Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix

Abstract

The present invention provides a pigment dispersion composition for a black matrix, which can maintain a surface resistance value even after post-baking and can form a black matrix having excellent heat flow characteristics. A pigment dispersion composition for a black matrix, which comprises a black colorant, a sulfonate of copper phthalocyanine, and an amine compound, the amine compound being an imidazole compound and / or a triazole compound; the content of the amine compound being 0.1 to 1.5 parts by mass per 100 parts by mass of the black colorant.

Description

[0001] [CROSS-REFERENCE TO RELATED APPLICATIONS]

[0002] This application claims priority to Japanese Patent Application No. “Japanese Patent Application 2020-211472” filed on December 21, 2020, to the Japan Patent Office, and hereby incorporates by reference the entire disclosure of that application into the specification of this application. TECHNICAL FIELD

[0003] The present invention relates to a pigment dispersion composition for a black matrix, a resist composition for a black matrix, and a black matrix. BACKGROUND

[0004] In an image display device using liquid crystal, plasma, etc., a colored pattern in a display area of a screen is provided with a light-shielding film (black matrix, also called “black matrix”) at a gap between the colored pattern and a peripheral portion of the display area, and at an outer light side of a TFT in a liquid crystal display using the TFT.

[0005] Also, in a liquid crystal display device, it is mainly used for preventing leakage from a backlight from being reflected in a screen, and in a plasma display device, it is mainly used for preventing bleeding due to confusion of each color light from being reflected in a screen, thereby contributing to improvement of display characteristics (contrast and color purity).

[0006] For example, a color filter for converting white light of a backlight of a liquid crystal display device into color light is generally manufactured by a method of sequentially forming pixels of different color phases of red, green, and blue in a striped or mosaic pattern, etc., on a surface of a transparent substrate such as a glass or plastic sheet, etc., on which a black matrix is formed.

[0007] Also, even in a touch panel in which an image display device is aligned with a position input device, a color filter (color filter) obtained by forming a black matrix as a light-shielding film is also used, and has been generally formed on the side opposite to a sensor substrate through a glass cover plate (protective sheet) so far. However, as the demand for weight reduction of the touch panel increases, in order to achieve further weight reduction, development of a technology of simultaneously forming a light-shielding film and a touch sensor on the same side as the glass cover plate is promoted.

[0008] As a method of forming such a black matrix, for example, a photolithography method (pigment method) using a pigment is used.

[0009] In such a pigment method, in order to improve dispersibility of the pigment, a sulfonic acid derivative of copper phthalocyanine is sometimes used.

[0010] For example, Patent Document 1 discloses a pigment dispersion composition for a black matrix characterized by dispersing in a solvent carbon black having an oil absorption amount of 10 to 150 ml / 100 g, a basic group-containing urethane-based high-molecular pigment dispersant having a polyester chain, and a phthalocyanine derivative having a sulfonic acid group as an acid group-containing pigment derivative, at a pH of more than 9.

[0011] In the black matrix, in order to prevent short-circuiting or current leakage, it is desirable to be able to maintain the surface resistance value even after post-baking.

[0012] Further, in the black matrix, by forming a forward tapered shape by heat flow at the time of post-baking, it is possible to prevent the omission of a pattern. Therefore, it is desirable for the black matrix to have appropriate heat flow characteristics.

[0013] However, in Patent Document 1, there is no sufficient study on the surface resistance value and the heat flow characteristics, and there is room for further improvement.

[0014] Prior Art Documents

[0015] Patent Documents

[0016] Patent Document 1: International Publication No. 2008 / 066100 SUMMARY

[0017] PROBLEMS TO BE SOLVED BY THE INVENTION

[0018] Therefore, an object of the present application is to provide a pigment dispersion composition for a black matrix which is able to maintain the surface resistance value even after post-baking and which is able to form a black matrix having excellent heat flow characteristics.

[0019] MEANS FOR SOLVING THE PROBLEMS

[0020] The present inventors have found that, in a pigment dispersion composition for a black matrix which contains a black colorant and a sulfonate of copper phthalocyanine, by further containing a specific amine compound in a specific amount, a pigment dispersion composition for a black matrix which is able to maintain the surface resistance value even after post-baking and which is able to form a black matrix having excellent heat flow characteristics can be obtained, and thus the present application has been accomplished.

[0021] That is, the present application is a pigment dispersion composition for a black matrix which contains a black colorant, a sulfonate of copper phthalocyanine, and an amine compound, the above-mentioned amine compound being an imidazole compound and / or a triazole compound; the content of the above-mentioned amine compound being 0.1 parts by mass to 1.5 parts by mass with respect to 100 parts by mass of the above-mentioned black colorant.

[0022] The above-mentioned black colorant is preferably carbon black, and more preferably an acid carbon black.

[0023] The imidazole compound is preferably an alkyl imidazole, and the alkyl imidazole is more preferably an alkyl imidazole having an alkyl group having 8 to 16 carbon atoms, and is further preferably a monoalkyl imidazole and has a linear alkyl group having 8 to 16 carbon atoms, and is particularly preferably 2-undecyl imidazole.

[0024] The triazole compound preferably has a benzotriazole skeleton, and is more preferably a benzotriazole.

[0025] Further, the copper phthalocyanine sulfonate preferably has 0.5 to 3 sulfonic acid groups in the molecule.

[0026] Further, the present application also relates to a black matrix resist composition for a black matrix obtained by the pigment dispersion composition for a black matrix.

[0027] Further, the present application also relates to a black matrix formed by the black matrix resist composition.

[0028] Effects of the Invention

[0029] The present application provides a pigment dispersion composition for a black matrix which can maintain a surface resistance value even after post-baking and can form a black matrix having excellent heat flow characteristics. DETAILED DESCRIPTION

[0030] <Black Matrix Pigment Dispersion Composition>

[0031] The present application relates to a pigment dispersion composition for a black matrix, which comprises a black colorant, a copper phthalocyanine sulfonate, and an amine compound, the amine compound being an imidazole compound and / or a triazole compound.

