Method and storage cartridge for automated processing of multiple samples in a BIB system

Abstract

The present invention discloses a system and method for efficiently processing multiple samples using a BIB system. An exemplary method for efficiently processing multiple samples using a BIB system according to the present invention includes: removing a separate sample holder containing a sample from a storage location within the BIB system, wherein the BIB system includes a plurality of sample holders positioned in one or more storage locations; loading the separate sample holder onto a sample stage, the sample stage being configured to hold the sample holder during polishing of the corresponding sample held by the separate sample holder; and causing a BIB source to emit a broad ion beam toward the sample, wherein the broad ion beam removes at least a portion of the sample upon which the broad ion beam is incident. Once the desired portion of the sample is removed, the sample holder is removed from the sample stage and loaded back into the storage location.

Description

Background Art

[0001] A broad ion beam (BIB) polishing system is used to prepare samples for research. Specifically, a BIB polishing system directs a high-energy, unfocused or minimally focused beam of ions (e.g., argon ions) to a sample, where the beam degrades and / or otherwise removes the portion of the sample on which it is incident. Because the broad ion beam does not require focusing or minimal focusing, the BIB polishing system does not have the optical column limitations of other sample preparation techniques (such as focused ion beam (FIB) milling), and therefore the BIB polishing system can employ much higher primary energy beam currents. Due to the higher primary energy beam current, the BIB system is able to remove sample material more quickly than existing systems to expose the area of ​​interest, thereby achieving a faster sample preparation process.

[0002] Unfortunately, while efficient in removing sample material, the sample being processed needs to be precisely aligned with a special mask designed to block portions of the beam from impinging on areas of the sample that the user does not wish to remove. Because this alignment process takes time and requires precise skill, it slows down the sample preparation workflow. In addition, because the higher current wide ion beam removes sample material faster, the rate of redeposition of removed material onto the wide ion beam source also increases, forcing the user to remove the source more frequently for cleaning, which in turn requires system downtime. Due to these limitations on workflow efficiency, most current use of BIB polishing systems has been for academic and other non-commercial applications. Therefore, it would be desirable to have a new BIB polishing system that can efficiently and accurately process many samples in a shorter period of time. Summary of the Invention

[0003] The present invention discloses a system and method for efficiently processing multiple samples using a broad ion beam (BIB) system. An exemplary method for efficiently processing multiple samples using a BIB system according to the present invention includes: removing a separate sample holder containing a sample from a storage location within the BIB system, wherein the BIB system includes multiple sample holders positioned in one or more storage locations; loading the separate sample holder onto a sample stage configured to hold the sample holder during polishing of the corresponding sample held by the separate sample holder; and causing a BIB source to emit a broad ion beam toward the sample, wherein the broad ion beam removes at least a portion of the sample on which the broad ion beam is incident. Once the desired portion of the sample is removed, the sample holder is removed from the sample stage and loaded back into the storage location. The process can be repeated for multiple samples stored in the BIB system. In this way, if the sample is pre-aligned, processing of multiple samples can be performed with little user input or supervision. BRIEF DESCRIPTION OF THE DRAWINGS

[0004] The detailed description is described with reference to the accompanying drawings. In the drawings, the left-most digit(s) of a reference number identifies the drawing in which the reference number first appears. The same reference numbers in different drawings indicate similar or identical items.

[0005] Figure 1 Depicted is a cross-section of an exemplary BIB system configured to more efficiently process multiple samples according to the present disclosure.

[0006] Figure 2 An exemplary environment for more efficiently processing multiple samples within a sample preparation workflow is shown.

[0007] Figure 3 An exemplary process for processing samples through a dual BIB system that achieves increased system uptime in accordance with the present invention is depicted.

[0008] Figure 4 An exemplary process for processing samples by a dual-mode, optical and BIB milling system for more efficient sample processing is described in accordance with the present invention.

[0009] Figure 5 An exemplary process for processing multiple samples with reduced downtime within a dual BIB system in accordance with the present invention is depicted.

[0010] Figure 6 An exemplary process for processing samples through a BIB system that achieves increased system uptime in accordance with the present invention is described.

[0011] Figure 7A and Figure 7B is an exemplary diagram showing pre-alignment of a sample with a first mask, and subsequent processing of the sample by a BIB system including a second mask.

[0012] Like reference numerals refer to corresponding parts throughout the several views of the drawings. Generally, in the drawings, elements that may be included in a given example are shown in solid lines, while elements that are optional for a given example are shown in dashed lines. However, elements shown in solid lines are not required for all examples of the present disclosure, and elements shown in solid lines may be omitted from a particular example without departing from the scope of the present disclosure.

[0013] Specific implementation methods of the implementation plan

[0014] Disclosed herein are systems and methods for more efficiently processing multiple samples using a broad ion beam (BIB) system. More specifically, the present disclosure includes a BIB system configured to receive and process one or more samples with increased throughput and / or uptime compared to current BIB systems.

[0015] Figure 1 1 is an illustration of a cross-section 100 of an exemplary BIB system 102 according to the present disclosure that is configured to more efficiently process multiple samples 104. The BIB system 102 includes a BIB source 106 configured to emit a wide ion beam 108 along a BIB axis 110 toward a sample stage area 112. The wide ion beam 108 is configured such that when a portion of the wide ion beam 108 is incident upward onto the sample 104, material of the sample on which the wide ion beam is incident is milled or otherwise removed from the sample. For example, in some embodiments, the BIB source 106 can be an Ar ion source configured to emit an argon ion beam toward the sample stage 112.

[0016] The sample stage area 112 may include a mask 114 configured to block a portion of the wide ion beam 108 so that sample material corresponding to the portion of interest is not milled or otherwise removed from the sample 104 by the incident ions. Figure 1 A first portion of a cross-section of a wide ion beam 108(a) is shown incident on a mask 114, and a second portion of a cross-section of the wide ion beam 108(a) partially incident on a portion of a sample 104 whose material will be milled or otherwise removed by the wide ion beam 108. The mask 114 is composed of a hard material that is not degraded by the wide ion beam 108, thereby allowing it to be used to process multiple samples.

[0017] The sample stage area 112 may also include a holder interface configured to receive a sample holder 116 so that it can be positioned and held relative to the mask 114 during processing of the sample 104, such that the mask protects a portion of interest in the sample. In some embodiments, the sample stage area 112 may include a stage element capable of translating, tilting, or rotating the sample 104 / sample holder 116. Additionally, in such embodiments, the stage element may also be configured to translate, tile, or rotate the sample 104 / sample holder 116 as the BIB source 106 emits the broad ion beam 108 toward the sample 104. For example, the stage element may be configured to periodically or continuously rotate the sample 104 / sample holder 116 through a series of predefined angular positions and / or to rock the sample 104 / sample holder 116 between two angular positions during milling with the broad ion beam. This translation / tilting / rotation may be performed at a constant or varying speed. In this manner, the stage element may dynamically change the portion of the sample 104 irradiated by the wide ion beam 108 to allow for more efficient or otherwise optimized removal of sample material and / or polishing of regions of interest by the BIB system 102 .

[0018] The sample holder 116 is configured to hold the sample 104 during processing and during transport of the sample 104 into, out of, and / or within the BIB system 102 . Figure 1 The BIB system 102 is also shown as including one or more additional samples 104(a) held by corresponding additional sample holders 116(a). In some embodiments, the BIB system 102 has one or more optional sample storage volumes / areas 118 in which sample holders can be parked within the BIB system 102 when the samples 104 they hold are not currently being processed. Figure 1 The BIB system 102 is also shown as including a storage cartridge 120 configured to hold a plurality of sample holders 116 positioned within a cartridge storage volume 122. The storage cartridge 120 is configured to allow numerous samples 104 and their corresponding sample holders 116 to be transported and / or loaded into the BIB system 102.

[0019] In some embodiments, the sample holder 116 may include one or more optional adjustment elements 124 that allow the sample 104 to be translated, tilted, rotated, or otherwise repositioned relative to the sample holder 116, the broad ion beam 108, and / or the mask 114. In embodiments having such adjustment elements 118, the BIB system 112 may include one or more interface elements that allow a user to manipulate the adjustment elements or the sample holder 116 itself so that the sample 104 has a desired geometric relationship with the mask 114 or a feature of the mask (e.g., the mask edge 114(a)). Figure 1 Adjustment element 124 is shown as a screw, but one of ordinary skill in the art will understand that there are many types of known adjustment elements that can translate, tilt, rotate, or otherwise reposition a sample relative to various types of sample holders. Figure 1 Also shown is a sample holder manipulator 126 configured to reposition the sample holder 116 within the BIB system 102. For example, the sample holder manipulator 126 can be configured to move the sample holder between the sample holder storage volume 118 and the sample stage area 112. Additionally, in some embodiments, the sample holder manipulator 126 can be further configured to engage the adjustment element 124 to cause translation, tilt, rotation, etc. of the sample 104.

[0020] The BIB system 102 also includes a housing 128 that defines an interior volume 130. In some embodiments, the interior volume can be a sealed volume that does not allow gases from the external environment to pass through. In such embodiments, the interior volume can include a pump system 132 configured to adjust the pressure of the interior volume 130 and / or change the gaseous composition of the environment within the interior volume. For example, the pump system 132 can cause the interior volume 130 to be at a lower pressure than the environment outside and / or to be at a vacuum. Although Figure 1 At least a portion of a pump system 132 is shown as optionally included within the internal volume, but those skilled in the art will appreciate that some or all of such pump system 132 may be located external to the internal volume 130. Alternatively, the pump system 132 may cause the gas composition of the environment within the internal volume 130 to be composed of an inert gas (e.g., a gas that does not interact with the broad ion beam 108 and / or the sample 104 material during processing). The BIB system 102 is also shown as having a sample holder port 134 through which the sample holder 116 can be inserted into and / or removed from the BIB system 102. Additionally, Figure 1 The BIB system 102 is also shown with an optional cartridge port 136 configured to allow the storage cartridge 120 to be inserted into and / or removed from the BIB system 102 .

