Ion source moving device and ion implantation device

Abstract

The present invention relates to an ion source moving device and an ion implantation device, and aims at enabling smooth lifting of an ion source, and improving workability of work of attaching and detaching the ion source to and from a device body. The ion source moving device of the present invention is capable of moving an ion source having a chamber fixed to a device body in a manner of facing the device body in a first horizontal direction, in a manner of changing inclination with respect to the device body while lifting a center of gravity of the ion source; and the ion source moving device is configured to have: a support member capable of supporting a first supported member fixed to an outer side of the chamber; a movable member linked to the support member; and a lifting mechanism capable of restricting movement of the movable member in a direction intersecting a predetermined second direction, and capable of lifting and moving the movable member in the second direction.

Description

TECHNICAL FIELD

[0001] The present application relates to an ion source moving device that can be used in an operation of attaching and detaching an ion source to and from a device body, and an ion implantation device provided with the ion source moving device. BACKGROUND

[0002] An ion implantation device used in a process of a flat panel display and a semiconductor process is assembled by fixing an ion source that generates an ion beam to a device body. Further, when a replacement operation of a part disposed inside the ion source is performed and when a cleaning operation inside the ion source is performed, it is necessary to detach the ion source from the device body, perform the above operation, and then reattach the ion source to the device body. As a moving mechanism that moves the ion source at the time of attaching the ion source to the device body or at the time of detaching the ion source from the device body, a moving mechanism disclosed in the following Patent Literature 1 is known.

[0003] The moving mechanism disclosed in the following Patent Literature 1 is provided with a suspension mechanism that enables the ion source suspended by a chain to be moved in a vertical direction and a horizontal direction using a chain block. The moving mechanism is configured to slowly suspend the ion source by the chain block after hooking the chain to a part of the ion source, and thereby the ion source can be changed from a collapsed posture to an erected posture. Further, the moving mechanism is configured to slowly lower the chain while the ion source is suspended by the chain, and thereby the ion source can be changed from the erected posture to the collapsed posture.

[0004] The moving mechanism is further provided with an ion source support table that supports the ion source in a manner that the posture of the ion source is smoothly changed. In the case of attaching the ion source to the device body, an operator winds up the chain hooked to a part of the ion source using the chain block. At this time, the ion source is changed from the collapsed state to the erected state while being supported by the ion source support table, and then the ion source is moved in the vertical direction until the position near the device body is reached while being separated from the ion source support table. Then, the operator operates the chain block or the like to move the ion source in the horizontal direction so that the ion source becomes in a state of contacting the device body, and the ion source is fixed to the device body by a fixing tool such as a bolt. Further, in the case of taking out the ion source from the device body, the operator first hooks the chain to a part of the ion source, and thereby the ion source is in a state of being suspended by the chain block. Next, the fixing tool that fixes the ion source to the device body is detached, and the ion source is lowered to the ion source support table by the chain block. Then, after the ion source is supported by the ion source support table in the erected posture, the ion source is slowly collapsed by pulling the lower side of the ion source in one direction on the ion source support table, and finally the ion source is disposed on the ion source support table in a state of the collapsed posture.

[0005] (Prior Art Document)

[0006] (Patent Document)

[0007] Patent Document 1: Japanese Patent Application Laid-Open No. 2019-57385 SUMMARY

[0008] (Problems to be Solved by the Invention)

[0009] In the mobile mechanism disclosed in the above-described Patent Document 1, there is a period in which the ion source is lifted while the ion source is not supported by the ion source support table during the work of attaching and detaching the ion source to and from the device body. During this period, the chain hooked to the ion source vibrates or swings with the operation of the chain crane, and therefore, in order to lift the ion source smoothly, the worker has to perform the work while supporting the ion source. Further, when the substrate as the object of ion implantation is upsized, the ion source itself is also upsized and the weight thereof is increased, and therefore, the worker can have difficulty in lifting the ion source while supporting the ion source. In view of this, there is a demand for a device capable of smoothly lifting the ion source and improving the workability of the work of attaching and detaching the ion source to and from the device body.

[0010] The present application has been achieved in order to solve the above-described problem, and has an object to provide an ion source mobile device and an ion implantation device capable of smoothly lifting an ion source and improving the workability of the work of attaching and detaching the ion source to and from a device body.

[0011] (Means for Solving the Problem)

[0012] The ion source mobile device of the present application is capable of moving an ion source having a chamber fixed to a device body of an ion implantation device in a manner that the ion source is opposed to the device body in a first horizontal direction, in a manner that the center of gravity of the ion source is lifted and the inclination of the ion source with respect to the device body is changed;

[0013] The ion source mobile device includes:

[0014] a support member capable of supporting a first supported member fixed to the outside of the chamber;

[0015] a movable member linked to the support member; and

[0016] a lifting mechanism capable of lifting and moving the movable member in a second direction while restricting the movable member from moving in a direction intersecting the second direction.

