A vapor deposition apparatus

Abstract

The application discloses a kind of vapor deposition devices, comprising: furnace body, the cavity is provided in the furnace body;Supporting table is arranged in the accommodating cavity, and the supporting table is used to carry workpiece;Gas inlet assembly is sent to the deposition gas in the accommodating cavity, the gas inlet assembly is provided with two groups, and two groups of the gas inlet assembly are symmetrically arranged on the two sides of the accommodating cavity;Gas outlet assembly is arranged on the furnace body, and the accommodating cavity is communicated;Drive assembly, the output of the drive assembly is connected with the supporting table, drives the supporting table to rotate around the axis direction of the output while moving along the axis direction of the output shaft.The chemical vapor deposition device provided by the application can improve the problem of uneven deposition thickness on the surface of large-size or special-shaped workpieces compared with the prior art, and improve the performance of the product.

Description

Technical Field

[0001] This application relates to the field of chemical equipment technology, and more specifically, to a vapor deposition apparatus. Background Technology

[0002] Semiconductor materials are a crucial link in the semiconductor industry chain and the foundation for the development of the integrated circuit industry. With the rapid development of my country's integrated circuit industry, semiconductor materials have undergone several transformations. Compared to first-generation semiconductors (Si, Ge), third-generation semiconductors (SiC, GaN, ZnO, etc.) have higher electrical conductivity, wider bandgap, and higher thermal conductivity, and are widely used in the "core" of microwave RF devices, semiconductor lighting, next-generation mobile communications, and new energy vehicles. Especially in the semiconductor light-emitting diode (LED) industry, third-generation semiconductor GaN materials have attracted much attention from experts and scholars due to their high frequency, low loss, and high efficiency. Currently, there are many methods for preparing next-generation GaN single crystals, with epitaxial growth being the most commonly used method. SiC-coated graphite substrates are a key consumable in this preparation process; therefore, their quality significantly affects the application of SiC-coated graphite substrates in the semiconductor lighting industry.

[0003] Chemical vapor deposition (CVD) is an important method for preparing SiC-coated graphite substrates. Currently, the graphite substrate is often placed in a CVD apparatus for deposition. However, for large or irregularly shaped graphite substrates, the surface deposition performance is greatly affected by the temperature and gas flow fields inside the deposition apparatus. When traditional CVD apparatuses are used for the deposition of large or irregularly shaped graphite substrates, the uniformity of the deposition thickness on the graphite substrate surface deteriorates, which seriously affects the performance of the product.

[0004] Therefore, there is an urgent need for a vapor deposition apparatus for vapor deposition of large-sized workpieces, which can improve the problem of uneven deposition thickness on the surface of large or irregularly shaped workpieces and improve product performance. Summary of the Invention

[0005] To address the aforementioned technical problems, this application provides a vapor deposition apparatus that can improve the uneven deposition thickness on the surface of large-sized or irregularly shaped workpieces, thereby enhancing product performance.

[0006] The technical solution provided in this application is as follows:

[0007] A vapor deposition apparatus, comprising:

[0008] Furnace body, wherein a receiving cavity is provided inside the furnace body;

[0009] A support platform disposed within the accommodating cavity for supporting the workpiece;

[0010] An air intake assembly for supplying deposited gas into the accommodating cavity, wherein two sets of air intake assemblies are provided and the two sets of air intake assemblies are symmetrically arranged on both sides of the accommodating cavity;

[0011] An air outlet assembly disposed on the furnace body and communicating with the accommodating cavity;

[0012] A drive assembly, the output end of which is connected to the support platform, drives the support platform to rotate around the axis of the output end while moving along the axis of the output shaft.

[0013] Preferably, the driving component includes:

[0014] A first link connected to the support platform, the end of the first link away from the support platform being connected to a rotary drive member, so that the support platform rotates about the axis of the first link;

[0015] A second connecting rod is sleeved on the outside of the first connecting rod and movably connected to the furnace body. The second connecting rod is connected to a moving drive component, which drives the second connecting rod to move along its axial direction.

