A display module and its preparation method

Abstract

The present invention relates to a display module and a method for preparing the same. The display module has a display area and a non-display area located outside the display area, and includes an array substrate, a first inorganic layer, a second inorganic layer, a first setting groove, and an electrode line. The first inorganic layer is provided on the array substrate, including a first inorganic portion located in the non-display area; the second inorganic layer is provided on the side of the first inorganic layer away from the array substrate, including a second inorganic portion located above the first inorganic portion; the first setting groove is provided in the non-display area and surrounds a portion of the display area, and the first setting groove passes through the first inorganic portion and the second inorganic portion; wherein the first setting groove is open, and in the direction from the array substrate toward the second inorganic layer, the groove wall of the first setting groove is inclined or the groove wall of the first setting groove is stepped; the electrode line is at least partially provided in the first setting groove.

Description

Technical Field

[0001] The present invention belongs to the field of display technology, and in particular relates to a display module and a preparation method thereof. Background Art

[0002] With the continuous development of display panel technology, organic light-emitting diode (OLED) display devices have become the next generation display structure with great competitiveness and development prospects due to their advantages such as all-solid-state structure, high brightness, full viewing angle, fast response speed and flexible display. Micro-OLED display products are widely used as a commonly used organic light-emitting diode display device. Figure 1 As shown, in the related technology for preparing Micro-OLED display products, after the anodes (not shown) are formed on the array substrate 10', there is a lateral height coverage (LHC) process to set an inorganic layer (such as a silicon oxide layer) between adjacent anodes to reduce the height difference between the anode surface and the spacer between adjacent anodes. In the LHC process, in order to ensure that the height of the inorganic layer in the spacer between the adjacent anodes is level. In the LHC process, an inorganic material layer is specifically set on the array substrate 10' provided with the anodes, and the inorganic material layer is etched to thin the inorganic material layer to be relatively flush with the anode surface. The inorganic material layer set in this process will also cover the edge area of ​​the array substrate (which can be understood as the non-display area). However, when etching the inorganic material layer, the etching is mainly based on the specific structure of the display area. This will result in a layer of residual inorganic material layer 31' left on the non-display layer. When the pixel defining layer is subsequently set, a pixel defining layer is superimposed on the inorganic material layer 31' and extends to the inorganic layer 40' of the non-display area, so that when the setting groove 340' of the cathode ring is subsequently formed, the depth of the setting groove 340' is relatively large, and the climbing ability of the cathode ring material 50' is not high, so that the cathode ring is easily broken (such as the fracture 501') above the notch of the setting groove 340 when the cathode ring is formed. Summary of the Invention

[0003] According to a first aspect of an embodiment of the present invention, there is provided a display module having a display area and a non-display area located outside the display area, comprising:

[0004] array substrate;

[0005] A first inorganic layer is provided on the array substrate and includes a first inorganic portion located in the non-display area;

[0006] a second inorganic layer, provided on a side of the first inorganic layer facing away from the array substrate, comprising a second inorganic portion located on the first inorganic portion;

[0007] a first arrangement groove, provided in the non-display area and surrounding a portion of the display area, the first arrangement groove penetrating the first inorganic portion and the second inorganic portion; wherein the first arrangement groove is open, and in a direction from the array substrate toward the second inorganic layer, a groove wall of the first arrangement groove is inclined or a groove wall of the first arrangement groove is stepped;

[0008] The electrode line layer is at least partially disposed in the first arrangement groove.

[0009] In some embodiments, the groove wall of the first setting groove is inclined, and the slope angle of the groove wall of the first setting groove is 20° to 60°.

[0010] In some embodiments, the groove wall of the first setting groove is step-shaped, and the groove wall of the first setting groove includes a first groove wall close to the array substrate, a second groove wall away from the array substrate, and a third groove wall connected therebetween, and the third groove wall forms a step.

[0011] In some embodiments, the display module includes a plurality of first electrodes, the plurality of first electrodes are arranged in a display area on the array substrate, and the plurality of first electrodes are arranged in an array; the first inorganic layer also includes a third inorganic part arranged between two adjacent first electrodes in the display area, and the second inorganic layer also includes a pixel defining layer arranged on the third inorganic part.

