A heater and smoking set

Abstract

This application relates to a heater and a smoking device. The smoking device includes a housing, and the heater is mounted on the housing. The heater includes a substrate and a heating film mounted on the substrate. The heating film can heat the aerosol-forming matrix through a combination of infrared radiation and contact heat conduction, reducing energy loss caused by excessive infrared emissivity during operation, thereby improving the energy utilization rate of the heating film and reducing the power consumption of the heating film in heating the aerosol-forming matrix, thus increasing the battery life and improving the smoking device's endurance. At the same time, it eliminates the need for an additional reflective layer or a transparent substrate, simplifying the heater's structure and manufacturing process, and reducing manufacturing costs.

Description

Technical Field

[0001] This application relates to the field of smoking device technology, and more particularly to a heater and a smoking device. Background Technology

[0002] Existing smoking devices mainly consist of a substrate, an infrared coating on the outer surface of the substrate, and a conductive layer. When the device is powered on, the infrared light emitted by the infrared coating can penetrate the substrate and heat the aerosol-forming matrix inside the substrate, causing at least one component in the aerosol-forming matrix to volatilize and form an aerosol for the user to inhale. To meet the requirements for heating temperature and heating efficiency of the aerosol-forming matrix, the infrared coating needs to have a high infrared emissivity, resulting in high heat loss during use and shortening the device's battery life. Current technologies reduce infrared emission energy loss by adding an infrared reflective layer or using a transparent material for the substrate, but these methods suffer from drawbacks such as complex structure and high cost. Summary of the Invention

[0003] This application provides a heater and a smoke set that reduces energy loss from infrared emission while simplifying the heater's structure.

[0004] The first aspect of this application provides a heater for heating an aerosol forming matrix and volatilizing at least one component in the aerosol forming matrix to form an aerosol for inhalation by a user. The heater includes a matrix and a heating film mounted on the matrix. The heating film is capable of heating the aerosol forming matrix through a combination of infrared radiation and contact heat conduction.

[0005] In one possible design, the infrared radiation heating power of the heating film is less than the contact heat conduction heating power.

[0006] In one possible design, the infrared emissivity of the heating film is less than 20%.

[0007] In one possible design, the heating film is made of one or more of the following materials: platinum, titanium nitride, indium oxide, and zinc oxide.

[0008] In one possible design, the heating film is made of tin-doped indium oxide or aluminum-doped zinc oxide.

[0009] In one possible design, the sheet resistance R of the heating film... sq Must satisfy: 0.5Ω / sq≤R sq ≤15Ω / sq; and / or, the thickness t of the heating film must satisfy: 0.05μm≤t≤5μm; and / or, the resistivity ρ of the heating film must satisfy: 1E-7Ω·m≤ρ≤1E-5Ω·m.

[0010] In one possible design, the heater further includes an electrode assembly electrically connected to the heating film, the electrode assembly being mounted on the substrate and / or on the heating film, and the extension direction of the electrode assembly being parallel to the axial direction of the substrate.

[0011] In one possible design, the electrode film assembly includes a positive electrode film and a negative electrode film, which are connected to the positive and negative terminals of the power supply, respectively.

[0012] The number of electrode film groups is one or more. When the number of electrode film groups is multiple, the positive electrode film and the negative electrode film are alternately arranged at intervals along the circumference of the substrate.

[0013] In one possible design, the electrode membrane assembly is made of one or more of the following materials: gold, silver, platinum, titanium dioxide, and thick film slurry.

[0014] In one possible design, the sheet resistance of the electrode film assembly is less than or equal to 0.01 Ω / sq.

[0015] In one possible design, the electrode film assembly includes a body portion extending along the axial direction of the substrate, the body portion including a first body that contacts the outer surface of the heating film and a second body that contacts the outer surface of the substrate.

[0016] The second body has a connecting part extending circumferentially along the substrate at the end away from the first body, and the electrode film assembly is connected to the power source through the connecting part.

[0017] A second aspect of this application provides a smoking device, including a housing and a heater mounted on the housing, the heater being any of the heaters described above.