[0017] According to the configuration, the movable member is moved up and down in the second direction in a state where the first supported members are supported by the support member. Accordingly, the ion source can be moved up and down in the second direction. At this time, the movable member is restricted from moving in a direction intersecting the second direction, and thus the movable member is prevented from swinging. Therefore, the support member coupled to the movable member is prevented from swinging, and thus the ion source supported by the support member is prevented from swinging. As a result, the operator can easily move the ion source up and down while supporting the ion source. Alternatively, the ion source can be moved up and down without being supported by the operator. That is, according to the ion source moving device of the present application, the ion source can be smoothly moved up and down, and the workability of the work of attaching and detaching the ion source to and from the device main body can be improved.

[0018] Further, the ion source moving device of the present application can also be configured such that the pair of first supported members are respectively fixed to a pair of side walls of the chamber that are opposed to each other in the horizontal direction, and the movable member is configured to be movable in the second direction in a state where the support member supports the first supported members.

[0019] According to the configuration, the movable member is moved up and down in the second direction in a state where the first supported members are supported by the support member. Accordingly, the ion source can be moved up and down in the second direction. At this time, the movable member is restricted from moving in a direction intersecting the second direction, and thus the movable member is prevented from swinging. Therefore, the support member coupled to the movable member is prevented from swinging, and thus the ion source supported by the support member is prevented from swinging. As a result, the operator can easily move the ion source up and down while supporting the ion source. Alternatively, the ion source can be moved up and down without being supported by the operator. That is, according to the ion source moving device of the present application, the ion source can be smoothly moved up and down, and the workability of the work of attaching and detaching the ion source to and from the device main body can be improved.

[0020] Further, the ion source moving device of the present application can also be configured such that the second direction is a vertical direction, and the center of gravity of the ion source and the first supported member are located on the same straight line in the vertical direction when the ion source is fixed to the device main body and viewed from the side.

[0021] According to the configuration, the ion source can be moved up and down in the vertical direction without tilting. Therefore, the ion source can be moved up and down in a more stable state.

[0022] Further, the ion source moving device of the present application can also be configured to further include a transfer mechanism that moves the movable member in the first horizontal direction when viewed from above.

[0023] Further, the ion source moving device of the present application can also be configured such that the chamber has:

[0024] a plasma generation portion side chamber member that generates plasma inside; and

[0025] an electrode side chamber member that is configured to be detachable from the plasma generation portion side chamber member and houses an electrode that extracts an ion beam from the plasma; and

[0026] A second supported member supported by the support member is fixed to the chamber member on the plasma generating portion side;

[0027] The movable member is moved in the first horizontal direction and the second direction in a state where the electrode-side chamber member is fixed to the device body and the second supported member is supported by the support member, whereby the plasma generating portion-side chamber member can be detached from the electrode-side chamber member.

[0028] According to this configuration, the plasma generating portion-side chamber member can be detached from the electrode-side chamber member in a state where the ion source is fixed to the device body by the ion source moving device. Therefore, the electrode-side chamber member is detached from the device body, and the work of replacing the parts arranged in the electrode-side chamber member and the cleaning of the electrode-side chamber member and the like can be performed. That is, the work on the electrode-side chamber member can be performed without detaching the entire ion source from the device body.

[0029] Further, the ion implantation device of the present application has:

[0030] a device body;

[0031] an ion source having a chamber and fixed to the device body in a manner that the ion source opposes the device body in a first horizontal direction; and

[0032] an ion source moving device that moves the ion source in a manner that the center of gravity of the ion source is raised and lowered while the inclination with respect to the device body is changed;

[0033] the ion source moving device has:

[0034] a support member that supports a first supported member fixed to the outside of the chamber;

[0035] a movable member linked to the support member; and

[0036] a raising and lowering mechanism that raises and lowers the movable member in a second direction while restricting the movement of the movable member in a direction intersecting the second direction.

[0037] According to the configuration, the movable member is moved up and down in a predetermined second direction in a state in which the first supported member is supported by the support member, whereby the ion source can be moved up and down. At this time, the movable member is restricted in movement in a direction intersecting the second direction, and therefore, the movable member is prevented from swinging. Therefore, the support member coupled to the movable member is prevented from swinging, and thus the ion source supported by the support member is prevented from swinging. As a result, an operator can easily move the ion source up and down while supporting the ion source. Alternatively, the ion source can be moved up and down without being supported by the operator. That is, according to the ion source moving device of the present application, the ion source can be smoothly moved up and down, and the workability of the work of attaching and detaching the ion source to and from the device main body can be improved. Further, the time required for the work of attaching and detaching the ion source to and from the device main body is shortened by improving the workability of the work. Therefore, the period during which the operation of the ion implantation device is stopped for maintenance work such as parts replacement and cleaning can be shortened.

[0038] (EFFECTS OF THE INVENTION)

[0039] According to the present application, the ion source can be smoothly moved up and down, and the workability of the work of attaching and detaching the ion source to and from the device main body can be improved. BRIEF DESCRIPTION OF DRAWINGS

[0040] Figure 1 A schematic plan view of an ion source moving device and an ion implantation device according to an embodiment of the present application is shown.

[0041] Figure 2 A perspective view of the ion source moving device according to the embodiment is shown.

[0042] Figure 3 A perspective view of the ion source in a state in which the ion source according to the embodiment is fixed to the device main body is shown.

[0043] Figure 4 A perspective view of the ion source in a state in which the electrode-side chamber member of the plasma generation portion-side chamber member according to the embodiment is separated from the electrode-side chamber member is shown.

