Planar oscillation type deterministic magneto-rheological micro-polishing device

Abstract

This application discloses a planar vibration-based deterministic magnetorheological micropolishing device, belonging to the field of precision machining technology. The device comprises a high-frequency vibration mechanism that drives a magnetic field response element to reciprocate in a first and second direction, with an amplitude of less than 1 mm. One of the mounting base of the high-frequency vibration mechanism and the workpiece fixing mechanism is connected to a feeding mechanism, while the other is mounted on the base along with the feeding mechanism. The workpiece to be polished, fixed to the workpiece fixing mechanism, is positioned opposite the magnetic field response element in a third direction. The feeding mechanism drives the high-frequency vibration mechanism and the workpiece fixing mechanism to move relative to each other in a third direction, with the first, second, and third directions being mutually perpendicular. A magnetorheological fluid nozzle is fitted to the magnetic field response element and is used to deliver magnetorheological fluid to the focused magnetic field generated by the magnetic field response element. This device possesses the capability to deterministically polish microstructured surfaces with microscale features.

Description

Technical Field

[0001] This application belongs to the field of precision machining technology, specifically relating to a planar vibration-type deterministic magnetorheological micropolishing device. Background Technology

[0002] In the field of precision machining, magnetorheological polishing is a commonly used finishing method. It has advantages such as controllable material removal, high processing efficiency, good stability, and high polishing accuracy, and is widely used in the ultra-precision polishing of complex optical surfaces. However, most current magnetorheological polishing equipment adopts a wheel structure, which is only suitable for processing medium and large-diameter optical components. Due to interference problems, it cannot be used to process small-diameter components.

[0003] Regarding the polishing of small-diameter optical components, while some studies have proposed using a ball-head permanent magnet structure in magnetorheological polishing equipment to adapt it to polishing components with diameters below 10 mm, the removal function width obtained by such equipment is still generally in the millimeter range or larger. Furthermore, due to the small magnetic field gradient, the removal function exhibits significant edge effects, resulting in irregular or distorted edges. Consequently, such equipment still lacks the ability to perform deterministic polishing of microstructured surfaces with microscale features. Summary of the Invention

[0004] The purpose of this application is to provide a planar vibration-based deterministic magnetorheological micropolishing device to solve the problem that current magnetorheological polishing devices do not have the ability to deterministically polish microstructured surfaces with microscale features.

[0005] This application discloses a planar vibration-based deterministic magnetorheological micropolishing device, which includes a base, a high-frequency vibration mechanism, a workpiece fixing mechanism, a magnetic field response component, a feeding mechanism, and a magnetorheological fluid nozzle.

[0006] The high-frequency vibration mechanism includes a vibration part and a mounting base connected to each other. The magnetic field response element is mounted on the vibration part. The vibration part is used to drive the magnetic field response element to reciprocate in a first direction and a second direction. The vibration amplitude of the vibration part is less than 1 mm, and the first direction and the second direction are perpendicular to each other.

[0007] One of the mounting base and the workpiece fixing mechanism is connected to the feeding mechanism, and the other and the feeding mechanism are both mounted on the base. The workpiece fixing mechanism is used to fix the workpiece to be polished, and the workpiece to be polished and the magnetic field response device are arranged opposite each other in a third direction. The feeding mechanism is used to drive the high-frequency vibration mechanism and the workpiece fixing mechanism to move relative to each other in a third direction, and the third direction is perpendicular to both the first direction and the second direction.

[0008] The magnetorheological fluid nozzle is configured to cooperate with the magnetic field response element, and the magnetorheological fluid nozzle is used to deliver magnetorheological fluid to the focusing magnetic field generated by the magnetic field response element.

