Plasma generating electrode, plasma generating device, and purification apparatus

Abstract

The application relates to the technical field of separation and purification, and discloses an electrode for plasma generation, a plasma generation device and a purification equipment, wherein at least part of the electrode is provided with a hollow structure. The technical scheme can increase the coverage area of the plasma generated by the plasma generation device and improve the purification effect.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of separation and purification, in particular to an electrode for plasma generation, a plasma generation device and a purification equipment. BACKGROUND

[0002] In the related art, the electrode for preparing plasma in the plasma generation device is mostly a flat plate electrode. Such a plasma generation device has a very small plasma coverage area, often in the order of microns, and cannot effectively purify air, water or other objects. SUMMARY

[0003] The main purpose of the present application is to provide an electrode for plasma generation, a plasma generation device and a purification equipment, aiming to increase the plasma coverage area generated by the plasma generation device and improve the purification effect.

[0004] To achieve the above purpose, the present application provides an electrode for plasma generation, at least part of the area of which is provided with a hollow structure.

[0005] In an embodiment of the present application, the minimum distance d between any point in the hollow part of the electrode for plasma generation and the edge of the hollow structure is 2.5 mm.

[0006] In an embodiment of the present application, the hollow structure is distributed throughout the electrode for plasma generation.

[0007] In an embodiment of the present application, the electrode for plasma generation is provided in a cylindrical structure with a hollow surface, and an installation space is formed in the cylindrical structure.

[0008] In an embodiment of the present application, the electrode for plasma generation comprises at least one spiral electrode.

[0009] In an embodiment of the present application, the electrode for plasma generation comprises two spiral electrodes, and the two spiral electrodes are opposite in rotation direction and intersect with each other.

[0010] And / or, the spiral electrode is a spiral extending metal wire or metal strip.

[0011] In an embodiment of the present application, the electrode for plasma generation comprises at least two strip-shaped electrodes arranged side by side.

[0012] In an embodiment of the present application, the electrode for plasma generation further comprises a connecting electrode, which is arranged at an angle with the strip-shaped electrode and connected with each strip-shaped electrode.

[0013] And / or, the strip-shaped electrode is a metal wire or a metal strip.

[0014] In an embodiment of the present application, the plasma generating electrode is a plate electrode, and the plate electrode is provided with a plurality of hollow holes.

[0015] Alternatively, the plasma generating electrode is a mesh electrode.

[0016] In an embodiment of the present application, the plasma generating electrode comprises a plurality of dot electrodes arranged in a dot matrix.

[0017] In an embodiment of the present application, the plasma generating electrode comprises a plurality of block electrodes arranged in a dot matrix.

[0018] The present application also provides a plasma generating device, comprising:

[0019] a first electrode;

[0020] a dielectric layer arranged on a surface of the first electrode; and

[0021] a second electrode arranged on a side of the dielectric layer away from the first electrode, and covering at least part of the dielectric layer, wherein the second electrode is the plasma generating electrode as described in any one of the preceding embodiments.

[0022] In an embodiment of the present application, the first electrode is a linear electrode, and the second electrode is arranged in a circumferential direction of the first electrode.

[0023] In an embodiment of the present application, the plasma generating device is applied with a voltage U on the second electrode, and U≤3kV.

[0024] The present application also provides a purification device, comprising the plasma generating device as described above.

[0025] The technical solution of the present application provides a plasma generating electrode with a hollow structure, which can be applied in a plasma generating device and exposed to an environment to be purified. The partial area of the plasma generating electrode exposed to the environment to be purified is provided with a hollow structure, which, on one hand, increases the extension length of the electrode under the premise of using the same amount of material, and on the other hand, reduces the overlapping plasma coverage area at the hollow structure position, so that the plasma generating device can obtain a larger plasma coverage area under the same discharge voltage, ensuring that the generated plasma is in sufficient contact with external air or water and other substances, so as to effectively purify and disinfect air, water, fabric, skin, material surface, etc., and improve the purification effect. BRIEF DESCRIPTION OF DRAWINGS

[0026] In order to make the technical solutions of the embodiments of the present application or the prior art clearer, the accompanying drawings needed in the embodiments or prior art description will be briefly introduced. Obviously, the accompanying drawings in the following description only show some embodiments of the present application, and for those skilled in the art, other drawings can be obtained from the structures shown in the drawings without any creative effort.