[0018] In this application, the heating film has both infrared radiation and contact heat conduction heating methods, which reduces the energy loss caused by excessive infrared emissivity during operation, thereby improving the energy utilization rate of the heating film and reducing the power consumption of the heating film in heating the aerosol to form the matrix, thus increasing the power supply's usability and improving the battery life of the smoking device. At the same time, it eliminates the need to add a reflective layer or use a transparent substrate, simplifying the structure and processing technology of the heater and reducing processing costs.

[0019] It should be understood that the above general description and the following detailed description are merely exemplary and do not limit this application. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the heater provided in this application;

[0021] Figure 2 for Figure 1 A top view, showing that the number of electrode film groups is one;

[0022] Figure 3 for Figure 1 A top view showing two electrode film assemblies;

[0023] Figure 4 Table of materials and operating conditions of the heater provided in this application in several embodiments.

[0024] Figure label:

[0025] 1-Matrix;

[0026] 2-Heating film;

[0027] 3-Electrode film assembly;

[0028] 31-Positive electrode film;

[0029] 32-Negative electrode film;

[0030] 33-Ontology part;

[0031] 331-First ontology;

[0032] 332 - Second Body;

[0033] 34 - Connecting part.

[0034] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application. Detailed Implementation

[0035] To better understand the technical solution of this application, the embodiments of this application will be described in detail below with reference to the accompanying drawings.

[0036] It should be understood that the described embodiments are merely some, not all, of the embodiments in this application. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0037] The terminology used in the embodiments of this application is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. The singular forms “a,” “the,” and “the” used in the embodiments of this application and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise.

[0038] It should be understood that the term "and / or" used in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.

[0039] It should be noted that the directional terms such as "upper," "lower," "left," and "right" described in the embodiments of this application are used to describe the angles shown in the accompanying drawings and should not be construed as limiting the embodiments of this application. Furthermore, in the context, it should be understood that when it is mentioned that an element is connected "upper" or "lower" to another element, it can be directly connected to the other element "upper" or "lower," or indirectly connected to the other element "upper" or "lower" through an intermediate element.

[0040] This application provides a smoking device, which includes a housing and a heater installed on the housing, the heater being connected to a power source. When the smoking device is in operation, the heater can heat an aerosol-forming matrix placed inside the housing, causing at least one component in the aerosol-forming matrix to volatilize into an aerosol for the user to inhale.

[0041] Specifically, such as Figure 1 As shown, the heater includes a substrate 1, a heating film 2 mounted on the substrate 1, and an electrode film assembly 3 mounted on the substrate 1 and / or the heating film 2. The heating film 2 is electrically connected to a power source through the electrode film assembly 3. To facilitate the installation of the heating film 2 and the electrode film assembly 3, the heating film 2 is disposed on the outer surface of the substrate 1, and the electrode film assembly 3 is disposed on the outer surface of the substrate 1 and / or the outer surface of the heating film 2.

[0042] During the operation of the heater, the heating film 2 is connected to the power source through the electrode film assembly 3, thereby energizing the heating film 2 and generating heat. The electrode film 2 directly heats the aerosol-forming matrix through the heat it generates, promoting the decomposition of the aerosol-forming matrix. At the same time, the heating film 2 generates infrared light after being energized. The infrared light can penetrate the substrate 1 and heat the aerosol-forming matrix within the substrate 1, thereby promoting the decomposition of the aerosol-forming matrix.

[0043] In this application, the heating film 2 heats the aerosol forming matrix through a combination of infrared radiation heating and contact heat conduction. While ensuring the heating efficiency of the heating film 2, it reduces energy loss caused by excessively high infrared emissivity during operation, thereby improving the energy utilization rate of the heating film 2 and reducing the power consumption for heating the aerosol forming matrix. This extends the battery life and improves the endurance of the smoking device. Furthermore, compared to existing technologies that add a reflective layer or use a transparent substrate 1, the heater structure of this application is simpler, simplifying the heater's manufacturing process and reducing its processing cost.

[0044] Among them, the infrared radiation heating power of the heating film 2 is less than the contact heat conduction heating power. While meeting the heating efficiency of the heating film 2, it further reduces the energy loss of infrared radiation of the heating film 2, thereby improving the energy utilization rate of the heating film 2. At the same time, it reduces the power consumption of the heating film 2 in heating the aerosol to form the matrix, thereby increasing the usable time of the power supply and thus improving the battery life of the smoking device.