[0032] (Black Colorant)

[0033] The pigment dispersion composition for a black matrix of the present application comprises a black colorant.

[0034] As the black colorant, carbon black is preferably contained, and more preferably the carbon black is an acid carbon black.

[0035] As the carbon black, an average primary particle diameter of 20 to 60 nm is preferable, and more preferably, a neutral carbon black having an average primary particle diameter of 20 to 60 nm and / or an acid carbon black having an average primary particle diameter of 20 to 60 nm.

[0036] In the case where the primary particle diameter of the black colorant is less than 20 nm or more than 60 nm, sometimes, sufficient light shielding properties are not obtained, and storage stability is also poor.

[0037] Further, the average primary particle diameter is a value of an arithmetic average particle diameter obtained by electron microscope observation.

[0038] From the viewpoint of appropriately imparting a surface resistance value, it is preferable that the black colorant contain only an acidic carbon black.

[0039] On the other hand, in the case of using a neutral carbon black and an acidic carbon black in combination, it is preferable that the neutral carbon black be 85% by mass or less, more preferably 75% by mass or less, relative to the total mass of the neutral carbon black and the acidic carbon black.

[0040] In the case where the content of the neutral carbon black in the carbon black is more than 85% by mass, the seal strength can sometimes be reduced.

[0041] The acidic carbon black and the neutral carbon black will be described.

[0042] Carbon blacks can be roughly classified into acidic carbon blacks and neutral carbon blacks according to surface structure. Acidic carbon black refers to a carbonaceous substance that has been oxidized as is or has been artificially oxidized, and exhibits acidity when boiled with distilled water. On the other hand, it is known that neutral carbon black exhibits a neutral or higher pH when boiled with distilled water.

[0043] As the neutral carbon black, the pH is preferably in the range of 8.0 to 10.0, and specifically, PRINTEX 25 (average primary particle diameter: 56 nm, pH 9.5), PRINTEX 35 (average primary particle diameter: 31 nm, pH 9.5), PRINTEX 65 (average primary particle diameter: 21 nm, pH 9.5) manufactured by Orion Engineered Carbons, MA#20 (average primary particle diameter: 40 nm, pH 8.0), MA#40 (average primary particle diameter: 40 nm, pH 8.0), MA#30 (average primary particle diameter: 30 nm, pH 8.0) manufactured by Mitsubishi Chemical Corporation, and the like can be given.

[0044] As the acidic carbon black, the pH is preferably in the range of 2.0 to 4.0, and specifically, Raven 10 80 (average primary particle diameter: 28 nm, pH 2.4), Raven 1100 (average primary particle diameter: 32 nm, pH 2.9); MA-8 (average primary particle diameter: 24 nm, pH 3.0), MA-100 (average primary particle diameter: 22 nm, pH 3.5) manufactured by Mitsubishi Chemical Corporation; Special Black 250 (average primary particle diameter: 56 nm, pH 3.0), Special Black 350 (average primary particle diameter: 31 nm, pH 3.0), Special Black 550 (average primary particle diameter: 25 nm, pH 4.0), NEROX 305 (average primary particle diameter: about 28 nm, pH about 2.8) manufactured by Orion Engineered Carbons, and the like.

[0045] As the black colorant, Special Black 250 or NEROX 305 is preferable from the viewpoint of appropriately imparting dispersibility of the pigment or a surface resistance value.

[0046] In addition, the pH can be measured by adding 1 g of the carbon black to 20 ml of distilled water from which carbonic acid has been removed (pH 7.0), mixing with a magnetic stirrer, preparing an aqueous suspension, and measuring at 25°C using a glass electrode (DIN ISO 787 / 9, German Industrial Standard).

[0047] The content of the black colorant is preferably 3 to 70% by mass, and more preferably 10 to 50% by mass, relative to the mass fraction of the entire solid component of the pigment dispersion composition for a black matrix of the present application.

[0048] In the case where the content of the black colorant is less than 3% by mass, the light shielding property when the black matrix is formed can sometimes become low; in the case where the content exceeds 70% by mass, the pigment dispersion can sometimes become difficult.

[0049] (Sulfonate of copper phthalocyanine)

[0050] The pigment dispersion composition for a black matrix of the present application contains a sulfonate of copper phthalocyanine.

[0051] The sulfonate of copper phthalocyanine, in the process of the microparticulation or dispersion of the black colorant, adsorbs to the surface of the pigment in part of the basic skeleton, and has the effect of improving the microparticulation or dispersion stability after the dispersion of the black colorant at the time of dispersion, by improving the affinity between the sulfonic acid group and the organic solvent or the pigment dispersant.

[0052] As the copper phthalocyanine in the sulfonate of copper phthalocyanine, there is no particular limitation as long as it has the structure of a copper phthalocyanine skeleton, and for example, it can have a known substituent such as an alkyl group or a halogen atom on the copper phthalocyanine skeleton, but from the viewpoint of easily introducing a sulfonic acid group, a structure having no substituent is preferable.

[0053] The phthalocyanine copper sulfonate preferably has 0.5 to 3 sulfonic acid groups in the molecule.

[0054] Thus, by having 0.5 to 3 sulfonic acid groups in the molecule, a composition for a black matrix capable of obtaining a coating film having an excellent surface resistance value can be formed.

[0055] More preferably, the phthalocyanine copper sulfonate has 0.5 to 1.5 sulfonic acid groups in the molecule, and further preferably has 0.7 to 1.5 sulfonic acid groups.

[0056] In addition, the number of sulfonic acid groups in the molecule can be found from the ratio of sulfur atoms to copper atoms obtained by elemental analysis.

