An electrochromic device

Abstract

The present application provides an electrochromic device, which belongs to the field of electrochromic. The electrochromic device includes a first conductive substrate, an electrochromic layer, and a second conductive substrate stacked in sequence; the first conductive substrate includes a stacked first conductive layer and a first substrate layer, the second conductive substrate includes a stacked second conductive layer and a second substrate layer, and the first substrate layer is stacked on a side of the first conductive layer away from the electrochromic layer, and the second substrate layer is stacked on a side of the second conductive layer away from the electrochromic layer; at least one of the hardness of the first conductive layer and the hardness of the second conductive layer is not less than the first hardness value, and the hardness of the first conductive layer and the second conductive layer is adjusted to avoid short circuit caused by contact between the first conductive layer and the second conductive layer, thereby improving the stability of the electrochromic device.

Description

Technical Field

[0001] The present application relates to the field of electrochromism, and in particular to an electrochromism device. Background Art

[0002] In existing electrochromic devices, due to the low hardness of the conductive layer ITO (Indium tin oxide) and the solid electrolyte, they are compressed during the subsequent preparation process (such as glass autoclave packaging), and the edges of the conductive layer and the electrolyte are compressed and deformed, resulting in a short circuit between the conductive layers on both sides, causing a short circuit in the electrochromic device. Summary of the invention

[0003] In view of this, the purpose of the present application is to overcome the deficiencies in the prior art and provide an electrochromic device.

[0004] The present application provides the following technical solution: an electrochromic device, comprising a first conductive substrate, an electrochromic layer, and a second conductive substrate stacked in sequence; the first conductive substrate comprises a stacked first conductive layer and a first substrate layer, the second conductive substrate comprises a stacked second conductive layer and a second substrate layer, and the first substrate layer is stacked on a side of the first conductive layer away from the electrochromic layer, and the second substrate layer is stacked on a side of the second conductive layer away from the electrochromic layer; at least one of the hardness of the first conductive layer and the hardness of the second conductive layer is not less than a first hardness value.

[0005] In the present application, by limiting the hardness of the conductive layer to be greater than a specific hardness value, the hardness of the conductive layer is controlled above a certain range, that is, the hardness of the first conductive layer and the second conductive layer is increased, and the bending height of the first conductive layer and the second conductive layer when they are under pressure can be reduced, so as to avoid the situation where the first conductive layer and the second conductive layer are in contact and short-circuited when the electrochromic device is bent under pressure, thereby improving the stability and reliability of the electrochromic device.

[0006] Optionally, the edge of the first conductive substrate is provided with a first receiving groove, the edge of the second conductive substrate is provided with a second receiving groove, and the edge of the electrochromic layer is provided with a third receiving groove; the first receiving groove and the third receiving groove are connected to form a first groove, and the second receiving groove and the third receiving groove are connected to form a second groove; the first receiving groove overlaps with the third receiving groove in the plane where the electrochromic layer is located, and the second receiving groove overlaps with the third receiving groove in the plane where the electrochromic layer is located. Thus, a half-cut groove can be formed at the edge of the electrochromic device (the first groove penetrates the first conductive substrate and the electrochromic layer, but does not penetrate the second conductive substrate, and the second groove penetrates the second conductive substrate and the electrochromic layer, but does not penetrate the first conductive substrate), so that the first conductive substrate and the second conductive substrate are exposed through the second groove and the first groove respectively, so that the conductive substrate at the groove can be electrically connected to an external power source, etc., to power the electrochromic device, so that it changes color on the surface.

[0007] Optionally, there are multiple first receiving grooves, and multiple first receiving grooves are arranged at intervals on the edge of the first conductive substrate; there are multiple second receiving grooves, and multiple second receiving grooves are arranged at intervals on the edge of the second conductive substrate; there are multiple third receiving grooves, and multiple third receiving grooves are arranged at intervals on the edge of the electrochromic layer. Preferably, one first receiving groove and one third receiving groove are connected to form a first groove, and one second receiving groove and one third receiving groove are connected to form a second groove; the orthographic projection of each first receiving groove on the plane where the electrochromic layer is located overlaps with one third receiving groove, and the orthographic projection of each second receiving groove on the plane where the electrochromic layer is located overlaps with one third receiving groove. Thus, multiple conductive parts of the conductive substrate can be exposed simultaneously through multiple grooves (receiving grooves) to form a multi-electrode electrochromic device, and the external power supply can be electrically connected to the electrochromic device through multiple conductive parts at the same time to accelerate the electrical conduction efficiency of the electrochromic device, thereby improving the color change efficiency of the device.