[0009] This application discloses a planar vibration-type deterministic magnetorheological micropolishing device. Both its high-frequency vibration mechanism and workpiece fixing mechanism are mounted on a base. The vibration section of the high-frequency vibration mechanism can drive a magnetic field response element to perform high-frequency micro-amplitude vibration in a first and second direction. Simultaneously, when the magnetic field response element generates a focused magnetic field, the magnetorheological fluid delivered by the magnetorheological fluid nozzle can solidify within the focused magnetic field range at the end of the magnetic field response element, thereby hardening the magnetorheological fluid. Furthermore, the magnetic field response element drives the magnetorheological fluid to perform planar relative motion with the workpiece to be polished, which is fixed to the workpiece fixing mechanism, in the first and second directions. Under the action of shear force, material removal is achieved at the corresponding position on the workpiece to be polished, i.e., the polishing process.

[0010] Furthermore, in this embodiment, since the solidified magnetorheological fluid and the workpiece to be polished move in a planar relative motion, and the polishing workpiece is performed using shear force, the size of the end of the magnetic field response element used to gather the magnetorheological fluid can be relatively small. On the other hand, the vibration amplitude of the high-frequency vibration mechanism is extremely small, which makes the movement amplitude of the solidified magnetorheological fluid extremely small, so as to obtain a removal function width on the order of hundreds of micrometers. Under these circumstances, the planar vibration deterministic magnetorheological micropolishing device can polish relatively small apertures and micro-scale micro-surfaces with relatively high polishing accuracy. At the same time, by designing parameters such as the interaction time between the magnetic field response element and different positions on the workpiece to be polished, the planar vibration deterministic magnetorheological micropolishing device disclosed in this embodiment has the ability to perform deterministic polishing under the action of the feeding mechanism, thereby achieving deterministic control of the amount of material removed and enabling the surface shape error of the workpiece to be polished to be corrected during the polishing process. Attached Figure Description

[0011] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:

[0012] Figure 1 This is a schematic diagram of the planar vibration-type deterministic magnetorheological micropolishing device disclosed in the embodiments of this application;

[0013] Figure 2 for Figure 1 A magnified view of a portion of the image;

[0014] Figure 3 This is a schematic diagram illustrating the working principle of the planar vibration-type deterministic magnetorheological micropolishing device disclosed in the embodiments of this application;

[0015] Figure 4 for Figure 3 A magnified view of a portion of the image;

[0016] Figure 5 This is a schematic diagram of the magnetic field response device in the planar vibration deterministic magnetorheological micropolishing device disclosed in the embodiments of this application.

[0017] Figure label:

[0018] 100-base,

[0019] 200-High-frequency vibration mechanism

[0020] 300-Workpiece fixing mechanism

[0021] 400 - Magnetic field response element; 410 - Fixing base; 421 - First yoke; 422 - Second yoke; 423 - Third yoke; 424 - Filling part; 430 - Coil; 440 - Baffle.

[0022] 500 - Feed mechanism

[0023] 610 - Magnetorheological fluid nozzle, 620 - Recovery container, 630 - Storage container, 640 - Recovery pump, 650 - Stirrer, 660 - Magnetorheological fluid

[0024] 710 - First drive unit, 720 - Second drive unit

[0025] 900 - Workpiece to be polished. Detailed Implementation

[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0027] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0028] like Figures 1-3 As shown in the embodiment of this application, a planar vibration deterministic magnetorheological micropolishing device is disclosed, which includes a base 100, a high-frequency vibration mechanism 200, a workpiece fixing mechanism 300, a magnetic field response device 400, a feeding mechanism 500, and a magnetorheological fluid nozzle 610.

[0029] The base 100 serves as the mounting foundation for other components or structures in the planar vibration deterministic magnetorheological micropolishing equipment, and the entire equipment can be placed or mounted on a worktable or other working surface using the base 100. The base 100 can be formed from materials with relatively high structural strength, such as metal. The shape and size of the base 100 can be flexibly selected according to actual needs. For example, the base 100 can generally be a rectangular structure, or it can be an L-shaped structure to reduce the installation difficulty of the high-frequency vibration mechanism 200 and the workpiece fixing mechanism 300, and to improve the coordination between the magnetic field response component 400 and the workpiece to be polished.