[0021] Figure 1 The BIB system 102 is also shown as including a source housing 138 that defines a source volume 140 configured to contain the BIB source 106. The source housing 138 further defines a BIB aperture 142 that connects the source volume 140 with the interior volume 130, and a BIB source maintenance aperture 144 (e.g., a flange, door, or other type of sealable component that allows the source housing 138 to be switched between a sealed and unsealed state relative to the external environment) that allows the BIB source 106 to be removed from or reinstalled within the source volume 140 (i.e., the source maintenance aperture 144 allows the BIB source 106 to be removed or accessed via the aperture 144 when unsealed). The BIB system 102 may also include a valve 146 configured to switch between an open state, in which ions emitted from the BIB source 106 are allowed to pass from the source volume 140 to the interior volume 130 through the BIB aperture 142, and a sealed state, in which the valve 146 prevents ions or emissions from the sample 104 from passing from the interior volume 130 to the source volume 130. Those skilled in the art will understand that the valve 146 may correspond to any of a shutter, a valve, a door, or other sealing mechanism capable of switching between open and closed states.

[0022] Figure 1104 and 114. In some embodiments, when the valve 146 is in a closed state, the source volume 140 can be opened to the external environment (e.g., via the BIB source maintenance port 144) without affecting the pressure within the internal volume. In this way, when the valve 146 is in a closed state, the BIB source maintenance port 144 can be opened to allow the BIB source 106 to be cleaned, adjusted, removed, replaced, and / or otherwise maintained without affecting the pressure or gas composition of the internal volume 130. In such embodiments, the source volume 140 can also include an optional pump system capable of reestablishing the pressure and / or gas composition to match the pressure and / or gas composition of the internal volume 130. The BIB source maintenance port 144 can include a port configured to switch between an open state and a closed state, in which the first BIB source 106 can be removed from or reinstalled in the source volume 140, and in which the source volume 140 is sealed from the external environment.

[0023] Unlike a focused ion beam (FIB) system, the BIB system 102 does not include an optical column that includes optical elements configured to focus the ions emitted by the BIB source 106 so that they have a small spot size in and around the sample plane of the sample 104. Because such optical elements are only capable of focusing, correcting, tuning, and / or otherwise manipulating ion beams below a certain intensity threshold, and because such optical elements do not need to focus the ions emitted by the BIB source 106, the intensity of the wide ion beam (i.e., the main beam current) used in the BIB system 102 can be much greater than in a FIB system. This increase in beam current allows the BIB system 102 to remove sample material much faster than a FIB system. Applicants note that those skilled in the art will appreciate that some optical elements may be included to focus the wide ion beam in the BIB system 102, but including such elements will impose a smaller beam current limit (compared to in a FIB system) on the BIB system 102.

[0024] Due to the increased beam intensity of the wide ion beam 108, the material of the sample 104 on which the wide ion beam 108 is incident is removed at a rate faster than that of the FIB milling process. Specifically, because the wide ion beam 108 has a higher beam intensity and is incident on the large area of ​​the sample, the rate at which material is removed from the sample 104 is much higher than in a FIB system. Unfortunately, due to this increase in sample material removal, as the portion of the sample 104 removed by the wide ion beam 108 is redeposited on the surface within the internal volume 130 and / or source volume 140, material redeposition increases proportionally. In current BIB systems, this redeposition causes a large reduction in efficiency because the redeposition on the BIB source 106 forces the user to frequently remove and / or otherwise approach the BIB source 106 for cleaning and maintenance. Due to this cleaning and maintenance, current BIB systems have a high rate of downtime, in which they cannot be used for sample processing.

[0025] Figure 1 The BIB system 102 is shown to include an optional additional BIB source 148 that is configured to emit an additional wide ion beam along an emission axis 150. The additional BIB source 148 is shown positioned within an additional source volume 152 defined by an additional source housing 154. The additional source housing 154 also defines an additional BIB aperture 156 that connects the additional source volume 148 with the interior volume 130, and an additional BIB source maintenance aperture 158 that allows the additional BIB source 148 to be removed from or reinstalled within the additional source volume 148.

[0026] The BIB system 102 may also include an additional valve 160 configured to switch between an open state, in which ions emitted from the additional BIB source 148 are allowed to pass from the additional source volume 152 to the internal volume 130 through the additional BIB aperture 156, and a sealed state, in which the additional valve 160 prevents ions or emissions from the sample 104 from passing from the internal volume 130 to the additional source volume 152. When the valve 160 is in the closed state, the additional source volume 152 can be opened to the external environment (e.g., via the additional BIB source maintenance aperture 158) without affecting the pressure within the internal volume 130. Thus, when the valve 160 is in the closed state, the BIB source maintenance aperture 158 can be removed to allow the additional BIB source 148 to be cleaned, adjusted, removed, replaced, and / or otherwise maintained without affecting the pressure or gas composition of the internal volume 130.

[0027] Figure 1The valve 160 is shown in a closed state so that sample material removed from the sample 104 via the wide ion beam 108 is not allowed to enter the additional source volume 152 and / or be redeposited on the additional BIB source 148. In accordance with the present invention, because no redeposition occurs on the additional BIB source 148 when the BIB source 130 is in use, the additional BIB source 148 will be able to be used to process the sample 104 (or additional samples) when the BIB source 140 needs to be removed and / or accessed for cleaning and / or maintenance. Therefore, because the valve 146 can be closed to seal the source volume 140 from the internal volume 130, the valve 160 can be opened to allow the additional BIB source 148 to be used to emit an additional wide ion beam through the additional BIB aperture 156 to process the sample. Therefore, in some embodiments of the present disclosure, the BIB system 102 is able to process samples continuously without downtime, thereby greatly increasing its efficiency. Additionally, although not shown in FIG. Figure 1 , but in various embodiments, the BIB system 102 may include only one BIB source or may include three or more BIB sources.

[0028] Figure 1 The BIB system 102 is also shown as optionally including a laser source 162 located within a laser volume 164, which can be configured to emit a beam through a laser aperture 166 defined by a laser housing 168. The beam emitted by the laser source 162 has a higher beam energy and / or intensity than the wide ion beam 108, thereby allowing the beam to remove sample material on which the beam is incident at a rate that is 10-50x greater than that possible with a wide ion beam. For example, in less than 10 minutes, an optical laser can remove as much nickel or cobalt as a wide ion beam can remove in 90 minutes. Furthermore, for harder materials such as graphite, currently a wide ion beam would require up to four hours to remove the same amount of material as the beam can remove in less than 10 minutes.

[0029] However, while removing sample material by a beam is faster, milling and / or processing by the beam also causes damage / burning on the remaining sample surface. Therefore, in an embodiment of the present invention, the BIB system 102 can use a beam to quickly remove an initial portion of the sample 104, and the final portion of the sample 104 that needs to be removed is removed using a broad ion beam from a BIB source (e.g., BIB source 106, additional BIB source 148, or another BIB source within the BIB system 102). In this way, a beam can be used to remove a large portion of the sample 104, and then the broad ion beam can be used to expose an area of ​​interest and / or produce a smoother or undamaged surface.

[0030] Figure 1 Also shown is a computing device 170 associated with the BIB system 102 . Figure 1Computing device 170 is shown as being separate from external device 112, however, in various embodiments, one or more of these elements may be combined. That is, applicants note that computing device 170 can be a component of BIB system 102, a separate device from BIB system 102 that communicates via a network communication interface, or a combination thereof.

[0031] Those skilled in the art will appreciate that Figure 1 The computing device 170 depicted in the figures is merely illustrative and is not intended to limit the scope of the present disclosure. Computing systems and devices may include any combination of hardware or software that can perform the indicated functions, including computers, network equipment, Internet facilities, PDAs, wireless phones, controllers, etc. The computing device 170 may also be connected to other devices not shown, or may instead operate as a standalone system. Additionally, in some embodiments, the functionality provided by the components shown may be combined in fewer components or distributed in additional components. Similarly, in some embodiments, the functionality of some of the components shown may not be provided and / or other additional functionality may be used.

[0032] Figure 1 Also included is a schematic diagram illustrating an exemplary computing architecture 180 of the computing device 170. The exemplary computing architecture 180 illustrates additional details of hardware and software components that may be used to implement the techniques described in this disclosure. In the exemplary computing architecture 180, the computing hardware 170 of the BIB system 102 includes one or more processors 182 and a memory 184 communicatively coupled to the one or more processors 182.

[0033] The exemplary computing architecture 180 may include at least a control module 188 and a sample processing module 190 stored in the memory 184. The exemplary computing architecture 180 is further shown as including sample information 192 and a processing schedule 194 stored on the memory 184. The sample information 192 may correspond to data describing characteristics of the sample, identification information of the sample, history of the sample, status of the sample, position of the sample on the sample holder, composition of the sample, regions of interest within the sample, surfaces of interest on the sample, etc. The processing schedule 194 may include one or more methods, settings, or instructions for processing the sample 104 through the BIB system 102 to achieve a desired result (i.e., exposing and polishing the surface of interest within the sample 104 so that it can be inspected using the charged particle microscope system). For example, the processing schedule 194 may include combining Figures 3 to 6The steps of one or more methods shown and described. The sample processing schedule 194 for the sample may include laser intensity, laser milling time, a portion of the sample to be removed by the laser, BIB intensity, BIB milling time, a portion of the sample to be removed by the BIB, a surface of interest, a processing order, sample identification information, an area of ​​the sample to be removed, or a combination thereof. For example, the sample processing schedule 194 can be a data structure that identifies a plurality of steps to be performed by components of the BIB system 102 in a particular order, wherein the data structure can also identify various parameters of the components and / or individual steps. In some embodiments, such a processing schedule 194 can be at least partially presented to a user of the BIB system 102 to guide the processing of the sample, can be used at least in part by the computing device 170 to automate and / or adjust settings associated with the processing of the sample, or a combination thereof.

