Shielding device and thin film deposition machine with shielding device

Abstract

This invention provides a thin film deposition apparatus with a shielding device, comprising a reaction chamber, a support tray, a shielding device, and at least two photosensors, wherein the support tray and part of the shielding device are located within the accommodating space of the reaction chamber. The shielding device includes two shielding units and at least one driving device, wherein the driving device is connected to and drives the two shielding units to swing in opposite directions, causing the two shielding units to operate in an open state and a shielded state. Each of the two shielding units has a shielding protrusion and a sensing area on its upper surface, wherein the sensing area is adjacent to the shielding protrusion to prevent contaminants from depositing in the sensing area, thereby improving the accuracy of the photosensors in sensing the position of the shielding units.

Description

Technical Field

[0001] The present invention relates to a thin film deposition machine with a shielding device, which mainly provides a shielding protrusion and a sensing area on the shielding unit, wherein the sensing area is adjacent to the shielding protrusion to prevent contaminants from being deposited in the sensing area, thereby improving the accuracy of the photosensitive sensor in sensing the position of the shielding unit. Background Technology

[0002] Chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD) are all commonly used thin film deposition equipment and are widely used in the manufacturing processes of integrated circuits, light-emitting diodes, and displays.

[0003] The deposition equipment mainly includes a cavity and a wafer carrier disk, wherein the wafer carrier disk is located in the cavity and is used to support at least one wafer. Taking physical vapor deposition as an example, a target needs to be placed in the cavity, with the target facing the wafer on the wafer carrier disk. During physical vapor deposition, inert gas and / or reactive gas can be delivered into the cavity to apply bias voltages to the target and the wafer carrier disk, respectively, and the wafer supported by the wafer carrier disk is heated.

[0004] The inert gas inside the cavity is ionized by the high-voltage electric field. The ionized inert gas is attracted by the bias voltage on the target and bombards the target. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and deposited on the surface of the heated wafer to form a thin film on the wafer surface.

[0005] After a period of use, a deposited film will form on the inner surface of the cavity, requiring periodic cleaning to prevent the film from falling off during the manufacturing process and contaminating the wafer. Additionally, oxides or other contaminants may form on the surface of the target, also necessitating periodic cleaning. Generally, a burn-in process is used to remove oxides or other contaminants from the target surface by bombarding it with plasma ions.

[0006] When cleaning the cavity and target material as described above, it is necessary to remove the wafer carrier and wafer from the cavity, or isolate the wafer carrier to avoid contaminating the wafer carrier and wafer during the cleaning process. Summary of the Invention

[0007] Generally, thin film deposition equipment requires cleaning after a period of use to remove oxides or nitrides from the deposited thin film and target material within the chamber. During cleaning, particles generated can contaminate the support tray, necessitating isolation between the tray and the contaminants. This invention proposes a thin film deposition equipment with a shielding device, primarily using a drive mechanism to swing two shielding plates in opposite directions, allowing the two shielding plates to operate in both an open and a shielded state.

[0008] Each of the two shielding plates has a shielding protrusion and a sensing area on its upper surface, with the sensing area adjacent to the shielding protrusion and located outside or inside it. During cleaning of the reaction chamber, the drive unit moves the two shielding units closer together in a swinging motion, shielding the carrier disk within the accommodating space to prevent plasma or contaminants generated during cleaning from contacting the carrier disk and / or its supported substrate. During the deposition process, the drive unit moves the two shielding units further apart in a swinging motion, depositing a thin film on the substrate within the reaction chamber.

[0009] The thin-film deposition cavity of the present invention includes at least two photosensors for projecting a sensing beam onto the sensing area of ​​a baffle plate to confirm that the two baffle plates are indeed in the open state. However, during the cleaning process of the cavity, a thin film is often deposited on the surface of the sensing area of ​​the baffle plate, which affects the accuracy of the photosensors in sensing the position of the baffle plate. To address this, the present invention further proposes to use a baffle protrusion to block the sensing area, thereby reducing the formation of a thin film in the sensing area during the cleaning process and improving the accuracy of the photosensors in sensing the operating state of the baffle plate.