[0030] The high-frequency vibration mechanism 200 provides high-frequency, low-amplitude vibration. It is typically electrically driven. More specifically, the high-frequency vibration mechanism 200 includes a vibrating part and a mounting base. The mounting base serves as the foundation for the vibrating part, which is connected to it. Driven by energy sources such as electricity, the vibrating part vibrates relative to the mounting base. Therefore, in this embodiment, a magnetic field response element 400 is mounted on the vibrating part so that the vibrating part can drive the magnetic field response element 400 to reciprocate in a first direction and a second direction. That is, the vibrating part drives the magnetic field response element 400 to reciprocate in the first direction, and the vibrating part can also drive the magnetic field response element 400 to reciprocate in the second direction, where the first and second directions are perpendicular to each other.

[0031] Meanwhile, regarding the vibration amplitude of the high-frequency vibration mechanism 200, in this embodiment, the vibration amplitude of the vibrating part is less than 1 mm. That is, the vibration range of the magnetic field response element 400 driven by the vibrating part in the first and second directions is within 1 mm, and the vibration velocity can be v respectively. x and v y Furthermore, in this embodiment, the vibration frequency of the vibrating part is greater than tens of hertz. Considering the fineness of the polishing process, in this embodiment, the vibration frequency of the vibrating part can be less than one kilohertz. That is, the vibration frequency of the vibrating part can be from tens of hertz to hundreds of hertz. This can basically meet the requirements of the relative planar motion between the magnetic field response element 400 and the workpiece 900 to be polished in this embodiment, while making the energy consumption of the high-frequency vibration mechanism 200 relatively small.

[0032] As described above, the base 100 serves as the mounting foundation for other devices or mechanisms in the planar vibration deterministic magnetorheological micropolishing equipment. Therefore, in this embodiment, one of the mounting bases for the workpiece fixing mechanism 300 and the high-frequency vibration mechanism 200 is connected to the feed mechanism 500, and the other is mounted on the base 100 along with the feed mechanism 500. The workpiece fixing mechanism 300 is used to fix the workpiece 900 to be polished. Specifically, the workpiece fixing mechanism 300 can use clamping or locking methods to fix the workpiece 900 to be polished, ensuring that the workpiece 900 does not move uncontrollably relative to the base 100 during the polishing process, thus preventing the polishing work from failing to proceed normally.

[0033] Meanwhile, by designing parameters such as the installation position and orientation of the workpiece fixing mechanism 300 and the mounting base on the base 100, the workpiece 900 to be polished, fixed on the workpiece fixing mechanism 300, and the magnetic field response element 400 can be set opposite each other in a third direction. The third direction is perpendicular to both the first and second directions, so that the workpiece 900 to be polished can face the magnetic field response element 400. Under the action of the magnetic field response element 400, the magnetorheological fluid 660 can interact with the workpiece 900 to be polished and perform polishing work on the workpiece 900.

[0034] Furthermore, the feeding mechanism 500, connected to the high-frequency vibration mechanism 200 or the workpiece fixing mechanism 300, enables the high-frequency vibration mechanism 200 and the workpiece fixing mechanism 300 to move relative to each other in a third direction. This allows the magnetic field response element 400 and the workpiece 900 to move relative to each other in the third direction. Based on the initial gap d0 between the magnetic field response element 400 and the workpiece 900 in the third direction, and the amount of material removed at position O, the feed amount of the feeding mechanism 500 is determined to complete the material removal work of the corresponding size. Specifically, the feeding mechanism 500 can be driven by electricity, gas, or liquid. In one specific embodiment of this application, the feeding mechanism 500 can be operated by electric drive. Furthermore, by equipping the feeding mechanism 500 with guiding devices such as linear guides, the driving accuracy of the feeding mechanism 500 can be ensured to be relatively high. The first direction, the second direction, and the third direction are mutually perpendicular. More intuitively, the first direction can be... Figure 3 In the x-direction, the second direction can be Figure 3 In the direction y, the third direction can be Figure 3 The direction z in the middle.