[0016] Preferably, the intake assembly includes:

[0017] An air inlet pipe is installed on the side wall of the furnace body. At least two sets of the air inlet pipe are provided and are spaced apart along the height direction of the furnace body.

[0018] An air distribution component disposed within the accommodating cavity and connected to the outlet end of the air inlet pipe, used to evenly distribute airflow into the accommodating cavity.

[0019] Preferably, the intake assembly further includes:

[0020] An air intake adjustment mechanism is installed outside the furnace body and connected to the air intake pipe for adjusting the angle between the air intake pipe and the side wall.

[0021] Preferably, the air distribution component is a spherical cavity that communicates with the air outlet end of the air inlet pipe, and the outer surface of the spherical cavity is provided with air distribution holes at intervals.

[0022] Preferably, the air outlet assembly includes:

[0023] An exhaust pipe is connected to the accommodating cavity. A switch for opening and closing the exhaust pipe is provided at the outlet of the exhaust pipe. There are two sets of exhaust pipes, which are respectively located at the top and bottom of the furnace body.

[0024] Preferably, the air outlet assembly further includes:

[0025] A vacuum pumping system, which is connected to the outlet pipe, is used to extract gas from the accommodating cavity.

[0026] Preferably, the air outlet assembly further includes:

[0027] An exhaust gas purification system is connected to the exhaust pipe and is used to purify the discharged reaction gas.

[0028] Preferably, it further includes:

[0029] A heating device installed on the furnace body for heating the reaction gas in the accommodating cavity;

[0030] Temperature measuring device for detecting the temperature inside the accommodating cavity;

[0031] A controller connected to the temperature measuring device, the controller being connected to the heating device.

[0032] Preferably, the air outlet assembly further includes:

[0033] A pressure sensor is installed inside the accommodating cavity, and the pressure sensor is connected to the controller, which is connected to the switch of the air outlet pipe.

[0034] The vapor deposition apparatus provided by this invention is mainly used for large-sized or irregularly shaped workpieces. It comprises a furnace body, a support platform, an inlet assembly, and an outlet assembly. The furnace body contains a sealed cavity. The support platform is located within the cavity and supports the workpiece. The inlet assembly supplies deposition gas into the cavity. Two sets of inlet assemblies are symmetrically arranged on both sides of the furnace body, reducing the influence of the airflow field on various parts of the workpiece. Furthermore, the external deposition gas entering the cavity can be quickly and uniformly mixed, preventing uneven temperature distribution throughout the cavity. The outlet assembly discharges the reaction gas from the cavity.

[0035] Secondly, to further ensure the deposition quality on the workpiece surface, a driving component is also provided. The output end of the driving component is connected to the support platform, driving the support platform to rotate around the axis of the output end while moving along the axis of the output shaft. Under the action of the driving component, the support platform and the workpiece can rotate at a first speed within the accommodating cavity while moving at a second speed along the axis of the output shaft. On the one hand, this ensures that all surfaces of the workpiece can be in uniform contact with the deposition gas; on the other hand, the support platform drives the flow of the deposition gas within the accommodating cavity, allowing external deposition gas to enter the accommodating cavity and mix quickly and uniformly, resulting in a consistent temperature throughout the accommodating cavity, thereby ensuring the deposition quality on the workpiece surface. Therefore, compared with the prior art, the vapor deposition apparatus in this embodiment of the invention can improve the problem of uneven deposition thickness on the surface of large-sized or irregularly shaped workpieces, improving product performance. Attached Figure Description

[0036] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0037] Figure 1 This is a schematic diagram of a vapor deposition apparatus provided in an embodiment of the present invention;

[0038] Figure 2 This is a schematic diagram of a gas distribution component provided in an embodiment of the present invention;

[0039] Figure 3 for Figure 2 Side view;

[0040] Figure 4 for Figure 2 Top view.