[0027] Figure 1 Structure diagram of a first embodiment of the plasma generating device of the present application;

[0028] Figure 2 Structure diagram of a second embodiment of the plasma generating device of the present application;

[0029] Figure 3 Structure diagram of a first embodiment of the plasma generating electrode of the present application in a strip-shaped mesh structure;

[0030] Figure 4 Structure diagram of a third embodiment of the plasma generating device of the present application;

[0031] Figure 5 Structure diagram of a first embodiment of the plasma generating electrode of the present application in a plate-shaped open structure;

[0032] Figure 6 Structure diagram of a fourth embodiment of the plasma generating device of the present application;

[0033] Figure 7 Structure diagram of a fifth embodiment of the plasma generating device of the present application;

[0034] Figure 8 Structure diagram of a first embodiment of the plasma generating electrode of the present application in a mesh structure;

[0035] Figure 9 Structure diagram of a sixth embodiment of the plasma generating device of the present application;

[0036] Figure 10 Structure diagram of another embodiment of the plasma generating electrode of the present application in a mesh structure;

[0037] Figure 11 Structure diagram of a seventh embodiment of the plasma generating device of the present application;

[0038] Figure 12 Structure diagram of a first embodiment of the plasma generating electrode of the present application in a partially hollow structure;

[0039] Figure 13 Structure diagram of an eighth embodiment of the plasma generating device of the present application;

[0040] Figure 14Structure diagram of a ninth embodiment of the plasma generating device of the present application;

[0041] Figure 15 Structure diagram of a tenth embodiment of the plasma generating device of the present application;

[0042] Figure 16 Structure diagram of an eleventh embodiment of the plasma generating device of the present application;

[0043] Figure 17 Structure diagram of a twelfth embodiment of the plasma generating device of the present application.

[0044] Explanation of reference numerals:

[0045]

[0046] The implementation, functional features and advantages of the present application will be further described with reference to the embodiments and the accompanying drawings. DETAILED DESCRIPTION

[0047] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without any creative work under the premise that the embodiments in the present application are within the protection scope of the present application.

[0048] It should be noted that all the directionality indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present application are only used to explain the relative position relationship, movement condition, etc. between the components in a certain specific posture (as shown in the drawings). If the specific posture changes, the directionality indications also change accordingly.

[0049] In the present application, unless otherwise explicitly specified and limited, the terms “connection”, “fixation” and the like should be understood in a broad sense. For example, “fixation” can be fixed connection, or detachable connection, or integral; can be mechanical connection, or electrical connection; can be direct connection, or indirect connection through an intermediate medium; can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0050] In addition, the descriptions such as "first", "second" and the like in the present application are only for the purpose of description, and cannot be understood as indicating or implying the relative importance of the technical features or implicitly indicating the number of the technical features indicated. Therefore, the features defined as "first", "second" can be explicitly or implicitly included at least one of the features. In addition, the technical solutions of various embodiments can be combined with each other, but it must be based on the realization of ordinary skilled in the art, when the combination of technical solutions appears contradictory or unachievable, it should be considered that the combination of technical solutions does not exist, nor within the protection scope required by the present application.

[0051] The present application provides a plasma generating electrode 10, which is applied to a plasma generating device 100. It should be understood that the working principle of the plasma generating device 100 is to form a positive voltage or a negative voltage between two electrodes, and a dielectric layer 50 between the two electrodes can form a dielectric barrier discharge. When a voltage with sufficient strength is applied between the two electrodes, the air between the two electrodes can be ionized to generate plasma. The generated plasma can propagate a distance along the dielectric surface from the plasma generating electrode 10, cover the peripheral side of the plasma generating electrode 10, and play a purifying role on the air, water, fabric, skin, material surface and the like in contact with it, so as to remove toxic and harmful substances in the substances. In addition, the plasma generating device 100 can be applied to a purification device, such as an air conditioner, an air purifier, a floor cleaning machine and the like, to reduce the toxic and harmful substances contained in the wind blown by the air conditioner and the air purifier, to purify, sterilize and disinfect the water used for cleaning in the floor cleaning machine, and of course, other purification devices, such as a purification and disinfection treatment for fabric, skin or material surface, which are not limited herein.

[0052] Please refer to Figures 1 to 13 In some embodiments of the present application, at least part of the area of the plasma generating electrode 10 is provided as a hollow structure.

