Display panel and display device

Abstract

The present application discloses a display panel and a display device, including: a substrate; at least one isolation column arranged on the substrate; a water-absorbing layer arranged on the isolation column; an organic light-emitting layer covering the substrate, the isolation column and the water-absorbing layer, the organic light-emitting layer being separated by the isolation column; and a water-blocking layer covering the substrate, the isolation column and the organic light-emitting layer, wherein each first side wall of the isolation column and each second side wall of the water-absorbing layer are coated with the water-blocking layer. By setting the isolation column, the organic light-emitting layer can be separated, thereby blocking the channel for water and oxygen invasion; by setting the water-absorbing layer on the isolation column, on the one hand, the path of the water and oxygen invasion channel can be increased, and on the other hand, the effect of blocking water and oxygen invasion can be improved by separating the organic light-emitting layer again; on the other hand, by the water-absorbing material of the water-absorbing layer, the water and oxygen invading through the organic light-emitting layer can be absorbed by the water-absorbing layer, which greatly prolongs the time of water and oxygen invasion and prolongs the service life of the product.

Description

Technical Field

[0001] The present application generally relates to the field of display technology, and specifically relates to a display panel and a display device. Background Art

[0002] In the related art, most of the materials used in OLED (Organic Light-Emitting Diode) devices are extremely sensitive to water vapor. During the packaging process of OLED devices or after using them for a period of time, the airtightness of the devices will deteriorate, and water vapor will enter the OLED devices, affecting the service life of the OLED devices.

[0003] If the airtightness of the OLED device is not good, water vapor will enter the OLED device, which will easily produce many black non-luminous areas in its luminous area, and the black non-luminous area will gradually increase with the increase of time. Among them, the radius of the black non-luminous area is roughly proportional to the square root of its generation time. When the black non-luminous area increases to a certain extent, users can see it with the naked eye. Summary of the invention

[0004] In view of the above-mentioned defects or deficiencies in the prior art, it is desired to provide a display panel and a display device, which greatly prolong the time of water and oxygen intrusion and extend the service life of the product.

[0005] In a first aspect, the present application provides a display panel, comprising:

[0006] substrate;

[0007] At least one isolation column disposed on the substrate;

[0008] A water absorbing layer disposed on the isolation column;

[0009] an organic light-emitting layer covering the substrate, the isolation column and the water absorption layer, wherein the organic light-emitting layer is separated by the isolation column; and

[0010] A water-blocking layer covers the substrate, the isolation column and the organic light-emitting layer, wherein each first side wall of the isolation column and each second side wall of the water-absorbing layer are covered by the water-blocking layer.

[0011] Optionally, the number of the isolation columns is at least two, a recessed portion is formed between two adjacent isolation columns, and the organic light-emitting layer is separated by the recessed portion.

[0012] Optionally, the water absorbing layer includes a first portion disposed inside the isolation column and a second portion disposed on an upper surface of the isolation column.

[0013] Optionally, a cross-sectional shape of the first portion is substantially an inverted trapezoidal structure, and an orthographic projection of the first portion on the substrate is located within a range of an orthographic projection of the isolation column on the substrate.

[0014] Optionally, a cross-sectional shape of the second portion is substantially an inverted trapezoidal structure, and an orthographic projection of the second portion on the substrate is located within a range of an orthographic projection of the isolation column on the substrate.

[0015] Optionally, the organic light-emitting layer covering the upper surface of the isolation column is disconnected via the water absorption layer.

[0016] Optionally, there are a plurality of isolation columns, and at least one of the plurality of isolation columns is provided with the water absorbing layer.

[0017] Optionally, the material of the water absorbing layer includes a water absorbing resin.

[0018] Optionally, the display panel includes a thin film transistor structure layer and a pixel defining layer for defining each pixel area, the thin film transistor structure layer includes a planar layer, and the water absorption layer is arranged on the same layer as the planar layer or the pixel defining layer.

[0019] Optionally, the material of the water-blocking layer includes one or more of silicon oxide, silicon nitride and silicon oxynitride.

[0020] In a second aspect, the present application provides a method for preparing a display panel, the method comprising:

[0021] providing a substrate;

[0022] forming at least one isolation column on the substrate;

[0023] forming a water absorbing layer on the isolation column;

[0024] forming an organic light-emitting layer on the water-absorbing layer, wherein the organic light-emitting layer covers the substrate, the isolation column and the water-absorbing layer, and the organic light-emitting layer is separated by the isolation column; and

[0025] A water blocking layer is formed on the water absorbing layer, and the water blocking layer covers the substrate, the isolation column and the organic light emitting layer. Each first side wall of the isolation column and each second side wall of the water absorbing layer are covered by the water blocking layer.

