Device surface shape detection method, device and system

Abstract

The present application relates to the field of device quality inspection technology, and provides a device surface shape inspection method, apparatus, and system. The method first obtains the detection results of the wavefront phase of multiple inspection areas of the device to be inspected; then, based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in a first direction, and the spliced ​​results in the first direction are spliced ​​in a second direction to obtain the surface shape inspection results of the device to be inspected. The method uses the detection results corresponding to each overlapping area and performs splicing in two directions in succession to obtain the surface shape inspection results of the full-width device to be inspected, thereby calibrating the grating manufacturing errors of the full-width, and providing a guarantee for the smooth progress of subsequent compensation work. Moreover, the method performs splicing in two directions in succession, which can greatly reduce the number of splicing times, improve the splicing efficiency, and thus improve the surface shape inspection efficiency.

Description

Technical Field

[0001] The present application relates to the technical field of optical system quality detection, and in particular to a device surface shape detection method, apparatus and system. Background Art

[0002] Large-scale, high-precision plane grating scales are a critical component of the motion stage displacement feedback system in photolithography systems. During the plane grating fabrication process, interference from environmental and instrumental errors can lead to grating manufacturing errors. This can cause non-ideal phase shifts in the interference signal in the motion stage displacement feedback system, preventing the interferometer readings from accurately reflecting the displacement of the workpiece and mask stages in the photolithography machine, leading to inaccurate displacement measurements. Therefore, surface shape detection of the plane grating is necessary to calibrate and compensate for the grating manufacturing errors, thereby facilitating the calibration of the displacement measurement errors caused by the grating.

[0003] In the prior art, optical inspection systems are typically used to perform surface inspection on planar gratings to calibrate their manufacturing errors. However, due to the large size of planar gratings, their aperture is usually larger than the aperture of the optical inspection system. This makes it impossible to perform full-scale surface inspection of the planar grating using the optical inspection system, resulting in incomplete inspection results and the inability to calibrate the manufacturing errors across the entire surface. This, in turn, hinders the smooth implementation of subsequent compensation work. Summary of the Invention

[0004] The present application provides a device surface shape detection method, apparatus and system to address the defects in the prior art.

[0005] The present application provides a device surface shape detection method, comprising:

[0006] Obtaining detection results of wavefront phases of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to the multiple surface sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected;

[0007] Based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in a first direction, and the spliced ​​results in the first direction are spliced ​​in a second direction to obtain a surface shape detection result of the device to be detected;

[0008] The first direction is perpendicular to the second direction.

[0009] According to a device surface shape detection method provided by the present application, based on the detection result corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in a first direction, and the spliced ​​results of the first direction are spliced ​​in a second direction to obtain the surface shape detection result of the device to be detected, including:

[0010] Based on a preset weight curve corresponding to the first direction, performing a weighted summation on the detection results corresponding to each overlapping area in the first direction to obtain a splicing result in the first direction;

[0011] Based on a preset weight curve corresponding to the second direction, weighted summation is performed on the detection results corresponding to the overlapping area of ​​the stitching results in the second direction to obtain the face shape detection result.

[0012] According to a device surface shape detection method provided by the present application, the preset weight curve corresponding to the first direction and / or the preset weight curve corresponding to the second direction are determined based on the following steps:

[0013] For any direction of the first direction and the second direction, determine a basic weight curve corresponding to the any direction, and determine a basic sampling point position and a corresponding weight value in the basic weight curve based on a size of each overlapping area in the any direction;

[0014] Determining, based on the position and size of each overlapping area in the any direction, a target sampling point position in each overlapping area in the any direction corresponding to the base sampling point position;

[0015] The weight value corresponding to the basic sampling point position is fitted with the target sampling point position corresponding to the basic sampling point position to obtain a preset weight curve corresponding to any direction.

[0016] According to a device surface shape detection method provided by the present application, the splicing results of the first direction are spliced ​​in the second direction to obtain the surface shape detection result of the device to be detected, and then the method includes:

[0017] Fitting the surface shape detection result in the first direction and the second direction respectively to obtain a first fitting result corresponding to the first direction and a second fitting result corresponding to the second direction;

[0018] Based on the first fitting result and the second fitting result, the surface shape detection result is corrected in the first direction and the second direction respectively.

[0019] According to a device surface shape detection method provided by the present application, the detection results of the multiple detection areas are spliced ​​in the first direction, which includes:

[0020] For the detection results of each detection area belonging to any overlapping area, fitting is performed in the first direction and the second direction within the overlapping area to obtain a third fitting result corresponding to the first direction and a fourth fitting result corresponding to the second direction;

[0021] Based on the third fitting result and the fourth fitting result, oblique matching is performed on the detection results of two adjacent detection areas to which any overlapping area belongs in the first direction and the second direction respectively.

[0022] According to a device surface shape detection method provided by the present application, the multiple detection areas are all rectangular areas.

[0023] According to a device surface shape detection method provided by the present application, the method of obtaining detection results of wavefront phases of multiple detection areas of the device to be detected includes:

[0024] Acquiring a surface area of ​​the device to be detected;

[0025] The face area is divided to obtain the plurality of face sub-areas.

[0026] According to a device surface shape detection method provided by the present application, dividing the surface shape area to obtain the multiple surface shape sub-areas includes:

[0027] Based on the aperture of the wavefront phase detection device, the surface area of ​​the device to be detected is divided to obtain the multiple surface sub-areas.

[0028] The present application also provides a device surface shape detection device, comprising:

[0029] an acquisition module, configured to acquire detection results of the wavefront phase of a plurality of detection areas of the device to be detected; the plurality of detection areas correspond one-to-one to the plurality of surface sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected;

[0030] a splicing module, configured to splice the detection results of the multiple detection areas in a first direction based on the detection results corresponding to each overlapping area, and to splice the splicing results in the first direction in a second direction to obtain a surface shape detection result of the device to be detected;

[0031] The first direction is perpendicular to the second direction.

[0032] The present application also provides a device surface shape detection system, comprising: a wavefront phase detection device, a motion stage, and a processor, wherein the wavefront phase detection device is connected to the processor;

[0033] The moving platform is used to carry the device to be detected and drive the device to be detected to move;

[0034] The wavefront phase detection device is used to perform wavefront phase detection on the detection areas corresponding to the multiple surface sub-areas of the device to be detected, obtain detection results of the wavefront phases of the multiple detection areas, and transmit the detection results of the multiple detection areas to the processor;

[0035] The processor is used to execute the above-mentioned device surface shape detection method.

[0036] The present application also provides an electronic device, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein when the processor executes the program, the device surface shape detection method as described above is implemented.

[0037] The present application also provides a non-transitory computer-readable storage medium having a computer program stored thereon. When the computer program is executed by a processor, the device surface shape detection method as described in any one of the above is implemented.

[0038] The present application also provides a computer program product, comprising a computer program, which, when executed by a processor, implements any of the device surface shape detection methods described above.

[0039] The device surface shape detection method, apparatus and system provided by the present application first obtain the detection results of the wavefront phase of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to the multiple surface shape sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; then, based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in the first direction, and the splicing results of the first direction are spliced ​​in the second direction to obtain the surface shape detection results of the device to be detected. This method uses the detection results corresponding to each overlapping area and splices them in two directions in succession to obtain the surface shape detection results of the full-width device to be detected, and then can realize the calibration of the grating manufacturing error of the full-width, providing a guarantee for the smooth progress of subsequent compensation work. Moreover, this method performs splicing in two directions in succession, which can greatly reduce the number of splicing times, improve the splicing efficiency, and thus improve the surface shape detection efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to more clearly illustrate the technical solutions in this application or the prior art, a brief introduction will be given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, for ordinary technicians in this field, other drawings can be obtained based on the drawings in the following description without any creative work.

