A device for the reverse disproportionation reaction

Abstract

The present application relates to the technical field of chemical production, and discloses a kind of disproportionation reaction devices, comprising: conveying pipeline assembly: including feed pipe and discharge pipe;Disproportionation reaction tower: including tower body, the filler frame being arranged in tower body and resin being arranged on filler frame;Adjusting pipeline assembly, including several communication pipes being arranged between the conveying pipeline assembly and the disproportionation reaction tower and control valve for controlling the communication of the conveying pipeline assembly and the disproportionation reaction tower;The control valve controls material to be fed from the bottom of disproportionation reaction tower, discharged from the top and fed from the top of disproportionation reaction tower, discharged from the bottom two flow states, solves the problem that resin performance is wasted when resin at the top and the bottom of traditional disproportionation reactor is in different operating conditions during replacement.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of chemical production, and particularly discloses a disproportionation reaction device. BACKGROUND

[0002] At present, most polycrystalline silicon enterprises adopt the improved Siemens method to produce polycrystalline silicon, and trichlorosilane is a basic raw material for producing polycrystalline silicon, and the purity of trichlorosilane is required to be higher in order to improve the quality of polycrystalline silicon. Polycrystalline silicon manufacturers generally adopt a dichlorosilane disproportionation chemical process to obtain trichlorosilane. Dichlorosilane from an external system and silicon tetrachloride returned from a pre-separation system are mixed according to a certain molar ratio or mass ratio, and then are sent into a disproportionation reaction column. The disproportionation reaction column is controlled to be in a certain temperature range, and dichlorosilane and silicon tetrachloride react to generate trichlorosilane under the action of a disproportionation resin as a catalyst. The catalyst used for disproportionation is mainly a macroporous ion exchange resin loaded with ammonia and ammonium salt, and has the functions of catalysis and adsorption of boron impurities.

[0003] In this process, dichlorosilane is a strong corrosive and toxic gas with a boiling point of only 8.2 DEG C and a self-ignition temperature of 58 DEG C, and is not suitable for long-term storage on site. Recovering dichlorosilane in a rectification process can not only solve the problem of polycrystalline silicon production cost, but also effectively eliminate safety hazards. Disproportionation provides an effective recovery way for dichlorosilane. However, in the prior art, the operation mode of the bottom feeding and the top discharging of the disproportionation reactor is maintained for a long time, so that the resin in the lower part of the disproportionation reactor participates in the reaction for a long time, and the resin in the top part of the disproportionation reactor participates in the reaction less. At the same time, the temperature of the top part of the disproportionation reactor is affected by the reaction heat, and the discharging temperature is high. In this way, the resins in the top part and the bottom part of the disproportionation reactor are in different operating conditions. The relative general situation is that when the bottom resin is invalid, the top resin still has certain catalytic function. In this case, the resin needs to be replaced, which not only causes the waste of the use performance of the resin, but also leads to a high replacement frequency of the resin, thereby reducing the production efficiency and increasing the production cost. Therefore, the inventor provides a disproportionation reaction device in order to solve the above problems. SUMMARY

[0004] The purpose of the present application is to solve the problem of waste of the use performance of the resin caused by the different operating conditions of the top and bottom resins in the traditional disproportionation reactor during replacement.

[0005] In order to achieve the above purpose, the basic scheme of the present application provides a disproportionation reaction device, which comprises:

[0006] The conveying pipeline assembly comprises a feeding pipeline and a discharging pipeline.

[0007] The dehydrogenation reactor tower comprises a tower body, a filler frame arranged in the tower body, and resin arranged on the filler frame;

[0008] The adjusting pipeline assembly comprises a plurality of communication pipelines arranged between the conveying pipeline assembly and the dehydrogenation reactor tower and control valves for controlling the communication between the conveying pipeline assembly and the dehydrogenation reactor tower.

[0009] The control valves control the flow of the material in two flow states, i.e., bottom feeding and top discharging of the dehydrogenation reactor tower and top feeding and bottom discharging of the dehydrogenation reactor tower.

