Plasma device for treating a liquid and method of use thereof

Abstract

The application discloses a kind of plasma device and its use method for processing liquid, it is related to plasma processing equipment technical field, the processing liquid plasma device of the present application includes reactor, micro-bubble generating unit and gas compression assembly, reactor is equipped with the reaction cavity for liquid flow;Micro-bubble generating unit is below the reactor, and is communicated reaction cavity, micro-bubble generating unit is used to provide bubble to reaction cavity;Gas compression assembly includes gas compression disc and drive mechanism connected with gas compression disc, gas compression disc is movably arranged in reaction cavity, and drive mechanism is used to drive gas compression disc to move along the height direction of reactor, to control the flow speed of bubble.The application can control the up-moving speed of bubble, make bubble evenly distributed in liquid, guarantee the processing effect of subsequent plasma discharge processing to liquid.

Description

Technical Field

[0001] This invention relates to the field of plasma processing equipment technology, and in particular to a plasma device for processing liquids and its method of use. Background Technology

[0002] Plasma treatment technology is one of the most effective processes for cleaning, activating, and coating surfaces. By modifying the surface through physicochemical processes, it improves surface adhesion and can be used to treat various materials, including plastics, metals, and glass. Therefore, there are many devices that use plasma technology to treat solid surfaces. However, this technology has limited penetration into liquids, thus limiting its widespread application in treating large volumes of flowing liquids.

[0003] Existing plasma devices for liquid treatment generally employ a bubbling process. In this process, a high-pressure environment is used to infuse the liquid into the reactor, which then enters a low-pressure device via a steering component. Gas is released from the liquid as bubbles, and through the action of an electric field, these bubbles form a plasma region within the reactor. This plasma region contains high-energy and high-temperature plasma. The flow of bubbles within the liquid allows for thorough contact and mixing between the liquid and the plasma, enabling a series of reactions such as oxidation, cracking, desorption, and decomposition of organic matter and pollutants. This process achieves the goal of degrading and removing pollutants.

[0004] However, in the existing device described above, the microbubbles rise at uneven and excessively fast speeds within the liquid, preventing them from fully contacting and mixing with the liquid. This results in uneven distribution of the bubbles within the liquid, which in turn affects the subsequent processing effect of the liquid plasma discharge treatment. Summary of the Invention

[0005] The main objective of this invention is to provide a plasma device for processing liquids and a method for using the same, which can control the upward movement speed of bubbles, so that the bubbles are evenly distributed in the liquid, and ensure the processing effect of subsequent liquid plasma discharge treatment.

[0006] To achieve the above objectives, the present invention provides a plasma device for processing liquids, comprising:

[0007] The reactor is provided with a reaction chamber for liquid flow;

[0008] A microbubble generating unit is provided below the reactor and communicates with the reaction chamber. The microbubble generating unit is used to supply bubbles into the reaction chamber.

[0009] A gas compression assembly includes a gas compression plate and a drive mechanism connected to the gas compression plate. The gas compression plate is movably disposed within the reaction chamber. The drive mechanism is used to drive the gas compression plate to move along the height direction of the reactor to control the flow speed of the bubbles.

[0010] Optionally, the reactor includes an upper sealing plate, a lower sealing plate, and a glass tube cover. The upper end of the glass tube cover is connected to the upper sealing plate, and the lower end of the glass tube cover is connected to the lower sealing plate. The upper sealing plate, the lower sealing plate, and the glass tube cover together form the reaction chamber. The end of the glass tube cover near the upper sealing plate is provided with an inlet pipe communicating with the reaction chamber, and the end of the glass tube cover near the lower sealing plate is provided with a drain pipe communicating with the reaction chamber.

[0011] Optionally, the plasma device for processing liquids further includes a plasma generating unit, which includes a positive electrode post and a negative electrode post disposed in the reaction chamber and spaced apart. One of the positive electrode post and the negative electrode post is connected to the upper sealing plate, and the other is connected to the lower sealing plate.

[0012] Optionally, the plasma device for processing liquids includes a plurality of plasma generating units, which are arranged at intervals. In two adjacent plasma generating units, the positive electrode post of one plasma generating unit is arranged adjacent to the negative electrode post of the other plasma generating unit.

[0013] Optionally, both the positive electrode post and the negative electrode post extend along the vertical direction of the reactor;

[0014] The air compressor plate is provided with multiple sliding holes, and each sliding hole is provided with a positive electrode post or a negative electrode post.