[0041] Figure 1 It is a flow chart of the device surface shape detection method provided by this application;

[0042] Figure 2 It is the wavefront phase diagram corresponding to each detection area in the device surface shape detection method provided by this application;

[0043] Figure 3 This is a schematic diagram of a preset weight curve corresponding to the overlapping area between detection areas 1 and 2 in the x-direction in the device surface shape detection method provided by this application;

[0044] Figure 4 It is a fitting coefficient graph corresponding to each first coordinate value in the x-direction obtained by fitting the detection results of detection areas 1 and 2 in the y-direction within the overlapping area in the device surface shape detection method provided by the present application;

[0045] Figure 5 It is a fitting coefficient diagram after tilt matching of the detection results of detection areas 1 and 2 in the x-direction in the device surface shape detection method provided by this application;

[0046] Figure 6 It is a wavefront phase diagram corresponding to each detection area in the device surface shape detection method provided by the present application after the wavefront phase diagram is tilted and matched in the x direction;

[0047] Figure 7 It is a wavefront phase diagram of a splicing result in the x-direction in the device surface shape detection method provided by this application;

[0048] Figure 8 is a wavefront phase diagram of another splicing result in the x-direction in the device surface shape detection method provided by the present application;

[0049] Figure 9 It is a wavefront phase diagram of the surface shape detection result before correction in the device surface shape detection method provided in this application;

[0050] Figure 10 is a wavefront phase diagram of the surface shape detection result after correction in the device surface shape detection method provided in this application;

[0051] Figure 11 It is a three-dimensional wavefront phase diagram of the surface shape detection result after correction in the device surface shape detection method provided in this application;

[0052] Figure 12 It is a structural schematic diagram of the device surface shape detection device provided by this application;

[0053] Figure 13 This is one of the structural diagrams of the device surface shape detection system provided by this application;

[0054] Figure 14 This is the second structural diagram of the device surface shape detection system provided by this application;

[0055] Figure 15 It is a structural diagram of the electronic device provided in this application. DETAILED DESCRIPTION

[0056] To make the objectives, technical solutions, and advantages of this application more clear, the technical solutions in this application will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the embodiments described are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.

[0057] Currently, motion stage displacement feedback systems are used to measure the displacement of moving stages, such as the workpiece stage and mask stage, in lithography systems to achieve accurate positioning of the lithographic object. Large, high-precision planar optical scales, a key component of these systems, are challenging to manufacture, meeting extreme requirements: near-zero defects, high precision, large size, thin thickness, and highly complex macroscopic shapes.

[0058] Usually, scanning interference lithography can be used to produce plane gratings using scanning interference lithography technology using a scanning interference lithography machine. The basic principle of scanning interference lithography technology is: using two Gaussian light beams through a small-aperture optical system to make the beam waists interfere on the grating film, generating interference fringes of the required period. A two-dimensional high-precision workpiece stage carries a grating film evenly coated with photoresist for two-dimensional step scanning, and records the information of the interference field on the photoresist to produce a plane grating, thereby completing large-area exposure.

[0059] Because the aperture of a single plane grating is on the order of hundreds of millimeters, and because the plane grating fabrication process is subject to interference from environmental and instrumental errors, both single-shot and step-and-scan exposures will result in grating manufacturing errors in the resulting plane grating. These grating manufacturing errors can cause non-ideal phase shifts in the interference signal within the motion stage's displacement feedback system, preventing the interferometer reading from accurately reflecting the motion stage's displacement and leading to inaccurate position measurements of the lithographic object.

[0060] Grating manufacturing errors include line manufacturing errors and surface manufacturing errors. Whether using single exposure with a large field of view or step-by-step or step-by-step scanning splicing exposure with a small field of view, the line manufacturing errors are limited by the motion accuracy of the lens and workpiece stage in the scanning interferometer lithography machine. The motion accuracy requirements of the motion stage in the motion stage displacement feedback system will be much greater than the motion accuracy requirements of the motion stage. Even if silicon wafer gratings are manufactured using lithography mask exposure, the line accuracy cannot reach sub-nanometers, and the silicon wafer size cannot meet the requirements. In addition to line manufacturing errors, surface errors are also unavoidable and are much greater than the motion accuracy requirements of the motion stage in the motion stage displacement feedback system.

[0061] Therefore, the grating manufacturing error cannot be eliminated or not affect the displacement measurement accuracy of the motion stage displacement feedback system by improving the grating quality through optimizing the manufacturing process. Instead, the grating manufacturing error of the plane grating can only be calibrated in the motion stage displacement feedback system, and then the grating manufacturing error can be compensated to achieve the calibration of the displacement measurement error in the motion stage displacement feedback system.

[0062] Calibration of grating manufacturing errors in plane gratings can be achieved by performing surface shape detection on the plane grating. In the prior art, this is usually performed with the aid of an optical detection system. However, due to the large size of the plane grating, its aperture is usually larger than the aperture of the optical detection system. This results in the inability to perform full-scale surface shape detection on the plane grating using the optical detection system, resulting in incomplete detection results. This makes it impossible to calibrate the manufacturing errors of the grating across the entire surface, and thus hinders the subsequent compensation work.

[0063] Based on this, the present invention provides a device surface shape detection method that can be applied to the full-width surface shape detection of a plane grating to address the defects in the prior art. The method can also be applied to the full-width surface shape detection of other devices.

[0064] Figure 1 A schematic diagram of a device surface shape detection method provided in an embodiment of the present application is shown in FIG. Figure 1 As shown, the method includes:

[0065] S1, obtaining detection results of the wavefront phase of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to the multiple surface sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected;

[0066] S2, based on the detection results corresponding to each overlapping area, stitching the detection results of the multiple detection areas in a first direction, and stitching the stitching results in the first direction in a second direction to obtain a surface shape detection result of the device to be detected;

[0067] The first direction is perpendicular to the second direction.

[0068] Specifically, a device surface shape detection method provided in an embodiment of the present application is executed by a device surface shape detection device, which can be configured in a computer, which can be a local computer or a cloud computer. The local computer can be a computer, a tablet, etc., which is not specifically limited here.

[0069] First, step S1 is performed to obtain wavefront phase detection results for multiple detection areas of the device to be detected. The device to be detected refers to the device whose surface shape needs to be determined. It can be any device with a surface shape, such as an optical device or an electronic device, and is not specifically limited here. The optical device can be a plane grating.

[0070] The device to be inspected can be quite large. Therefore, to perform full-scale surface inspection of the device, its surface area can be divided into multiple surface sub-areas. The areas of the surface sub-areas can be equal or unequal, and this is not specifically limited here. Each surface inspection sub-area corresponds to a detection area, and any two detection areas overlap, providing a theoretical basis for the subsequent splicing of detection results.

[0071] Here, the wavefront phase of each detection area of ​​the device to be detected can be detected separately by a wavefront phase detection device to obtain detection results for each detection area of ​​the device to be detected. The wavefront phase detection device can be an interferometer or a wavefront sensor, etc. The interferometer can be a surface interferometer such as a Fizeau interferometer or a grating interferometer, and the wavefront sensor can be a Shack-Hartmann wavefront sensor, etc., without specific limitations here.

