A method for curing a cadmium telluride power generation glass anti-reflection film

Abstract

This application discloses a method for curing an antireflective film on cadmium telluride (CTD) photovoltaic glass, relating to the field of photovoltaic technology, and aims to solve the technical problem of low curing efficiency in existing antireflective film curing processes. The curing method for the CTD antireflective film on cadmium telluride photovoltaic glass includes the following steps: obtaining a CTD photovoltaic glass substrate after a lamination process; preheating the CTD photovoltaic glass substrate, and then coating the TCO glass surface of the CTD photovoltaic glass substrate with an antireflective film solution to obtain a first CTD photovoltaic glass substrate; wherein the first CTD photovoltaic glass substrate includes a CTD photovoltaic glass substrate and an uncured antireflective film layer; subjecting the uncured antireflective film layer to high-temperature heating and rapid cooling to obtain a second CTD photovoltaic glass substrate; wherein the second CTD photovoltaic glass substrate includes a CTD photovoltaic glass substrate and a cured antireflective film layer.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photovoltaic, in particular to a curing method of a cadmium telluride power generation glass anti-reflection film. BACKGROUND

[0002] Photovoltaic glass is the best packaging material for protecting solar cells and itself has high transmittance. Improving the optical properties of photovoltaic glass, especially improving the transmittance, can improve the conversion efficiency of the cell. The anti-reflection film of photovoltaic glass, also known as the anti-reflection film of photovoltaic glass, is a film layer with anti-reflection effect coated on the surface of the front plate glass (photovoltaic glass) in the photovoltaic module. It can effectively improve the transmittance of sunlight on the photovoltaic glass, so as to improve the power generation efficiency of the solar cell.

[0003] However, for cadmium telluride power generation glass with special structure, it is difficult to ensure that the anti-reflection film layer in the cadmium telluride power generation glass is cured without damaging the power generation glass substrate while obtaining good curing effect using the existing process. SUMMARY

[0004] The main purpose of the present application is to provide a curing method of a cadmium telluride power generation glass anti-reflection film, which aims to solve the technical problem of low curing efficiency of the existing anti-reflection film curing process.

[0005] To solve the above technical problems, the embodiments of the present application provide a curing method of a cadmium telluride power generation glass anti-reflection film, comprising the following steps:

[0006] Obtain a cadmium telluride power generation glass substrate after a lamination process;

[0007] After preheating treatment of the cadmium telluride power generation glass substrate, the anti-reflection film solution is coated on the TCO glass surface of the cadmium telluride power generation glass substrate to obtain a first cadmium telluride power generation glass substrate; wherein the first cadmium telluride power generation glass substrate includes a cadmium telluride power generation glass substrate and an uncured anti-reflection film layer;

[0008] The uncured anti-reflection film layer is subjected to high-temperature heating treatment and rapid cooling treatment to obtain a second cadmium telluride power generation glass substrate; wherein the second cadmium telluride power generation glass substrate includes a cadmium telluride power generation glass substrate and a cured anti-reflection film layer.

[0009] As some optional embodiments of the present application, the high-temperature heating treatment and rapid cooling treatment of the uncured anti-reflection film layer to obtain the second cadmium telluride power generation glass substrate comprises:

[0010] The uncured anti-reflection film layer is subjected to high-temperature heating treatment, heated to a target heating temperature, and then subjected to rapid cooling treatment, cooled to a target cooling temperature, and then a second cadmium telluride power generation glass substrate is obtained.

[0011] As some optional embodiments of the present application, the high-temperature heating treatment of the uncured anti-reflective film layer is followed by rapid cooling treatment after heating to the target heating temperature and cooling to the target cooling temperature, to obtain a second cadmium telluride power generation glass substrate, comprising:

[0012] The first high-temperature heating treatment of the uncured anti-reflective film layer is followed by first rapid cooling treatment after heating to the target heating temperature and cooling to the target cooling temperature, to obtain a first solidified anti-reflective film layer.

[0013] The second high-temperature heating treatment of the first solidified anti-reflective film layer is followed by second rapid cooling treatment after heating to the target heating temperature and cooling to the target cooling temperature, to obtain a second cadmium telluride power generation glass substrate.

