A touch panel and its preparation method, and a touch device

Abstract

The present application discloses a touch panel and a preparation method thereof, and a touch device, comprising: a plurality of transmitting electrode channels and a plurality of receiving electrode channels; a plurality of transmitting signal lines, each transmitting signal line can be optionally connected to at least one transmitting electrode channel, and the corresponding transmitting signal line combination mode on each transmitting electrode channel is different; a plurality of receiving signal lines, each receiving signal line can be optionally connected to at least one receiving electrode channel, and the corresponding receiving signal line combination mode on each receiving electrode channel is different; a first diode is arranged between each receiving signal line and each corresponding electrically connected receiving electrode channel, and a second diode is arranged between each transmitting signal line and each corresponding electrically connected transmitting electrode channel.

Description

Technical Field

[0001] The present application generally relates to the field of touch technology, and specifically relates to a touch panel and a preparation method thereof, and a touch device. Background Art

[0002] A touch screen, also known as a "touch screen" or "touch panel", is an inductive display device that can receive input signals such as contacts. In a touch display screen, the display screen is located on a conductive base plate, and the touch screen is located on the display screen.

[0003] The capacitive touch screen is provided with an emitting electrode and a sensing electrode made of transparent conductive material, and the emitting electrode and the sensing electrode are insulated from each other. When the screen is touched, due to the electric field of the human body, a coupling capacitor is formed between the finger and the emitting electrode and the sensing electrode in the touch screen; due to the change in capacitance of the touch point, an induced current flows to the touch point in the emitting electrode and the sensing electrode, and the position of the touch point can be accurately calculated through relevant calculations.

[0004] At present, the transmitting electrode and the receiving electrode are arranged vertically. When an electric pulse of a certain amplitude is applied to a certain channel of the transmitting electrode (other channels are suspended or grounded), all receiving channels will receive this signal through the cross-point sensing capacitor. The signal of the cross-point is only related to the position of the transmitting channel. If all the transmitting channels are scanned according to the above method and the receiving information of each cross-point is recorded, the touch state of the cross-point can be detected by comparing the information before the touch, and the coordinates of the cross-point can be calculated to determine which one or more cross-points are touched. This is the principle of capacitive touch screen.

[0005] However, if there is a large area touch capacitive touch screen, this single-channel scanning method is slow, affecting the processing speed of the touch screen. Moreover, in the current design of the touch panel drive circuit, multiple drive lines, such as multiple scan lines and multiple sensing lines, are often used to achieve the purpose of multi-finger touch. However, the larger the size of the touch panel, the more drive lines it requires, which also causes the area of ​​the touch panel drive circuit to increase accordingly. Summary of the invention

[0006] In view of the above defects or deficiencies in the prior art, it is desirable to provide a touch panel and a method for manufacturing the same, and a touch device, which can reduce the wiring area and achieve fast detection of narrow bezels and large-area touch.

[0007] In a first aspect, the present application provides a touch panel, comprising:

[0008] A plurality of transmitting electrode channels and a plurality of receiving electrode channels;

[0009] A plurality of transmitting signal lines, each transmitting signal line can be optionally connected to at least one transmitting electrode channel, and the corresponding transmitting signal line combination mode on each transmitting electrode channel is different;

[0010] A plurality of receiving signal lines, each receiving signal line can be optionally connected to at least one receiving electrode channel, and the corresponding receiving signal line combination mode on each receiving electrode channel is different;

[0011] A first diode is provided between each of the receiving signal lines and the corresponding electrically connected receiving electrode channels, and a second diode is provided between each of the transmitting signal lines and the corresponding electrically connected transmitting electrode channels.

[0012] Optionally, a first anode of the first diode is connected to the receiving channel electrode, and a first cathode is connected to the receiving signal line.

[0013] Optionally, the second anode of the second diode is connected to the transmitting signal line, and the second cathode is connected to the transmitting electrode channel.

[0014] Optionally, the transmitting signal line includes a first transmitting sub-signal line and a second transmitting sub-signal line, and the signals on the first transmitting sub-signal line and the second transmitting sub-signal line are the same, wherein:

[0015] The first transmitting sub-signal line is connected to a first end of the corresponding transmitting electrode channel, and the second transmitting sub-signal line is connected to a second end of the transmitting electrode channel.

[0016] Optionally, the second diode is provided between each of the first transmitting sub-signal lines and the corresponding electrically connected transmitting electrode channels; and the third diode is provided between each of the second transmitting sub-signal lines and the corresponding electrically connected transmitting electrode channels.

[0017] Optionally, the second anode of the second diode is connected to the transmitting signal line, and the second cathode is connected to the transmitting electrode channel; the third anode of the third diode is connected to the transmitting signal line, and the third cathode is connected to the transmitting electrode channel.