[0072] Each inspection area of ​​the device to be inspected corresponds to a test result. The test result for each inspection area can include the wavefront phase value of each point in the inspection area. The wavefront phase value is characterized by the distance between each point in the inspection area and the wavefront phase detection device. Furthermore, the test results of each inspection area can be used to determine the presence of defects in each inspection area, as well as the size and direction of the defects.

[0073] Here, the detection results of each detection area can form a wavefront phase diagram. Take the device to be detected as a 500mm plane grating as an example, and its surface area includes 6 surface sub-areas. The detection areas corresponding to the surface sub-areas are marked as 1, 2, 3, 4, 5, and 6 respectively. The corresponding wavefront phase diagram is as follows: Figure 2 shown. Figure 2 The origin of the coordinates is the lower left corner of the surface area of ​​the device to be detected.

[0074] Figure 2is the grayscale image of each wavefront phase image, its horizontal coordinates are the x-direction of the corresponding detection area, the unit is mm, and its vertical coordinates are the y-direction of the corresponding detection area, the unit is mm. The grayscale value in the grayscale image represents the wavefront phase value of each point on the corresponding detection area. The larger the wavefront phase value of a point, the larger the grayscale value. Figure 2 The lighter the color, the brighter the color.

[0075] In particular, Figure 2 The rectangular frame area in the wavefront phase image corresponding to detection area 1 and the rectangular frame area in the wavefront phase image corresponding to detection area 2 represent overlapping areas.

[0076] Then, step S2 is executed to splice the wavefront phase detection results of multiple detection areas in the first direction using the detection results of the wavefront phase corresponding to each overlapping area, and to splice the splicing results in the first direction in the second direction to obtain the surface shape detection results of the device to be detected.

[0077] The wavefront phase detection result corresponding to each overlapping region refers to the wavefront phase detection result at the corresponding position in the overlapping region, among the wavefront phase detection results of the two adjacent detection regions to which the overlapping region belongs. That is, each overlapping region includes two wavefront phase detection results: the first detection result is the wavefront phase detection result at the corresponding position in the first detection region of the overlapping region, among the two adjacent detection regions to which the overlapping region belongs; and the second detection result is the wavefront phase detection result at the corresponding position in the second detection region of the overlapping region, among the two adjacent detection regions to which the overlapping region belongs.

[0078] by Figure 2 Taking detection area 1 and detection area 2 as an example, the overlapping areas between detection area 1 and detection area 2 are represented by rectangular frame areas respectively, and the corresponding wavefront phase detection results include both the wavefront phase value of the rectangular frame area in the wavefront phase diagram corresponding to detection area 1 and the wavefront phase value of the rectangular frame area in the wavefront phase diagram corresponding to detection area 2.

[0079] Based on this, using the detection results corresponding to each overlapping area, the detection results of the wavefront phases of multiple detection areas can be spliced ​​in the first direction. Due to the use of the detection results corresponding to each overlapping area, the splicing efficiency can be higher and the splicing results can be more reliable. The first direction and the subsequent second direction are perpendicular to each other and can be determined according to the division method of the surface sub-areas. For example, each surface sub-area can be obtained by dividing the surface area of ​​the device to be detected in two perpendicular directions. Then the first direction can be horizontal or vertical, and the second direction is another direction perpendicular to the first direction, that is, vertical or horizontal. Here, the horizontal direction is the x-direction and the vertical direction is the y-direction.

[0080] Splicing the wavefront phase detection results for multiple detection areas in the first direction refers to splicing the wavefront phase detection results for at least two detection areas in the first direction using the detection results corresponding to the overlapping areas in the first direction. The number of spliced ​​results in the first direction is the number of detection areas in the second direction.

[0081] The wavefront phase detection results corresponding to the overlapping regions in the second direction can then be used to stitch the stitching results from the first direction in the second direction, thereby obtaining the surface shape detection results of the device under test. This surface shape detection result can be represented by the wavefront phase values ​​at each point on the surface of the device under test, and can be stored in the form of a two-dimensional table. In the two-dimensional table, each point on the surface of the device under test is represented by the x and y dimensions, and the data in the two-dimensional table are the wavefront phase values ​​at each point on the surface of the device under test.

[0082] Since the detection results of the wavefront phases in two directions are spliced ​​together, the obtained surface shape detection result is the full-width surface shape information of the device to be detected.

[0083] by Figure 2 For example, if the first direction is Figure 2 The second direction is Figure 2 In the longitudinal direction, there are three detection areas in the first direction and two detection areas in the second direction. In the first direction, the wavefront phase detection results of detection areas 1, 2, and 3 can be sequentially spliced ​​together to obtain a splicing result in the first direction after two splicing operations. The wavefront phase detection results of detection areas 4, 5, and 6 can be sequentially spliced ​​together to obtain another splicing result in the first direction after two splicing operations.

[0084] Afterwards, in the second direction, the two stitching results in the first direction are spliced ​​using the detection results of the wavefront phase corresponding to the overlapping area between detection areas 1 and 4, the detection results of the wavefront phase corresponding to the overlapping area between detection areas 2 and 5, and the detection results of the wavefront phase corresponding to the overlapping area between detection areas 3 and 6. After one stitching, the surface shape detection result and its corresponding wavefront phase map are obtained.

[0085] Since the splicing is performed in the first direction first and then in the second direction, Figure 2 The corresponding 6 detection areas only need to be spliced ​​5 times in total, which can greatly reduce the number of splicing times compared to two-by-two splicing or one-by-one splicing which requires 7 times in total.

[0086] It is understandable that the advantage of greatly reducing the number of splicing times is more obvious when the number of detection areas is large.

[0087] The device surface shape detection method provided in the embodiment of the present application first obtains the detection results of the wavefront phase of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to the multiple surface shape sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; then, based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in the first direction, and the splicing results in the first direction are spliced ​​in the second direction to obtain the surface shape detection results of the device to be detected. This method uses the detection results corresponding to each overlapping area and performs splicing in two directions in succession to obtain the surface shape detection results of the full-width device to be detected, and then can realize the calibration of the grating manufacturing error of the full-width, providing a guarantee for the smooth progress of subsequent compensation work. Moreover, this method performs splicing in two directions in succession, which can greatly reduce the number of splicing times, improve the splicing efficiency, and thus improve the surface shape detection efficiency.

[0088] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application, wherein the stitching results of the first direction are stitched in the second direction to obtain the surface shape detection result of the device to be detected, then includes:

[0089] Based on the surface shape detection result and predetermined surface shape information of a standard device of the same type as the device to be detected, the manufacturing error of the device to be detected is calibrated.

[0090] Specifically, the surface shape detection results can be stored in the form of a two-dimensional table, which can be recorded as the 2D table to be calibrated. The surface shape information can also be stored in the form of a two-dimensional table, which can be recorded as the standard 2D table. In the standard 2D table, each point on the surface of the same type of standard device is represented by the x and y dimensions. The data in the standard 2D table is the theoretical wavefront phase value of each point on the surface of the same type of standard device. This can be obtained by performing wavefront phase detection on multiple detection areas of the same type of standard device and splicing the detection results, or by computer simulation.

[0091] It is understandable that the standard device of the same type refers to a device that is of the same type as the device to be tested and has no manufacturing errors.

[0092] When calibrating the manufacturing error of the device to be detected, it can be achieved by calculating the data difference between the two-dimensional table to be calibrated and the standard two-dimensional table, that is, the difference can be used as the manufacturing error of the device to be detected at the corresponding point.

[0093] In the embodiment of the present application, the surface shape detection results can be used to perform full-scale calibration of the manufacturing errors of the device to be detected, which can make the calibration results more comprehensive and accurate.