[0041] Reference numerals: 1. Furnace body; 2. Workpiece; 3. Support platform; 4. Drive assembly; 6. Gas outlet pipe; 81. Heating device; 82. Insulation layer; 9. Vacuum pumping system; 41. First connecting rod; 42. Rotary drive component; 43. Second connecting rod; 44. Moving drive component; 51. Gas inlet pipe; 52. Gas distribution component; 53. Gas distribution hole; 54. Gas inlet regulating mechanism; 71. Infrared temperature measuring mechanism; 72. Thermocouple temperature measuring mechanism. Detailed Implementation

[0042] To enable those skilled in the art to better understand the technical solutions in this application, the technical solutions in the embodiments of this application will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0043] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly set on the other component; when a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to the other component.

[0044] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0045] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "a plurality of" or "several" means two or more, unless otherwise explicitly specified.

[0046] It should be noted that the structures, proportions, sizes, etc., shown in the accompanying drawings of this specification are only for the purpose of assisting those skilled in the art in understanding and reading the content disclosed in the specification, and are not intended to limit the conditions under which this application can be implemented. Therefore, they have no substantial technical significance. Any modifications to the structure, changes in the proportions, or adjustments to the size should still fall within the scope of the technical content disclosed in this application, provided that they do not affect the effects and purposes that this application can produce.

[0047] The embodiments of this invention are written in a progressive manner.

[0048] like Figures 1 to 4 As shown, this embodiment of the invention provides a vapor deposition apparatus, comprising: a furnace body 1, wherein a receiving cavity is provided inside the furnace body 1; a support platform 3 disposed within the receiving cavity, the support platform 3 being used to support a workpiece 2; an air inlet assembly for supplying deposition gas into the receiving cavity, wherein two sets of air inlet assemblies are provided, and the two sets of air inlet assemblies are symmetrically disposed on both sides of the receiving cavity; an air outlet assembly disposed on the furnace body 1 and communicating with the receiving cavity; and a drive assembly 4, wherein the output end of the drive assembly 4 is connected to the support platform 3, driving the support platform 3 to rotate around the axis of the output end while moving along the axis of the output shaft.

[0049] It should be noted that the vapor deposition apparatus provided in this embodiment of the invention is mainly used for vapor deposition of large or irregularly shaped workpieces. The coating performance on the surface of large or irregularly shaped workpieces is greatly affected by the temperature field and airflow field inside the deposition apparatus. When traditional vapor deposition apparatuses are used for vapor deposition of large or irregularly shaped workpieces, the uniformity of the deposition thickness on the surface of large or irregularly shaped workpieces deteriorates, which seriously affects the performance of the product.

[0050] Existing vapor deposition equipment often employs bottom gas inlet and static deposition of the workpiece. The deposition gas enters directly into the bottom of the deposition chamber and quickly enters the high-temperature zone in the middle of the deposition furnace. This can easily cause the product temperature at the bottom of the deposition furnace to be too low, failing to reach the deposition temperature. Moreover, the deposition gas passes through the bottom of the workpiece quickly without having time to deposit on the bottom of the workpiece, resulting in poor deposition effect at the bottom of the workpiece, inconsistent deposition quality at different locations on the workpiece, or inconsistent quality at different parts of the same product.

[0051] The vapor deposition apparatus provided by this invention comprises a furnace body 1, a support platform 3, an inlet assembly, and an outlet assembly. The furnace body 1 contains a sealed cavity. The support platform 3 is located within the cavity and is used to support the workpiece 2. The inlet assembly is used to supply deposition gas into the cavity. Two sets of inlet assemblies are symmetrically arranged on both sides of the furnace body 1. The external deposition gas can be quickly and uniformly mixed upon entering the cavity, preventing uneven temperature distribution of the deposition gas throughout the cavity. The outlet assembly is used to discharge the reaction gas from the cavity.