[0010] The principle and effect of the basic scheme are as follows:

[0011] Compared with the prior art, the flow path of the material is arranged in two flow states, i.e., bottom feeding and top discharging of the dehydrogenation reactor tower and top feeding and bottom discharging of the dehydrogenation reactor tower, so that the bottom resin and the top resin of the dehydrogenation reactor are uniformly loaded, the resin partial resolution function is realized, the service life of the resin is prolonged, and the problem of waste of the performance of the resin caused by the resin at the top and the bottom being in different operating conditions in the traditional dehydrogenation reactor during replacement is solved.

[0012] Further, the control valve comprises:

[0013] The valve body is in communication with the feeding pipeline and the discharging pipeline at the top of the valve body;

[0014] The valve core is in rotary sealing connection with the valve body at the top of the valve core, and a pair of through holes are arranged on the valve core and can be in communication with the feeding pipeline and the discharging pipeline, respectively;

[0015] The baffle is arranged between the valve core and the bottom of the valve body, and the baffle divides the space between the valve core and the bottom of the valve body into a first cavity and a second cavity, and the first cavity and the second cavity are in communication with the bottom and the top of the dehydrogenation reactor tower, respectively;

[0016] When one pair of through holes is in communication with the feeding pipeline and the discharging pipeline, respectively, the feeding pipeline and the discharging pipeline are in communication with the first cavity and the second cavity, respectively;

[0017] When the other pair of through holes is in communication with the feeding pipeline and the discharging pipeline, respectively, the feeding pipeline and the discharging pipeline are in communication with the second cavity and the first cavity, respectively.

[0018] By arranging the valve body, the valve core, and the baffle, the flow of the material can be conveniently adjusted in different directions by rotating the valve core, so that the flow direction of the material in the dehydrogenation reactor tower can be conveniently adjusted.

[0019] Further, the through hole comprises a first connecting hole, a second connecting hole, a third connecting hole and a fourth connecting hole, the first connecting hole and the third connecting hole are arranged in pairs and penetrate the valve core and can respectively communicate with the inlet pipe and the outlet pipe; the second connecting hole and the fourth connecting hole are arranged in pairs and can respectively communicate with the inlet pipe and the outlet pipe, and the second connecting hole and the fourth connecting hole are respectively provided with a flow guide channel. When the first connecting hole and the third connecting hole respectively communicate with the inlet pipe and the outlet pipe, the material flows in one direction; and when the second connecting hole and the fourth connecting hole respectively communicate with the inlet pipe and the outlet pipe, the material flows in the other direction under the action of the flow guide channel, so that the flow direction of the material is adjusted.

[0020] Further, the tower body is provided with a partition plate symmetrically dividing the tower body, the partition plate divides the tower body into a first reaction cavity and a second reaction cavity, and the flow directions of the materials in the first reaction cavity and the second reaction cavity are opposite. By arranging the first reaction cavity and the second reaction cavity with opposite flow directions, the temperature in the tower body is more stable, thereby improving the uniformity of the working conditions of the resin in the tower body, and improving the utilization of the performance of all resins.

[0021] Further, the communication pipeline is arranged between the first cavity, the second cavity and the top and bottom of the first reaction cavity and the top and bottom of the second reaction cavity, so that the first cavity communicates with the bottom of the first reaction cavity and the top of the second reaction cavity, and the second cavity communicates with the top of the first reaction cavity and the bottom of the second reaction cavity. By this arrangement, the materials in the first reaction cavity and the second reaction cavity can realize two flow states of bottom feeding and top discharging and top feeding and bottom discharging, further improving the uniformity of the resin working condition environment.

[0022] Further, the tower body is provided with a heat conduction ring communicating the first reaction cavity and the second reaction cavity, and the heat conduction ring is filled with a heat conduction medium. The heat conduction medium in the heat conduction ring stabilizes the temperature in the first reaction cavity and the second reaction cavity, so that the temperature difference between the first reaction cavity and the second reaction cavity is small, further improving the uniformity of the resin working condition environment.

