A wafer transfer control method, device, equipment and computer readable medium

By establishing a sports model and correction coordinate system, the problem of motion path deviation during the wafer transmission process is solved, and precise control and efficient transmission are realized, and the finished product rate of semiconductor manufacturing is improved.

CN118800698BActive Publication Date: 2025-01-24WU XI CHINSOR TECH CO LTD
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Patent Information

Application Number
CN202411290431.6
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-09-14
Publication Date
2025-01-24
Estimated Expiration
2044-09-14

AI Technical Summary

Technical Problem

During semiconductor manufacturing, the actual motion path of the wafer conveying robot arm is deviated from the preset path, resulting in the wafer being unable to be accurately transferred into place, affecting the processing effect and possible collision.

Method used

By establishing a sports model of a sports mechanism, the zero -point coordinate system is established, and the deviation correction is to establish a absolute coordinate system to accurately control the wafer of the motion institution according to the preset trajectory.

Benefits of technology

The precise control of the wafer transmission mechanism is achieved, the error in the wafer transmission process is avoided, the processing loss is reduced, the processing rate of processing is improved, and the transmission efficiency is improved.

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Abstract

The present invention discloses a wafer transfer control method, device, equipment and computer-readable medium. The method includes: establishing a motion model according to a motion mechanism; establishing a zero-point coordinate system of the motion model; performing deviation correction on the zero-point coordinate system; establishing an absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system; controlling the motion mechanism to transfer the wafer according to a first motion trajectory according to the absolute coordinate system, and obtaining a first preset point position of a preset point; controlling the motion model to move according to a second motion trajectory according to the absolute coordinate system, and obtaining a second preset point position of the preset point; comparing the first preset point position and the second preset point position, if there is a deviation between the first preset point position and the second preset point position, then correcting the absolute coordinate system according to the deviation between the first preset point position and the second preset point position. The wafer transfer scheme disclosed in the embodiment of the present invention can avoid errors in the wafer during the transfer process and realize precise control of the wafer transfer mechanism.
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Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing technology, and in particular to a wafer transfer control method, device, equipment and computer-readable medium. Background Art

[0002] In the semiconductor manufacturing process, wafer transfer is one of the key links, especially for vacuum equipment, which has multiple process chambers. The wafers need to be placed accurately in the corresponding process chambers according to the established route. In actual operation, the actual movement path of the robotic arm that transfers the wafers often deviates from the preset path, causing the wafers to not be accurately transferred to the right place, thus affecting the processing effect and even causing collisions. Summary of the invention

[0003] In order to solve at least one technical problem existing in the above-mentioned prior art, the embodiments of the present invention provide a wafer transfer control method, device, equipment and computer readable medium. The technical solution is as follows:

[0004] In a first aspect, a wafer transfer control method is provided, comprising:

[0005] Establish motion model based on motion mechanism;

[0006] Establishing a zero-point coordinate system of the motion model;

[0007] Performing deviation correction on the zero-point coordinate system;

[0008] Establishing an absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system;

[0009] The step of controlling the motion mechanism to transfer the wafer along a motion trajectory according to the absolute coordinate system includes:

[0010] Controlling the motion mechanism to transfer the wafer along a first motion trajectory according to the absolute coordinate system, and obtaining a first preset point position of a preset point, wherein the first preset point includes: a positioning point, which is an intersection of an extension line of a diameter of a wafer carrier in a wafer storage chamber and an extension line of a diameter of a wafer carrier in a wafer process chamber;

[0011] While the motion mechanism transfers the wafer according to the first motion trajectory, the motion model is controlled to move according to the second motion trajectory according to the absolute coordinate system, and a second preset point position of the preset point is obtained, where the second preset point is an overlap point where the first motion trajectory and the second motion trajectory have the same coordinates in the absolute coordinate system;

[0012] The first preset point position is compared with the second preset point position. If there is a deviation between the first preset point position and the second preset point position, the absolute coordinate system is corrected according to the deviation between the first preset point position and the second preset point position.

[0013] Furthermore, the establishing of the motion model according to the motion mechanism includes:

[0014] Establishing a rotational motion model and a linear motion model according to the motion mechanism;

[0015] The motion form of the motion mechanism is coupled with the rotational motion model and the linear motion model.