[0008] Optionally, the first hardness value ranges from 2H to 6H. Preferably, the orthographic projection of the first receiving groove on the plane where the second conductive substrate is located has a gap with the second receiving groove. More preferably, the first hardness value is 3H. Normally, if the hardness of the conductive layer is too low, the conductive layer is likely to collapse under the action of external pressure or the pressure of the substrate layer, especially the edge of the conductive layer is prone to bend, and after bending, it will be electrically connected to the conductive layer on the opposite side, forming a short circuit, affecting the stability of the device; and if the hardness of the conductive layer is too high, especially when bent, it is prone to breakage, etc., affecting the conductive performance of the conductive layer. Therefore, setting the hardness of the conductive layer within a certain range can effectively prevent the conductive layer from collapsing and bending to form a short circuit, and can also prevent the conductive layer from bending and breaking, thereby ensuring the stability of the electrochromic device and improving its service life. Furthermore, when a groove is formed on the edge of the conductive substrate, if there is a gap between the grooves on both sides, the device is half-cut at the gap position (that is, the first conductive substrate and the electrochromic layer are cut off to leave the second conductive substrate, or the second conductive substrate and the electrochromic layer are cut off to leave the first conductive substrate). In this way, there is a risk of the side of the first conductive layer contacting the second conductive layer or the side of the second conductive layer contacting the first conductive layer at the gap position, while the degree or possibility of bending of the uncut first substrate layer or the second substrate layer is lower, and the degree or possibility of bending of the cut first substrate layer or the second substrate layer is higher. At this time, appropriately increasing the hardness of the conductive layer, for example, making the hardness of the conductive layer 3H, can effectively resist the bending pressure of the substrate layer at this time, prevent electrical contact between the conductive layers on both sides, and effectively avoid the occurrence of short circuit.

[0009] Optionally, the orthographic projection of the first receiving groove on the plane where the second conductive substrate is located overlaps with the second receiving groove. Preferably, the first hardness value is 5H. When a groove is formed at the edge of the conductive substrate, if there is an overlap between the grooves on both sides, the overlapping position is a case where the device is fully cut (that is, the first conductive substrate, the electrochromic layer and the second conductive substrate at the edge of the device are all cut off). In this way, there is a risk of contact between the side of the first conductive layer and the side of the second conductive layer at the overlapping position, and the degree or possibility of bending of the first substrate layer and the second substrate layer on both sides is high. Therefore, it is necessary to further improve the hardness of the conductive layer, for example, to make the hardness of the conductive layer 5H, so that it can effectively resist the bending pressure of the substrate layers on both sides at this time, prevent electrical contact between the conductive layers on both sides, and effectively avoid the occurrence of short circuits.

[0010] Optionally, the electrochromic layer includes an electrochromic material layer, an electrolyte layer and an ion storage layer stacked in sequence, thereby forming an electrochromic device by stacking them in sequence, simplifying the structure and preparation process of the electrochromic device.

[0011] Optionally, a first give way groove is provided at the edge of the first conductive layer, a second give way groove is provided at the edge of the second conductive layer, a third give way groove is provided on the inner wall of the first groove, the third give way groove is located at the edge of the electrochromic material layer, and the orthographic projection of the third give way groove on the plane where the first conductive layer is located coincides with the first give way groove, and the first give way groove and the third give way groove are connected to form a first etching area; a fourth give way groove is provided on the inner wall of the second groove, the fourth give way groove is located at the edge of the electrochromic material layer, and the orthographic projection of the fourth give way groove on the plane where the second conductive layer is located coincides with the second give way groove, and the second give way groove and the fourth give way groove are connected to form a second etching area. Therefore, by setting the give way groove (etching area), a partition area can be formed on the conductive layer, or on the conductive layer and the electrochromic layer, or on the conductive layer and the ion storage layer. In this way, even if the edge of the conductive substrate is pressed and bends at the groove to form an electrical connection with the conductive substrate on the opposite side, the electrical connection between the edge of the conductive substrate and the inner side of the conductive substrate is cut off due to the existence of the give way groove (etching area). Therefore, a short circuit will not be formed, and the stability and reliability of the electrochromic device can be improved. In addition, the give way groove is further extended to the substrate layer to partially penetrate the substrate layer, so as to further ensure that the conductive layer is fully isolated by the give way groove, thereby improving the effectiveness of short circuit prevention, that is, improving the stability and reliability of the electrochromic device.