[0023] Further, the tower body is provided with a detection ring arranged in the first reaction cavity and the second reaction cavity respectively, the detection ring is filled with a detection medium, and one end of the detection ring extends out of the tower body and is provided with a detection instrument. The detection ring facilitates detection of the temperature in the first reaction cavity and the second reaction cavity respectively.

[0024] Further, the partition plate is uniformly provided with a plurality of semiconductor cooling fins, and the cold end and the hot end of the semiconductor cooling fins are communicated with the first reaction cavity and the second reaction cavity respectively.

[0025] Based on the same inventive concept, the present application provides a method for transdechlorination reaction, which comprises using the transdechlorination reaction device described above to perform transdechlorination reaction on dichlorodihydrogen silicon.

[0026] Further, the step of using the transdechlorination reaction device described above to perform transdechlorination reaction on dichlorodihydrogen silicon is as follows:

[0027] Step S001: By adjusting the control valve, the connecting pipeline is used to pass the mixed material of dichlorodihydrogen silicon and silicon tetrachloride from the feed pipeline into the bottom of the tower body, and the mixed material is discharged from the top of the tower body and the discharge pipeline after transdechlorination reaction in the tower body;

[0028] Step S002: By adjusting the control valve, the connecting pipeline is used to pass the mixed material of dichlorodihydrogen silicon and silicon tetrachloride from the feed pipeline into the top of the tower body, and the mixed material is discharged from the bottom of the tower body and the discharge pipeline after transdechlorination reaction in the tower body;

[0029] The steps S001 and S002 described above are repeated in turn with a cycle of three months.

[0030] Compared with the prior art, the method sets the flow path of the material as two flow states of bottom feeding and top discharging of the transdechlorination reaction tower and top feeding and bottom discharging of the transdechlorination reaction tower, and performs periodic reciprocal adjustment, so that the resin at the bottom and the resin at the top of the transdechlorination reactor are uniformly loaded, the resin partial resolution function is realized, the service life of the resin is prolonged, and the problem of waste of resin use performance caused by the resin at the top and the bottom in different operating conditions in the traditional transdechlorination reactor during replacement is solved. BRIEF DESCRIPTION OF DRAWINGS

[0031] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0032] Figure 1 A system diagram of a transdechlorination reaction device according to an embodiment of the present application is shown;

[0033] Figure 2A reverse disproportionation reaction device is shown in the embodiment of the present application.

[0034] Figure 3 A control valve is shown in the embodiment of the present application.

[0035] Figure 4 A valve core is shown in the embodiment of the present application. DETAILED DESCRIPTION

[0036] To further illustrate the technical means and effects adopted by the present application to achieve the predetermined purposes, the specific embodiments, structures, features and effects according to the present application are described in detail below in combination with the drawings and preferred embodiments.

[0037] The reference signs in the drawings include: a reverse disproportionation reaction tower 1, a partition plate 2, a first pipeline 3, a second pipeline 4, a third pipeline 5, a fourth pipeline 6, a first reaction cavity 7, a second reaction cavity 8, a semiconductor cooling fin 9, a heat conduction ring 10, a detection ring 11, a detection instrument 12, a lower valve body 13, a valve core 14, a baffle 15, an upper valve body 16, a feeding pipeline 17, a discharging pipeline 18, a shifting piece 19, a first connecting hole 20, a second connecting hole 21, a third connecting hole 22, a fourth connecting hole 23, and a flow guide channel 24.

[0038] A reverse disproportionation reaction device is shown in the embodiment as Figure 1 The device includes the following structures:

[0039] The feeding pipeline 17 is used to feed the mixed material of mixed dichlorodihydrogen silicon and silicon tetrachloride, and the discharging pipeline 18 is used to discharge trichlorohydrogen silicon generated after the reverse disproportionation reaction.