[0018] Optionally include:

[0019] substrate;

[0020] a first conductive layer located on the substrate, the first conductive layer comprising a first electrode arranged along a first direction and a second electrode arranged along a second direction, the first electrode comprising a plurality of first electrode blocks; the first electrode is used to form the transmitting electrode channel, and the second electrode is used to form the receiving electrode channel;

[0021] A second conductive layer is located on the substrate, wherein the second conductive layer includes a plurality of bridge structures for electrically connecting adjacent first electrode blocks.

[0022] Optionally, the receiving signal line is set on the first conductive layer and / or the second conductive layer; the transmitting signal line is set on the first conductive layer and / or the second conductive layer; the first diode is set on the first conductive layer or the second conductive layer; the second diode is set on the first conductive layer or the second conductive layer.

[0023] Optionally, the first conductive layer and / or the second conductive layer is a transparent silicon-based conductive material.

[0024] In a second aspect, the present application provides a method for preparing a touch panel, which is used to prepare any of the above touch panels, and the method comprises:

[0025] A first conductive layer is formed on a substrate, and patterned to form a first electrode arranged along a first direction, a second electrode arranged along a second direction, a transmitting signal line, and a receiving signal line, wherein the first electrode includes a plurality of first electrode blocks; the first electrode is used to form the transmitting electrode channel, and the second electrode is used to form the receiving electrode channel; the first conductive layer is a transparent silicon-based conductive material;

[0026] forming a photoresist layer on the first conductive layer;

[0027] Masking, exposing, developing, etching, and stripping the photoresist layer to form a photoresist retaining area and a photoresist removing area;

[0028] forming a doped region in the photoresist removal region by ion implantation to form a first diode and a second diode on the first conductive layer;

[0029] Stripping the photoresist in the photoresist reserved area;

[0030] A second conductive layer is formed on the substrate and patterned to form a bridging structure, wherein the bridging structure is used to electrically connect adjacent first electrode blocks.

[0031] Optionally, the photoresist removal area corresponds to an area of ​​the first electrode and a receiving signal line.

[0032] In a third aspect, the present application provides a touch device, comprising any touch panel as described above.

[0033] The technical solution provided by the embodiments of the present application may have the following beneficial effects:

[0034] The touch panel provided in the embodiment of the present application utilizes the characteristic of small reverse leakage current of semiconductor PN junction diodes and is applied to touch transmission channels and touch receiving channels to improve touch detection accuracy; by multiplexing signal lines, a unique coding method is formed corresponding to electrode channels, so that the touch panel can be prepared to determine the electrode channel corresponding to the touch point; the detection speed is improved, the routing area is reduced, and rapid detection of narrow bezels and large-area touch is achieved. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Other features, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:

[0036] Figure 1 A schematic diagram of the structure of a touch panel provided in an embodiment of the present application;

[0037] Figure 2 A truth table of 4 transmit signal lines and 14 transmit electrode channels provided in an embodiment of the present application;

[0038] Figure 3 A truth table of 7 receiving signal lines and 35 transmitting electrode channels provided in an embodiment of the present application;

[0039] Figure 4 A schematic cross-sectional view of a touch panel provided in an embodiment of the present application;

[0040] Figure 5 A schematic structural diagram of a first conductive layer provided in an embodiment of the present application;

[0041] Figure 6 A schematic diagram of the structure of a second conductive layer provided in an embodiment of the present application;

[0042] Figure 7 A flow chart of a touch panel manufacturing method provided in an embodiment of the present application;

[0043] Figure 8 A schematic diagram of a diode preparation principle provided in an embodiment of the present application;

[0044] Fig. 9 A schematic diagram of a first removal zone provided in an embodiment of the present application;

[0045] Fig.10 A schematic diagram of a first reserved area provided in an embodiment of the present application;

[0046] Fig.11 A schematic diagram of the distribution of diodes provided in an embodiment of the present application;

[0047] Fig.12A flow chart of a PN junction preparation method provided in an embodiment of the present application;

[0048] Fig.13 A schematic diagram of a second removal zone provided in an embodiment of the present application;

[0049] Fig.14 A schematic diagram of a second reserved area provided in an embodiment of the present application;

[0050] Fig.15 A flow chart of another PN junction preparation method provided in an embodiment of the present application. DETAILED DESCRIPTION

[0051] The present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the relevant invention, rather than to limit the invention. It is also necessary to explain that, for ease of description, only the parts related to the invention are shown in the accompanying drawings.

[0052] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0053] Please see Figure 1 , a touch panel comprising:

[0054] A plurality of transmitting electrode channels 1 and a plurality of receiving electrode channels 2;

[0055] A plurality of transmitting signal lines 3, each transmitting signal line 3 is optionally connected to at least one transmitting electrode channel 1, and the corresponding transmitting signal lines 3 on each transmitting electrode channel 1 are combined in different ways;

[0056] A plurality of receiving signal lines 4, each receiving signal line 4 can be optionally connected to at least one receiving electrode channel 2, and the combination of the receiving signal lines 4 corresponding to each receiving electrode channel 2 is different;

[0057] A first diode 5 is provided between each of the receiving signal lines 4 and the corresponding receiving electrode channels 2 electrically connected thereto, and a second diode 6 is provided between each of the transmitting signal lines 3 and the corresponding transmitting electrode channels 1 electrically connected thereto.

