Preparation method of W-Cu composite material with trace activation elements added
By electrodepositing trace activating elements on the surface of W powder to form a core-shell structure, and then performing sintering and infiltration treatment, a W-Cu composite material with added trace activating elements is prepared. This solves the problem in the existing technology that W-Cu composite materials are difficult to maintain high thermal conductivity while improving the W skeleton strength, and achieves improvements in the material's arc erosion resistance and thermal conductivity.
Patent Information
- Application Number
- CN202310586904.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-05-23
- Publication Date
- 2025-09-12
- Estimated Expiration
- 2043-05-23
AI Technical Summary
While existing W-Cu composite materials improve the strength of the W skeleton, it is difficult to maintain high thermal conductivity and cannot meet the dual requirements of arc erosion resistance and thermal conductivity of contact materials under high short-circuit breaking current.
A W-Cu composite material with trace activation elements added was prepared by electrodepositing trace activation elements on the surface of W powder to form a core-shell structure, followed by sintering and infiltration treatment.
This method effectively improves the strength of the W skeleton while maintaining a high thermal conductivity, thereby enhancing the arc erosion resistance of the W-Cu composite material.
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Figure CN116590560B_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of metal matrix composite material preparation, and particularly relates to a method for preparing a W-Cu composite material by adding trace activation elements. Background Art
[0002] Circuit breakers are among the most critical devices in power systems. Their core components are the contacts, responsible for both disconnecting and connecting circuits. With the integration of renewable energy sources and the continuous increase in grid capacity, the maximum rated short-circuit breaking current of circuit breakers continues to rise. Every 1kA increase in breaking current places a greater strain on the arc erosion resistance of the contact material. When the short-circuit breaking current rises to 80kA, improving arc erosion resistance at the expense of thermal conductivity will be difficult to achieve. Therefore, to ensure safe and stable grid operation, the development of contact materials with both excellent erosion resistance and thermal conductivity is crucial. Due to the lack of a new alternative material, W-Cu composites remain the predominant contact material. However, existing methods for improving the arc erosion resistance of W-Cu composites fail to simultaneously achieve both enhanced W skeleton strength and high thermal conductivity. Therefore, it is necessary to develop a W-Cu composite that combines enhanced W skeleton strength with satisfactory thermal conductivity. Summary of the Invention
[0003] The purpose of the present invention is to provide a method for preparing a W-Cu composite material by adding a trace amount of activation elements, which can not only improve the W skeleton strength but also ensure that the thermal conductivity is not reduced.
[0004] The technical solution adopted by the present invention is a method for preparing a W-Cu composite material by adding a trace amount of activation elements, which is specifically implemented according to the following steps:
[0005] Step 1, preparing W@ activated element core-shell powder;
[0006] Step 2: Sintering the W@activating element core-shell powder obtained in step 1 to obtain a W skeleton with added activating elements, and subjecting the obtained W skeleton with added activating elements to infiltration treatment to obtain a W-Cu composite material with added trace activating elements.
[0007] The present invention is also characterized in that:
[0008] The specific process of step 1 is:
[0009] Step 1.1, place W powder evenly on the cathode plate of the electrodeposition device, place the anode plate parallel to the cathode plate, and fill the electrodeposition device with electroplating solution;
[0010] Step 1.2, the electrodeposition device is turned on with a pulse power supply for intermittent electrodeposition. After the electrodeposition is completed, the product is cleaned with deionized water and alcohol, and placed in a vacuum drying oven for drying to obtain W@ activated element core-shell powder.
[0011] In step 1.1, the particle size of the W powder is 100 nm to 1 mm.
[0012] In step 1.1, the cathode plate is made of copper or stainless steel, and the anode plate is made of a plate corresponding to the activated element.
[0013] In step 1.1, the activating element is one or a combination of two of Ni, Fe, and Co.