[0014] As some optional embodiments of the present application, the processing conditions of the first high-temperature heating treatment and the second high-temperature heating treatment are the same, and the processing conditions of the first rapid cooling treatment and the second rapid cooling treatment are the same.

[0015] As some optional embodiments of the present application, the target heating temperature refers to the target heating temperature of the anti-reflective film layer, which is ≥200℃, and the target cooling temperature refers to the target cooling temperature of the anti-reflective film layer, which is ≤60℃.

[0016] As some optional embodiments of the present application, the high-temperature heating treatment of the uncured anti-reflective film layer is followed by rapid cooling treatment after heating to the target heating temperature and cooling to the target cooling temperature, to obtain a second cadmium telluride power generation glass substrate, comprising:

[0017] The high-temperature heating treatment of the uncured anti-reflective film layer is performed by hot air knife, followed by rapid cooling treatment by cold air knife after heating to the target heating temperature and cooling to the target cooling temperature, to obtain a second cadmium telluride power generation glass substrate.

[0018] As some optional embodiments of the present application, the distance between the hot air knife and the uncured anti-reflective film layer is 3mm-5mm, and the outlet temperature of the hot air knife is 350℃-650℃.

[0019] The high-temperature heating treatment of the uncured anti-reflective film layer by hot air knife comprises linear sweeping heating treatment of the uncured anti-reflective film layer by hot air knife.

[0020] As some optional embodiments of the present application, the cooling rate of the rapid cooling treatment is 20℃ / s-50℃ / s.

[0021] As some optional embodiments of this application, the rapid cooling process using a cold air knife to obtain the second cadmium telluride photovoltaic glass substrate after cooling to the target cooling temperature includes:

[0022] The antireflective coating layer after high-temperature heating is subjected to a first-gradient cooling treatment using a cold air knife.

[0023] After the antireflective coating is cooled to the first target cooling temperature, a cold air knife is used to perform a second gradient cooling treatment on the antireflective coating.

[0024] After the antireflection film layer is cooled to the second target cooling temperature, a second cadmium telluride power generation glass substrate is obtained.

[0025] The first target cooling temperature is higher than the second target cooling temperature.

[0026] As some optional embodiments of this application, the antireflective film solution includes a SiO2 suspension;

[0027] When the antireflective coating is heated to the target heating temperature, the temperature of the cadmium telluride photovoltaic glass substrate is ≤100℃.

[0028] Compared with the prior art, the curing method of the antireflective film for cadmium telluride power generation glass described in this application uses a combination of high-temperature heating and rapid cooling when curing the antireflective film after coating it on the cadmium telluride power generation glass substrate after lamination. This improves the hardness of the antireflective film layer without affecting the performance of the power generation layer and the encapsulating film. Attached Figure Description

[0029] Figure 1 This is a schematic diagram of the structure of a crystalline silicon photovoltaic module;

[0030] Figure 2 This is a schematic diagram of the structure of cadmium telluride photovoltaic glass;

[0031] Figure 3 This is a schematic flowchart of the curing method for the antireflective film of cadmium telluride photovoltaic glass involved in the embodiments of this application;

[0032] Figure 4 This is a schematic diagram of the antireflective film curing device involved in the embodiments of this application;

[0033] in: Figure 1 In the diagram, number 1-1 is the anti-reflective coating, number 1-2 is the front glass, number 1-3 is the crystalline silicon cell, number 1-4 is the encapsulant film, and number 1-5 is the back glass. Figure 2 In the diagram, number 2-1 is the anti-reflective coating, number 2-2 is the substrate glass, number 2-3 is the power generation film, number 2-4 is the butyl rubber, number 2-5 is the backplate glass, and number 2-6 is the adhesive film.Figure 4 In the figure, reference numeral 4-1 is a cadmium telluride power glass substrate, reference numeral 4-2 is a hot air knife, reference numeral 4-3 is a cold air knife, and reference numeral 4-4 is a conveying roller. DETAILED DESCRIPTION

[0034] It should be understood that the specific embodiments described herein are merely exemplary and not intended to limit the application.