[0010] One objective of this invention is to provide a thin film deposition apparatus with a shielding device, which mainly includes a reaction chamber, a support plate, and a shielding device. The shielding device includes at least one driving device, two shielding units, and two distance sensing units, wherein the driving device is connected to and drives the two shielding units to swing in opposite directions, so that the two shielding units operate in an open state or a shielded state.

[0011] Each of the two occlusion units has a reflective surface. When the two occlusion units are in an occlusion state, the sensing beams generated by the two distance sensing units will be projected onto the reflective surfaces of the two occlusion units respectively, and the distance between the two distance sensing units and the two occlusion units will be measured to determine whether the two occlusion units are in an occlusion state.

[0012] To achieve the above objectives, the present invention provides a thin film deposition apparatus with a shielding device, comprising: a reaction chamber including a receiving space; a carrier tray located within the receiving space and including a bearing surface for supporting at least one substrate; and a shielding device comprising: a first shielding unit located within the receiving space and including a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are located on the surface of the first shielding unit not facing the carrier tray, and the first shielding protrusion is adjacent to the first sensing area; and a second shielding unit located within the receiving space and including a second shielding protrusion and a second sensing area, wherein the second shielding protrusion and the second sensing area are located on the surface of the second shielding unit not facing the carrier tray, and the second... The blocking protrusion is adjacent to the second sensing area; at least one driving device is connected to the first blocking unit and the second blocking unit, and drives the first blocking unit and the second blocking unit to swing in opposite directions, so that the first blocking unit and the second blocking unit switch between an open state and a blocking state, wherein the first blocking unit and the second blocking unit in the blocking state are close to each other and used to block the carrier plate, while the first blocking unit and the second blocking unit in the open state form a gap space; and at least two photosensitive sensors are disposed in the reaction cavity and are used to sense the first sensing area of ​​the first blocking unit and the second sensing area of ​​the second blocking unit, respectively, to determine whether the first blocking unit and the second blocking unit are indeed operating in the open state.

[0013] The present invention provides a shielding device, comprising: a first shielding plate including a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are disposed on a first upper surface of the first shielding plate and the first shielding protrusion is adjacent to the first sensing area; a first connecting arm for supporting the first shielding plate; a second shielding plate including a second shielding protrusion and a second sensing area, wherein the second shielding protrusion and the second sensing area are disposed on a second upper surface of the second shielding unit and the second shielding protrusion is adjacent to the second sensing area; a second connecting arm for supporting the second shielding plate; and at least one driving device for driving the first shielding plate and the second shielding plate to swing in opposite directions via the first connecting arm and the second connecting arm respectively, such that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, while a gap space is formed between the first shielding plate and the second shielding plate in the open state.

[0014] The thin film deposition machine with a shielding device includes a first shielding unit comprising a first connecting arm and a first shielding plate, a driving device connected to the first shielding plate via the first connecting arm, and a first shielding protrusion and a first sensing area located on the first shielding plate. The second shielding unit includes a second connecting arm and a second shielding plate, a driving device connected to the second shielding plate via the second connecting arm, and a second shielding protrusion and a second sensing area located on the second shielding plate.

[0015] The thin film deposition machine with shielding device includes a target material facing the bearing surface of the carrier plate, wherein a first shielding protrusion and a first sensing area are located on a first upper surface of a first shielding plate facing the target material, and a second shielding protrusion and a second sensing area are located on a second upper surface of a second shielding plate facing the target material.

[0016] The thin film deposition machine or shielding device with shielding device is wherein the first shielding protrusion and the second shielding protrusion in the shielding state form an annular shielding protrusion, and the first sensing area and the second sensing area form an annular sensing area, the annular sensing area being located outside the annular shielding protrusion.