[0012] In some embodiments, the display area is provided with a plurality of second arrangement grooves corresponding to the plurality of first electrodes, and the second arrangement grooves penetrate the pixel defining layer.

[0013] In some embodiments, the non-display area is provided with a first electrode material layer located between the first inorganic layer and the array substrate, and the first electrode material layer and the electrode line layer are used together to form an electrode ring.

[0014] According to a second aspect of an embodiment of the present invention, there is provided a method for preparing a display module, comprising:

[0015] providing an array substrate;

[0016] Disposing a first inorganic material layer on the array substrate, and thinning the first inorganic material layer to form a first inorganic portion located in a non-display area;

[0017] Disposing a second inorganic layer on the first inorganic layer; the second inorganic layer includes a second inorganic portion located on the first inorganic portion;

[0018] A first arrangement groove is provided; the first arrangement groove is provided in the non-display area and surrounds a portion of the display area, the first arrangement groove passing through the first inorganic portion and the second inorganic portion; wherein the first arrangement groove is open, and in a direction from the array substrate toward the second inorganic layer, the groove wall of the first arrangement groove is inclined or the groove wall of the first arrangement groove is stepped;

[0019] An electrode line layer is arranged in the first arrangement groove.

[0020] In some embodiments, the groove wall of the first setting groove is inclined, and the slope angle of the groove wall of the first setting groove is 20° to 60°.

[0021] In some embodiments, before opening the first setting groove, the method includes:

[0022] Disposing a first etching glue layer in a non-display area on the second inorganic layer;

[0023] forming a first etching groove in the first etching glue layer;

[0024] The step of opening the first setting slot comprises:

[0025] Etching is performed at the first etched groove to form the first setting groove.

[0026] In some embodiments, the first setting groove is formed by dry etching.

[0027] In some embodiments, the wall of the first setting groove is inclined, and the etchant for dry etching is a mixture of carbon tetrafluoride and oxygen;

[0028] The etching at the first etched groove to form the first setting groove comprises:

[0029] Carbon tetrafluoride and oxygen with a preset ratio are used to etch the second inorganic portion and the first inorganic portion at the first etched groove for a first preset time to form the first setting groove.

[0030] In some embodiments, the groove wall of the first setting groove is stepped, and etching the first etched groove to form the first setting groove includes:

[0031] Etching the second inorganic portion and the first inorganic portion corresponding to the first etched groove to form a first groove portion penetrating the second inorganic portion and the first inorganic portion;

[0032] Laterally etching the first etching groove of the first etching glue layer to form a second etching groove, wherein an orthographic projection of the first etching groove in a direction from the array substrate toward the second inorganic layer is located within an orthographic projection of the second etching groove in a direction from the array substrate toward the second inorganic layer;

[0033] The second inorganic portion and the first inorganic portion corresponding to the second etched groove are etched for a second preset time to form the first setting groove.

[0034] In some embodiments, before providing the first inorganic layer on the array substrate, the method includes:

[0035] A plurality of first electrodes are provided on the array substrate, wherein the plurality of first electrodes are provided in a display area on the array substrate and are arranged in an array;

[0036] A first inorganic material layer is provided on the array substrate, and the first inorganic material layer is thinned to form a first inorganic portion located in the non-display area, further comprising:

[0037] A third inorganic portion is formed between two adjacent first electrodes in the display area, and the first inorganic portion and the third inorganic portion form a first inorganic layer.

[0038] In some embodiments, disposing a second inorganic layer on the first inorganic layer comprises:

[0039] forming a second inorganic layer on surfaces of the first inorganic portion, the third inorganic portion, and the first electrodes;

[0040] After the first arrangement groove is formed and before the electrode line layer is arranged in the first arrangement groove, the method further includes:

[0041] Disposing a second etching glue layer located in the display area on the second inorganic layer;

[0042] forming a plurality of second etching grooves in the second etching glue layer corresponding to the plurality of first electrodes one by one;

[0043] The second inorganic layer is etched at the second etched grooves to form a plurality of second arrangement grooves corresponding one to one to the first electrodes.