[0016] Furthermore, the establishing of the zero-point coordinate system of the motion model includes:

[0017] The servo motor of the motion mechanism is controlled to return to zero, and a zero-point coordinate system of the motion model is established.

[0018] Furthermore, the performing deviation correction on the zero-point coordinate system includes:

[0019] Establishing a relative coordinate system of the motion mechanism by fine-tuning and calibration;

[0020] Determining an error between the zero-point coordinate system and the relative coordinate system;

[0021] The zero-point coordinate system is subjected to deviation correction according to the error.

[0022] Furthermore, the relative coordinate system of the motion mechanism is established by fine-tuning and calibrating, including:

[0023] acquiring a first zero point position sent by a first sensor and a second zero point position sent by a second sensor installed on the motion mechanism, and determining the zero point position of the relative coordinate system according to the first zero point and the second zero point, or

[0024] Determine the zero point position of the relative coordinate system by means of the Z point encoded in the servo motor of the motion mechanism;

[0025] The relative coordinate system is established according to the zero point of the relative coordinate system.

[0026] Further, the determining the error between the zero-point coordinate system and the relative coordinate system includes:

[0027] Controlling the motion mechanism to move to the zero point of the zero-point coordinate system, and obtaining the zero-point position of the zero-point coordinate system;

[0028] The error between the zero-point coordinate system and the relative coordinate system is determined according to the zero-point position of the relative coordinate system and the zero-point position of the zero-point coordinate system.

[0029] Furthermore, establishing the absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system comprises:

[0030] Controlling the motion mechanism to move to a preset calibration position according to the corrected zero-point coordinate system to obtain calibration information;

[0031] The absolute coordinate system is established according to the calibration information.

[0032] In a second aspect, a wafer transfer control device is provided, comprising:

[0033] A modeling module, used for establishing a motion model according to a motion mechanism;

[0034] A first coordinate system building module, used to establish a zero-point coordinate system of the motion model;

[0035] A first correction module, used for performing deviation correction on the zero-point coordinate system;

[0036] A second coordinate system building module, used for establishing an absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system;

[0037] A first control module is used to control the motion mechanism to transfer the wafer according to the first motion trajectory according to the absolute coordinate system, and obtain a first preset point position of the preset point, wherein the first preset point includes: a positioning point, which is an intersection of an extension line of a diameter of a wafer carrier in the wafer storage chamber and an extension line of a diameter of a wafer carrier in the wafer process chamber;

[0038] A second control module is used to control the motion model to move according to a second motion trajectory according to the absolute coordinate system while the motion mechanism transfers the wafer according to the first motion trajectory, and obtain a second preset point position of the preset point, where the second preset point is an overlap point where the first motion trajectory and the second motion trajectory have the same coordinates in the absolute coordinate system;

[0039] The second correction module is used to compare the first preset point position and the second preset point position, and if there is a deviation between the first preset point position and the second preset point position, correct the absolute coordinate system according to the deviation between the first preset point position and the second preset point position.

[0040] Furthermore, the modeling module includes:

[0041] A preliminary modeling module is used to establish a rotational motion model and a linear motion model according to the motion mechanism;

[0042] The coupling module is used to couple the motion form of the motion mechanism with the rotational motion model and the linear motion model.

[0043] Furthermore, the first coordinate system construction module is specifically used for:

[0044] Control the servo motor of the motion mechanism to return to zero and establish the zero-point coordinate system of the motion model.

[0045] Furthermore, the correction module comprises:

[0046] A relative coordinate system establishment module is used to establish the relative coordinate system of the motion mechanism by fine-tuning and calibration;

[0047] An error determination module, used for determining the error between the zero point coordinate system and the relative coordinate system;

[0048] The deviation correction module is used to perform deviation correction on the zero point coordinate system according to the error.

[0049] Furthermore, the relative coordinate system establishment module is specifically used for:

[0050] Acquire a first zero point position sent by a first sensor installed on the motion mechanism and a second zero point position sent by a second sensor, and determine the zero point position of the relative coordinate system according to the first zero point and the second zero point;

[0051] The relative coordinate system is established according to the zero point of the relative coordinate system.

[0052] Furthermore, the relative coordinate system establishment module is specifically used for:

[0053] The zero position of the relative coordinate system is determined by the Z point encoded in the servo motor of the motion mechanism;

[0054] A relative coordinate system is established based on the zero point of the relative coordinate system.