[0012] Optionally, the thickness of the electrolyte layer is not less than the sum of a bending height of the first conductive layer on a side close to the first groove and a bending height of the second conductive layer on a side close to the second groove.

[0013] Optionally, the first etching area and the second etching area are filled with insulating glue. Preferably, the insulating glue forms an integral structure with the electrolyte layer. More preferably, the electrolyte layer is made of a non-solid electrolyte material, and the insulating glue is made of the non-solid electrolyte material. Thus, by filling the gap area with insulating glue, it is possible to more effectively prevent the short-circuit contact formed between the insulating portion and the conductive substrate outside the groove, thereby improving the reliability of short-circuit prevention, that is, further improving the use stability and reliability of the electrochromic device; and, by setting the insulating glue to be made of a non-solid electrolyte material, the non-solid electrolyte material can be filled into the etching area while preparing the electrolyte layer, thereby forming an insulating glue, which simplifies the preparation process.

[0014] Optionally, the inner wall of the first groove is provided with a first insulating portion, and the first insulating portion is located on the side of the second conductive substrate close to the electrochromic layer; the inner wall of the second groove is provided with a second insulating portion, and the second insulating portion is located on the side of the first conductive substrate close to the electrochromic layer. Preferably, at least one of the first insulating portion and the second insulating portion is an insulating glue. More preferably, the insulating glue has a sealing property, and the insulating glue is an insulating sealant. More preferably, the insulating glue has a high temperature resistance property, and the insulating glue is a high temperature insulating glue. Thus, by setting the insulating portion, it is more convenient to form a barrier structure on the inner wall of the groove, that is, to block the electrical connection between the side of the conductive substrate outside the groove and the conductive substrate on the opposite side, so as to prevent the occurrence of a short circuit, thereby improving the stability and reliability of the electrochromic device; in addition, by making the insulating glue have at least one of the sealing property or the high temperature resistance property, the insulating portion can not only have an insulating function, but also achieve a sealing effect on the edge of the device at the same time, so that there is no need to set up an additional sealant, etc., which can simplify the preparation process of the device, and further can be resistant to high temperature, which can further improve the applicability of the electrochromic device.

[0015] Optionally, the vertical distance from the side of the first insulating part away from the inner wall of the first groove to the inner wall of the first groove is not less than the first threshold range; the vertical distance from the side of the second insulating part away from the inner wall of the second groove to the inner wall of the second groove is not less than the first threshold range. Preferably, the first threshold range is 0.45-0.5 mm. More preferably, the vertical distance from the side of the first insulating part away from the inner wall of the first groove to the inner wall of the first groove is not greater than the second threshold range; the vertical distance from the side of the second insulating part away from the inner wall of the second groove to the inner wall of the second groove is not greater than the second threshold range; the second threshold range is 1-2 mm. The vertical distance from the side of the insulating part away from the inner wall of the groove to the inner wall of the groove is the width of the insulating part. Usually, when the width of the insulating part is too small, its insulating effect (sealing effect) is not ideal; when the width of the insulating part is too large, more insulating material (material forming the insulating part) will be wasted, which is not conducive to resource conservation, and if the width of the insulating part is too large, it will also affect the setting width of the electrode (such as conductive silver paste, conductive copper foil, etc.) arranged inside the groove; therefore, the width of the insulating part is controlled within a certain range, that is, by making the width of the insulating part not less than the first threshold range, it can be ensured that it has a more ideal insulating effect (sealing effect), and by making the width of the insulating part not greater than the second threshold range, material waste can be further reduced, and there is enough space for the setting of other components inside the groove, thereby improving the utilization rate of the electrochromic device.