[0034] In some embodiments, the sample information 192 and / or individual processing schedules 194 can be input into the computing device 170 by a user (e.g., using a keypad, keyboard, mouse, voice command, touch screen, etc.), received via a hardware connection (e.g., CD / DVD, USB, HDMI, portable storage, etc.), received through a network connection (e.g., Bluetooth, Wi-Fi, the Internet, etc.), received in association with a sample being inserted into the BIB system 102 (e.g., accessible memory on the sample holder 116), generated based on sensor information or the sample information 192, or a combination thereof. For example, in an exemplary embodiment, the BIB system 102 can be configured to receive an identifier via an RFID on the sample holder 116, access the sample information 192 associated with the identifier via a network connection, and then identify or generate a processing schedule 194 for the sample 104 based on the identifier, the sample information, or both.

[0035] As used herein, the term "module" is intended to represent an exemplary division of executable instructions for the purposes of discussion and is not intended to represent any type of requirement or required method, approach, or organization. Thus, while various "modules" are described, their functionality and / or similar functionality may be arranged in different ways (e.g., combined into a smaller number of modules, broken down into a larger number of modules, etc.). Furthermore, while particular functions and modules are described herein as being implemented by software and / or firmware executable on a processor, in other examples, any or all of the modules may be implemented in whole or in part by hardware (e.g., a dedicated processing unit, etc.) to perform the described functions.

[0036] The control module 188 can be executed by the processor 182 to cause the computing device 170 and / or the BIB system 102 to take one or more actions and / or perform steps of a sample processing schedule. In some embodiments, the control module 188 can be executed to adjust settings of individual components of the BIB system 102 (e.g., a BIB source, a laser source, etc.), cause individual components of the BIB system 102 to perform specific operations (e.g., move a sample holder within the BIB system 102, open or close a valve, emit a wide ion beam, emit a light beam, align a sample, adjust pressure settings or gases present in volumes 130, 140, and / or 152, etc.), or a combination thereof. For example, the control module 188 may be executable to cause the sample holder manipulator 126 to engage a desired sample holder 116 stored within the BIB system 102 (e.g., stored in a storage cartridge 120 located within the cartridge storage volume 122, stored in the sample holder storage volume 118, etc.), and translate, tilt, and / or rotate the engaged sample holder 116 to the sample stage area 112 so that it nests with the mask 114 and the sample 104 has a desired geometric relationship with the mask 114. In such an example, the control module 118 may be further executable to return the sample holder 116 to the position in which it was stored within the BIB system 102 once the sample 104 has been processed, and then engage an additional sample holder 116, and then translate the additional sample holder 116 to the sample stage area 112 so that the additional sample 104 can be processed.

[0037] Alternatively or in addition, the control module 188 may cause the display 186 to present a processing protocol to the user, present information about the sample being processed, etc. For example, the control module 188 may present video / image information of the alignment of the sample with the mask 114, the removed / polished / processed surface of the sample 104, etc. In some embodiments, the control module 188 may cause the display 186 to present a graphical user interface that includes selectable interfaces that allow the user to input and / or change data associated with the sample 104 and / or select protocol steps or component configurations to be used when processing the sample 104.

[0038] The sample processing module 190 can be executed by the processor 182 to at least partially automate the processing of the sample 104 by the BIB system 102. For example, the sample processing module 190 can be executed to reposition the sample holder 116 in the BIB system 102, access sample information 192 of the sample, determine a processing schedule 194 for the sample 104, adjust the configuration of components of the BIB system 102 driver, and / or cause components of the BIB system 102 to perform processing of the sample 104. According to the present invention, the sample processing module 190 can obtain sample information 192 of the sample 104 to be processed. In various embodiments, the sample processing module 190 can obtain information by receiving information from a user input via a hardwired or wireless connection. Alternatively or in addition, the sample processing module 190 can obtain information by determining information based on sensor information.

[0039] The sample processing module 190 may also be operable to determine a desired component configuration of components of the BIB system 102 based on user input, sample information 192 of the sample 104, a processing schedule 194 associated with the sample 104, or a combination thereof. For example, based on the sample information 192 indicating the composition of the sample material to be removed and the amount of material to be removed, the sample processing module 190 may determine a desired broad ion beam intensity (e.g., BIB current, accelerating voltage, stage shaking, etc.) and a time for irradiation with the broad ion beam required to process the sample 104, and may adjust the BIB source 106 configuration and / or the associated processing schedule 194 accordingly.

[0040] In addition, the sample processing module 190 can also be executed to obtain a processing schedule 194 associated with the sample to be processed 104. Obtaining the processing schedule 194 can correspond to accessing a predetermined processing schedule from an accessible data structure, modifying a predetermined processing schedule, generating a processing schedule for the sample, or a combination thereof. For example, after determining an identifier for the sample (e.g., by scanning a barcode on the sample holder 116), the sample processing module 190 can use the identifier to access the sample information 192 and / or the processing schedule 194 from a data structure stored on an accessible memory. Alternatively or in addition, a user can input an identifier for the sample, sample information 194, desired processing results, the likeness of the processing to occur, etc., which the sample processing module 190 can use to generate a customized processing schedule 194 that will cause the BIB system 102 to perform the desired sample processing. For example, based on the specifications of the processing schedule 194, the sample processing module 190 can cause the BIB system 102 to use Figures 3 to 6The sample processing module 190 may process one or more samples 104 using any of the methods shown. In some embodiments, the sample processing module 190 may provide a series of GUIs on the display 186 that allow the user to approve and / or give instructions to perform the steps of the processing schedule 194. The sample processing module 190 may further be executable to perform some or all of the steps of the processing schedule 194 independent of user input.

[0041] The sample processing module 190 may be further executed by the processor 182 to automatically move the sample holder 116 within the BIB system 102 so that many samples 104 can be processed continuously. For example, based on user input identifying multiple samples to be processed, the sample processing module 190 may cause the sample holder manipulator 126 to sequentially move the associated sample holder 116 between a storage location (e.g., a storage box 120 positioned within the box storage volume 122, a sample holder storage volume 118, etc.) and the sample stage area 112 so that each identified sample can be processed. Because the sample processing module 190 is further configured to cause the BIB system 102 to perform some or all processing steps without user input, the sample processing module 190 allows the BIB system 102 to automatically process multiple samples quickly and continuously and without user supervision. In this way, the BIB system 102 of the present disclosure allows a single user to monitor sample processing of many samples across multiple BIB systems 102, and / or leave the BIB system 102 without user supervision to process a series of samples over a long period of time.

[0042] The computing device 170 includes one or more processors configured to execute instructions, applications, or programs stored in a memory accessible to the one or more processors. In some instances, the one or more processors may include a hardware processor, including but not limited to a hardware central processing unit (CPU), a graphics processing unit (GPU), and the like. Although in many cases, these techniques are described herein as being performed by one or more processors, in some cases, these techniques may be implemented by one or more hardware logic components (e.g., a field programmable gate array (FPGA), a complex programmable logic device (CPLD), an application specific integrated circuit (ASIC), a system on a chip (SoC), or a combination thereof).

[0043] One or more processor-accessible memories are examples of computer-readable media. Computer-readable media can include two types of computer-readable media: computer storage media and communication media. Computer storage media can include volatile and non-volatile, removable and non-removable media implemented in any method or technology for storing information, such as computer-readable instructions, data structures, program modules, or other data. Computer storage media include, but are not limited to, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EEPROM), flash memory or other storage technology, compact disc read-only memory (CD-ROM), digital versatile disk (DVD) or other optical storage devices, magnetic cassettes, magnetic tape, magnetic disk storage devices or other magnetic storage devices, or any other non-transmission media that can be used to store desired information and can be accessed by a computing device. In general, computer storage media can include computer-executable instructions that, when executed by one or more processing units, cause the various functions and / or operations described herein to be performed. In contrast, communication media embodies computer-readable instructions, data structures, program modules, or other data in a modulated data signal (such as a carrier wave) or other transmission mechanism. As defined herein, computer storage media does not include communication media.

[0044] Those skilled in the art will also understand that for the purposes of memory management and data integrity, projects or portions thereof may be transferred between memory and other storage devices. Alternatively, in other specific implementations, some or all of the software components may be executed in memory on another device and communicate with the computing device 170. Some or all of the system components or data structures may also be stored (e.g., as instructions or structured data) on a non-transitory computer-accessible medium or portable article of manufacture to be read by an appropriate driver, various examples of which are described above. In some specific implementations, instructions stored on a computer-accessible medium separate from the computing device 170 may be transmitted to the computing hardware and computing device 170 via a transmission medium or signal (such as an electronic, electromagnetic or digital signal transmitted via a communication medium such as a wireless link). Various specific implementations may further include receiving, sending or storing instructions and / or data implemented on a computer-accessible medium as described above.

[0045] Figure 2 is a diagram of an exemplary environment 200 in which the BIB system 102 is used to more efficiently process multiple samples within a sample preparation workflow. Specifically, Figure 2The environment 200 is shown as including a sample preparation station 202, a sample transport device 250, a BIB system 102, and a charged particle microscope 260. However, one skilled in the art will understand how different stations, components, and devices may be used to allow the BIB system 102 according to the present disclosure to effectively process samples. For example, the exemplary environment 200 or the components / stations / devices therein may be used to practice Figures 3 to 6 and other procedures described herein.