[0053] In this embodiment, at least part of the plasma generating electrode 10 is provided with a hollow structure. The plasma generating electrode 10 can be made of rigid material, in the form of a plate with hollow holes, or a plurality of point blocks arranged at intervals. The plasma generating electrode 10 can also be made of flexible metal material, such as metal wire, metal strip or metal line, etc. to form a mesh electrode or a spiral structure or any other shape. The hollow structure can be a single or at least two hollow holes arranged at intervals. The hollow hole can be a round hole, a square hole or any other regular or irregular shape. It can also be a mesh hole on the mesh electrode, a layer gap on the spiral electrode, or a gap between adjacent point blocks when the plasma generating electrode 10 includes a plurality of point blocks arranged at intervals. In addition, the hollow structure can be provided only in part of the plasma generating electrode 10, and the other part is a complete and continuous electrode surface. That is, the plasma generating electrode 10 has a complete electrode surface with a limited size. It can be understood that, under the same material consumption, the hollow structure can increase the forming area or length of the plasma generating electrode 10. Conversely, under the same purification environment, the hollow structure can reduce the material consumption of the plasma generating electrode 10.

[0054] For the plasma coverage area formed by the plasma generating electrode 10, after the plasma generating device 100 generates plasma, the plasma will propagate along the surface of the medium for a distance from the plasma generating electrode 10 and cover the side of the plasma generating electrode 10. It can be understood that for the electrode without hollow structure, a plurality of linear electrodes or point blocks are arranged without gap. At this time, the plasma coverage area formed by each linear electrode or point block will overlap with the plasma coverage area formed by the adjacent electrode. For the plasma generating electrode 10 in this embodiment, the adjacent linear or point blocks are arranged at intervals through the hollow position. The plasma will diffuse to the hollow area along the surface of the medium, reducing the overlapping area of the adjacent plasma coverage area. The plasma coverage area formed by the adjacent electrodes can be connected to each other, so that the plasma generating device 100 can obtain a larger plasma coverage area under the same discharge voltage, and fully utilize the plasma in the plasma coverage area formed by each electrode. It ensures that the generated plasma is in full contact with external air or water and other substances, so as to effectively purify and disinfect air, water, fabric and other substances, and improve the purification effect.

[0055] It should be noted that in this embodiment, the plasma generating electrode 10 can be provided with a hollow structure as follows: Figure 12 and Figure 13The hollow structure is only arranged in part of the area, and the hollow structure can also be arranged throughout the plasma generating electrode 10. When the hollow structure is arranged throughout the plasma generating electrode 10, the plasma coverage area of each position of the plasma generating electrode 10 can be fully utilized, and the utilization efficiency of the plasma is better improved. However, in some embodiments, based on the convenience of connection of the plasma generating electrode 10 and the external power supply, or the installation convenience, installation strength and stability and other factors of the plasma generating electrode 10, part of the area of the plasma generating electrode 10 can be arranged as a complete planar electrode area, so that the larger plasma coverage area and the utilization efficiency of the plasma are obtained, and other use or installation requirements are met.

[0056] Therefore, it can be understood that the technical scheme of the present application sets a plasma generating electrode 10 with a hollow structure, which can be applied to the plasma generating device 100 and exposed to the environment to be purified. The part of the area of the plasma generating electrode 10 exposed to the environment to be purified is arranged in a hollow structure. On the one hand, the extension length of the electrode is increased under the premise of using the same amount of material. On the other hand, the plasma coverage area generated by the part of the electrode surrounding the hollow part is connected to reduce the overlapping plasma coverage area, so that the plasma generating device 100 can obtain a larger plasma coverage area under the same discharge voltage, ensure that the generated plasma is in sufficient contact with the external air or water and other substances, and effectively purify and disinfect the air, water, fabric, skin, material surface and the like, and improve the purification effect.

[0057] In an embodiment of the present application, the minimum distance between any point in the part of the hollow part of the plasma generating electrode 10 and the edge of the hollow structure is d, and d≤2.5mm is satisfied.

