirror provided by the present invention can be tempered and has a relatively long service life after tempering (grade 8 or above is qualified, and grade 10 is excellent).

[0070] The 100-grid test is based on GB / 9286-1998 (100-grid test standard). Through the 100-grid test, it can be seen that the film firmness of the glass mirror provided by the present invention is relatively good before and after tempering, and can effectively protect the metal reflective layer (5B is judged as excellent, 4B is qualified).

[0071] It can be seen from the above embodiments that the glass mirror provided by the present invention has strong anti-oxidation ability, long service life, high film firmness and safety, can be tempered in a different place without pollution; and also has high reflectivity.

[0072] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principle of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

Claims

1. A glass mirror that can be tempered off-site, comprising a glass substrate, an enhanced reflection layer, a metal layer and a protective layer arranged on the glass substrate in sequence from the inside to the outside; The enhanced reflection layer is a niobium oxide layer and a silicon oxide layer arranged in sequence from the inside to the outside; the thickness of the niobium oxide layer is 35nm, and the thickness of the silicon oxide layer is 70nm; The metal layer is a nickel-chromium alloy layer; the thickness of the metal layer is 70nm; The protective layer is a silicon oxide layer and a niobium oxide layer which are sequentially arranged from the inside to the outside; the thickness of the silicon oxide layer is 20 nm, and the thickness of the niobium oxide layer is 20 nm.

2. The glass mirror that can be tempered off-site according to claim 1, characterized in that: When the metal layer is a nickel-chromium alloy layer, the molar ratio of nickel to chromium in the nickel-chromium alloy is 20:

80.

3. The method for preparing a glass mirror that can be tempered off-site according to any one of claims 1 to 2, characterized in that: The following steps are involved: By adopting the magnetron sputtering method, an enhanced reflection layer, a metal layer and a protective layer are sputtered in sequence from the inside to the outside on the glass substrate to obtain a glass mirror that can be tempered off-site.

4. The preparation method according to claim 3, characterized in that: The vacuum degree of the sputtering is 1.0×10 -4 Pa~5.0×10 -7 Pa.

5. The preparation method according to claim 3 or 4, characterized in that: When sputtering the niobium oxide layer, the sputtering target is a Nb2O5 target, the sputtering gas is argon and oxygen, and the volume ratio of argon to oxygen is 1:0.1; When sputtering the silicon oxide layer, the sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and oxygen, and the volume ratio of argon to oxygen is 1:1; When sputtering the nickel-chromium alloy layer, the sputtering target is a nickel-chromium alloy target, and the sputtering gas is argon; The molar ratio of silicon to aluminum in the silicon-aluminum alloy target is 98:2, and the molar ratio of nickel to chromium in the nickel-chromium alloy target is 20:80.

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