[0046] Figure 2 The sample preparation station 202 is shown as a hooded work area with controlled pressure and atmospheric gas composition. Specifically, Figure 2 The sample preparation station 202 is shown to include a barrier material 204 defining a working volume 206, and one or more optionally sealable apertures 208 through which components can be transferred between the working volume 206 and the external environment. However, those skilled in the art will appreciate that the sample preparation station 202 can correspond to an open environment. Additionally, although the sample preparation station 202 is Figure 2 202 is shown as being separate from the BIB system 102, but those skilled in the art will understand that in some embodiments, the sample preparation station 202 may be included in a chamber within the BIB system 102 that is separate from the internal volume, so that a sample can be aligned on a sample holder in the sample preparation station 202 while a different sample is processed by a BIB source within the internal volume of the BIB system 102.

[0047] In some embodiments, a user can select the pressure and atmospheric gas composition within the working volume 206 so that they are optimal for the preparation of a desired type of sample 210. The working volume 206 is depicted as containing exemplary elements for preparing samples 210 for processing in the BIB system 102. For example, the working volume 206 is shown to include a plurality of samples 210 that have been harvested / generated and are ready for examination, a plurality of empty sample holders 212 in which the samples 210 can be positioned, an exemplary aid 214 for aligning / positioning the samples on the sample holders, and a sample holder 216 containing the samples. While the exemplary aid 214 is shown as an optical microscope system, those skilled in the art will appreciate that different types of samples 210 / preparation workflows may require different types of aids to optimally align / position the samples on the sample holders.

[0048] In some embodiments of the present invention, the preparation station also includes an additional mask 218 for aligning the sample 210 on the sample holder 212. The additional mask 218 is geometrically configured so that when the sample is aligned and / or positioned to have a specific geometric relationship between the sample and the edge of the additional mask 218 when the sample holder and the additional mask 218 are nested, then when the sample holder and the mask 114 are nested within the BIB system 102, the sample 210 will have the same specific geometric relationship between the sample and the edge of the mask 114 (a). This geometric similarity between the mask 114 and the additional mask 218 allows the sample to be aligned on its corresponding sample holder without taking up potential time that the BIB system 102 can process the sample with a wide ion and / or beam. In some embodiments, aligning the sample within the sample preparation station 202 can correspond to optically aligning the sample without using the additional mask 218. For example, the sample can be optically aligned relative to the sample holder by adjusting an adjustable portion of the sample holder so that the sample will be in a desired position, where the sample holder and mask 114 are nested within the BIB system 102. Exemplary methods for optically aligning the sample in this manner include, but are not limited to, adjusting the edge of the sample to a marked position (e.g., using an optical microscope and / or image recognition algorithms), using laser gate sensing to determine the desired position, etc.

[0049] in addition, Figure 2 The sample preparation system is shown to include a storage box 220 that is configured to hold a plurality of sample holders 216. The storage box 220 is configured to allow many samples 204 and their corresponding sample holders 216 to be transported to and / or loaded into the BIB system 102. In this manner, a user can pre-align each of the plurality of samples 210 using the additional rods 218 and then load them within the storage box 220.

[0050] Figure 2 Also shown is an optional sample transport device 204 that is configured to transport sample holders 216 between the sample preparation station 202 and the BIB system 102 and / or between the BIB system 102 and the charged particle microscope 206. In some embodiments, the sample transport device 204 can maintain a desired pressure and / or gas environment around the sample holder 216 during transport. In such embodiments, the sample transport device 204 allows samples to be prepared in the sample preparation station 202, processed in the BIB system 102, and studied in the charged particle microscope 206 without being exposed to pressures or gases other than the desired pressure and / or gas environment. Alternatively, the sample holders 216 or the storage box 220 themselves can be transported between the sample preparation station 202 and the BIB system 102. In some embodiments, the storage box 220 can be capable of maintaining the multiple sample holders 216 it contains at a desired pressure and / or gas environment.

[0051] Figure 2 The exemplary environment 200 is also shown as including Figure 1 An exemplary BIB system 102 is described. The BIB system 102 includes a BIB source 106 and an optional additional BIB source 148 configured to emit a wide ion beam along a BIB axis toward a sample stage region 112. The wide ion beam is configured such that when a portion of the wide ion beam is incident upwardly on a sample 210, material of the sample on which the wide ion beam is incident is milled or otherwise removed from the sample. The sample stage region 112 may include a mask 114 configured to block a portion of the wide ion beam so that sample material corresponding to a portion of interest is not milled or otherwise removed from the sample 210 by the incident ions. The sample stage region 112 may also include a holder interface configured to receive a sample holder 216 so that it can be positioned and held relative to the mask 114 during processing of the sample 210 so that the mask protects the portion of interest in the sample. The BIB system 102 is also shown as including an optional laser source 162. The BIB system 102 is configured as shown in Figure 1 As described in the discussion of and / or in accordance with Figures 3 to 6 Samples were processed using the methods described in

[15] and other procedures described herein.

[0052] The exemplary environment 200 is also depicted as including a charged particle microscope system 206 for examining a sample 210 that has been processed by the BIB system 102 according to the present invention. The exemplary charged particle microscope system 206 may include an electron microscope (EM) setup or an electron lithography setup that is configured to irradiate and / or otherwise impact the sample 210 with a charged particle beam 222 (typically an electron beam or an ion beam). In various embodiments, the charged particle microscope system 206 may be or include one or more different types of EM and / or charged particle microscopes, such as, but not limited to, a scanning electron microscope (SEM), a scanning transmission electron microscope (STEM), a transmission electron microscope (TEM), a charged particle microscope (CPM), a dual-beam microscope system, etc. Additionally, in some embodiments, the TEM may also be capable of operating as a STEM. Figure 2 Exemplary charged particle microscope system 206 is shown as a scanning electron microscope (SEM) 224 .

[0053] Figure 3 An exemplary process 300 for processing samples by a dual BIB system that achieves increased system uptime according to the present invention is depicted. The process 300 can be implemented by either of the BIB systems 102 in any environment, including any exemplary environment 200 for more efficiently processing multiple samples within a sample preparation workflow.

[0054] At step 302, it is optional to determine the sample to be processed. For example, the sample to be processed can be determined based on an input received from a user via an interface on the BIB system or via an associated computing device. Alternatively, the sample to be processed can be determined by the BIB system or an associated computing device that accesses a data structure (i.e., a table, a schedule, metadata, etc.) and / or performs an instruction that causes the next sample to be processed. For example, the BIB system can be configured so that it sequentially accesses a plurality of sample holders stored therein, thereby allowing the user to preload a plurality of samples into the BIB system to be automatically processed continuously. In such examples, the BIB system of the associated computing device will track the order in which the sample is to be processed, and which sample in the plurality of samples will be processed next.

[0055] At step 304, determine the processing schedule of the sample. The processing schedule of the sample corresponds to the BIB system configuration and workflow settings, and will follow the BIB system configuration and workflow settings to achieve the desired processing results of the sample (e.g., BIB intensity, BIB milling time, a part of the sample to be removed by BIB, surface of interest, or a combination thereof). In some embodiments, the processing schedule can be input by the user by selecting a processing schedule from a list of pre-made processing schedules, input / generate a new processing schedule, input a separate step or configuration instruction, or a combination thereof. For example, an associated computer can present a graphical user interface that includes a selectable interface that allows the user to input and / or change the data associated with the sample and / or select the protocol steps or component configurations to be used when processing the sample. In another example, when the BIB system is frequently used to process a specific type of sample to prepare it for a specific inspection modality, the BIB system or an associated computer may have stored user-selectable (manually or via metadata associated with the sample, sample holder, etc.) to initiate the associated processing schedule of the frequently used processing configuration / workflow.

[0056] In some embodiments, a processing schedule and sample information associated with the sample to be processed may be received. The sample information includes one or more of sample identification information, sample composition, region of interest, surface of interest, associated processing schedule, etc. Alternatively or in addition, the BIB system or an associated computing system may use predefined rules / instructions to determine a processing schedule for the sample based on the sample information. For example, a user may enter an identifier for the sample, which the BIB system may use to access a data structure specifying relevant sample information, and the BIB system may then use the predefined rules to create a custom processing schedule that will cause the BIB system to perform the desired processing of the sample. For example, the BIB system may set the beam intensity of a broad ion beam based on the composition of the material to be removed, and / or adjust the milling time based on the amount of material to be removed.

[0057] At step 306, the sample is prepared for processing. Preparing the sample for processing may include harvesting the sample from a larger sample or otherwise generating the sample (e.g., growing or depositing a portion of the sample), loading the sample onto a sample holder, aligning the sample, transporting the sample to the BIB system, transporting the sample rack to a sample stage area within the BIB system, etc. For example, the BIB system may cause a component sample holder transport element to retrieve a sample holder associated with the sample to be processed from a storage area and translate, tilt, and / or rotate the sample holder so that the geometric relationship between the sample and the protective mask is such that the mask will protect the desired portion of the sample during irradiation / milling.

[0058] At step 308, the BIB source is caused to emit a wide ion beam toward the sample. Figure 3 Step 310 is also shown as being performed when emitting a wide ion beam toward the sample. At step 310, an additional BIB source is accessed. According to the present invention, the additional BIB source is positioned in a volume that can be selectively sealed from the inside of the BIB system via a valve. In this way, when the valve is closed, milling material from the sample cannot enter the volume containing the additional BIB source. In addition, in some embodiments, when accessing the additional BIB source, pressure and / or gas composition are unaffected. In various embodiments, accessing the additional BIB source at 310 may include removing the additional BIB source 312 (e.g., for cleaning, adjustment, repair, etc.) from the BIB system, performing maintenance (e.g., cleaning, alignment, etc.) on the additional BIB system 314, replacing the additional BIB source 316 (e.g., reinstalling the BIB source after cleaning / maintenance), and / or installing one or more of the new BIB source 318 in the BIB system.