[0052] Secondly, to further ensure the deposition quality on the workpiece surface, a drive assembly 4 is also provided. The output end of the drive assembly 4 is connected to the support platform 3, driving the support platform 3 to rotate around the axis of the output end while moving along the axis of the output shaft. Under the action of the drive assembly 4, the support platform 3 and the workpiece 2 can rotate at a first speed within the accommodating cavity while moving at a second speed along the axis of the output shaft. On the one hand, this ensures that all surfaces of the workpiece 2 can be in uniform contact with the deposition gas. On the other hand, the support platform 3 drives the flow of the deposition gas within the accommodating cavity, allowing the external deposition gas to enter the accommodating cavity and mix quickly and uniformly, resulting in a consistent temperature throughout the accommodating cavity, thereby ensuring the deposition quality on the surface of the workpiece 2. Therefore, compared with the prior art, the vapor deposition apparatus in this embodiment of the invention can improve the problem of uneven deposition thickness on the surface of large-sized or irregularly shaped workpieces, thus improving product performance.

[0053] In the above structure, as one embodiment, the driving component 4 in this invention includes a first connecting rod 41, a rotary driving member 42, a second connecting rod 43, and a moving driving member 44. The first connecting rod 41 is connected to the support platform 3, and the end of the first connecting rod 41 away from the support platform 3 is connected to the rotary driving member 42. Under the action of the rotary driving member 42, the first connecting rod 41 and the support platform 3 are driven to rotate around the axis of the first connecting rod 41. By driving the workpiece 2 on the support platform 3 to rotate at a first speed, the workpiece 2 is made to make uniform contact with the deposition gas in the accommodating cavity, ensuring that the deposition thickness on the surface of the workpiece 2 is generally consistent. The second connecting rod 43 is fitted on the outside of the first connecting rod 41 and is movably connected to the furnace body 1. The moving driving member 44 drives the support platform 3 to move along the axis of the second connecting rod 43. The movement of the support platform 3 in the accommodating cavity drives the flow of the deposition gas in the accommodating cavity, making the temperature in all parts of the accommodating cavity quickly and evenly mixed, avoiding the influence of the temperature field on the deposition thickness of the large-sized workpiece 2. Furthermore, in this embodiment of the invention, the second connecting rod 43 is fixedly connected to the support platform 3. To ensure the performance of the rotary drive component 42 and the moving drive component 44, since the accommodating cavity is a high-temperature environment, the rotary drive component 42 and the moving drive component 44 in this embodiment of the invention are located outside the furnace body 1, and a sealing component is provided between the second connecting rod 43 and the furnace body 1 to ensure that the deposited gas in the accommodating cavity will not leak.

[0054] In the above structure, in order to further reduce the influence of airflow field on the large workpiece 2 during processing, as one embodiment of the present invention, the air intake assembly further includes an air intake pipe 51 and an air distribution component 52. The air intake pipe 51 is movably arranged on the side wall of the furnace body 1. At least two sets of air intake pipes 51 are provided and are spaced apart along the height direction of the furnace body 1. The air distribution component 52 is arranged in the accommodating cavity and is connected to the outlet end of the air intake pipe 51 for uniformly distributing airflow into the accommodating cavity. Specifically, one end of the air inlet pipe 51 is connected to the deposition gas source, and the other end of the air inlet pipe 51, away from the deposition gas source, extends into the accommodating cavity and is connected to the gas distributor 52. In this embodiment of the invention, two sets of air inlet components are provided, symmetrically arranged on both sides of the accommodating cavity. Each set of air inlet components includes at least two air inlet pipes 51, which are spaced apart along the height direction of the furnace body 1. The outlet end of the air inlet pipe 51 is provided with a gas distributor 52. Through the gas distributor 52, the deposition gas can be evenly dispersed in the accommodating cavity. Compared with the prior art where the air inlet pipe 51 is located at the bottom of the furnace body 1, the air inlet component provided in this embodiment of the invention provides more uniform air intake, preventing the problem of uneven surface deposition thickness caused by the influence of the deposition gas flow field on large-sized or irregularly shaped workpieces 2.