[0026] In a third aspect, the present application provides a display device, comprising any display panel as described above.

[0027] The technical solution provided by the embodiments of the present application may have the following beneficial effects:

[0028] The display panel provided in the embodiment of the present application can isolate the organic light-emitting layer by setting the isolation column, thereby blocking the channel for the invasion of water and oxygen; the water-absorbing layer set on the isolation column can increase the path of the water and oxygen invasion channel on the one hand, and on the other hand, the effect of blocking the invasion of water and oxygen is improved by isolating the organic light-emitting layer again; on the other hand, the water-absorbing material of the water-absorbing layer can make the water and oxygen invading through the organic light-emitting layer can be absorbed by the water-absorbing layer, which greatly prolongs the time of water and oxygen invasion and prolongs the service life of the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Other features, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:

[0030] Figure 1 A schematic diagram of the water and oxygen intrusion path on a display panel;

[0031] Figure 2-4 A schematic diagram of the structures of various display panels provided in the embodiments of the present application;

[0032] Figure 5 A schematic diagram of the location of an isolation column on a display panel provided in an embodiment of the present application;

[0033] Figure 6-8 Structural schematic diagrams of various other display panels provided in the embodiments of the present application;

[0034] Fig. 9 A schematic diagram of a water and oxygen intrusion path on a display panel provided in an embodiment of the present application;

[0035] Fig.10 A flow chart of a method for preparing a display panel provided in an embodiment of the present application;

[0036] In the figure:

[0037] 10. Substrate; 20. Isolation column; 30. Water absorption layer; 40. Organic light-emitting layer; 50. Water blocking layer; 60. Encapsulation layer; 21. First side wall; 22. Recess; 23. Opening; 31. Second side wall; 32. First part; 33. Second part. DETAILED DESCRIPTION

[0038] The present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the relevant invention, rather than to limit the invention. It is also necessary to explain that, for ease of description, only the parts related to the invention are shown in the accompanying drawings.

[0039] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0040] GDS is a common problem of OLED screen reliability failure. Its mechanism is that water and oxygen at the edge of the screen invade the display area (AA area) through the organic light-emitting material, causing the organic light-emitting material in the AA area to fail and fail to emit light.

[0041] In order to overcome the problem of screen reliability failure, the prior art adopts a method of setting an isolation column at a position prone to failure, and the isolation column and the water-blocking layer covering the isolation column form an effect of blocking the water and oxygen entry path; however, a single water-blocking method cannot achieve a good water-blocking effect. The water and oxygen intrusion path is as follows: Figure 1 As shown. In addition, since the water barrier layer is made of inorganic materials, the inorganic water barrier layer will also produce large internal stress, and defects such as pinholes and cracks will inevitably be generated in the process of generating inorganic thin films, resulting in reduced barrier capacity of the inorganic water barrier layer. Furthermore, when used as a flexible display, when the display structure is at a corner, bend or fold, a large contact stress may be generated between the water barrier layer and the isolation column, resulting in a poor contact effect between the isolation column and the water barrier layer, which seriously affects the barrier effect and leads to an aggravated effect of water and oxygen intrusion.

[0042] Please see Figure 2-4 , a display panel comprising:

[0043] substrate 10;

[0044] At least one isolation column 20 disposed on the substrate 10;

[0045] A water absorbing layer 30 disposed on the isolation column 20;

[0046] an organic light emitting layer 40 covering the substrate 10 , the isolation column 20 and the water absorption layer 30 , wherein the organic light emitting layer 40 is separated by the isolation column 20 ; and

[0047] A water blocking layer 50 covers the substrate 10 , the isolation column 20 and the organic light emitting layer 40 , wherein each first side wall 21 of the isolation column 20 and each second side wall 31 of the water absorbing layer 30 are covered by the water blocking layer 50 .

[0048] In the embodiments of the present application, the light-emitting type of the display panel is not limited, such as an organic light-emitting diode (OLED) display panel, an active-matrix organic light-emitting diode (AMOLED) display panel, a passive-matrix organic light-emitting diode (Passive Matrix OLED) display panel, a quantum dot organic light-emitting diode (QLED) display panel, etc.