[0045] Preferably, the infrared emissivity of the heating film 2 is less than 20%. In order to meet the requirement that the infrared emissivity of the heating film 2 is less than 20%, the heating film 2 can be made of the following low resistivity materials, specifically including: one of metal, alloy, conductive nitride, and conductive oxide; or one or more of platinum, titanium nitride, indium oxide doped, and zinc oxide doped; or indium tin oxide (ITO) or zinc aluminum oxide (AZO).

[0046] In this application, there are no special restrictions on the mixing method or mixing ratio of various materials. They can be flexibly adjusted according to actual production and usage needs to increase the flexibility of material selection for heating film 2, thereby reducing the production cost of heating film 2 and simplifying the manufacturing process of heating film 2.

[0047] Preferably, the mixing ratio of indium tin oxide (ITO) is 90% indium oxide (In2O3) and 10% tin oxide (SnO2), and the mixing ratio of zinc oxide aluminum oxide (AZO) is 95% zinc oxide (ZnO) and 5% aluminum oxide (Al2O3). This can reduce the resistivity of the heating film 2, thereby reducing its energy consumption. Simultaneously, it can reduce the infrared emissivity of the heating film 2, thus reducing energy loss during the heating process. Therefore, the mixing ratio of indium tin oxide (ITO) of 90% indium oxide (In2O3) and 10% tin oxide (SnO2), and the mixing ratio of zinc oxide aluminum oxide (AZO) of 95% zinc oxide (ZnO) and 5% aluminum oxide (Al2O3) can simultaneously reduce both energy consumption and energy loss of the heating film 2, thereby improving its performance.

[0048] Among them, the sheet resistance R of heating film 2 sq Must satisfy: 0.5Ω / sq≤R sq ≤15Ω / sq.

[0049] In this embodiment, if the sheet resistance R of the heating film 2 sq A sheet resistance <0.5Ω / sq leads to increased processing precision in heating film 2, thereby increasing its processing cost; if the sheet resistance R of heating film 2 is less than 0.5Ω / sq, it will increase the processing precision required for heating film 2, thus increasing its processing cost. sq A value greater than 15Ω / sq results in a high infrared emissivity for heating film 2, thus increasing energy loss during its operation. Therefore, 0.5Ω / sq ≤ R sqWith a strength of ≤15Ω / sq, the energy loss of the heating film 2 can be reduced, and the processing cost of the heating film 2 can also be reduced.

[0050] Specifically, the thickness t of the heating film 2 must satisfy: 0.05μm≤t≤5μm.

[0051] According to the sheet resistance R sq Calculation formula R sq =ρ / t (where ρ is the resistivity of heating film 2 and t is the thickness of heating film 2). It can be seen that when the material of heating film 2 is determined, the resistivity of heating film 2 is a constant. At this time, in order to ensure that the sheet resistance of heating film 2 satisfies 0.5Ω / sq≤R sq If the sheet resistance is ≤15Ω / sq, then the thickness t of the heating film 2 must satisfy: 0.05μm≤t≤5μm. This prevents the heating film 2 from being too thick or too thin, which would result in an excessively low or high sheet resistance. Therefore, 0.05μm≤t≤5μm reduces the space occupied by the heating film 2 during installation, thereby reducing the installation space of the heater and the size of the smoking appliance, improving the user experience. At the same time, it makes it easier for the sheet resistance of the heating film 2 to meet the above requirements, thereby improving the working performance and stability of the heating film 2.

[0052] In addition, the resistivity ρ of the heating film 2 must satisfy: 1E-7Ω·m≤ρ≤1E-5Ω·m.