[0058] The first anode of the first diode 5 is connected to the receiving channel electrode, and the first cathode is connected to the receiving signal line 4. The second anode of the second diode 6 is connected to the transmitting signal line 3, and the second cathode is connected to the transmitting electrode channel 1.

[0059] In the embodiment of the present application, the characteristic of small reverse leakage current of semiconductor PN junction diode is utilized and applied to touch transmission channel and touch receiving channel to improve touch detection accuracy; by multiplexing signal lines, a unique coding method corresponding to electrode channels is formed, which enables the touch panel to be ready to determine the electrode channel corresponding to the touch point.

[0060] In the embodiment of the present application, by multiplexing the signal lines, a receiving electrode channel 2 is connected to one or more receiving signal lines, a transmitting electrode channel 1 is connected to more than one transmitting signal line, and by using different combinations of the signal lines connected on each electrode channel, each electrode channel has a unique code, so that the touch panel can prepare to determine the electrode channel corresponding to the touch point. In the embodiment of the present application, the different combinations of signal lines include different numbers of connected signal lines or different serial numbers.

[0061] In the implementation of the present application, the transmitting electrode channels 1 arranged along the first direction X are marked as T0, T1, ..., Ti; the receiving electrode channels 2 arranged along the second direction Y are marked as R0, R1, ..., Rj. The transmitting signal lines are marked as TA1, TA2, ..., TAp; the receiving signal lines are marked as RA1, RA2, ..., RAq; wherein i / j / p / q are natural numbers.

[0062] According to the mathematical combination method, there can be 2p-1 valid combinations of p transmission signal lines; according to the mathematical combination method, there can be 2q-1 valid combinations of q transmission signal lines. In application, the connection method between the transmission electrode channel 1 and the transmission signal line, and the connection method between the reception electrode channel 2 and the reception signal line can be arbitrarily selected from the valid combinations, and this application does not limit this.

[0063] In the present application, a limited number of TAx and RAx combinations can be realized by setting a truth table. According to the number of Tx and Rx channels used by the touch screen in the actual application, the truth table is set in the internal program of the touch IC to realize the channel configuration.

[0064] In the present application, binary numbers 0 and 1 are used as examples to schematically illustrate signal routing, wherein 0 indicates that the corresponding signal routing is not connected to the electrode channel, and 1 indicates that the corresponding signal routing is connected to the electrode channel. Figure 2 A truth table of 4 transmitting signal lines and 14 transmitting electrode channels 1 is shown in FIG. Figure 3 A truth table of 7 receiving signal lines and 35 transmitting electrode channels 1 is shown in FIG.

[0065] It should be noted that in specific applications, the data of the transmitting electrode routing and the receiving electrode routing can be adjusted according to the number of electrode channels, the area of ​​the border area on the touch panel, or the area of ​​the bonding area on the touch IC, and the actual number of corresponding signal routings in each electrode channel and the arrangement relationship of all signal buses can be based on the actual binary settings.

[0066] For example, Figure 1 Schematic diagram of a connection method of three transmitting signal lines and four transmitting electrode channels 1, and schematic diagram of a connection method of three receiving signal lines and six receiving electrode channels 2 are shown in FIG.

[0067] Specifically, when p=3, the binary numbers when the signal can be sensed are: (1, 0, 0), (1, 1, 0), (1, 1, 1), (0, 1, 0), (0, 0, 1), (0, 1, 1), (1, 0, 1). In this embodiment, when i=4, T0=(1, 0, 0), T1=(1, 1, 0), T2=(0, 1, 0), T3=(0, 0, 1) can be selected as the combination mode of forming the connection between the transmitting electrode channel 1 and the transmitting signal line 3.

[0068] Similarly, when q=6, j=6, the selected combination of the receiving electrode channel 2 and the receiving signal line 4 is R0=(1,0,0), R1=(1,1,0), R2=(1,0,1), R3=(0,1,0), R4=(0,1,1), R5=(0,0,1).

[0069] The present application forms a specific transmitting signal channel by connecting a receiving electrode channel 2 with a uniquely coded transmitting signal line, and forms a specific receiving signal channel by connecting a transmitting electrode channel 1 with a uniquely coded receiving signal line. When touching, the effective signals on the transmitting signal channel and the receiving signal channel can be judged through the truth table, and the sensing position can be determined.

[0070] The present application can be applied to touch panels of various sizes. When the size is large, due to the increase in the length of the transmitting electrode, the voltage drop on the same transmitting electrode channel 1 increases, the signal is delayed, etc., which reduces the charging rate on the same transmitting electrode channel 1 and may also cause a decrease in the capacitance detection accuracy on the receiving electrode.