[0044] The above-mentioned display module and preparation method provided in the present application, by making the groove wall of the first setting groove inclined or the groove wall of the first setting groove stepped, when the electrode line layer is set in the first setting groove, the material forming the electrode line layer has better continuity above the first setting groove, which is beneficial to reduce or avoid the risk of the electrode line layer breaking above the first setting groove, thereby improving the quality of the formed electrode (such as cathode ring line) connecting line.

[0045] It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0047] Figure 1 It is a schematic cross-sectional view of part of the structure of a display module in the related art;

[0048] Figure 2 is a schematic top view of a display module according to an embodiment of the present invention;

[0049] Figure 3 is an enlarged schematic diagram of a portion of a display area of ​​a display module according to an embodiment of the present invention;

[0050] Figure 4 is an enlarged schematic diagram of a portion of a non-display area of ​​a display module according to an embodiment of the present invention;

[0051] Figure 5 FIG. 1 is a partial cross-sectional view of a non-display area of ​​a display module according to an embodiment of the present invention, wherein Figure 5 Can be Figure 4 Cross-sectional view at point A;

[0052] Figure 6 is a partial cross-sectional view of a non-display area of ​​another display module according to an embodiment of the present invention;

[0053] Figure 7 A flowchart of a method for displaying a module according to an embodiment of the present invention;

[0054] Figure 8 A diagram showing a transverse flattening process method according to an embodiment of the present invention;

[0055] Figure 9 is a partial cross-sectional view of a display area after a lateral flattening process according to an embodiment of the present invention;

[0056] Figure 10 This is a comparison diagram of the display area and the non-display area under the microlens after the lateral flattening process according to an embodiment of the present invention;

[0057] Figure 11 is a diagram showing the relationship between the mixing ratio of the etchant and the slope of the groove wall of the first setting groove according to an embodiment of the present invention;

[0058] Figure 12is a diagram showing the relationship between the etching time and the slope of the groove wall of the first arrangement groove when the same etchant is used according to an embodiment of the present invention;

[0059] Figure 13 Schematic diagram of a micro-lens in a display module according to an embodiment of the present invention, wherein the groove wall of the first arrangement groove has a slope angle;

[0060] Figure 14 Schematic diagram of a micro-lens in a display module according to an embodiment of the present invention, wherein the groove wall of the first arrangement groove has another slope angle;

[0061] Figure 15 FIG. 1 is a schematic diagram of a microlens of another display module according to an embodiment of the present invention. DETAILED DESCRIPTION

[0062] Exemplary embodiments will be described in detail herein, examples of which are illustrated in the accompanying drawings. In the following description, when referring to the drawings, like numbers in different figures represent like or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments are not intended to represent all possible embodiments consistent with the present invention. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the present invention, as detailed in the appended claims.

[0063] The terms used in this application are for the purpose of describing specific embodiments only and are not intended to limit this application. Unless otherwise defined, technical or scientific terms used in this application should have the ordinary meaning understood by a person of ordinary skill in the art to which this invention belongs. The use of "a" or "an," and similar terms in this specification and claims does not indicate a limitation of quantity, but rather indicates the presence of at least one. "Multiple" means two or more. "Include" or "comprising," and similar terms mean that the elements or objects listed before "include" or "comprising" include the elements or objects listed after "include" or "comprising," and their equivalents, and do not exclude other elements or objects. "Connected" or "connected," and similar terms are not limited to physical or mechanical connections and can include electrical connections, whether direct or indirect. "On" and / or "below," and similar terms are for convenience only and are not limited to a single position or spatial orientation. As used in this specification and the appended claims, the singular forms "a," "the," and "the" are intended to include the plural forms unless the context clearly indicates otherwise. It will also be understood that the term "and / or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.

