An electrochromic device

Abstract

The application provides an electrochromic device, belonging to the field of electrochromic devices. The electrochromic device comprises a first conductive substrate, an electrochromic layer and a second conductive substrate which are sequentially stacked; a first gap region and a second gap region are communicated to form a first partition region; the first partition region is peripherally arranged in the first groove to form a first blocking structure between the first groove and the first partition region; a third gap region and the second gap region are communicated to form a second partition region; the second partition region is peripherally arranged in the second groove to form a second blocking structure between the second groove and the second partition region. The electrochromic device provided by the application avoids the short circuit phenomenon caused by the contact between the first conductive substrate and the second conductive substrate through the first partition region and the second partition region, thereby improving the safety and stability of the electrochromic device.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of electrochromic, in particular to an electrochromic device. BACKGROUND

[0002] Electrochromism refers to a phenomenon that the optical properties (reflectivity, transmittance, absorptivity, etc.) of a material change stably and reversibly under the action of an applied electric field, which is manifested as reversible changes in color and transparency in appearance.

[0003] The existing electrochromic device is prone to bending or deforming under the action of external force, which can easily cause the conductive layers on both sides to contact each other and result in short circuit. SUMMARY

[0004] Therefore, the present application aims to overcome the deficiencies in the prior art and provide an electrochromic device.

[0005] The present application provides the following technical solution: an electrochromic device, comprising a first conductive substrate, an electrochromic layer and a second conductive substrate which are stacked in sequence; the edge of the first conductive substrate is provided with a first accommodating groove, the edge of the second conductive substrate is provided with a second accommodating groove, and the edge of the electrochromic layer is provided with two or more third accommodating grooves; the normal projection of the first accommodating groove on the plane where the electrochromic layer is located overlaps at least one third accommodating groove, and the first accommodating groove and the third accommodating groove are in communication to form a first groove; the edge of the first conductive substrate is provided with a first gap region, the edge of the electrochromic layer is provided with two or more second gap regions, and the first gap region and at least one second gap region are in communication to form a first partition region; the first partition region is circumferentially arranged around the first groove to form a first barrier structure between the first groove and the first partition region; the normal projection of the second accommodating groove on the plane where the electrochromic layer is located overlaps at least one third accommodating groove, and the second accommodating groove and the third accommodating groove are in communication to form a second groove; the edge of the second conductive substrate is provided with a third gap region, and the third gap region and at least one second gap region are in communication to form a second partition region; the second partition region is circumferentially arranged around the second groove to form a second barrier structure between the second groove and the second partition region.

[0006] In the present application, the first barrier structure and the second barrier structure are arranged to form a barrier support structure around the first groove and the second groove. On the one hand, the barrier structure can support the conductive substrate and the electrochromic layer on the side away from the first groove and the second groove, preventing the conductive substrate on both sides from being bent to form an electrical contact. On the other hand, the barrier structure can also form an insulating island structure. Even if it is bent to form a contact with the conductive substrate in the area surrounded by the first groove or the second groove (projection), it is still separated from the conductive substrate on the other side by the partition area, so it will not form a short circuit between the conductive substrates on both sides. Therefore, the use reliability and stability of the electrochromic device are improved.

[0007] Further, the first accommodating groove and the second accommodating groove are respectively a plurality of, to form a plurality of the first grooves and a plurality of the second grooves respectively, and the first grooves and the second grooves are staggered. Preferably, the orthogonal projection of any one of the first grooves between the second conductive substrate has a gap between the second grooves. Thus, by arranging a plurality of accommodating grooves, a plurality of grooves can be formed, and a plurality of grooves can correspond to the layout of the bus bar in the form of multiple electrodes, thereby improving the color changing efficiency of the electrochromic device. Further, the projection of the grooves in the same plane has a gap, which can improve the convenience of the bus bar layout. Usually, the gap is the overlapping area of the first conductive substrate, the electrochromic layer and the second conductive substrate. Therefore, the gap can prevent the bus bars arranged on both sides from forming an electrical contact and other situations.

[0008] Preferably, the first gap region and the third gap region are respectively a plurality of, to form a plurality of the first partition regions and a plurality of the second partition regions. More preferably, the first barrier structure and the second barrier structure are respectively a plurality of. Thus, the partition region can be arranged around the groove, and the barrier structure can be formed around the groove. The support and barrier effect of the barrier structure around the groove can further prevent short circuit and improve the use reliability and stability of the electrochromic device.

[0009] Further, a ratio of a width of the first barrier structure in the first direction to a width of the first barrier structure in the second direction is X1, and 0X1≤1; a ratio of a width of the second barrier structure in the first direction to a width of the second barrier structure in the second direction is X2, and 0X2≤1. Wherein, the width in the first direction is the minimum width of the first barrier structure or the second barrier structure in the first direction. Preferably, at least one of the first barrier structure and the second barrier structure has a width in the first direction of 1 mm or more. More preferably, at least one of the first barrier structure and the second barrier structure has a width in the first direction of 2 mm or more. Further preferably, X1=X2. In this case, the short circuit prevention effect of the barrier structure can be improved, and when the width of the barrier structure in the first direction is 1 mm or 2 mm or more, the width of the barrier structure in the second direction is at least not less than 1 mm or 2 mm, thereby further ensuring that the barrier structure has more effective insulation and support effects, and further improving the stability and reliability of the electrochromic device; in addition, by limiting the values of X1 and X2, the width of the barrier structure in the visual area direction is less than the width in the non-visual area direction, which can further improve the barrier effect, especially in the non-visual area direction.