[0071] In order to overcome the above defects, in one embodiment of the present application, the transmitting signal line 3 includes a first transmitting sub-signal line 8 and a second transmitting sub-signal line 9, and the signals on the first transmitting sub-signal line 8 and the second transmitting sub-signal line 9 are the same.

[0072] The first transmitting sub-signal line 8 is connected to a first end of the corresponding transmitting electrode channel 1 , and the second transmitting sub-signal line 9 is connected to a second end of the transmitting electrode channel 1 .

[0073] The second diode 6 is provided between each of the first transmitting sub-signal lines 8 and the corresponding electrically connected transmitting electrode channels 1; the third diode 7 is provided between each of the second transmitting sub-signal lines 9 and the corresponding electrically connected transmitting electrode channels 1. The second anode of the second diode 6 is connected to the transmitting signal line 3, and the second cathode is connected to the transmitting electrode channel 1; the third anode of the third diode 7 is connected to the transmitting signal line 3, and the third cathode is connected to the transmitting electrode channel 1.

[0074] In the embodiment of the present application, by changing the connection mode of the transmitting signal channel and the receiving signal channel, and by means of the diode between the signal line and the electrode channel, the function of the data selector is realized, and multi-channel driving can be realized. When the driver IC outputs a high level through the transmitting signal line 3, the high level is simultaneously added to the unidirectional current of the transmitting electrode line to drive the transmitting electrode through the diode; when the driver IC outputs a low level through the transmitting signal line 3, it outputs zero voltage after being processed by the input signal processor, so that the diode is reverse biased and cut off, and the transmitting electrode line is not driven.

[0075] In the embodiment of the present application, the touch panel adopts a multiplexed routing method, and the TOS device can be used to set the range of its electrical signal value to confirm whether the product is defective; considering that the signal value of the reference analog signal can only confirm whether the product is defective, it is difficult to directly determine which channels have abnormalities (an abnormality in the signal of one channel will affect several analog signals). For the poor touch work of the touch screen provided by this solution, it is recommended that the test equipment apply the TOS temperature calibration function to facilitate accurate identification of the defective area; note that since the number of routing lines in the touch area is greatly compressed, a larger interval can be left between the routing lines in the touch area, the incidence of defective touch areas will be greatly reduced, and the testing requirements will also be reduced accordingly.

[0076] In the embodiment of the present application, regarding the arrangement of touch electrodes and wiring on the touch panel, as shown in FIG. Figure 4 As shown, including:

[0077] Substrate 10; the substrate 10 may be, for example, a transparent glass substrate 10, a plastic substrate 10 or a display screen.

[0078] The first conductive layer 20 located on the substrate 10 is as follows: Figure 5As shown, the first conductive layer 20 includes a first electrode 40 arranged along a first direction X and a second electrode 50 arranged along a second direction Y, the first electrode 40 includes a plurality of first electrode blocks 90; the first electrode 40 is used to form the transmitting electrode channel 1, and the second electrode 50 is used to form the receiving electrode channel 2.

[0079] The second conductive layer 30 located on the substrate 10 is as follows: Figure 6 As shown, the second conductive layer 30 includes a plurality of bridge structures 60 for electrically connecting adjacent first electrode blocks 90. The bridge structure 60 electrically connects two adjacent first electrode blocks 90 so that the first electrode blocks 90 are directly electrically connected through the bridge structure 60.

[0080] In this embodiment, the first direction and the second direction are arranged perpendicular to each other. In other embodiments, the first direction and the second direction may be arranged to cross each other at other angles, which is not limited in the present invention.

[0081] In the embodiment of the present application, the touch circuit does not have high requirements on the circuit conductivity. The first conductive layer 20 and the second conductive layer 30 are transparent silicon-based conductor materials. The first conductive layer 20 and / or the second conductive layer 30 can be transparent conductive materials such as monocrystalline silicon, polycrystalline silicon, and amorphous silicon.

[0082] In the embodiment of the present application, the touch panel may further include other hierarchical structures, for example, an insulating layer 70 is provided between the first conductive layer 20 and the second conductive layer 30, and the insulating layer 70 may be formed of an inorganic insulating material and / or an organic insulating material. For example, the material of the insulating layer 70 includes silicon nitride, silicon oxide, benzocyclobutene, polyester film or acrylic resin, etc. A contact hole 80 may also be provided on the insulating layer 70, for electrical connection between the bridge structure 60 and the first electrode block 90 or electrical connection between the signal line and the diode, etc.

[0083] The first conductive layer 20 and the second conductive layer 30 may be directly disposed on the substrate 10 or on the insulating layer 70. The material of the first conductive layer 20 and the second conductive layer 30 may be formed by doping impurities into a silicon-based material layer to increase the conductivity of the transparent silicon conductive layer.