[0035] As described above, the magnetic field responder 400 is used to apply the magnetorheological fluid 660 to the workpiece 900 to be polished, thereby polishing the workpiece 900. The magnetic field responder 400 includes a magnet that can generate a magnetic field, so that the magnetorheological fluid 660 can change from a liquid state to a solid state. Of course, the aforementioned solid and liquid states are relative properties, not absolute properties of the magnetorheological fluid 660. Accordingly, by designing the structure and shape parameters of the magnet in the magnetic field responder 400, the magnetic field responder 400 can form a relatively focused magnetic field at its end, so that the magnetorheological fluid 660 can be solidified by the focused magnetic field, and the magnetorheological fluid 660 accumulates at the end of the magnetic field responder 400 to provide a polishing effect.

[0036] Therefore, in this embodiment of the application, the magnetorheological fluid nozzle 610 is correspondingly provided with the magnetic field response element 400 so that the magnetorheological fluid nozzle 610 can deliver the magnetorheological fluid 660 to the focusing magnetic field generated by the magnetic field response element 400. Thus, when the magnetic field is generated by the magnetic field response element 400, the magnetorheological fluid 660 can be hardened at the focusing magnetic field of the magnetic field response element 400. Under the high-frequency vibration of the high-frequency vibration mechanism 200, the magnetorheological fluid 660 generates a shearing motion relative to the workpiece 900 to be polished, so as to perform polishing work on the workpiece 900.

[0037] This application discloses a planar vibration-type deterministic magnetorheological micropolishing device. Both the high-frequency vibration mechanism 200 and the workpiece fixing mechanism 300 are mounted on a base 100. The vibration part of the high-frequency vibration mechanism 200 can drive the magnetic field response element 400 to perform high-frequency micro-amplitude vibration in the first and second directions. Simultaneously, when the magnetic field response element 400 generates a focused magnetic field, the magnetorheological fluid 660 delivered by the magnetorheological fluid nozzle 610 can solidify within the focused magnetic field range at the end of the magnetic field response element 400, thereby hardening the magnetorheological fluid 660. The magnetic field response element 400 also causes the magnetorheological fluid 660 to move relative to the workpiece 900 to be polished, which is fixed to the workpiece fixing mechanism 300, in the first and second directions in a planar relative motion. Under the action of shear force, material removal is achieved at the corresponding position on the workpiece 900, i.e., the polishing process.

[0038] Furthermore, in this embodiment, since the solidified magnetorheological fluid 660 and the workpiece 900 to be polished move in a planar relative motion, and the polishing work is performed using shear force, the size of the end of the magnetic field response element 400 used to gather the magnetorheological fluid 660 can be relatively small. On the other hand, the vibration amplitude of the high-frequency vibration mechanism 200 is extremely small, which makes the movement amplitude of the solidified magnetorheological fluid 660 extremely small, so as to obtain a removal function width on the order of hundreds of micrometers. Under these circumstances, the planar vibration deterministic magnetorheological micropolishing device can provide polishing for workpieces with relatively small aperture and microscale micro-surfaces, and the polishing accuracy is relatively high. At the same time, by designing parameters such as the interaction time at different positions on the magnetic field response element 400 and the workpiece 900 to be polished, under the action of the feeding mechanism 500, the planar vibration deterministic magnetorheological micropolishing device disclosed in this embodiment has the ability to perform deterministic polishing, thereby achieving deterministic control of the amount of material removed, and enabling the surface shape error of the workpiece 900 to be polished to be corrected during the polishing process.

[0039] In the above embodiments, parameters such as the fixed position of the workpiece 900 on the workpiece fixing mechanism 300 can be used to make the position to be polished on the workpiece 900 correspond to the focused magnetic field area generated by the magnetic field responder 400. Thus, under the action of the feeding mechanism 500, the polishing work on the polished position is achieved to remove a preset amount of material. If there are multiple positions to be polished, after polishing at a certain position, the fixed position of the workpiece 900 on the workpiece fixing mechanism 300 can be changed so that the next position to be polished on the workpiece 900 is aligned with the magnetic field responder 400 in a third-order direction, and polishing continues at that position.