[0059] In step 320, portions of the sample are removed by a broad ion beam. According to the present invention, step 320 may include milling by a source other than a broad ion beam, such as Figure 4 The dual optical and ion milling process described in . In step 320, portions of the sample not obscured by the protective mask are removed from the sample. In this way, regions of interest and / or portions of the sample that will undergo additional processing can be quickly exposed.

[0060] At step 322, it is determined whether another sample is to be milled. If the answer at 322 is yes, the process returns to step 302 and determines the sample to be processed. In this way, a large number of samples can be processed while accessing additional BIB systems. If the answer at 322 is no, the process 300 can end.

[0061] Figure 4A sample process 400 for processing a sample by a dual-mode, optical, and BIB milling system for more efficient sample processing according to the present invention is described. The process 400 can be implemented by any of the BIB systems 102 in any environment, including any exemplary environment 200 for more efficiently processing multiple samples within a sample preparation workflow.

[0062] At step 402, a sample to be processed is optionally determined. For example, the sample to be processed may be determined based on input received from a user via an interface on the BIB system or via an associated computing device. Alternatively, the sample to be processed may be determined by the BIB system or an associated computing device accessing data structures (i.e., tables, schedules, metadata, etc.) and / or executing instructions that result in determining the next sample to be processed.

[0063] At step 404, a processing schedule for the sample is determined. The processing schedule for the sample corresponds to a BIB system configuration and workflow settings that are to be followed to achieve a desired processing result for the sample (e.g., BIB intensity, BIB milling time, a portion of the sample to be removed by the BIB, a surface of interest, or a combination thereof). In various embodiments, the processing schedule can be input by a user, received along with sample information associated with the sample to be processed, or determined by the BIB system (e.g., based on the sample information).

[0064] At step 406, the sample is prepared for processing. Preparing the sample for processing may include harvesting the sample from a larger sample or otherwise generating the sample (e.g., growing or depositing a portion of the sample), loading the sample onto a sample holder, aligning the sample, transporting the sample to the BIB system, transporting the sample rack to a sample stage area within the BIB system, etc. For example, the BIB system may cause a component sample holder transport element to retrieve a sample holder associated with the sample to be processed from a storage area and translate, tilt, and / or rotate the sample holder so that the geometric relationship between the sample and the protective mask is such that the mask will protect the desired portion of the sample during irradiation / milling.

[0065] At step 408, a laser source is caused to emit a beam of light (e.g., a laser) toward the sample. The beam emitted by the laser source has a higher beam energy and / or intensity than a broad ion beam. In step 410, a first portion of the sample is removed by the beam. Due to the increased intensity of the beam, the beam can remove sample material upon which it is incident at a rate 10-50x greater than that possible with a broad ion beam. However, while removal of sample material by the beam is faster, the milling and / or processing performed by the beam also causes damage / burning on the remaining sample surface.

[0066] At step 412, the BIB source is caused to emit a wide ion beam toward the sample, and at step 414, a second portion of the sample is removed by the wide ion beam. Because the wide ion beam can remove sample material without damaging the sample surface, the wide ion beam can remove the final portion of the sample (i.e., the damaged portion of the sample) without causing further damage to the sample. In this way, once the majority of the material has been quickly removed by the beam, the wide ion beam can be used to remove the final portion of the sample to expose the region of interest.

[0067] Figure 5 Depicted is a sample process 500 for processing multiple samples with reduced downtime within a dual BIB system according to the present invention. The process 500 can be implemented by any of the BIB systems 102 in any environment, including any exemplary environment 200 for more efficiently processing multiple samples within a sample preparation workflow.

[0068] At step 502, a sample to be processed is optionally determined. For example, the sample to be processed may be determined based on input received from a user via an interface on the BIB system or via an associated computing device. Alternatively, the sample to be processed may be determined by the BIB system or an associated computing device accessing data structures (i.e., tables, schedules, metadata, etc.) and / or executing instructions that result in determining the next sample to be processed.

[0069] At step 504, a processing schedule for the sample is determined. The processing schedule for the sample corresponds to a BIB system configuration and workflow settings that are to be followed to achieve a desired processing result for the sample (e.g., BIB intensity, BIB milling time, a portion of the sample to be removed by the BIB, a surface of interest, or a combination thereof). In various embodiments, the processing schedule can be input by a user, received along with sample information associated with the sample to be processed, or determined by the BIB system (e.g., based on the sample information).

[0070] The sample holder associated with the sample to be processed is removed from a storage location within the BIB system at step 506. For example, the BIB system may cause a component sample holder transport element (e.g., a sample holder manipulator) to retrieve the sample holder associated with the sample to be processed from a storage area within the BIB system and / or from a sample storage / transport device (e.g., a storage box).

[0071] At step 508, the sample holder is positioned in the sample stage area. Specifically, the sample holder transport element can translate, tilt, and / or rotate the sample holder so that the geometric relationship between the sample and the protective mask is such that the mask will protect the desired portion of the sample during irradiation / milling. In some embodiments, the sample can also be aligned with the mask based on user and / or sensor input. Alternatively or in addition, a workflow (such as Figure 6 ) to realign the sample.

[0072] At step 510, sample is processed. Specifically, the BIB source is caused to emit a wide ion beam toward the sample. The first part of the sample on which the wide ion beam is incident is milled away, while the second part of the sample blocked by the protective mask of the BIB source is not milled away. Alternatively or in addition thereto, other sample preparation workflows (including but not limited to the process described herein) can be used to process the sample in the BIB system. At step 512, the sample holder is removed from the sample stage area. That is, the sample holder transport element translates, tilts and / or rotates the sample holder so that the sample holder is stored in a storage location, a sample transport device, or is transported to outside the BIB system through a port.

[0073] At step 514, it is determined whether another sample is to be processed. If the answer at 514 is yes, the process returns to step 502 and determines the sample to be processed. If the answer at 514 is no, the process 500 may end.

[0074] Figure 6 An exemplary process 300 for processing samples by a BIB system that achieves increased system uptime according to the present invention is depicted. The process 600 can be implemented by any of the BIB systems 102 in any environment, including any exemplary environment 200 for more efficiently processing multiple samples within a sample preparation workflow.

[0075] At step 602, a sample is obtained. Specifically, the sample can be obtained by harvesting the sample from a larger sample, growing or depositing a portion of the sample, milling away a portion of the larger sample, or a combination thereof.

[0076] At step 604, the sample is secured to the sample holder, and at step 606, the sample holder is nested with the first mask. The first mask is geometrically similar to the second protective mask within the BIB system, such that a sample in a desired alignment with respect to the first mask will also be in a desired alignment with the second sample. That is, when the sample is aligned with the first mask to the desired position on the sample holder, it does not need to be further aligned when the sample holder is subsequently nested in the second mask in the BIB system.

[0077] At step 608, the sample is aligned with the first mask. For example, the user can use an optical microscope, a sensor, or vision to manipulate the sample alignment element on the sample holder so that the sample is translated, tilted, or rotated until it is in the desired alignment position. Once the sample is aligned, the sample holder can be translated to the sample storage area in the BIB system and / or translated from a sample storage / transport device (e.g., a storage box). For example, after the sample is pre-aligned in this way, the sample holder can be transported to a storage location in the BIB system where the sample will be processed. In some embodiments, the BIB system may have a separate sample alignment chamber in which some or all of steps 602-608 can be performed, and the sample manipulation element can transport the sample holder containing the aligned sample to a storage location in the BIB system. In this way, when the user aligns the sample with the first mask, the BIB system can use a second mask to process the pre-aligned sample.

[0078] In an alternative example, once the sample is aligned with the first mask, the sample can be loaded onto a sample transport device that protects the sample during transport / loading into the BIB system where the sample will be processed. Such a transport device can be configured to transport a single sample holder or a plurality of sample holders. In some embodiments, the transport device can maintain the pressure or gas environment around the sample during transport. In this way, the sample can be prepared in a sample preparation area with a controlled pressure and / or gas composition, and then transported to the BIB system without exposing the sample to a new pressure / gas composition.

[0079] At step 610, it is determined whether another sample is to be aligned. If the answer at 610 is yes, the process returns to step 602 and another sample is obtained. In this way, multiple samples can be pre-aligned and loaded into the sample storage area within the BIB system and / or loaded from the sample storage / transport device. Because the user can align many samples in a continuous manner, the throughput of sample preparation across multiple samples using this method can be greatly simplified.

[0080] If the answer at 610 is no, process 600 continues at step 612, where the sample holder is nested with the second mask within the BIB system. Because the sample is pre-aligned with the first mask, the sample holder does not require further alignment when it is nested with the second mask. This greatly increases the speed at which samples can be processed within the system.

[0081] At step 614, the sample is processed by the BIB system. For example, portions of the sample can be removed by a light beam or a broad ion beam according to any of the processes described herein. Additionally, because most user input currently required by current BIB systems is associated with the alignment process, by using this process to pre-align samples, the required user input can be performed all at once during the alignment of multiple samples, and the remaining processing steps can be at least partially automated, enabling the BIB system according to the present invention to process multiple pre-aligned samples with little or no user input / oversight.

[0082] At step 616, it is determined whether another sample is to be processed. If the answer at 616 is yes, the process returns to step 612 and another sample holder is nested with the second mask. If the answer at 616 is no, the process 600 may end.

[0083] Figure 7A and Figure 7B is an exemplary diagram illustrating pre-alignment of a sample 702 with a first mask 704 and subsequent processing of the sample 702 by a BIB system including a second mask 706. Specifically, Figure 7A Alignment of sample 702 on sample holder 708 using optical microscope 710 is shown. Figure 7B Sample 704 is shown being processed within a BIB system using a broad ion beam 712 from a BIB source 714. Because sample 702 is pre-aligned with first mask 704, and because second mask 706 is geometrically similar to first mask 704, sample 702 does not require alignment / positioning within the BIB system.