[0094] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application, based on the detection results corresponding to each overlapping area, splicing the detection results of the multiple detection areas in a first direction, and splicing the splicing results in the first direction in a second direction to obtain the surface shape detection result of the device to be detected, includes:

[0095] Based on a preset weight curve corresponding to the first direction, performing a weighted summation on the detection results corresponding to each overlapping area in the first direction to obtain a splicing result in the first direction;

[0096] Based on a preset weight curve corresponding to the second direction, weighted summation is performed on the detection results corresponding to the overlapping area of ​​the stitching results in the second direction to obtain the face shape detection result.

[0097] Specifically, when stitching together the detection results corresponding to each overlapping region in the first and second directions, a preset weight curve corresponding to each direction can be introduced. That is, each direction has a corresponding preset weight curve, and the preset weight curves corresponding to different directions can be the same or different. The preset weight curve corresponding to each direction can be predetermined or determined by the resolution of the wavefront phase image corresponding to the detection region in the corresponding direction, which is not specifically limited here.

[0098] The preset weight curve corresponding to each direction is used to characterize the correspondence between the coordinates of each overlapping area in the corresponding direction and the weight value, wherein the coordinates of each overlapping area in the corresponding direction are independent variables and the weight value is the dependent variable.

[0099] Because the wavefront phase detection results corresponding to each overlapping region include both a first detection result and a second detection result, the preset weighting curve corresponding to each direction includes a first sub-curve and a second sub-curve, respectively used to weight the first detection result and the second detection result. The first sub-curve and the second sub-curve have the same curve type and can be selected as needed, for example, both can be S-shaped curves, reciprocal curves, logarithmic curves, etc., which are not specifically limited here.

[0100] The first and second sub-curves have completely opposite changing trends and the same magnitude of change, thereby achieving a smooth transition during the stitching process. For example, the first sub-curve's changing trend could be that the weight value gradually decreases from 1 to 0 as the coordinate value of the overlapping area in the corresponding direction increases, while the second sub-curve's changing trend could be that the weight value gradually decreases from 0 to 1 as the coordinate value of the overlapping area in the corresponding direction increases.

[0101] Therefore, according to the preset weight curve corresponding to the first direction, the detection results corresponding to each overlapping area in the first direction are weighted and summed, that is, the wavefront phase values ​​of each point in the corresponding position of the overlapping area in the first adjacent detection area are weighted using the weight values ​​corresponding to each point in the first sub-curve contained in the preset weight curve corresponding to the first direction, and the wavefront phase values ​​of each point in the corresponding position of the overlapping area in the second adjacent detection area are weighted using the weight values ​​corresponding to each point in the second sub-curve contained in the preset weight curve corresponding to the first direction, and the two weighted results are summed to obtain the splicing result of the first direction.

[0102] Afterwards, the preset weight curve corresponding to the second direction is used to perform weighted summation on the detection results corresponding to the overlapping area of ​​the splicing results of the first direction in the second direction, that is, the wavefront phase values ​​of each point in the corresponding position of the overlapping area in the first adjacent detection area are weighted using the weight values ​​corresponding to each point in the first sub-curve contained in the preset weight curve corresponding to the second direction, and the wavefront phase values ​​of each point in the corresponding position of the overlapping area in the second adjacent detection area are weighted using the weight values ​​corresponding to each point in the second sub-curve contained in the preset weight curve corresponding to the second direction, and the two weighted results are summed to obtain the surface shape detection result of the device to be detected.

[0103] In the embodiment of the present application, the introduction of preset weight curves corresponding to each direction can ensure that the transition of the splicing result obtained by weighted summation is more natural and the splicing result is less likely to have a break phenomenon.

[0104] On the basis of the above embodiments, in the device surface shape detection method provided in the embodiments of the present application, the preset weight curve corresponding to the first direction and / or the preset weight curve corresponding to the second direction are determined based on the following steps:

[0105] For any direction of the first direction and the second direction, determine a basic weight curve corresponding to the any direction, and determine a basic sampling point position and a corresponding weight value in the basic weight curve based on a size of each overlapping area in the any direction;

[0106] Determining, based on the position and size of each overlapping area in the any direction, a target sampling point position in each overlapping area in the any direction corresponding to the base sampling point position;

[0107] The weight value corresponding to the basic sampling point position is fitted with the target sampling point position corresponding to the basic sampling point position to obtain a preset weight curve corresponding to any direction.

[0108] Specifically, in the embodiment of the present application, the sizes of the overlapping areas are the same, so that the splicing efficiency can be guaranteed.

[0109] The sizes of the overlapping regions may include the size of each overlapping region in the first direction (ie, the length of each overlapping region in the first direction) and the size of each overlapping region in the second direction (ie, the length of each overlapping region in the second direction).

[0110] Therefore, when determining the preset weight curve corresponding to the first direction and / or when determining the preset weight curve corresponding to the second direction, the following steps are performed. The only difference between the two is that the preset weight curves correspond to different directions.

[0111] For any direction in the first direction and the second direction, the basic weight curve corresponding to any direction can be determined first. The basic weight curve corresponding to any direction may include a first basic sub-curve and a second basic sub-curve. The first basic sub-curve and the second basic sub-curve have the same curve type and can be selected as needed, for example, an S-shaped curve, a reciprocal curve, and a logarithmic curve, etc., which are not specifically limited here. The change trends of the first basic sub-curve and the second basic sub-curve are completely opposite, and the change amplitudes are the same.

[0112] Taking the case where both the first basic sub-curve and the second basic sub-curve are S-shaped curves as an example, the formula of the S-shaped curve can be expressed as:

[0113] w=k1*s l1 -k2*s l2 +k3*s l3

[0114] Among them, w is the dependent variable, s is the independent variable, k1, k2, k3 are the coefficients of their respective variable terms, and l1, l2, l3 are the exponents of the independent variables.

[0115] Let w(s=0)=0, w′=0, w(s=1)=1, and solve the above formula to obtain multiple groups (k1, k2, k3, l1, l2, l3). Substituting any one of these groups into the above formula will yield the first basic subcurve contained in the basic weight curve. Let w(s=0)=1, w′=0, w(s=1)=0, and solve the above formula to obtain multiple groups (k1, k2, k3, l1, l2, l3). Substituting any one of these groups into the above formula will yield the second basic subcurve contained in the basic weight curve. The independent variables of the first and second basic subcurves are both positions, and the dependent variables are both weights.

[0116] Afterwards, the size of each overlapping area in any direction can be used to determine the basic sampling point position and the corresponding weight value in the basic weight curve. Here, the number of pixels of the wavefront phase detection device contained in each overlapping area in any direction can be determined based on the size of each overlapping area in any direction and the pixel size of the wavefront phase detection device; then, based on the number of pixels, an increasing arithmetic sequence is constructed, and each number in the arithmetic sequence is the basic sampling point position. Each number in the arithmetic sequence is substituted into the first basic sub-curve and the second basic sub-curve of the basic weight curve respectively to obtain the first weight value of each basic sampling point position on the first basic sub-curve and the second weight value on the second basic sub-curve.

[0117] Taking the x direction as an example, if the size of each overlapping area in the x direction is x1, in mm, and the pixel size of the wavefront phase detection device in the x direction is r1, in mm, then the number of pixels of the wavefront phase detection device contained in each overlapping area in the x direction is x. p It can be calculated by the following formula:

[0118]

[0119] Afterwards, you can As the first item, is the tolerance, Construct an increasing arithmetic progression for the last term.