[0017] The thin film deposition machine or shielding device with shielding device is wherein the first shielding protrusion and the second shielding protrusion are tubular protrusions with a closed shape.

[0018] The thin film deposition machine with a shielding device includes: a first reflective surface disposed on a first connecting arm; a second reflective surface disposed on a second connecting arm; a first distance sensing unit disposed on a reaction chamber and used to project a first sensing beam onto the first reflective surface of the first connecting arm operating in a shielding state; and a second distance sensing unit disposed on a reaction chamber and used to project a second sensing beam onto the second reflective surface of the second connecting arm operating in a shielding state.

[0019] The thin film deposition apparatus with shielding device includes a reaction chamber comprising two sensing chambers, and two photosensors are respectively disposed in the two sensing chambers and are used to sense the first sensing area of ​​the first shielding plate and the second sensing area of ​​the second shielding plate entering the sensing chamber.

[0020] The beneficial effects of the present invention are: it provides a novel thin film deposition machine with a shielding device, which mainly shields the sensing area through the shielding protrusion to reduce the formation of a thin film in the sensing area during the cleaning process, thereby facilitating the sensing of the operating state of the shielding plate by the light sensor. Attached Figure Description

[0021] Figure 1 This is a cross-sectional schematic diagram of an embodiment of the thin film deposition machine with a shielding device of the present invention operating in a shielded state.

[0022] Figure 2 This is a perspective view of an embodiment of the shielding device of the present invention in the open state.

[0023] Figure 3 This is a perspective view of an embodiment of the shielding device of the present invention in the shielding state.

[0024] Figure 4This is a perspective view of a partial structure embodiment of the thin film deposition machine with a shielding device according to the present invention.

[0025] Figure 5 This is a top perspective view of an embodiment of the thin film deposition machine with a shielding device of the present invention in the open state.

[0026] Figure 6 This is a top view of an embodiment of the thin film deposition machine with a shielding device of the present invention operating in a shielded state.

[0027] Figure 7 This is a cross-sectional schematic diagram of another embodiment of the thin film deposition machine with a shielding device of the present invention in a shielded state.

[0028] Figure 8 This is a perspective view of another embodiment of the shielding device of the present invention in the open state.

[0029] Figure 9 This is a top perspective view of yet another embodiment of the thin film deposition machine with a shielding device of the present invention in the open state.

[0030] Explanation of reference numerals in the drawings: 10-Thin film deposition stage with shielding device; 100-Shielding device; 11-Reaction chamber; 111-Baffle; 112-Opening; 113-Sensing chamber; 115-Light-transmitting window; 12-Accommodation space; 13-Annular shielding protrusion; 130-Annular sensing area; 131-First shielding protrusion; 132-First sensing area; 133-Second shielding protrusion; 134-Second sensing area; 14-First shielding unit; 141-First connecting arm; 143-First shielding plate; 1431-First upper surface ; 145-First reflective surface; 15-Second shielding unit; 151-Second connecting arm; 153-Second shielding plate; 1531-Second upper surface; 155-Second reflective surface; 161-Target material; 163-Substrate; 165-Carrying plate; 1651-Carrying surface; 17-Drive device; 171-Drive motor; 173-Shaft sealing device; 18-Gap space; 191-First distance sensing unit; 193-Second distance sensing unit; 195-Photosensor; L1-First sensing beam; L2-Second sensing beam. Detailed Implementation

[0031] Please see Figure 1 This is a side cross-sectional view of an embodiment of the thin film deposition machine with a shielding device of the present invention in a shielded state. As shown in the figure, the thin film deposition machine 10 with a shielding device mainly includes a reaction chamber 11, a carrier plate 165 and a shielding device 100, wherein the reaction chamber 11 includes a receiving space 12 for receiving the carrier plate 165 and part of the shielding device 100.