[0053] According to the sheet resistance R sq Calculation formula R sq From ρ / t, we can see that when the thickness of heating film 2 is limited by the installation space and is a constant value, in order to ensure that the sheet resistance of heating film 2 satisfies 0.5Ω / sq≤R sq If the resistivity ρ of heating film 2 is ≤15Ω / sq, then the resistivity ρ must satisfy: 1E-7Ω·m≤ρ≤1E-5Ω·m. This avoids the heating film 2 being too thick or too thin, which would result in an excessively low or high sheet resistance. Therefore, 1E-7Ω·m≤ρ≤1E-5Ω·m facilitates the selection of the material for heating film 2, increasing the range and flexibility of material selection. Simultaneously, it ensures that the sheet resistance of heating film 2 meets the aforementioned requirements, thereby improving the working performance and stability of heating film 2.

[0054] like Figures 1-3 As shown, the electrode film assembly 3 consists of a positive electrode film 31 and a negative electrode film 32, and the structures of the positive electrode film 31 and the negative electrode film 32 are the same. Taking the positive electrode film 31 as an example, as follows... Figure 1As shown, the positive electrode film 31 includes a body portion 33 extending axially along the substrate 1. A first body portion 331 of the body portion 33 is attached to the outer surface of the heating film 2, and a second body portion 332 of the body portion 33 is attached to the outer surface of the substrate 1. A connecting portion 34 extending circumferentially along the substrate 1 is provided at the end of the second body portion 332 away from the first body portion 331. The positive electrode film 31 is connected to a power source through the connecting portion 34 to increase the connectable area of ​​the positive electrode film 31, thereby increasing the stability of the connection between the positive electrode film 31 and the power source, and improving the working stability of the positive electrode film 31. Specifically, the projected shape of the positive electrode film 31 along the direction perpendicular to the outer surface of the substrate 1 can be L-shaped, etc. This application does not impose any special limitations on the specific structure and shape of the positive electrode film 31.

[0055] The number of electrode film groups 3 can be one or more. When the number of electrode film groups 3 is one, such as... Figure 2 As shown, the positive electrode film 31 and the negative electrode film 32 are evenly distributed along the circumference of the substrate 1 on both sides of the substrate 1. The heating film 2 is divided into two parallel parts by the positive electrode film 31 and the negative electrode film 32. When there are multiple electrode film groups 3, taking two electrode film groups 3 as an example, as follows... Figure 3 As shown, the positive electrode film 31 and the negative electrode film 32 are alternately arranged circumferentially along the substrate 1, and the positive electrode film 31 and the negative electrode film 32 are uniformly distributed along the axial direction of the substrate 1. In this case, the heating film 2 is divided into four parallel parts by the two positive electrode films 31 and the two negative electrode films 32. The uniform distribution of the positive electrode films 31 and the negative electrode films 32 ensures that the heat generated by each parallel part of the heating film 2 is the same, thereby enabling the heater to uniformly heat the aerosol-forming matrix and improve the working performance of the heater.

[0056] Furthermore, the positive electrode film 31 can be made of one of the following materials: gold (Au), silver (Ag), platinum (Pt), titanium dioxide, or thick film paste. The negative electrode film 32 can also be made of one of the following materials: gold (Au), silver (Ag), platinum (Pt), titanium dioxide, or thick film paste. The materials of the positive electrode film 31 and the negative electrode film 32 can be the same or different, increasing the flexibility of the materials used for the positive and negative electrode films 31 and 32, thus facilitating the replacement of damaged positive and negative electrode films 31 and 32. Simultaneously, the sheet resistance of both the positive and negative electrode films 31 and 32 must be less than or equal to 0.01 Ω / sq to reduce their infrared emissivity, thereby further reducing the energy loss of the heater.

[0057] Since both the electrode film group 3 and the heating film 2 are conductive materials, the substrate 1 must be made of insulating material to prevent the electrode film group 3 from being connected and causing a short circuit in the heating film 2, thereby improving the working stability of the heating film 2 and thus improving the working stability of the heater.

[0058] Specifically, the material of the substrate 1 includes, but is not limited to, glass, ceramics, etc. The substrate 1 can also be made of metal. When the substrate 1 is metal, an insulating layer is provided between the substrate 1 and the heating film 2, and between the substrate 1 and the electrode film group 3, so as to prevent the substrate 1 from short-circuiting the heating film 2.