[0055] Furthermore, in order to better process the workpiece, as one specific implementation, the air intake assembly in this embodiment of the invention also includes an air intake adjustment mechanism 54, wherein the air intake adjustment mechanism 54 is disposed outside the furnace body 1 and is connected to the air intake pipe 51. During the processing stage, according to the process requirements, the angle between the air intake pipe 51 and the side wall of the furnace body 1 is adjusted in real time by the air intake adjustment mechanism 54.

[0056] More specifically, the intake adjustment mechanism in this embodiment of the invention includes a swing motor, wherein the output shaft of the swing motor is connected to the intake pipe, and the intake angle of the intake pipe is adjusted by the swing motor.

[0057] Furthermore, as one embodiment, the gas distributor 52 in this invention is specifically a spherical cavity connected to the outlet end of the inlet pipe 51, with gas distribution holes 53 spaced apart on the outer surface of the spherical cavity. Before entering the accommodating cavity, the gas distributor 52 diverts the deposited gas, uniformly dispersing the deposited gas within the accommodating cavity, thereby improving the uniformity of the gas within the accommodating cavity.

[0058] Furthermore, as one embodiment, the air distribution hole 53 in this embodiment of the invention is disposed at one end of the spherical cavity near the air inlet pipe 51.

[0059] More specifically, as one embodiment of the invention, the plurality of air distribution holes form an air outlet assembly. In this embodiment, "plural" refers to two or more. The air outlet assemblies are evenly spaced apart in a direction away from the air inlet pipe 51, and the air distribution holes within one air outlet assembly are evenly spaced circumferentially around the central axis of the spherical cavity. This arrangement allows the gas in the air inlet pipe 51 to enter the receiving cavity evenly.

[0060] Furthermore, as one embodiment, the gas outlet component in this invention includes a gas outlet pipe 6 and a switch (not shown). The gas outlet pipe 6 is connected to the accommodating cavity. A switch for opening and closing the gas outlet pipe 6 is provided at the outlet of the gas outlet pipe. During the processing preparation stage, the switch on the gas outlet pipe 6 is opened to discharge the air in the accommodating cavity through the gas outlet pipe 6. During the processing stage, the switch on the gas outlet pipe 6 is opened and closed according to the processing needs to control the processing pressure in the accommodating cavity. The deposited gas processes the workpiece in the cavity. After processing, the switch on the gas outlet pipe 6 needs to be opened to discharge the reacted gas. In order to accelerate the venting speed during the processing preparation stage, as a more specific embodiment, two sets of gas outlet pipes 6 are provided, which are respectively located at the top and bottom of the furnace body 1. During the processing preparation stage, both sets of gas outlet pipes 6 are opened to quickly vent the gas in the accommodating cavity and further improve the venting efficiency. During the processing deposition stage, one set of gas outlet pipes 6 is closed to better control the gas pressure in the accommodating cavity.

[0061] In the above structure, as one embodiment, the gas outlet assembly in this embodiment of the invention further includes a vacuum pumping system 9, which is connected to the gas outlet pipe 6 and used to pump gas from the accommodating cavity. In the above structure, as one embodiment, the gas outlet pipe 6 is symmetrically arranged at the top and bottom of the accommodating cavity. Before the workpiece undergoes deposition processing, connecting the vacuum pumping system 9 to the gas outlet pipe 6 enables rapid achievement of a high vacuum within the accommodating cavity and significantly reduces the vacuuming time.