[0057] As the phthalocyanine copper sulfonate, commercially available products can be used, and examples thereof include a desodiated product of Solsperse 12000 (manufactured by The Lubrizol Corporation) or VALIFAST BLUE 1605 (manufactured by Orient Chemical Industries Co., Ltd.), and the like.

[0058] The content of the phthalocyanine copper sulfonate is preferably 0.1 to 20 parts by mass, and more preferably 1 to 15 parts by mass, with respect to 100 parts by mass of the above-described black colorant.

[0059] (Amine compound)

[0060] The pigment dispersion composition for a black matrix according to the present application contains an amine compound.

[0061] The above-described amine compound is an imidazole compound and / or a triazole compound.

[0062] Since the basicity of such an amine compound is low, the ionization of a salt formed by neutralization with a sulfonic acid or a carboxylic acid (for example, the above-described acid black or the phthalocyanine copper sulfonate or the alkali-soluble resin or the binder resin described later) is low, and thus the formed black matrix is difficult to be electrified, and thus it is considered that the surface resistance value is excellent. In addition, since the basicity of the above-described amine compound is low, the ionization of a salt formed by neutralization with a sulfonic acid or a carboxylic acid is low, and thus the ionic crosslinking in the resist coating film is weak, and thus the resist coating film becomes soft and has excellent heat flow properties.

[0063] However, the present application can not be limited to be explained by the above-described mechanism.

[0064] As the imidazole compound, there can be mentioned imidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-(1-naphthyl)imidazole, 2-(1-naphthyl)-4-methylimidazole, 2-(2-naphthyl)imidazole, 2-(2-naphthyl)-4-methylimidazole, 4-phenylimidazole, 2-methyl-4-phenylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-propylimidazole, 2-isopropylimidazole, 2-butylimidazole, 2-tert-butylimidazole, 2-pentylimidazole, 2-hexylimidazole, 2-heptylimidazole, 2-(1-ethylpentyl)imidazole, 2-octylimidazole, 2-nonylimidazole, 2-decylimidazole, 2-undecylimidazole, 2-dodecylimidazole, 2-tridecylimidazole, 2-tetradecylimidazole, 2-pentadecylimidazole, 2-hexadecylimidazole, 2-heptadecylimidazole, 2-(1-heptadecyl)imidazole, 2-ethyl-4-methylimidazole, 2-undecyl-4-methylimidazole, 2-heptadecyl-4-methylimidazole, 4-methylimidazole, 4-isopropylimidazole, 4-octylimidazole, 2,4,5-trimethylimidazole, 4,5-dimethyl-2-octylimidazole, 2-undecyl-4-methyl-5-bromoimidazole, 4,5-dichloro-2- ethylimidazole, and the like.

[0065] Among them, from the viewpoint of appropriately imparting surface resistance value and heat flow characteristics, the imidazole compound is preferably an alkyl imidazole, the alkyl imidazole is more preferably an alkyl imidazole having an alkyl group having a carbon number of 8 to 16, the alkyl imidazole is further preferably a monoalkyl imidazole and has a linear alkyl group having a carbon number of 8 to 16, and the particularly preferable one is 2-undecylimidazole.

[0066] As the triazole compound, there can be mentioned 1,2,3-triazole, 1,2,4-triazole, 3-mercapto-triazole, 3-amino-5-mercapto-triazole, benzotriazole, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-(2'-hydroxy-3,5-di-tert-butylphenyl)benzotriazole, 2-[2'-hydroxy-3,5-bis(α,α-dimethylbenzyl)phenyl]benzotriazole, 2-(2'-hydroxy-3,5-di-tert-amylphenyl)benzotriazole, 2-(2'-hydroxy-3,5-di-isopentylphenyl)benzotriazole, 2-[2'-hydroxy-3,5-bis(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole, 2-(2'-hydroxy-4'-octyloxyphenyl)benzotriazole, and the like.

[0067] Among them, from the viewpoint of appropriately imparting surface resistance value and heat flow characteristics, it is preferable to have a benzotriazole skeleton, and it is more preferable to be benzotriazole.

[0068] The amine compound can be used alone or in combination of two or more.

[0069] The content of the amine compound is 0.1 to 1.5 parts by mass, preferably 0.3 to 1.4 parts by mass, and more preferably 0.5 to 1.3 parts by mass, relative to 100 parts by mass of the black colorant described above.

[0070] When the content of the amine compound described above is less than 0.1 parts by mass or more than 1.5 parts by mass relative to 100 parts by mass of the black colorant described above, the surface resistance value or the heat flow characteristics decrease.

[0071] (Organic solvent)

[0072] The pigment dispersion composition for a black matrix according to the present application preferably contains an organic solvent.

[0073] As the organic solvent, an organic solvent conventionally used in the field of liquid crystal black matrix resists can be preferably used.

[0074] Specifically, as the organic solvent, an ester-based organic solvent, an ether-based organic solvent, an ether ester-based organic solvent, a ketone-based organic solvent, a ketone-based organic solvent, an aromatic hydrocarbon-based organic solvent, and a nitrogen-containing organic solvent, etc. having a boiling point of 100 to 250°C under normal pressure (1.013 x 10 2 kPa) can be used.

[0075] If the organic solvent having a boiling point exceeding 250°C is contained in a large amount, the organic solvent does not sufficiently evaporate and remains in the dried coating film when pre-baking is performed on the coating film formed by coating the black matrix resist composition according to the present application, and sometimes the heat resistance of the dried coating film decreases.

[0076] In addition, if the organic solvent having a boiling point of less than 100°C is contained in a large amount, it is difficult to uniformly coat without deviation, and sometimes a coating film having excellent surface smoothness is not obtained.

