A low electromagnetic interference target chamber and system for laser plasma

Abstract

The present invention provides a low electromagnetic interference target chamber for laser plasma and its system, comprising: an outer vacuum target chamber, an inner metal target chamber and a radiation shielding channel; the inner metal target chamber is fixed inside the outer vacuum target chamber through an insulating support block, and the inner metal target chamber is at zero potential; the outer vacuum target chamber comprises: a first vacuum pipe arranged in the side wall, isolating the cable of the inner metal target chamber from the outer vacuum target chamber; the radiation shielding channel is arranged inside the inner metal target chamber, one end of the radiation shielding channel is sealed and connected to the inner metal target chamber; the other end extends toward the target material direction and communicates with the inner metal target chamber; the radiation shielding channel is a metal tubular structure with a cutoff frequency. The present invention sets an inner metal target chamber so that the electromagnetic interference generated by the laser plasma is blocked by the metal inner shielding layer, which greatly reduces the electromagnetic interference to the outer vacuum target chamber.

Description

Technical Field

[0001] The invention relates to the field of laser plasma, and in particular to a low electromagnetic interference target chamber for laser plasma and a system thereof. Background Art

[0002] Laser plasma generated by the interaction of high-power laser and matter has a wide range of applications, but the generation process of laser plasma is accompanied by strong electromagnetic radiation, which can seriously interfere with the signal acquisition of experimental equipment placed on the wall of the target chamber and around the target chamber.

[0003] In the application of laser plasma, the detection equipment is usually installed on the flange of the outer vacuum target chamber, or some parts of the detection equipment pass through the flange of the outer vacuum target chamber, or the signal cable of the detector inside the target chamber is transferred to the data acquisition equipment outside the target chamber through the flange of the outer vacuum target chamber.

[0004] Therefore, in order to prevent the electromagnetic interference emitted by the laser plasma from reaching the outer vacuum target chamber and entering the surrounding electrical equipment through the conductive medium connected to the outer vacuum target chamber or in the form of free space radiation, it is necessary to reduce the electromagnetic interference on the outer vacuum target chamber to solve the above technical problems. Summary of the invention

[0005] The purpose of the present invention is to provide a low electromagnetic interference target chamber and system for laser plasma, which can solve at least one of the above-mentioned technical problems. The specific solution is as follows:

[0006] According to the specific embodiments disclosed in the present invention, the first aspect of the present invention provides a low electromagnetic interference target chamber for laser plasma, comprising: an outer vacuum target chamber, an inner metal target chamber and a radiation shielding channel;

[0007] The inner metal target chamber is fixed inside the outer vacuum target chamber through an insulating support block, and the inner metal target chamber is at zero potential;

[0008] The outer vacuum target chamber comprises: a first vacuum pipe arranged in the side wall, isolating the cables of the inner metal target chamber from the outer vacuum target chamber;

[0009] The radiation shielding channel is arranged inside the inner metal target chamber, one end of the radiation shielding channel is sealed and connected to the inner metal target chamber; the other end of the radiation shielding channel extends toward the target material and communicates with the inner metal target chamber;

[0010] The radiation shielding channel is a metal tubular structure with a cutoff frequency.

[0011] Preferably, the wall thickness of the inner metal target chamber or the tube wall thickness of the radiation shielding channel is greater than 20 μm.

[0012] Preferably, the tube wall of the radiation shielding channel is a mesh metal, and the diameter of the mesh is less than 0.5 mm and less than 1 / 10 of the wavelength of the electromagnetic radiation.

[0013] Preferably, a first vacuum flange is arranged outside the outer vacuum target chamber;

[0014] The thickness of the bottom wall of the inner metal target chamber close to the first vacuum flange is greater than the thickness of the side wall;

[0015] A through hole is arranged on the bottom wall so that the inner metal target chamber is in a vacuum state.

[0016] Preferably, the axial cross-section of the radiation shielding channel is rectangular or trapezoidal.