[0040] To improve the positional accuracy between the workpiece 900 to be polished and the magnetic field responder 400, in another embodiment of this application, the planar vibration deterministic magnetorheological micropolishing device further includes a driving mechanism. The driving mechanism includes a first driving part 710 and a second driving part 720, both of which are mounted on the base 100. The driving direction of the first driving part 710 is parallel to a first direction, and the driving direction of the second driving part 720 is parallel to a second direction. By mounting at least one of the high-frequency vibration mechanism 200 and the workpiece fixing mechanism 300 on the driving mechanism, the driving mechanism can drive the high-frequency vibration mechanism 200 and the workpiece fixing mechanism 300 to move relative to each other in the first and second directions. This achieves the purpose of adjusting the relative position of the magnetic field responder 400 and the workpiece 900 to be polished in the third direction. On the one hand, this improves the accuracy of the polishing position. On the other hand, in the case of the embodiment of this application, the driving mechanism can also be used to achieve continuous polishing of multiple positions on the workpiece 900 to be polished, thereby improving the polishing efficiency of the workpiece 900.

[0041] In one specific embodiment of this application, the feeding mechanism 500 can be mounted on the first drive unit 710, the workpiece fixing mechanism 300 can be mounted on the feeding mechanism 500, and the high-frequency vibration mechanism 200 can be mounted on the second drive unit 720. That is, in this embodiment of the application, the workpiece 900 to be polished and the magnetic field response element 400 are respectively connected to the first drive unit 710 and the second drive unit 720. On the one hand, this can reduce the driving difficulty of the entire drive mechanism and improve the positional accuracy between the workpiece 900 to be polished and the magnetic field response element 400. On the other hand, it can also improve the position adjustment efficiency between the workpiece 900 to be polished and the magnetic field response element 400.

[0042] As described above, the magnetic field responder 400 can generate a focused magnetic field, causing the magnetorheological fluid 660 to accumulate at the end of the magnetic field responder 400 under the influence of the magnetic field. In a specific embodiment of this application, the magnetic field responder 400 may include a magnet and a yoke. The magnet may be a permanent magnet, and by designing the structure of the yoke, the yoke can guide the magnetic field generated by the magnet and form a focused magnetic field at the end of the yoke.

[0043] In another embodiment of this application, the magnetic field response element 400 includes a fixed base 410, a coil 430, a first magnetic yoke 421, and a second magnetic yoke 422. The coil 430 generates a magnetic field when energized. That is, in this embodiment of the application, an electromagnet is used to provide the magnetic field. In this case, the control of the magnetic field is relatively easier, and the magnetorheological fluid 660 can be replaced by controlling the on and off of the coil 430, thereby improving the polishing effect. At the same time, after the polishing work is completed, the coil 430 can also be de-energized, and the position adjustment between the workpiece 900 to be polished and the magnetic field response element 400 can be changed to prevent the magnetorheological fluid 660 accumulated at the end of the magnetic field response element 400 from hindering the aforementioned position adjustment process.

[0044] The mounting base 410 can be installed on the vibrating part and serves to provide mounting for other components in the magnetic field response element 400. The mounting base 410 can be a plate-shaped or block-shaped structure, and a stable assembly relationship can be formed between it and the vibrating part through bolts or other connecting parts. One end of each of the first magnetic yoke 421 and the second magnetic yoke 422 can be fixedly connected to the mounting base 410 by bolts or other connecting parts. Of course, methods such as plug-in or snap-fit ​​can also be used to fix one end of each of the first magnetic yoke 421 and the second magnetic yoke 422 to the mounting base 410. At the same time, in the second direction, the first magnetic yoke 421 and the second magnetic yoke 422 can be spaced apart on opposite sides of the coil 430 so that the magnetic field generated by the coil 430 has a relatively good effect on the first magnetic yoke 421 and the second magnetic yoke 422. Simultaneously, in the second direction, the other ends of the first magnetic yoke 421 and the second magnetic yoke 422 extend to the position where the coil 430 is located, thereby allowing the first magnetic yoke 421 and the second magnetic yoke 422 to guide the magnetic field to their ends away from the fixed base 410, forming a focused magnetic field. As described above, in this application, since the magnetic field response element 400 does not need to rotate relative to the workpiece 900 to be polished, the end size of the magnetic field response element 400 can be relatively small. Therefore, in the design and processing of the magnetic field response element 400 disclosed in the embodiments of this application, the dimensions of the other ends of the first magnetic yoke 421 and the second magnetic yoke 422 away from the fixed base 410 can be relatively small, so as to further improve the diameter size of the workpiece that can be finely processed by the planar vibration deterministic magnetorheological micropolishing equipment.