[0040] The reverse disproportionation reaction tower 1 is shown in the embodiment as Figure 2As shown, the tower body, the packing support arranged in the tower body and the resin arranged on the packing support, in this embodiment, the tower body is provided with a partition plate 2 which divides the tower body into a first reaction cavity 7 and a second reaction cavity 8, the first reaction cavity 7 and the second reaction cavity 8 are both provided with the packing support and the resin, the flow directions of the materials in the first reaction cavity 7 and the second reaction cavity 8 are opposite; the tower body is further provided with a heat conduction ring 10 which communicates the first reaction cavity 7 and the second reaction cavity 8, the heat conduction ring 10 is filled with heat conduction medium; the tower body is further provided with a detection ring 11 which is respectively arranged in the first reaction cavity 7 and the second reaction cavity 8, the detection ring 11 is filled with detection medium, one end of the detection ring 11 extends out of the tower body and is provided with a detection instrument 12, the detection instrument 12 is a temperature detection instrument, the heat conduction ring 10 and the detection ring 11 are arranged in the vertical direction of the tower body. The partition plate 2 is uniformly provided with a plurality of semiconductor cooling fins 9, the cold end and the hot end of the semiconductor cooling fin 9 are respectively communicated with the first reaction cavity 7 and the second reaction cavity 8. A plurality of semiconductor cooling fins 9 are arranged at the same horizontal height, part of the cold end of the semiconductor cooling fin 9 is communicated with the first reaction cavity 7, part of the cold end is communicated with the second reaction cavity 8, and part of the hot end of the semiconductor cooling fin 9 is communicated with the first reaction cavity 7, part of the hot end is communicated with the second reaction cavity 8. The semiconductor cooling fin 9 is powered from the outside of the tower body and controlled to be powered on and powered off respectively, one end of the semiconductor cooling fin 9 is refrigerated, one end is heated, and the cold end and the hot end of the semiconductor cooling fin are communicated with the first reaction cavity 7 and the second reaction cavity 8 respectively, which is convenient for adjusting the temperature in the first reaction cavity 7 and the second reaction cavity 8, and the stability of the temperature in the first reaction cavity 7 and the second reaction cavity 8.

[0041] The adjusting pipeline assembly comprises a plurality of communication pipelines arranged between the conveying pipeline assembly and the reverse disproportionation reaction tower 1 and a control valve for controlling the communication between the conveying pipeline assembly and the reverse disproportionation reaction tower 1. Figure 3 As shown, the control valve comprises a valve body, a valve core 14 and a baffle 15, the valve body comprises an upper valve body 16 and a lower valve body 13, the top of the upper valve body 16 is communicated with the feeding pipeline 17 and the discharging pipeline 18; the top of the valve core 14 is rotationally and sealingly connected with the valve body, and a pair of four through holes which can be respectively communicated with the feeding pipeline 17 and the discharging pipeline 18 are arranged on the valve core 14, which are a first connecting hole 20, a second connecting hole 21, a third connecting hole 22 and a fourth connecting hole 23, as shown in Figure 4 The first connecting hole 20 and the third connecting hole 22 penetrate the valve core 14, the second connecting hole 21 and the fourth connecting hole 23 do not penetrate the valve core 14, and a flow guide channel 24 is arranged between the second connecting hole 21 and the first connecting hole 20 and between the fourth connecting hole 23 and the third connecting hole 22; the baffle 15 is arranged between the valve core 14 and the bottom of the lower valve body 13, and the baffle 15 divides the space between the valve core 14 and the bottom of the lower valve body 13 into a first cavity and a second cavity, the upper valve body 16 and the lower valve body 13 form an arc-shaped groove with an angle of 90° after being closed, and the side wall of the valve core 14 is provided with a push piece 19 which can be pushed along the arc-shaped groove, as shown inFigure 3 and Figure 4 As shown in the figure, the first connecting hole 20 and the second connecting hole 21 are located on the same side and above the first cavity, the third connecting hole 22 and the fourth connecting hole 23 are located on the other side and above the second cavity, at this time, the first connecting hole 20 is communicated with the feeding pipe 17, the third connecting hole 22 is communicated with the discharging pipe 18, and the second connecting hole 21 and the fourth connecting hole 23 are in the state of not being communicated, that is, the feeding pipe 17 is communicated with the first cavity, and the discharging pipe 18 is communicated with the second cavity, which is called forward feeding in the embodiment. When the knob 19 is turned counterclockwise by 90°, the first connecting hole 20 and the fourth connecting hole 23 are located on the same side and above the first cavity, the second connecting hole 21 and the third connecting hole 22 are located on the same side and above the second cavity, at this time, the fourth connecting hole 23 is communicated with the feeding pipe 17, the second connecting hole 21 is communicated with the discharging pipe 18, and the first connecting hole 20 and the third connecting hole 22 are in the state of not being communicated, but the material enters the first connecting hole 20 and the third connecting hole 22 through the flow guide channel 24, so that the feeding pipe 17 is communicated with the second cavity, and the discharging pipe 18 is communicated with the first cavity, which is called reverse feeding in the embodiment. The communication pipe includes the first pipe 3 arranged at the bottom of the left side of the first cavity and communicated with the first reaction cavity 7, the second pipe 4 arranged at the bottom of the right side of the second cavity and communicated with the second reaction cavity 8, the third pipe 5 arranged at the top of the left side of the second cavity and communicated with the first reaction cavity 7, and the fourth pipe 6 arranged at the top of the right side of the first cavity and communicated with the second reaction cavity 8.