[0015] Optionally, the upper sealing plate and the lower sealing plate, respectively, have an upper annular groove and a lower annular groove formed on their respective sidewalls near the glass tube cover. The upper and lower ends of the glass tube cover are respectively inserted into the upper annular groove and the lower annular groove via sealing rings; and / or

[0016] The reactor also includes a fastening bolt, the bolt thread passing through the upper sealing plate and the lower sealing plate, and two nuts of the fastening bolt passing through the bolt thread and respectively abutting and locking against the opposite sides of the upper sealing plate and the lower sealing plate.

[0017] Optionally, the driving mechanism includes a drive motor, a lead screw, and a lead screw nut. The lead screw is rotatably inserted through the reactor and extends into the reaction chamber. The lead screw nut is movably sleeved on the section of the lead screw that extends into the reaction chamber. The drive motor drives the end of the lead screw that is away from the reaction chamber.

[0018] The air pressure plate is sleeved on the outside of the lead screw nut.

[0019] Optionally, the bottom of the reactor has multiple air-blowing channels communicating with the reaction chamber, and the multiple air-blowing channels are spaced apart. The microbubble generating unit includes:

[0020] An electrolytic cell, wherein the top of the electrolytic cell is provided with a gas outlet;

[0021] A gas guide hood is connected to the electrolysis box, and the gas guide hood forms a gas guide channel, with the gas inlet end of the gas guide channel connected to the gas outlet.

[0022] A porous release plate is disposed between the reactor and the gas guide hood. The porous release plate has multiple spaced-apart release channels. The inlet end of each release channel is connected to the outlet end of the gas guide channel, and the outlet end of each release channel is respectively connected to the respective gas blowing channel.

[0023] Multiple one-way valves are provided in each of the release channels.

[0024] Optionally, the top of the reactor is provided with multiple air outlet channels communicating with the reaction chamber, and the multiple air outlet channels are arranged at intervals.

[0025] The plasma device for processing liquids further includes a safety valve and an exhaust hood connected to the reactor. The exhaust hood forms an exhaust channel, the inlet end of which is connected to a plurality of exhaust outlets, and the outlet end of which is provided with the safety valve. The safety valve is used to open or close the exhaust channel.

[0026] The present invention also proposes a method of using a plasma device based on the above-described liquid processing method, characterized in that the method includes the following steps:

[0027] Liquid is introduced into the reactor, and the introduction of liquid is stopped when the liquid fills to the predetermined position;

[0028] Adjust the initial position of the compressor plate of the compressor assembly to be close to the bottom of the reactor;

[0029] The microbubble generator is activated to produce bubbles, which then enter the reactor.

[0030] The control drive mechanism drives the air compressor plate to move along the height direction of the reactor until the air compressor plate is close to the top of the reactor, and then the microbubble generating unit is turned off to stop generating bubbles;

[0031] After the discharge process has been completed for a period of time, the liquid is discharged from the reactor.

[0032] The plasma device for liquid processing provided by this invention first adjusts the initial position of the pressure plate of the pressure assembly to near the bottom of the reactor during liquid processing. Then, a microbubble generating unit located at the bottom of the reactor generates bubbles and introduces them into the reactor to mix with the liquid. During bubble generation, a control drive mechanism moves the pressure plate along the height of the reactor until it approaches the top, at which point the microbubble generating unit is shut off to stop bubble generation. As the pressure plate moves upward, the bubbles rise slowly under the pressure of the pressure plate, increasing their residence time in the liquid and promoting thorough and uniform mixing, thereby ensuring the effectiveness of subsequent liquid plasma discharge treatment. Attached Figure Description

[0033] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0034] Figure 1 This is a schematic diagram of the structure of an embodiment of the plasma device for processing liquids according to the present invention;

[0035] Figure 2 This is a schematic diagram of the structure of an embodiment of a compressor assembly;

[0036] Figure 3 This is a schematic diagram of the structure of one embodiment of the plasma generating unit;

[0037] Figure 4 This is a schematic diagram of the structure of one embodiment of a microbubble generating unit;

[0038] Figure 5 A schematic diagram of one embodiment of the porous release disc;

[0039] Figure 6 This is a schematic flowchart illustrating the method of using the plasma device for processing liquids according to the present invention.