[0062] In the above structure, as one embodiment, the exhaust component in this invention also includes an exhaust gas purification system. The exhaust gas purification system is connected to the exhaust pipe 6 and purifies the exhaust gas generated during the preparation process. After the exhaust gas is purified and qualified, it is discharged, which is more environmentally friendly.

[0063] In the above structure, as one embodiment, the vapor deposition apparatus of the present invention further includes a heating device 81, a temperature measuring device, and a controller. The heating device 81 is used to heat the reaction gas in the accommodating cavity, the temperature measuring device is used to detect the temperature in the accommodating cavity, and the controller is connected to the temperature measuring device. When the temperature value in the accommodating cavity detected by the temperature measuring device is not greater than the preset temperature, the reaction gas in the accommodating cavity is heated by the heating device 81. When the temperature value in the accommodating cavity detected by the temperature measuring device is equal to the preset temperature, the heating device 81 stops working. Because a controller, a temperature measuring device, and a heating device are provided, the temperature in the accommodating cavity can be controlled more intelligently.

[0064] Furthermore, as one embodiment, the temperature measuring device in this invention includes a thermocouple temperature measuring mechanism 72 and an infrared temperature measuring mechanism 71. The thermocouple temperature measuring mechanism 72 and the infrared temperature measuring mechanism 71 are both disposed at the top of the accommodating cavity, and the thermocouple temperature measuring mechanism 72 and the infrared temperature measuring mechanism 71 are symmetrically disposed on both sides of the air outlet pipe 6 to avoid temperature deviation between the thermocouple temperature measuring mechanism 72 and the infrared temperature measuring mechanism 71.

[0065] Furthermore, when the temperature inside the cavity rises to 1600℃, if the thermocouple temperature measuring mechanism 72 continues to be used for temperature measurement, problems such as damage to the thermocouple temperature measuring mechanism 72 and inaccurate temperature measurement may occur. In order to solve the above problems, when the temperature inside the furnace is low, the thermocouple temperature measuring mechanism 72 is inserted into the cavity to measure the temperature inside the cavity. When the temperature measured by the thermocouple temperature measuring mechanism 72 is 1600℃, the infrared temperature measuring mechanism 71 is switched to measure the temperature inside the cavity, which can accurately control the temperature error inside the furnace within ±1℃.

[0066] Furthermore, as one embodiment, the heating device 81 in this embodiment is specifically a graphite heating element; more specifically, the graphite heating element in this embodiment is disposed inside the furnace body 1. In the above structure, as one embodiment, the vapor deposition apparatus in this embodiment further includes a heat insulation layer 82, wherein the heat insulation layer 82 is disposed on the outside of the heating device 81, serving to insulate against heat loss and prevent overheating of the furnace body 1, thus avoiding burns. Further, the furnace body 1 in this embodiment is specifically made of stainless steel, and the heat insulation layer 8 in this embodiment is specifically made of heat insulation felt.

[0067] In the above structure, in order to achieve precise control of the gas pressure in the accommodating cavity, as one embodiment of the present invention, the gas outlet component also includes a pressure sensor and a controller. During the processing, when the pressure sensor detects that the pressure in the accommodating cavity is greater than the preset pressure, the controller controls the opening of one set of gas outlet pipes to release pressure, thereby precisely controlling the gas pressure in the accommodating cavity.

[0068] The present invention also provides a method for processing based on the above-described vapor deposition apparatus, comprising the following steps:

[0069] S1. Open the vent pipe and use the vacuum pumping system to quickly bring the accommodating cavity to a high vacuum.

[0070] S2. Close the air outlet pipe, turn on the heating device to heat to the preset temperature, open the air inlet pipe to start the drive assembly 4, and drive the workpiece on the support table to rotate and move up and down at a uniform speed in the accommodating cavity.

[0071] In step S2, based on the requirements of the workpiece processing, the angle between the air inlet pipe 51 and the side wall of the furnace body 1 is adjusted in real time by the air inlet adjustment mechanism 54, thereby realizing the adjustment of the air inlet angle.