[0045] In order to increase the component of the focused magnetic field generated at the end of the magnetic field responder 400 in the third direction to be relatively larger, in another embodiment of this application, the magnetic field responder 400 may further include a third yoke 423, and the coil 430 is wound around the outer periphery of the third yoke 423. In the second direction, the third yoke 423 is sandwiched between the first yoke 421 and the second yoke 422, so as to enhance the intensity of the focused magnetic field in the third direction by utilizing the third yoke 423, thereby making the size of the magnetorheological fluid 660 gathered at the end of the magnetic field responder 400 relatively larger in the third direction, so as to further reduce the range of the effective area when polishing with the magnetorheological fluid 660.

[0046] Of course, during the assembly of the magnetic field response component 400, one end of the third magnetic yoke 423 can be fixed to the fixing base 410, and the other end of the third magnetic yoke 423 can be connected to the other ends of the first magnetic yoke 421 and the second magnetic yoke 422, so as to jointly form an end for focusing the magnetorheological fluid 660. At the same time, the first magnetic yoke 421 and the second magnetic yoke 422 need to be spaced apart from the third magnetic yoke 423, and air gaps should be formed between the first magnetic yoke 421 and the third magnetic yoke 423, as well as between the second magnetic yoke 422 and the third magnetic yoke 423. Using air as a non-magnetic material, it is ensured that the magnetic field can be guided by the first magnetic yoke 421, the second magnetic yoke 422 and the third magnetic yoke 423, and a focused magnetic field is formed at the ends of the aforementioned three components.

[0047] To prevent the magnetorheological fluid 660 from flowing between the first yoke 421 and the third yoke 423, and between the second yoke 422 and the third yoke 423, thus hindering the normal operation of the magnetic field response element 400, in another embodiment of this application, the gaps between the first yoke 421 and the third yoke 423, and between the second yoke 422 and the third yoke 423, can be filled with a non-magnetic material. In a specific embodiment of this application, titanium alloy can be used to fill the gaps between the first yoke 421 and the third yoke 423, and between the second yoke 422 and the third yoke 423. Simultaneously, permalloy can be used as the magnetically conductive material to form the first yoke 421, the second yoke 422, and the third yoke 423.

[0048] Furthermore, the magnetic field response element 400 may also include a baffle 440, which is formed of a rigid material and is fitted outside the first magnetic yoke 421, the second magnetic yoke 422 and the third magnetic yoke 423. The baffle 440 provides protection for the coil 430 and prevents the magnetorheological fluid from adsorbing onto the coil 430, which would have an adverse effect on the normal operation of the coil 430 and the entire device.

[0049] As described above, the ends of the first magnetic yoke 421, the second magnetic yoke 422, and the third magnetic yoke 423 facing away from the fixing base 410 form a focused magnetic field and accumulate magnetorheological fluid 660. Optionally, the end faces of the aforementioned three yokes facing away from the fixing base 410 can be planar structures. In another embodiment of this application, the end faces of the first magnetic yoke 421, the second magnetic yoke 422, and the third magnetic yoke 423 facing away from the fixing base 410 can each be cylindrical side-shaped structures, and these end faces extend along the direction surrounding the second direction. In this case, the magnetorheological fluid 660 accumulated on the end face has a symmetrical structure, and the polished surface of the magnetorheological fluid 660 solidified on the end face is smoother overall, thereby further improving the polishing accuracy and effect. Of course, the specific parameters of the aforementioned end faces can be determined based on the dimensions of the ends of the first magnetic yoke 421, the second magnetic yoke 422, and the third magnetic yoke 423 facing away from the fixing base 410 in the first direction. In addition, the angle around which the aforementioned end faces pass can be greater than 90° and less than 180°.