[0077] As the above-mentioned organic solvent, specifically, there can be mentioned ether-based organic solvents such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and the like; ether ester-based organic solvents such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and the like; ketone-based organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptanone, δ-valerolactone, and the like; ester-based organic solvents such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, 3-methyl-3-methoxybutyl propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, n-pentyl formate, and the like; alcohol-based solvents such as methanol, ethanol, isopropanol, butanol, and the like; nitrogen-containing organic solvents such as N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, and the like; and the like. These can be used alone or in combination of two or more.

[0078] Among the above-mentioned organic solvents, from the viewpoints of solubility, dispersibility, coatability, and the like, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, ethyl 2-hydroxypropionate, 3-methyl-3-methoxybutyl propionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, n-pentyl formate, and the like are preferable, and propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate are more preferable.

[0079] (Pigment dispersant)

[0080] The pigment dispersion composition for a black matrix of the present application preferably contains a pigment dispersant.

[0081] As the above-mentioned pigment dispersant, it is a pigment dispersant containing a basic group, and anionic surfactants, polyester-based pigment dispersants containing a basic group, acrylic-based pigment dispersants containing a basic group, polyurethane-based pigment dispersants containing a basic group, carbodiimide-based pigment dispersants containing a basic group, high-molecular pigment dispersants containing an acidic group, and the like can be used.

[0082] These pigment dispersants containing a basic group can be used alone, and in combination of two or more. Among them, from the viewpoint of obtaining good pigment dispersibility, high-molecular pigment dispersants containing a basic group are preferable.

[0083] Specific examples of the above-mentioned high-molecular pigment dispersants containing a basic group can be mentioned as follows:

[0084] (1) a reaction product of an amino group and / or an imino group of a polyamine compound (e.g., a polyallylamine, a polyvinylamine, a polyethylenepolyimine, a poly(lower)alkyleneamine, or the like) and at least one selected from the group consisting of a polyester having a free carboxyl group, a polyamide, and a polyesteramide (Japanese Patent Application Laid-Open (JP-A) No. 2001-59906);

[0085] (2) a reaction product of a low-molecular amine compound such as a poly(lower)alkyleneimine, a methyliminodipropylamine, and a polyester having a free carboxyl group (JP-A No. 54-37082, JP-A No. 01-311177);

[0086] (3) a reaction product of a reaction of an isocyanate group of a polyisocyanate compound with an alcohol such as a methoxypolyethylene glycol, a polyester having one hydroxyl group such as a caprolactone polyester, a compound having two to three isocyanate group-reactive functional groups, and an aliphatic or heterocyclic hydrocarbon compound having an isocyanate group-reactive functional group and a tertiary amino group, in this order (JP-A No. 02-612);

[0087] (4) a compound obtained by reacting a polyisocyanate compound and a hydrocarbon compound having an amino group with a polymer of an acrylate having an alcoholic hydroxyl group;

[0088] (5) a reaction product of a polyether chain and a low-molecular amine compound;

[0089] (6) a reaction product of a reaction of a compound having an amino group with a compound having an isocyanate group (JP-A No. 04-210220);

[0090] (7) a reaction product of a reaction of a linear polymer having a free carboxyl group and an organic amine compound having one secondary amino group with a polyepoxy compound (JP-A No. 09-87537);

[0091] (8) a reaction product of a polycarbonate compound having a functional group capable of reacting with an amino group at a single terminal and a polyamine compound (JP-A No. 09-194585);

[0092] (9) a copolymer of at least one of methacrylate esters or acrylate esters selected from the group consisting of methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, stearyl methacrylate, benzyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, stearyl acrylate, benzyl acrylate, and the like, and at least one of basic group-containing polymerizable monomers selected from the group consisting of acrylamide, methacrylamide, N-methylolamide, vinyl imidazole, vinyl pyridine, monomers having an amino group and a polycaprolactone skeleton, and the like, and at least one of other polymerizable monomers selected from the group consisting of styrene, styrene derivatives (Japanese Patent Application Laid-Open No. 01-164429);

[0093] (10) a carbodiimide-based pigment dispersant containing a basic group (International Publication WO04 / 000950);

[0094] (11) a block copolymer composed of a block having a basic group such as a tertiary amino group, a quaternary ammonium base, and the like, and a block having no functional group (see the description of Japanese Patent Application Laid-Open No. 2005-55814);

[0095] (12) a pigment dispersant obtained by subjecting a polycarbonate compound to a Michael addition reaction with a polyallylamine (Japanese Patent Application Laid-Open No. 09-194585);

[0096] (13) a carbodiimide compound having at least one polybutadiene chain and a basic nitrogen-containing group, respectively (Japanese Patent Application Laid-Open No. 2006-257243);

[0097] (14) a carbodiimide compound having at least one side chain having an amide group and a basic nitrogen-containing group, respectively, in the molecule (Japanese Patent Application Laid-Open No. 2006-176657);

[0098] (15) a polyurethane compound having a structural unit having an oxirane chain and an oxetane chain, and having an amino group which is quaternized with a quaternizing agent (Japanese Patent Application Laid-Open No. 2009-175613);

[0099] (16) a compound obtained by reacting an isocyanate group of an isocyanate compound having an isocyanurate ring in the molecule with an active hydrogen group of a compound having a carbazole ring and / or an azobenzene skeleton and having an active hydrogen group in the molecule, wherein the number of the carbazole ring and the azobenzene skeleton in the molecule of the compound, with respect to the total of the carbazole ring and the azobenzene skeleton derived from the isocyanate group of the isocyanate compound having an isocyanurate ring and the urethane bond and the urea bond generated by the reaction of the isocyanate group and the active hydrogen group, is 15 to 85% (Japanese Patent Application No. 2009-220836);

[0100] (17) a graft copolymer in which a polyether or polyester side chain is introduced in an acrylate polymer having an amino group.