[0120] For example, x1=20mm, r1=1mm, then x p =20, the increasing arithmetic progression is [1 / 21, 2 / 21, ..., 20 / 21]. Substituting each number in the arithmetic progression into the first basic sub-curve, the corresponding first weight values ​​can be obtained, which are w 1，1 , w 1，2 ,……,w 1，20 Substituting the numbers in the arithmetic progression into the second basic sub-curve, we can get the corresponding second weight values, which are w 2，1 , w 2，2 ,……,w 2，20 .

[0121] Afterwards, the position and size of each overlapping area in any direction are used to determine the target sampling point position in each overlapping area in any direction corresponding to the basic sampling point position. The position of each overlapping area in any direction refers to the coordinate range of each overlapping area in any direction. For example Figure 2In the figure, the overlapped region between detection areas 1 and 2 in the x-direction can be expressed as [150 mm, 200 mm], with a size of 50 mm. The overlapped region between detection areas 1 and 4 in the y-direction can be expressed as [175 mm, 190 mm], with a size of 15 mm.

[0122] The target sampling point position in each overlapping area in any direction corresponding to the base sampling point position is the position obtained by mapping the base sampling point position to the position in any direction of each overlapping area. For example, the first number 1 / 21 in the arithmetic progression corresponds to the target sampling point position in the overlapping area between detection areas 1 and 2 in the x-direction at x = 150 + 50 * 1 / 21.

[0123] Finally, the weight values ​​corresponding to the basic sampling point positions are fitted with the target sampling point positions corresponding to the basic sampling point positions, that is, the first weight values ​​corresponding to the basic sampling point positions are fitted with the target sampling point positions corresponding to the basic sampling point positions, and the first sub-curve in the preset weight curve corresponding to any direction can be obtained. The second weight values ​​corresponding to the basic sampling point positions are fitted with the target sampling point positions corresponding to the basic sampling point positions, and the second sub-curve in the preset weight curve corresponding to any direction can be obtained. Figure 3 , which is a schematic diagram of a preset weight curve corresponding to the overlapping area between detection areas 1 and 2 in the x direction.

[0124] In the embodiments of the present application, the position and size of each overlapping region in any direction can be used to create a preset weight curve that can be applied to the splicing of the wavefront phase detection results corresponding to each overlapping region. Furthermore, by fitting the weight values ​​corresponding to the base sampling point positions with the target sampling point positions corresponding to the base sampling point positions, the resulting preset weight curve can contain sufficient weight data.

[0125] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application, wherein the stitching results of the first direction are stitched in the second direction to obtain the surface shape detection result of the device to be detected, then includes:

[0126] Fitting the surface shape detection result in the first direction and the second direction respectively to obtain a first fitting result corresponding to the first direction and a second fitting result corresponding to the second direction;

[0127] Based on the first fitting result and the second fitting result, the surface shape detection result is corrected in the first direction and the second direction respectively.

[0128] Specifically, due to errors such as assembly errors and measurement errors in the placement of the device under test, the device under test may be tilted as a whole, which in turn leads to errors in the surface shape detection results. Therefore, after the splicing results in the first direction are spliced ​​in the second direction to obtain the surface shape detection results of the device under test, the surface shape detection results can also be corrected to remove any possible overall tilt errors. The correction process is as follows:

[0129] First, the face detection results are fitted in the first and second directions, respectively, to obtain a first fitting result corresponding to the first direction and a second fitting result corresponding to the second direction. Fitting the face detection results in the first direction refers to fitting with the face detection results as the dependent variable and the coordinate values ​​of the face detection results in the first direction as the independent variable. The first fitting result represents the correspondence between the independent and dependent variables. Fitting the face detection results in the second direction refers to fitting with the face detection results as the dependent variable and the coordinate values ​​of the face detection results in the second direction as the independent variable. The second fitting result also represents the correspondence between the independent and dependent variables.

[0130] Then, based on the first fitting result and the second fitting result, the face detection result is corrected in the first direction and the second direction, respectively. Here, the face detection result can be corrected in the first direction using the first fitting result first, and then in the second direction using the second fitting result. Alternatively, the face detection result can be corrected in the second direction using the second fitting result first, and then in the first direction using the first fitting result. Alternatively, the face detection result can be corrected in both directions simultaneously.

[0131] Correcting the surface shape detection results in the first direction using the first fitting result can be understood as removing the effect of any tilt of the device under test in the first direction on the surface shape detection results, that is, removing any rotational errors that may exist in the surface shape detection results in the first direction. Here, the first fitting result can be used to determine a first fitting value corresponding to each point in the surface shape detection results. The difference between the wavefront phase value corresponding to each point in the surface shape detection results and the first fitting value is then calculated. The resulting result is the corrected result in the first direction.

[0132] Similarly, using the second fitting result to correct the surface shape detection results in the second direction can be understood as removing the effect of any tilt of the device under test in the second direction on the surface shape detection results, that is, removing any rotational errors that may exist in the surface shape detection results in the second direction. Here, the second fitting result can be used to determine the second fitting value corresponding to each point in the surface shape detection results. The difference between the wavefront phase value corresponding to each point in the surface shape detection results and the second fitting value is then calculated. The resulting result is the corrected result in the second direction.

[0133] In an embodiment of the present application, by correcting the surface detection results in two directions, the corrected surface detection results can more accurately characterize the surface shape of the device to be detected, and the manufacturing error calibration of the device to be detected is more accurate, which facilitates the subsequent compensation for the manufacturing error of the device to be detected and the calibration of other errors caused by it.

[0134] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application, wherein the detection results of the multiple detection areas are spliced ​​in the first direction, comprises:

[0135] For the detection results of each detection area belonging to any overlapping area, fitting is performed in the first direction and the second direction within the overlapping area to obtain a third fitting result corresponding to the first direction and a fourth fitting result corresponding to the second direction;

[0136] Based on the third fitting result and the fourth fitting result, oblique matching is performed on the detection results of two adjacent detection areas to which any overlapping area belongs in the first direction and the second direction respectively.

[0137] Specifically, due to the de-tilting function that the wavefront phase detection equipment used to detect the wavefront phase of multiple detection areas may have, as well as the slight changes in the device to be detected when detecting the wavefront phase of each detection area, the detection results of the wavefront phase of multiple detection areas have tilt errors. If they are directly spliced, the splicing results will be inaccurate and the splicing efficiency will also be affected.

[0138] Based on this, before starting the stitching in both directions, the wavefront phase detection results of the two adjacent detection areas to be stitched are tilt-matched to match the two detection results corresponding to each overlapping area so that the two detection results corresponding to each overlapping area are equal. The following steps are performed for each overlapping area, and only one overlapping area is used as an example for explanation.

[0139] First, for the detection results of each adjacent detection area to which any overlapping area belongs, that is, for the detection results of the first detection area to which any overlapping area belongs, fitting is performed in the first direction and the second direction of the overlapping area, respectively, to obtain the third fitting result of the first detection area corresponding to the first direction and the fourth fitting result of the first detection area corresponding to the second direction. For the detection results of the second detection area to which any overlapping area belongs, fitting is performed in the first direction and the second direction of the overlapping area, respectively, to obtain the third fitting result of the second detection area corresponding to the first direction and the fourth fitting result of the second detection area corresponding to the second direction.

[0140] Taking fitting in the second direction of any overlapping area as an example, the first coordinate value of any overlapping area in the first direction is sampled, and any first coordinate value of any overlapping area in the first direction is selected. The second coordinate value in the second direction corresponding to the any first coordinate value is used as the independent variable, and the second coordinate value and the detection result of the first detection area corresponding to the any first coordinate value are used as the dependent variable for fitting, thereby obtaining a fourth fitting result for the first detection area at any first coordinate value. The second coordinate value in the second direction corresponding to the any first coordinate value is used as the independent variable, and the second coordinate value and the detection result of the second detection area corresponding to the any first coordinate value are used as the dependent variable for fitting, thereby obtaining a fourth fitting result for the second detection area at any first coordinate value.