[0055] Furthermore, the error determination module is specifically used to:

[0056] Control the motion mechanism to run to the zero point of the zero-point coordinate system, and obtain the zero-point position of the zero-point coordinate system;

[0057] According to the zero point position of the relative coordinate system and the zero point position of the zero point coordinate system, the error between the zero point coordinate system and the relative coordinate system is determined.

[0058] Furthermore, the first correction module is specifically used to:

[0059] According to the corrected zero-point coordinate system, the motion mechanism is controlled to move to a preset calibration position to obtain calibration information;

[0060] Establish an absolute coordinate system based on the calibration information.

[0061] In a third aspect, an electronic device is provided, including:

[0062] one or more processors; and

[0063] A memory associated with the one or more processors, the memory being used to store program instructions, wherein the program instructions, when read and executed by the one or more processors, execute any method described in the first aspect.

[0064] According to a fourth aspect, a computer-readable medium is provided, on which a computer program is stored, wherein when the program is executed by a processor, the method described in any one of the first aspects is implemented.

[0065] The technical solution provided by the embodiment of the present invention has the following beneficial effects:

[0066] 1. The wafer transfer scheme disclosed in the embodiment of the present invention realizes precise control of the wafer transfer mechanism, which can avoid errors in the wafer transfer process, reduce wafer processing losses, and improve processing yield;

[0067] 2. The wafer transfer scheme disclosed in the embodiment of the present invention provides a simple wafer transfer deviation correction method to improve wafer transfer efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0068] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0069] Figure 1 It is a schematic flow chart of a wafer transfer control method provided by an embodiment of the present invention;

[0070] Figure 2 It is a schematic diagram of the module structure of a wafer transfer control device provided by an embodiment of the present invention;

[0071] Figure 3 It is a schematic diagram of the structure of an electronic device provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0072] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution in the embodiment of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiment of the present invention. Obviously, the described embodiment is only a part of the embodiment of the present invention, not all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0073] like Figure 1 As shown, in order to improve the transfer accuracy of wafers in the equipment, the embodiment of the present invention provides a wafer transfer control method, device, equipment and computer readable medium, wherein the wafer transfer method includes:

[0074] S1. Establish a motion model based on the motion mechanism.

[0075] The motion mechanism mentioned above mainly refers to wafer transfer equipment, which can be a wafer transfer equipment that transfers wafers between different wafer processing equipment, or a wafer transfer equipment that transfers wafers to different positions within a wafer processing equipment. By establishing a virtual motion model, the motion of the actual motion mechanism is simulated.

[0076] In one embodiment, step S1 includes:

[0077] S11, establishing a rotational motion model and a linear motion model according to the motion mechanism;

[0078] S12. Couple the motion form of the motion mechanism with the rotational motion model and the linear motion model.

[0079] The above-mentioned coupling method includes: establishing a virtual motion object, so that the virtual motion object can control the actual motion mechanism through isochronous synchronization, different reduction ratios, different rotation directions, etc., and at the same time constantly monitor the operating position, speed, motion direction and other parameters of the actual motion mechanism to achieve precise control. The motion mechanism includes: a rotary motion mechanism and a linear motion mechanism. The rotary motion mechanism is used to realize the rotation or revolution of the wafer, and the linear motion mechanism is used to realize the linear motion of the wafer. The rotary motion mechanism and the linear motion mechanism cooperate to complete the wafer transmission.

[0080] S2. Establish the zero-point coordinate system of the motion model.

[0081] As mentioned above, the zero-point coordinate system mainly refers to the zero-point absolute coordinate system when the motion model is in motion, and its main function is to provide a mechanical reference point for the motion mechanism. The mechanical reference point is the point where the zero-point position is corrected during installation. Since the controlled object is a combination of multiple parts, when the cumulative error is too large, the structure will cause unstable operation or inaccurate positioning during movement. Therefore, strict requirements are required when each part is installed. After the parts are installed, fine-tuning some positions by calibrating the mechanical zero point can improve the cumulative error during installation.

[0082] In one embodiment, step S2 includes:

[0083] Control the servo motor of the motion mechanism to return to zero and establish the zero-point coordinate system of the motion model.