[0035] Solar energy is a renewable clean resource, and it is attracting more and more attention. One of the most direct means of using solar energy in today's society is solar photovoltaic power generation technology, which has been widely promoted worldwide. Photovoltaic glass is the best packaging material for protecting solar cells and has high transmittance. Improving the optical properties of photovoltaic glass, especially the transmittance, can improve the conversion efficiency of the cell. The antireflection film of photovoltaic glass, also known as the antireflection film of photovoltaic glass, is a film layer with antireflection effect coated on the surface of the front plate glass (photovoltaic glass) in the photovoltaic module. The main function of the antireflection film is to form a light trapping structure on the glass surface, increase the effective light transmission, and thus increase the absorption rate of the solar cell absorption layer and improve the photoelectric conversion efficiency. That is, it can effectively improve the transmittance of sunlight on the photovoltaic glass, thereby improving the power generation efficiency of the solar cell.

[0036] The structure diagram of the crystalline silicon photovoltaic module is shown in Figure 1 The crystalline silicon photovoltaic module includes, from top to bottom, an antireflection film coating, a front plate glass, a crystalline silicon cell, a glue film, and a back plate glass. In actual application, the antireflection film coating is the sunlight irradiation surface. The structure diagram of the cadmium telluride power glass is shown in Figure 2 The cadmium telluride power glass includes, from top to bottom, an antireflection film coating, a substrate glass, a power film, a butyl glue, a back plate glass, and a glue film. In actual application, the antireflection film coating is also the sunlight irradiation surface.

[0037] But the existing photovoltaic industry antireflection film curing process is mainly applied to crystalline silicon photovoltaic modules, that is, the front plate glass surface is coated with an antireflection film solution, and the glass coated with the antireflection film solution is cured at the same time as the semi-tempering / tempering process is completed, that is, the high-temperature curing of the antireflection film is completed in the tempering furnace. This method is suitable for crystalline silicon module structure, that is, "front plate glass + crystalline silicon cell + glass / back plate" structure, and the front plate glass can be processed separately for antireflection film process. The traditional crystalline silicon photovoltaic module antireflection film process is completed synchronously with the front plate glass tempering process, and is not affected by the photovoltaic cell & module process, and has realized mass production. The traditional crystalline silicon photovoltaic glass antireflection film curing process is glass cutting, edge grinding → cleaning → drying and preheating → antireflection film solution roller coating → pre-curing → glass tempering and antireflection film high-temperature curing in the tempering furnace; the crystalline silicon module preparation process is front plate glass with antireflection film → adhesive film laying, crystalline silicon cell string welding & lamination process → adhesive film laying & back plate glass bonding → lamination process.

[0038] But for cadmium telluride power generation glass (and other similar thin film photovoltaic cells such as perovskite thin film solar cells), because the preparation process of the cell is different from that of the crystalline silicon cell, the power generation layer is grown on the front plate glass, and considering the protection of the power generation layer film, it cannot be in contact with the transmission mechanism and cannot withstand high temperature, etc. The antireflection film process becomes a difficulty and cannot be mass-produced.

[0039] The cadmium telluride power generation glass (and other thin film photovoltaic modules) has a front plate glass with TCO (transparent conductive thin film) coating, that is, one side of the glass is a glass surface and the other side is a TCO film surface; among them, the TCO film surface is the cadmium telluride power generation glass cell process surface, and the antireflection film needs to be cured on the glass surface. The TCO glass production process is to coat the glass on the float line, so it is not possible to perform the antireflection film curing process synchronously.

[0040] The prior art needs to put the glass coated with the anti-reflective film solution into a tempering furnace / solidification furnace to heat and solidify the anti-reflective film at a high temperature. In this process, the whole glass / assembly is heated to a set temperature (>200℃, time >3min). The photovoltaic assembly packaging material generally adopts cross-linked EVA\POE. In this process, the cross-linking degree of EVA and POE will exceed the standard due to the secondary heating for solidification of the anti-reflective film. The corners of the assembly will be delaminated due to the warping of the glass caused by heating. This method is not suitable for the solidification of the anti-reflective film of the photovoltaic assembly. If the AR film layer of the cadmium telluride power generation glass is plated by the vapor deposition method, three layers of MgF2 film layer, ZrO2 / SiO2 film layer and Al2O3 / TiO2 film layer can be plated on the cadmium telluride power generation glass to form an AR film. The anti-reflective film formed by the deposition method has better uniformity and adhesion and very good anti-reflective effect, and the quality is better. After activation by cooling, the previously plated cadmium telluride film layer crystal grows again and is uniformly distributed. The AR film layer is further dried and recrystallized and diffused with the film layer. The film layer is more compact, and the service life is obviously improved. However, this method is realized in the front-end plating process of the cadmium telluride power generation glass. There are many process procedures in the middle and rear ends, such as laser scribing, wet chemical process, etc. The anti-reflective film is easily damaged by transmission and corroded by chemicals. In addition, the laser scribing process is affected. The laser scribing is performed from the glass surface (anti-reflective film surface) through the glass, and the vacuum plating method is used. The equipment and material prices are relatively high, resulting in high mass production cost.