[0084]

[0026] Embodiments of the inventive subject matter according to the present disclosure are described in the following enumerated paragraphs.

[0085] A1. A broad ion beam (BIB) sample preparation system with improved uptime, the BIB sample preparation system comprising: a housing defining an internal volume; a sample stage positioned within the internal volume, wherein the sample stage is configured to hold a sample holder during polishing of a sample held by the sample holder; a first BIB source configured to emit a first broad ion beam toward the sample when in use, wherein the first BIB source is positioned within a first source housing; and a second BIB source configured to emit a second broad ion beam toward the sample when in use, wherein the first BIB source is positioned within the first source housing, wherein the second BIB source is configured to be removed when the first BIB source emits the first broad ion beam toward the sample.

[0086] A2. The BIB sample preparation system of paragraph A1, wherein the second source is further configured to be reinstalled when the first BIB source emits the first broad ion beam toward the sample.

[0087] A2.1. The BIB sample preparation system of paragraph A2, wherein the first source is configured to be removed when the second source emits the second wide ion beam toward the sample.

[0088] A2.2. A BIB sample preparation system according to any of paragraphs A2-A2.2, wherein the first source is configured to be reinstalled when the second BIB source emits the second wide ion beam toward the sample.

[0089] A3. The BIB sample preparation system of any of paragraphs A1-A2.2, wherein the first source housing and the second source housing are each at least partially located within the interior volume.

[0090] A4. The BIB sample preparation system of any of paragraphs A1-A3, wherein the first source housing at least partially defines: a first volume comprising the first BIB source; and a first aperture connecting the first volume with the interior volume.

[0091] A4.1. The BIB sample preparation system of paragraph A4 further comprises a first valve configured to switch between: an open state, in which the ions emitted from the first BIB source are allowed to pass from the first volume to the internal volume through the first hole; and a sealed state, in which the first valve prevents ions or emissions from the sample from passing from the internal volume to the first volume.

[0092] A4.1.1. The BIB sample preparation system of paragraph A4.1, wherein when the first valve is in the sealed state, the first volume is openable to the external environment without affecting the pressure within the internal volume.

[0093] A4.1.2. The BIB sample preparation system of any of paragraphs A4.1-A4.1.1, wherein when the first valve is in the sealed state, the first volume is openable to the external environment without affecting the gas composition within the internal volume.

[0094] A4.1.3. A BIB sample preparation system according to any of paragraphs A4.1-A4.1.2, wherein when the first valve is in the sealed state, the first BIB source can be at least one of removed and reinstalled from the BIB sample preparation system without affecting the pressure or gas composition within the internal volume.

[0095] A4.1.4. The BIB sample preparation system of any of paragraphs A4.1-A4.1.3, wherein when the first valve is in the sealed state, the first volume is openable to the external environment without breaking the vacuum in the interior volume.

[0096] A4.1.5. The BIB sample preparation system of any of paragraphs A4.1-A4.1.4, wherein the first valve corresponds to one of a gate, a valve, or a door.

[0097] A4.2. A BIB sample preparation system according to any of paragraphs A4-A4.1.5, wherein the first housing further defines a first BIB source maintenance aperture that allows the first BIB source to be removed from or reinstalled within the first volume.

[0098] A4.2.1. The BIB sample preparation system of paragraph A4.1 further comprises a first access port configured to switch between: an open state, in which the first BIB source can be removed from or reinstalled in the first volume; and a closed state, in which the first volume is sealed and isolated from the external environment.

[0099] A4.2.2. The BIB sample preparation system of paragraph A4.2.1, wherein the first housing is configured to allow the first volume to be pressurized independently of the interior volume or the second volume when the first valve and the first access port are each in the closed state.

[0100] A5. A BIB sample preparation system according to any of paragraphs A1-A4.2.2, wherein the second source housing at least partially defines: a second volume, the second volume comprising the second BIB source; and a second aperture, the second aperture connecting the second volume with the interior volume.

[0101] A5.1. The BIB sample preparation system of paragraph A5 further includes a second valve configured to switch between: an open state, in which the ions emitted from the second BIB source are allowed to pass from the second volume to the internal volume through the second hole; and a sealed state, in which the second valve prevents ions or emissions from the sample from passing from the internal volume to the second volume.

[0102] A5.1.1. The BIB sample preparation system of paragraph A5.1, wherein when the first valve is in the sealed state, the first volume is openable to the external environment without affecting the pressure within the internal volume.

[0103] A5.1.2. The BIB sample preparation system of any of paragraphs A5.1-A5.1.1, wherein when the first valve is in the sealed state, the first volume is openable to the external environment without affecting the gas composition within the internal volume.

[0104] A5.1.3. A BIB sample preparation system according to any of paragraphs A5.1-A5.1.21, wherein when the first valve is in the sealed state, the first BIB source can be at least one of removed and reinstalled from the BIB sample preparation system without affecting the pressure or gas composition within the internal volume.

[0105] A5.1.4. The BIB sample preparation system of any of paragraphs A5.1-A5.1.3, wherein when the first valve is in the sealed state, the first volume is openable to the external environment without breaking the vacuum in the interior volume.

[0106] A5.1.5. The BIB sample preparation system of any of paragraphs A5.1-A5.1.4, wherein the second valve corresponds to one of a gate, a valve, or a door.

[0107] A5.2. A BIB sample preparation system according to any of paragraphs A5-A5.1.5, wherein the second housing further defines a second BIB source maintenance aperture that allows the second BIB source to be removed from or reinstalled within the second volume.

[0108] A5.2.1. The BIB sample preparation system of paragraph A5.1 further comprises a second access port configured to switch between: an open state, in which the second BIB source can be removed from or reinstalled in the second volume; and a closed state, in which the second volume is sealed and isolated from the external environment.

[0109] A5.2.2. The BIB sample preparation system of paragraph A5.2.1, wherein the second housing is configured to allow the second volume to be pressurized independently of the interior volume or the first volume when the second valve and the second access port are each in the closed state.

[0110] A6. The BIB sample preparation system of any of paragraphs A1-A5.2.2, further comprising one or more additional BIB sources.

[0111] A7. A BIB sample preparation system according to any one of paragraphs A1-A5.2.2, wherein the first BIB source emits the first wide ion beam toward the sample along a first axis, the second BIB source emits the second wide ion beam toward the sample along a second axis, and the angle between the first source and the second source is between 60 degrees and 120 degrees.

[0112] A8. A BIB sample preparation system according to any one of paragraphs A1-A7, which further includes: a processor; and a memory, wherein the memory stores computer-readable instructions, which, when executed on the processor, cause the processor to initiate the execution of the method according to any one of paragraphs B1-B7.2.1.

[0113] B1. A method for operating a broad ion beam (BIB) polisher with improved uptime, the method comprising: causing a first BIB source to emit a first wide ion beam toward a sample positioned within an internal volume of the BIB polisher, wherein the first wide ion beam causes a portion of the sample upon which the first wide ion beam is incident to be removed; while the first BIB source is emitting the first wide ion beam toward the sample, removing a second BIB source from the BIB polisher, wherein the second BIB source is configured to emit a second wide ion beam toward the sample when the second BIB source is in use.

[0114] B2. The method of paragraph B1, further comprising reinstalling the second BIB source into the BIB polishing system.

[0115] B2.1. The method of paragraph B2, wherein the second BIB source is reinstalled when the first BIB source emits the first wide ion beam.

[0116] B2.1.1. The method of paragraph B2.1, wherein the second BIB source is reinstalled while the first BIB source emits the first broad ion beam toward the sample.

[0117] B2.1.2. The method of paragraph B2.1, wherein the second BIB source is reinstalled when the first BIB source emits the first broad ion beam toward a different sample.

[0118] B3. The method of any of paragraphs B1-B2.1, further comprising causing the second BIB source to emit the second wide ion beam.

[0119] B3.1. The method of paragraph B3, wherein the second wide ion beam is emitted toward the sample.

[0120] B3.2. The method of paragraph B3, wherein the second wide ion beam is emitted toward a different sample.

[0121] B4. The method of any of paragraphs B1-B3.2, further comprising installing a third BIB source into the BIB polishing system.

[0122] B4.1. A method according to paragraph B4, wherein the third BIB source is installed when the first BIB source emits the first wide ion beam.

[0123] B4.1.1. The method of paragraph B4.1, wherein the third BIB source is installed when the first BIB source emits the first wide ion beam toward the sample.

[0124] B4.1.2. The method of paragraph B4.1, wherein the third BIB source is installed when the first BIB source emits the first broad ion beam toward a different sample.

[0125] B4.2. The method of any one of paragraphs B4-B4.1.2, further comprising: causing the third BIB source to emit a third wide ion beam; and removing the first BIB source from the BIB polisher when the third BIB source emits the third wide ion beam.

[0126] B5. The method according to any one of paragraphs B1-B4.2 further includes: causing the second BIB source to emit the second wide ion beam toward a new sample positioned within the internal volume of the BIB polisher, wherein the second wide ion beam causes the portion of the new sample on which the second wide ion beam is incident to be removed; and removing the first BIB source from the BIB polisher when the second BIB source emits the second wide ion beam toward the new sample.

[0127] B6. The method of any of paragraphs B4.2-B5, further comprising reinstalling the first BIB source into the BIB polishing system.

[0128] B6.1. A method according to paragraph B6, wherein the first BIB source is reinstalled when the second BIB source emits the second wide ion beam.

[0129] B6.1.1. The method of paragraph B6.1, wherein the first BIB source is reinstalled when the second BIB source emits the second wide ion beam toward the sample.