[0141] By traversing all first coordinate values ​​of any overlapping region in the first direction, the fourth fitting result corresponding to the second direction can be obtained.

[0142] by Figure 2 Take the overlapping area between detection areas 1 and 2 as an example, and the first direction is the x direction and the second direction is the y direction. For the detection results of detection area 1, fitting is performed in the y direction of the overlapping area, and the fitting coefficients corresponding to the first coordinate values ​​in the x direction are obtained as follows Figure 4 As shown in curve 1, for the detection results of detection area 2, fitting is performed in the y direction of the overlapping area, and the fitting coefficients corresponding to the first coordinate values ​​in the x direction are obtained as follows: Figure 4 As shown in Curve 2 in . Wherein, the fitting coefficient is the slope corresponding to each fourth fitting result.

[0143] Thereafter, the detection results of two adjacent detection areas belonging to any overlapping area are obliquely matched in the first direction and the second direction respectively using the fitting coefficients in the third fitting result and the fourth fitting result.

[0144] In this case, any detection area to which any overlapping area belongs can be selected as a reference. Based on the first slope in the third fitting result of any detection area, a linear correction can be performed on the second slope in the third fitting result of another detection area to which any overlapping area belongs, that is, the second slope is replaced by the first slope. Based on the first bias in the third fitting result of any detection area, an offset correction can be performed on the second bias in the third fitting result of another detection area to which any overlapping area belongs, that is, the second bias is replaced by the first bias.

[0145] Similarly, based on the third slope in the fourth fitting result of any detection area, a linear correction is performed on the fourth slope in the fourth fitting result of another detection area belonging to any overlapping area, i.e., the fourth slope is replaced with the third slope. Based on the third bias in the fourth fitting result of any detection area, an offset correction is performed on the fourth bias in the fourth fitting result of another detection area belonging to any overlapping area, i.e., the fourth bias is replaced with the third bias.

[0146] After performing tilt matching on the detection results of detection areas 1 and 2, Figure 4 becomes Figure 5 At this time, the two detection results corresponding to the overlapping area between detection areas 1 and 2 are equal.

[0147] In the embodiment of the present application, fitting is used to implement tilt matching of the detection results of two adjacent detection areas belonging to any overlapping area, which can ensure smooth subsequent stitching and improve the stitching efficiency and the accuracy of the stitching results.

[0148] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application is Figure 2 After tilt matching, the wavefront phase image corresponding to each detection area in can be transformed into Figure 6 Afterwards, Figure 6 The detection results of detection areas 1, 2, and 3 are spliced ​​in the x direction to obtain a splicing result in the x direction. The wavefront phase diagram is as follows: Figure 7 As shown. Figure 6 The detection results of detection areas 4, 5, and 6 are spliced ​​in the x direction to obtain another splicing result in the x direction. The wavefront phase diagram is as follows: Figure 8 shown.

[0149] After that, the two splicing results in the x direction are spliced ​​in the y direction to obtain the surface shape detection result of the device to be detected, and its wavefront phase diagram is as follows: Figure 9 shown.

[0150] After that, the obtained surface shape detection results of the device to be detected are overall de-tilted, that is, the surface shape detection results are fitted in the x direction and the y direction respectively to obtain the first fitting result corresponding to the x direction and the second fitting result corresponding to the y direction. Then, according to the first fitting result and the second fitting result, the surface shape detection results are corrected in the x direction and the y direction respectively to obtain the corrected surface shape detection results, whose wavefront phase diagram is shown as follows: Figure 10 As shown. Figure 10 If a three-dimensional graph is used to represent Figure 11 shown.

[0151] Although current surface shape measurement technology uses large-scale plane gratings as research objects, it studies the impact of the overall flatness of the grating and the degree of non-ideality of the grating period on the wavefront from the perspective of wavefront distortion. Based on sub-aperture stitching measurement technology, a sub-aperture stitching method is used to stitch the interferometric measurement results from small-scale sub-apertures to large-scale full apertures, thereby obtaining flatness within a large range of sizes. At the same time, a corresponding sub-aperture stitching algorithm has also been designed. However, the existing solution uses a method of stitching multiple circular apertures, which has a large overlapping area and low stitching efficiency. In addition, if the number of stitched apertures is large, programming is difficult to implement.

[0152] Based on this, on the basis of the above embodiments, in the device surface shape detection method provided in the embodiments of the present application, the multiple detection areas are all rectangular areas.

[0153] Specifically, the multiple detection areas are all rectangular. The length and width of the rectangular areas can be equal or unequal, and are not specifically limited here. Compared to circular areas, the solution of multiple detection areas being all rectangular can minimize the overlapping area while ensuring the stitching effect, thereby improving stitching efficiency and reducing stitching difficulty. This is suitable for full-width surface shape inspection of large-diameter and irregularly shaped devices to be inspected.

[0154] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application, wherein the detection results of the wavefront phases of multiple detection areas of the device to be detected are obtained, comprises:

[0155] Acquiring a surface area of ​​the device to be detected;

[0156] The face area is divided to obtain the plurality of face sub-areas.

[0157] Specifically, before executing step S1, multiple surface sub-regions of the device to be detected can be obtained by dividing the surface area of ​​the device to be detected into equal areas. The number of divided surface sub-regions can be set as needed, so that the detection results obtained by performing wavefront phase detection on the detection areas corresponding to all surface sub-regions are spliced ​​under the premise of ensuring splicing efficiency and splicing effect to obtain the complete surface shape of the device to be detected.

[0158] Here, the surface area of ​​the device to be detected can be the top view area of ​​the device to be detected when the device to be detected is placed with the surface facing upward. It can be understood that there is no gap or overlap between any two adjacent surface sub-areas.

[0159] On the basis of the above embodiments, the device surface shape detection method provided in the embodiments of the present application, wherein the surface shape region is divided to obtain the plurality of surface shape sub-regions, comprises:

[0160] Based on the aperture of the wavefront phase detection device, the surface area of ​​the device to be detected is divided to obtain the multiple surface sub-areas.

[0161] Specifically, in order to minimize the number of surface sub-regions obtained by division, a wavefront phase detection device for wavefront phase detection is introduced. The aperture of the wavefront phase detection device is used to divide the surface area of ​​the device to be detected, thereby obtaining multiple surface sub-regions.

[0162] The aperture of the wavefront phase detection device refers to the size of the single detection range of the wavefront phase detection device. For example, if the single detection range of the wavefront phase detection device is rectangular, its aperture is the length and width.

[0163] In summary, an embodiment of the present application provides a large-aperture device surface shape detection method based on wavefront phase stitching. The wavefront phase detection method can be used to detect the surface shape of large-aperture devices, and then the displacement measurement error caused by grating manufacturing error can be calibrated. At the same time, a stitching scheme for the wavefront phase detection results of the detection area corresponding to multiple surface shape sub-areas is introduced, which solves the problem that full-width measurement cannot be performed when the aperture of the device to be detected is larger than the aperture of the wavefront phase detection equipment.