[0010] Further, the first direction is the width direction of the non-visual area and perpendicular to the visual area, and the second direction is perpendicular to the first direction and parallel to the visual area. Thus, by vertically arranging the first direction and the second direction, the first barrier structure and the second barrier structure can be arranged in the first direction and the second direction respectively, thereby more effectively improving the short circuit prevention effect of the electrochromic device.

[0011] Further, the first barrier structure has a gap with the second barrier structure in the orthogonal projection of the second conductive substrate. Preferably, the first barrier structure partially overlaps the second barrier structure in the orthogonal projection of the second conductive substrate, forming an overlapping area. Thus, by arranging the gap, the barrier structure can be more conveniently arranged; further, the overlapping area between the barrier structures (projection) can form an overlap between the two island insulation structures, i.e. the overlapping area cannot form a conductive connection, thereby cutting off the front surface electrical contact between the first conductive substrate and the second conductive substrate (i.e. the side of the first conductive substrate facing the electrochromic layer forms an electrical contact with the side of the second conductive substrate facing the electrochromic layer), to more effectively prevent short circuit.

[0012] Further, a ratio of the width of the overlap region in the first direction to the width of the first barrier structure in the first direction is Y1, and 0Y1≤1; and a ratio of the width of the overlap region in the first direction to the width of the second barrier structure in the first direction is Y2, and 0Y2≤1. The overlap region is an overlap region formed by the first barrier structure and the second barrier structure in the second direction, and the width of the first barrier structure or the second barrier structure in the first direction is the maximum width of the first barrier structure or the second barrier structure in the first direction. Preferably, the widths of the first barrier structure and the second barrier structure in the first direction are different, i.e., Y1≠Y2. More preferably, the difference between the widths of the first barrier structure and the second barrier structure in the first direction is not less than 1 mm. Still more preferably, the difference between the widths of the first barrier structure and the second barrier structure in the first direction is not less than 2 mm. In this case, the first barrier structure and the second barrier structure can not completely overlap in the first direction, i.e., the width of one of the barrier structures in the first direction is less than the other, so that the edge region formed by one of the barrier structures is blocked or supported by the other, avoiding the formation of a new short-circuit risk region, thereby further ensuring that the barrier structure has a more effective insulation and support effect, and further improving the use stability and reliability of the electrochromic device.

[0013] Further, a ratio of the width of the overlap region in the second direction to the width of the first barrier structure in the second direction is Z1, and 0Z1<1; and / or a ratio of the width of the overlap region in the second direction to the width of the second barrier structure in the second direction is Z2, and 0Z2<1. Further, the difference between the width of the first barrier structure in the second direction and the width of the overlap region in the second direction is not less than 1 mm; and / or the difference between the width of the second barrier structure in the second direction and the width of the overlap region in the second direction is not less than 1 mm. Preferably, the difference between the width of the first barrier structure in the second direction and the width of the overlap region in the second direction is not less than 2 mm; and / or the difference between the width of the second barrier structure in the second direction and the width of the overlap region in the second direction is not less than 2 mm. In this case, the first barrier structure and the second barrier structure can not completely overlap in the second direction, and further, the distance between the side of the barrier structure close to the groove and the overlap region can be 1 mm or more or 2 mm or more, i.e., the edge of the barrier structure remains 1 mm or 2 mm or more in width, which can ensure that the edge does not fall off while ensuring sufficient insulation and support effect, thereby improving the use stability and reliability of the electrochromic device.

[0014] Further, the first partition region and the second partition region are filled with insulating glue. In this way, by arranging the insulating glue, on the one hand, the conductive substrate and the electrochromic layer can be laterally supported, and on the other hand, the partition region can be further ensured to form an island insulating region, thereby further preventing the electrical contact between the side surface of the conductive substrate and the front surface of the other conductive substrate, and further improving the short circuit prevention effect.

[0015] The embodiments of the present application have the following advantages: by arranging the first barrier structure and the second barrier structure to form a barrier between the first conductive substrate and the second conductive substrate, the first conductive substrate is prevented from contacting the second conductive substrate when the electrochromic device is bent, so as to avoid the short circuit phenomenon, thereby improving the safety and stability of the electrochromic device.

[0016] In order to make the above objectives, characteristics and advantages of the present application more apparent and easy to understand, the following preferred embodiments are specifically described below, and the accompanying drawings are referred to for detailed description. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be considered as a limitation to the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0018] Figure 1 shows a structure diagram of a perspective view of an electrochromic device provided by some embodiments of the present application Figure 1 ;

[0019] Figure 2 shows a sectional view of the A-A part in Figure 1 ;

[0020] Figure 3 shows an enlarged view of the B part in Figure 1 ;

[0021] Figure 4 shows an enlarged view of the C part in Figure 2 ;

[0022] Figure 5 shows a structure diagram of a perspective view of an electrochromic device provided by some embodiments of the present application Figure 2 ;

[0023] Figure 6 shows an enlarged view of the D part in Figure 5 ;

[0024] Figure 7A structural diagram of a view angle of an electrochromic device provided by some embodiments of the present application is shown Figure 3 ;

[0025] Figure 8 An enlarged view of part E in Figure 7 is shown

[0026] Figure 9 A structural diagram of a view angle of an electrochromic device provided by some embodiments of the present application is shown Figure 4 ;

[0027] Figure 10 An enlarged view of part F in Figure 9 is shown

[0028] Figure 11 A structural diagram of a view angle of an electrochromic device provided by some embodiments of the present application is shown Figure 5 ;

[0029] Figure 12 An enlarged view of part G in Figure 11 is shown.