[0130] B6.1.2. The method of paragraph B6.1, wherein the first BIB source is reinstalled when the second BIB source emits the second wide ion beam toward a different sample.

[0131] B7. The method of any of paragraphs B1-B6.1.2, wherein the BIB polisher includes a source housing defining a housing volume and a bore between the housing volume and an interior volume of the BIB polisher.

[0132] B7.1. The method of paragraph B7, wherein the second BIB source is positioned within the shell volume.

[0133] B7.2. A method according to any one of paragraphs B7-B7.1, wherein the BIB polisher further comprises a valve configured to switch between: an open state, in which the ions emitted from the second BIB source are allowed to pass from the shell volume to the internal volume through the aperture; and a sealed state, in which the valve prevents ions or emissions from the sample from passing from the internal volume to the shell volume.

[0134] B7.2.1. The method of paragraph B7.2, further comprising causing the valve to switch to the sealed state before removing the second BIB source from the BIB polisher.

[0135] C1. A method for preparing a sample by a combined broad ion beam (BIB) and laser sample preparation system, the method comprising the steps of: positioning the sample within the internal volume of the combined sample preparation system; causing the laser source component of the combined sample preparation system to emit a light beam toward the sample, wherein the light beam causes a first portion of the sample on which the light beam is incident to be removed; and causing the BIB source component of the combined sample preparation system to emit a broad ion beam toward the sample, wherein the broad ion beam causes a second portion of the sample on which the broad ion beam is incident to be removed to expose a region of interest.

[0136] C2. The method of paragraph C1, wherein the sample is irradiated by each of the light beam and the broad ion beam without removing the sample from the interior volume.

[0137] C2.1. The method of paragraph C2, wherein the sample is irradiated by each of the light beam and the broad ion beam without repositioning the sample.

[0138] C2.2. The method of any of paragraphs C2-C2.1, wherein the sample is irradiated by each of the light beam and the broad ion beam without repositioning the laser source.

[0139] C2.3. The method of any of paragraphs C2-C2.2, wherein the sample is irradiated by each of the light beam and the broad ion beam without repositioning the BIB source.

[0140] C3. The method of any of paragraphs C1-C2.3, wherein the laser source is configured to illuminate the sample with the light beam for a first time period, and the BIB source is configured to illuminate the sample with the light beam for a first time period.

[0141] C3.1. The method of paragraph C2, wherein at least one of the first time period and the second time period is a predetermined time period.

[0142] C3.2. The method of any of paragraphs C3-C3.1, wherein at least one of the first time period and the second time period is provided via user input.

[0143] C3.3. A method according to any of paragraphs C3-C3.2, wherein at least one of the first time period and the second time period is determined by accessing sample information associated with the sample.

[0144] C3.4. The method of any of paragraphs C3-C3.3, wherein at least one of the first time period and the second time period is determined based on a material of the first portion of the sample.

[0145] C3.5. The method of any of paragraphs C3-C3.4, wherein at least one of the first time period and the second time period is determined based on one or more sensors receiving information indicating that the first portion of the sample has been removed.

[0146] C3.6. A method according to any of paragraphs C3-C3.5, wherein at least one of the first time period and the second time period is determined based on one or more sensors receiving information indicating that the second portion of the sample has been removed.

[0147] C3.7. A method according to any of paragraphs C3-C3.6, wherein at least one of the first time period and the second time period is determined based on one or more sensors receiving information indicating that the region of interest has been exposed.

[0148] C3.8. A method according to any one of paragraphs C3-C3.7, wherein at least one of the first time period and the second time period is determined based on one or more of laser intensity, a portion of the sample to be removed by the laser, BIB intensity, a portion of the sample to be removed by the BIB, a surface of interest, or a combination thereof.

[0149] C4. A method according to any of paragraphs C1-C3.8, wherein the method further comprises receiving sample information.

[0150] C4.1. The method of paragraph C4, wherein the sample information is received via user input.

[0151] C4.2. The method of paragraph C4, wherein the sample information is received by accessing a data file associated with the sample.

[0152] C4.3. A method according to any of paragraphs C4-C4.2, wherein the sample information includes one or more of sample composition, a region of interest, and a surface of interest.

[0153] C4.4. A method according to any of paragraphs C4-C4.3, wherein the sample information includes one or more processing schedules.

[0154] C4.4.1. The method of paragraph C4.4, wherein the method further comprises determining one or more processing schedules based on the sample information.

[0155] C4.4.2. A method according to paragraph C4.4, wherein the one or more processing schedules include one or more of laser intensity, laser milling time, a portion of the sample to be removed by the laser, BIB intensity, BIB milling time, a portion of the sample to be removed by the BIB, a surface of interest, or a combination thereof.

[0156] C5. The method of any one of paragraphs C1-C4.4.2, further comprising: positioning an additional sample within the internal volume of the combined sample preparation system; causing the laser source component of the combined sample preparation system to emit an additional light beam toward the additional sample, wherein the additional light beam causes a first portion of the additional sample on which the additional light beam is incident to be removed; and causing the BIB source component of the combined sample preparation system to emit an additional wide ion beam toward the additional sample, wherein the additional wide ion beam causes a second portion of the additional sample on which the additional wide ion beam is incident to be removed to expose an additional region of interest.

[0157] C6. The method of any of paragraphs C1-C5, wherein the beam removes sample material 20x, 30x, 50x, or faster than the broad ion beam.

[0158] D1. A combined broad ion beam (BIB) and laser sample preparation system with improved polishing throughput, the combined sample preparation system comprising: a housing defining an internal volume; a sample stage positioned within the internal volume, wherein the sample stage is configured to hold the sample holder during polishing of a sample held by the sample holder; a laser source configured to, when in use, emit a beam toward the sample, wherein the beam causes a first portion of the sample on which the beam is incident to be removed; and a BIB source configured to, when in use, emit a wide ion beam toward the sample, wherein at least a second portion of the sample on which the wide ion beam is incident is removed to expose a region of interest.

[0159] D2. The combined sample preparation system of paragraph D1 further comprising: a processor; and a memory storing computer-readable instructions that, when executed on the processor, cause the processor to initiate execution of the method of any one of paragraphs C1-C6.

[0160] E1. A storage box for storing multiple samples for broad ion beam (BIB) polishing, the storage box comprising: a shell that at least partially defines an internal storage volume; a plurality of sample holder housings that are located within the internal storage volume, wherein each individual sample holder housing is configured to receive a sample holder that includes a corresponding sample for polishing in a BIB system; and wherein the storage box is configured to be inserted into the BIB system, and each of the sample holder housings is further configured to allow its corresponding sample holder to be removed from the box when the box is inserted into the BIB system, so that the corresponding sample can be polished by the BIB system.

[0161] F1. A broad ion beam (BIB) system for efficiently processing multiple samples, the BIB system comprising: a housing defining an internal volume; a sample stage positioned within the internal volume, wherein the sample stage is configured to hold the sample holder during polishing of the sample held by the sample holder; a BIB source configured to emit a first wide ion beam toward the sample when in use, wherein the first BIB source is positioned within a first source housing; a box housing configured to receive and hold a storage box according to any one of paragraphs E1 EXX; and a sample holder manipulator configured to: remove individual sample holders from the storage box; load the individual sample holders onto the sample stage to enable processing of the corresponding samples; remove the individual sample holders from the sample stage after the corresponding samples have been processed; and load the individual sample holders back into the storage box.

[0162] F2. The BIB system according to paragraph F1 further includes: a processor; and a memory storing computer-readable instructions that, when executed on the processor, cause the processor to initiate execution of the method described in any one of paragraphs G1-G6.4.2.

[0163] G1. A method for efficiently processing multiple samples using a broad ion beam (BIB) system, the method comprising the following steps: removing an individual sample holder containing a sample from a storage box; loading the individual sample holder onto a sample stage, the sample stage being configured to hold the sample holder during polishing of the corresponding sample held by the individual sample holder; causing a BIB source to emit a broad ion beam toward the sample, wherein the broad ion beam removes at least a portion of the sample on which the broad ion beam is incident; after the corresponding sample has been processed, removing the individual sample holder from the sample stage; and loading the individual sample holder back into the storage box.

[0164] G1.1. The method of paragraph G1, further comprising receiving the storage cartridge of paragraph E1 for processing in a BIB system.

[0165] G2. The method of any of paragraphs G1-G1.1, wherein the storage box stores a plurality of sample holders each containing a corresponding sample.

[0166] G2.1. The method according to paragraph G2 also includes: removing another individual sample holder containing another sample from the storage box; loading the another individual sample holder onto the sample stage; causing the BIB source to emit another wide ion beam toward the sample, wherein the another wide ion beam removes at least a portion of the other sample on which the another wide ion beam is incident; after the corresponding sample has been processed, removing the another individual sample holder from the sample stage; and loading the another individual sample holder back into the storage box.

[0167] G2.2. The method of any of paragraphs G2-G2.1, further comprising repeating the method steps of paragraph G2.1 for one or more additional sample holders stored in the storage box.

[0168] G3. The method of any of paragraphs G2-G2.2, wherein the samples stored in the sample holders in the storage box are pre-aligned.

[0169] G3.1. The method of paragraph G2, wherein the samples are pre-aligned in their respective sample holders using the method of any of paragraphs H1-H9.

[0170] G4. A method according to any of paragraphs G1-G3.1, wherein the steps according to any of paragraphs G1-G3.1 are at least partially automatically performed by the BIB system.

[0171] G4.1. A method according to paragraph G3.1, wherein the steps according to any of paragraphs G1-G3.1 are performed without user input.

[0172] G5. The method of any of paragraphs G1-C4.1, wherein the BIB source is configured to irradiate the sample with the broad ion beam for a period of time.