[0041] In addition, due to the requirement of the anti-reflective film solidification process, the coated surface of the anti-reflective film faces upward, and the anti-reflective film process is performed on the TCO glass surface. The TCO film surface is in contact with the transmission roller, which will cause the TCO film surface to be contaminated or damaged, thereby affecting the photoelectric conversion efficiency of the cadmium telluride power generation glass. Therefore, it is difficult to perform the anti-reflective film processing on the TCO glass surface before the cadmium telluride power generation glass battery process. In addition, in the process of the cadmium telluride power generation glass battery process, the glass surface of the TCO glass is in contact with the equipment to ensure the integrity of the battery film layer.

[0042] As described above, the prior art mainly uses the following three methods to solidify the anti-reflective film layer:

[0043] 1) The method adopted by the crystalline silicon assembly is to coat the anti-reflective film before the front plate glass is tempered, and the solidification of the anti-reflective film solution is synchronized with the semi-tempering of the glass. The temperature of the tempering furnace is as high as 600℃ or above. This method will cause the packaging material and the power generation film layer to fail, and cannot be applied to the cadmium telluride power generation glass.

[0044] 2) When performing the battery film layer process on the TCO glass of cadmium telluride power generation glass, the anti-reflection film is deposited on the TCO glass surface by sputtering. On the one hand, the vacuum equipment and target material are expensive. On the other hand, the anti-reflection film will come into contact with the transmission mechanism (belt, roller, ceramic roller, etc.) during other processes, which will cause scratches on the anti-reflection film and affect the anti-reflection effect and appearance.

[0045] 3) The anti-reflective film that cures at room temperature requires more than 24 hours for the solution to cure naturally, which cannot be implemented on automated production lines, and the hardness after curing is relatively low.

[0046] To address the aforementioned technical issues, this application provides a curing method for the antireflective coating process of cadmium telluride power generation glass. Specifically, an antireflective coating and curing process is performed on the cadmium telluride power generation glass after the lamination process. The curing method employs rapid high-temperature heating and rapid cooling, ensuring that the hardness of the antireflective coating solution meets the standard without encapsulating the material properties. This enables a low-cost mass production process for the antireflective coating of cadmium telluride power generation glass.

[0047] Specifically, such as Figure 3 As shown in the embodiments of this application, the curing method for the antireflective film on cadmium telluride photovoltaic glass includes the following steps:

[0048] Step S10: Obtain the cadmium telluride photovoltaic glass substrate after lamination process.

[0049] Step S20: After preheating the cadmium telluride power generation glass substrate, an antireflective coating solution is applied to the TCO glass surface of the cadmium telluride power generation glass substrate to obtain a first cadmium telluride power generation glass substrate; wherein, the first cadmium telluride power generation glass substrate includes a cadmium telluride power generation glass substrate and an uncured antireflective coating layer.

[0050] Step S30: Perform high-temperature heating and rapid cooling on the uncured antireflective film layer to obtain a second cadmium telluride power generation glass substrate; wherein, the second cadmium telluride power generation glass substrate includes a cadmium telluride power generation glass substrate and a cured antireflective film layer.

[0051] As can be seen, compared with the prior art, the curing method for the cadmium telluride photovoltaic glass antireflective film described in this application, after coating the antireflective film on the cadmium telluride photovoltaic glass substrate after the lamination process, employs a combination of high-temperature heating and rapid cooling during the curing process. This improves the hardness of the antireflective film layer without affecting the performance of the power generation layer and the encapsulating film. The antireflective film layer cured by the method described in this application achieves a pencil hardness of 3H and a short-circuit current gain of 2.5%-3%. It can be seen that the cadmium telluride photovoltaic glass antireflective film obtained by the curing method described in this application has higher pencil hardness and gain than the prior art.