[0017] Preferably, a laser window is arranged outside the outer vacuum target chamber so that the incident direction of the laser coincides with the axial direction of the radiation shielding channel.

[0018] Preferably, the outer vacuum target chamber further comprises: a second vacuum pipe arranged in the side wall, and a second vacuum flange connected to the second vacuum pipe;

[0019] The second vacuum pipe is coaxial with the radiation shielding channel, so that the probe of the detector enters the radiation shielding channel through the second vacuum pipe.

[0020] Preferably, a projection area of ​​the second vacuum flange in the laser radiation direction is smaller than a projection area of ​​the radiation shielding channel.

[0021] According to a specific embodiment disclosed in the present invention, a second aspect of the present invention provides a pulsed laser deposition film coating integrated system, comprising the low electromagnetic interference target chamber described in the first aspect.

[0022] According to the specific embodiments disclosed in the present invention, the third aspect of the present invention provides an extreme ultraviolet lithography machine integrated system, including the low electromagnetic interference target chamber described in the first aspect.

[0023] Compared with the prior art, the above solution of the embodiment of the present disclosure has at least the following beneficial effects:

[0024] 1. The present invention sets an inner metal target chamber so that the electromagnetic interference generated by the laser plasma is blocked by the metal inner shielding layer, which greatly reduces the electromagnetic interference to the outer vacuum target chamber;

[0025] 2. The present invention sets a radiation shielding channel at the laser incident direction of the inner metal target chamber and the detector probe installation position, one end of which is connected to the target chamber and the other end is connected to the side wall of the inner metal target chamber, effectively preventing the electromagnetic radiation emitted by the laser plasma from leaking from the laser path or the detector position, and greatly reducing the electromagnetic interference leaked from the detector position and the laser path. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The drawings herein are incorporated into the specification and constitute a part of the specification, showing embodiments consistent with the disclosure of the present invention, and together with the specification, are used to explain the principles disclosed in the present invention. Obviously, the drawings described below are only some embodiments disclosed in the present invention, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. In the drawings:

[0027] Figure 1 A schematic diagram of the overall structure of a low electromagnetic interference target chamber for laser plasma provided in Example 1 of the present invention;

[0028] Figure 2 A schematic diagram of the overall structure of a low electromagnetic interference target chamber provided in Example 2 of the present invention;

[0029] Figure 3 This is a schematic diagram of the overall structure of the low electromagnetic interference target chamber provided in Example 3 of the present invention.

[0030] Reference numerals:

[0031] 1 outer vacuum target chamber; 2 inner metal target chamber; 3 bottom wall of inner metal target chamber; 4 insulating support block; 5 first vacuum pipe; 6 radiation shielding channel; 7 side wall of outer vacuum target chamber; 8 laser focusing mirror; 9 laser window; 10 target material; 11 second vacuum pipe; 12 first vacuum flange; 13 detector probe. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical scheme and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0033] It should also be noted that the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a product or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such product or device. In the absence of more restrictions, the elements defined by the sentence "comprises a" do not exclude the presence of other identical elements in the product or device including the elements.

[0034] The following is combined with Figure 1-3 A low electromagnetic interference target chamber for laser plasma of the present invention is described in detail.

[0035] like Figure 1 As shown, the present invention provides a low electromagnetic interference target chamber for laser plasma, comprising: an outer vacuum target chamber 1, an inner metal target chamber 2 and a radiation shielding channel 6;

[0036] The inner metal target chamber 2 is fixed inside the outer vacuum target chamber 1 through the insulating support block 4, and the inner metal target chamber 2 is at zero potential;

[0037] The outer vacuum target chamber 1 comprises: a first vacuum pipe 5 arranged in the side wall 7 of the outer vacuum target chamber, and the cables of the inner metal target chamber 2 are isolated from the outer vacuum target chamber 1;

[0038] The radiation shielding channel 6 is arranged inside the inner metal target chamber 2, one end of the radiation shielding channel 6 is sealed and connected to the inner metal target chamber 2; the other end extends toward the target material 10 and communicates with the inner metal target chamber 2;

[0039] The radiation shielding channel 6 is a metal tubular structure with a cutoff frequency.