[0016] In order to make the above-mentioned objects, features and advantages of the present application more obvious and understandable, preferred embodiments are given below and described in detail with reference to the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0018] Figure 1 A schematic diagram showing a structure of an electrochromic device provided by some embodiments of the present application from a viewing angle Figure 1 ;

[0019] Figure 2 A schematic diagram showing a structure of an electrochromic device provided by some embodiments of the present application from a viewing angle Figure 2 ;

[0020] Figure 3 Shows Figure 2 Enlarged view of part A in the middle;

[0021] Figure 4 A schematic diagram showing a structure of an electrochromic device provided by some embodiments of the present application from a viewing angle Figure 3 ;

[0022] Figure 5 Shows Figure 4 Enlarged view of middle part B;

[0023] Figure 6 A schematic diagram showing a structure of an electrochromic device provided by some embodiments of the present application from a viewing angle Figure 4 ;

[0024] Figure 7 Shows Figure 6 Enlarged view of the middle C part;

[0025] Figure 8 A structural schematic diagram of an electrochromic layer in an electrochromic device provided by some embodiments of the present application from one viewing angle is shown;

[0026] Fig. 9 A schematic structural diagram showing a first conductive substrate in an electrochromic device provided by some embodiments of the present application from a viewing angle is shown;

[0027] Fig.10 A structural schematic diagram of a second conductive substrate in an electrochromic device provided in some embodiments of the present application is shown from a viewing angle.

[0028] Description of main component symbols:

[0029] 100-electrochromic device; 110-first conductive substrate; 111-first conductive layer; 112-first substrate layer; 113-first receiving groove; 120-electrochromic layer; 121-third receiving groove; 122-electrochromic material layer; 123-electrolyte layer; 124-ion storage layer; 130-second conductive substrate; 131-second conductive layer; 132-second substrate layer; 133-second receiving groove; 140-first groove; 150-second groove; 160-first insulating portion; 170-second insulating portion; 180-first etching area; 190-second etching area. DETAILED DESCRIPTION

[0030] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be understood as limiting the present application.

[0031] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. In contrast, when an element is referred to as being "directly on" another element, there is no intermediate element. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only.

[0032] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0033] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0034] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of the template are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0035] like Figure 1 , Figure 2 , Figure 8 , Fig. 9 and Fig.10 As shown, some embodiments of the present application provide an electrochromic device, which is mainly used in the field of electrochromic. The electrochromic device 100 includes a first conductive substrate 110, an electrochromic layer 120, and a second conductive substrate 130 stacked in sequence. It should be noted that the first conductive substrate 110 and the second conductive substrate 130 are completely covered by the electrochromic layer 120.

[0036] Among them, a first receiving groove 113 is provided at the edge of the first conductive substrate 110, a second receiving groove 133 is provided at the edge of the second conductive substrate 130, and a third receiving groove 121 is provided at the edge of the electrochromic layer 120. It should be noted that the number of the first receiving groove 113, the second receiving groove 133 and the third receiving groove 121 can be one, two or more than two, and can be specifically set according to actual conditions.

[0037] Among them, the hardness of the first conductive layer 111 of the first conductive substrate 110 and / or the hardness of the second conductive layer 131 of the second conductive substrate 130 is not less than the first hardness value. It can be understood that the hardness of the first conductive layer 111 and the second conductive layer 131 is not less than the first hardness value, and the first hardness value can range from 2H to 6H. In some examples, the orthographic projection of the first receiving groove 113 on the plane where the second conductive substrate 130 is located has a gap with the second receiving groove 133. In this case, the hardness of the first conductive layer 111 can be no less than 3H. In other examples, the orthographic projection of the first receiving groove 113 on the plane where the second conductive substrate 130 is located overlaps with the second receiving groove 133. In this case, the hardness of the first conductive layer 111 can be no less than 5H.

[0038] By increasing the hardness of the first conductive layer and the second conductive layer and reducing the bending height of the first conductive layer and the second conductive layer when they are under pressure, it is avoided that the first conductive layer and the second conductive layer contact and short circuit when the electrochromic device is bent under pressure, thereby improving the stability of the electrochromic device.