[0050] As described above, when the polishing position needs to be moved, the coil 430 can be de-energized to prevent the magnetorheological fluid 660 from hindering the position adjustment process. In another embodiment of this application, to reduce the control difficulty of the coil 430 and improve the continuity of the polishing process, a pulse width modulation method can be used to control the current of the coil 430. That is, when controlling the current of the coil 430, the duty cycle is controlled to alternately switch the coil 430 between being energized and de-energized. In this case, the specific parameters of the duty cycle can be adjusted according to actual needs to control the position adjustment process between the workpiece 900 to be polished and the magnetic field response device 400 when the coil 430 cannot generate a magnetic field.

[0051] More specifically, based on the material removal amount at each of the multiple locations on the workpiece 900 to be polished, the relative positional relationship between the multiple locations, and the actual parameters such as the driving speed of the driving mechanism, the movement path of the magnetic field response element 400 relative to the workpiece 900 to be polished can be pre-selected and determined, and the dwell time at each location can be determined. In this case, the duty cycle of the coil 430 can be designed so that when the coil 430 does not generate a magnetic field, the relative position between the high-frequency vibration mechanism 200 and the workpiece fixing mechanism 300 can be adjusted by the driving mechanism. In this case, since the driving mechanism does not perform polishing action when it is in motion, the vibration caused by the frequent acceleration and deceleration of the driving mechanism can be prevented, thereby further improving the polishing accuracy. In addition, when the coil 430 does not generate a magnetic field and the driving mechanism is controlled to move, the magnetorheological fluid 660 can also be updated.

[0052] As described above, magnetorheological fluid 660 can be delivered to the end of the magnetic field response element 400 through the magnetorheological fluid nozzle 610. Specifically, the magnetorheological fluid nozzle 610 can be connected to a container for containing the magnetorheological fluid 660 or a delivery pipeline for the magnetorheological fluid 660, thereby enabling the magnetorheological fluid nozzle 610 to continuously deliver the magnetorheological fluid 660 to the magnetic field response element 400. To improve the utilization rate of the magnetorheological fluid 660, in this embodiment, the planar vibration deterministic magnetorheological micropolishing device further includes a recovery container 620, which is disposed below the magnetic field response element 400 to collect the magnetorheological fluid 660. The recovery container 620 can specifically be a cylindrical structure, and its dimensions and other parameters can be flexibly selected according to actual conditions, which are not limited herein.

[0053] Furthermore, the planar vibration deterministic magnetorheological micropolishing apparatus may also include a storage container 630 and a recovery pump 640, with the recovery container 620 and the storage container 630 connected via the recovery pump 640. This allows the magnetorheological fluid 660 recovered in the recovery container 620 to be quickly returned to the storage container 630 for backup. Correspondingly, the magnetorheological fluid nozzle 610 may be connected to the storage container 630, allowing the magnetorheological fluid 660 in the storage container 630 to be delivered to the magnetic field response element 400 via the magnetorheological fluid nozzle 610. Alternatively, a supply pump or similar device can be provided to output the magnetorheological fluid 660 from the storage container 630. Specifically, both the recovery pump 640 and the supply pump may include peristaltic pumps.

[0054] In addition, a stirrer 650 can be installed in the storage container 630, and the stirrer 650 can be used to stir the magnetorheological fluid 660 in the storage container 630, so that the uniformity of the magnetorheological fluid 660 output through the magnetorheological fluid nozzle 610 is relatively high, thereby improving the polishing efficiency and polishing effect.

[0055] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element. Furthermore, it should be noted that the scope of the methods and apparatuses in the embodiments of this application is not limited to performing functions in the order shown or discussed, but may also include performing functions substantially simultaneously or in the reverse order, depending on the functions involved. For example, the described methods may be performed in a different order than described, and various steps may be added, omitted, or combined. Additionally, features described with reference to certain examples may be combined in other examples.