[0072] In step S2, when the air pressure in the accommodating cavity is greater than the preset pressure value, the switch of one set of air outlet pipes is opened to ensure that the air pressure in the accommodating cavity is not greater than the preset pressure value.

[0073] In step S2, when the temperature inside the accommodating cavity is below 1600℃, a thermocouple temperature measuring mechanism is used for temperature measurement. When the temperature inside the accommodating cavity rises to 1600℃, the temperature is switched to an infrared temperature measuring mechanism to avoid the problem of easy damage to the thermocouple temperature measuring mechanism and inaccurate temperature measurement under high temperature conditions. By switching to the infrared temperature measuring mechanism, the temperature error inside the accommodating cavity can be accurately controlled within ±1℃.

[0074] The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A vapor deposition apparatus characterized by comprising: The device comprises: a furnace body (1) in which a containing cavity is arranged; a support table (3) arranged in the containing cavity and used for carrying a workpiece (2); an air inlet assembly arranged in the containing cavity and used for conveying deposition air, the air inlet assembly is arranged in two groups and symmetrically arranged on both sides of the containing cavity; an air outlet assembly arranged on the furnace body (1) and communicated with the containing cavity; a driving assembly (4) whose output end is connected with the support table (3) to drive the support table (3) to rotate around the axis direction of the output end and move along the axis direction of the output shaft; the driving assembly (4) comprises: a first connecting rod (41) connected with the support table (3), one end of the first connecting rod (41) away from the support table (3) is connected with a rotating driving member (42) to enable the support table (3) to rotate around the axis direction of the first connecting rod (41); a second connecting rod (43) sleeved on the outside of the first connecting rod (41) and movably connected with the furnace body (1), the second connecting rod (43) is connected with a moving driving member (44) to drive the second connecting rod (43) to move along the axis direction thereof; the air inlet assembly comprises: an air inlet pipe (51) movably arranged on the side wall of the furnace body (1), the air inlet pipe (51) is arranged in at least two groups and is arranged in the height direction of the furnace body (1) at intervals; a gas distribution member (52) arranged in the containing cavity and connected with the air outlet end of the air inlet pipe (51) and used for uniformly distributing air flow in the containing cavity; the air inlet assembly further comprises: an air inlet adjusting mechanism (54) arranged outside the furnace body (1) and connected with the air inlet pipe (51) and used for adjusting the angle between the air inlet pipe (51) and the side wall; the gas distribution member (52) is specifically a spherical cavity communicated with the air outlet end of the air inlet pipe (51), and a plurality of gas distribution holes (53) are uniformly and interval arranged on the outer surface of the spherical cavity; the air outlet assembly comprises: an air outlet pipe (6) communicated with the containing cavity, a switch for opening and closing the air outlet pipe (6) is arranged at the outlet of the air outlet pipe (6), and the air outlet pipe (6) is arranged in two groups and arranged at the top and bottom of the furnace body (1) respectively; the air outlet assembly further comprises: a vacuum air extraction system (9) connected with the air outlet pipe (6) and used for extracting air in the containing cavity.

2. The vapor deposition device according to claim 1, wherein the air outlet assembly further comprises: a tail gas purification system connected with the air outlet pipe (6) and used for purifying the discharged reaction gas.

3. The vapor deposition device according to claim 2, further comprising: a heating device (81) arranged on the furnace body (1) and used for heating the reaction gas in the containing cavity, and a heat insulation layer (82) is arranged on the outside of the heating device (81); a temperature measuring device used for detecting the temperature in the containing cavity. ​ A controller connected with the temperature measuring device, the controller being connected with the heating device (81).

4. The vapor deposition apparatus according to claim 3, wherein The air outlet assembly further comprises: A pressure sensor arranged in the accommodating cavity, the pressure sensor being connected with the controller, and the controller being connected with the switch of the air outlet pipe.

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