[0084] It should be noted that, in the embodiment of the present application, the stacking manner of the first conductive layer 20 and the second conductive layer 30 on the substrate 10 is not limited, and the first conductive layer 20 and the second conductive layer 30 can be both arranged on the same side of the substrate 10, including the first conductive layer 20 being arranged on the side of the second conductive layer 30 away from the substrate 10 or on the side close to the substrate 10; the first conductive layer 20 and the second conductive layer 30 can also be arranged on different sides of the substrate 10. Different arrangements can be made depending on the device or application scenario.

[0085] In the embodiment of the present application, the first electrode 40 is an independent structure of a plurality of first electrode blocks 90, and the second electrode 50 is a continuous structure formed by a plurality of second electrode blocks 91 through a connecting section 92. In the embodiment of the present application, a schematic structure in which the first electrode block 90 and the second electrode block 91 are diamond-shaped is shown. When applied, the first electrode block 90 and the second electrode block 91 can be various geometric shapes, such as square, circular, triangular, hexagonal or octagonal, etc., and are not limited to the above embodiment. The actual structure and setting method of the electrode block can be set according to the requirements of the resistance value and the process capability.

[0086] The receiving signal line and the transmitting signal line are arranged in the frame area of ​​the touch panel. Exemplarily, the receiving signal line 4 includes a first routing line 31 extending along a first direction, and the first routing line 31 is used to extend from the position of the driving IC to the corresponding position of the corresponding receiving electrode channel 2; the transmitting signal line (first transmitting sub-signal line 8) includes a second routing line 32 extending along a second direction, and the second routing line 32 is used to extend from the position of the driving IC to the corresponding position of the corresponding transmitting electrode channel 1 (first end); the transmitting signal line (second transmitting sub-signal line 9) includes a third routing line 33 extending along the first direction and a fourth routing line 34 extending along the second direction, the third routing line 33 is used to extend from the position of the driving IC to the corresponding position of the corresponding transmitting electrode channel 1 (second end), and the fourth routing line 34 is used to extend from one end of the third routing line 33 to the corresponding position of the corresponding transmitting electrode channel 1.

[0087] In the embodiment of the present application, the number of signal lines is greatly reduced by multiplexing the signal lines. In order to reduce the thickness of the touch device or simplify the process, the signal lines and electrodes can be arranged on the same conductive layer. For example, the receiving signal line 4 is arranged on the first conductive layer 20 and / or the second conductive layer 30; the transmitting signal line 3 is arranged on the first conductive layer 20 and / or the second conductive layer 30; the first diode 5 is arranged on the first conductive layer 20 or the second conductive layer 30; the second diode 6 is arranged on the first conductive layer 20 or the second conductive layer 30.

[0088] Optionally, the first electrode block 90, the second electrode 50, the bridge structure 60, the receiving signal line 4, and the transmitting signal line 3 are all made of transparent silicon-based conductive materials. The first diode 5, the second diode, and the third diode 7 can be prepared in the same layer as the electrodes and the signal lines, and are also prepared from transparent silicon-based conductive materials.

[0089] It should be noted that, in some embodiments, the routing of the signal line can be arranged on both the first conductive layer 20 and the second conductive layer 30 to prevent the voltage drop from being increased due to the length of the routing line, resulting in reduced touch detection accuracy or short circuits in the application. When setting, part of the routing located on the first conductive layer 20 and part of the routing on the second conductive layer 30 are electrically connected through vias or the like. The first diode 5, the second diode 6 and the third diode 7 can be distributed on the same layer, for example, on the first conductive layer 20 or the second conductive layer 30, or on different conductive layers. When applied, different settings can be made according to different devices or application scenarios, and this application does not limit this.

[0090] Compared with the prior art, in the embodiment of the present application, a diode is added between the electrode channel and the wiring, so that the preparation process of the diode needs to be added during the preparation process, resulting in a complicated preparation process. The present application provides a method for preparing a touch panel, which is used to prepare the touch panel as described above, simplifies the preparation method, does not cause moiré, does not have a negative impact on the image quality and characteristics of the product, and is also helpful to reduce voltage and reduce product power consumption to a certain extent.

[0091] like Figure 7 As shown, the method includes:

[0092] S02, forming a first conductive layer 20 on a substrate, and patterning to form a first electrode 40 arranged along a first direction, a second electrode 50 arranged along a second direction, a transmitting signal line 3 and a receiving signal line 4, wherein the first electrode 40 includes a plurality of first electrode blocks 90; the first electrode 40 is used to form the transmitting electrode channel 1, and the second electrode 50 is used to form the receiving electrode channel 2; the first conductive layer 20 is a transparent silicon-based conductive material;

[0093] S04, forming a photoresist layer on the first conductive layer 20;

[0094] S06, masking, exposing, developing, etching, and stripping the photoresist layer to form a photoresist retaining area and a photoresist removal area;

[0095] S08, forming a doped region in the photoresist removal region by ion implantation to form a first diode 5 and a second diode 6 on the first conductive layer 20;

[0096] S10, stripping the photoresist in the photoresist reserved area;

[0097] S12 , forming a second conductive layer 30 on the substrate, and patterning to form a bridge structure 60 , wherein the bridge structure 60 is used to electrically connect adjacent first electrode blocks 90 .