[0064] The present application provides a display module and a preparation method thereof. The display module has a display area and a non-display area located outside the display area, including an array substrate, a first inorganic layer, a second inorganic layer, a first setting groove and an electrode line. The first inorganic layer is provided on the array substrate, including a first inorganic part located in the non-display area; the second inorganic layer is provided on the side of the first inorganic layer away from the array substrate, including a second inorganic part located above the first inorganic part; the first setting groove is provided in the non-display area and surrounds a part of the display area, and the first setting groove passes through the first inorganic part and the second inorganic part; wherein, the first setting groove is open, and in the direction from the array substrate toward the second inorganic layer, the groove wall of the first setting groove is inclined or the groove wall of the first setting groove is stepped; the electrode line is at least partially provided in the first setting groove. The display module is configured such that when the electrode line is arranged in the first setting groove, the material forming the electrode line has better continuity above the first setting groove, which is beneficial to reducing or avoiding the risk of the electrode line breaking above the first setting groove.

[0065] The display module mentioned in this application can be used to prepare a display panel, such as a display panel of a Micro-OLED display device, which can be applied to mobile phones, tablet computers, televisions, laptops, and other products or components with display functions.

[0066] The following is combined with Figures 2 to 15 The display module and the manufacturing method thereof provided in this application are described in detail.

[0067] Please refer to Figure 2 , and when necessary, combine Figures 3 to 5 As shown, the present application provides a display module 100. The display module 100 has a display area S1 and a non-display area S2 located outside the display area S1. The display module includes an array substrate 10, a first inorganic layer 30, a second inorganic layer 40, a first arrangement groove 340, and an electrode line layer 50. The first inorganic layer 30 is provided on the array substrate 10 and includes a first inorganic portion 31 located in the non-display area S2. The second inorganic layer 40 is provided on a side of the first inorganic layer 30 facing away from the array substrate 10 and includes a second inorganic portion 42 located on the first inorganic portion 31. A first arrangement groove 340 is provided in the non-display area S2 and surrounds a portion of the display area S1. The first arrangement groove 340 extends through the first inorganic portion 31 and the second inorganic portion 42. The first arrangement groove 340 is open, and its groove wall 341 is inclined or stepped in a direction from the array substrate 10 toward the second inorganic layer 40. The electrode line layer 50 is at least partially provided in the first arrangement groove 340.

[0068] The array substrate mentioned here can be understood as a substrate structure having thin film transistors arranged in an array.

[0069] It should be noted that here Figure 5 Only a part of the first arrangement groove 340 is shown in the figure. In fact, the first arrangement groove 340 also has another groove wall opposite to the groove wall 341. The groove wall and the groove wall 341 can be roughly symmetrical in structure. Figure 5 The higher top surface of the middle electrode line layer 50 can be used to connect to the cathode layer of the display device.

[0070] The material of the first inorganic layer may be silicon oxide (SiOx). The first arrangement groove 340 may be formed by dry etching.

[0071] In some embodiments, the inventors, through extensive testing, have determined that when the slope angle β of the first arrangement groove 340's wall 341 is between 20° and 60°, the material continuity of the electrode wire layer 50 can be better ensured when the electrode wire layer 50 is subsequently arranged. Preferably, the slope angle β of the wall 341 is between 20° and 50°.

[0072] In some embodiments, the display module includes a plurality of first electrodes 21. The plurality of first electrodes 21 are disposed in the display area S1 on the array substrate 10 and are arranged in an array. The first inorganic layer 30 further includes a third inorganic portion 32 disposed between two adjacent first electrodes 21 in the display area S1. The second inorganic layer 40 further includes a pixel defining layer disposed on the third inorganic portion 32.

[0073] The first electrode 21 mentioned here can be understood as the anode in the light-emitting layer.

[0074] The surface of the third inorganic portion 32 facing away from the array substrate 10 is flush or substantially flush with the surface of the first electrode 21 facing away from the array substrate 10 .

[0075] The third inorganic portion 32 may be formed by an LHC process. Accordingly, the first inorganic portion 31 may be understood as the portion of the inorganic material layer that is not etched away during the LHC process.

[0076] In some embodiments, the display area S1 is provided with a plurality of second arrangement grooves corresponding to the plurality of first electrodes 21 , and the second arrangement grooves penetrate the pixel defining layer.