[0044] Figure 5A A side view of the ion source and the ion source moving device according to the embodiment in a state in which the ion source is positioned at a first position is shown.

[0045] Figure 5B A side view of the ion source and the ion source moving device according to the embodiment in a state in which the ion source is positioned between the first position and a second position is shown.

[0046] Figure 5C A side view of the ion source and the ion source moving device according to the embodiment in a state in which the ion source is positioned at the second position is shown.

[0047] Figure 5DFIG. 10 is a side view showing the ion source and the ion source moving apparatus in a state where the ion source of the embodiment is positioned at a third position.

[0048] Figure 6A FIG. 11 is a side view showing the ion source and the ion source moving apparatus in a state where the ion source of the embodiment is positioned at a fixed position.

[0049] Figure 6B FIG. 12 is a side view showing the ion source and the ion source moving apparatus in a state where the plasma generation portion side chamber member of the embodiment is detached from the electrode side chamber member.

[0050] Explanation of Reference Numerals

[0051] 10 Ion source moving apparatus

[0052] 11 Support member

[0053] 11a Hook

[0054] 11b Chain

[0055] 12 Movable member

[0056] 13 Lifting mechanism

[0057] 13a One side support

[0058] 13b Other side support

[0059] 14a One side guide member

[0060] 14b Other side guide member

[0061] 15a, 16a Rail

[0062] 15b, 16b Block

[0063] 15c, 16c Motor

[0064] 16 Transport mechanism

[0065] 17 Support table

[0066] 18 Guide rail member

[0067] 18a Guide groove

[0068] 19 Trolley

[0069] 19a Trolley side guide groove

[0070] 19b Wheel

[0071] 20 Ion source

[0072] 21 Chamber

[0073] 21a first chamber member (electrode side chamber member)

[0074] 21b second chamber member (plasma generation portion side chamber member)

[0075] 22a first flange portion

[0076] 22b second flange portion

[0077] 23 hinge member

[0078] 24a electrode

[0079] 24b member

[0080] 25a, 25b side wall

[0081] 26a first shaft member (first supported member)

[0082] 26b second shaft member (second supported member)

[0083] 27a upper side roller

[0084] 27b lower side roller

[0085] 30 device body

[0086] 30a mounting surface

[0087] 31 conveyance portion

[0088] 31a mass analysis magnet

[0089] 32 processing chamber

[0090] 100 ion implantation device

[0091] A1 rotation axis

[0092] D1 first horizontal direction

[0093] D2 second direction

[0094] G1 center of gravity of ion source

[0095] G2 center of gravity of second chamber member (plasma generation portion side chamber member)

[0096] IB ion beam

[0097] P1 position

[0098] P2 second position

[0099] P3 third position

[0100] S substrate DETAILED DESCRIPTION

[0101] The ion source moving device 10 according to an embodiment of the present application and the ion implantation device 100 provided with the ion source moving device 10 will be described. Figures 1 to 6B The ratio of the length dimensions and the scale of each constituent element between the drawings, which are made for the purpose of understanding the present application, are not necessarily consistent. In addition, in the present embodiment, the first horizontal direction Dl described later is parallel to the X axis shown in each drawing, and the second direction D2 is parallel to the Z axis. The X axis, the Y axis, and the Z axis are orthogonal, the X axis is consistent with the horizontal direction, and the Z axis is consistent with the vertical direction.

[0102] As shown in FIG. 1, the ion implantation device 100 is a device that performs ion implantation processing on a substrate S by irradiating the substrate S with an ion beam IB. The ion implantation device 100 is provided with an ion source 20 that generates the ion beam IB, and a device body 30 that transports the ion beam IB generated by the ion source 20 so as to reach the substrate S. In addition, the ion implantation device 100 is further provided with an ion source moving device 10 that is used when the ion source 20 is attached to or detached from the device body 30. Figure 1

[0103] First, the ion source 20 according to the present embodiment will be described.

[0104] The ion source 20 is provided with a chamber 21 that has an internal space. In addition, the ion source 20 is configured so as to generate plasma from a raw material supplied from the outside inside the chamber 21, and to be able to extract the ion beam IB from the plasma.

[0105] The device body 30 is provided with a transport section 31 that transports the ion beam IB extracted from the ion source 20 so as to reach the substrate S, and a processing chamber 32 that is formed in a high vacuum state inside and in which the substrate S is arranged. The transport section 31 is provided with a mass analysis magnet 31a that mass-separates the ions included in the ion beam IB and transports the desired ions to the processing chamber 32. The substrate S is irradiated with the ion beam IB inside the processing chamber 32. By irradiating the substrate S with the ion beam IB, ion implantation processing is performed on the substrate S. The ion implantation device 100 according to the present embodiment is an ion implantation device used for a flat panel display process, and the substrate S is a glass substrate that has a generally rectangular shape. In addition, the substrate S is not limited to a glass substrate, and the shape of the substrate S is not limited to a particular shape. In addition, the ion implantation device 100 is not limited to being used for a flat panel display process, and may, for example, be used for a semiconductor process.