[0049] In the embodiment of the present application, an OLED display panel is used as an example for exemplary description. The display panel includes a plurality of organic light-emitting units arranged in an array on a substrate 10. The organic light-emitting unit can adopt an existing OLED structure, and the organic light-emitting unit includes an anode, a cathode, and an organic light-emitting layer 40 located between the anode and the cathode.

[0050] In one embodiment, the organic light emitting layer 40 includes a first common material layer, an emitting layer (EML), and a second common material layer which are stacked. The first common material layer and the second common material layer include one or more of a HIL (Hole Inject Layer), a HTL (Hole Transport Layer), a HBL (Hole Blocking Layer), an ETL (Electron Transport Layer), an EIL (Electron Inject Layer), and a CPL (Capping Layer).

[0051] In the present application, the organic light-emitting layer 40 includes multiple layers of organic common material layers, and water vapor can easily enter the display area through the organic common material layers. By setting the isolation column 20, the organic light-emitting layer 40 can be isolated, thereby blocking the channel for water and oxygen invasion; by setting the water absorption layer 30 on the isolation column 20, on the one hand, the path of the water and oxygen invasion channel can be increased, and on the other hand, the effect of blocking the water and oxygen invasion can be improved by isolating the organic light-emitting layer 40 again; on the other hand, through the water absorption material of the water absorption layer 30, the water and oxygen invading through the organic light-emitting layer 40 can be absorbed by the water absorption layer 30, which greatly prolongs the time of water and oxygen invasion and prolongs the service life of the product.

[0052] In addition, by providing a flexible water-absorbing layer 30 on the isolation column 20, the thickness of the inorganic water-blocking layer 50 material on the upper surface of the isolation column 20 in the prior art is reduced, which can greatly reduce the internal stress of the water-blocking layer 50 and reduce defects such as pinholes and cracks that will be generated in the process of generating the inorganic thin film, thereby reducing the barrier capacity of the inorganic water-blocking layer 50.

[0053] When used as a flexible display, when the display structure is at a corner, bend or fold, the contact stress between the water-blocking layer 50 and the isolation column 20 is reduced, the folding performance of the display panel is improved, and at the same time, the water and oxygen intrusion aggravation effect caused by the large contact stress at the corner, bend area or folding area can be effectively improved.

[0054] In the embodiment of the present application, the substrate 10 may be a flexible substrate (eg, a PI substrate 10 ) or a rigid substrate (eg, a glass substrate 10 ).

[0055] The display panel also includes a thin film transistor layer formed on the substrate 10, and the thin film transistor layer includes a plurality of thin film transistors arranged in an array on the substrate 10. The thin film transistor is a top-gate thin film transistor. In other structural schematic diagrams, the thin film transistor may also be a bottom-gate thin film transistor. In the embodiment of the present application, a top-gate thin film transistor is used for exemplary description.

[0056] The top-gate thin-film transistor includes an active layer formed on a side of a buffer layer away from a substrate 10, a gate insulating layer formed on a side of the active layer away from the substrate 10, a gate formed on a side of the gate insulating layer away from the substrate 10, an interlayer insulating layer formed on a side of the buffer layer away from the substrate 10 and covering the active layer and the gate, and source-drain electrodes formed on the interlayer insulating layer and contacting the active layer through vias on the interlayer insulating layer, wherein the source-drain electrodes are located on opposite sides of the gate.

[0057] The thin film transistor layer may also include other hierarchical structures. For example, in order to prevent the active layer in the top-gate thin film transistor from generating carriers due to the influence of backlight and affecting the electrical performance of the thin film transistor, a light shielding layer is provided between the thin film transistor layer and the substrate 10. In order to prevent impurity ions in the substrate 10 from entering the thin film transistor and affecting the electrical performance of the thin film transistor, a buffer layer is provided between the thin film transistor layer and the substrate 10, and the buffer layer covers the light shielding layer. A passivation layer is provided to prevent ions in the organic layer from entering the thin film transistor layer and affecting the electrical performance of the thin film transistor.

[0058] In the embodiment of the present application, the setting of the isolation column 20 cannot affect the normal light emission of the organic light emitting layer 40, so the isolation column 20 needs to be set in the non-light emitting area of ​​the organic light emitting layer 40. The main body of the isolation column 20 can be a single material layer, such as an isolation column 20 formed by a pixel defining material, an isolation column 20 formed by a cathode material, and an isolation column 20 formed by a buffer layer material; it can also be formed by multiple film layers of different materials. In different embodiments, according to different setting positions of the isolation column 20, different materials can be used to form it, and different composition forms can also be included.