[0098] It should be noted that, in the embodiment of the present application, the first conductive layer 20 and the second conductive layer 30 may be formed by sputtering, printing, photolithography, physical vapor deposition (PVD) or chemical vapor deposition (CVD). The present application does not limit this. For forming the first electrode block 90, the second electrode 50, the receiving signal line 4,

[0099] In this application, the "patterning" process refers to the process steps of forming a specific pattern structure, which may include one or more process steps such as photoresist coating, exposure, development, etching and photoresist stripping; it may also be an imprinting process, inkjet printing process or other technical means in the art that can use masks to achieve patterning and form the desired pattern structure. This application does not limit the patterning method of electrode blocks and wiring. Some examples of material removal processes include mask and etching processes, laser ablation processes and other similar technologies.

[0100] In addition, when forming the photoresist retention area and the photoresist removal area in the present application, the accuracy requirement for the photoresist mask is not high, and an FMM mask plate can be used. Forming the diode in this way can simplify the process and save costs.

[0101] In the embodiment of the present application, the diode is formed by using different doping processes to make a P-type semiconductor and an N-type semiconductor on the same semiconductor substrate (usually silicon or germanium) through diffusion, and a space charge region is formed at their interface. Figure 8 shown.

[0102] In the embodiment of the present application, the diode is formed by using the semiconductor of the first conductive layer 20 as a substrate. The material of the substrate can be an intrinsic semiconductor or an N-type semiconductor material. Then, ion implantation is performed in a partial area of ​​the substrate to form a P-type semiconductor material in a partial area of ​​the substrate. A PN junction is formed between the main area of ​​the substrate and the implanted area to form a diode in a specific area.

[0103] In the embodiment of the present application, the PN junction positions will not cause any optical or stress impact on the product when they are reasonably distributed. Fig. 9 and 11As shown, the specific areas for forming the diodes include a first specific area P1 for forming the first diode 5, a second specific area P2 for forming the second diode 6, and a third specific area P3 for forming the third diode 7, wherein the first specific area is the junction area between the receiving signal line 4 and the second electrode 50, the second specific area is the junction area between the transmitting signal line 3 (first transmitting sub-signal line 8) and the first electrode 40, and the third specific area is the junction area between the transmitting signal line 3 (second transmitting sub-signal line 9) and the first electrode 40.

[0104] Intrinsic semiconductor: refers to a pure semiconductor that is completely free of impurities and lattice defects. It generally refers to a pure semiconductor whose conductivity is mainly determined by the intrinsic excitation of the material. Typical intrinsic semiconductors include silicon (Si), germanium (Ge) and gallium arsenide (GaAs).

[0105] N-type semiconductor: In silicon crystals (or germanium crystals) doped with a small amount of impurity phosphorus (or antimony), since semiconductor atoms (such as silicon atoms) are replaced by impurity atoms, four of the five outer electrons of the phosphorus atoms form covalent bonds with the surrounding semiconductor atoms, and the extra electron is almost unbound and can easily become a free electron. As a result, N-type semiconductors become semiconductors with a higher electron concentration, and their conductivity is mainly due to the conduction of free electrons.

[0106] P-type semiconductor: In a silicon crystal (or germanium crystal) doped with a small amount of impurity boron (or indium), as the semiconductor atoms (such as silicon atoms) are replaced by impurity atoms, a "hole" is generated when the three outer electrons of the boron atom form covalent bonds with the surrounding semiconductor atoms. This hole may attract bound electrons to "fill" it, making the boron atom a negatively charged ion.

[0107] It should be noted that, in the embodiment of the present application, the first positive electrode of the first diode 5 is connected to the receiving channel electrode, and the first negative electrode is connected to the receiving signal line 4. The second positive electrode of the second diode 6 is connected to the transmitting signal line 3, and the second negative electrode is connected to the transmitting electrode channel 1; the third positive electrode of the third diode 7 is connected to the transmitting signal line 3, and the third negative electrode is connected to the transmitting electrode channel 1.

[0108] In the embodiment of the present application, the first diode 5, the second diode 6, and the third transistor are all disposed on the first conductive layer 20 for illustrative purposes only. In other embodiments, the first diode 5, the second diode 6, and the third diode 7 may be disposed on the first conductive layer 20, the second conductive layer 30, or other conductive layers, and the present application does not limit this.

[0109] In the embodiment of the present application, the substrate in the corresponding photoresist reserved area is an N-type semiconductor material, and after ions are injected into the corresponding injection area, a P-type semiconductor material is formed, and the unidirectional conductivity of the formed PN junction is formed. In the embodiment of the present application, the photoresist removal area corresponds to the area of ​​the first electrode 40 and the receiving signal line 4, and the location of the photoresist reserved area is other areas of the first conductive layer 20.