[0014] In step 1.2, the parameters of intermittent electrodeposition are: current density is 1A / dm 2 ~3A / dm 2 , the electrodeposition time is 10min~30min, and the pulse width is 10s~80s.
[0015] In step 1.2, the temperature of the vacuum drying oven is 30°C to 80°C.
[0016] The mass percentage of the activated element in the obtained W@activated element core-shell powder is 0% to 1%, the balance is W, and the sum of the mass percentages of the activated element and W is 100%. The coverage rate of the W@activated element core-shell powder is 10% to 100%.
[0017] In step 2, the sintering parameters are: sintering temperature is 1300° C. to 1500° C., sintering time is 10 min to 120 min, and sintering atmosphere is hydrogen.
[0018] In step 2, the infiltration parameters are: infiltration temperature of 1100° C. to 1200° C., infiltration time of 10 min to 120 min, and infiltration atmosphere of hydrogen.
[0019] The beneficial effects of the present invention are as follows: the preparation method of the W-Cu composite material with trace activation elements added in the present invention prepares W@activation element core-shell powder by an electrodeposition method, the activation elements are uniformly dotted and coated on the surface of W particles, and then sintered to obtain a W skeleton, and then infiltrated to obtain the W-Cu composite material with the trace activation elements added. The trace activation elements are beneficial to reducing the sintering temperature of the W skeleton and improving the strength of the W skeleton. At the same time, the trace activation elements have little effect on thermal conductivity, which is beneficial to improving the arc ablation resistance of the W-Cu composite material. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 This is a scanning electron microscope image of the W@Ni core-shell powder obtained in Example 1 of the method of the present invention;
[0021] Figure 2Microstructure of W-Cu composite material; (a) is the microstructure of W-Cu composite material with Ni added, and (b) is the microstructure of W-Cu composite material without Ni added. DETAILED DESCRIPTION
[0022] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
[0023] The preparation method of the W-Cu composite material with added trace activation elements of the present invention is specifically implemented according to the following steps:
[0024] Step 1, preparing W@ activated element core-shell powder;
[0025] The specific process of step 1 is:
[0026] Step 1.1: evenly place W powder with a particle size of 100 nm to 1 mm on the cathode plate of an electrodeposition apparatus. The cathode plate is made of copper or stainless steel. An anode plate is placed parallel to the cathode plate. The anode plate is made of a plate corresponding to the activated element. The electrodeposition apparatus is filled with electroplating solution and the anode plate is placed in the electroplating solution.
[0027] The electrodeposition device of the present invention adopts the deposition device in CN201710735384.5;
[0028] The activating element is one or a combination of two of Ni, Fe, and Co;
[0029] Step 1.2: Turn on the pulse power supply of the electrodeposition device to perform intermittent electrodeposition with a current density of 1A / dm 2 ~3A / dm 2 The electrodeposition time is 10 min to 30 min, the pulse width is 10 s to 80 s, and after the electrodeposition is completed, the product is cleaned with deionized water and alcohol, and placed in a vacuum drying oven for drying at a temperature of 30°C to 80°C to obtain W@activated element core-shell powder. The mass percentage of the activated element in the W@activated element core-shell powder is 0% to 1%, and the remainder is W, and the sum of the mass percentages of the two is 100%; the coverage rate of the W@activated element core-shell powder is 10% to 100%.
[0030] Step 2: Sintering the W@activating element core-shell powder obtained in step 1 to obtain a W skeleton with added activating elements, and subjecting the obtained W skeleton with added activating elements to a melt infiltration treatment to obtain a W-Cu composite material with added trace amounts of activating elements;
[0031] The sintering parameters are as follows: sintering temperature is 1300℃~1500℃, sintering time is 10min~120min, and sintering atmosphere is hydrogen;
[0032] The parameters of the infiltration are: infiltration temperature of 1100°C to 1200°C, infiltration time of 10min to 120min, and infiltration atmosphere of hydrogen.