[0106] As shown in FIG. 1, the ion implantation device 100 is a device that performs ion implantation processing on a substrate S by irradiating the substrate S with an ion beam IB. The ion implantation device 100 is provided with an ion source 20 that generates the ion beam IB, and a device body 30 that transports the ion beam IB generated by the ion source 20 so as to reach the substrate S. In addition, the ion implantation device 100 is further provided with an ion source moving device 10 that is used when the ion source 20 is attached to or detached from the device body 30. Figure 2 ​As shown, the device body 30 has a mounting surface 30a for fixing the ion source 20. The ion source 20 is fixed to the device body 30 on the mounting surface 30a in a manner opposite to the device body 30 in a first horizontal direction D1. More specifically, the ion source 20 and the device body 30 are fixed together by fasteners such as bolts (not shown) such that their contact surfaces are orthogonal to the first horizontal direction D1, in other words, that their contact surfaces are parallel to the vertical direction. Furthermore, the orientation of the ion source 20 and the device body 30 relative to the first horizontal direction D1 is not limited to the fact that their contact surfaces are parallel to the vertical direction. For example, the ion source 20 may be fixed to the device body 30 with their contact surfaces tilted from the vertical direction to the horizontal direction. That is, the first horizontal direction D1 can be considered as the horizontal component of the direction in which the ion source 20 and the device body 30 are opposite to each other.

[0107] like Figure 3 As shown, the chamber 21 of the ion source 20 is constructed by a first chamber member 21a and a second chamber member 21b. The first chamber member 21a is mounted to the mounting surface 30a of the device body 30, and the second chamber member 21b is fixed to the first chamber member 21a in a detachable manner. The first chamber member 21a has a first flange portion 22a that is fixed to the device body 30. The first chamber member 21a is fixed to the device body 30 using a fixing member (not shown) such as bolts when the first flange portion 22a is in contact with the mounting surface 30a.

[0108] In this embodiment, the ion source 20 and the device body 30 are fixed with the first chamber member 21a and the mounting surface 30a facing each other in the first horizontal direction D1. More specifically, the ion source 20 and the device body 30 are fixed with the contact surfaces of the first flange 22a and the mounting surface 30a being parallel to the vertical direction.

[0109] The second chamber member 21b has a second flange portion 22b that is fixed to the first chamber member 21a. The second chamber member 21b is fixed to the first chamber member 21a using a fixing member (not shown) such as a bolt when the second flange portion 22b is in contact with the surface of the first chamber member 21a.

[0110] In addition, such as Figure 3 and Figure 4As shown, the ion source 20 includes a hinge member 23 connecting the first chamber member 21a and the second chamber member 21b. With the ion source 20 fixed to the device body 30, the hinge member 23 connects the lower end of the first chamber member 21a to the lower end of the second chamber member 21b. With the first chamber member 21a fixed to the device body 30, the hinge member 23 causes the second chamber member 21b to rotate relative to the first chamber member 21a about a rotation axis A1.

[0111] In the ion source 20, plasma is generated inside the second chamber component 21b from raw materials supplied from the outside. For example... Figure 4 As shown, components 24b, such as a heating filament for supplying thermionic electrons to generate plasma from raw materials and components supporting the heating filament, are disposed inside the second chamber component 21b. That is, the second chamber component 21b of this embodiment corresponds to the plasma generation section-side chamber component of the present invention. Furthermore, in order to... Figure 4 The part 24b shown is schematically arranged within the second chamber member 21b, and part 24b is not limited to a specific part.

[0112] like Figure 1 As shown, the first chamber member 21a houses electrodes such as extraction electrodes for extracting the ion beam IB from the plasma generated within the first chamber member 21a. That is, the first chamber member 21a of this embodiment corresponds to the electrode-side chamber member of the present invention.

[0113] With the first chamber member 21a fixed to the device body 30, when the fixation between the first chamber member 21a and the second chamber member 21b is released, the second chamber member 21b can rotate about the rotation axis A1 via the hinge member 23. Accordingly, as... Figure 4 As shown, the internal space of the second chamber component 21b can be exposed, allowing operators to perform tasks such as replacing parts 24b located within the second chamber component 21b and cleaning the second chamber component 21b. In other words, the ion source 20 is configured such that the second chamber component 21b can be detached from the first chamber component 21a to perform various operations without removing the entire ion source 20 from the device body 30.

[0114] In the ion source 20 of the present embodiment, when the replacement work of the electrode 24a and the cleaning work inside the first chamber member 21a, and the like are performed, it is necessary to detach the first chamber member 21a from the device body 30, and to take out the entire ion source 20 from the device body 30. However, in general, the frequency of performing the maintenance work inside the second chamber member 21b in which the consumable parts such as the heater wire are arranged is higher than the frequency of performing the maintenance work inside the first chamber member 21a. Therefore, in the ion source 20, the maintenance work inside the second chamber member 21b, which is performed with high frequency, can be performed without detaching the entire ion source 20 from the device body 30. The work of detaching only the second chamber member 21b is easier than detaching the entire ion source 20 from the device body 30. Therefore, the replacement work of the parts 24b and the like arranged inside the second chamber member 21b and the cleaning work inside the second chamber member 21b can be performed in a short time, compared to the case where the entire ion source 20 is detached from the device body 30.