[0084] As mentioned above, the zero position is reset by the program or when the origin limit is sensed during the zero return process, the current position value is cleared to zero, indicating the origin or zero point, and all positions in the zero coordinate system are determined based on the zero point. Generally speaking, there are two types of encoders for servo motors, absolute encoders and incremental encoders. Absolute encoders can be maintained when the power is off, and there is no need to find the zero point after the initial return to the origin. The incremental encoder will lose the value of multiple motor turns after the power is off, and the origin search operation is required.

[0085] S3. Perform deviation correction on the zero-point coordinate system.

[0086] As mentioned above, the zero-point coordinate system is the motion coordinate system of the motion model, and there is an error between it and the motion coordinate system of the actual motion mechanism. It is precisely because of this error that the motion of the motion mechanism is controlled inaccurately through the motion model.

[0087] In one embodiment, step S3 includes:

[0088] S31, establishing a relative coordinate system of the motion mechanism by fine-tuning and calibration;

[0089] S32, determining the error between the zero-point coordinate system and the relative coordinate system;

[0090] S33. Correct the deviation of the zero-point coordinate system according to the error.

[0091] As mentioned above, the relative coordinate system is established mainly to facilitate the calibration of other moving target points except the zero point.

[0092] As a case, two sensors are pre-installed on the motion mechanism, and the zero point position of the relative coordinate system can be determined by the actual zero point position sensed by the sensors. The above step S31 includes:

[0093] Acquire a first zero point position sent by the first sensor and a second zero point position sent by the second sensor, and determine the zero point position of the relative coordinate system according to the first zero point position and the second zero point position;

[0094] A relative coordinate system is established based on the zero point of the relative coordinate system.

[0095] Specifically, when the first zero point position and the second zero point position are the same, either one can be selected as the zero point position. When the first zero point position and the second zero point position are different, the midpoint between the two can be selected as the zero point position.

[0096] As another case, the zero position of the relative coordinate system can be determined by the internal encoding of the servo motor. The above step S31 includes:

[0097] The zero position of the relative coordinate system is determined by the Z point encoded in the servo motor of the motion mechanism;

[0098] A relative coordinate system is established based on the zero point of the relative coordinate system.

[0099] As mentioned above, the encoder in the servo motor is used to measure the motor speed. The Z-phase pulse is a pulse emitted when the motor rotates one circle. The Z-phase pulse position of the servo motor is the origin of the shaft rotation, also known as the Z point.

[0100] As mentioned above, establishing the relative coordinate system according to the zero point of the relative coordinate system includes: determining the coordinate positions of other non-zero points in the relative coordinate system according to the position of the zero point.

[0101] In one embodiment, step S32 includes:

[0102] Control the motion mechanism to run to the zero point of the zero-point coordinate system, and obtain the zero-point position of the zero-point coordinate system;

[0103] According to the zero point position of the relative coordinate system and the zero point position of the zero point coordinate system, the error between the zero point coordinate system and the relative coordinate system is determined.

[0104] As mentioned above, the embodiment of the present invention establishes a zero-point coordinate system by means of mechanical calibration and corrects the deviation between the mechanical zero point and the zero point detected by the sensor. The error value is always recorded in the system, and the error is automatically updated in the system each time the sensor returns to the origin. In addition, the embodiment disclosed in the present invention records the error between the virtual zero point and the actual zero point, sets the error value with a power-off retention function, and sets the error modification authority. For example, the error can be manually changed by the engineer with the highest authority, and the numerical value before and after each change will be recorded in the system.

[0105] S4. Establish the absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system.

[0106] As mentioned above, the final calibration position of the motion mechanism is marked in the absolute coordinate system. The calibration data has the function of power-off retention, and the modification authority of the target position is set. For example, this parameter can be manually changed by the equipment engineer and the engineer with the highest authority, and the numerical value before and after each change will be recorded in the system.

[0107] In one embodiment, step S4 includes:

[0108] According to the corrected zero-point coordinate system, the motion mechanism is controlled to move to a preset calibration position to obtain calibration information;

[0109] Establish an absolute coordinate system based on the calibration information.

[0110] S5. Control the motion mechanism to transfer the wafer along the first motion trajectory according to the absolute coordinate system, and obtain a first preset point position of the preset point.