[0052] That is, the embodiments of the present application mainly improve the solidification treatment method of the anti-reflective film layer to improve the hardness of the anti-reflective film layer without affecting the performance of the power generation layer and the packaging adhesive film. Specifically, the high-temperature heating treatment and rapid cooling treatment of the uncured anti-reflective film layer to obtain a second cadmium telluride power generation glass substrate comprises: high-temperature heating treatment of the uncured anti-reflective film layer, heating to the target heating temperature, and then rapid cooling treatment, cooling to the target cooling temperature, and then obtaining a second cadmium telluride power generation glass substrate.

[0053] It should be noted that the purpose of the pre-heating treatment is to evaporate water vapor and reach the process temperature of the anti-reflective film coating, which is generally 35-50°C. Of course, different pre-heating treatment temperatures correspond to different coating speeds, so the pre-heating temperature can be selected according to actual needs, which is not specially limited here. In addition, the coating process of the anti-reflective film solution refers to uniformly coating the anti-reflective film solution on the surface of the substrate glass by using a coating process, and the coating process includes spraying, rolling or showering, etc. The coating process can also be selected according to actual needs, which is not specially limited here.

[0054] It should be noted that because the anti-reflective film needs to be cured at a temperature above 200°C for more than 2 minutes, the target heating temperature of the anti-reflective film layer is ≥200°C. However, it should be noted that when the anti-reflective film layer is heated to the target heating temperature, the temperature of the cadmium telluride power generation glass substrate is ≤100°C to avoid affecting the performance of the power generation glass. However, after the cadmium telluride power generation glass is laminated, if it is again subjected to high-temperature heating treatment above 100°C, it is easy to cause the crosslinking degree of the packaging adhesive film between the glasses to exceed the standard or to age, so the embodiments of the present application use a combination of rapid high-temperature heating and rapid cooling to solidify the anti-reflective film layer, that is, the target cooling temperature of the anti-reflective film layer is ≤60°C.

[0055] It should be noted that the thickness of the TCO glass layer in the cadmium telluride power generation glass substrate is generally about 3.2 mm, and when the anti-reflection film solution coated surface reaches a high temperature, the glass needs time for heat conduction, so the application adopts rapid high-temperature heating of the anti-reflection film coated surface glass, and based on the actual application requirements, the anti-reflection film reaches a high-temperature heating effect by controlling the heating rate, temperature or fan air volume; and ensure that the internal temperature of the assembly does not exceed 100℃ during the heating process, and then rapid cooling is performed to achieve the solidification of the anti-reflection film without affecting the performance of the power generation layer and the encapsulation adhesive film. For example, the air knife outlet width is 4-5 mm, the air knife outlet air speed is 10-15 M / S, the air knife outlet and glass spacing is 5-10 mm, the heater set temperature is 650℃, the air knife outlet temperature is 550-580℃, the glass coated with anti-reflection film solution is transmitted through the hot air knife at a speed of 600 mm / min, and then cooled, the actual measured temperature of the anti-reflection film coated surface glass surface is as high as 170-180℃, the temperature is reduced to 60℃ in 40s without the aid of a cooling mechanism and under room temperature conditions, and the non-anti-reflection film coated surface temperature is measured to be as high as 55-60℃.

[0056] The anti-reflection film solution used in the embodiment of the application includes SiO2 suspension liquid, which can effectively improve the hardness and adhesion of the anti-reflection film solution after solidification through rapid cooling treatment after high temperature. It should be noted that the anti-reflection film solution can also be other anti-reflection film solutions such as silicate or aluminum oxide, but when other anti-reflection film solutions are used for solidification, the number of heating and cooling times needs to be matched accordingly.

[0057] Generally speaking, when a material solidifies at room temperature, its crystal structure gradually forms and increases the hardness and strength of the material. But in a high temperature state, atoms can be easily rearranged, and the crystal structure will become more loose, and the hardness and strength will decrease. Rapid cooling method makes the material suddenly cool down from high temperature, thereby significantly slowing down the speed of the crystal structure returning to the original state, thereby producing fine crystal structure, so that the material has higher macroscopic performance, that is, the material has higher bonding density, and has better hardness and strength.