[0039] Specifically, the orthographic projection of each first receiving groove 113 on the plane where the electrochromic layer 120 is located overlaps with a third receiving groove 121, and a first receiving groove 113 is connected to a third receiving groove 121 to form a first groove 140. The orthographic projection of each second receiving groove 133 on the plane where the electrochromic layer 120 is located overlaps with a third receiving groove 121, and a second receiving groove 133 is connected to a third receiving groove 121 to form a second groove 150.

[0040] It should be noted that the orthographic projections of the first receiving groove 113 and the second receiving groove 133 on the plane where the electrochromic layer 120 is located form a groove structure that is spaced apart and interlaced with each other, and coincides with the third groove.

[0041] It can be understood that the sum of the number of the first receiving grooves 113 and the number of the second receiving grooves 133 is equal to the number of the third receiving grooves 121 .

[0042] like Figure 1 , Figure 2 , Figure 8 , Fig. 9 and Fig.10 As shown, in some embodiments of the present application, there are multiple first receiving grooves 113, and the multiple first receiving grooves 113 are arranged at intervals on the edge of the first conductive substrate 110. It should be noted that multiple spaced first receiving grooves 113 are arranged on each side of the edge of the first conductive substrate 110.

[0043] There are multiple second receiving grooves 133, and the multiple second receiving grooves 133 are arranged at intervals on the edge of the second conductive substrate 130. It should be noted that multiple intervals of second receiving grooves 133 are arranged on each side of the edge of the second conductive substrate 130.

[0044] In addition, there are a plurality of third receiving grooves 121, which are arranged at intervals on the edge of the electrochromic layer 120. It should be noted that a plurality of spaced third receiving grooves 121 are arranged on each side of the edge of the electrochromic layer 120.

[0045] like Figure 2 and Figure 3 As shown, in some embodiments of the present application, the first conductive substrate 110 includes a stacked first conductive layer 111 and a first substrate layer 112, and the first substrate layer 112 is stacked on a side of the first conductive layer 111 away from the electrochromic layer 120. It should be noted that the first substrate layer 112 completely covers the first conductive layer 111, and the first substrate layer provides support for the first conductive layer to improve the stability of the first conductive layer on the first substrate layer.

[0046] The second conductive substrate 130 includes a stacked second conductive layer 131 and a second substrate layer 132, and the second substrate layer 132 is stacked on a side of the second conductive layer 131 away from the electrochromic layer 120. The second substrate layer 132 completely covers the second conductive layer 131, and the second substrate layer provides support for the second conductive layer to improve the stability of the second conductive layer on the second substrate layer.

[0047] In addition, the electrochromic layer 120 includes an electrochromic material layer 122 , an electrolyte layer 123 , and an ion storage layer 124 which are sequentially stacked, and the electrochromic material layer 122 and the ion storage layer 124 are completely covered on the electrolyte layer 123 , respectively.

[0048] In some embodiments of the present application, the first hardness value is 3H. It should be noted that, in the present application, H is used to represent surface hardness, wherein the ability of a material to locally resist a hard object from pressing into its surface is called hardness.

[0049] By increasing the hardness of the first conductive layer and / or the second conductive layer, the bending height of the first conductive layer and the second conductive layer is reduced, and the deformation of the first conductive layer and the second conductive layer when subjected to pressure is reduced, it is avoided that the first conductive layer and / or the second conductive layer is deformed under pressure, resulting in a short circuit between the first conductive layer and the second conductive layer, thereby reducing the probability of short circuit in the electrochromic device and improving the stability of the electrochromic device.

[0050] In some embodiments of the present application, the thickness of the electrolyte layer 123 is not less than the sum of the bending height of the first conductive layer 111 close to the first groove 140 and the bending height of the second conductive layer 131 close to the second groove 150 .

[0051] It should be noted that the bending height of the first conductive layer 111 on the side close to the first groove 140 refers to the displacement height when the first conductive layer 111 located on the inner wall of the first groove 140 is bent toward the second conductive layer 131 and contacts the second conductive layer 131. The bending height of the second conductive layer 131 on the side close to the second groove 150 refers to the displacement height when the second conductive layer 131 located on the inner wall of the second groove 150 is bent toward the first conductive layer 111 and contacts the first conductive layer 111.