[0058] The hollow structure is arranged on the electrode 10 for generating plasma, aiming to reduce the overlapping part of the plasma coverage area between the electrodes, so as to obtain a larger plasma coverage area. It can be understood that for each hollow position in the hollow structure, there is a hollow edge formed by the electrode, and the plasma in the hollow position is also formed by the inward diffusion of the electrode from the hollow edge. In the embodiment, the distance d between any point in the part of the hollow position limited by the hollow structure and the electrode of the nearest hollow edge is ≤2.5 mm. Within the safe range of electrical safety, the maximum length of the outward diffusion of the generated plasma from the electrode is about 2.5 mm when the maximum voltage is applied. Therefore, if the distance between a certain position in the hollow position and the nearest hollow edge exceeds the diffusion length of the plasma, it is easy to cause the generated plasma coverage area to not completely cover the surface of the hollow dielectric layer 50. That is, under the condition of the same external electrode volume or the same total coverage area, a part of the gap in the hollow position is not covered by the plasma. When the distance d between any point in the hollow position and the electrode of the nearest hollow edge is not greater than 2.5 mm, the generated plasma area can cover the hollow position when the maximum applied voltage does not exceed the safe electrical condition, thereby achieving good purification effect in the range of the hollow position. Among them, the value of d can be determined according to the applied voltage value. For example, the value of d can be 0.1 mm, 0.5 mm, 1 mm, 1.5 mm, 2 mm or any value within 2.5 mm. Of course, it should be noted that with the development of technology, such as changes in the material of the electrode 10 for generating plasma, the material of the dielectric layer 50, the plasma generation environment, the range of applicable voltage values, etc., those skilled in the art can adjust the value of d according to different conditions. Other sizes with similar effects to 2.5 mm can be used under different conditions, and the size can be greater than 2.5 mm.

[0059] When the voltage is applied to the two electrodes of the plasma generating device 100 to generate plasma, the higher the voltage, the larger the coverage area of the plasma. However, if the voltage is too high, not only the energy consumption increases, but also the technical risk during operation increases greatly. Moreover, the plasma coverage area improved by increasing the voltage is limited. When a low voltage within 3 kV, including 3 kV, is applied to the plasma generating device 100, the technical risk is low, and the power is relatively low. By observing the surface of the plasma generating device 100 during the discharge process, it can be determined whether the plasma completely covers the surface of the dielectric layer 50. When the overall electron density of the surface of the dielectric layer 50 is greater than 1.0*10 18 At this time, uniform purple light can be observed on the surface of the plasma generating device 100, and the purple light can completely cover the surface of the plasma generating device 100, that is, it can be determined that the dielectric layer 50 is covered by plasma. When the overall electron density of the surface of the dielectric layer 50 is less than 1.0*10 18When the distance between any point in the hollow structure and the outer electrode is not more than 2.5 mm, the plasma can fully cover the surface of the plasma generating device 100 under the driving of a voltage of 3 kV, and when the distance exceeds 2.5 mm, the plasma reactor is difficult to fully cover the surface under a voltage of 3 kV or below. It can be understood that when the voltage is further increased, there is a higher voltage that can fully cover the medium layer 50 of the plasma generating device 100 by plasma, but a too high voltage will increase the energy consumption and greatly increase the technical risk, which has a serious negative effect on manufacturing and practical application. However, with the development of technology, the safe voltage range can gradually increase, and at this time, the value of d in the hollow part can be appropriately increased to achieve full coverage when d exceeds 2.5 mm. That is, in the embodiment, the maximum value of the distance d between any point in the hollow structure and the edge of the hollow structure is 2.5 mm, which can fully cover the surface of the plasma generating device 100 by plasma under the safe voltage of 3 kV, and obtain the maximum plasma coverage area in the application environment of low voltage and low energy consumption.

[0060] In addition, it should be noted that when each point in the hollow structure of the plasma generating electrode 10 meets the above size limitation, the hollow structure of the plasma generating electrode 10 can be fully covered by plasma, thereby achieving a more excellent purification effect. However, when only part of the hollow structure meets the above size limitation, the purification effect of the plasma generating device 100 can be improved to some extent.

[0061] Please refer to Figure 5 In an embodiment of the present application, the hollow structure is distributed throughout the plasma generating electrode 10.