[0030] Main element symbol explanation:

[0031] 100 - electrochromic device; 110 - first conductive substrate; 111 - first conductive layer; 112 - first substrate layer; 120 - electrochromic layer; 121 - ion storage layer; 122 - electrochromic material layer; 123 - electrolyte layer; 130 - second conductive substrate; 131 - second conductive layer; 132 - second substrate layer; 140 - first recess; 150 - second recess; 160 - first barrier structure; 170 - second barrier structure; 180 - first partition region; 190 - second partition region; 200 - overlapping region. DETAILED DESCRIPTION

[0032] Embodiments of the present application are described in detail below with reference to the attached drawing figures, wherein the same or like reference numerals are used throughout the figures to refer to the same or like elements or elements with the same or similar functionality. The embodiments described below are merely exemplary for the purposes of explanation and are not intended to limit the application.

[0033] It is noted that when an element is referred to as being "on" another element, it can be directly on the other element or intervening elements can also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements can also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical", "horizontal", "left", "right", and the like as used herein are used for explanation purposes only.

[0034] In this application, unless otherwise clearly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integrated; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through intermediate medium, or internal communication of two elements or interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.

[0035] In addition, the terms "first", "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined as "first", "second" can explicitly or implicitly include one or more features. In the description of the application, the meaning of "multiple" is two or more, unless otherwise clearly specified and limited.

[0036] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as understood by those skilled in the art to which the application belongs. The terms used in the description of the template herein are only for the purpose of describing the specific embodiments and are not intended to limit the application. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0037] As shown in Figure 1 , Figure 2 and Figure 4 Some embodiments of the application provide an electrochromic device 100 mainly applied in the field of electrochromic. The electrochromic device 100 comprises a first conductive substrate 110, an electrochromic layer 120 and a second conductive substrate 130 which are stacked in sequence. Among them, the first conductive substrate 110 and the second conductive substrate 130 completely cover the electrochromic layer 120 respectively.

[0038] The first conductive substrate 110 is provided with a first accommodating groove at the edge, the second conductive substrate 130 is provided with a second accommodating groove at the edge, and the electrochromic layer 120 is provided with two or more third accommodating grooves at the edge. It should be noted that the number of first accommodating grooves, second accommodating grooves and third accommodating grooves can be two or more than two arbitrary values, which can be set according to actual conditions.

[0039] The first accommodating groove is overlapped with at least one third accommodating groove in the orthogonal projection of the plane where the electrochromic layer 120 is located, and one first accommodating groove and one third accommodating groove are communicated to form a first recess 140.

[0040] Meanwhile, the first gap region is arranged at the edge of the first conductive substrate 110, and the edge of the electrochromic layer 120 is provided with two or more second gap regions, the first gap region and at least one of the second gap regions form a first partition region 180, and the first partition region 180 is arranged around the circumference of the first accommodating groove 140 to form a first blocking structure 160 between the first accommodating groove 140 and the first partition region 180.

[0041] It should be noted that the first gap region is formed by etching or laser cutting at the edge of the first conductive substrate 110. It can be understood that the first gap region is arranged around the circumference of the first accommodating groove and forms a first blocking part between the first gap region and the first accommodating groove. Meanwhile, the second gap region is arranged around the circumference of the first accommodating groove and forms a second blocking part between the second gap region and the third accommodating groove, and the first blocking part and the second blocking part are the first blocking structure 160. In order to avoid the short circuit caused by the contact between the first conductive substrate 110 and the side of the second conductive substrate 130 close to the electrochromic layer 120 when the electrochromic device is bent, or the short circuit caused by the contact between the side of the electrochromic layer 120 away from the second conductive substrate 130 and the side of the second conductive substrate 130 close to the electrochromic layer 120, thereby improving the stability of the electrochromic device.

[0042] In addition, the second accommodating groove overlaps at least one third accommodating groove in the orthographic projection of the plane where the electrochromic layer 120 is located, and one second accommodating groove and one third accommodating groove form a second groove 150.

[0043] Specifically, the first groove 140 and the second groove 150 partially overlap or are spaced apart in the orthographic projection of the plane where the electrochromic layer 120 is located, that is, the first groove 140 and the second groove 150 form a staggered groove structure at the edge of the electrochromic layer 120.

[0044] Meanwhile, the third gap region is arranged at the edge of the second conductive substrate 130, and the third gap region and the second gap region form a second partition region 190, and the second partition region 190 is arranged around the circumference of the second groove 150 to form a second blocking structure 170 between the second groove 150 and the second partition region 190.

[0045] It should be noted that the third gap region is formed by etching or laser cutting at the edge of the second conductive substrate 130. It can be understood that the third gap region is spaced around the circumference of the second accommodating groove, and a third barrier is formed between the third gap region and the second accommodating groove. At the same time, the second barrier and the third barrier are the second barrier structure 170. In order to prevent the electrochromic device from being bent, the second conductive substrate 130 and the first conductive substrate 110 on the side close to the electrochromic layer 120 are in contact and short-circuit, or the electrochromic layer 120 on the side away from the first conductive substrate 110 is in contact with the side of the first conductive substrate 110 close to the electrochromic layer 120, thereby improving the stability of the electrochromic device.

[0046] It can be understood that the material of the second barrier structure 170 includes the material of the second conductive substrate 130 and the material of the electrochromic layer 120.