[0040] Specifically, the outer vacuum target chamber 1 is a vacuum target chamber for providing a mechanical structure and having a vacuum sealing function. The outer vacuum target chamber 1 is evacuated by connecting a first vacuum flange 12 disposed outside the outer vacuum target chamber 1 to a vacuum pump. The laser enters the vacuum target chamber from the laser window 9, ablating the target material 10 to generate laser plasma, and at the same time, generating electromagnetic interference and emitting to the surroundings.

[0041] like Figure 1As shown, the inner metal target chamber 2 in the present invention is a fully sealed design relative to the laser plasma, and can shield all electromagnetic radiation emitted from the laser plasma, so that it cannot propagate to the outer vacuum target chamber 1 from any path, and cannot enter the surrounding electrical equipment through the conductive medium connected to the outer vacuum target chamber 1 or through the form of free space radiation. Therefore, the present invention sets an inner metal target chamber in the outer vacuum target chamber, so that the electromagnetic interference generated by the laser plasma is blocked by the metal inner shielding layer, thereby greatly reducing the electromagnetic interference to the outer vacuum target chamber.

[0042] Preferably, the wall thickness of the inner metal target chamber is greater than 20 μm. This thickness is greater than the skin depth of electromagnetic interference in metal encountered in laser plasma experiments, which can ensure that electromagnetic interference will not penetrate the inner metal target chamber, and also prevent holes in the metal wall from leaking electromagnetic radiation during processing.

[0043] Since the inner metal target chamber 2 needs to be grounded separately, has no conductive connection with the outer vacuum target chamber 1, and does not share a ground with other laboratory equipment, a first vacuum pipe 5 is arranged in the outer vacuum target chamber side wall 7 of the outer vacuum target chamber 1, and the cable connected to the inner metal target chamber 2 is passed through the first vacuum pipe 5 and then grounded to the outside, so that the inner metal target chamber is at zero potential.

[0044] Furthermore, in order to ensure the vacuum degree of the inner metal target chamber 2, a plurality of threaded holes are provided on the inner metal target chamber bottom wall 3 near the first vacuum flange 12 of the inner metal target chamber 2, so that the gas in the inner metal target chamber 2 can be extracted through the threaded holes. The threaded holes can also function as a metal cutoff waveguide to prevent electromagnetic radiation leakage.

[0045] Preferably, the thickness of the bottom wall 3 of the inner metal target chamber is greater than the thickness of the side wall. Since a threaded hole is to be opened on the bottom wall of the inner metal target chamber, the depth to aperture ratio of the threaded hole must be greater than a certain value to ensure the function of the electromagnetic radiation cutoff waveguide. Therefore, the thickness of the bottom wall of the inner metal target chamber must be greater than the thickness of the side wall and meet the parameter requirements of the threaded hole cutoff waveguide.

[0046] In the application of laser plasma, the detection equipment is often installed on the flange of the outer vacuum target chamber, or a hole is opened at the corresponding position of the target chamber, so that some parts of the detection equipment can pass through the flange of the outer vacuum target chamber, or the signal cable of the detector inside the target chamber can be transferred to the data acquisition equipment outside the target chamber through the flange of the outer vacuum target chamber. However, the commonly used conductive glass will block the laser plasma signal and cannot carry the high-power laser used by laser plasma, so it is impossible to rely on conductive glass to block the electromagnetic radiation leakage at the opening.

[0047] To prevent electromagnetic interference from being propagated through cables, vacuum pipes, other conductive media, or free space radiation. Figure 2 As shown, the present invention provides radiation shielding channels 6 in the inner metal target chamber 2 at the laser incident direction and the detector installation position. One end of the radiation shielding channel 6 is sealed and connected to the inner metal target chamber 2; the other end extends toward the target material 10 and communicates with the inner metal target chamber 2.