[0033] Example 1
[0034] Step 1, preparing W@Ni core-shell powder;
[0035] The specific process of step 1 is:
[0036] Step 1.1: Evenly place W powder with a particle size of 6 μm on the cathode plate of an electrodeposition apparatus. The cathode plate is made of metallic copper. The anode plate is placed parallel to the cathode plate. The anode plate is made of a single nickel plate. The electrodeposition apparatus is filled with electroplating solution and the anode plate is placed in the electroplating solution.
[0037] The nickel plating solution is a general industrial nickel plating formula;
[0038] Step 1.2: Turn on the pulse power supply of the electrodeposition device to perform intermittent electrodeposition with a current density of 1A / dm 2 The electrodeposition time was 20 min, the pulse width was 10 s, and after the electrodeposition was completed, the product was cleaned with deionized water and alcohol, and placed in a vacuum drying oven for drying at 30 ° C to obtain W@Ni core-shell powder. The mass percentage of the activated element in the W@Ni core-shell powder was 0.1%, and the remainder was W. The sum of the mass percentages of the two was 100%; the coverage rate of the W@Ni core-shell powder was 20%.
[0039] Step 2: Sintering the W@Ni core-shell powder obtained in step 1 to obtain a W skeleton with added activation elements, and subjecting the obtained W skeleton with added Ni to a melt infiltration treatment to obtain a W-Cu composite material with added trace amounts of Ni;
[0040] The sintering parameters are as follows: sintering temperature is 1300 °C, sintering time is 10 min, and sintering atmosphere is hydrogen;
[0041] The parameters of the infiltration are: infiltration temperature of 1100°C, infiltration time of 10 min, and infiltration atmosphere of hydrogen.
[0042] pass Figure 1 It can be seen that the activation element Ni is evenly dotted and coated on the surface of the W particles.
[0043] pass Figure 2 It can be seen that the W-Cu composite material with the addition of the activating element Ni has a more uniform microstructure. After testing, the compressive strength of the W skeleton increased by 15% and the arc ablation resistance increased by 34%.
[0044] Example 2
[0045] Step 1, preparing W@Fe core-shell powder;
[0046] The specific process of step 1 is:
[0047] Step 1.1: Place W powder with a particle size of 100 nm evenly on the cathode plate of an electrodeposition apparatus. The cathode plate is made of metallic copper. Place an anode plate parallel to the cathode plate. The anode plate is made of a single Fe plate. Fill the electrodeposition apparatus with electroplating solution and place the anode plate in the electroplating solution.
[0048] The nickel plating solution is a general industrial iron plating formula;
[0049] Step 1.2: Turn on the pulse power supply of the electrodeposition device to perform intermittent electrodeposition with a current density of 2A / dm 2 The electrodeposition time was 10 min, the pulse width was 40 s, and after the electrodeposition was completed, the product was cleaned with deionized water and alcohol, and placed in a vacuum drying oven for drying at 50 ° C to obtain W@Fe core-shell powder. The mass percentage of the activated element in the W@Fe core-shell powder was 0.6%, and the remainder was W, and the sum of the mass percentages of the two was 100%; the coverage rate of the W@activated element core-shell powder was 10%.
[0050] Step 2: Sintering the W@activating element core-shell powder obtained in step 1 to obtain a W skeleton with added activating elements, and subjecting the obtained W skeleton with added activating elements to a melt infiltration treatment to obtain a W-Cu composite material with added trace amounts of activating elements;
[0051] The sintering parameters are as follows: sintering temperature is 1400 °C, sintering time is 60 min, and sintering atmosphere is hydrogen;
[0052] The infiltration parameters are: infiltration temperature of 1150°C, infiltration time of 60 min, and infiltration atmosphere of hydrogen.