[0059] The cross-sectional shape of the main body of the isolation column 20 can be a rectangle (eg Figure 2 or 3), inverted trapezoid (as shown Figure 4 As shown), "I" shape, "T" shape or inverted cone shape, etc., the present application is not limited thereto.

[0060] In one embodiment of the present application, Figure 4 As shown, the main body of the isolation column 20 is in an inverted trapezoidal shape, that is, the width of the main body of the isolation column 20 gradually increases in the direction away from the substrate 10. In terms of the formation method, the main body of the isolation column 20 includes a plurality of film layers stacked and arranged, and the etching resistance of the plurality of film layers increases layer by layer in the direction away from the substrate 10, thereby achieving the above shape in the above manner.

[0061] In the embodiment of the present application, in order to improve the blocking effect of the isolation column 20 on water and oxygen, a plurality of isolation columns 20 may be provided, and the plurality of isolation columns 20 may be distributed at intervals. It should be understood by those skilled in the art that as the number of isolation columns 20 increases, the effectiveness of intercepting the water and oxygen intrusion channel will inevitably increase, but the increase in the number of isolation columns 20 will inevitably increase the difficulty of the manufacturing process of the display panel and increase the production cost. Those skilled in the art may provide one, two, three or more isolation columns 20 on the substrate 10, and the present disclosure does not limit this.

[0062] Optionally, the number of the isolation columns 20 is at least two, a recessed portion 22 is formed between two adjacent isolation columns 20 , and the organic light-emitting layer 40 is separated by the recessed portion 22 .

[0063] It should be noted that in different embodiments, due to the different shapes of the isolation column 20 and the different widths of the recessed portion 22, the position of the recessed portion 22 may be covered with the organic light-emitting layer 40 or may not be covered with the organic light-emitting layer 40. The present application does not limit the number and width of the recessed portion 22. By setting the isolation column 20 and the recessed portion 22, it is possible to prevent water vapor or oxygen from invading the display panel from the through hole to cause the display panel to have a GDS phenomenon.

[0064] In the embodiment of the present application, the isolation column 20 can be arranged in the gap area between pixels, the opening area and the display edge position, such as Figure 5 The isolation column 20 may be a continuously arranged annular structure, for example, a plurality of annular structures arranged around the gap area, the opening area or the display area. In specific applications, it can be selected according to needs.

[0065] For example, when placing some sensors such as cameras in the screen, it is necessary to make holes in the screen, and the holes in the screen are easy to form water and oxygen intrusion channels in the organic light-emitting material layer. The isolation column 20 is designed to block the common light-emitting material layer, thereby cutting off the water and oxygen intrusion channels and preventing packaging defects.

[0066] In the embodiment of the present application, the water absorption layer 30 is disposed on the isolation column 20 and protrudes from the upper surface of the isolation column 20. On the one hand, the blocking effect of the organic light-emitting layer 40 can be formed, and on the other hand, the water absorption and water storage effect can be increased. The cross-sectional shape of the water absorption layer 30 can be a rectangle, an inverted trapezoid, an "I" shape, a "T" shape, or an inverted cone, etc., and the present application is not limited here.

[0067] Optionally, an opening 23 is provided on the isolation column 20 , and the water absorbing layer 30 extends from the inside of the opening 23 and protrudes from the upper surface of the isolation column 20 .

[0068] It should be noted that, in the embodiment of the present application, by providing an opening 23 on the isolation column 20, the water absorbing layer 30 includes a first portion 32 protruding from the upper surface of the isolation column 20 and a second portion 33 extending into the opening 23. Figure 6-7 As shown. By setting the opening 23, the volume of the water absorbing layer 30 can be increased, and the water absorbing capacity and water storage capacity can be improved. The depth of the opening 23 is not limited in the present application. In different embodiments, different settings can be made according to different devices and application scenarios. The depth of the opening 23 can extend to any position on the depth of the isolation column 20 or pass through the upper and lower surfaces of the isolation column 20.