[0115] As shown in FIG. 1, a pair of first shaft members 26a, 26a supported by a movable member 12 of an ion source moving device 10 described later are fixed to the outside of a pair of side walls 25a, 25a of the first chamber member 21a which are opposed to each other in the horizontal direction. The first shaft member 26a corresponds to the first supported member of the present application. Note that the configuration of the first supported member of the present application is not limited to the first shaft member 26a of the present embodiment. The configuration of the first supported member of the present application is not limited to a specific configuration. Figure 3

[0116] Further, a pair of upper side rollers 27a, 27a and a pair of lower side rollers 27b, 27b which can roll on guide rail members 18, 18 of the ion source moving device 10 described later are arranged on the pair of side walls 25a, 25a. The "upper side" and the "lower side" of the upper side rollers 27a and the lower side rollers 27b simply indicate the relative positional relationship in the state where the ion source 20 is attached to the device body 30.

[0117] Further, a pair of second shaft members 26b, 26b supported by the movable member 12 are fixed to the outside of a pair of side walls 25b, 25b of the second chamber member 21b which are opposed to each other in the horizontal direction. The second shaft member 26b corresponds to the second supported member of the present application. Note that in the present embodiment, the pair of second shaft members 26b, 26b are arranged on the second flange portion 22b, but the configuration is not limited to this. Further, the configuration of the second supported member of the present application is not limited to the second shaft member 26b of the present embodiment. The configuration of the second supported member of the present application is not limited to a specific configuration.

[0118] As shown in FIG. 1, a pair of first shaft members 26a, 26a supported by a movable member 12 of an ion source moving device 10 described later are fixed to the outside of a pair of side walls 25a, 25a of the first chamber member 21a which are opposed to each other in the horizontal direction. The first shaft member 26a corresponds to the first supported member of the present application. Note that the configuration of the first supported member of the present application is not limited to the first shaft member 26a of the present embodiment. The configuration of the first supported member of the present application is not limited to a specific configuration. Figure 6A ​As shown, the ion source 20 is configured such that, when viewed from the side, the first axis member 26a and the center of gravity G1 of the ion source 20 are aligned on a straight line L1. With the ion source 20 fixed to the device body 30, the straight line L1 is parallel to the vertical direction. That is, with the ion source 20 fixed to the device body 30, when viewed from the side, the first axis member 26a and the center of gravity G1 of the ion source 20 are aligned on the same straight line in the vertical direction.

[0119] Next, the ion source moving device 10 of this embodiment will be described.

[0120] like Figure 2 As shown, the ion source moving device 10 includes a pair of support members 11, 11 that support a pair of first shaft members 26a, 26a respectively. Furthermore, the ion source moving device 10 includes a movable member 12 connected to the support members 11, 11. The support member 11 is constructed by a hook 11a that supports the first shaft member 26a by hooking onto it, and a chain 11b that connects the hook 11a to the movable member 12. However, the configuration of the support member 11 is not limited to the above. For example, a wire can be used instead of a chain 11b. Furthermore, the support member 11 and the movable member 12 can be connected by a rigid body, and the support member 11 and the movable member 12 can also be pre-molded as a single unit.

[0121] The ion source moving device 10 further includes a lifting mechanism 13 that moves the movable member 12 up and down along a predetermined second direction D2. Furthermore, during the up-and-down movement of the movable member 12 via the lifting mechanism 13, movement of the movable member 12 in a direction intersecting the second direction D2, i.e., movement in a direction different from the second direction D2, is restricted. In this embodiment, the second direction D2 is a vertical direction. Additionally, the lifting mechanism 13 can be any mechanism that moves the movable member 12 up and down; the second direction D2 is not limited to a vertical direction.

[0122] The lifting mechanism 13 of this embodiment includes a pair of side pillars 13a, 13a arranged at a predetermined interval along a first horizontal direction D1. Furthermore, the lifting mechanism 13 includes a pair of other side pillars 13b, 13b arranged at a predetermined interval along the first horizontal direction D1. Each side pillar 13a and each other side pillar 13b are arranged opposite each other in the Y direction. The ion source moving device 10 moves the ion source 20 in the region between the side pillars 13a, 13a and the other side pillars 13b, 13b.

[0123] like Figure 2As shown, the lifting mechanism 13 has a pair of one-side guide members 14a that are lifted in the second direction D2 along one-side supports 13a, 13a, and a pair of other-side guide members 14b that are lifted in the second direction D2 along other-side supports 13b, 13b.

[0124] As shown by the dotted lines in FIG. 1, the other-side support 13b has a rail 15a arranged in parallel with the second direction D2, a block 15b that moves on the rail 15a, and a motor 15c that drives the block 15b. The block 15b is connected to the other-side guide member 14b. Although not shown, the other-side support 13b also has a rail 15a, a block 15b, and a motor 15c. When the motors 15c arranged in the pair of other-side supports 13b, 13b are operated, the blocks 15b move on the rails 15a, and the other-side guide member 14b moves in the second direction D2. Figure 2 As shown by the dotted lines in FIG. 1, the other-side support 13b has a rail 15a arranged in parallel with the second direction D2, a block 15b that moves on the rail 15a, and a motor 15c that drives the block 15b. The block 15b is connected to the other-side guide member 14b. Although not shown, the other-side support 13b also has a rail 15a, a block 15b, and a motor 15c. When the motors 15c arranged in the pair of other-side supports 13b, 13b are operated, the blocks 15b move on the rails 15a, and the other-side guide member 14b moves in the second direction D2.