[0042] In the implementation process of the present application, the adjusting control valve is located Figure 3When the position is shown, the feeding pipe 17 is communicated with the first cavity, the discharging pipe 18 is communicated with the second cavity, so that the material in the first reaction cavity 7 flows from bottom to top, and the material in the second reaction cavity 8 flows from top to bottom, and the mixed material of dichlorodihydrogen silicon and silicon tetrachloride respectively performs reverse disproportionation reaction under the catalysis of the resin in the first reaction cavity 7 and the second reaction cavity 8, at this time, the heat conduction medium in the heat conduction ring 10 plays a stabilizing role on the temperature in the first reaction cavity 7 and the second reaction cavity 8, so that the temperature difference between the first reaction cavity 7 and the second reaction cavity 8 is small, and the uniformity of the resin working condition environment is further improved; and the detection ring 11 detects the temperature in the first reaction cavity 7 and the second reaction cavity 8 respectively, and displays through the detection instrument 12, when it is found that the temperature in the first reaction cavity 7 and the second reaction cavity 8 is different and the heat conduction medium in the heat conduction ring 10 cannot be adjusted in time, one of the first reaction cavity 7 and the second reaction cavity 8 has lower temperature and the other has higher temperature, at this time, the semiconductor cooling sheet 9 is powered on to heat the reaction cavity with lower temperature and cool the reaction cavity with higher temperature, so as to maintain the balance of the overall temperature; after running for three months in this mode, the knob 19 is actuated, the valve core 14 is rotated counterclockwise by 90°, so that the feeding pipe 17 is communicated with the second cavity, the discharging pipe 18 is communicated with the first cavity, so that the material in the first reaction cavity 7 flows from top to bottom, and the material in the second reaction cavity 8 flows from bottom to top, and the mixed material of dichlorodihydrogen silicon and silicon tetrachloride respectively performs reverse disproportionation reaction under the catalysis of the resin in the first reaction cavity 7 and the second reaction cavity 8.

[0043] Compared with the prior art, the application sets the flow path of the material as two flow states of bottom feeding and top discharging of the reverse disproportionation reactor and top feeding and bottom discharging of the reverse disproportionation reactor, so that the resin at the bottom and the resin at the top of the reverse disproportionation reactor are evenly loaded, the resin partial analysis function is realized, the service life of the resin is prolonged, and the problem of waste of resin use performance caused by the resin at the top and the resin at the bottom being in different operating conditions in the traditional reverse disproportionation reactor during replacement is solved.