[0032] like Figure 1 As shown, the carrier plate 165 is located within the accommodating space 12 of the reaction chamber 11 and includes a bearing surface 1651 for supporting at least one substrate 163. When the thin film deposition stage 10 with a shielding device is a physical vapor deposition chamber, a target 161 is disposed within the reaction chamber 11, wherein the target 161 faces the substrate 163 and the bearing surface 1651 of the carrier plate 165. For example, the target 161 may be disposed on the upper surface of the accommodating space 12 of the reaction chamber 11.

[0033] Please refer to the following: Figure 2 and Figure 3 As shown, the blocking device 100 includes a first blocking unit 14, a second blocking unit 15, and a driving device 17, wherein the first blocking unit 14 and the second blocking unit 15 are located within the accommodating space 12. The driving device 17 is connected to the first blocking unit 14 and the second blocking unit 15, and drives the first blocking unit 14 and the second blocking unit 15 to swing in opposite directions respectively.

[0034] like Figure 2 and Figure 3 As shown, in one embodiment of the present invention, the first blocking unit 14 includes a first connecting arm 141 and a first blocking plate 143, wherein the first connecting arm 141 is used to support the first blocking plate 143. The second blocking unit 15 includes a second connecting arm 151 and a second blocking plate 153, wherein the second connecting arm 151 is used to support the second blocking plate 153. The driving device 17 is connected to and drives the first blocking plate 143 and the second blocking plate 153 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 151 respectively.

[0035] The first shielding plate 143 and the second shielding plate 153 can be plates. A first shielding protrusion 131 and a first sensing area 132 are provided on the first upper surface 1431 of the first shielding plate 143 that is not facing the carrier plate 165. The first shielding protrusion 131 is adjacent to the first sensing area 132. For example, the first upper surface 1431 is the surface of the first shielding plate 143 facing the target material 161.

[0036] like Figure 1 , Figure 2 and Figure 3 As shown, in one embodiment of the present invention, the first sensing area 132 is located outside or radially outside the first blocking protrusion 131. For example, the first blocking plate 143 is a semi-circular plate, and the first blocking protrusion 131 is an approximately C-shaped or semi-circular ring-shaped protrusion. The second blocking protrusion 133 and the second sensing area 134 are provided on the second upper surface 1531 of the second blocking plate 153 that does not face the support plate 165. For example, the second upper surface 1531 faces the target material 161, wherein the structure of the second blocking plate 153 is similar to that of the first blocking plate 143.

[0037] The thin film deposition machine 10 with a shielding device and / or the shielding device 100 of the present invention can operate in both an open state and a shielding state. For example... Figure 2 and Figure 5 As shown, the driving device 17 drives the first shielding unit 14 and the second shielding unit 15 to move away from each other and operates in the open state. A gap space 18 is formed between the first shielding unit 14 and the second shielding unit 15, so that there are no first shielding units 14 and the second shielding unit 15 between the target material 161 and the carrier plate 165 and the substrate 163. Then, the carrier plate 165 and the substrate 163 can be driven to move closer to the target material 161, and a thin film is deposited on the surface of the substrate 163 by the gas impacting the target material 161 in the accommodating space 12.

[0038] Please refer to the following: Figure 1 , Figure 5 and Figure 6 As shown, the reaction chamber 11 includes two sensing chambers 113, which protrude from the reaction chamber 11. The height of the two sensing chambers 113 is less than that of the reaction chamber 11, and a light sensor 195 can be respectively disposed on the two sensing chambers 113. For example, the light sensor 195 can be a distance light sensor, a reflective light sensor, or a contrast light sensor, and includes at least one light emitting unit and at least one light receiving unit.

[0039] like Figure 1 , Figure 2 and Figure 5 As shown, when the first and second blocking units 14 / 15 are in the open state, portions of the first and second blocking plates 143 / 153 will enter the two sensing chambers 113 respectively. The two light sensors 195 will be used to sense the first and second sensing areas 132 / 134 respectively, and determine whether the first and second blocking units 14 / 15 are indeed in the open state. For example, the light emitting units of the two light sensors 195 will project sensing beams into the first and second sensing areas 132 / 134 respectively, and the light receiving units of the light sensors 195 will receive the sensing beams reflected and / or scattered by the first and second sensing areas 132 / 134.