[0111] As mentioned above, the first motion trajectory is the actual motion trajectory of the motion mechanism, and the position of the first preset point can be measured by a sensor. Specifically, the first preset point includes: a positioning point, which is the intersection of the diameter extension line of the wafer carrier in the wafer storage chamber and the diameter extension line of the wafer carrier in the wafer process chamber. The wafer storage chamber is a chamber for storing wafers in the wafer processing equipment, and the wafer process chamber is a chamber for processing wafers in the wafer processing equipment, usually a vacuum chamber. The wafer storage chamber and the wafer process chamber are usually connected by a wafer transfer chamber, and the positioning point is generally located in the wafer transfer chamber. The motion trajectory of the motion mechanism may include the target point position and interference conditions. Interference conditions include: when there is a wafer on the manipulator, there is also a wafer being processed or processed in the target chamber where the wafer needs to be placed, the transmission mechanism is blocked from the wafer placement chamber, and when the target chamber needs to be taken to take the wafer, the height of the wafer in the target chamber overlaps with the height of the manipulator, etc. When there is no interference condition, the motion of the motion mechanism can be controlled in a step-by-step manner. When the motion mechanism transfers the wafer in the wafer vacuum processing equipment, the number of vacuum chambers can be set, and the motion trajectory can be set according to the number of vacuum chambers.

[0112] S6. While the motion mechanism is transporting the wafer along the first motion trajectory, the motion model is controlled to move along the second motion trajectory according to the absolute coordinate system, and a second preset point position of the preset point is obtained, where the second preset point is an overlapping point where the first motion trajectory and the second motion trajectory have the same coordinates in the absolute coordinate system.

[0113] In the above, the second motion trajectory is a virtual motion trajectory of the motion model, and the first motion trajectory and the second motion trajectory are different conveying routes of the wafer with the same overlapping points in the absolute coordinate system. The second preset point position is the position information fed back after the motion model passes through the preset point when simulating the motion. While the motion mechanism conveys the wafer according to the first motion trajectory, controlling the motion model to move according to the second motion trajectory according to the absolute coordinate system is conducive to real-time monitoring of motion deviations during the motion of the motion mechanism.

[0114] S7. Compare the first preset point position and the second preset point position. If there is a deviation between the first preset point position and the second preset point position, calibrate the absolute coordinate system according to the deviation between the first preset point position and the second preset point position.

[0115] As mentioned above, as the number of times the motion mechanism is used increases, the accuracy of the motion mechanism changes, resulting in deviations in the motion position of the motion mechanism, so the absolute coordinate system needs to be corrected. The embodiment of the present invention discloses a method for dynamically correcting the absolute coordinate system during wafer transmission, which can realize dynamic correction of the absolute coordinate system without re-adjusting the zero point coordinate system, thereby improving the transmission efficiency of the wafer.

[0116] like Figure 2As shown, based on the wafer transfer control method disclosed in the embodiment of the present invention, the embodiment of the present invention further provides a wafer transfer control device, including:

[0117] A modeling module 201, used to establish a motion model according to the motion mechanism;

[0118] A first coordinate system building module 202, used to establish a zero-point coordinate system of a motion model;

[0119] A first correction module 203, used for performing deviation correction on the zero-point coordinate system;

[0120] A second coordinate system building module 204, used to establish an absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system;

[0121] The first control module 205 is used to control the motion mechanism to transfer the wafer according to the first motion trajectory according to the absolute coordinate system, and obtain the first preset point position of the preset point, specifically, the first preset point includes: a positioning point, which is the intersection of the diameter extension line of the wafer carrier in the wafer storage chamber and the diameter extension line of the wafer carrier in the wafer process chamber;

[0122] The second control module 206 is used to control the motion model to move according to the second motion trajectory according to the absolute coordinate system while the motion mechanism transfers the wafer according to the first motion trajectory, and obtain the second preset point position of the preset point, wherein the second preset point is the overlapping point of the first motion trajectory and the second motion trajectory with the same coordinates in the absolute coordinate system.

[0123] The second calibration module 207 is used to compare the first preset point position with the second preset point position, and if there is a deviation between the first preset point position and the second preset point position, calibrate the absolute coordinate system according to the deviation between the first preset point position and the second preset point position.

[0124] In one embodiment, the modeling module 201 includes:

[0125] A preliminary modeling module is used to establish a rotational motion model and a linear motion model according to the motion mechanism;

[0126] The coupling module is used to couple the motion form of the motion mechanism with the rotational motion model and the linear motion model.