[0044] Based on the same inventive concept, the embodiment provides a reverse disproportionation reaction method, which comprises using the reverse disproportionation reaction device to perform reverse disproportionation reaction on dichlorodihydrogen silicon, and the specific steps are as follows:

[0045] Step S001, the control valve is adjusted to be located at the position shown in the first mode. Figure 3When the position is shown, the feeding pipe 17 communicates with the first cavity, the discharging pipe 18 communicates with the second cavity, the material in the first reaction cavity 7 flows from bottom to top, and the material in the second reaction cavity 8 flows from top to bottom, the mixed material of dichlorodihydrogen silicon and silicon tetrachloride respectively performs reverse disproportionation reaction under the catalysis of resin in the first reaction cavity 7 and the second reaction cavity 8, the heat conducting medium in the heat conducting ring 10 plays a stabilizing role on the temperature in the first reaction cavity 7 and the second reaction cavity 8, the temperature difference between the first reaction cavity 7 and the second reaction cavity 8 is small, and the uniformity of the resin working condition environment is further improved; and the detection ring 11 detects the temperature in the first reaction cavity 7 and the second reaction cavity 8 respectively, and displays through the detection instrument 12, when the temperature in the first reaction cavity 7 and the second reaction cavity 8 is found to be different and the heat conducting medium in the heat conducting ring 10 cannot be adjusted in time, one of the first reaction cavity 7 and the second reaction cavity 8 has lower temperature and the other has higher temperature, at this time, the semiconductor cooling sheet 9 is powered on to heat the reaction cavity with lower temperature and cool the reaction cavity with higher temperature, so as to maintain the balance of the overall temperature.

[0046] In step S002, the dial piece 19 is dialed to rotate the valve core 14 counterclockwise by 90°, so that the feeding pipe 17 communicates with the second cavity, the discharging pipe 18 communicates with the first cavity, the material in the first reaction cavity 7 flows from top to bottom, and the material in the second reaction cavity 8 flows from bottom to top, the mixed material of dichlorodihydrogen silicon and silicon tetrachloride respectively performs reverse disproportionation reaction under the catalysis of resin in the first reaction cavity 7 and the second reaction cavity 8, the heat conducting medium in the heat conducting ring 10 plays a stabilizing role on the temperature in the first reaction cavity 7 and the second reaction cavity 8, the temperature difference between the first reaction cavity 7 and the second reaction cavity 8 is small, and the uniformity of the resin working condition environment is further improved; and the detection ring 11 detects the temperature in the first reaction cavity 7 and the second reaction cavity 8 respectively, and displays through the detection instrument 12, when the temperature in the first reaction cavity 7 and the second reaction cavity 8 is found to be different and the heat conducting medium in the heat conducting ring 10 cannot be adjusted in time, one of the first reaction cavity 7 and the second reaction cavity 8 has lower temperature and the other has higher temperature, at this time, the semiconductor cooling sheet 9 is powered on to heat the reaction cavity with lower temperature and cool the reaction cavity with higher temperature, so as to maintain the balance of the overall temperature.

[0047] The above steps S001 and S002 are repeated in turn with three months as a cycle.

[0048] Compared with the prior art, the method sets the flow path of the material as two flow states of bottom feeding and top discharging of the reverse disproportionation reactor 1 and top feeding and bottom discharging of the reverse disproportionation reactor 1, and carries out periodic reciprocating adjustment, so that the bottom resin and the top resin of the reverse disproportionation reactor are uniformly loaded, the resin partial resolution function is realized, the service life of the resin is prolonged, and the problem that the resin use performance is wasted due to the resins at the top and the bottom in different operating conditions in the traditional reverse disproportionation reactor is solved.

[0049] The above is only the preferred embodiment of the present application, and does not limit the present application in any form. Although the present application has been disclosed as above with the preferred embodiment, it is not intended to limit the present application. Any person skilled in the art can make slight changes or modifications to the above disclosed technical content to obtain equivalent embodiments with equivalent changes, without departing from the technical solution of the present application. Any modification, change and modification of the above embodiments according to the technical essence of the present application are still within the scope of the technical solution of the present application.