[0062] In the embodiment, the hollow structure is distributed throughout the plasma generating electrode 10, for example, a uniformly perforated plate-shaped electrode or a cylindrical electrode, a mesh electrode, a spiral electrode, or a plurality of arrayed point block electrodes. That is, the plasma generating electrode 10 is divided into a plurality of regions according to a predetermined size, and each region has a hollow structure. In this way, the plasma coverage area of each position of the plasma generating electrode 10 can be fully utilized, and under the same voltage and material, the plasma generating electrode 10 has a longer extension length, which can obtain a larger plasma coverage area and better improve the utilization efficiency of the plasma. The hollow structure provided on the plasma generating device 10 can be uniformly distributed as shown in the accompanying drawings Figures 3-11 , or can be as shown in the accompanying drawings Figures 14 to 17The uneven distribution is not limited.

[0063] Please refer to Figure 1 and Figure 2 In an embodiment of the present application, the plasma generating electrode 10 is arranged in a hollow cylindrical structure with a surface, and the mounting space is formed in the hollow cylindrical structure.

[0064] In the plasma generating device 100, the first electrode 30, the dielectric layer 50 and the second electrode are included, wherein the second electrode is the plasma generating electrode 10 proposed in the embodiment of the present application, and the dielectric layer 50 is arranged between the first electrode 30 and the second electrode to form a dielectric barrier discharge. In the embodiment, the first electrode 30 and the dielectric layer 50 are both arranged in the second electrode, and the dielectric layer 50 is arranged around the first electrode 30, so that the plasma generating electrode 10 as the second electrode is arranged in a hollow cylindrical structure around the dielectric layer 50, and the cross section of the hollow cylindrical structure can be any shape such as a circle, an ellipse, a rectangle, a triangle or other polygons. The hollow cylindrical structure can be a spiral electrode formed by winding a metal wire, or a mesh electrode, a cylindrical electrode structure with holes or a plurality of point block electrode structures arranged around, which are not limited. In this way, the plasma generating device 100 is arranged in a coaxial structure with a space structure, so that the surface area of the first electrode 30 can be fully utilized under the condition that the volume size of the first electrode 30 is constant, and the discharge area between the first electrode 30 and the second electrode is relatively larger. Alternatively, under the condition that the discharge area of the plasma generating device 100 is constant, the volume of the first electrode 30 can be relatively smaller due to the full utilization of the surface area of the first electrode 30, and the volume of the dielectric layer 50 and the second electrode is also relatively smaller, so that the plasma generating device of the present application has better purification performance and smaller volume size.

[0065] It should be noted that when the plasma generating electrode 10 of the embodiment is used, and is a spiral electrode, a mesh electrode and a point block electrode, the dielectric layer 50 can be used as the attachment base of the plasma generating electrode 10, and can be a rigid or flexible material for shaping, so that the plasma generating electrode 10 is shaped into the required structure by the dielectric layer 50.

[0066] Please refer to Figure 1 In an embodiment of the present application, the plasma generating electrode 10 includes at least one spiral electrode.

[0067] The embodiment is one of the embodiments of the plasma generating electrode 10. A single metal wire or metal strip can be used to form a single spiral electrode outside the dielectric layer 50. Alternatively, at least two spiral electrodes can be wound outside the dielectric layer 50. The spiral directions of the two spiral electrodes can be the same or opposite as in the following embodiment, so that the two spiral electrodes intersect. The adjacent layers of the spiral electrode form a hollow gap. In some embodiments, the minimum distance d between any point in the hollow part of the plasma generating electrode 10 and the edge of the hollow part is limited. In this case, for a single spiral electrode, the spiral spacing between adjacent layers does not exceed 2d, so as to ensure that the minimum distance between any point in the adjacent layers and the spiral electrode meets the above size limit, thereby ensuring that the generated plasma can cover the entire interlayer gap and improve the purification effect.

[0068] Please refer to Figure 2 In an embodiment of the present application, the plasma generating electrode 10 includes two spiral electrodes, and the spiral directions of the two spiral electrodes are opposite and intersect with each other.

[0069] The embodiment is one of the embodiments of the plasma generating electrode 10. The plasma generating electrode 10 has a double spiral structure, and the two spiral electrodes intersect with each other and have opposite spiral directions. Similarly, the positions not covered by the spiral electrodes are hollow regions, and the dielectric layer 50 on the inner side is exposed in the hollow regions. When the plasma is generated, the plasma will diffuse from the spiral electrode along the surface of the dielectric layer 50 into the hollow region to cover the hollow region, increase the contact area between the plasma and external air or water, and play a better purification role.