[0058] In practical application, the antireflection film layer may not be completely solidified after the first high-temperature treatment and the first cooling treatment. Therefore, the antireflection film layer can be subjected to heat and cold treatment (i.e., high-temperature heating treatment and rapid cooling treatment) according to actual process requirements to achieve solidification of the antireflection film layer. That is, after the high-temperature heating treatment of the unsolidified antireflection film layer to the target heating temperature, the rapid cooling treatment is performed, and after cooling to the target cooling temperature, a second cadmium telluride power generation glass substrate is obtained. The method comprises the following steps: after the first high-temperature heating treatment of the unsolidified antireflection film layer to the target heating temperature, the first rapid cooling treatment is performed, and after cooling to the target cooling temperature, a first solidified antireflection film layer is obtained; after the second high-temperature heating treatment of the first solidified antireflection film layer to the target heating temperature, the second rapid cooling treatment is performed, and after cooling to the target cooling temperature, a second cadmium telluride power generation glass substrate is obtained.

[0059] It should be noted that the above-mentioned "first" and "second" are only used to represent the order, and do not limit the number of cycles of heat and cold treatment. The number of cycles of heat and cold treatment can be set according to actual application requirements, which is not specially limited here. However, it should be noted that if the above-mentioned steps are used for conventional heat and cold treatment, the processing conditions of the first high-temperature heating treatment and the second high-temperature heating treatment are the same, and the processing conditions of the first rapid cooling treatment and the second rapid cooling treatment are the same. If the above-mentioned steps are used for gradient heating / gradient cooling, the processing conditions remain the same except for the heating / cooling temperature. That is, the above-mentioned processing conditions mainly refer to the heating device / cooling device, heating method / cooling method, or heating time / cooling time, etc.

[0060] It should be noted that the above-mentioned high-temperature heating treatment and rapid cooling treatment can be air heating / air cooling, liquid heating / liquid cooling, or gas heating / gas cooling, etc. However, it is easier to control the process by using an air knife. Therefore, in the above-mentioned embodiments, the air knife is taken as an example for specific illustration. That is, after the high-temperature heating treatment of the unsolidified antireflection film layer to the target heating temperature, the rapid cooling treatment is performed, and after cooling to the target cooling temperature, a second cadmium telluride power generation glass substrate is obtained. The method comprises the following steps: using a hot air knife to perform high-temperature heating treatment on the unsolidified antireflection film layer to the target heating temperature, and using a cold air knife to perform rapid cooling treatment, and after cooling to the target cooling temperature, a second cadmium telluride power generation glass substrate is obtained.

[0061] The distance between the hot air knife and the unhardened anti-reflective film layer is 3-5 mm, and the outlet temperature of the hot air knife is 350-650°C. Specifically, the outlet temperature is controlled by setting the heater temperature and the fan speed, and the fan speed is set to be greater than or equal to 10 m / s. After the fan speed is set, the heater temperature is adjusted to achieve the required outlet temperature. The heater temperature is set to be constant.

[0062] The high-temperature heating treatment of the unhardened anti-reflective film layer by the hot air knife includes linear sweeping and heating treatment of the unhardened anti-reflective film layer by the hot air knife.

[0063] When the wind knife is used for heating / cooling treatment, an anti-reflective film curing device can be used for treatment, as shown in Figure 4 The device should include core components such as a centrifugal fan, a wind pipe, a heater, a wind knife, and a transmission mechanism. The centrifugal fan is mainly used to provide the required air volume for the wind knife. The wind pipe is mainly used to connect the fan and the heater / wind knife. The heater is mainly used to heat the air sent by the fan to the required temperature. The wind knife is mainly used to blow the heated hot / cold air to the anti-reflective film solution coating surface according to the structure of the wind knife. The transmission mechanism is mainly used for transmission between components and transmission speed adjustment. The transmission speed is controlled under the hot air knife and the cold air knife.