[0164] like Figure 12 As shown, based on the above embodiment, the embodiment of the present application further provides a device surface shape detection device, including:

[0165] An acquisition module 121 is configured to acquire detection results of the wavefront phase of a plurality of detection areas of the device to be detected; the plurality of detection areas correspond one-to-one to a plurality of surface sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected;

[0166] a splicing module 122 configured to splice the detection results of the multiple detection areas in a first direction based on the detection results corresponding to each overlapping area, and to splice the splicing results in the first direction in a second direction to obtain a surface shape detection result of the device to be detected;

[0167] The first direction is perpendicular to the second direction.

[0168] On the basis of the above embodiments, in the device surface shape detection apparatus provided in the embodiments of the present application, the splicing module is specifically used for:

[0169] Based on a preset weight curve corresponding to the first direction, performing a weighted summation on the detection results corresponding to each overlapping area in the first direction to obtain a splicing result in the first direction;

[0170] Based on a preset weight curve corresponding to the second direction, weighted summation is performed on the detection results corresponding to the overlapping area of ​​the stitching results in the second direction to obtain the face shape detection result.

[0171] On the basis of the above embodiments, the device surface shape detection apparatus provided in the embodiments of the present application further includes a weight curve determination module, which is used to:

[0172] For any direction of the first direction and the second direction, determine a basic weight curve corresponding to the any direction, and determine a basic sampling point position and a corresponding weight value in the basic weight curve based on a size of each overlapping area in the any direction;

[0173] Determining, based on the position and size of each overlapping area in the any direction, a target sampling point position in each overlapping area in the any direction corresponding to the base sampling point position;

[0174] The weight value corresponding to the basic sampling point position is fitted with the target sampling point position corresponding to the basic sampling point position to obtain a preset weight curve corresponding to any direction.

[0175] On the basis of the above embodiments, the device surface shape detection apparatus provided in the embodiments of the present application further includes an overall de-tilting module for:

[0176] Fitting the surface shape detection result in the first direction and the second direction respectively to obtain a first fitting result corresponding to the first direction and a second fitting result corresponding to the second direction;

[0177] Based on the first fitting result and the second fitting result, the surface shape detection result is corrected in the first direction and the second direction respectively.

[0178] On the basis of the above embodiments, the device surface shape detection apparatus provided in the embodiments of the present application further includes a tilt matching module for:

[0179] For the detection results of each detection area belonging to any overlapping area, fitting is performed in the first direction and the second direction within the overlapping area to obtain a third fitting result corresponding to the first direction and a fourth fitting result corresponding to the second direction;

[0180] Based on the third fitting result and the fourth fitting result, oblique matching is performed on the detection results of two adjacent detection areas to which any overlapping area belongs in the first direction and the second direction respectively.

[0181] On the basis of the above-mentioned embodiment, in the device surface shape detection apparatus provided in the embodiment of the present application, the multiple detection areas are all rectangular areas.

[0182] On the basis of the above embodiments, the device surface shape detection apparatus provided in the embodiments of the present application, wherein the detection results of the wavefront phases of multiple detection areas of the device to be detected are obtained, comprises:

[0183] Acquiring a surface area of ​​the device to be detected;

[0184] The face area is divided to obtain the plurality of face sub-areas.

[0185] On the basis of the above embodiments, in the device surface shape detection apparatus provided in the embodiments of the present application, the dividing the surface shape area to obtain the multiple surface shape sub-areas includes:

[0186] Based on the aperture of the wavefront phase detection device, the surface area of ​​the device to be detected is divided to obtain the multiple surface sub-areas.

[0187] Specifically, the functions of each module in the device surface shape detection device provided in the embodiment of the present application correspond one-to-one to the operating procedures of each step in the above-mentioned method embodiment, and the effects achieved are also consistent. Please refer to the above-mentioned embodiment for details, and no further details will be given in the embodiment of the present application.

[0188] like Figure 13 As shown, based on the above embodiment, the embodiment of the present application further provides a device surface shape detection system, including: a wavefront phase detection device 131, a motion stage 132 and a processor 133, and the wavefront phase detection device 131 is connected to the processor 133;

[0189] The moving platform 132 is used to carry the device to be detected 134 and drive the device to be detected 134 to move;

[0190] The wavefront phase detection device 131 is used to perform wavefront phase detection on the detection areas corresponding to the multiple surface sub-areas of the detection device 134, obtain the detection results of the wavefront phases of the multiple detection areas, and transmit the detection results of the multiple detection areas to the processor 133;

[0191] The processor 133 is configured to execute the device surface shape detection method provided in the above embodiments.

[0192] Specifically, taking the example of a grating interferometer as the wavefront phase detection device 131 and a plane grating as the device to be detected 134, the measurement arms of the grating interferometer's readout head are both incident on the plane grating at the Littrow angle. When the light beam diffracts on the plane grating, not only is the relative displacement between the readout head and the plane grating recorded, but also the diffracted wavefront information caused by the grating manufacturing errors of the plane grating is recorded. The process of using the grating interferometer to detect the wavefront phase of the detection area corresponding to each surface sub-region of the plane grating can be viewed as a process of sampling the full-width wavefront phase of the plane grating, using the readout head's aperture as the window size.

[0193] Therefore, a grating interferometer is used to detect the wavefront phase of the detection area corresponding to each surface sub-area of ​​the plane grating with a reading head measuring arm under the same incident condition, and the detection result is transmitted to the processor 133.

[0194] It can be understood that each surface sub-region of the plane grating is obtained by dividing the surface sub-region based on the aperture of the grating interferometer.

[0195] The processor 133 uses the detection results of the wavefront phase of the detection area corresponding to each surface sub-area of ​​the plane grating, and combines it with the device surface detection method provided in the above embodiments to perform surface detection on the plane grating, and uses the surface detection results to create a two-dimensional table related to the displacement in the x-direction and the y-direction for real-time lookup table compensation of the manufacturing error of the plane grating.

[0196] like Figure 14 As shown, a motion stage 132 can support a plane grating via a stage 135 and drive the plane grating in the x- and y-directions. The motion stage 132's mover is placed on a base 135. The motion stage 132 utilizes a laminated rail design, driven by a linear motor, and a closed-loop position control system for the grating scale. A three-degree-of-freedom turntable 136 can be installed between the motion stage 132 and the stage 135 to enable large-angle rotation, enabling precise diffraction angles and interference fringe fine-tuning.

[0197] The motion stage 132 can be used to sequentially move each surface sub-region of the plane grating directly below the grating interferometer for testing. When testing each surface sub-region, the actual detection range is larger than the range of the surface sub-region. In other words, each detection area has an overlapping area to align the surface sub-regions.

[0198] The device surface shape detection system provided in the embodiment of the present application can move the device to be detected by using a motion table, and can use a wavefront phase detection device to perform wavefront phase detection on the detection areas corresponding to each surface shape sub-area of ​​the device to be detected. The detection results of each detection area can be spliced ​​through a processor, so that the full-width surface shape detection of the device to be detected can be achieved, and then the manufacturing error of the device to be detected can be calibrated.

[0199] Figure 15 An example of a physical structure diagram of an electronic device is shown below. Figure 15 As shown, the electronic device may include: a processor (Processor) 1510, a communication interface (Communications Interface) 1520, a memory (Memory) 1530 and a communication bus 1540, wherein the processor 1510, the communication interface 1520, and the memory 1530 communicate with each other via the communication bus 1540. The processor 1510 may call the logic instructions in the memory 1530 to execute the device surface shape detection method provided in each of the above embodiments, the method comprising: obtaining detection results of the wavefront phase of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to multiple surface shape sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in a first direction, and the spliced ​​results in the first direction are spliced ​​in a second direction to obtain the surface shape detection result of the device to be detected; the first direction is perpendicular to the second direction.