[0047] In some embodiments of the present application, the first accommodating groove and the second accommodating groove are respectively a plurality of. It can be understood that the number of the first accommodating grooves and the number of the second accommodating grooves can be two or more than two arbitrary values, which can be set according to actual conditions. To form a plurality of first grooves and a plurality of second grooves, and the first grooves and the second grooves are staggered. Specifically, the orthogonal projection of any first groove 140 on the plane where the second conductive substrate 130 is located has a gap with each second groove 150. So that the connection terminal of the external power supply can pass through the second groove and be connected with the first conductive substrate, and the connection terminal of the external power supply can also pass through the first groove and be connected with the second conductive substrate. The connection terminal of the external power supply connected to the first conductive substrate and the second conductive substrate respectively is staggered, which improves the safety and stability of the connection between the first conductive substrate, the second conductive substrate and the external power supply, and avoids short circuit.

[0048] Among them, a plurality of first accommodating grooves are arranged at intervals at the edge of the first conductive substrate 110. Specifically, a plurality of first accommodating grooves are arranged at intervals on each side of the edge of the first conductive substrate 110.

[0049] A plurality of second accommodating grooves are arranged at intervals at the edge of the second conductive substrate 130. Specifically, a plurality of second accommodating grooves are arranged at intervals on each side of the edge of the second conductive substrate 130. It should be noted that the orthogonal projection of any second accommodating groove on the plane where the first conductive substrate 110 is located has a gap with any first accommodating groove.

[0050] In addition, a plurality of third accommodating grooves are arranged at intervals at the edge of the electrochromic layer 120. Specifically, a plurality of third accommodating grooves are arranged at intervals on each side of the edge of the electrochromic layer 120.

[0051] It can be understood that, in some embodiments of the present application, the number of the first accommodation grooves and the number of the second accommodation grooves are equal to the number of the third accommodation grooves. The first gap region and the third gap region can respectively match the number of the first accommodation grooves and the second accommodation grooves, i.e., can be multiple, to form multiple first partition regions and multiple second partition regions, thereby forming multiple first barrier structures and multiple second barrier structures.

[0052] It should be noted that, as shown in Figure 1 , the first direction is perpendicular to the second direction; wherein the first direction refers to a direction along the width direction of the non-visible region and perpendicular to the visible region, and in a two-dimensional plane, the first direction may, for example, be a direction perpendicular to any one side of the edge of the electrochromic device 100; the second direction refers to a direction perpendicular to the first direction, i.e., a direction parallel to the visible region, and in a two-dimensional plane, the second direction may, for example, be a direction parallel to any one side of the edge of the electrochromic device 100. Specifically, with respect to the upper and lower sides of the edge of the electrochromic device 100 (the upper and lower sides are parallel to each other), the first direction is a direction perpendicular to the upper and lower sides, and the second direction is a direction parallel to the upper and lower sides; with respect to the left and right sides of the edge of the electrochromic device 100 (the left and right sides are parallel to each other), the first direction is a direction perpendicular to the left and right sides, and the second direction is a direction parallel to the left and right sides.

[0053] As can be seen from the above, in some examples, when the upper and lower sides of the edge of the electrochromic device 100 are perpendicular to the left and right sides thereof, the first direction and the second direction located at different sides can be in a perpendicular relationship, respectively, i.e., the first direction located at the upper and lower sides of the edge of the electrochromic device 100 can be perpendicular to the first direction located at the left and right sides of the edge of the electrochromic device 100; the second direction located at the upper and lower sides of the edge of the electrochromic device 100 can be perpendicular to the second direction located at the left and right sides of the edge of the electrochromic device 100.

[0054] As shown in Figure 3 , Figure 5 , Figure 6 , Figure 8 , Figure 10 and Figure 12 , in some embodiments of the present application, the ratio of the width of the first barrier structure 160 in the first direction to the width of the first barrier structure 160 in the second direction is X1, and 0 < X1 ≤ 1. It can be understood that X1 can be any value between 0 and 1, which can be specifically set according to actual conditions.

[0055] For example, when the width of the first barrier structure 160 in the first direction is 1 mm, and the width of the first barrier structure 160 in the second direction is 2 mm, X1 is 0.5.

[0056] When the width of the first barrier structure 160 in the first direction is 2mm and the width of the first barrier structure 160 in the second direction is 2mm, X1 is 1.

[0057] When the width of the first barrier structure 160 in the first direction is 1mm and the width of the first barrier structure 160 in the second direction is 10mm, X1 is 0.1.

[0058] When the width of the first barrier structure 160 in the first direction is 2mm and the width of the first barrier structure 160 in the second direction is 10mm, X1 is 0.2.

[0059] It should be noted that the ratio of the width of the first barrier structure 160 in the first direction to the width of the first barrier structure 160 in the second direction can be any one of 0.01, 0.02, 0.04, 0.08, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 and 1, which can be set according to actual conditions.

[0060] The width of the first barrier structure 160 in the first direction refers to the vertical distance from the side of the first barrier structure 160 away from the electrochromic layer 120 to the side of the first barrier structure 160 close to the electrochromic layer 120 in the first direction and between the first groove and the first partition area. Here, when defining the value of X, the width in the first direction refers to the minimum width of the first barrier structure 160 in the first direction, i.e., the vertical distance between the side of the first barrier structure 160 close to the first groove and the side of the first barrier structure 160 close to the viewing area in the first direction.

[0061] The width of the first barrier structure 160 in the second direction refers to the vertical distance from the side of the first barrier structure 160 away from the first groove 140 to the side of the first barrier structure 160 facing the first groove 140 in the second direction and between the first groove and the first partition area.