[0064] However, due to the surface temperature gradient change caused by rapid cooling of the glass, the power generation glass is prone to thermal explosion. Therefore, the cooling rate of the rapid cooling process is controlled to be within 20-50°C / s, and the substrate is cooled to below 60°C. That is, by adjusting the cooling rate, the change of the surface temperature gradient can be reduced. For example, using a relatively mild cooling medium or adjusting the cooling rate can help avoid sudden temperature changes, thereby avoiding thermal explosion of the power generation glass.

[0065] Or by gradient cooling, the risk of glass breakage is reduced, that is, gradient cooling is used to reduce the change of the surface temperature gradient. For example, by using multiple cooling medium regions or adjusting the temperature of the cooling medium, gradient cooling can reduce the temperature gradient change caused by rapid cooling, thereby reducing the risk of glass breakage. Specifically, the rapid cooling process by the cold air knife to the target cooling temperature to obtain the second cadmium telluride power generation glass substrate includes: first gradient cooling treatment of the anti-reflective film layer after high-temperature heating treatment by the cold air knife; second gradient cooling treatment of the anti-reflective film layer by the cold air knife after the anti-reflective film layer is cooled to the first target cooling temperature; and obtaining the second cadmium telluride power generation glass substrate after the anti-reflective film layer is cooled to the second target cooling temperature. The first target cooling temperature is higher than the second target cooling temperature.

[0066] In order to avoid the anti-reflection film from being in contact with the transmission mechanism (belt, roller, ceramic roller, etc.) during the sputtering coating process of the TCO glass of the cadmium telluride power generation glass, which causes the anti-reflection film to be scratched, thereby affecting the anti-reflection effect and appearance. In some preferred embodiments of the present application, the anti-reflection film curing process is added between the laminating process and the junction box process, that is, after the laminating process is completed, the substrate is turned over by 180°, the TCO glass is faced upwards, and then the anti-reflection film is coated and cured. After the curing is completed, the substrate is turned over by 180° again, and the subsequent junction box process and other processes are continued, thereby avoiding damage to the power generation layer and the anti-reflection film layer.

[0067] In addition, the curing method of the anti-reflection film of the cadmium telluride power generation glass described in the embodiments of the present application is relatively simple to operate and has a low curing cost, and can be used to realize mass production process of the anti-reflection film of the cadmium telluride power generation glass.

[0068] In order to facilitate those skilled in the art to understand the technical solutions described in the present application, the curing method of the anti-reflection film of the cadmium telluride power generation glass described in the present application will be further described in combination with the specific embodiments as follows:

[0069] Embodiment 1

[0070] Step 1, obtain the cadmium telluride power generation glass substrate after the laminating process, and use the adhesive tape to seal the back glass hole of the cadmium telluride power generation glass substrate to avoid water vapor entering during cleaning; use the cleaning machine to clean the TCO glass surface to ensure the cleanliness of the anti-reflection film coating surface.

[0071] Step 2, preheat the cadmium telluride power generation glass substrate under the condition of 35℃-50℃; after the preheating is completed, the anti-reflection film solution is coated on the TCO glass surface of the cadmium telluride power generation glass substrate to obtain a first cadmium telluride power generation glass substrate; wherein the first cadmium telluride power generation glass substrate comprises a cadmium telluride power generation glass substrate and an un-cured anti-reflection film layer.

[0072] Step 3, heat the anti-reflection film surface glass using a hot air knife or other methods under the condition of 350℃-500℃, and then perform rapid cooling (the rapid cooling process includes air cooling, liquid cooling, and gas cooling methods). According to the process requirements, the curing process is completed by N cycles to obtain a second cadmium telluride power generation glass substrate; wherein the second cadmium telluride power generation glass substrate comprises a cadmium telluride power generation glass substrate and a cured anti-reflection film layer.

[0073] Step S40, turn over the second cadmium telluride power generation glass substrate after the curing process by 180°, and continue the subsequent other processes.

[0074] The hardness of the anti-reflection film layer in the second cadmium telluride power glass substrate cured by the above method is greatly improved, and the second cadmium telluride power glass substrate is damaged during the curing process, so that the power generation efficiency performance of the second cadmium telluride power glass substrate is not reduced.