[0069] In the embodiment of the present application, the cross-sectional shape of the first portion 32 is generally an inverted trapezoidal structure, and the orthographic projection of the first portion 32 on the substrate is located within the range of the orthographic projection of the isolation column 20 on the substrate. The cross-sectional shape of the second portion 33 is generally an inverted trapezoidal structure, and the orthographic projection of the second portion 33 on the substrate is located within the range of the orthographic projection of the isolation column 20 on the substrate.

[0070] When forming the water absorbing layer 30 penetrating the upper and lower surfaces of the isolation column 20, the material of the water absorbing layer 30 can be a flat layer material, a pixel definition layer material, etc., and when forming the flat layer PLN or the pixel definition layer PDL, the shape structure of the water absorbing layer 30 is formed at the same time, such as Figure 8 As shown, the process steps are simplified.

[0071] The display panel includes a thin film transistor structure layer and a pixel defining layer PDL for defining each pixel area; the thin film transistor structure layer includes a shielding layer SG, a buffer layer BU, a gate insulating layer GI, an interlayer dielectric layer ILD, a source-drain metal layer SD, a gate layer Gate, an active layer Act, and a planar layer PLN disposed on the substrate 10. In the embodiment of the present application, by forming a water absorption layer 30 on the upper surface of the isolation column 20, on the one hand, the effect of absorbing and storing water can be achieved; on the other hand, the isolation column 20 can also form a partition effect on the upper surface of the isolation column 20.

[0072] In the embodiment of the present application, the projection area of ​​the water absorption layer 30 on the substrate 10 is smaller than the projection area of ​​the isolation column 20 on the substrate 10 , and the organic light-emitting layer 40 covering the upper surface of the isolation column 20 is disconnected via the water absorption layer 30 .

[0073] The cross-sectional shape of the first portion 32 of the water absorbing layer 30 protruding from the upper surface of the isolation column 20 can be a rectangle (eg Figure 2 As shown), inverted trapezoid (as Figure 3 Or as shown in 4), "T" shape or inverted cone shape, etc., the present application is not limited thereto.

[0074] When the cross section of the water absorption layer 30 is rectangular, due to process reasons, generally, when the organic light emitting layer 40 material is formed, for example, by evaporation or other processes, if there is no other removal process, a continuous organic light emitting layer 40 material will be formed on the second side wall 31 of the water absorption layer 30 and the upper surface of the isolation column 20, such as Fig. 9 Although the water-oxygen transport channel formed by the organic light-emitting layer 40 material will be absorbed by the water-absorbing layer 30 material, it cannot achieve an effective blocking effect.

[0075] In one embodiment of the present application, the water absorbing layer 30 protrudes from the upper surface of the isolation column 20, and the cross-sectional shape of the water absorbing layer 30 is generally an inverted trapezoidal structure. The cross-sectional area of ​​the first portion 32 gradually increases from the upper surface of the isolation column 20 in a direction away from the substrate 10.

[0076] By improving the structure of the first portion 32 of the water absorption layer 30, a blocking effect can be formed at the second side wall 31 of the water absorption layer 30 when preparing the organic light-emitting layer 40. The organic light-emitting material is blocked at the water absorption layer 30, which has the same blocking effect as the isolation column 20, forming a double blocking effect. Combined with the water absorption and water storage effects of the water absorption layer 30, the reliability GDS defect can be greatly reduced and the product life can be improved.

[0077] In the present application, the material of the water-absorbing layer 30 is an organic material. To form an inverted trapezoidal structure of the water-absorbing layer 30, there is no need to change the production sequence of the water-absorbing layer 30. By controlling the exposure intensity and exposure temperature of the organic material, the surface material of the organic material in the water-absorbing layer 30 is completely exposed and solidified, and the lower material is not fully exposed. Due to the etching characteristics, during the erosion of the developer, the development rate of the lower layer of the water-absorbing layer 30 is higher than that of the surface layer. By controlling the development time, the inverted trapezoidal morphology in the figure can be formed.

[0078] It should be noted that there are multiple isolation columns 20, and the water absorption layer 30 is selectively provided in the multiple isolation columns 20. Of course, a rectangular or inverted trapezoidal structure of multiple water absorption layers 30 can also be arranged at intervals on an isolation column 20. In different embodiments, different numbers can be used depending on the device or application scenario. When water oxygen invades the outer isolation column 20 through the organic light-emitting material, it contacts the water absorption layer 30. At this time, the water oxygen will be preferentially absorbed by the water absorption layer 30 material until a circle of water absorption layer 30 materials surrounding the screen absorbs water to a certain concentration before invading the next isolation column 20. This greatly prolongs the water oxygen invasion time and prolongs the service life of the product.