[0053] Example 3
[0054] Step 1, preparing W@Co core-shell powder;
[0055] The specific process of step 1 is:
[0056] Step 1.1: Place 1mm W powder evenly on the cathode plate of an electrodeposition apparatus. The cathode plate is made of metallic copper. Place an anode plate parallel to the cathode plate. The anode plate is made of simple Co. Fill the electrodeposition apparatus with electroplating solution and place the anode plate in the electroplating solution.
[0057] The nickel plating solution is a general industrial cobalt plating formula;
[0058] Step 1.2: Turn on the pulse power supply of the electrodeposition device to perform intermittent electrodeposition with a current density of 3A / dm 2The electrodeposition time was 30 min, the pulse width was 80 s, and after the electrodeposition was completed, the product was cleaned with deionized water and alcohol, and placed in a vacuum drying oven for drying at 80 ° C to obtain W@Co core-shell powder. The mass percentage of the activated element in the W@Co core-shell powder was 1%, and the remainder was W. The sum of the mass percentages of the two was 100%; the coverage rate of the W@Co core-shell powder was 100%.
[0059] Step 2: Sintering the W@Co core-shell powder obtained in step 1 to obtain a W skeleton with added activation elements, and subjecting the obtained W skeleton with added Co to an infiltration treatment to obtain a W-Cu composite material with added trace amounts of Co;
[0060] The sintering parameters are as follows: sintering temperature is 1500 °C, sintering time is 120 min, and sintering atmosphere is hydrogen;
[0061] The infiltration parameters are: infiltration temperature of 1200°C, infiltration time of 120 min, and infiltration atmosphere of hydrogen.
Claims
1. A method for preparing a W-Cu composite material by adding a trace amount of activation elements, characterized in that: Please follow the steps below to implement it: Step 1, preparing W@ activated element core-shell powder; The specific process of step 1 is: Step 1.1, place W powder evenly on the cathode plate of the electrodeposition device, place the anode plate parallel to the cathode plate, and fill the electrodeposition device with electroplating solution; In step 1.1, the particle size of W powder is 100nm~6μm; In step 1.1, the cathode plate is made of copper or stainless steel, and the anode plate is made of the plate corresponding to the activated element; In step 1.1, the activating element is one or a combination of two of Ni, Fe, and Co; Step 1.2, turning on the pulse power supply of the electrodeposition device to perform intermittent electrodeposition. After the electrodeposition is completed, the product is cleaned with deionized water and alcohol, and placed in a vacuum drying oven for drying to obtain W@ activated element core-shell powder; In step 1.2, the parameters of intermittent electrodeposition are: current density is 1A / dm 2 ~3A / dm 2 , the electrodeposition time is 10min~30min, and the pulse width is 10s~80s; The mass percentage of the activated element in the obtained W@activated element core-shell powder is greater than 0 and less than or equal to 1%, and the remainder is W, and the sum of the mass percentages of the two is 100%; the coverage rate of the W@activated element core-shell powder is 10% to 100%; W@activated element core-shell powders were prepared by electrodeposition, and the activated elements were evenly coated on the surface of W particles. Step 2: Sintering the W@activating element core-shell powder obtained in step 1 to obtain a W skeleton with added activating elements, and subjecting the obtained W skeleton with added activating elements to infiltration treatment to obtain a W-Cu composite material with added trace activating elements.
2. The method for preparing a W-Cu composite material with added trace activation elements according to claim 1, characterized in that: In step 1.2, the drying temperature is 30°C to 80°C.
3. The method for preparing a W-Cu composite material with added trace activation elements according to claim 1, characterized in that: In step 2, the sintering parameters are: sintering temperature is 1300° C. to 1400° C., sintering time is 10 min to 120 min, and sintering atmosphere is hydrogen.
4. The method for preparing a W-Cu composite material with added trace activation elements according to claim 1, characterized in that: In step 2, the infiltration parameters are: infiltration temperature of 1100° C. to 1200° C., infiltration time of 10 min to 120 min, and infiltration atmosphere of hydrogen.
Citation Information
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