[0062] In addition, the width of the second barrier structure 170 in the first direction refers to the vertical distance from the side of the second barrier structure 170 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120 in the first direction and between the second groove and the second partition area. Here, when defining the value of X, the width in the first direction refers to the minimum width of the second barrier structure 170 in the first direction, i.e., the vertical distance between the side of the second barrier structure 170 close to the second groove and the side of the second barrier structure 170 close to the viewing area in the first direction.

[0063] The width of the second barrier structure 170 in the second direction refers to the vertical distance in the second direction from the side of the second barrier structure 170 away from the second groove 150 to the side of the second barrier structure 170 facing the second groove 150.

[0064] Furthermore, the ratio of the width of the second barrier structure 170 in the first direction to the width of the second barrier structure 170 in the second direction is X2, and 0 < X2 ≤ 1. It can be understood that X2 can be any value between 0 and 1, and can be specifically set according to the actual situation.

[0065] For example, when the width of the first barrier structure 160 in the first direction is 2mm and the width of the first barrier structure 160 in the second direction is 2mm, X2 is 1.

[0066] When the width of the first barrier structure 160 in the first direction is 1 mm and the width of the first barrier structure 160 in the second direction is 10 mm, X2 is 0.1.

[0067] It should be noted that the ratio of the width of the second barrier structure 170 in the first direction to the width of the second barrier structure 170 in the second direction can be any one of 0.01, 0.02, 0.04, 0.08, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 and 1, and can be specifically set according to the actual situation.

[0068] like Figure 1 and Figure 3 As shown, in some embodiments of this application, when the width of the first barrier structure 160 in the first direction is 1 mm and the width of the first barrier structure 160 in the second direction is 2 mm, that is, X1 is 0.5, and the width of the second barrier structure 170 in the first direction is 1 mm and the width of the second barrier structure 170 in the second direction is 10 mm, that is, X2 is 0.5.

[0069] When the width of the first barrier structure 160 in the first direction is 1mm, the width of the first barrier structure 160 in the second direction is 10mm, that is, X1 is 0.1. Similarly, when the width of the second barrier structure 170 in the first direction is 1mm, the width of the second barrier structure 170 in the second direction is 10mm, that is, X2 is 0.1.

[0070] It should be noted that by increasing the width of the first barrier structure and the second barrier structure in the second direction, i.e. increasing the contact area between the first barrier structure and the second conductive substrate and increasing the contact area between the second barrier structure and the first conductive substrate, the stability of the first barrier structure on the second conductive substrate is improved, and the stability of the second barrier structure on the first conductive substrate is improved, avoiding the first barrier structure and / or the second barrier structure from falling off, preventing the first conductive substrate from contacting the second conductive substrate to form a short circuit, thereby improving the use reliability and stability of the electrochromic device.

[0071] In addition, when the width of the first barrier structure 160 in the first direction is 2 mm, and the width of the first barrier structure 160 in the second direction is 10 mm, i.e. X1 is 0.2. When the width of the second barrier structure 170 in the first direction is 2 mm, the width of the second barrier structure 170 in the second direction is 10 mm, i.e. X2 is 0.2.

[0072] When the width of the first barrier structure 160 in the first direction is 4 mm, and the width of the first barrier structure 160 in the second direction is 20 mm, X1 is still 0.2. When the width of the second barrier structure 170 in the first direction is 4 mm, the width of the second barrier structure 170 in the second direction is 20 mm, i.e. X2 is still 0.2.

[0073] It should be noted that in some embodiments of the present application, by reducing the width of the first barrier structure in the first direction, the effective color-changing area of the electrochromic layer is increased, thereby increasing the area of the visible region of the electrochromic device. At the same time, the width of the first barrier structure in the second direction is increased to increase the contact area between the first barrier structure and the second conductive substrate, thereby improving the stability of the first barrier structure on the second conductive substrate.

[0074] At the same time, the edge side of the first conductive substrate 110 is prevented from contacting the second conductive substrate 130, or / and the edge side of the second conductive substrate 130 is prevented from contacting the first conductive substrate 110, or / and the edge side of the first conductive substrate 110 and the edge side of the second conductive substrate 130 are prevented from contacting, thereby preventing the occurrence of a short circuit, thereby improving the use stability and reliability of the electrochromic device.

[0075] In addition, in some embodiments of the present application, the first barrier structure 160 has a gap with the second barrier structure 170 in the orthogonal projection on the plane where the second conductive substrate 130 is located. It can be understood that the first barrier structure 160 and the second barrier structure 170 form staggered barrier structures at the edge of the electrochromic device to prevent a short circuit between the first conductive substrate 110 and the second conductive substrate 130.

[0076] AsFigures 7 to 12 As shown, in some embodiments of the present application, in order to improve the stability of the electrochromic device and avoid short circuit phenomenon, the first blocking structure 160 has a partial overlap with the second blocking structure 170 in the orthogonal projection of the plane where the second conductive substrate 130 is located, forming an overlapping area 200.

[0077] It should be noted that the orthogonal projection of the overlapping area 200 in the plane where the electrochromic layer 120 is located is located between the orthogonal projection of the first groove 140 and the orthogonal projection of the second groove 150 in the plane where the electrochromic layer 120 is located, and the overlapping area 200 has a gap with the first groove 140 and the second groove 150 respectively, so that the connection terminals of the external power supply connected to the first conductive substrate and the second conductive substrate are misaligned, improving the safety and stability of the connection of the first conductive substrate and the second conductive substrate to the external power supply.