[0052] Specifically, in some embodiments, if the electrolyte thickness is 10μm, the short circuit probability is close to 100%, and the device short circuit current is about 50mA. When the electrolyte thickness is 20μm, the short circuit probability is 20%, and the device short circuit current is about 10mA. When the electrolyte thickness is adjusted to 30μm, the short circuit probability is basically 0%. That is, by increasing the thickness of the electrolyte layer 123, the electrolyte layer 123 forms a height difference between the first conductive layer 111 and the second conductive layer 131. When the thickness of the electrolyte layer 123 is not less than 30μm, even if the first conductive layer and the second conductive layer are squeezed and deformed and bent, no short circuit will be formed, thereby improving the stability of the electrochromic device.

[0053] like Figure 4 and Figure 5 As shown, in some embodiments of the present application, the inner wall of the first groove 140 is provided with a first clearance groove, and the first clearance groove is located at the edge of the first conductive layer 111. It should be noted that the first clearance groove is located in the circumference of the inner wall of the first groove 140, and the vertical distance from the side of the first clearance groove away from the electrochromic layer 120 to the side of the first clearance groove close to the electrochromic layer 120 is equal to the thickness of the first conductive layer 111.

[0054] At the same time, a second clearance groove is provided on the inner wall of the second groove 150, and the second clearance groove is located at the edge of the second conductive layer 131. It should be noted that the second clearance groove is located in the circumference of the inner wall of the second groove 150, and the vertical distance from the side of the second clearance groove away from the electrochromic layer 120 to the side of the second clearance groove close to the electrochromic layer 120 is equal to the thickness of the second conductive layer 131.

[0055] The first and second clearance grooves are used to prevent the first conductive layer from contacting with the second conductive layer to form a short circuit when the electrochromic device is deformed.

[0056] The first make way groove may be formed by etching the first conductive layer 111 on the inner wall of the first groove 140 , and the second make way groove may be formed by etching the second conductive layer 131 on the inner wall of the second groove 150 .

[0057] In addition, in order to further improve the stability between the first conductive layer and the second conductive layer and avoid short circuit between the first conductive layer and the second conductive layer, insulating glue is filled in the first make way groove and the second make way groove respectively, and the first conductive layer on the inner wall of the first groove is sealed by the insulating glue, and the second conductive layer on the inner wall of the second groove is sealed by the insulating glue at the same time, thereby preventing the first conductive layer and the second conductive layer from contacting and forming a short circuit when the electrochromic device is squeezed and deformed, thereby improving the stability of the electrochromic device.

[0058] like Figure 4 and Figure 5As shown, in some embodiments of the present application, a third clearance groove is provided on the inner wall of the first groove 140, and the third clearance groove is located at the edge of the electrochromic material layer 122. It should be noted that the vertical distance from the side of the third clearance groove away from the electrolyte layer 123 to the side of the third clearance groove close to the electrolyte layer 123 is equal to the thickness of the electrochromic material layer 122, and the orthographic projection of the third clearance groove on the plane where the first conductive layer 111 is located coincides with the first clearance groove to form a first etching area 180.

[0059] It is understandable that the vertical distance from the side of the first etched region 180 away from the electrolyte layer 123 to the side of the first etched region 180 close to the electrolyte layer 123 is equal to the sum of the thicknesses of the electrochromic material layer 122 and the first conductive layer 111 .

[0060] In addition, a fourth make way groove is provided on the inner wall of the second groove 150, and the fourth make way groove is located at the edge of the electrochromic material layer 122. It should be noted that the vertical distance from the side of the fourth make way groove away from the electrolyte layer 123 to the side of the fourth make way groove close to the electrolyte layer 123 is equal to the thickness of the ion storage layer 124, and the orthographic projection of the fourth make way groove on the plane where the second conductive layer 131 is located coincides with the second make way groove, so as to form a second etching area 190.

[0061] It is understood that the vertical distance from the side of the second etched region 190 away from the electrolyte layer 123 to the side of the second etched region 190 close to the electrolyte layer 123 is equal to the sum of the thicknesses of the ion storage layer 124 and the second conductive layer 131 .