[0040] like Figure 1 , Figure 3 and Figure 6As shown, during the cleaning process of the reaction chamber 11 and / or the target material 161, contaminants or particles may deposit on the first shielding plate 143 and the second shielding plate 153, causing the photosensitive sensor 195 to be unable to accurately sense the first shielding plate 143 and the second shielding plate 153. To address this, the present invention further proposes to provide first and second shielding protrusions 131 / 133 on the surfaces of the first and second shielding plates 143 / 153 facing the target material 161, and to define first and second sensing areas 132 / 134 on the first and second shielding plates 143 / 153 through the first and second shielding protrusions 131 / 133. The first and second shielding protrusions 131 / 133 are adjacent to the first and second sensing areas 132 / 134, respectively, and the first and second sensing areas 132 / 134 are located outside the first and second shielding protrusions 131 / 133, respectively. The first and second shielding protrusions 131 / 133 are used to shield the first and second sensing areas 132 / 134 and prevent the deposition of thin films on the first and second sensing areas 132 / 134.

[0041] like Figure 1 , Figure 3 , Figure 4 , Figure 6 and Figure 7 As shown, the driving device 17 can drive the first blocking unit 14 and the second blocking unit 15 to approach each other and operate in a blocking state, wherein the first blocking plate 143 and the second blocking plate 153 will approach each other and form a circular blocking member to block the carrier plate 165 and / or the substrate 163.

[0042] like Figure 2 , Figure 3 , Figure 5 and Figure 6 As shown, the first blocking protrusion 131 and the second blocking protrusion 133 can be C-shaped or semi-circular. When the first and second blocking plates 143 / 153 are in the blocking state, the first and second blocking protrusions 131 / 133 will form an annular blocking protrusion 13, wherein an annular sensing area 130 will be formed on the outer side of the annular blocking protrusion 13. By forming an annular blocking protrusion 13 on the surface of the first blocking plate 143 and the second blocking plate 153 facing the target material 161, it is not only beneficial to block the first and second sensing areas 132 / 134, but also to further improve the blocking effect of the first blocking plate 143 and the second blocking plate 153.

[0043] In the embodiments of the present invention, the first shielding unit 14 and the second shielding unit 15 operate in a shielding state, which can be defined as the first shielding plate 143 and the second shielding plate 153 approaching each other until the distance between them is less than a threshold value, for example, less than 1 mm, so as to prevent the first shielding plate 143 and the second shielding plate 153 from generating particles during the contact process.

[0044] The first shielding unit 14 and the second shielding unit 15, operating in a shielded state, are located between the target 161 and the carrier plate 165, and define a cleaning space within the accommodating space 12, wherein the cleaning space partially overlaps with or is close to the reaction space. A burn-in process can then be performed within the cleaning space to clean the target 161 and the reaction chamber 11 and / or baffle 111 within the cleaning space, and to remove oxides, nitrides, or other contaminants from the surface of the target 161, and the deposited film from the surface of the reaction chamber 11 and / or baffle 111.

[0045] like Figure 7 and Figure 8 As shown, the first and second shielding protrusions 131 / 133 can also be polygonal tubes or cylindrical tubes, for example, tubular protrusions with closed cross sections of the first and second shielding protrusions 131 / 133, and a first and second sensing area 132 / 134 is formed inside the first and second shielding protrusions 131 / 133.

[0046] like Figure 9 As shown, the cross-sections of the first and second shielding protrusions 131 / 133 are non-closed protrusions, such as C-shaped or U-shaped protrusions, wherein the first and second shielding protrusions 131 / 133 can connect to the edges of the first and second shielding plates 143 / 153.