[0200] In addition, the logic instructions in the above-mentioned memory 1530 can be implemented in the form of a software functional unit and can be stored in a computer-readable storage medium when sold or used as an independent product. Based on this understanding, the technical solution of the present application, or the part that contributes to the prior art, or the part of the technical solution, can be embodied in the form of a software product. The computer software product is stored in a storage medium and includes several instructions for enabling a computer device (which can be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the method described in each embodiment of the present application. The aforementioned storage medium includes: various media that can store program codes, such as a USB flash drive, a mobile hard disk, a read-only memory (ROM), a random access memory (RAM), a magnetic disk or an optical disk.

[0201] On the other hand, the present application also provides a computer program product, which includes a computer program, which can be stored on a non-transitory computer-readable storage medium. When the computer program is executed by a processor, the computer can execute the device surface shape detection method provided by the above methods, which includes: obtaining the detection results of the wavefront phase of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to the multiple surface shape sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in the first direction, and the spliced ​​results of the first direction are spliced ​​in the second direction to obtain the surface shape detection results of the device to be detected; the first direction is perpendicular to the second direction.

[0202] On the other hand, the present application also provides a non-transitory computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, is implemented to execute the device surface shape detection method provided by the above-mentioned methods, the method comprising: obtaining the detection results of the wavefront phase of multiple detection areas of the device to be detected; the multiple detection areas correspond one-to-one to the multiple surface shape sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in a first direction, and the spliced ​​results of the first direction are spliced ​​in a second direction to obtain the surface shape detection results of the device to be detected; the first direction is perpendicular to the second direction.

[0203] The device embodiments described above are merely illustrative. The units described as separate components may or may not be physically separate, and the components shown as units may or may not be physical units, i.e., they may be located in one location or distributed across multiple network units. Some or all of the modules may be selected based on actual needs to achieve the objectives of the present embodiment. Persons of ordinary skill in the art will be able to understand and implement the present invention without inventive effort.

[0204] Through the description of the above embodiments, those skilled in the art can clearly understand that each embodiment can be implemented by means of software plus a necessary general hardware platform, or of course, by hardware. Based on this understanding, the essence of the above technical solution or the part that contributes to the existing technology can be embodied in the form of a software product. The computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, a magnetic disk, an optical disk, etc., and includes a number of instructions for enabling a computer device (which can be a personal computer, a server, or a network device, etc.) to execute the methods described in each embodiment or certain parts of the embodiments.

[0205] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A device surface detection method, characterized in that: include: Obtaining detection results of wavefront phases of multiple detection areas of the device to be detected; The multiple detection areas correspond one-to-one to the multiple surface sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; Based on the detection results corresponding to each overlapping area, the detection results of the multiple detection areas are spliced ​​in a first direction, and the spliced ​​results in the first direction are spliced ​​in a second direction to obtain a surface shape detection result of the device to be detected; The first direction is perpendicular to the second direction; The method of splicing the detection results of the plurality of detection areas in a first direction based on the detection results corresponding to each overlapping area, and splicing the splicing results in the first direction in a second direction to obtain the surface shape detection result of the device to be detected includes: Based on a preset weight curve corresponding to the first direction, performing a weighted summation on the detection results corresponding to each overlapping area in the first direction to obtain a splicing result in the first direction; Based on a preset weight curve corresponding to the second direction, weighted summation is performed on the detection results corresponding to the overlapping area of ​​the stitching results in the second direction to obtain the face shape detection result.

2. The device surface shape detection method according to claim 1, characterized in that: The preset weight curve corresponding to the first direction and / or the preset weight curve corresponding to the second direction are determined based on the following steps: For any direction of the first direction and the second direction, determine a basic weight curve corresponding to the any direction, and determine a basic sampling point position and a corresponding weight value in the basic weight curve based on a size of each overlapping area in the any direction; Determining, based on the position and size of each overlapping area in the any direction, a target sampling point position in each overlapping area in the any direction corresponding to the base sampling point position; The weight value corresponding to the basic sampling point position is fitted with the target sampling point position corresponding to the basic sampling point position to obtain a preset weight curve corresponding to any direction.

3. The device surface shape detection method according to claim 1, characterized in that: The stitching results of the first direction are stitched together in a second direction to obtain a surface shape detection result of the device to be detected, and then the method includes: Fitting the surface shape detection result in the first direction and the second direction respectively to obtain a first fitting result corresponding to the first direction and a second fitting result corresponding to the second direction; Based on the first fitting result and the second fitting result, the surface shape detection result is corrected in the first direction and the second direction respectively.

4. The device surface shape detection method according to claim 1, characterized in that: The stitching of the detection results of the plurality of detection areas in the first direction includes: For the detection results of each detection area belonging to any overlapping area, fitting is performed in the first direction and the second direction within the overlapping area to obtain a third fitting result corresponding to the first direction and a fourth fitting result corresponding to the second direction; Based on the third fitting result and the fourth fitting result, oblique matching is performed on the detection results of two adjacent detection areas to which any overlapping area belongs in the first direction and the second direction respectively.

5. The device surface shape detection method according to any one of claims 1 to 4, characterized in that: The multiple detection areas are all rectangular areas.

6. The device surface shape detection method according to any one of claims 1 to 4, characterized in that: The step of obtaining the detection results of the wavefront phases of the multiple detection areas of the device to be detected includes: Acquiring a surface area of ​​the device to be detected; The face area is divided to obtain the plurality of face sub-areas.

7. The device surface shape detection method according to claim 6, characterized in that: The dividing the face area to obtain the plurality of face sub-areas includes: Based on the aperture of the wavefront phase detection device, the surface area of ​​the device to be detected is divided to obtain the multiple surface sub-areas.

8. A device for detecting surface shape of a device, characterized in that: include: an acquisition module, configured to acquire detection results of the wavefront phase of a plurality of detection areas of the device to be detected; the plurality of detection areas correspond one-to-one to the plurality of surface sub-areas of the device to be detected, and there is an overlapping area between any two adjacent detection areas of the device to be detected; a splicing module, configured to splice the detection results of the multiple detection areas in a first direction based on the detection results corresponding to each overlapping area, and to splice the splicing results in the first direction in a second direction to obtain a surface shape detection result of the device to be detected; The first direction is perpendicular to the second direction; The splicing module is specifically used for: Based on a preset weight curve corresponding to the first direction, performing a weighted summation on the detection results corresponding to each overlapping area in the first direction to obtain a splicing result in the first direction; Based on a preset weight curve corresponding to the second direction, weighted summation is performed on the detection results corresponding to the overlapping area of ​​the stitching results in the second direction to obtain the face shape detection result.

9. A device surface detection system, characterized in that: include: A wavefront phase detection device, a motion stage, and a processor, wherein the wavefront phase detection device is connected to the processor; The moving platform is used to carry the device to be detected and drive the device to be detected to move; The wavefront phase detection device is used to perform wavefront phase detection on the detection areas corresponding to the multiple surface sub-areas of the device to be detected, obtain detection results of the wavefront phases of the multiple detection areas, and transmit the detection results of the multiple detection areas to the processor; The processor is configured to execute the device surface shape detection method according to any one of claims 1 to 7.

10. An electronic device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein: When the processor executes the program, the device surface shape detection method according to any one of claims 1 to 7 is implemented.

11. A non-transitory computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the device surface shape detection method according to any one of claims 1 to 7 is implemented.

12. A computer program product comprising a computer program, characterized in that When the computer program is executed by a processor, the device surface shape detection method according to any one of claims 1 to 7 is implemented.

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