[0125] Figure 5A As shown by the dotted lines in FIG. 1, the other-side support 13b has a rail 15a arranged in parallel with the second direction D2, a block 15b that moves on the rail 15a, and a motor 15c that drives the block 15b. The block 15b is connected to the other-side guide member 14b. Although not shown, the other-side support 13b also has a rail 15a, a block 15b, and a motor 15c. When the motors 15c arranged in the pair of other-side supports 13b, 13b are operated, the blocks 15b move on the rails 15a, and the other-side guide member 14b moves in the second direction D2.

[0126] The one-side guide members 14a and the other-side guide members 14b are driven by the four motors 15c arranged in the one-side supports 13a, 13a and the other-side supports 13b, 13b to move up and down in the second direction D2. The four motors 15c are controlled based on the results of detecting the positions of the one-side guide members 14a and the other-side guide members 14b by sensors not shown, so that the one-side guide members 14a and the other-side guide members 14b are always positioned at the same position in the height direction.

[0127] The movable member 12 is supported by the one-side guide members 14a and the other-side guide members 14b. Therefore, the movable member 12 moves up and down in the second direction D2 as the one-side guide members 14a and the other-side guide members 14b move up and down in the second direction D2. As shown in FIG. 1, the movable member 12 is fixed to blocks 16b arranged in the one-side guide members 14a and the other-side guide members 14b. Figure 6A

[0128] ​​As described later, block 16b is driven by motor 16c to move on track 16a. Block 16b is configured to remain stationary on track 16a when not driven by motor 16c, and will not move on track 16a. Accordingly, movable member 12 is configured to restrict movement in a direction intersecting the second direction D2, that is, movement in a direction different from the direction along the second direction D2. Furthermore, as described later, block 16b is configured to be able to move along the first horizontal direction D1 by being driven by motor 16c, therefore movable member 12 can also move along the first horizontal direction D1.

[0129] Although the movable member 12 is configured to restrict movement in a direction intersecting the second direction D2, i.e., movement in a direction different from the direction along the second direction D2, the movable member 12 is not always restricted to movement in a direction different from the direction along the second direction D2. That is, the movable member 12 only needs to be restricted to move in a direction different from the direction along the second direction D2 during the operation of loading and unloading the ion source 20 onto the device body 30. Furthermore, the lifting mechanism 13 can be any configuration as long as it is a mechanism that restricts the movement of the movable member 12 in a direction intersecting the second direction D2 while lifting the movable member 12 in the second direction D2, and is not limited to the configuration of this embodiment.

[0130] like Figure 5A As shown, the ion source moving device 10 of this embodiment includes a transfer mechanism 16 that moves the movable member 12 along a first horizontal direction D1. The transfer mechanism 16 can be used simply to move the movable member 12 along the first horizontal direction D1 when viewed from above, and a chain crane or the like can also be used. In this embodiment, the transfer mechanism 16 is arranged to be housed inside one side guide member 14a and the other side guide member 14b.

[0131] like Figure 1As shown, the transfer mechanism 16 includes: a track 16a disposed inside one side guide member 14a and the other side guide member 14b respectively; a block 16b that moves on the track 16a; and a motor 16c that drives the block 16b. A movable member 12 is connected to a pair of blocks 16b disposed inside one side guide member 14a and the other side guide member 14b. Therefore, when the motor 14c drives the block 16b, the movable member 12 moves along the track 16a as the block 16b moves. That is, when the transfer mechanism 16 is driven, the movable member 12 moves along a first horizontal direction D1 on one side guide member 14a and the other side guide member 14b. In addition, the transfer mechanism 16 is not limited to the configuration of this embodiment. For example, the transfer mechanism 16 may also be configured using a ball screw. At this point, it is sufficient to replace the track 16a and the block 16b with a screw shaft and a ball nut that moves on the screw shaft, respectively, and fix the movable member 12 to the ball nut.

[0132] like Figure 2 As shown, the ion source moving device 10 further includes a pair of guide rail members 18, 18 that support the ion source 20 while guiding the chamber 21 to move along a first horizontal direction D1. Each guide rail member 18 has a guide groove 18a parallel to the first horizontal direction D1. The ion source 20 is supported by the guide rail members 18, 18, with its upper roller 27a and lower roller 27b embedded in the guide groove 18a. Furthermore, when an operator applies external force to the ion source 20 manually or with a winch (not shown), the upper roller 27a and lower roller 27b of the ion source 20 roll on the guide groove 18a, and the ion source 20 moves along the first horizontal direction D1 on the guide rail members 18, 18. That is, the ion source 20 is guided while being supported by the guide rail members 18, 18 and moving along the first horizontal direction D1.

[0133] Furthermore, the ion source moving device 10 includes a trolley 19 for transporting the ion source 20. The trolley 19 includes: a pair of trolley side guide grooves 19a, 19a accommodating the upper roller 27a and lower roller 27b of the ion source 20; and four wheels 19b for moving the trolley 19. The ion source 20 is supported by the trolley 19 with the upper roller 27a and lower roller 27b embedded in the trolley side guide grooves 19a, 19a. In addition, during the assembly of the ion implantation device 100 and the replacement of the ion source 20, the ion source 20 is transported between the external environment and the ion implantation device 100 while being placed on the trolley 19.