[0079] In the embodiment of the present application, the material of the water-absorbing layer 30 includes a water-absorbing resin. For example, the material of the water-absorbing layer 30 may include a super absorbent resin. The super absorbent resin is insoluble in water and organic solvents, and its water absorption capacity can generally reach 500 to 2000 times of its own weight, and can reach up to 6000 times. After absorbing water, the super absorbent resin will swell into a hydrogel, has excellent water retention, and is not easy to squeeze out even under pressure. After the absorbent resin that has absorbed water is dried, the water absorption capacity can still be restored.

[0080] In the embodiment of the present application, the water-blocking layer 50 conformally covers the surfaces of the substrate 10, the spacer 20, the water-absorbing layer 30, and the organic light-emitting layer 40. The first side walls 21 of the spacer 20 and the second side walls 31 of the water-absorbing layer 30 are all covered by the water-blocking layer 50. The material of the water-blocking layer 50 includes one or more of silicon oxide (SiOx), silicon nitride (SiNx), and silicon oxynitride (SiON). It is used to improve the water and oxygen resistance of the substrate.

[0081] In the embodiment of the present application, the display panel may further include an encapsulation layer 60. The encapsulation layer 60 is located on the water-blocking layer 50. In a specific configuration, the encapsulation layer 60 may be an encapsulation cover plate, for example, the encapsulation cover plate may be a metal cover plate or a glass cover plate; the encapsulation layer 60 may also be an encapsulation film. The encapsulation film may be, for example, an inorganic film, an inorganic-inorganic film, a silicon nitride film, an organic film, an organic-organic film, an organic-inorganic film, and the like.

[0082] In the embodiment of the present application, the water-blocking layer 50 and the encapsulation layer 60 can prevent water and oxygen from entering the light-emitting layer and thus affecting the normal light emission of the display panel.

[0083] It should be noted that when describing positional relationships, unless otherwise specified, when an element such as a layer, film or substrate 10 is referred to as being "on" another element, it can be directly on the other element or there can be an intermediate element. Further, when a layer is referred to as being "under" another layer, it can be directly below or there can be one or more intermediate layers. It can also be understood that when a layer is referred to as being "between" two layers, it can be the only layer between the two layers, or there can be one or more intermediate layers.

[0084] like Fig.10 As shown, the present application provides a method for manufacturing a display panel. Below, each step of the method for manufacturing a display panel in this exemplary embodiment will be further described. The method includes:

[0085] S100, providing a substrate 10; in the embodiment of the present application, the substrate 10 may be a flexible substrate or a rigid substrate. A thin film transistor layer and a pixel definition layer are also formed on the substrate 10.

[0086] The thin film transistor layer includes an active layer formed on a side of the buffer layer away from the substrate 10, a gate insulating layer formed on a side of the active layer away from the substrate 10, a gate formed on a side of the gate insulating layer away from the substrate 10, an interlayer insulating layer formed on a side of the buffer layer away from the substrate 10 and covering the active layer and the gate, and source-drain electrodes formed on the interlayer insulating layer and contacting the active layer through vias on the interlayer insulating layer, wherein the source-drain electrodes are located on opposite sides of the gate.

[0087] S200, forming at least one isolation column 20 on the substrate 10; in the embodiment of the present application, the isolation column 20 may be a single layer, a multi-layer or a composite layer. The isolation column 20 may be formed by various patterning processes in the prior art.

[0088] It can be understood that the "patterning" mentioned in this article, when the patterned material is an inorganic material or metal, "patterning" includes processes such as coating photoresist, mask exposure, development, etching, and stripping photoresist; when the patterned material is an organic material, "patterning" includes processes such as mask exposure and development. The evaporation, deposition, coating, and coating mentioned in this article are all mature preparation processes in the relevant technology.

[0089] S300, forming a water absorbing layer 30 on the isolation column 20; the cross-sectional shape of the first portion 32 of the water absorbing layer 30 protruding from the upper surface of the isolation column 20 can be a rectangle, an inverted trapezoid, a "T" shape or an inverted cone.

[0090] The exposure intensity and development time of the water absorbing layer 30 material are controlled so that the lower layer material close to the isolation column 20 is not fully exposed and the upper layer material away from the isolation column 20 is fully exposed, forming the light shielding portion with an inverted trapezoidal cross section.