[0047] In one embodiment of the present invention, such as Figure 1 As shown, a baffle 111 may be provided in the accommodating space 12 of the reaction chamber 11, wherein one end of the baffle 111 is connected to the reaction chamber 11, and the other end of the baffle 111 forms an opening 112. When the carrier plate 165 approaches the target material 161, the reaction chamber 11, the carrier plate 165 and the baffle 111 will separate a reaction space in the accommodating space 12, and a thin film will be deposited on the surface of the substrate 163 in the reaction space.

[0048] When the first baffle plate 143 and the second baffle plate 153 are in the baffle state, the annular baffle protrusion 13 will be located below or outside the baffle 111, so that the area of ​​the inner side of the annular baffle protrusion 13 is greater than or equal to the area of ​​the opening 112, thereby improving the baffle effect.

[0049] In one embodiment of the present invention, such as Figure 2 and Figure 3 As shown, the drive device 17 includes at least one drive motor 171 and a shaft seal device 173, wherein the drive motor 171 is connected to and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions through the shaft seal device 173, and the shaft seal device 173 can be a common shaft seal or a magnetohydrodynamic shaft seal.

[0050] like Figure 1 , Figure 4 and Figure 6 As shown, the present invention further provides a first reflective surface 145 and a second reflective surface 155 on the first connecting arm 141 and the second connecting arm 151 respectively, and provides a first distance sensing unit 191 and a second distance sensing unit 193 on the reaction cavity 11, wherein the first distance sensing unit 191 and the second distance sensing unit 193 can be optical rangefinders.

[0051] like Figure 4 As shown, the first distance sensing unit 191 and the first blocking unit 14 are disposed on the same side of the reaction cavity 11, while the second distance sensing unit 193 and the second blocking unit 15 are disposed on the same side of the reaction cavity 11. The first and second distance sensing units 191 / 193 respectively project a first and a second sensing beam L1 / L2 onto the first and second reflecting surfaces 145 / 155 of the first and second blocking units 14 / 15, wherein the first and second sensing beams L1 / L2 are perpendicular to the first and second reflecting surfaces 145 / 155, respectively.

[0052] like Figure 4 As shown, the first distance sensing unit 191 can measure the distance between the first occlusion unit 14 and the first distance sensing unit 191 by the reflected first sensing beam L1, while the second distance sensing unit 193 can measure the distance between the second occlusion unit 15 and the second distance sensing unit 193 by the reflected second sensing beam L2, and determine whether the first and second occlusion units 14 / 15 are indeed operating in the occlusion state by the measured distance.

[0053] In one embodiment of the present invention, such as Figure 5 and Figure 6 As shown, a light-transmitting window 115 can be respectively provided on the reaction chamber 11, wherein the first distance sensing unit 191 and the second distance sensing unit 193 face the two light-transmitting windows 115 respectively.

[0054] Advantages of this invention:

[0055] A novel thin film deposition machine with a shielding device is provided, which mainly uses shielding protrusions to shield the sensing area, thereby reducing the formation of a thin film in the sensing area during the cleaning process, which is beneficial for the light sensor to sense the operating status of the shielding plate.

[0056] The above description is merely a preferred embodiment of the present invention and is not intended to limit the scope of the present invention. All equivalent variations and modifications made in accordance with the shape, structure, features and spirit described in the claims of the present invention should be included within the scope of the claims of the present invention.