[0101] Among the above-mentioned high-molecular pigment dispersants containing a basic group, more preferable are a polyurethane pigment-based high-molecular pigment dispersant containing a basic group, a polyester-based high-molecular pigment dispersant containing a basic group, an acrylic high-molecular pigment dispersant containing a basic group, and further preferable are a polyurethane pigment-based high-molecular pigment dispersant containing an amino group, a polyester-based high-molecular pigment dispersant containing an amino group, and an acrylic high-molecular pigment dispersant containing an amino group. Among the above-mentioned high-molecular pigment dispersants containing a basic group, particularly preferable is a high-molecular pigment dispersant having a basic group (amino group) having at least one selected from the group consisting of a polyester chain, a polyether chain, and a polycarbonate chain.

[0102] As the content of the above-mentioned pigment dispersant, relative to 100 parts by mass of the above-mentioned black colorant, it is preferable to be 1 to 200 parts by mass, and more preferable to be 5 to 100 parts by mass.

[0103] (Binder resin)

[0104] The pigment dispersion composition for a black matrix of the present application preferably contains a binder resin.

[0105] As the above-mentioned binder resin, a thermosetting resin, a thermoplastic resin, a photopolymerizable compound, an alkali-soluble resin, and the like can be given. They can be used alone or two or more kinds thereof can be used in mixture.

[0106] As the above-mentioned thermosetting resin or thermoplastic resin, for example, a butyral resin, a styrene-maleic acid copolymer, a chlorinated polyethylene, a chlorinated polypropylene, a polyvinyl chloride, a chloroethylene-vinyl acetate copolymer, a polyvinyl acetate, a polyurethane-based resin, a phenolic resin, a polyester resin, an acrylic resin, an alkyd resin, a styrene resin, a polyamide resin, a rubber-based resin, a cyclized rubber, an epoxy resin, a cellulose-based resin, a polybutadiene, a polyimide resin, a benzoguanamine resin, a melamine resin, a urea-formaldehyde resin (urea resin), and the like can be given.

[0107] As the above-mentioned photopolymerizable compound, a monomer having one or two or more photopolymerizable unsaturated bonds in a molecule, an oligomer having a photopolymerizable unsaturated bond, and the like can be given.

[0108] As the monomer having one photopolymerizable unsaturated bond in the molecule, there can be used: methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and the like alkyl methacrylates or acrylates; benzyl methacrylate, benzyl acrylate, and the like aralkyl methacrylates or acrylates; butoxyethyl methacrylate, butoxyethyl acrylate, and the like alkoxyalkyl methacrylates or acrylates; N,N-dimethylaminoethyl methacrylate, N,N-dimethylaminoethyl acrylate, and the like aminoalkyl methacrylates or acrylates; methacrylate or acrylate of polyalkylene glycol monoalkyl ether such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, and dipropylene glycol monomethyl ether; methacrylate or acrylate of polyalkylene glycol monoaryl ether such as hexaethylene glycol monophenyl ether; isobornyl methacrylate or acrylate; glyceryl methacrylate or acrylate; 2-hydroxyethyl methacrylate or acrylate, and the like.

[0109] As the monomer having two or more photopolymerizable unsaturated bonds in the molecule, there can be used: bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, 1,3-butanediol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol pentamethacrylate, epoxy methacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butanediol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, epoxy acrylate, and the like.

[0110] As the oligomer having a photopolymerizable unsaturated bond, there can be used an oligomer obtained by appropriately polymerizing the above monomer.

[0111] The above binder resin can be used alone or in combination of two or more.

[0112] As the binder resin, from the viewpoints of heat resistance and developability, an epoxy acrylate resin is preferred.

[0113] The above alkali-soluble resin will be described later.

[0114] The content of the above-mentioned adhesive resin is preferably 3 to 50 mass% relative to the mass of the total solid components of the pigment dispersion composition for black matrix of the present application.

[0115] (Method for producing the pigment dispersion composition for black matrix)

[0116] The pigment dispersion composition for black matrix of the present application can be obtained by adding the above-mentioned various components and mixing and performing a bead-milling treatment.

[0117] As the method for performing the above-mentioned bead-milling treatment, there is no particular limitation, and for example, a bead mill, a ready mill, an ultrasonic homogenizer, a high-pressure homogenizer, a paint shaker, a ball mill, a roll mill, a sand mill, a sand grinder, a Dyno-Mill, a high-speed disperser (DISPERMAT), an SC mill, a high-pressure homogenizer (Nanomizer), or the like can be used, and the bead-milling treatment can be performed by a publicly known method.

[0118] <Resist composition for black matrix>

[0119] The present application also relates to a resist composition for black matrix obtained from the pigment dispersion composition for black matrix of the present application.

[0120] (Pigment dispersion composition for black matrix)

[0121] The resist composition for black matrix of the present application contains the above-mentioned pigment dispersion composition for black matrix of the present application.

[0122] The content of the above-mentioned pigment dispersion composition for black matrix is preferably 30 to 80 mass%, and more preferably 40 to 75 mass% based on the total mass of the resist composition for black matrix of the present application.

[0123] (Photo-polymerization initiator)

[0124] The resist composition for black matrix of the present application preferably contains a photo-polymerization initiator.

[0125] As the above-mentioned photopolymerization initiator, there is no particular limitation as long as it is a polymerization initiator capable of generating radicals, cations by irradiation of active energy rays such as ultraviolet rays or electron beams, and examples thereof include photopolymerization initiators such as 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime) ethanone, benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, a-hydroxyisobutyl phenyl ketone, thioxanthone, 2-chlorothioxanthone, 1-hydroxycyclohexyl phenyl ketone, t-butyl anthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 1,2-benzanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropane-1-one, and the like.

[0126] The above-mentioned photopolymerization initiator can be used alone or in combination of two or more.

[0127] The content of the above-mentioned photopolymerization initiator is preferably 1 to 20% by mass relative to the entire solid content of the black matrix resist composition of the present application.

[0128] (Photo-polymerizable compound)

[0129] The black matrix resist composition of the present application preferably contains a photo-polymerizable compound.