[0059] The substrate 1 can be made of non-infrared transparent materials such as alumina, zirconium oxide, or metal. When the infrared light generated by the heating film 2 enters the substrate 1, it reduces the risk of infrared light inside the substrate 1 penetrating the substrate 1 and radiating outwards, thereby improving the utilization rate of infrared light inside the substrate 1 and reducing the infrared emissivity of the heating film 2 while meeting the infrared radiation heating requirements.

[0060] In addition, the roughness of the inner surface of the substrate 1 is less than or equal to 0.16 μm, and / or the roughness of the outer surface of the substrate 1 is less than or equal to 0.16 μm, that is, the inner surface and / or the outer surface of the substrate 1 have a mirror effect.

[0061] In this embodiment, if the surface roughness of the substrate 1 is large (including the inner and outer surfaces), the reflectivity of the infrared light emitted by the heating film 2 on the surface of the substrate 1 will be large. Therefore, if the surface roughness of the substrate 1 is less than or equal to 0.16 μm, the reflectivity of the infrared light generated by the heating film 2 on the surface of the substrate 1 can be reduced, thereby improving the utilization rate of the infrared light emitted by the heating film 2 and reducing the infrared emissivity of the heating film 2 while meeting the requirements for infrared radiation heating.

[0062] The following examples illustrate the selection of materials for substrate 1, heating film 2, and electrode film assembly 3, and are illustrated as follows. Figure 4 The table shown:

[0063] In Example 1, the substrate 1 is made of high borosilicate glass, and a Pt film is deposited on the outer surface of the substrate 1 to form a heating film 2. In this case, the thickness of the heating film 2 is t = 0.05 μm, and the sheet resistance R... sq =2Ω / sq, infrared emissivity 3.2%, TiN is deposited on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form a positive electrode film 31 and a negative electrode film 32. At this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 is 0.008Ω / sq. The number of electrode film groups 3 is 1.

[0064] In this embodiment, the resistance of the heater is 0.71Ω, and a voltage of 3.7V is applied to the positive electrode film 31 and the electrode film respectively. The temperature field distribution after stabilization is uniform, the temperature difference between the two parallel parts of the heating film 2 is less than 5℃, and the maximum temperature can reach 262℃.

[0065] In Example 2, the substrate 1 is an aluminum tube with an insulating layer on its outer surface. A TiN film is deposited on the outer surface of the insulating layer to form a heating film 2. The thickness of the heating film 2 is t = 0.1 μm, and the sheet resistance R... sq = 4.2Ω / sq, infrared emissivity 15.5%. Au is deposited on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form a positive electrode film 31 and a negative electrode film 32. At this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 is 0.01Ω / sq. The number of electrode film groups 3 is 1.

[0066] In this embodiment, the heater has a resistance of 1.5Ω, and a voltage of 6V is applied to the positive electrode film 31 and the electrode film respectively. The temperature field distribution is uniform after stabilization, and the temperature difference between the two parallel parts of the heating film 2 is less than 5℃. The maximum temperature can reach 325℃.

[0067] In Example 3, the substrate 1 is made of quartz glass, and an AZO film is deposited on the outer surface of the substrate 1 to form a heating film 2. In this case, the thickness of the heating film 2 is t = 5 μm, and the sheet resistance R... sq =1Ω / sq, infrared emissivity 8.1%, Ag is deposited on the outer surface of heating film 2 in a direction parallel to the axis of substrate 1 to form positive electrode film 31 and negative electrode film 32. At this time, the sheet resistance of positive electrode film 31 and negative electrode film 32 is 0.002Ω / sq. The number of electrode film groups 3 is 1.

[0068] In this embodiment, the resistance of the heater is 0.35Ω, and a voltage of 3V is applied to the positive electrode film 31 and the electrode film respectively. The temperature field distribution is uniform after stabilization, the temperature difference between the two parallel parts of the heating film 2 is less than 5℃, and the maximum temperature can reach 302℃.

[0069] In Example 4, the substrate 1 is made of alumina, and an ITO film is deposited on the outer surface of the substrate 1 to form a heating film 2. In this case, the thickness of the heating film 2 is t = 1.5 μm, and the sheet resistance R... sq =2.3Ω / sq, infrared emissivity 4.8%. Ag is deposited on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form a positive electrode film 31 and a negative electrode film 32. At this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 is 0.002Ω / sq. The number of electrode film groups 3 is 1.