[0078] Wherein, the ratio of the width of the overlapping area 200 in the first direction to the width of the first blocking structure 160 in the first direction is Y1, and 0 < Y1 ≤ 1. It can be understood that Y1 can be any value between 0 and 1, which can be specifically set according to actual conditions. It can be understood that the ratio can be any one of 0.01, 0.02, 0.04, 0.08, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 and 1, which can be specifically set according to actual conditions.

[0079] In addition, the ratio of the width of the overlapping area 200 in the first direction to the width of the second blocking structure 170 in the first direction is Y2, and 0 < Y2 ≤ 1. It can be understood that Y2 can be any value between 0 and 1, which can be specifically set according to actual conditions. It can be understood that the ratio can be any one of 0.01, 0.02, 0.04, 0.08, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 and 1, which can be specifically set according to actual conditions.

[0080] Specifically, the shape of the overlapping area 200 can be any one of a rectangle, a square, a triangle, a circular arc or a special shape, which can be specifically set according to actual conditions.

[0081] It should be noted that the overlapping area 200 is an overlapping area formed by the first blocking structure 160 and the second blocking structure 170 in the second direction, and the width of the first blocking structure 160 or the second blocking structure 170 in the first direction is the maximum width of the first blocking structure 160 or the second blocking structure 170 in the first direction, that is, the vertical distance between the side of the first blocking structure 160 or the second blocking structure 170 close to the edge of the electrochromic device 100 and the side close to the viewing area along the first direction.

[0082] In some examples, the first barrier structure 160 and the second barrier structure 170 can have different widths in the first direction, i.e., Y1≠Y2. In other examples, the difference between the widths of the first barrier structure 160 and the second barrier structure 170 in the first direction can be no less than 1 mm or no less than 2 mm.

[0083] Specifically, the vertical distance from the side of the overlap region 200 away from the electrochromic layer 120 to the side of the first barrier structure 160 close to the electrochromic layer 120 is greater than the vertical distance from the side of the overlap region 200 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120. Or the vertical distance from the side of the overlap region 200 away from the electrochromic layer 120 to the side of the first barrier structure 160 close to the electrochromic layer 120 is less than the vertical distance from the side of the overlap region 200 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120. Or the vertical distance from the side of the overlap region 200 away from the electrochromic layer 120 to the side of the first barrier structure 160 close to the electrochromic layer 120 is equal to the vertical distance from the side of the overlap region 200 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120, which can be set according to actual conditions.

[0084] By adjusting the widths of the overlap region 200 in the first direction and the second direction, the color-changing region of the electrochromic device 100 is increased, while avoiding the edge side of the first conductive substrate 110 from contacting the second conductive substrate 130 and / or avoiding the edge side of the second conductive substrate 130 from contacting the first conductive substrate 110, so as to improve the stability of the electrochromic device.

[0085] As shown in FIGS. 1A and 1B, the electrochromic device 100 includes a first conductive substrate 110, a second conductive substrate 130, an electrochromic layer 120, a first barrier structure 160, and a second barrier structure 170. Figure 7 and Figure 8 As shown in FIGS. 1A and 1B, the electrochromic device 100 includes a first conductive substrate 110, a second conductive substrate 130, an electrochromic layer 120, a first barrier structure 160, and a second barrier structure 170.

[0086] It can be understood that, in the first direction, the width of the overlapping area 200 is equal to the vertical distance from the side of the overlapping area 200 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120.

[0087] Or the vertical distance from the side of the overlapping area 200 away from the electrochromic layer 120 to the side of the first barrier structure 160 close to the electrochromic layer 120 is less than the vertical distance from the side of the overlapping area 200 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120. At this time, Y1 is less than Y2, and Y1 is equal to 1, which can be specifically set according to actual conditions.

[0088] As shown in Figure 9 and Figure 10 In some embodiments of the present application, the vertical distance from the side of the overlapping area 200 away from the electrochromic layer 120 to the side of the first barrier structure 160 close to the electrochromic layer 120 is equal to the vertical distance from the side of the overlapping area 200 away from the electrochromic layer 120 to the side of the second barrier structure 170 close to the electrochromic layer 120.

[0089] Wherein, the side of the first barrier structure 160 in the second direction is orthogonally projected on the plane where the electrochromic layer 120 is located as an "L" shape, and partially overlaps with the side of the second barrier structure 170 in the second direction. In addition, the side of the second barrier structure 170 in the second direction is orthogonally projected on the plane where the electrochromic layer 120 is located as an "L" shape, and partially overlaps with the side of the first barrier structure 160 in the second direction, and the side of the first barrier structure 160 in the second direction has a gap with the side of the second barrier structure 170 in the second direction. In the case of ensuring the width of the overlapping area 200 in the second direction, the width of the overlapping area 200 in the first direction is reduced, not only avoiding the short circuit of the side of the first conductive substrate 110 and the side of the second conductive substrate 130, but also increasing the color changing area of the electrochromic layer 120, thereby improving the color changing area of the electrochromic device.

[0090] As shown in Figure 11 and Figure 12 In some embodiments of the present application, in order to simplify the cutting process of the electrochromic device and make the cutting patterns on both sides more symmetrical, the overlapping area 200 formed by the orthographic projection of the first barrier structure 160 and the second barrier structure 170 on the plane where the electrochromic layer 120 is located is an isosceles triangle structure or an equilateral triangle structure, improving the appearance after cutting and improving the beauty of the electrochromic device in the color changing process.

[0091] It can be understood that, at this time, Y1 is equal to Y2, and Y1 and Y2 are both less than 1.