[0130] As the above-mentioned photo-polymerizable compound, those described for the above-mentioned black matrix pigment dispersion composition can be appropriately selected.

[0131] The content of the above-mentioned photo-polymerizable compound is preferably 0.1 to 50% by mass relative to the entire solid content of the black matrix resist composition of the present application.

[0132] (Alkali-soluble resin)

[0133] The black matrix resist composition of the present application preferably contains an alkali-soluble resin.

[0134] As the above-mentioned alkali-soluble resin, a resin that functions as a binder for the above-mentioned black colorant and is soluble in a developing solution (particularly, an alkali developing solution) used in the developing process at the time of manufacturing the black matrix is preferred.

[0135] As the above-mentioned alkali-soluble resin, a block copolymer can be used. By using a block copolymer, the pigment dispersing ability is improved compared to other copolymers, and solubility to PGMEA or an alkali developer can be imparted.

[0136] In the block copolymer, a block copolymer having a block composed of an ethylenically unsaturated monomer having one or more carboxyl groups and a block composed of another copolymerizable ethylenically unsaturated monomer is preferred.

[0137] As the above-mentioned block copolymer, there is no particular limitation, and a block copolymer generally used can be used. Among them, specifically, a copolymer between an ethylenically unsaturated monomer having a carboxyl group such as acrylic acid, methacrylic acid, and at least one selected from the group consisting of styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, N-phenylmaleimide, polystyrene macromonomer, and polymethyl methacrylate macromonomer, which can be copolymerized with the ethylenically unsaturated monomer having a carboxyl group, can be mentioned.

[0138] However, it is preferred that N-vinylpyrrolidone and a monomer containing a sulfur element are not used.

[0139] As the above-mentioned block copolymer, a block resin synthesized by living radical polymerization, anionic polymerization can be used.

[0140] A part of the block portion of the above-mentioned block copolymer can be composed of a random copolymer.

[0141] As the above-mentioned alkali-soluble resin, an alkali-soluble Cardo resin can be used.

[0142] As the above-mentioned alkali-soluble Cardo resin, an epoxy (meth) acrylate acid adduct having a fluorene skeleton, which is an addition product of a fluorene ring epoxy (meth) acrylate derivative and a dicarboxylic anhydride and / or a tetracarboxylic dianhydride, and the like can be mentioned.

[0143] In addition, the alkali-soluble resin can also have a photopolymerizable functional group.

[0144] As the acid value of the above-mentioned alkali-soluble resin, from the viewpoint of development characteristics, 5 to 300 mgKOH / g is preferred, 5 to 250 mgKOH / g is more preferred, 10 to 200 mgKOH / g is further preferred, and 60 to 150 mgKOH / g is particularly preferred.

[0145] In addition, in the present specification, the acid value described above is a theoretical acid value, and is a value calculated based on the ethylenically unsaturated monomer having a carboxyl group and the content thereof.

[0146] From the viewpoint of development characteristics and solubility in an organic solvent, the weight average molecular weight of the alkali-soluble resin described above is preferably 1000 to 100000, more preferably 3000 to 50000, and further preferably 5000 to 30000.

[0147] In addition, in the present application, the weight average molecular weight described above is a polystyrene-converted weight average molecular weight based on GPC.

[0148] In the present specification, as a device for measuring the weight average molecular weight, Water2690 (manufactured by Waters Corporation) was used, and as a column, PLgel 5μm MIXED-D (manufactured by Agilent Technologies, Inc.) was used.

[0149] The content of the alkali-soluble resin described above is preferably 1 to 200 parts by mass, and more preferably 10 to 150 parts by mass, with respect to 100 parts by mass of the black colorant described above.

[0150] At this time, if the content of the alkali-soluble resin described above is less than 1 part by mass, the development characteristics can be reduced, and if the content of the alkali-soluble resin described above exceeds 200 parts by mass, the concentration of the black colorant described above is relatively reduced, and thus it is sometimes difficult to achieve the target color density as a thin film.

[0151] As the alkali-soluble resin described above, it is preferable that none of a primary amino group, a secondary amino group, and a tertiary amino group be contained, and more preferably, a quaternary ammonium group is not contained. Furthermore, it is more preferable that no basic group be contained. In addition, an alkali-soluble resin having a structure other than a block copolymer can also be mixed within a range that does not impair the effects of the present application.

[0152] (Organic solvent)

[0153] As the organic solvent described above, those described for the pigment dispersion composition for a black matrix described above can be appropriately selected and used.

[0154] The content of the organic solvent described above is preferably 1 to 40% by mass, and more preferably 5 to 35% by mass, based on the total mass of the resist composition for a black matrix of the present application.

[0155] (Other additives)

[0156] The resist composition for a black matrix of the present application can appropriately use various additives such as a thermal polymerization inhibitor, an ultraviolet absorber, and an antioxidant as needed.

[0157] (Method for producing resist composition for black matrix)

[0158] As a method for producing the black matrix resist composition of the present application, for example, the black matrix pigment dispersion composition of the present application is produced, and then the remaining materials are added and mixed by stirring using a stirring device or the like.

[0159] As the method for stirring and mixing, there is no particular limitation, and known methods such as an ultrasonic disperser, a high-pressure emulsifier, a bead mill, a triple roll, a sand mill, a kneader, and the like can be used.

[0160] In addition, after the stirring and mixing, the filter can be used for filtration.

[0161] In addition, when the black matrix resist composition of the present application is produced, the above-described black colorant, the above-described epoxy resin, the above-described oxazine compound, and the like described for the black matrix pigment dispersion composition of the present application can be added as needed.

[0162] <Black Matrix>

[0163] The black matrix of the present application is formed by the black matrix resist composition of the present application.