Claims

1. A disproportionation reaction apparatus, characterized in that, include: Conveying pipeline assembly: including inlet pipeline and outlet pipeline; Disproportionation reaction tower: includes tower body, packing rack inside tower body and resin on packing rack; The regulating pipeline assembly includes a plurality of connecting pipes disposed between the conveying pipeline assembly and the disproportionation reaction tower, and a control valve for controlling the connection between the conveying pipeline assembly and the disproportionation reaction tower; The control valve controls the material to have two flow states: feeding from the bottom and discharging from the top of the disproportionation reactor, and feeding from the top and discharging from the bottom of the disproportionation reactor. The control valve includes: The valve body, with its top connected to the inlet and outlet pipes; The valve core has a top that is rotatably and sealingly connected to the valve body. The valve core has four through holes arranged in pairs, each communicating with a feed pipe and a discharge pipe. Each through hole includes a first connecting hole, a second connecting hole, a third connecting hole, and a fourth connecting hole. The first and third connecting holes are arranged in pairs, penetrate the valve core, and communicate with the feed pipe and the discharge pipe respectively. The second and fourth connecting holes are also arranged in pairs and communicate with the feed pipe and the discharge pipe respectively. A flow guide channel is provided between the second and first connecting holes, and between the fourth and third connecting holes. A baffle is provided between the valve core and the bottom of the valve body, and the baffle divides the space between the valve core and the bottom of the valve body into a first cavity and a second cavity, which are respectively connected to the bottom and top of the disproportionation reaction tower. When one of the pairs of through holes is connected to the feed pipe and the discharge pipe respectively, the feed pipe and the discharge pipe are connected to the first cavity and the second cavity respectively. When the other pair of through holes are connected to the feed pipe and the discharge pipe respectively, the feed pipe and the discharge pipe are connected to the second cavity and the first cavity respectively.

2. The disproportionation reaction apparatus according to claim 1, characterized in that, The tower body is provided with a partition that symmetrically divides the tower body into a first reaction chamber and a second reaction chamber, and the flow direction of the materials in the first reaction chamber and the second reaction chamber is opposite.

3. The disproportionation reaction apparatus according to claim 2, characterized in that, The connecting pipes are respectively located between the first cavity and the second cavity and the top and bottom of the first reaction cavity, and the top and bottom of the second reaction cavity, so that the first cavity is connected to the bottom of the first reaction cavity and the top of the second reaction cavity, and the second cavity is connected to the top of the first reaction cavity and the bottom of the second reaction cavity.

4. The disproportionation reaction apparatus according to claim 3, characterized in that, The tower body is provided with a heat-conducting ring that connects the first reaction chamber and the second reaction chamber, and the heat-conducting ring is filled with a heat-conducting medium.

5. A disproportionation reaction apparatus according to claim 3 or 4, characterized in that, The tower body is provided with detection rings located in the first reaction chamber and the second reaction chamber respectively. The detection rings are filled with detection medium, and one end of each detection ring extends out of the tower body and is equipped with a detection instrument.

6. The disproportionation reaction apparatus according to claim 5, characterized in that, The partition is uniformly provided with a plurality of semiconductor cooling plates, the cold end and the hot end of the semiconductor cooling plates being connected to the first reaction chamber and the second reaction chamber, respectively.

7. A method for a disproportionation reaction, characterized in that, This includes performing a disproportionation reaction on dichlorosilane using the disproportionation reaction apparatus according to any one of claims 1 to 6.

8. The disproportionation reaction method according to claim 7, characterized in that, The steps for performing a disproportionation reaction on dichlorosilane using the disproportionation reaction apparatus according to claim 1 are as follows: Step S001: By adjusting the control valve, the mixture of dichlorosilane and silicon tetrachloride is fed into the bottom of the tower through the feed pipe, and after undergoing the disproportionation reaction in the tower, it is discharged from the top of the tower and the discharge pipe. Step S002: By adjusting the control valve, the mixture of dichlorosilane and silicon tetrachloride is fed into the top of the tower through the feed pipe, and after undergoing the disproportionation reaction in the tower, it is discharged from the bottom of the tower and the discharge pipe. The above steps S001 and S002 are repeated in a three-month cycle.

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