[0040] Explanation of icon numbers:

[0041]

[0042] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0043] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0044] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0045] Furthermore, the use of terms such as "first" and "second" in this invention is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this invention.

[0046] Plasma treatment technology is one of the most effective processes for cleaning, activating, and coating surfaces. By modifying the surface through physicochemical processes, it improves surface adhesion and can be used to treat various materials, including plastics, metals, and glass. Therefore, there are many devices that use plasma technology to treat solid surfaces. However, this technology has limited penetration into liquids, thus limiting its widespread application in treating large volumes of flowing liquids.

[0047] Existing plasma devices for liquid treatment generally employ a bubbling process. In this process, a high-pressure environment is used to infuse the liquid into the reactor, which then enters a low-pressure device via a steering component. Gas is released from the liquid as bubbles, and through the action of an electric field, these bubbles form a plasma region within the reactor. This plasma region contains high-energy and high-temperature plasma. The flow of bubbles within the liquid allows for thorough contact and mixing between the liquid and the plasma, enabling a series of reactions such as oxidation, cracking, desorption, and decomposition of organic matter and pollutants. This process achieves the goal of degrading and removing pollutants.

[0048] However, in the existing device described above, the microbubbles rise at uneven and excessively fast speeds within the liquid, preventing them from fully contacting and mixing with the liquid. This results in uneven distribution of the bubbles within the liquid, which in turn affects the subsequent processing effect of the liquid plasma discharge treatment.

[0049] In view of this, the present invention provides a plasma device 100 for processing liquids and a method for using the same, which can control the upward movement speed of bubbles, so that the bubbles are evenly distributed in the liquid, and ensure the processing effect of subsequent liquid plasma discharge treatment. Figures 1 to 5 This is one embodiment of the plasma device 100 for processing liquids according to the present invention. Figure 6 This is an embodiment of the method of using the plasma device 100 for processing liquids according to the present invention.

[0050] The plasma device 100 for processing liquids of the present invention includes a reactor 1, a microbubble generating unit 2, and a gas compression assembly 3. The reactor 1 is provided with a reaction chamber 14 for liquid flow. The microbubble generating unit 2 is located below the reactor 1 and communicates with the reaction chamber 14. The microbubble generating unit 2 is used to provide bubbles into the reaction chamber 14. The gas compression assembly 3 includes a gas compression plate 32 and a drive mechanism 31 that drives the gas compression plate 32. The gas compression plate 32 is movably disposed in the reaction chamber 14. The drive mechanism 31 is used to drive the gas compression plate 32 to move along the height direction of the reactor 1 to control the flow rate of the bubbles.

[0051] The plasma device 100 for liquid processing provided by this invention first adjusts the initial position of the pressure plate 32 of the pressure assembly 3 to be close to the bottom of the reactor 1 during liquid processing. Then, a microbubble generating unit located at the bottom of the reactor 1 generates bubbles and introduces them into the reactor 1 to mix with the liquid. During the bubble generation process, the control drive mechanism 31 drives the pressure plate 32 to move along the height direction of the reactor 1 until the pressure plate 32 approaches the top of the reactor 1, at which point the microbubble generating unit 2 is shut off to stop bubble generation. During the upward movement of the pressure plate 32, the bubbles can rise slowly under the pressure of the pressure plate 32, increasing the residence time of the bubbles in the liquid and promoting thorough and uniform mixing with the liquid, thereby ensuring the effectiveness of subsequent liquid plasma discharge treatment.

[0052] Further, please refer to Figure 2In one embodiment of this application, the drive mechanism 31 includes a drive motor 311, a lead screw 312, and a lead screw nut 313. The lead screw 312 rotatably passes through the reactor 1 and extends into the reaction chamber 14. The lead screw nut 313 is movably sleeved on the section of the lead screw 312 that extends into the reaction chamber 14. The drive motor 311 is connected to the end of the lead screw 312 away from the reaction chamber 14. A pressure plate 32 is sleeved on the outside of the lead screw nut 313. When the drive motor 311 is running, the lead screw 312 can rotate under the drive of the output shaft of the drive motor 311, so that the lead screw nut 313 can move up and down along with the pressure plate 32. In other embodiments, the drive mechanism 31 may also include a cylinder and a telescopic rod connected to the cylinder, with the pressure plate 32 sleeved on one end of the telescopic rod.