[0075] For example, the experimental sample is a 3.2mm power glass substrate+0.5mm EVA+3.2mm back plate glass structure, with a size of 1600*1200mm; the heating device is two 16KW heaters, two 600*4mm air knives, and one 2.2KW frequency conversion fan. The air knife outlet air speed is set to 11M / S, the air knife outlet and glass spacing is 10mm, the heater setting temperature is 650℃, the air knife outlet temperature is 550-580℃, the glass coated with the anti-reflection film solution is transmitted through the hot air knife at a speed of 600mm / min, and then cooled. Cooling is performed by 12 80W 2600r / min axial flow fans (6 above and 6 below), the pencil hardness of the cured anti-reflection film layer is 3H, and the short circuit current gain is 2.5%-3%. The purpose of the present application is to complete the coating and curing of the anti-reflection film solution after the laminating process, without affecting the crosslinking degree of the packaging adhesive film. The pencil hardness and gain are higher than those of the prior art.

[0076] The above only discloses part of the embodiments of the present application, and of course cannot limit the scope of the rights of the present application. Those skilled in the art can understand that the above-mentioned all or part of the processes can be implemented, and equivalent changes made according to the claims of the present application still belong to the scope covered by the present application.

Claims

1. A method for curing a cadmium telluride power generation glass anti-reflective film, characterized by, The method comprises the following steps: obtaining a cadmium telluride power generation glass substrate after a lamination process; carrying out a pre-heating treatment on the cadmium telluride power generation glass substrate, and then coating an anti-reflection film solution on a TCO glass surface of the cadmium telluride power generation glass substrate to obtain a first cadmium telluride power generation glass substrate; the first cadmium telluride power generation glass substrate comprises a cadmium telluride power generation glass substrate and an uncured anti-reflection film layer; the anti-reflection film solution comprises SiO2 suspension liquid; carrying out linear blowing and heating treatment on the uncured anti-reflection film layer by using a hot air knife, heating to a target heating temperature, and then carrying out rapid cooling treatment by using a cold air knife, cooling to a target cooling temperature to obtain a second cadmium telluride power generation glass substrate; the target heating temperature of the anti-reflection film layer is ≥200°C; the target cooling temperature of the anti-reflection film layer is ≤60°C; the distance between the hot air knife and the uncured anti-reflection film layer is 3mm-5mm, and the outlet temperature of the hot air knife is 350°C-650°C; the cooling rate of the rapid cooling treatment is 20°C / s-50°C / s; wherein the second cadmium telluride power generation glass substrate comprises a cadmium telluride power generation glass substrate and a cured anti-reflection film layer; when the anti-reflection film layer is heated to the target heating temperature, the temperature of the cadmium telluride power generation glass substrate is ≤100°C; or, after the rapid cooling treatment by using the cold air knife and cooling to the target cooling temperature, the second cadmium telluride power generation glass substrate is obtained by using a cold air knife to carry out first gradient cooling treatment on the anti-reflection film layer after high-temperature heating treatment; after the anti-reflection film layer is cooled to a first target cooling temperature, the cold air knife is used to carry out second gradient cooling treatment on the anti-reflection film layer; after the anti-reflection film layer is cooled to a second target cooling temperature, the second cadmium telluride power generation glass substrate is obtained; wherein the first target cooling temperature is higher than the second target cooling temperature.

2. The method of claim 1, wherein the cadmium telluride glass solar cell anti-reflective coating is cured at a temperature of about 150°C to about 200°C. the high-temperature heating treatment on the uncured anti-reflection film layer, heating to the target heating temperature, and then the rapid cooling treatment, cooling to the target cooling temperature, and obtaining the second cadmium telluride power generation glass substrate, comprises: carrying out first high-temperature heating treatment on the uncured anti-reflection film layer, heating to the target heating temperature, and then carrying out first rapid cooling treatment, cooling to the target cooling temperature, and obtaining a first cured anti-reflection film layer; carrying out second high-temperature heating treatment on the first cured anti-reflection film layer, heating to the target heating temperature, and then carrying out second rapid cooling treatment, cooling to the target cooling temperature, and obtaining the second cadmium telluride power generation glass substrate.

3. The method of claim 2, wherein the cadmium telluride glass solar cell anti-reflective coating is cured at a temperature of about 150°C to about 200°C. the processing conditions of the first high-temperature heating treatment and the second high-temperature heating treatment are the same, and the processing conditions of the first rapid cooling treatment and the second rapid cooling treatment are the same.

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