Claims

1. A thin film deposition machine with a shielding device, characterized in that, include: A reaction chamber includes a receiving space containing a target material; A carrier disk is located within the accommodating space and includes a carrier surface for supporting at least one substrate; A first shielding unit is located within the accommodating space and includes a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are located on the surface of the first shielding unit that does not face the carrier plate, and the first shielding protrusion is adjacent to the first sensing area, and the first shielding protrusion shields between the first sensing area and the target material. A second shielding unit is located within the accommodating space and includes a second shielding protrusion and a second sensing area, wherein the second shielding protrusion and the second sensing area are located on the surface of the second shielding unit that does not face the carrier plate, and the second shielding protrusion is adjacent to the second sensing area, and the second shielding protrusion shields between the second sensing area and the target material. At least one driving device is connected to the first blocking unit and the second blocking unit, and drives the first blocking unit and the second blocking unit to swing in opposite directions, so that the first blocking unit and the second blocking unit switch between an open state and a blocking state, wherein the first blocking unit and the second blocking unit in the blocking state are close to each other and used to block the carrier plate, while a gap space is formed between the first blocking unit and the second blocking unit in the open state; and At least two optical sensors are disposed in the reaction cavity to sense the first sensing area of ​​the first blocking unit and the second sensing area of ​​the second blocking unit, respectively, so as to determine whether the first blocking unit and the second blocking unit are indeed operating in the open state. The first and second blocking protrusions in the blocked state form an annular blocking protrusion, and the first and second sensing areas form an annular sensing area, which is located outside the annular blocking protrusion.

2. The thin film deposition machine with a shielding device according to claim 1, characterized in that, The first blocking unit includes a first connecting arm and a first blocking plate. The driving device is connected to the first blocking plate via the first connecting arm. The first blocking protrusion and the first sensing area are located on the first blocking plate. The second blocking unit includes a second connecting arm and a second blocking plate. The driving device is connected to the second blocking plate via the second connecting arm. The second blocking protrusion and the second sensing area are located on the second blocking plate.

3. The thin film deposition machine with a shielding device according to claim 2, characterized in that, The device includes a target material facing the bearing surface of the bearing plate, wherein the first shielding protrusion and the first sensing area are located on a first upper surface of the first shielding plate facing the target material, and the second shielding protrusion and the second sensing area are located on a second upper surface of the second shielding plate facing the target material.

4. The thin film deposition machine with a shielding device according to claim 3, characterized in that, The first and second blocking protrusions are tubular protrusions with a closed shape.

5. The thin film deposition machine with a shielding device according to claim 2, characterized in that, include: A first reflective surface is disposed on the first connecting arm; A second reflective surface is disposed on the second connecting arm; A first distance sensing unit is disposed on the reaction cavity and is used to project a first sensing beam onto the first reflective surface of the first connecting arm operating in the shielded state; and A second distance sensing unit is disposed on the reaction cavity and is used to project a second sensing beam onto the second reflective surface of the second connecting arm operating in the occluded state.

6. The thin film deposition machine with a shielding device according to claim 2, characterized in that, The reaction chamber includes two sensing chambers, and two optical sensors are respectively disposed in the two sensing chambers and are used to sense the first sensing area of ​​the first shield and the second sensing area of ​​the second shield entering each sensing chamber.

7. A shielding device for shielding a target material from a support plate, characterized in that, include: A first shielding plate includes a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are disposed on a first upper surface of the first shielding plate, and the first shielding protrusion is adjacent to the first sensing area, and the first shielding protrusion shields between the first sensing area and the target material. A first connecting arm is used to support the first shielding plate; A second shielding plate includes a second shielding protrusion and a second sensing area, wherein the second shielding protrusion and the second sensing area are disposed on a second upper surface of the second shielding plate, and the second shielding protrusion is adjacent to the second sensing area, and the second shielding protrusion shields the second sensing area between the target material. A second connecting arm for supporting the second baffle; and At least one driving device drives the first blocking plate and the second blocking plate to swing in opposite directions via the first connecting arm and the second connecting arm, so that the first blocking plate and the second blocking plate switch between an open state and a blocking state. In the blocking state, the first blocking plate and the second blocking plate are close to each other, and the first blocking protrusion and the second blocking protrusion form an annular blocking protrusion. The first sensing area and the second sensing area form an annular sensing area, which is located outside the annular blocking protrusion. In the open state, a gap space is formed between the first blocking plate and the second blocking plate.

8. The shielding device according to claim 7, characterized in that, The first and second blocking protrusions are tubular protrusions with a closed shape.

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