[0092] It should be noted that, in some embodiments of the present application, in order to improve the stability of the electrochromic device, the edges of the first barrier structure 160 and the edges of the second barrier structure 170 are both set as rounded corner structures to avoid discharge at the sharp corners, thereby improving the stability of the electrochromic device.

[0093] In addition, in order to avoid the bus bars connected to the first conductive substrate and the second conductive substrate, respectively, when cutting or etching in the second direction, in some embodiments of the present application, the width of the overlapping area in the first direction is not less than the width of the bus bar. It should be noted that the width of the bus bar referred to here is the width of the area in the first direction in which the orthogonal projection of the bus bar on the plane of the electrochromic layer overlaps the electrochromic layer, thereby improving the stability during etching or cutting of the first conductive substrate and the second conductive substrate, and thereby improving the quality of the electrochromic device.

[0094] In some embodiments of the present application, the ratio of the width of the overlapping area 200 in the second direction to the width of the first barrier structure 160 in the second direction is Z1, and 0 < Z1 < 1. It can be understood that Z1 can be any value between 0 and 1, which can be set according to actual conditions. Specifically, the ratio can be any one of 0.01, 0.02, 0.04, 0.08, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 and 1.

[0095] And / or the ratio of the width of the overlapping area 200 in the second direction to the width of the second barrier structure 170 in the second direction is Z2, and 0 < Z2 < 1. It can be understood that Z2 can be any value between 0 and 1, which can be set according to actual conditions. Specifically, the ratio can be any one of 0.01, 0.02, 0.04, 0.08, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 and 1.

[0096] For example, when the distance between the orthogonal projections of any adjacent first groove and second groove on the plane of the electrochromic layer is 30 mm, the maximum width of the overlapping area in the second direction is 26 mm. At this time, the width of the first barrier structure and the width of the second barrier structure in the second direction are both 28 mm, so that the distance between the adjacent first grooves of the first barrier structure is 2 mm, and the distance between the adjacent second grooves of the second barrier structure is 2 mm, thereby avoiding the side edges of the first conductive substrate and the side edges of the second conductive substrate from being in contact and short-circuiting, and improving the stability of the electrochromic device.

[0097] It can be understood that when the distance between the orthogonal projection of any adjacent first groove and second groove on the plane where the electrochromic layer is located is 30 mm, the width of the overlapping area in the second direction is greater than 0 mm and not greater than 26 mm, which can be specifically set according to actual conditions.

[0098] In some embodiments of the present application, in order to prevent short circuit of the electrochromic device while increasing the color-changing area of the electrochromic layer 120, the difference between the width of the first barrier structure 160 in the second direction and the width of the overlapping area 200 in the second direction is not less than 2 mm.

[0099] It can be understood that the difference between the width of the first barrier structure 160 in the second direction and the width of the second barrier structure 170 in the second direction is 2 mm. Or the difference between the width of the first barrier structure 160 in the second direction and the width of the second barrier structure 170 in the second direction is greater than 2 mm. At this time, by adjusting the width of the second barrier structure 170 in the second direction, the width of the overlapping area 200 in the second direction is adjusted, so as to more effectively avoid the edge of the first conductive substrate 110 from contacting the second conductive substrate 130, while avoiding the edge of the second conductive substrate 130 from contacting the first conductive substrate 110, preventing short circuit from occurring, so as to improve the use stability and reliability of the electrochromic device.

[0100] Similarly, in some embodiments of the present application, the difference between the width of the second barrier structure 170 in the second direction and the width of the overlapping area 200 in the second direction is not less than 2 mm.

[0101] As shown in Figure 2 and Figure 4 In some embodiments of the present application, the first conductive substrate 110 includes a first conductive layer 111 and a first substrate layer 112 which are stacked, and the first substrate layer 112 is stacked on the side of the first conductive layer 111 away from the electrochromic layer 120. It should be noted that the first substrate layer 112 completely covers the first conductive layer 111.

[0102] In some embodiments of the present application, the first conductive substrate 110 includes a first conductive layer 111 and a first substrate layer 112 which are stacked, and the first substrate layer 112 is stacked on the side of the first conductive layer 111 away from the electrochromic layer 120. It should be noted that the first substrate layer 112 completely covers the first conductive layer 111.

[0103] In addition, the electrochromic layer 120 includes an electrochromic material layer 122, an electrolyte layer 123 and an ion storage layer 121 which are stacked in sequence, and the electrochromic material layer 122 and the ion storage layer 121 completely cover the electrolyte layer 123, respectively. In this way, the electrochromic device can be sequentially stacked and arranged, simplifying the structure and preparation process of the electrochromic device.

[0104] In some embodiments of the present application, the edge of the first conductive layer 111 is provided with a plurality of first accommodation grooves, and the first accommodation grooves are first gap regions. Specifically, one first accommodation groove and one third accommodation groove form a first partition region 180.

[0105] It can be understood that the first partition region 180 is arranged in a ring around the first groove 140, and a first barrier structure 160 is formed between the first partition region 180 and the first groove 140, the first barrier structure 160 being a non-conductive first conductive layer 111 and part of the electrochromic layer, and the first barrier structure 160 prevents short circuit between the first conductive layer 111 and the second conductive layer 131.

[0106] At the same time, the edge of the second conductive layer 131 is provided with a plurality of second accommodation grooves, and the second accommodation grooves are third gap regions. Specifically, one second accommodation groove and one third accommodation groove form a second partition region 190.