[0048] It effectively prevents the electromagnetic radiation emitted by the laser plasma from leaking from the laser path or the detector position, and greatly reduces the electromagnetic interference leaking from the detector position and the laser path.

[0049] When the laser enters the inner metal target chamber 2 from the radiation shielding channel 6 and irradiates the target material 10 to generate laser plasma, the electromagnetic interference emitted by the laser plasma is blocked by the radiation shielding channel 6 and cannot overflow the space surrounded by the inner metal target chamber 2 and the radiation shielding channel 6.

[0050] Therefore, the opening size and length of the radiation shielding channel 6 need to be designed accordingly according to the specific electromagnetic interference wavelength, and the length and aperture ratio must be greater than the critical value determined theoretically to meet the cut-off frequency requirement.

[0051] Furthermore, in order to detect signals such as ions, electrons, and X-rays emitted by the laser plasma, the detector probe 13 needs to be extended into the inner metal target chamber 2. At this time, a second vacuum pipe and a second vacuum flange (not shown in the figure) connected to the second vacuum pipe are arranged in the side wall 7 of the outer vacuum target chamber. The second vacuum pipe is coaxial with the radiation shielding channel 6, so that the detector probe 13 passes through the second vacuum pipe through the radiation shielding channel 6 and extends into the inner metal target chamber 2.

[0052] Specifically, the electrical signal generated by the detector is transmitted through a coaxial cable with a shielding layer, and the coaxial cable passes through the second vacuum flange and finally enters the data acquisition device outside the vacuum target chamber. In order to prevent the high-energy rays from the laser plasma from exciting secondary electrons on the coaxial cable to generate new electromagnetic interference, the coaxial cable and the second vacuum flange through which the coaxial cable passes must be within the shadow area of ​​the inner metal target chamber 2 and the radiation shielding channel 6.

[0053] Preferably, if Figure 2-3 As shown, the axial cross section of the radiation shielding channel 6 is rectangular or trapezoidal. At this time, the projection area of ​​the second vacuum flange in the laser radiation direction is smaller than the projection area of ​​the radiation shielding channel in the laser radiation direction.

[0054] Preferably, the radiation shielding channel 6 can be made of a plate-shaped metal material such as copper, aluminum, stainless steel, etc., and the tube wall thickness is greater than 20 μm. This thickness is greater than the skin depth of electromagnetic interference in the metal encountered in the laser plasma experiment, which can ensure that the electromagnetic interference will not penetrate the inner metal target chamber. At the same time, this thickness can also prevent the metal wall plate from having holes during processing, resulting in electromagnetic radiation leakage.

[0055] It can also be made of mesh metal, with the diameter of the mesh being less than 0.5 mm and less than 1 / 10 of the wavelength of the electromagnetic radiation, which can prevent the electromagnetic radiation in the laser plasma experiment from leaking from the mesh.

[0056] The following are optional implementations: Example

[0057] The outer vacuum target chamber and the inner metal target chamber are made of 3mm and 1mm thick stainless steel respectively, and the inner metal target chamber is fixed to the bottom of the outer vacuum target chamber with an insulating block. The thickness of the bottom wall of the inner metal target chamber is 2cm, and several M6 threaded holes are evenly opened on the bottom wall at a spacing of 5cm.

[0058] A radiation shielding channel is set in the inner metal target chamber in the direction of laser transmission, and the axial direction of the radiation shielding channel coincides with the incident direction of the laser. One end of the radiation shielding channel is sealed and connected to the inner metal target chamber; the other end is open and extends toward the target material, and is connected to the inner metal target chamber. The radiation shielding channel is conical, with a head opening diameter of 1 cm and a cone angle of 30°.

[0059] A first vacuum pipe is arranged in the side wall of the outer vacuum target chamber, which is used to lead out the coaxial cable of the inner metal target chamber and connect it to the ground wire, so as to meet the condition of mutual insulation with the outer vacuum target chamber, so as to ensure that the inner metal target chamber and its bottom wall are at zero potential, and can suppress static electricity accumulation and electromagnetic interference generation.