[0164] As the method for forming the black matrix of the present application, there is no particular limitation, and for example, the black matrix can be formed by the following method: the black matrix resist composition of the present application is applied to a transparent substrate, and after drying to form a coating film, a photomask is placed on the coating film, and image exposure, development, and the like are performed through the photomask, and photocuring and the like are performed as needed.

[0165] As the method for applying, drying, exposing, and developing the black matrix resist composition of the present application, known methods can be appropriately selected. In addition, as the transparent substrate, known transparent substrates such as a glass substrate, a plastic substrate, and the like can be appropriately selected.

[0166] As the thickness of the coating film, the thickness after drying is preferably 0.2 to 10 μm, more preferably 0.5 to 6 μm, and further preferably 1 to 4 μm.

[0167] By setting to the above-described thickness range, the prescribed pattern can be appropriately developed and the prescribed optical density can be appropriately imparted.

[0168] As for the black matrix of the present application, the black matrix resist composition was applied to a glass substrate (EAGLE XG) using a spin coater so that the film thickness reached 1 μm, and after pre-baking at 100°C for 3 minutes, exposure was performed using a high-pressure mercury lamp (UV cumulative light amount: 80 mJ / cm 2) and further post-baking at 2300C for 60 minutes, the surface resistance value is preferably 1.0 x 10 8 Ω / □ or more, more preferably 5 x 10 8 Ω / □ or more, further preferably 1.0 x 10 9 Ω / □ or more.

[0169] If the above surface resistance value is set to 1.0 x 10 8 Ω / □ or more, short-circuiting or current leakage can be appropriately prevented.

[0170] In addition, the above surface resistance value can be measured with the main body being "microammeter R8340" and the option being "shielding box R12702A" (both manufactured by ADVANCE-SYA INC.).

[0171] In the black matrix of the present application, the heat flow characteristic [ΔCD (%)] is preferably 2.0% or more, more preferably 3.0% or more, further preferably 4.0% or more.

[0172] If the above heat flow characteristic [ΔCD (%)] is 2.0% or more, loss of the pattern of the black matrix can be appropriately prevented.

[0173] The above heat flow characteristic [ΔCD (%)] can be calculated according to the following formula.

[0174] The above black matrix resist composition was applied to a glass substrate (EAGLE XG) using a spin coater so that the film thickness became 1 μm, and after pre-baking at 1000C for 3 minutes, exposure was performed using a high-pressure mercury lamp (UV cumulative light amount: 80 mJ / cm 2 ) and using a photomask having a line pattern of 20 μm, exposure was performed using a high-pressure mercury lamp (UV cumulative light amount: 80 mJ / cm 2 ). Next, development was performed at 230C in a 0.05% aqueous potassium hydroxide solution at a spray development pressure of 0.5 kgf / cm 2 , and spray water washing was performed at 3.0 kgf / cm 2 .

[0175] The line width of the 20 μm pattern on the obtained glass substrate was measured using a digital microscope, and the measured value was set as CDl (μm).

[0176] Next, the above glass substrate was post-baked at 2300C for 30 minutes, and the line width of the 20 μm pattern on the above glass substrate was measured using a digital microscope, and the measured value was set as CD2 (μm). The heat flow characteristic [ΔCD (%)] can be calculated according to the following formula.

[0177] ΔCD(%)={(CD2 / CD1)-1}×100

[0178] Since the pigment dispersion composition for black matrix, the resist composition for black matrix, and the black matrix of the present invention have the above-mentioned characteristics, they can be preferably used as black matrices for image display devices or touch panels, etc.

[0179] Examples

[0180] The present invention will now be illustrated with specific examples; however, the invention is not limited to these examples as long as it does not depart from its spirit and scope of application. It should be noted that, unless otherwise specified, in these examples, "parts" and "%" respectively represent "parts by mass" and "% by mass".

[0181] The various materials used in the following embodiments and comparative examples are described below.

[0182] <Black dye>

[0183] Carbon black (trade name "NEROX 305", average primary particle size of about 28nm, pH of about 2.8, manufactured by Orion Engineered Carbons)

[0184] <Pigment Dispersant>

[0185] DISPERBYK-167 (solid content 52 g / L, manufactured by BYK-Chemie)

[0186] <Amine compounds>

[0187] 2-Undecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.)

[0188] Benzotriazole (manufactured by Tokyo Chemical Industry Co., Ltd.)

[0189] Bis(2-ethylhexyl)amine (manufactured by Tokyo Chemical Industry Co., Ltd.)

[0190] 4-(3-Phenylacetyl)pyridine (manufactured by Tokyo Chemical Industry Co., Ltd.)

[0191] <Adhesive Resins>

[0192] ZCR-1569H (Epoxy acrylate resin, 70% solids by mass, manufactured by Nippon Kayaku Co., Ltd.)

[0193] <Organic Solvents>

[0194] PGMEA (Propylene Glycol Monomethyl Ether Acetate)

[0195] <Photopolymerization Initiator>

[0196] Irgacure OXE02 (trade name: "Irgacure OXE02", 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime)ethanone, manufactured by BASF Corporation)

[0197] <Photopolymerizable compound>

[0198] DPHA (dipentaerythritol hexaacrylate)

[0199] <Alkali-soluble resin>

[0200] WR-301 (product name: "WR-301", Cardo resin, acid value: 100 mgKOH / g, solid content: 45 mass%, manufactured by ADEKA Corporation)

[0201] <Preparation of dispersing composition>

[0202] (Dispersing composition 1)

[0203] Solsperse 12000 (sulfonated substance of phthalocyanine copper (containing about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Corporation) and 2-undecylimidazole were mixed at a mass ratio of 25:11 to obtain a dispersing composition 1.

[0204] (Dispersing composition 2)

[0205] Solsperse 12000 (sulfonated substance of phthalocyanine copper (containing about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Corporation) and benzotriazole were mixed at a mass ratio of 25:6 to obtain a dispersing composition 2.