[0110] like Fig.12 As shown, the method includes:

[0111] S101 , forming a photoresist layer on the first conductive layer 20 ; the material of the first conductive layer 20 is an N-type semiconductor material.

[0112] S103, masking, exposing, developing, etching, and stripping the photoresist layer to form a first reserved area D1 and a first removed area D2; the first removed area D2 includes a first area D3 corresponding to the transmitting signal line 3 and a second area D4 corresponding to the receiving electrode channel 2, such as Fig. 9 The first reserved area D1 is other areas on the first conductive layer 20, such as Fig.10 shown.

[0113] S105, forming a P-type region in the first removal area D2 by ion implantation. The doping ions are boron ions. Of course, in other embodiments, those skilled in the art may also select other feasible positive ions to dope and form the P-type region as needed.

[0114] S107, stripping the photoresist in the first reserved area D1. The first reserved area D1 is an N-type area.

[0115] Among them, the first area D3 is the area corresponding to the transmitting signal line 3, and the first area D3 includes a continuous sub-area covering (completely covering or partially covering) the second wiring 32 and extending along the second direction, a continuous sub-area covering (completely covering or partially covering) the third wiring 33 and extending along the first direction, and a continuous sub-area covering (completely covering or partially covering) the fourth wiring and extending along the second direction. The second area D4 is the area corresponding to the receiving electrode channel 2, and the second area D4 includes multiple sub-areas. The second area D4 includes a continuous area covering (completely covering or partially covering) the second electrode 50 and extending along the second direction.

[0116] It is worth noting that in the embodiment of the present application, the first area D3 and the second area D4 are used as the injection area. Since the first electrode 40 in the transmitting electrode channel 1 needs to be bridged, the injection area is selected in the area corresponding to the transmitting signal line 3. Considering the barrier penetration effect, the entire continuous area is selected in the injection area to enhance the unidirectional conductivity of the diode and improve the touch detection accuracy.

[0117] It should be noted that the embodiment of the present application is not limited to the above-mentioned method of implementing the injection in the diode, and the material for forming the first conductive layer 20 may also be a P-type semiconductor material, the location of the photoresist reserved area is the area corresponding to the first electrode 40 and the receiving signal line 4, and the location of the photoresist stripping area is other areas of the first conductive layer 20. When applied, the selection is made according to the type of diode and the unidirectional conductive direction.

[0118] In the present application, the conductivity of the implanted area can be increased while forming a PN junction by means of implantation. Similarly, in order to improve the conductivity of the unimplanted area on the substrate (as a trace), reverse implantation (negative doping) can be performed, and ions of the same type (N type) as the substrate can be implanted at the position corresponding to the existing coverage to improve the conductive formation of the trace.

[0119] In this application, reverse injection is performed in the area of ​​the receiving signal line 4 and the area of ​​the transmitting electrode as an example. Fig.15 As shown, the method includes:

[0120] S201 , forming a photoresist layer on the first conductive layer 20 ; the material of the first conductive layer 20 is an N-type semiconductor material.

[0121] S203, masking, exposing, developing, etching, and stripping the photoresist layer to form a second reserved area D5 and a second removed area D6; the second removed area D6 includes a third area D7 corresponding to the receiving signal line 4 and a fourth area D8 corresponding to the transmitting electrode, such as Fig.13 The second reserved area D5 is other areas on the first conductive layer 20, such as Fig.14 shown.

[0122] S205, forming a heavily doped N-type region in the second removal area D6 by ion implantation. The doping ions are phosphorus ions. Of course, in other embodiments, those skilled in the art may also select other feasible negative ions to dope and form the N-type region as needed.

[0123] S207, stripping the photoresist in the second reserved area D5. The P-type region in the second reserved area D5.

[0124] Among them, the third area D7 is the area corresponding to the receiving signal line 4, the third area D7 includes covering (completely covering or partially covering) the first routing line 31, including a continuous area extending along the first direction, the fourth area D8 is the area corresponding to the transmitting electrode channel 1, including multiple sub-areas, and the fourth area D8 includes covering (completely covering or partially covering) the first electrode 40 and extending along the second direction.

[0125] It is worth noting that in the embodiment of the present application, the method of forming the P-type region by positive doping injection and the method of forming the N-type region by negative doping injection can be used in combination, and the order of the processes is not limited. When applied, it is selected according to the needs. It is also possible to form the pattern of the receiving signal line 4 and the second electrode 50 by negative doping (N-type) of the intrinsic semiconductor, and form the pattern of the transmitting signal line 3 and the first electrode 40 by positive doping (P-type).

[0126] The present application also provides a touch device, including any of the above-described touch panels. The present application does not impose any specific restrictions on the applicability of the touch device, which can be any product or component with a touch function, such as a television, a laptop, a tablet computer, a wearable display device, a mobile phone, a car display, a navigation, an e-book, a digital photo frame, an advertising light box, etc.