[0134] Furthermore, the trolley 19 is configured such that the bottom surfaces of the trolley side guide grooves 19a, 19a are at the same height as the bottom surfaces of the guide grooves 18a, 18a. Therefore, by having an operator bring the trolley 19, which carries the ion source 20, into contact with the guide rail components 18, 18, the ion source 20 is moved close to the device body 30 by manual labor or by a machine (not shown). Accordingly, the ion source 20 can be moved from the trolley 19 onto the guide rail components 18, 18.

[0135] Next, the operation of the ion source moving device 10 will be explained.

[0136] Figures 5A to 5D and Figure 6A , Figure 6B A side view of the ion source moving device 10 viewed in the Y direction; for ease of understanding, only the portion inside the guide member 14b on the other side is shown. Figure 5A and Figure 5B The bottom surface of guide trench 18a is shown by a single chain line.

[0137] like Figure 5A As shown by the dashed lines, when the ion source 20 is installed onto the device body 30, firstly, the ion source 20 is transported from the outside in a folded position with the first flange 22a facing downwards on the trolley 19. Next, the trolley 19 is positioned such that the trolley-side guide groove 19a and guide groove 18a are aligned along the first horizontal direction D1. Then, the ion source 20 is moved along the first horizontal direction D1, thereby being placed onto the guide rail member 18 and positioned at position P1. Next, the hook 11a is attached to the first shaft member 26a of the ion source 20.

[0138] Then, the lifting mechanism 13 is driven, and one side guide member 14a and the other side guide member 14b move upward along the second direction D2, thereby causing the movable member 12 to move upward along the second direction D2. In this way, as... Figure 5B As shown, the lower roller 27b rolls on the guide groove 18a, while the ion source 20 is simultaneously lifted by the first shaft member 26a. Accompanying this, the ion source 20 stands upright, moving upwards while tracing a curved trajectory with its center of gravity G1, thus changing its posture.

[0139] Then, as Figure 5C As shown, after the ion source 20 leaves the guide channel 18a, the first shaft member 26a and the center of gravity G1 are aligned vertically, so the ion source 20 moves to the second position P2 opposite to the device body 30 without changing its posture. Then, the transfer mechanism 16 is driven to move the movable member 12 along the first horizontal direction D1, thereby bringing the ion source 20 closer to the device body 30. At this time, as... Figure 5DAs shown, the transfer mechanism 16 moves the ion source 20 to a position where the mounting work to the device body 30 is performed, that is, the third position P3. Then, the ion source 20 is fixed to the device body 30 by the worker.

[0140] The operation of detaching the ion source 20 from the device body 30 is performed by performing a procedure opposite to the procedure described above, and thus the description is omitted.

[0141] In the ion source moving device 10 of the present embodiment, the movable member 12 is moved up and down in the predetermined second direction D2 while the first shaft member 26a belonging to the first supported member is supported by the support member 11, whereby the ion source 20 can be moved up and down. At this time, the movement of the movable member 12 in a direction intersecting the second direction D2 is restricted, and thus the shaking of the movable member 12 is suppressed. Therefore, the shaking of the support member 11 coupled to the movable member 12 is suppressed, and thus the shaking of the ion source 20 supported by the support member 11 is also suppressed. As a result, the worker can easily move the ion source 20 up and down while supporting the ion source 20. Alternatively, the ion source 20 can be moved up and down without being supported by the worker. That is, the ion source 20 can be moved up and down smoothly, and in addition to the improvement in workability of the work of attaching and detaching the ion source 20 to and from the device body 30, the safety of the work can also be improved.

[0142] Further, in the ion source moving device 10, the pair of first shaft members 26a, 26a belonging to the first supported member are respectively fixed to a pair of side walls 25a, 25a of the chamber 21 that are opposed in the horizontal direction, and the movable member 12 is moved in the second direction D2 while the support member 11 supports each of the first shaft members 26a, 26a. Therefore, the support member 11 supports the chamber 21 at two places, and thus the shaking of the ion source 20 is further suppressed, and the ion source 20 can be moved up and down in a more stable state.

[0143] Further, the center of gravity G1 of the ion source 20 and the first shaft member 26a belonging to the first supported member are located on the same straight line in the vertical direction. Therefore, the ion source 20 can be moved up and down in the vertical direction without tilting, and the shaking of the ion source is further suppressed, and the ion source 20 can be moved up and down in a more stable state.

[0144] Further, the ion source moving device 10 has the transfer mechanism 16 that moves the movable member 12 in the first horizontal direction D1 in addition to the up-and-down mechanism 13. Therefore, after the ion source 20 is positioned in the standing posture to the second position P2 opposite the device body 30 using the up-and-down mechanism 13, the ion source 20 can be moved to the third position P3 as the mounting work position using the transfer mechanism 16.

[0145] Next, the action of detaching the second chamber member 21b from the first chamber member 21a will be described.