[0077] The second arrangement groove can be used to subsequently arrange the organic light-emitting material layer and the corresponding second electrode. The second arrangement groove can be formed after the first arrangement groove is formed. The second electrode mentioned here can be understood as the cathode in the light-emitting layer.

[0078] Here, the second groove can be formed by dry etching. The etchant can be carbon tetrafluoride, or a mixture of carbon tetrafluoride and a small amount of oxygen. The wall of the second groove is nearly vertical. The slope angle of the wall of the second groove can be approximately 80° to 90°.

[0079] In some embodiments, the non-display area S2 is provided with a first electrode material layer located between the first inorganic layer 30 and the array substrate 10. The first electrode material layer and the electrode line layer 50 are used together to form an electrode ring. The electrode ring here can be understood as a cathode ring, which is an electrical connection line structure for connecting the cathode (second electrode).

[0080] Please refer to Figure 6 As shown, the present application further provides a display module, which Figure 6 : This is a partial cross-sectional view of the non-display area of ​​another display module provided. The structure of this display module is similar to that of the above-mentioned display module 100. The same or similar parts can be referred to the above-mentioned related descriptions and will not be repeated here. The description here mainly focuses on the differences. Unlike the above-mentioned display module 100, in this embodiment, the groove wall 341 of the first setting groove 340 is stepped. For example Figure 6 As shown, the groove wall 341 of the first setting groove 340 includes a first groove wall 3411 close to the array substrate 10, a second groove wall 3412 away from the array substrate 10 and a third groove wall 3413 connected therebetween, and the third groove wall 3413 forms a step.

[0081] The first groove wall 3411 and the second groove wall 3412 extend substantially in a direction from the array substrate 10 toward the second inorganic layer 40. The step formed by the third groove wall 3413 extends substantially in a transverse direction, for example, perpendicular to the extending direction of the first groove wall 3411.

[0082] It should be noted that the stepped shape here may include one or more steps. The first groove wall and the second groove wall may be slightly inclined, and the second groove wall may also be slightly inclined. This application does not limit this and can be set according to specific circumstances.

[0083] Please refer to Figure 7 As shown, the present application provides a method for manufacturing a display module, which can be used to manufacture the above-mentioned display module 100. The manufacturing method may include the following steps S101 to S109:

[0084] In step S101, an array substrate 10 is provided.

[0085] In step S103 , a first inorganic material layer is provided on the array substrate 10 , and the first inorganic material layer is thinned to form a first inorganic portion 31 located in the non-display area S2 ;

[0086] In step S105 , a second inorganic layer 40 is provided on the first inorganic layer 30 ; the second inorganic layer 40 includes a second inorganic portion 42 located on the first inorganic portion 31 ;

[0087] In step S107, a first arrangement groove 340 is formed. The first arrangement groove 340 is located in the non-display area S2 and surrounds a portion of the display area S1. The first arrangement groove 340 penetrates the first inorganic portion 31 and the second inorganic portion 42. The first arrangement groove 340 is open, and a groove wall 341 of the first arrangement groove 340 is inclined in a direction from the array substrate 10 toward the second inorganic layer 40.

[0088] In step S109 , an electrode line layer 50 is disposed in the first arrangement groove 340 .

[0089] In some embodiments, the inventors, through extensive testing, have determined that when the slope angle β of the first arrangement groove 340's wall 341 is between 20° and 60°, the material continuity of the electrode wire layer 50 can be better ensured when the electrode wire layer 50 is subsequently arranged. Preferably, the slope angle β of the wall 341 is between 20° and 50°.

[0090] for example Figure 13 and Figure 14 As shown, Figure 13 In the structure shown, the slope angle β1 of the groove wall 341 is approximately 20°. Figure 14 In the structure shown, the slope angle β2 of the groove wall 341 is approximately 45°.

[0091] In some embodiments, before step S107, the method includes:

[0092] A first etching glue layer is provided on the second inorganic layer 40 and located in the non-display area S2.

[0093] A first etching groove is formed in the first etching glue layer.