[0127] In one embodiment, the first coordinate system construction module 202 is specifically used to:

[0128] Control the servo motor of the motion mechanism to return to zero and establish the zero-point coordinate system of the motion model.

[0129] In one embodiment, the correction module 203 includes:

[0130] A relative coordinate system establishment module is used to establish the relative coordinate system of the motion mechanism by fine-tuning and calibration;

[0131] An error determination module, used for determining the error between the zero point coordinate system and the relative coordinate system;

[0132] The deviation correction module is used to perform deviation correction on the zero point coordinate system according to the error.

[0133] As a case, the relative coordinate system establishment module is specifically used for:

[0134] Acquire a first zero point position sent by a first sensor installed on the motion mechanism and a second zero point position sent by a second sensor, and determine the zero point position of the relative coordinate system according to the first zero point and the second zero point;

[0135] The relative coordinate system is established according to the zero point of the relative coordinate system.

[0136] As another example, the relative coordinate system establishment module is specifically used for:

[0137] The zero position of the relative coordinate system is determined by the Z point encoded in the servo motor of the motion mechanism;

[0138] A relative coordinate system is established based on the zero point of the relative coordinate system.

[0139] In one embodiment, the error determination module is specifically configured to:

[0140] Control the motion mechanism to run to the zero point of the zero-point coordinate system, and obtain the zero-point position of the zero-point coordinate system;

[0141] According to the zero point position of the relative coordinate system and the zero point position of the zero point coordinate system, the error between the zero point coordinate system and the relative coordinate system is determined.

[0142] In one embodiment, the correction module 203 is specifically used to: control the motion mechanism to move to a preset calibration position according to the corrected zero-point coordinate system, and obtain calibration information;

[0143] The second coordinate system building module 204 is specifically used to establish an absolute coordinate system according to the calibration information.

[0144] In addition, an embodiment of the present invention further provides an electronic device, including:

[0145] one or more processors; and

[0146] A memory associated with the one or more processors, the memory is used to store program instructions, and when the program instructions are read and executed by the one or more processors, the wafer transfer control method disclosed in the above embodiment is executed.

[0147] in, Figure 3 The system architecture of the electronic device is exemplarily shown, which may include a processor 310, a video display adapter 311, a disk drive 312, an input / output interface 313, a network interface 314, and a memory 320. The processor 310, the video display adapter 311, the disk drive 312, the input / output interface 313, the network interface 314, and the memory 320 may be communicatively connected via a communication bus 330.

[0148] Among them, the processor 310 can be implemented by a general-purpose CPU (Central Processing Unit), a microprocessor, an application-specific integrated circuit (Application Specific Integrated Circuit, ASIC), or one or more integrated circuits, and is used to execute relevant programs to implement the technical solution provided in this application.

[0149] The memory 320 can be implemented in the form of ROM (Read Only Memory), RAM (Random Access Memory), static storage device, dynamic storage device, etc. The memory 320 can store an operating system 321 for controlling the operation of the electronic device and a basic input and output system 322 (BIOS) for controlling the low-level operation of the electronic device. In addition, a web browser 323, a data storage management system 324, and a device identification information processing system 325, etc. can also be stored. The above-mentioned device identification information processing system 325 can be an application program that specifically implements the operations of the aforementioned steps in the embodiment of the present application. In short, when the technical solution provided in the present application is implemented by software or firmware, the relevant program code is stored in the memory 320 and is called and executed by the processor 310.

[0150] The input / output interface 313 is used to connect the input / output module to realize information input and output. The input / output module can be configured in the device as a component (not shown in the figure), or it can be externally connected to the device to provide corresponding functions. The input device may include a keyboard, a mouse, a touch screen, a microphone, various sensors, etc., and the output device may include a display, a speaker, a vibrator, an indicator light, etc.

[0151] The network interface 314 is used to connect to a communication module (not shown) to achieve communication interaction between the device and other devices. The communication module can achieve communication through a wired method (such as USB, network cable, etc.) or a wireless method (such as mobile network, WIFI, Bluetooth, etc.).

[0152] The bus 330 comprises a pathway for transmitting information between the various components of the device (eg, the processor 310 , the video display adapter 311 , the disk drive 312 , the input / output interface 313 , the network interface 314 , and the memory 320 ).