[0107] It can be understood that by etching the second accommodation grooves at the edge of the second conductive layer 131, the second partition region 190 is arranged in a ring around the second groove 150, and a second barrier structure 170 is formed between the second partition region 190 and the second groove 150, the second barrier structure 170 being a non-conductive second conductive layer 131 and part of the electrochromic layer, and the second barrier structure 170 prevents short circuit between the second conductive layer 131 and the first conductive layer 111, thereby improving the stability of the electrochromic device.

[0108] In some embodiments of the present application, in order to improve the stability of the electrochromic device and prevent short circuit, the first partition region 180 and the second partition region 190 are filled with insulating glue. The first conductive substrate 110 and the second conductive substrate 130 are separated by the insulating glue while the first barrier structure 160 and the second barrier structure 170 provide support, so as to improve the stability of the first conductive substrate 110 and the second conductive substrate 130 in the process of deformation caused by pressure, thereby improving the stability of the electrochromic device.

[0109] It should be noted that in order to improve the support effect of the first barrier structure 160 and the second barrier structure 170, the ratio between the vertical distance from the side of the first etching region close to the first barrier structure 160 to the side of the first etching region away from the first barrier structure 160 and the width of the first barrier structure is in the range of 0.02-0.5, which can be any one of 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, 0.08, 0.09, 0.1, 0.2, 0.3, 0.4 and 0.5.

[0110] In addition, a ratio between a vertical distance of the second etching region from a side of the second etching region close to the second barrier structure 170 to a side of the second etching region away from the second barrier structure 170 and a width of the second barrier structure ranges from 0.02 to 0.5, and can be any one of 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, 0.08, 0.09, 0.1, 0.2, 0.3, 0.4, and 0.5. The ratio can be set according to actual conditions.

[0111] In all examples shown and described herein, any specific values should be interpreted as merely exemplary and not as a limitation, and thus, other examples of the exemplary embodiments can have different values.

[0112] It should be noted that like reference numerals and letters refer to like items throughout the several views, and once an item is defined in one view, it is not necessary to further define and explain it in the subsequent views.

[0113] The above embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the scope of the present application. It should be pointed out that for those skilled in the art, several modifications and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application.

Claims

1. An electrochromic device, characterized in that, The electrochromic layer is arranged between the first conductive substrate and the second conductive substrate. The first conductive substrate is provided with a first accommodating groove, the second conductive substrate is provided with a second accommodating groove, and the electrochromic layer is provided with two or more third accommodating grooves. The first accommodating groove overlaps at least one third accommodating groove in the projection of the plane where the electrochromic layer is located, and the first accommodating groove and the third accommodating groove are in communication to form a first groove. The first conductive substrate is provided with a first gap area, and the electrochromic layer is provided with two or more second gap areas, and the first gap area and at least one second gap area are in communication to form a first partition area. The first partition area is circumferentially arranged in the first groove to form a first barrier structure between the first groove and the first partition area. The second accommodating groove overlaps at least one third accommodating groove in the projection of the plane where the electrochromic layer is located, and the second accommodating groove and the third accommodating groove are in communication to form a second groove. The second conductive substrate is provided with a third gap area, and the third gap area and at least one second gap area are in communication to form a second partition area. The second partition area is circumferentially arranged in the second groove to form a second barrier structure between the second groove and the second partition area. The ratio of the width of the first barrier structure in the first direction to the width of the first barrier structure in the second direction is X1, and 0X1≤1. The ratio of the width of the second barrier structure in the first direction to the width of the second barrier structure in the second direction is X2, and 0X2≤1. The width of the first direction is the minimum width of the first barrier structure or the second barrier structure in the first direction.

2. The electrochromic device of claim 1, wherein, The first accommodating groove and the second accommodating groove are respectively a plurality of to form a plurality of first grooves and a plurality of second grooves, and the first grooves and the second grooves are staggered.

3. The electrochromic device of claim 1, wherein, Any one of the first grooves has a gap between the second conductive substrate and the second groove in the projection of the plane where the second conductive substrate is located.

4. The electrochromic device of claim 1, wherein, The projection of the first barrier structure in the plane where the second conductive substrate is located partially overlaps the second barrier structure to form an overlapping area.

5. Electrochromic device according to claim 4, characterized in that The ratio of the width of the overlapping area in the first direction to the width of the first barrier structure in the first direction is Y1, and 0Y1≤1. The ratio of the width of the overlapping area in the first direction to the width of the second barrier structure in the first direction is Y2, and 0Y2≤1. The overlapping area is the overlapping area formed by the first barrier structure and the second barrier structure in the second direction, and the width of the first direction of the first barrier structure or the second barrier structure is the maximum width of the first barrier structure or the second barrier structure in the first direction.

6. The electrochromic device of claim 4, wherein, The ratio of the width of the overlapping area in the second direction to the width of the first barrier structure in the second direction is Z1, and 0Z1<1. And / or a ratio of a width of the overlapping area in the second direction to a width of the second barrier structure in the second direction is Z2, and 0 7. The electrochromic device of claim 4, wherein, A difference between a width of the first barrier structure in the second direction and a width of the overlapping area in the second direction is not less than 2mm; And / or a difference between a width of the second barrier structure in the second direction and a width of the overlapping area in the second direction is not less than 2mm.

8. The electrochromic device of claim 1 or 5, wherein, The first direction is a width direction of the non-viewable area and is perpendicular to the viewable area, and the second direction is perpendicular to the first direction and is parallel to the viewable area.

9. The electrochromic device of claim 1, wherein, The first partition area and the second partition area are filled with insulating glue.

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