[0070] In an embodiment of the present application, the spiral electrode is a spiral extending metal wire or metal strip. The spiral electrode formed by the metal wire uses less material, can sufficiently reduce the use of materials, and has a better plasma coverage effect under the same discharge voltage. The spiral electrode formed by winding the metal strip has a larger contact area between the plasma generating electrode 10 and the dielectric layer 50, which can improve the structural strength and stability of the plasma generating electrode 10 wound on the dielectric layer 50, avoid the sliding of the plasma generating electrode 10, and ensure the performance stability of the plasma generating device.

[0071] Please refer to Figure 3 and Figure 4 In an embodiment of the present application, the plasma generating electrode 10 includes at least two strip electrodes 11 arranged side by side.

[0072] The embodiment of the plasma generating electrode 10 includes at least two strip-shaped electrodes 11 arranged side by side, and the gap between the adjacent two strip-shaped electrodes 11 is the hollow gap. The at least two strip-shaped electrodes 11 can be arranged side by side on a plane or a curved surface according to actual needs, and have high shaping flexibility, and can be applied to the structural arrangement requirements of different purification environments. When the voltage is applied to the plasma generating electrode 10, the voltage can be applied to each strip-shaped electrode 11 respectively, or the voltage can be applied through the connecting electrode 13 in the following embodiment, which is not limited herein.

[0073] Please refer to Figure 3 and Figure 4 In an embodiment of the present application, the plasma generating electrode 10 further includes a connecting electrode 13, which is arranged at an angle with the strip-shaped electrodes 11 and connected with each of the strip-shaped electrodes 11.

[0074] In the embodiment, the plasma generating electrode 10 further includes a connecting electrode 13, which is arranged at an angle with and connected to each of the strip-shaped electrodes 11. In this way, the structure of the plasma generating electrode 10 can be integrated by connecting each of the strip-shaped electrodes 11 through the connecting electrode 13, so as to avoid the electrodes from being scattered and lost. In addition, the external voltage can be applied to the connecting electrode 13 and each of the strip-shaped electrodes 11 by connecting the connecting electrode 13 to the external power supply, so as to improve the connection convenience of the plasma generating electrode 10, and make each of the strip-shaped electrodes 11 have a parallel structure, the voltage of each of the strip-shaped electrodes 11 is consistent, the amount and extension range of the generated plasma are substantially the same, and the consistency of the purification effect of each position of the plasma generating device 100 is improved.

[0075] In an embodiment of the present application, the strip-shaped electrode 11 is a metal wire or a metal flat strip. The strip-shaped electrode 11 formed by the metal wire has less material usage, can sufficiently reduce the material usage, and has better plasma coverage effect under the same discharge voltage. The strip-shaped electrode 11 formed by the metal flat strip has a larger contact area between the plasma generating electrode 10 and the dielectric layer 50, can improve the structural strength and stability of the plasma generating electrode 10 arranged on the dielectric layer 50, avoid the sliding of the plasma generating electrode 10, and ensure the performance stability of the plasma generating device.

[0076] Please refer to Figure 5 , Figure 6 and Figure 12 and Figure 13 In an embodiment of the present application, the plasma generating electrode 10 is a plate-shaped electrode, and the plate-shaped electrode is provided with a plurality of hollow holes.

[0077] Another embodiment of the plasma generating electrode 10 is that the hollow structure is formed by machining the hollow holes on the plate electrode. The shape of the hollow holes can be round, square or other regular or irregular shape. The plate electrode can be a flat plate or a curved plate, or a cylindrical structure. The plate electrode is machined to form the plasma generating electrode 10. The plasma generating electrode 10 has high structural strength and is not easy to deform or damage. The plasma generating electrode 10 can also protect the dielectric layer 50 and the first electrode 30, thereby effectively ensuring the performance stability of the plasma generating electrode 10 and the plasma generating device 100.

[0078] Please refer to Figures 8 to 11 In an embodiment of the present application, the plasma generating electrode 10 is a mesh electrode.

[0079] Another embodiment of the plasma generating electrode 10 is that the hollow structure is formed by machining the hollow holes on the plate electrode. The shape of the hollow holes can be round, square or other regular or irregular shape. The plate electrode can be a flat plate or a curved plate, or a cylindrical structure. The plate electrode is machined to form the plasma generating electrode 10. The plasma generating electrode 10 has high structural strength and is not easy to deform or damage. The plasma generating electrode 10 can also protect the dielectric layer 50 and the first electrode 30, thereby effectively ensuring the performance stability of the plasma generating electrode 10 and the plasma generating device 100.