[0127] It should be understood that the orientation or position relationship indicated by terms such as "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0128] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0129] Unless otherwise defined, the technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art in the technical field of the present invention. The terms used herein are only for describing specific implementation purposes and are not intended to limit the present invention. Terms such as "setting" and the like appearing in this article can mean that one component is directly attached to another component, or that one component is attached to another component through an intermediate. Features described in this article in one embodiment may be applied to another embodiment alone or in combination with other features, unless the feature is not applicable in the other embodiment or otherwise specified.

[0130] The present invention has been described through the above-mentioned embodiments, but it should be understood that the above-mentioned embodiments are only for the purpose of example and illustration, and are not intended to limit the present invention to the described embodiments. It can be understood by those skilled in the art that more variations and modifications can be made according to the teachings of the present invention, and these variations and modifications all fall within the scope of the protection claimed by the present invention.

Claims

1. A touch panel, characterized in that: include: A plurality of transmitting electrode channels and a plurality of receiving electrode channels; A plurality of transmitting signal lines, each transmitting signal line can be optionally connected to at least one transmitting electrode channel, and the corresponding transmitting signal line combination mode on each transmitting electrode channel is different; A plurality of receiving signal lines, each receiving signal line can be optionally connected to at least one receiving electrode channel, and the corresponding receiving signal line combination mode on each receiving electrode channel is different; A first diode is provided between each of the receiving signal lines and the corresponding electrically connected receiving electrode channels, and a second diode is provided between each of the transmitting signal lines and the corresponding electrically connected transmitting electrode channels.

2. The touch panel according to claim 1, characterized in that: A first anode of the first diode is connected to the receiving electrode channel, and a first cathode of the first diode is connected to the receiving signal line.

3. The touch panel according to claim 1, characterized in that: A second anode of the second diode is connected to the transmitting signal line, and a second cathode of the second diode is connected to the transmitting electrode channel.

4. The touch panel according to claim 1, characterized in that: The transmitting signal line includes a first transmitting sub-signal line and a second transmitting sub-signal line, and the signals on the first transmitting sub-signal line and the second transmitting sub-signal line are the same, wherein: The first transmitting sub-signal line is connected to a first end of the corresponding transmitting electrode channel, and the second transmitting sub-signal line is connected to a second end of the transmitting electrode channel.

5. The touch panel according to claim 4, characterized in that: The second diode is arranged between each of the first transmitting sub-signal lines and the corresponding electrically connected transmitting electrode channels; and the third diode is arranged between each of the second transmitting sub-signal lines and the corresponding electrically connected transmitting electrode channels.

6. The touch panel according to claim 5, characterized in that: The second anode of the second diode is connected to the transmitting signal line, and the second cathode is connected to the transmitting electrode channel; the third anode of the third diode is connected to the transmitting signal line, and the third cathode is connected to the transmitting electrode channel.

7. The touch panel according to claim 1, characterized in that: include: substrate; a first conductive layer located on the substrate, the first conductive layer comprising a first electrode arranged along a first direction and a second electrode arranged along a second direction, the first electrode comprising a plurality of first electrode blocks; the first electrode is used to form the transmitting electrode channel, and the second electrode is used to form the receiving electrode channel; A second conductive layer is located on the substrate, wherein the second conductive layer includes a plurality of bridge structures for electrically connecting adjacent first electrode blocks.

8. The touch panel according to claim 7, characterized in that: The receiving signal line is arranged on the first conductive layer and / or the second conductive layer; the transmitting signal line is arranged on the first conductive layer and / or the second conductive layer; the first diode is arranged on the first conductive layer or the second conductive layer; The second diode is disposed on the first conductive layer or the second conductive layer.

9. The touch panel according to claim 7, characterized in that: The first conductive layer and / or the second conductive layer is a transparent silicon-based conductive material.

10. A method for preparing a touch panel, characterized in that: For preparing the touch panel according to any one of claims 1 to 9, the method comprises: A first conductive layer is formed on a substrate, and patterned to form a first electrode arranged along a first direction, a second electrode arranged along a second direction, a transmitting signal line, and a receiving signal line, wherein the first electrode includes a plurality of first electrode blocks; the first electrode is used to form the transmitting electrode channel, and the second electrode is used to form the receiving electrode channel; the first conductive layer is a transparent silicon-based conductive material; forming a photoresist layer on the first conductive layer; Masking, exposing, developing, etching, and stripping the photoresist layer to form a photoresist retaining area and a photoresist removing area; forming a doped region in the photoresist removal region by ion implantation to form a first diode and a second diode on the first conductive layer; Stripping the photoresist in the photoresist reserved area; A second conductive layer is formed on the substrate and patterned to form a bridging structure, wherein the bridging structure is used to electrically connect adjacent first electrode blocks.

11. The method according to claim 10, characterized in that The photoresist removal area corresponds to the area of ​​the first electrode and the receiving signal line.

12. A touch device, characterized in that: It comprises a touch panel as described in any one of claims 1 to 9.

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