[0206] (Dispersing composition 3)

[0207] Solsperse 12000 (sulfonated substance of phthalocyanine copper (containing about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Corporation) and bis(2-ethylhexyl)amine were mixed at a mass ratio of 25:12 to obtain a dispersing composition 3.

[0208] (Dispersing composition 4)

[0209] Solsperse 12000 (sulfonated substance of phthalocyanine copper (containing about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Corporation) and 4-(3-phenylpropyl)pyridine were mixed at a mass ratio of 5:2 to obtain a dispersing composition 4.

[0210] <Dispersing material>

[0211] Solsperse 12000 (sulfonate of copper phthalocyanine (about 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Corporation, Japan)

[0212] Solsperse 5000 (quaternary ammonium salt of sulfonate of copper phthalocyanine (about 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Corporation, Japan)

[0213] <Preparation of pigment dispersion composition for black matrix>

[0214] Each material was mixed to form the composition shown in Table 1, and kneaded with a bead mill for one day to prepare a pigment dispersion composition for black matrix.

[0215] [Table 1]

[0216]

[0217] <Preparation of resist composition for black matrix>

[0218] The above pigment dispersion composition for black matrix and other materials (photopolymerizable compound, alkali-soluble resin, photopolymerization initiator, and organic solvent) were uniformly mixed using a high-speed mixer in a manner to form the composition of Table 2, and filtered using a filter having a pore size of 3 μm to obtain the black matrix resist compositions of the examples and comparative examples.

[0219] <Evaluation Test>

[0220] (Surface resistance)

[0221] Each of the black matrix pigment dispersion resist compositions of the examples and comparative examples was coated on a glass substrate (EAGLE XG) using a spin coater to a film thickness of 1 μm, and after pre-baking at 100°C for 3 minutes, exposed to a high-pressure mercury lamp (UV cumulative light amount: 80 mJ / cm 2 ), and after post-baking at 230°C for 60 minutes, a black resist pattern (black matrix) formed only by the solid portions was prepared.

[0222] The surface resistance value of each of the prepared black resist patterns was measured using a microammeter R8340 as the main body and an option "shielding box R12702A" (both manufactured by ADVANCE Corporation). The results are shown in Table 2.

[0223] (Heat flow characteristics)

[0224] Each of the black matrix resist compositions was coated on a glass substrate (EAGLE XG) using a spin coater to a film thickness of 1 μm, and after pre-baking at 100°C for 3 minutes, exposed to a high-pressure mercury lamp (UV cumulative light amount: 80 mJ / cm2 ), and exposed with a high-pressure mercury lamp (UV cumulative light amount 80 mJ / cm 2 ) using a photomask having a line pattern of 20 μm. Next, development was performed at 23°C in 0.05% aqueous potassium hydroxide solution under a spray development pressure of 0.5 kgf / cm 2 , and then water washing was performed under a spray pressure of 3.0 kgf / cm 2 .

[0225] The 20 μm pattern line width on the obtained glass substrate was measured using a digital microscope, and the measured value was set as CD1 (μm).

[0226] Next, the 20 μm pattern line width on the glass substrate was measured using a digital microscope after post-baking the above glass substrate at 230°C for 30 minutes, and the measured value was set as CD2 (μm).

[0227] The heat flow characteristic [ΔCD (%)] was calculated according to the following formula.

[0228] ΔCD (%) = {(CD2 / CD1) - 1} x 100

[0229] [Table 2]

[0230]

[0231] In the examples using the pigment dispersion composition for a black matrix containing a black colorant, a sulfonate of copper phthalocyanine, and a specific amine compound in a prescribed amount, it was confirmed that a black matrix having a surface resistance value that is maintained even after post-baking and excellent heat flow characteristics can be formed.

[0232] Industrial applicability

[0233] A pigment dispersion composition for a black matrix that has a surface resistance value that is maintained even after post-baking and excellent heat flow characteristics can be formed is provided based on the present application.

Claims

1. A pigment dispersion composition for a black matrix, wherein, The black matrix pigment dispersion composition comprises a black colorant, a sulfonated copper phthalocyanine, and an amine compound. The amine compound is an imidazole compound and / or a triazole compound. The triazole compound is selected from at least one of 1,2,3-triazole, 1,2,4-triazole, 3-mercaptotriazole, and 3-amino-5-mercaptotriazole. The content of the amine compound is 0.1 to 1.5 parts by weight relative to 100 parts by weight of the black colorant.

2. The pigment dispersion composition for black matrix as described in claim 1, wherein, The black colorant is carbon black.

3. The pigment dispersion composition for black matrix as described in claim 2, wherein, The black colorant is acidic carbon black.

4. The pigment dispersion composition for black matrix as described in any one of claims 1 to 3, wherein, The imidazole compound is an alkyl imidazole.

5. The pigment dispersion composition for black matrix as described in claim 4, wherein, The alkylimidazolium has an alkyl group having 8 to 16 carbon atoms.

6. The pigment dispersion composition for black matrix as described in claim 5, wherein, The alkylimidazolium is a monoalkylimidazolium and has a straight-chain alkyl group having 8 to 16 carbon atoms.

7. The pigment dispersion composition for black matrix as described in claim 6, wherein, The alkylimidazole is 2-undecylimidazole.

8. The pigment dispersion composition for black matrix as described in any one of claims 1 to 3, wherein, The triazole compounds have a benzotriazole skeleton.

9. The pigment dispersion composition for black matrix as described in claim 8, wherein, The triazole compound is benzotriazole.

10. The pigment dispersion composition for black matrix as described in any one of claims 1 to 3, wherein, The sulfonated form of copper phthalocyanine has 0.5 to 3 sulfonic acid groups in its molecule.

11. A resist composition for black matrix, obtained from the pigment dispersion composition for black matrix according to any one of claims 1 to 10.

12. A black matrix formed by using a resist composition according to claim 11.

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