[0070] In this embodiment, the resistance of the heater is 0.81Ω, and a voltage of 4V is applied to the positive electrode film 31 and the electrode film respectively. The temperature field distribution is uniform after stabilization, the temperature difference between the two parallel parts of the heating film 2 is less than 5℃, and the maximum temperature can reach 284℃.

[0071] In Example 5, zirconium oxide is used as the substrate 1, and an ITO film is deposited on the outer surface of the substrate 1 to form a heating film 2. In this case, the thickness of the heating film 2 is t = 0.5 μm, and the sheet resistance R... sq=6.9Ω / sq, infrared emissivity 8.9%. Ag is deposited on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form a positive electrode film 31 and a negative electrode film 32. At this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 is 0.002Ω / sq. There are two electrode film groups 3.

[0072] In this embodiment, the resistance of the heater is 0.68Ω, and a voltage of 3.7V is applied to the positive electrode film 31 and the electrode film respectively. The temperature field distribution after stabilization is uniform, the temperature difference between the two parallel parts of the heating film 2 is less than 5℃, and the maximum temperature can reach 278℃.

[0073] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A heater for heating an aerosol-forming matrix and volatilizing at least one component of the aerosol-forming matrix to form an aerosol for inhalation by a user, characterized in that, The heater includes: Matrix (1); Heating film (2), the heating film (2) is installed on the substrate (1); The heating film (2) can heat the aerosol-forming matrix through a combination of infrared radiation and contact heat conduction; The infrared radiation heating power of the heating film (2) is less than the contact heat conduction heating power, and the infrared emissivity of the heating film (2) is less than 20%. The sheet resistance R of the heating film (2) sq Must satisfy: 0.5Ω / sq≤R sq ≤15Ω / sq; And / or, the thickness t of the heating film (2) must satisfy: 0.05μm≤t≤5μm; And / or, the resistivity ρ of the heating film (2) must satisfy: 1E-7Ω•m≤ρ≤1E-5Ω•m.

2. The heater according to claim 1, characterized in that, The heating film (2) is made of one of the following materials: metal, alloy, conductive nitride, or conductive oxide.

3. The heater according to claim 1, characterized in that, The heating film (2) is made of one or more of the following materials: platinum, titanium nitride, indium oxide, and zinc oxide.

4. The heater according to claim 1, characterized in that, The heating film (2) is made of indium oxide doped with tin or zinc oxide doped with aluminum.

5. The heater according to claim 1, characterized in that, The heater further includes an electrode film assembly (3), which is electrically connected to the heating film (2). The electrode film assembly (3) is mounted on the substrate (1), and / or the electrode film assembly (3) is mounted on the heating film (2). The electrode film group (3) extends in a direction parallel to the axial direction of the substrate (1).

6. The heater according to claim 5, characterized in that, The electrode film group (3) includes a positive electrode film (31) and a negative electrode film (32), and the positive electrode film (31) and the negative electrode film (32) are respectively connected to the positive and negative terminals of the power supply; The number of electrode film groups (3) is one or more. When the number of electrode film groups (3) is multiple, the positive electrode film (31) and the negative electrode film (32) are alternately arranged at circumferential intervals along the substrate (1).

7. The heater according to claim 5, characterized in that, The electrode film assembly (3) includes a body portion (33) extending axially along the substrate (1), the body portion (33) including a first body (331) in contact with the outer surface of the heating film (2) and a second body (332) in contact with the outer surface of the substrate (1). The second body (332) has a connecting part (34) extending circumferentially along the substrate (1) at one end away from the first body (331), and the electrode film group (3) is connected to the power source through the connecting part (34).

8. The heater according to claim 5, characterized in that, The electrode film assembly (3) is made of one or more of the following materials: gold, silver, platinum, titanium dioxide, and thick film slurry.

9. The heater according to claim 5, characterized in that, The sheet resistance of the electrode film group (3) is less than or equal to 0.01Ω / sq.

10. A smoking device, characterized in that, The smoking device includes: case; The heater according to any one of claims 1 to 9, wherein the heater is mounted on the housing.

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