[0153] In addition, the electronic device can also obtain information on specific collection conditions from the virtual resource object collection condition information database for use in condition judgment, etc.

[0154] It should be noted that, although the above device only shows a processor 310, a video display adapter 311, a disk drive 312, an input / output interface 313, a network interface 314, a memory 320, a bus 330, etc., in the specific implementation process, the device may also include other components necessary for normal operation. In addition, it can be understood by those skilled in the art that the above device may also only include components necessary for implementing the solution of the present application, and does not necessarily include all the components shown in the figure.

[0155] In particular, according to an embodiment of the present application, the process described above with reference to the flowchart can be implemented as a computer software program. For example, an embodiment of the present application includes a computer program product, which includes a computer program carried on a computer-readable medium, and the computer program includes a program code for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from a network via a communication device, or installed from a memory, or installed from a ROM. When the computer program is executed by a processor, the above-mentioned functions defined in the method of the embodiment of the present application are executed.

[0156] It should be noted that the computer-readable medium of the embodiment of the present application may be a computer-readable signal medium or a computer-readable storage medium or any combination of the above two. The computer-readable storage medium may be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device or device, or any combination of the above. More specific examples of computer-readable storage media may include, but are not limited to: an electrical connection with one or more wires, a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the above. In an embodiment of the present application, a computer-readable storage medium may be any tangible medium containing or storing a program that can be used by or in combination with an instruction execution system, device or device. In an embodiment of the present application, a computer-readable signal medium may include a data signal propagated in a baseband or as part of a carrier wave, in which a computer-readable program code is carried. This propagated data signal may take a variety of forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination of the above. The computer readable signal medium may also be any computer readable medium other than a computer readable storage medium, which may send, propagate or transmit a program for use by or in conjunction with an instruction execution system, apparatus or device. The program code contained on the computer readable medium may be transmitted using any suitable medium, including but not limited to: wires, optical cables, RF (Radio Frequency), etc., or any suitable combination of the above.

[0157] The computer-readable medium may be included in the server; or it may exist independently without being installed in the server. The computer-readable medium carries one or more programs. When the one or more programs are executed by the server, the server: in response to detecting that the peripheral mode of the terminal is not activated, obtains the frame rate of the application on the terminal; when the frame rate meets the screen-off condition, determines whether the node is obtaining the screen information of the terminal; in response to the judgment result that the node does not obtain the screen information of the terminal, controls the screen to enter the immediate dimming mode.

[0158] The computer program code for the operation of the embodiment of the present application can be written in one or more programming languages ​​or a combination thereof, and the programming language includes an object-oriented programming language, such as Java, Smalltalk, C++, and also includes a conventional procedural programming language, such as "C" language or similar programming language. The program code can be executed completely on the node computer, partially on the node computer, as an independent software package, partially on the node computer, partially on the remote computer, or completely on the remote computer or server. In the case of a remote computer, the remote computer can be connected to the node computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or can be connected to an external computer (e.g., using an Internet service provider to connect through the Internet).

[0159] Each embodiment in this specification is described in a progressive manner, and the same or similar parts between the embodiments can refer to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the system or system embodiment, since it is basically similar to the method embodiment, the description is relatively simple, and the relevant parts can refer to the partial description of the method embodiment. The system and system embodiments described above are merely schematic, wherein the units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, they may be located in one place, or they may be distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the scheme of this embodiment. Ordinary technicians in this field can understand and implement it without creative work.

[0160] The technical solution provided by the present application is described in detail above. The principle and implementation method of the present application are described in detail using specific examples. The description of the above embodiments is only used to help understand the method and core idea of ​​the present application. At the same time, for those skilled in the art, according to the idea of ​​the present application, there will be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as limiting the present application.

[0161] All the above optional technical solutions can be arbitrarily combined to form optional embodiments of the present invention, which will not be described in detail here.