[0094] Accordingly, step S107 can be implemented by the following step S1071:

[0095] In step S1071 , etching is performed at the first etched groove to form the first setting groove 340 .

[0096] In some embodiments, the first setting groove 340 is formed by dry etching.

[0097] In some embodiments, the etchant for dry etching is a mixture of carbon tetrafluoride and oxygen. During the etching, an inert gas such as helium may be added to the mixture to ensure the pressure of the etching environment.

[0098] Step S1071 can be specifically implemented through the following steps:

[0099] Carbon tetrafluoride and oxygen having a preset ratio are used to etch the second inorganic portion 42 and the first inorganic portion 31 at the first etched groove for a first preset time to form the first setting groove 340 .

[0100] It should be noted that the slope angle of the groove wall 341 of the first setting groove 340 is related to the ratio of carbon tetrafluoride and oxygen and the etching time. When opening the first setting groove 340, the preset ratio of carbon tetrafluoride and oxygen and the etching time can be determined according to the specific situation.

[0101] Please refer to Figure 11 As shown, the inventors have found through research that, in some embodiments, the proportion of carbon tetrafluoride in the etchant is positively correlated with the slope angle of the groove wall 341. The greater the proportion of carbon tetrafluoride in the etchant, the greater the slope angle of the groove wall 341.

[0102] Please refer to Figure 12 As shown, the inventors have found through research that, in some embodiments, for the same etchant, the etching time is negatively correlated with the slope angle of the groove wall 341. The longer the etching time, the smaller the slope angle of the groove wall 341.

[0103] It should also be noted that the formation of the first setting groove 340 can be performed using an etching signal capture system (End Point Detection, EPD) to determine and control the end of etching by acquiring the spectral signal of the structure. The spectral comparison between the bottom of the first setting groove 340 and the first inorganic portion 31 and the second inorganic portion 42 stacked nearby can be used to determine whether the first inorganic portion 31 at the bottom of the first setting groove 340 has been completely etched.

[0104] In some embodiments, before step S103, the method includes the following steps:

[0105] A plurality of first electrodes 21 are disposed on the array substrate 10 . The plurality of first electrodes 21 are disposed in the display area S1 on the array substrate 10 , and the plurality of first electrodes 21 are arranged in an array.

[0106] Correspondingly, step S103 sets a first inorganic material layer on the array substrate 10, and thins the first inorganic material layer to form a first inorganic part 31 located in the non-display area S2. At the same time, a third inorganic part 32 can be formed between two adjacent first electrodes 21 in the display area S1. The first inorganic part 31 and the third inorganic part 32 form a first inorganic layer 30.

[0107] In some embodiments, disposing the second inorganic layer 40 on the first inorganic layer 30 includes:

[0108] The second inorganic layer 40 is formed on the surfaces of the first inorganic part 31, the third inorganic part 32 and the first electrodes 21. That is, the second inorganic layer 40 covers the display area and the non-display area.

[0109] Accordingly, after step S107 and before step S109, the method further includes:

[0110] Disposing a second etching glue layer located in the display area S1 on the second inorganic layer 40;

[0111] forming a plurality of second etching grooves in the second etching resist layer corresponding to the plurality of first electrodes 21 one by one;

[0112] The second inorganic layer 40 is etched at the second etched grooves to form a plurality of second arrangement grooves corresponding to the first electrodes 21 one by one.

[0113] Here, the second groove can also be formed using dry etching. The etchant can be carbon tetrafluoride or a mixture of carbon tetrafluoride and a small amount of oxygen. The groove wall of the second groove can be nearly vertical. The slope angle of the groove wall of the second groove can be approximately 80° to 90°.

[0114] The present application also provides a method for preparing a display module, which can be used to prepare Figure 6 The display module shown. This preparation method is similar to the above Figure 7 The manufacturing method shown is generally related, and the same or similar points can be referred to the above related description. Here, the main differences are described. Different from the manufacturing method of the display module described above, the first setting groove 340 opened in step S107 here has a stepped groove wall 341.