[0053] To facilitate the installation of the gas compression assembly 3 inside the reactor 1, the reactor 1 is generally required to be configured as a detachable structure. In one embodiment of this application, the reactor 1 includes an upper sealing plate 11, a lower sealing plate 13, and a glass tube cover 12. The upper end of the glass tube cover 12 is connected to the upper sealing plate 11, and the lower end of the glass tube cover 12 is connected to the lower sealing plate 13. The upper sealing plate 11, the lower sealing plate 13, and the glass tube cover 12 together form a reaction chamber 14. The end of the glass tube cover 12 near the upper sealing plate 11 is provided with an inlet pipe 15 that communicates with the reaction chamber 14, and the end of the glass tube cover 12 near the lower sealing plate 13 is provided with a drain pipe 16 that communicates with the reaction chamber 14. It should be noted that, to avoid the drive motor 311 being easily corroded by the liquid or affecting the treatment effect of liquid plasma discharge if it is located inside the reactor 1, the drive motor 311 generally needs to be located outside the reactor 1. In this embodiment, the output shaft or lead screw 312 of the drive motor 311 is partially inserted through the upper sealing plate 11. When it is necessary to install the gas compression assembly 3, it is only necessary to disassemble the upper sealing plate 11 from the glass tube cover 12 and then reassemble the gas compression assembly 3. Of course, in other embodiments, the glass tube cover 12 can be replaced with other materials, such as plastic or metal. Using glass allows the operator to clearly observe the liquid situation inside the reactor 1.

[0054] To improve the airtightness of reactor 1, in one embodiment of this application, an upper annular groove and a lower annular groove are formed on the side wall of the upper sealing plate 11 near the glass tube cover 12 and the side wall of the lower sealing plate 13 near the glass tube cover 12, respectively. The upper end and the lower end of the glass tube cover 12 are respectively inserted into the upper annular groove and the lower annular groove through sealing rings. This can prevent gas or liquid from flowing out from the connection gap between the glass tube cover 12 and the upper sealing plate 11 and the lower sealing plate 13, and can improve the structural strength of reactor 1.

[0055] To further improve the structural strength of reactor 1, in one embodiment of this application, reactor 1 further includes fastening bolts 17. The screw of fastening bolt 17 passes through the upper sealing plate 11 and the lower sealing plate 13. Two nuts of fastening bolt 17 pass through the screw and respectively abut against and lock the upper sealing plate 11 and the lower sealing plate 13 on opposite sides. The upper sealing plate 11 and the lower sealing plate 13 can be tightly fixed to both ends of the glass tube cover 12 by fastening bolts 17.

[0056] To facilitate plasma generation within reactor 1, in one embodiment of this application, the plasma device 100 for processing liquids further includes a plasma generating unit 4. The plasma generating unit 4 includes a positive electrode post 41 and a negative electrode post 42 disposed within the reaction chamber 14 and spaced apart. One of the positive electrode post 41 and the negative electrode post 42 is connected to the upper sealing plate 11, and the other is connected to the lower sealing plate 13. Specifically, the positive electrode post 41 and the negative electrode post 42 are distributed at intervals in columns and / or rows, forming a plasma discharge processing zone between them. It should be noted that, for ease of installation, the upper sealing plate 11 and the lower sealing plate 13 each have corresponding post holes on one side for inserting the positive electrode post 41 or the negative electrode post 42.

[0057] To further improve plasma generation efficiency, please refer to Figure 3. In one embodiment of this application, the plasma device 100 for processing liquids includes multiple plasma generating units 4, which are spaced apart. In two adjacent plasma generating units 4, the positive electrode post 41 of one plasma generating unit 4 is adjacent to the negative electrode post 42 of the other plasma generating unit 4. In this way, a plasma discharge processing zone can be formed between the two adjacent positive and negative electrode posts 42, thereby improving the plasma generation efficiency and quantity, and thus improving the cleaning capability of the plasma device.

[0058] To facilitate the movement of the pressure plate 32 within the reaction chamber 14, in one embodiment of this application, both the positive electrode post 41 and the negative electrode post 42 extend vertically along the reactor 1. The pressure plate 32 is provided with multiple sliding holes, each corresponding to a positive electrode post 41 or a negative electrode post 42. Thus, during the vertical sliding of the pressure plate 32, the sliding holes allow the pressure plate 32 to move around the negative electrode post 42 and the positive electrode post 41, without affecting the normal generation of plasma.