[0062] In order to further improve the stability of the electrochromic device, the first etching area 180 and the second etching area 190 are respectively filled with insulating glue, and the first conductive layer and the electrochromic material layer are separated from the second conductive layer by the insulating glue, and the second conductive layer and the ion storage layer are separated from the first conductive layer.

[0063] Specifically, the vertical distance from the side of the first etching region 180 away from the first conductive layer 111 to the side of the first etching region 180 close to the first conductive layer 111 is 0.1-2 mm, and the vertical distance from the side of the second etching region 190 away from the second conductive layer 131 to the side of the second etching region 190 close to the second conductive layer 131 is 0.1-2 mm. It can be any one of 0.1 mm, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1 mm, 1.1 mm, 1.2 mm, 1.3 mm, 1.4 mm, 1.5 mm, 1.6 mm, 1.7 mm, 1.8 mm, 1.9 mm, and 2 mm.

[0064] In addition, in some embodiments of the present application, the insulating glue may also be an electrolyte material layer.

[0065] like Figure 6 and Figure 7 As shown, in some other embodiments of the present application, a first insulating portion 160 is disposed on an inner wall of the first groove 140 , and the first insulating portion 160 is located on a side of the second conductive substrate 130 close to the electrochromic layer 120 .

[0066] Specifically, the first insulating portion 160 is attached to the circumference of the inner wall of the first groove 140 , and the first insulating portion prevents the first conductive layer and the second conductive layer from being short-circuited when the electrochromic device is deformed under pressure.

[0067] In addition, a second insulating portion 170 is disposed on the inner wall of the second groove 150 , and the second insulating portion 170 is located on a side of the first conductive substrate 110 close to the electrochromic layer 120 .

[0068] Specifically, the second insulating portion 170 is attached to the circumference of the inner wall of the second groove 150 , and the second insulating portion prevents the first conductive layer and the second conductive layer from being short-circuited when the electrochromic device is deformed under pressure.

[0069] It should be noted that the first insulating portion 160 and the second insulating portion 170 are both insulating layers.

[0070] In order to further improve the barrier quality of the first insulating portion and the second insulating portion and prevent the first conductive substrate from being short-circuited with the second conductive substrate, the vertical distance from the side of the first insulating portion 160 away from the inner wall of the first groove 140 to the inner wall of the first groove 140 is not less than the first threshold range. It should be noted that the vertical distance from the side of the first insulating portion 160 away from the inner wall of the first groove 140 to the inner wall of the first groove 140 is greater than the sum of the thickness of the first conductive layer 111 and the deformation width of the first conductive layer 111.

[0071] It should be noted that the deformation width of the first conductive layer 111 refers to the displacement distance of the first conductive layer 111 on the inner wall of the first groove 140 when the electrochromic layer 120 is deformed by compression.

[0072] In addition, the vertical distance from the side of the second insulating portion 170 away from the inner wall of the second groove 150 to the inner wall of the second groove 150 is not less than the first threshold range. The vertical distance from the side of the second insulating portion 170 away from the inner wall of the second groove 150 to the inner wall of the second groove 150 is greater than the sum of the thickness of the second conductive layer 131 and the deformation width of the second conductive layer 131.

[0073] Specifically, the first threshold value ranges from 0.45 to 0.5 mm, and may be any one of 0.45 mm, 0.46 mm, 0.47 mm, 0.48 mm, 0.49 mm, and 0.5 mm.

[0074] It should be noted that the deformation width of the second conductive layer 131 refers to the displacement distance of the second conductive layer 131 on the inner wall of the second groove 150 when the electrochromic layer 120 is deformed by compression.

[0075] Preferably, in order to further improve the stability between the first conductive layer and the second conductive layer, the vertical distance from the side of the first insulating part 160 away from the inner wall of the first groove 140 to the inner wall of the first groove 140 is not less than 0.5 mm, and the vertical distance from the side of the second insulating part 170 away from the inner wall of the second groove 150 to the inner wall of the second groove 150 is not less than 0.5 mm.