[0115] Accordingly, the method adopted in step S107 is also different. Here, step S1071 can be specifically implemented through the following steps S171 to S175:

[0116] In step S171 , the second inorganic portion 42 and the first inorganic portion 31 corresponding to the first etched groove are etched to form a first groove portion penetrating the second inorganic portion 42 and the first inorganic portion 31 .

[0117] It should be noted that the first groove portion can be formed using an etching signal capture system (End Point Detection, EPD) to determine and control the end of etching by acquiring the spectral signal of the structure. The first inorganic portion 31 and the second inorganic portion 42 stacked adjacent to the bottom of the first groove portion are compared to determine whether the first inorganic portion 31 at the bottom of the first setting groove 340 has been completely etched.

[0118] In step S173, the first etching groove of the first etching glue layer is laterally etched to form a second etching groove, and the orthographic projection of the first etching groove in the direction from the array substrate 10 toward the second inorganic layer 40 is located within the orthographic projection of the second etching groove in the direction from the array substrate 10 toward the second inorganic layer 40.

[0119] Here, oxygen gas may be used to first etch the first etching groove of the first etching glue layer for lateral etching.

[0120] It should be noted that the thickness of the first etching glue layer here can be greater than the thickness of the second etching glue layer to ensure that while oxygen is used to perform transverse etching on the first etching groove of the first etching glue layer, after etching away part of the thickness of the glue layer on the side of the first etching glue layer away from the array substrate 10, the first etching glue layer still has a certain thickness.

[0121] In step S175 , the second inorganic portion 42 and the first inorganic portion 31 corresponding to the second etched groove are etched for a second preset time to form the first arrangement groove 340 .

[0122] Here, different first arrangement grooves 340 can be formed by selecting different second preset durations. The longer the second preset duration, the closer the third groove wall 3413 of the first arrangement groove 340 is to the substrate. Conversely, the shorter the second preset duration, the further the third groove wall 3413 of the first arrangement groove 340 is from the substrate. In the present invention, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance. The terms "plurality" and "several" refer to two or more, unless otherwise expressly defined.

[0123] Other embodiments of the present invention will readily occur to those skilled in the art after considering the specification and practicing the disclosure herein. The present invention is intended to cover any variations, uses, or adaptations of the present invention that follow the general principles of the invention and include common knowledge or customary techniques in the art not disclosed herein. The description and examples are to be considered as exemplary only, with the true scope and spirit of the invention being indicated by the following claims.

[0124] It should be understood that the present invention is not limited to the exact construction described above and shown in the drawings, and that various modifications and changes may be made without departing from the scope thereof. The scope of the present invention is limited only by the appended claims.

Claims

1. A display module comprising a display area and a non-display area located outside the display area, characterized in that: include: array substrate; a first inorganic layer, provided on the array substrate, comprising a first inorganic portion located in the non-display area, wherein a portion of the first inorganic layer in the display area is relatively flush with the anode surface; a second inorganic layer, provided on a side of the first inorganic layer facing away from the array substrate, comprising a second inorganic portion located on the first inorganic portion; a first arrangement groove, provided in the non-display area and surrounding a portion of the display area, the first arrangement groove penetrating the first inorganic portion and the second inorganic portion; wherein the first arrangement groove is open, and in a direction from the array substrate toward the second inorganic layer, a groove wall of the first arrangement groove is inclined or a groove wall of the first arrangement groove is stepped; if the groove wall of the first arrangement groove is inclined, the slope angle of the groove wall of the first arrangement groove is 20° to 60°; The electrode line layer is at least partially disposed in the first arrangement groove.

2. The display module according to claim 1, wherein: The groove wall of the first setting groove is step-shaped, and the groove wall of the first setting groove includes a first groove wall close to the array substrate, a second groove wall away from the array substrate, and a third groove wall connected therebetween, and the third groove wall forms a step.

3. The display module according to claim 1, wherein: The display module includes a plurality of first electrodes, which are arranged in the display area on the array substrate and are arranged in an array; the first inorganic layer also includes a third inorganic part arranged between two adjacent first electrodes in the display area, and the second inorganic layer also includes a pixel defining layer arranged on the third inorganic part.