[0173] G5.1. The method of paragraph G5, wherein the first time period is a predetermined time period.

[0174] G5.2. A method according to any of paragraphs G5-G5.1, wherein the time period is provided via user input.

[0175] G5.3. A method according to any of paragraphs G5-G5.2, wherein the time period is determined by accessing sample information associated with the sample.

[0176] G5.4. A method according to any of paragraphs G5-G5.3, wherein the first time period is determined based on the material of the portion of the sample.

[0177] G5.5. A method according to any of paragraphs G5-C3.4, wherein the time period is determined based on one or more sensors receiving information indicating that the portion of the sample has been removed.

[0178] G5.7. A method according to any of paragraphs G5-C3.6, wherein the time period is determined based on one or more sensors receiving information indicating that the area of ​​interest has been exposed.

[0179] G5.8. A method according to any of paragraphs G5-C3.7, wherein the time period is determined based on one or more of BIB intensity, a portion of the sample to be removed by the BIB, a surface of interest, or a combination thereof.

[0180] G6. A method according to any of paragraphs G1-G5.8, wherein the method further comprises receiving sample information.

[0181] G6.1. The method of paragraph G6, wherein the sample information is received via user input.

[0182] G6.2. The method of paragraph G6, wherein the sample information is received by accessing a data file associated with the corresponding sample.

[0183] G6.2.1. The method of paragraph G6.2, wherein the data file is stored on a memory component of the storage cartridge.

[0184] G6.3. A method according to any of paragraphs G6-G6.2, wherein the sample information includes one or more of sample composition, region of interest, and surface of interest.

[0185] G6.4. A method according to any of paragraphs G6-G6.3, wherein the sample information includes one or more processing schedules.

[0186] G6.4.1. The method of paragraph G6.4, wherein the method further comprises determining one or more processing schedules based on the sample information.

[0187] G6.4.2. A method according to paragraph G6.4, wherein the one or more processing schedules include one or more of BIB intensity, BIB milling time, a portion of the sample removed by the BIB, a surface of interest, or a combination thereof.

[0188] H1. A method for pre-aligning samples for more efficiently processing multiple samples through a broad ion beam (BIB) system, the method comprising the steps of: securing the sample to an adjustable portion of a sample holder; nesting the sample holder with a first mask having a first mask edge, wherein the first mask is positioned outside the broad ion beam (BIB) system; aligning the sample so that it has a desired geometric relationship with the first mask edge; and nesting the sample holder with a second mask having a second mask edge, wherein the second mask is positioned within the BIB system, and wherein the first mask and the second mask are geometrically similar such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask.

[0189] H2. The method of paragraph H1, wherein when the sample holder is nested with the second mask, the sample has the desired geometric relationship with the second edge without any alignment of the sample within the BIB system.

[0190] H3. The method of any of paragraphs H1-H2, further comprising irradiating a portion of the second mask and a portion of the sample with a broad ion beam to remove a portion of the sample.

[0191] H3.1. The method of paragraph H3.1, wherein the second mask is made of a hard material that is not degraded by the broad ion beam.

[0192] H3.2. A method according to any of paragraphs H3-H3.1, wherein the second mask blocks a portion of the wide ion beam so that a portion of interest of the sample is not removed from the sample.

[0193] H4. The method of any of paragraphs H1-H3.2, wherein aligning corresponds to adjusting the adjustable portion of the sample holder so that the sample is positioned so that it has a desired geometric relationship with the first mask edge.

[0194] H5. The method of any of paragraphs H1-H4, wherein the first mask and the second mask are geometrically identical.

[0195] H6. The method of any of paragraphs H1-H5, wherein the sample is secured to the specimen and aligned within a closed environment.

[0196] H6.1. The method of paragraph H6, wherein the closed environment has an inert gas atmosphere.

[0197] H6.2. The method of any of paragraphs H6-H6.1, wherein the closed environment has a reduced pressure.

[0198] H6.3. The method of any of paragraphs H6-H6.2, wherein the closed environment has a vacuum pressure level.

[0199] H7. The method of any of paragraphs H1-H6.3, further comprising transferring the sample holder and the aligned sample from a preparation station to a BIB system.

[0200] H7.1. A method according to paragraph H7, wherein the BIB system is a BIB system according to any one of A1-A8, D1-D2 and / or F1-F2.

[0201] H7.2. The method of any of paragraphs H7-H7.1, wherein the preparation station is a closed environment of paragraphs H6-H6.3.

[0202] H7.3. A method according to any one of paragraphs H7-H7.2, wherein transferring the sample includes loading the sample into a transfer device, which is configured to interface with both the sample preparation area and the BIB system.

[0203] H7.3.1. The method of paragraph H7.3, wherein the transfer device is a sealed compartment for holding the sample holder so that it is sealed from the environment.

[0204] H7.3.1.1. According to the method of paragraph H7.3.1, the sealed compartment has an inert gas.

[0205] 7.3.2. The method of any of paragraphs H7.3-H7.3.1.1, wherein the transfer device is a storage box of paragraph E1.

[0206] H8. The method of any of paragraphs H1-H7.3.2, further comprising repeating the method for multiple samples on corresponding sample holders.

[0207] H9. A method according to any one of paragraphs H1-H8, further comprising processing the sample using a method according to any one of paragraphs C1-C6 and / or G1-G6.4.2.

[0208] I1. Using a system according to any of paragraphs A1-A8, D1-D2, E1, and / or F1-F2 to perform a method according to any of paragraphs C1-C6, G1-G6.4.2, and / or H1-H9.

[0209] J1. A non-transitory computer-readable medium storing instructions that, when executed on a processor, cause the processor to initiate execution of a method according to any one of paragraphs C1-C6, G1-G6.4.2, and / or H1-H9.

Claims

1. A method for efficiently processing multiple samples using a broad ion beam (BIB) system, the method comprising the following steps: removing an individual sample holder containing a sample from a storage location within the BIB system, wherein the BIB system includes a plurality of sample holders positioned in one or more storage locations; loading the individual sample holders onto a sample stage configured to hold the sample holders during polishing of the corresponding sample held by the individual sample holders; causing a BIB source to emit a wide ion beam toward the sample, wherein the wide ion beam removes at least a portion of the sample upon which the wide ion beam is incident; removing the individual sample holder from the sample stage after the corresponding sample has been processed; as well as The individual sample holders are loaded back into the storage location.

2. The method of claim 1 , wherein the storage location is a storage box for storing a plurality of samples for wide ion beam polishing, the storage box comprising: a housing at least partially defining an interior storage volume; a plurality of sample holder housings located within the internal storage volume, wherein each individual sample holder housing is configured to receive a sample holder including a corresponding sample for polishing in a BIB system; and wherein the storage box is configured to be inserted into the BIB system, and each of the sample holder housings is further configured to allow the corresponding sample holder of each of the sample holder housings to be removed from the box when the box is inserted into the BIB system, so that the corresponding sample can be polished by the BIB system.

3. The method of claim 2, wherein the storage box stores a plurality of sample holders each containing a corresponding sample.

4. The method of claim 3, further comprising repeating the method steps of claim 1 for one or more additional sample holders stored in the storage magazine.

5. The method of claim 3, wherein the samples in the sample holders stored in the storage box are pre-aligned such that the samples do not require further alignment within the BIB system before being processed.

6. The method according to claim 1, further comprising the steps of: removing another individual sample holder containing another sample from the storage location; loading the other individual sample holder onto the sample stage; causing the BIB source to emit another wide ion beam toward the sample, wherein the another wide ion beam removes at least a portion of the another sample on which the another wide ion beam is incident; removing the further individual sample holder from the sample stage after the corresponding further sample has been processed; and The other individual sample holder is loaded back into the storage location.

7. The method of claim 1, wherein the method steps are at least partially automatically performed by the BIB system.

8. The method according to claim 7, wherein: The method steps are performed without user input.

9. The method according to claim 1, wherein The BIB source is configured to irradiate a sample with a broad ion beam for a period of time.

10. The method according to claim 9, wherein: The time period is provided by user input.

11. The method of claim 9, wherein the time period is determined based on one or more sensors receiving information indicating one of: said portion of said sample has been removed; and The area of ​​interest has been exposed.

12. The method of claim 9, wherein the time period is determined based on one or more of the following: BIB strength; the portion of the sample to be removed using the BIB; and Interesting surface.

13. The method according to claim 9, further comprising: accessing sample information associated with the sample; as well as The time period is determined based on the sample information associated with the sample.

14. The method according to claim 13, wherein: The sample information includes a material that at least partially constitutes the portion of the sample, and the time period is determined based on the material.

15. The method according to claim 13, wherein The sample information is received via user input.

16. The method according to claim 13, wherein: The sample information is received by accessing a data file associated with the corresponding sample.

17. The method according to claim 16, wherein The data file is stored in a memory component of a storage box that holds the sample holder.

18. The method of claim 16, further comprising: detecting an identifier on the sample holder, the identifier comprising an identification code, a scannable identifier image, and an RFID; and The data file is accessed on an accessible memory based on the identifier.

19. The method of claim 13, wherein the sample information comprises a processing schedule for the sample, the processing schedule comprising one or more of: BIB strength; BIB milling time; the portion of said sample to be removed by BIB; and Interesting surface.

20. A storage box for storing a plurality of samples for broad ion beam (BIB) polishing, the storage box comprising: a housing at least partially defining an interior storage volume; a plurality of sample holder housings located within the internal storage volume, wherein each individual sample holder housing is configured to receive a sample holder including a corresponding sample for polishing in a BIB system; and wherein the storage box is configured to be inserted into the BIB system, and each of the sample holder housings is further configured to allow the corresponding sample holder of each of the sample holder housings to be removed from the box when the box is inserted into the BIB system, so that the corresponding sample can be polished by the BIB system.

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