[0080] Please refer to Figure 7 In an embodiment of the present application, the plasma generating electrode 10 includes a plurality of dot-shaped electrodes arranged in a dot matrix.

[0081] And / or, the plasma generating electrode 10 includes a plurality of block-shaped electrodes arranged in a dot matrix.

[0082] In this embodiment, a plurality of dot-shaped electrodes or block-shaped electrodes are used as the second electrode and are attached to the surface of the dielectric layer 50. The gap between the adjacent two electrodes is the hollow position. The combination of the split dot-shaped electrodes and block-shaped electrodes can make the plasma generating electrode 10 have higher scene applicability. According to the structure of the purification environment, the dielectric layer 50 or the first electrode 30, the position and gap of each dot-shaped electrode and block-shaped electrode can be freely combined and arranged, thereby better improving the applicability of the plasma generating electrode 10.

[0083] Please refer to Figure 1 And Figure 2The application also provides a plasma generating device 100, comprising a first electrode 30, a dielectric layer 50 arranged on the surface of the first electrode 30, and a second electrode arranged on the side of the dielectric layer 50 away from the first electrode 30 and covering at least part of the dielectric layer 50, wherein the second electrode is the plasma generating electrode 10 according to any one of the preceding embodiments. In the plasma generating device 100, the dielectric layer 50 between the first electrode 30 and the second electrode can form a dielectric barrier discharge by forming a positive voltage or a negative voltage between the first electrode 30 and the second electrode. After a voltage with sufficient strength is applied between the two electrodes, the air between the two electrodes can be ionized to generate plasma. The generated plasma can propagate along the surface of the dielectric layer for a distance from the plasma generating electrode 10, cover the circumferential side of the plasma generating electrode 10, and purify the air, water, fabric, skin, material surface, etc. in contact with the plasma generating electrode 10 to remove toxic and harmful substances in the substances.

[0084] In the application, the second electrode is the plasma generating electrode 10 according to any one of the preceding embodiments and is exposed to the environment to be purified. At least part of the plasma generating electrode 10 is hollow. On the one hand, the hollow structure can increase the extension length of the electrode under the condition of using the same amount of material. On the other hand, the plasma coverage areas generated by the parts of the electrode surrounding the hollow structure are connected to each other and the overlapping plasma coverage areas are reduced, so that the plasma generating device 100 can obtain a larger plasma coverage area under the same discharge voltage, ensure that the generated plasma can fully contact with the external air or water, and effectively purify and disinfect the air and water, thereby improving the purification effect.

[0085] In an embodiment of the application, the first electrode 30 is a linear electrode, and the second electrode is arranged in a circumferential direction around the first electrode 30.

[0086] In the embodiment, the first electrode 30 is a linear electrode, the dielectric layer 50 is wound outside the first electrode 30, and the second electrode is wound outside the dielectric layer 50, that is, the plasma generating electrode 10 as the second electrode is a hollow cylindrical structure surrounding the dielectric layer 50, and the cross section can be circular, oval, rectangular, triangular or any other polygonal shape. The hollow cylindrical structure can be a spiral electrode formed by winding a metal wire, or a mesh electrode, a cylindrical electrode structure or a plurality of point block electrode structures arranged around, which is not limited here. In this way, the plasma generating device 100 forms a coaxial surrounding structure with a spatial structure, which can fully utilize the surface area of the first electrode 30 under the condition that the volume size of the first electrode 30 is constant, so that the discharge area between the first electrode 30 and the second electrode is relatively larger. Alternatively, under the condition that the discharge area of the plasma generating device 100 is constant, the volume of the first electrode 30 can be relatively smaller due to the full use of the surface area of the first electrode 30, and the volume of the dielectric layer 50 and the second electrode is also relatively smaller, so that the plasma generating device of the present application has better purification performance and the volume size is also more compact.

[0087] It should be noted that when the plasma generating electrode 10 of the embodiment is a spiral electrode, a mesh electrode and a point block electrode, the dielectric layer 50 can be an attachment base for the plasma generating electrode 10, which can be rigid or flexible and easy to shape, so that the plasma generating electrode 10 is shaped into the required structure by the dielectric layer 50.