[0056] The embodiments of this application have been described above with reference to the accompanying drawings. However, this application is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of this application without departing from the spirit and scope of the claims, and all of these forms are within the protection scope of this application.

Claims

1. A planar vibration-based deterministic magnetorheological micropolishing device, characterized in that, It includes a base, a high-frequency vibration mechanism, a workpiece fixing mechanism, a magnetic field response component, a feeding mechanism, and a magnetorheological fluid nozzle, among which, The high-frequency vibration mechanism includes a vibration part and a mounting base connected to each other. The magnetic field response element is mounted on the vibration part. The vibration part is used to drive the magnetic field response element to reciprocate in a first direction and a second direction. The vibration amplitude of the vibration part is less than 1 mm, and the first direction and the second direction are perpendicular to each other. One of the mounting base and the workpiece fixing mechanism is connected to the feeding mechanism, and the other and the feeding mechanism are both mounted on the base. The workpiece fixing mechanism is used to fix the workpiece to be polished, and the workpiece to be polished and the magnetic field response device are arranged opposite each other in a third direction. The feeding mechanism is used to drive the high-frequency vibration mechanism and the workpiece fixing mechanism to move relative to each other in a third direction, and the third direction is perpendicular to both the first direction and the second direction. The magnetic field response device includes a fixed base, a coil, a first magnetic yoke, a second magnetic yoke, and a third magnetic yoke. The coil is wound around the outer periphery of the third magnetic yoke. In the second direction, the third magnetic yoke is sandwiched between the first magnetic yoke and the second magnetic yoke, and the first magnetic yoke and the second magnetic yoke are spaced apart from the third magnetic yoke. The first magnetic yoke and the second magnetic yoke are spaced apart on opposite sides of the coil. The coil generates a magnetic field when energized. The fixed base is installed on the vibrating part. One end of the first magnetic yoke and the second magnetic yoke are fixedly connected to the fixed base. One end of the third magnetic yoke is fixed to the fixed base. The other end of the third magnetic yoke is connected to the other end of the first magnetic yoke and the second magnetic yoke. In the second direction, the other end of the first magnetic yoke and the second magnetic yoke extends towards the position of the coil. The magnetorheological fluid nozzle is configured to cooperate with the magnetic field response element, and the magnetorheological fluid nozzle is used to deliver magnetorheological fluid to the focusing magnetic field generated by the magnetic field response element.

2. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 1, characterized in that, It also includes a drive mechanism, which includes a first drive part and a second drive part. Both the first drive part and the second drive part are mounted on the base. The drive direction of the first drive part is parallel to the first direction, and the drive direction of the second drive part is parallel to the second direction. At least one of the high-frequency vibration mechanism and the workpiece fixing mechanism is mounted on the drive mechanism, and the drive mechanism is used to make the high-frequency vibration mechanism and the workpiece fixing mechanism move relative to each other in the first direction and the second direction.

3. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 2, characterized in that, The feeding mechanism is mounted on the first drive unit, the workpiece fixing mechanism is mounted on the feeding mechanism, and the high-frequency vibration mechanism is mounted on the second drive unit.

4. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 1, characterized in that, The gap between the first magnetic yoke and the third magnetic yoke, as well as the gap between the second magnetic yoke and the third magnetic yoke, are provided with a filling portion, which is formed of a non-magnetic material.

5. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 1, characterized in that, The first magnetic yoke, the second magnetic yoke, and the third magnetic yoke are each connected to each other at one end away from the fixed base, and the resulting end face is a cylindrical side surface structure, and the end face is arranged around the second direction.

6. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 1, characterized in that, The current in the coil is controlled by pulse width modulation.

7. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 1, characterized in that, It also includes a recycling container disposed below the magnetic field responder.

8. The planar vibration-type deterministic magnetorheological micropolishing device according to claim 7, characterized in that, It also includes a storage container and a recovery pump, the recovery container and the storage container being connected via the recovery pump, and the magnetorheological fluid nozzle being connected to the storage container.

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