[0059] In existing technologies, a high-pressure environment is typically used to integrate gas into a liquid, followed by a sudden drop to a low-pressure environment, causing the gas to escape from the liquid as bubbles. However, this method requires significant energy and has low bubble generation efficiency. For solutions to these problems, please refer to [link to relevant documentation]. Figure 4 and Figure 5In one embodiment of this application, the bottom of the reactor 1 is provided with multiple air-blowing channels that communicate with the reaction chamber 14. The multiple air-blowing channels are spaced apart. The microbubble generating unit 2 includes an electrolysis box 21, a gas guide hood 22, a porous release plate 23, and multiple one-way valves. The top of the electrolysis box 21 is provided with an air outlet. The gas guide hood 22 is connected to the electrolysis box 21 and forms a gas guide channel. The air inlet end of the gas guide channel is connected to the air outlet. The porous release plate 23 is located between the reactor 1 and the gas guide hood 22. The porous release plate 23 is provided with multiple spaced release channels 231. The air inlet end of each release channel 231 is connected to the air outlet end of the gas guide channel. The air outlet end of each release channel 231 is respectively connected to each air-blowing channel. Multiple one-way valves are respectively located in each release channel 231. This application utilizes an external electrolysis box 21 to generate gas. The gas forms microbubbles through the gas guide shroud 22 and the porous release plate 23 and enters the glass tube shroud 12. This significantly simplifies the formation of microbubbles, reduces energy consumption, and improves bubble generation efficiency. It should be noted that the water supply pipe 212 and the terminal block 211 of the electrolysis box 21 are also... Figure 4 It is marked in the text.

[0060] As more gas enters reactor 1, the gas pressure inside reaction chamber 14 gradually increases. Under high pressure, gas cannot be introduced into reactor 1. To facilitate control of the gas pressure inside reaction chamber 14, in one embodiment of this application, the top of reactor 1 is provided with multiple outlet channels connecting to reaction chamber 14, spaced apart. The plasma device 100 for processing liquids also includes a safety valve 25 and an exhaust hood 24 connected to reactor 1. The exhaust hood 24 forms an exhaust channel, with the inlet end of the exhaust channel connecting to multiple outlet channels. The outlet end of the exhaust channel is provided with a safety valve 25, which is used to open or close the exhaust channel. When pressure reduction is required, the safety valve 25 can be opened, allowing the gas inside reaction chamber 14 to be released to the outside through the exhaust channel, ensuring that the gas pressure inside reaction chamber 14 remains within a suitable range.

[0061] The present invention also provides a method of using the plasma device 100 for processing liquids described above, comprising the following steps:

[0062] Liquid is introduced into reactor 1, and the introduction of liquid is stopped when the liquid fills to the predetermined position;

[0063] Adjust the initial position of the compressor plate 32 of the compressor assembly 3 to be close to the bottom of the reactor 1;

[0064] The microbubble generator 2 is activated to generate bubbles, which then enter reactor 1.

[0065] The control drive mechanism 31 drives the pressure plate 32 to move along the height direction of the reactor 1 until the pressure plate 32 is close to the top of the reactor 1, and the microbubble generating unit 2 is turned off to stop generating bubbles.

[0066] After the discharge process has been completed for a period of time, the liquid is discharged from reactor 1.

[0067] It should be noted that the discharge treatment referred to here refers to the discharge treatment using the positive electrode column 41 and negative electrode column 42 of the plasma generating unit 4. After the plasma generating unit 4 stops, the treated liquid is discharged from the reactor 1.

[0068] The above description is merely a preferred embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural transformations made using the contents of the present invention's specification and drawings under the inventive concept of the present invention, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present invention.

Claims

1. A plasma device for processing liquids, characterized in that, include: The reactor is provided with a reaction chamber for liquid flow; A microbubble generating unit is provided below the reactor and connected to the reaction chamber. The microbubble generating unit is used to provide bubbles into the reaction chamber. as well as A gas compression assembly includes a gas compression plate and a drive mechanism that drives the gas compression plate. The gas compression plate is movably disposed within the reaction chamber. The drive mechanism is used to drive the gas compression plate to move along the height direction of the reactor to control the flow rate of the bubbles. A plasma generating unit, comprising positive electrode posts and negative electrode posts disposed within a reaction chamber and spaced apart.