[0146] like Figure 6A As shown, firstly, the lifting mechanism 13 and the transfer mechanism 16 are driven to move the movable member 12 above the second shaft member 26b, and hook the hook 11a onto the second shaft member 26b. Then, while driving the lifting mechanism 13 to lower one side guide member 14a and the other side guide member 14b, the transfer mechanism 16 is driven to move the movable member 12 relative to one side guide member 14a and the other side guide member 14b in the first horizontal direction D1 toward the direction away from the device body 30. In this way, as Figure 6B As shown by the dashed line, the second chamber member 21b is disengaged from the first chamber member 21a by rotating through the hinge member 23.

[0147] In this embodiment, the second chamber member 21b is configured such that its center of gravity G2 is located on the opposite side of the first chamber member 21a in the first horizontal direction D1, more so than the second shaft member 26b. Therefore, the second shaft member 26b rotates around the pivot A1 via the hinge member 23 under its own weight. That is, at this time, the operator moves the lifting mechanism 13 and the transfer mechanism 16 by slowly rotating the second shaft member 26b while it is supported by the support member 11.

[0148] As described above, the first chamber member 21a rotates relative to the second chamber member 21b about the rotation axis A, thereby causing the first chamber member 21a to detach from the second chamber member 21b. Then, ultimately, the first chamber member 21a is... Figure 6B The support platform 17 is shown in the diagram as being supported. This exposes the internal space of the first chamber component 21a, allowing operators to perform maintenance tasks such as parts replacement and cleaning within the second chamber component 21b. Furthermore, the support platform 17 can be of any configuration as long as it can support the second chamber component 21b. The support platform 17 can also be incorporated as part of the guide rail component 18, or it can be transported in from the outside during operation.

[0149] After maintenance work is completed in the second chamber component 21b, the second chamber component 21b must be fixed to the first chamber component 21a. This procedure is simply the reverse of the above procedure, so the explanation is omitted.

[0150] Furthermore, the present invention is not limited to the above-described embodiments and variations, and various modifications can be made without departing from its spirit, which need not be elaborated upon.

Claims

1. An ion source moving device that moves an ion source having a chamber fixed to a device body of an ion implantation device in a manner opposed to the device body in a first horizontal direction, with a center of gravity of the ion source being raised and lowered and a tilt of the ion source with respect to the device body being changed; the ion source moving device comprising: a pair of support members that can support first supported members fixed to a pair of side walls of the chamber opposed in the horizontal direction, respectively; a movable member linked to the pair of support members; and a raising and lowering mechanism that can restrict the movable member from moving in a direction intersecting a predetermined second direction and raise and lower the movable member in the second direction; The lifting mechanism has one side support column, another side support column, one side guide member, another side guide member, wherein the one side guide member is raised and lowered along the one side pillar in the second direction, the other side guide member is raised and lowered along the other side pillar in the second direction, and the ion source is moved between the one side pillar and the other side pillar; the movable member is configured to be supported by the one side guide member and the other side guide member and to be movable in the second direction in a state in which the first supported members are supported together by the pair of support members, as the one side guide member and the other side guide member are raised and lowered.

2. The ion source movement device of claim 1, wherein, the second direction is a vertical direction; and configured so that, when viewed from the side in a state in which the ion source is fixed to the device body, the center of gravity of the ion source and the first supported members are located on the same straight line in the vertical direction.

3. The ion source movement apparatus of claim 1, wherein, the second direction is a vertical direction; and configured so that, when viewed from the side in a state in which the ion source is fixed to the device body, the center of gravity of the ion source and the first supported members are located on the same straight line in the vertical direction.

4. The ion source moving device according to any one of claims 1 to 3, further comprising a transfer mechanism that moves the movable member in the first horizontal direction when viewed from above.

5. The ion source movement apparatus of claim 4, wherein, configured so that the chamber has: a plasma generation portion side chamber member that generates plasma inside; and an electrode side chamber member configured to be detachable from the plasma generation portion side chamber member and houses an electrode that extracts an ion beam from the plasma; the second supported members supported by the support members are fixed to the plasma generation portion side chamber member; the movable member is moved in the first horizontal direction and the second direction in a state in which the electrode side chamber member is fixed to the device body and the second supported members are supported by the support members, whereby the plasma generation portion side chamber member is caused to be detached from the electrode side chamber member.

6. An ion implantation device comprising: a device body; an ion source having a chamber fixed to the device body in a manner opposed to the device body in a first horizontal direction; and an ion source moving device that moves the ion source with a center of gravity of the ion source being raised and lowered and a tilt of the ion source with respect to the device body being changed; the ion source moving device comprising: a pair of support members capable of supporting first supported members respectively fixed to a pair of side walls of the chamber which are opposed in a horizontal direction; a movable member coupled to the pair of support members; and a lifting mechanism capable of restricting movement of the movable member in a direction intersecting a predetermined second direction while allowing the movable member to move up and down in the second direction; The lifting mechanism has one side support column, another side support column, one side guide member, another side guide member, wherein the one side guide member is capable of moving up and down in the second direction along the one side pillar, the other side guide member is capable of moving up and down in the second direction along the other side pillar, and the ion source is capable of moving between the one side pillar and the other side pillar; the movable member is capable of being supported by the one side guide member and the other side guide member and moving in the second direction while being supported by the one side guide member and the other side guide member in a state in which the first supported members are supported together by the pair of support members.

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