[0088] In an embodiment of the present application, the voltage U applied to the second electrode of the plasma generating device 100 satisfies U≤3kV.

[0089] In the embodiment, the voltage U applied to the second electrode of the plasma generating device 100 satisfies U≤3kV, so as to meet the safe range of electricity, and at this time, when the minimum distance d between any point in the hollow structure on the plasma generating electrode 10, that is, the second electrode, and the edge of the hollow structure is not more than 2.5mm, the generated plasma completely covers the surface of the dielectric layer when the applied voltage is 3kV. Of course, when the minimum distance between any point in the hollow structure and the edge of the hollow structure is smaller, the applied voltage can be appropriately reduced to reduce the output power. It should be noted that with the development of technology, for example, the change of the material of the plasma generating electrode 10, the material of the dielectric layer 50, the plasma generating environment, the range of safe voltage values that can be applied, etc., those skilled in the art can adopt other voltage values with similar effects to 3kV according to different conditions, including but not limited to greater than 3kV.

[0090] The purification device according to the present application can be, but is not limited to, an air conditioner, an air purifier, a floor cleaning machine, and the like. The plasma generated by the plasma generating device 100 provided in the purification device can reduce toxic and harmful substances contained in the air blown by the air conditioner and the air purifier, purify, sterilize, and disinfect the water used for cleaning in the floor cleaning machine, and can be other purification devices, which are not limited herein. Since the purification device according to the present application applies all the technical solutions of the plasma generating electrode 10 and the plasma generating device 100 of all the embodiments, it has at least all the beneficial effects brought by all the technical solutions, which are not described herein.

[0091] The above description is merely preferred embodiments of the present application, and does not limit the patent scope of the present application. Any equivalent structural transformation made according to the content of the present application specification and drawings, or direct / indirect application in other related technical fields, falls within the patent protection scope of the present application.

Claims

1. A plasma generating device, characterized by comprising: The device comprises: a first electrode; a dielectric layer provided on a surface of the first electrode; and a plasma generating electrode provided as a second electrode on a side surface of the dielectric layer facing away from the first electrode and covering at least part of the surface of the dielectric layer, at least part of the plasma generating electrode being provided with a hollow structure; a minimum distance d between any point in the hollow structure of the plasma generating electrode and the edge of the hollow structure being less than or equal to 2.5 mm; and plasma generated by the plasma generating electrode propagating along the surface of the dielectric layer from the edge of the hollow structure and diffusing into the hollow region.

2. The plasma generating device of claim 1, wherein The hollow structure is provided on the plasma generating electrode.

3. The plasma generating device of claim 1, wherein The plasma generating electrode is provided in a hollow cylindrical structure, and an installation space is formed in the hollow cylindrical structure.

4. The plasma generating device of claim 3, wherein The plasma generating electrode comprises at least one spiral electrode.

5. The plasma generating device of claim 4, wherein The plasma generating electrode comprises two spiral electrodes with opposite rotation directions and intersecting with each other. The spiral electrode is a spiral extending metal wire or metal strip.

6. The plasma generating device as defined in any one of claims 1 to 3, characterized in that The plasma generating electrode comprises at least two strip electrodes arranged side by side.

7. The plasma generating device of claim 6, wherein The plasma generating electrode further comprises a connecting electrode arranged at an angle with the strip electrodes and connected to each of the strip electrodes. The strip electrode is a metal wire or metal strip.

8. The plasma generating device as defined in any one of claims 1 to 3, characterized in that The plasma generating electrode is a plate electrode provided with a plurality of hollow holes. The plasma generating electrode is a mesh electrode.

9. The plasma generating device as defined in any one of claims 1 to 3, characterized in that The plasma generating electrode comprises a plurality of dot electrodes arranged in a dot matrix. The plasma generating electrode comprises a plurality of block electrodes arranged in a dot matrix.

10. The plasma generating device of claim 1, wherein, The first electrode is a linear electrode, and the second electrode is provided in a circumferential direction around the first electrode.

11. The plasma generating device of claim 10, wherein the dielectric material is a ceramic material. The voltage U applied to the plasma generating device by the second electrode satisfies U≤3kV.

12. A purification apparatus, characterized by The device comprises the plasma generating device according to any one of claims 1 to 11.

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