[0091] It should be noted that to form an inverted trapezoidal light-shielding structure, there is no need to change the production sequence of the water-absorbing layer 30. By controlling the exposure intensity and exposure temperature of the water-absorbing layer 30 material, the surface material of the water-absorbing layer 30 is completely exposed and solidified, while the lower material is not fully exposed. Due to the etching characteristics, during the erosion of the developer, the development rate of the lower layer of the water-absorbing layer 30 is higher than that of the surface layer. By controlling the development time, an inverted trapezoidal morphology can be formed.

[0092] S400 , forming an organic light-emitting layer 40 on the water-absorbing layer 30 , wherein the organic light-emitting layer 40 covers the substrate 10 , the isolation columns 20 and the water-absorbing layer 30 , and the organic light-emitting layer 40 is separated by the isolation columns 20 .

[0093] S500, forming a water blocking layer 50 on the water absorbing layer 30, wherein the water blocking layer 50 covers the substrate 10, the isolation column 20 and the organic light emitting layer 40, and each first side wall 21 of the isolation column 20 and each second side wall 31 of the water absorbing layer 30 are covered by the water blocking layer 50.

[0094] The present application provides a display device, including any display panel as described above. The present application does not impose any specific restrictions on the application of the display device, which can be any product or component with a display function, such as a television, a laptop, a tablet computer, a wearable display device, a mobile phone, a car display, a navigation, an e-book, a digital photo frame, an advertising light box, etc.

[0095] It should be understood that the orientation or position relationship indicated by terms such as "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0096] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0097] Unless otherwise defined, the technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art in the technical field of the present invention. The terms used herein are only for describing specific implementation purposes and are not intended to limit the present invention. Terms such as "setting" and the like appearing in this article can mean that one component is directly attached to another component, or that one component is attached to another component through an intermediate. Features described in this article in one embodiment may be applied to another embodiment alone or in combination with other features, unless the feature is not applicable in the other embodiment or otherwise specified.

[0098] The present invention has been described through the above-mentioned embodiments, but it should be understood that the above-mentioned embodiments are only for the purpose of example and illustration, and are not intended to limit the present invention to the described embodiments. It can be understood by those skilled in the art that more variations and modifications can be made according to the teachings of the present invention, and these variations and modifications all fall within the scope of the protection claimed by the present invention.

Claims

1. A display panel, characterized in that: include: substrate; At least one isolation column disposed on the substrate; A water absorbing layer disposed on the isolation column; an organic light-emitting layer covering the substrate, the isolation column and the water absorption layer, wherein the organic light-emitting layer is separated by the isolation column; and A water-blocking layer covers the substrate, the isolation column and the organic light-emitting layer, wherein each first side wall of the isolation column and each second side wall of the water-absorbing layer are covered by the water-blocking layer.

2. The display panel according to claim 1, characterized in that: The number of the isolation columns is at least two, a recessed portion is formed between two adjacent isolation columns, and the organic light-emitting layer is separated by the recessed portion.

3. The display panel according to claim 1, characterized in that: The water absorbing layer includes a first portion disposed inside the isolation column and a second portion disposed on an upper surface of the isolation column.

4. The display panel according to claim 3, characterized in that: The cross-sectional shape of the first portion is substantially an inverted trapezoidal structure, and the orthographic projection of the first portion on the substrate is located within the range of the orthographic projection of the isolation column on the substrate.

5. The display panel according to claim 3, characterized in that: The cross-sectional shape of the second portion is substantially an inverted trapezoidal structure, and the orthographic projection of the second portion on the substrate is located within the range of the orthographic projection of the isolation column on the substrate.

6. The display panel according to claim 1, characterized in that: The organic light emitting layer covering the upper surface of the isolation column is disconnected via the water absorption layer.

7. The display panel according to claim 1, characterized in that: There are multiple isolation columns, and at least one of the multiple isolation columns is provided with the water absorbing layer.

8. The display panel according to claim 1, characterized in that: The material of the water-absorbing layer includes a water-absorbing resin.

9. The display panel according to claim 1, characterized in that: The display panel includes a thin film transistor structure layer and a pixel defining layer for defining each pixel area. The thin film transistor structure layer includes a planar layer. The water absorption layer is arranged on the same layer as the planar layer or the pixel defining layer.

10. A display device, characterized in that: Comprising a display panel as described in any one of claims 1-9.

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