A method for manufacturing a niobium tube target

By combining cold isostatic pressing and hot isostatic pressing, and controlling the particle size distribution of niobium powder and the vacuum thermal degassing process, the problems of low density and poor microstructure uniformity of niobium tube targets were solved, achieving efficient and low-cost preparation of niobium tube targets and meeting the needs of domestic manufacturers.

CN117512531BActive Publication Date: 2026-06-23AEROSPACE RES INST OF MATERIAL & PROCESSING TECH
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Patent Information

Application Number
CN202311410157.7
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-10-27
Publication Date
2026-06-23
Estimated Expiration
2043-10-27

AI Technical Summary

Technical Problem

Existing niobium tube target preparation technologies suffer from problems such as low density, high oxygen content, poor microstructure uniformity, and difficulty in preparing thick-walled niobium tube targets. These technologies cannot meet the stringent requirements of domestic manufacturers, and the preparation process is complex and costly, making them unsuitable for large-scale production.

Method used

Using niobium powder as raw material, a combination of cold isostatic pressing and hot isostatic pressing is employed. Specialized cold isostatic pressing tooling is used to control the particle size distribution of niobium powder. Combined with vacuum thermal degassing process, the densification of the niobium tube target material and its overall bonding with the back tube are achieved, avoiding secondary bonding.

Benefits of technology

A niobium tube target material with high density, uniform structure, small radial thickness deviation, and good straightness was prepared. The relative density was ≥99%, the oxygen content was ≤2500ppm, the length-to-diameter ratio was controllable, and the target material was integrally bonded to the back tube, which reduced production costs and was suitable for large-scale production.

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Abstract

The present application relates to a kind of preparation methods of niobium tube target material, belong to the preparation technical field of tubular target material for magnetron sputtering, the present application uses niobium powder as raw material, designs special cold isostatic pressing tooling, successively after granularity control proportioning and mechanical uniform mixing, cold isostatic pressing structure assembly, powder filling and cold isostatic pressing, cold isostatic pressing compact machining, hot isostatic pressing structure assembly, vacuum hot degassing of sheath, sheath hot isostatic pressing and machining process preparation niobium tube target material, the niobium tube target material prepared by the present application has the characteristics of high density, uniform structure, small radial thickness deviation, good straightness, controllable length-diameter ratio, and integral binding with back tube forming, etc., coating film applicability is wide, test shows that its relative density is ≥99%, oxygen content is ≤2500ppm, structure is uniform, radial thickness deviation is ≤0.3mm, straightness is ≤1mm, length-diameter ratio is controllable in the range of 8:1~20:1.
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