2. The plasma apparatus for processing liquids as described in claim 1, characterized in that, The reactor includes an upper sealing plate, a lower sealing plate, and a glass tube cover. The upper end of the glass tube cover is connected to the upper sealing plate, and the lower end of the glass tube cover is connected to the lower sealing plate. The upper sealing plate, the lower sealing plate, and the glass tube cover together form the reaction chamber. The end of the glass tube cover near the upper sealing plate is provided with an inlet pipe that communicates with the reaction chamber, and the end of the glass tube cover near the lower sealing plate is provided with a drain pipe that communicates with the reaction chamber.

3. The plasma apparatus for processing liquids as described in claim 2, characterized in that, One of the positive electrode post and the negative electrode post is connected to the upper sealing plate, and the other is connected to the lower sealing plate.

4. The plasma apparatus for processing liquids as described in claim 3, characterized in that, The plasma device for processing liquids includes a plurality of plasma generating units, which are spaced apart. In two adjacent plasma generating units, the positive electrode post of one plasma generating unit is adjacent to the negative electrode post of the other plasma generating unit.

5. The plasma apparatus for processing liquids as described in claim 3, characterized in that, Both the positive electrode post and the negative electrode post extend along the vertical direction of the reactor; The air compressor plate is provided with multiple sliding holes, and each sliding hole is provided with a positive electrode post or a negative electrode post.

6. The plasma apparatus for processing liquids as described in claim 2, characterized in that, The upper sealing plate and the lower sealing plate, respectively, have an upper annular groove and a lower annular groove formed on their respective sidewalls near the glass tube cover. The upper and lower ends of the glass tube cover are respectively inserted into the upper annular groove and the lower annular groove via sealing rings; and / or The reactor also includes a fastening bolt, the bolt thread passing through the upper sealing plate and the lower sealing plate, and two nuts of the fastening bolt passing through the bolt thread and respectively abutting and locking against the opposite sides of the upper sealing plate and the lower sealing plate.

7. The plasma apparatus for processing liquids as described in any one of claims 1 to 6, characterized in that, The driving mechanism includes a drive motor, a lead screw, and a lead screw nut. The lead screw is rotatably inserted through the reactor and extends into the reaction chamber. The lead screw nut is movably sleeved on the section of the lead screw that extends into the reaction chamber. The drive motor drives the end of the lead screw that is away from the reaction chamber. The air pressure plate is sleeved on the outside of the lead screw nut.

8. The plasma apparatus for processing liquids as claimed in any one of claims 1 to 6, characterized in that, The bottom of the reactor has multiple air-blowing channels communicating with the reaction chamber, and the multiple air-blowing channels are spaced apart. The microbubble generating unit includes: An electrolytic cell, wherein the top of the electrolytic cell is provided with a gas outlet; A gas guide hood is connected to the electrolysis box, and the gas guide hood forms a gas guide channel, with the gas inlet end of the gas guide channel connected to the gas outlet. A porous release plate is disposed between the reactor and the gas guide hood. The porous release plate has multiple spaced-apart release channels. The inlet end of each release channel is connected to the outlet end of the gas guide channel, and the outlet end of each release channel is respectively connected to the respective gas blowing channel. Multiple one-way valves are provided in each of the release channels.

9. The plasma apparatus for processing liquids as claimed in any one of claims 1 to 6, characterized in that, The top of the reactor is provided with multiple air outlet channels that communicate with the reaction chamber, and the multiple air outlet channels are arranged at intervals. The plasma device for processing liquids further includes a safety valve and an exhaust hood connected to the reactor. The exhaust hood forms an exhaust channel, the inlet end of which is connected to a plurality of exhaust outlets, and the outlet end of which is provided with the safety valve. The safety valve is used to open or close the exhaust channel.

10. A method of using a plasma apparatus for processing liquids as described in any one of claims 1 to 9, characterized in that, The method of use includes the following steps: Liquid is introduced into the reactor, and the introduction of liquid is stopped when the liquid fills to the predetermined position; Adjust the initial position of the compressor plate of the compressor assembly to be close to the bottom of the reactor; The microbubble generator is activated to produce bubbles, which then enter the reactor. The control drive mechanism drives the air compressor plate to move along the height direction of the reactor until the air compressor plate is close to the top of the reactor, and then the microbubble generating unit is turned off to stop generating bubbles; After the discharge process has been completed for a period of time, the liquid is discharged from the reactor.

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