[0162] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A wafer transfer control method, comprising: Establishing a motion model according to the motion mechanism, wherein establishing the motion model according to the motion mechanism includes: establishing a rotational motion model and a linear motion model according to the motion mechanism; coupling the motion form of the motion mechanism with the rotational motion model and the linear motion model; Establishing a zero-point coordinate system of the motion model; Performing deviation correction on the zero-point coordinate system; Establishing an absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system; Controlling the motion mechanism to transfer the wafer along a first motion trajectory according to the absolute coordinate system, and obtaining a first preset point position of a preset point, wherein the first preset point includes: a positioning point, which is an intersection of an extension line of a diameter of a wafer carrier in a wafer storage chamber and an extension line of a diameter of a wafer carrier in a wafer process chamber; While the motion mechanism transfers the wafer according to the first motion trajectory, the motion model is controlled to move according to the second motion trajectory according to the absolute coordinate system, and a second preset point position of the preset point is obtained, where the second preset point is an overlap point where the first motion trajectory and the second motion trajectory have the same coordinates in the absolute coordinate system; The first preset point position is compared with the second preset point position. If there is a deviation between the first preset point position and the second preset point position, the absolute coordinate system is corrected according to the deviation between the first preset point position and the second preset point position.

2. The method according to claim 1, characterized in that The establishing of the zero-point coordinate system of the motion model comprises: The servo motor of the motion mechanism is controlled to return to zero, and a zero-point coordinate system of the motion model is established.

3. The method according to claim 1, characterized in that The performing deviation correction on the zero-point coordinate system comprises: Establishing a relative coordinate system of the motion mechanism by fine-tuning and calibration; Determining an error between the zero-point coordinate system and the relative coordinate system; The zero-point coordinate system is subjected to deviation correction according to the error.

4. The method according to claim 3, characterized in that The relative coordinate system of the motion mechanism is established by fine-tuning and calibrating, including: acquiring a first zero point position sent by a first sensor and a second zero point position sent by a second sensor installed on the motion mechanism, and determining the zero point position of the relative coordinate system according to the first zero point and the second zero point, or Determine the zero point position of the relative coordinate system by means of the Z point encoded in the servo motor of the motion mechanism; The relative coordinate system is established according to the zero point of the relative coordinate system.

5. The method according to claim 3, characterized in that The determining of the error between the zero-point coordinate system and the relative coordinate system comprises: Controlling the motion mechanism to move to the zero point of the zero-point coordinate system, and obtaining the zero-point position of the zero-point coordinate system; The error between the zero-point coordinate system and the relative coordinate system is determined according to the zero-point position of the relative coordinate system and the zero-point position of the zero-point coordinate system.

6. The method according to claim 1, characterized in that The step of establishing the absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system comprises: Controlling the motion mechanism to move to a preset calibration position according to the corrected zero-point coordinate system to obtain calibration information; The absolute coordinate system is established according to the calibration information.

7. A wafer transfer control device, characterized in that: include: A modeling module, the modeling module includes: a preliminary modeling module for establishing a rotational motion model and a linear motion model according to a motion mechanism; a coupling module for coupling the motion form of the motion mechanism with the rotational motion model and the linear motion model; A first coordinate system building module, used to establish a zero-point coordinate system of the motion model; A first correction module, used for performing deviation correction on the zero-point coordinate system; A second coordinate system building module, used for establishing an absolute coordinate system of the motion mechanism according to the corrected zero-point coordinate system; A first control module is used to control the motion mechanism to transfer the wafer according to the first motion trajectory according to the absolute coordinate system, and obtain a first preset point position of the preset point, wherein the first preset point includes: a positioning point, which is an intersection of an extension line of a diameter of a wafer carrier in the wafer storage chamber and an extension line of a diameter of a wafer carrier in the wafer process chamber; A second control module is used to control the motion model to move according to a second motion trajectory according to the absolute coordinate system while the motion mechanism transfers the wafer according to the first motion trajectory, and obtain a second preset point position of the preset point, where the second preset point is an overlap point where the first motion trajectory and the second motion trajectory have the same coordinates in the absolute coordinate system; The second correction module is used to compare the first preset point position and the second preset point position, and if there is a deviation between the first preset point position and the second preset point position, correct the absolute coordinate system according to the deviation between the first preset point position and the second preset point position.

8. An electronic device, characterized in that: include: one or more processors; as well as A memory associated with the one or more processors, the memory being used to store program instructions, wherein the program instructions, when read and executed by the one or more processors, execute the method according to any one of claims 1 to 6.

9. A computer readable medium having a computer program stored thereon, wherein: When the program is executed by a processor, the method according to any one of claims 1 to 6 is implemented.

Citation Information

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