4. The display module according to claim 3, wherein: The display area is provided with a plurality of second arrangement grooves corresponding to the plurality of first electrodes, and the second arrangement grooves penetrate the pixel defining layer.

5. The display module according to claim 3, wherein: The non-display area is provided with a first electrode material layer located between the first inorganic layer and the array substrate, and the first electrode material layer and the electrode line layer are used together to form an electrode ring.

6. A method for preparing a display module, characterized in that: include: providing an array substrate; A first inorganic material layer is provided on the array substrate, and the first inorganic material layer is thinned to form a first inorganic layer, wherein the first inorganic layer includes a first inorganic portion located in a non-display area, and a portion of the first inorganic layer in the display area is relatively flush with the anode surface; Disposing a second inorganic layer on the first inorganic layer; the second inorganic layer includes a second inorganic portion located on the first inorganic portion; A first arrangement groove is provided; the first arrangement groove is provided in the non-display area and surrounds a portion of the display area, and the first arrangement groove passes through the first inorganic portion and the second inorganic portion; wherein the first arrangement groove is open, and in a direction from the array substrate toward the second inorganic layer, the groove wall of the first arrangement groove is inclined or the groove wall of the first arrangement groove is stepped; if the groove wall of the first arrangement groove is inclined, the slope angle of the groove wall of the first arrangement groove is 20° to 60°; An electrode line layer is arranged in the first arrangement groove.

7. The method for preparing a display module according to claim 6, wherein: Before opening the first setting groove, the method includes: Disposing a first etching glue layer in a non-display area on the second inorganic layer; forming a first etching groove in the first etching glue layer; The step of opening the first setting slot comprises: Etching is performed at the first etched groove to form the first setting groove.

8. The method for preparing a display module according to claim 7, wherein: The first setting groove is formed by dry etching.

9. The method for preparing a display module according to claim 8, wherein: The wall of the first setting groove is inclined, and the etchant for dry etching is a mixed gas of carbon tetrafluoride and oxygen; The etching at the first etched groove to form the first setting groove comprises: Carbon tetrafluoride and oxygen with a preset ratio are used to etch the second inorganic portion and the first inorganic portion at the first etched groove for a first preset time to form the first setting groove.

10. The method for preparing a display module according to claim 8, wherein: The groove wall of the first setting groove is in a step shape, and etching the first etched groove to form the first setting groove includes: Etching the second inorganic portion and the first inorganic portion corresponding to the first etched groove to form a first groove portion penetrating the second inorganic portion and the first inorganic portion; Laterally etching the first etching groove of the first etching glue layer to form a second etching groove, wherein an orthographic projection of the first etching groove in a direction from the array substrate toward the second inorganic layer is located within an orthographic projection of the second etching groove in a direction from the array substrate toward the second inorganic layer; The second inorganic portion and the first inorganic portion corresponding to the second etched groove are etched for a second preset time to form the first setting groove.

11. The method for preparing a display module according to any one of claims 6 to 10, wherein: Before providing a first inorganic layer on the array substrate, the method includes: A plurality of first electrodes are provided on the array substrate, wherein the plurality of first electrodes are provided in a display area on the array substrate and are arranged in an array; A first inorganic material layer is provided on the array substrate, and the first inorganic material layer is thinned to form a first inorganic portion located in the non-display area, further comprising: A third inorganic portion is formed between two adjacent first electrodes in the display area, and the first inorganic portion and the third inorganic portion form a first inorganic layer.

12. The method for preparing a display module according to claim 11, wherein: Providing a second inorganic layer on the first inorganic layer includes: forming a second inorganic layer on surfaces of the first inorganic portion, the third inorganic portion, and the first electrodes; After the first arrangement groove is formed and before the electrode line layer is arranged in the first arrangement groove, the method further includes: Disposing a second etching glue layer located in the display area on the second inorganic layer; forming a plurality of second etching grooves in the second etching glue layer corresponding to the plurality of first electrodes one by one; The second inorganic layer is etched at the second etched grooves to form a plurality of second arrangement grooves corresponding one to one to the first electrodes.

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