[0076] Specifically, the vertical distance from the side of the first insulating part 160 away from the inner wall of the first groove 140 to the inner wall of the first groove 140 is less than half the width of the first groove 140, and the vertical distance from the side of the second insulating part 170 away from the inner wall of the second groove 150 to the inner wall of the second groove 150 is less than half the width of the second groove 150.

[0077] In all examples shown and described herein, any specific values ​​should be interpreted as merely exemplary and not as limiting, and thus other examples of the exemplary embodiments may have different values.

[0078] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0079] The above embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the present application. It should be pointed out that, for those of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application.

Claims

1. An electrochromic device, characterized in that: It includes a first conductive substrate, an electrochromic layer, and a second conductive substrate stacked in sequence; The first conductive substrate includes a first conductive layer and a first substrate layer stacked together, the second conductive substrate includes a second conductive layer and a second substrate layer stacked together, and the first substrate layer is stacked on a side of the first conductive layer away from the electrochromic layer, and the second substrate layer is stacked on a side of the second conductive layer away from the electrochromic layer; At least one of the hardness of the first conductive layer and the hardness of the second conductive layer is not less than a first hardness value, and the first hardness value ranges from 2H to 6H.

2. The electrochromic device according to claim 1, characterized in that: A first receiving groove is provided at the edge of the first conductive substrate, a second receiving groove is provided at the edge of the second conductive substrate, and a third receiving groove is provided at the edge of the electrochromic layer; the first receiving groove and the third receiving groove are connected to form a first groove, and the second receiving groove and the third receiving groove are connected to form a second groove; the orthographic projection of the first receiving groove on the plane where the electrochromic layer is located overlaps with the third receiving groove, and the orthographic projection of the second receiving groove on the plane where the electrochromic layer is located overlaps with the third receiving groove.

3. The electrochromic device according to claim 2, characterized in that: There are a plurality of first accommodating grooves, and the plurality of first accommodating grooves are arranged at intervals on the edge of the first conductive substrate; there are a plurality of second accommodating grooves, and the plurality of second accommodating grooves are arranged at intervals on the edge of the second conductive substrate; There are a plurality of third containing grooves, and the plurality of third containing grooves are arranged at intervals at the edge of the electrochromic layer.

4. The electrochromic device according to claim 2, characterized in that: There is a gap between the orthographic projection of the first receiving groove on the plane where the second conductive substrate is located and the second receiving groove, and the first hardness value is 3H.

5. The electrochromic device according to claim 2, characterized in that: The orthographic projection of the first receiving groove on the plane where the second conductive substrate is located overlaps with the second receiving groove, and the first hardness value is 5H.

6. The electrochromic device according to claim 2, characterized in that: The electrochromic layer includes an electrochromic material layer, an electrolyte layer and an ion storage layer which are stacked in sequence.

7. The electrochromic device according to claim 6, characterized in that: The thickness of the electrolyte layer is not less than the sum of a bending height of the first conductive layer on a side close to the first groove and a bending height of the second conductive layer on a side close to the second groove.

8. The electrochromic device according to claim 6, characterized in that: A first give-way groove is provided at the edge of the first conductive layer, a second give-way groove is provided at the edge of the second conductive layer, a third give-way groove is provided on the inner wall of the first groove, the third give-way groove is located at the edge of the electrochromic material layer, and the orthographic projection of the third give-way groove on the plane where the first conductive layer is located coincides with the first give-way groove, and the first give-way groove is connected with the third give-way groove to form a first etching area; A fourth give-way groove is provided on the inner wall of the second groove, and the fourth give-way groove is located at the edge of the electrochromic material layer. The orthographic projection of the fourth give-way groove on the plane where the second conductive layer is located coincides with the second give-way groove, and the second give-way groove is connected to the fourth give-way groove to form a second etching area.

9. The electrochromic device according to claim 8, characterized in that: The first etching area and the second etching area are filled with insulating glue.

10. The electrochromic device according to claim 2, characterized in that: A first insulating portion is provided on the inner wall of the first groove, and the first insulating portion is located on a side of the second conductive substrate close to the electrochromic layer; A second insulating portion is disposed on an inner wall of the second groove, and the second insulating portion is located on a side of the first conductive substrate close to the electrochromic layer.

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