[0060] When working, the vacuum pump is connected to the first vacuum flange connected to the bottom of the outer vacuum target chamber, and the entire vacuum target chamber is evacuated to the required vacuum degree, and the gas in the metal inner shielding layer is extracted through the threaded holes on the bottom wall of the inner metal target chamber. The laser beam is converged by the laser focusing mirror 8, passes through the laser window on the outer vacuum target chamber, and enters the inner metal target chamber, and finally focuses to the position to ablate the target material to generate laser plasma.

[0061] The frequency of the electromagnetic radiation of the generated laser plasma is between 10MHz~1GHz (wavelength 30cm~30m). When it is emitted in all directions, it is blocked by the inner metal target chamber and cannot reach the outer vacuum target chamber wall. In the laser path, the electromagnetic radiation is blocked by the conical radiation shielding channel made of 1mm thick copper plate, and cannot escape from the inner metal target chamber, thereby achieving all-round shielding of electrical radiation.

[0062] Example 2

[0063] The outer vacuum target chamber and the inner metal target chamber are made of stainless steel with thickness of 3mm and 1mm respectively, and the inner metal target chamber is fixed to the bottom of the outer vacuum target chamber with an insulating block. The thickness of the bottom wall of the inner metal target chamber is 2cm, and M6 threaded holes are evenly opened on the bottom wall at a spacing of 5cm.

[0064] On the basis of setting a conical radiation shielding channel in the laser transmission direction of the inner metal target chamber, a radiation shielding channel is also set at the detector probe position. One end of the radiation shielding channel is sealed and connected to the inner metal target chamber; the other end is open and extends toward the target material direction and is connected to the inner metal target chamber.

[0065] In this embodiment, the detector is used to measure the ion signal of the laser plasma, such as Figure 2 As shown, since the detector has a relatively small transverse dimension, only 1 cm in diameter, a straight-cylindrical radiation shielding channel made of 1 mm thick copper plate is used to prevent electromagnetic radiation from propagating to the detector. In this embodiment, the characteristic frequency of laser plasma electromagnetic radiation is between 100 MHz and 10 GHz (wavelength 3 cm to 3 m), so the inner diameter of the straight-cylindrical radiation shielding channel is set to 2 cm, and the length of the radiation shielding channel extending from the detector probe toward the target material is set to 10 cm. The tail of the radiation shielding channel is connected to the metal inner shielding layer made of 1 mm copper plate, and the coaxial cable of the detector passes through the second vacuum pipe of the outer vacuum target chamber and is connected to the signal recording device outside the target chamber.

[0066] When working, the vacuum pump is connected to the first vacuum flange 12 connected to the bottom of the outer vacuum target 1, and the entire vacuum target chamber is evacuated to the required vacuum degree, and the gas in the metal inner shielding layer is extracted through the threaded holes opened on the bottom plate. The laser beam is converged by the laser focusing mirror, passes through the laser window on the outer vacuum target chamber, and then enters the vacuum, and finally focuses to the position to ablate the target material to generate laser plasma.

[0067] When the generated laser plasma is emitted in all directions, it is blocked by the inner metal target chamber and cannot reach the wall of the outer vacuum target chamber; it is also blocked by the barrel-shaped radiation shielding channel and cannot reach the space around the target chamber; on the laser path, the electromagnetic radiation is blocked by the conical radiation shielding channel made of 1mm thick copper plate and cannot escape from the inner metal target chamber, thus achieving all-round shielding of electrical radiation.

[0068] Example 3

[0069] The outer vacuum target chamber and the inner metal target chamber are made of stainless steel with thickness of 3mm and 1mm respectively, and the inner metal target chamber is fixed to the bottom of the outer vacuum target chamber with an insulating block. The thickness of the bottom wall of the inner metal target chamber is 2cm, and M6 threaded holes are evenly opened on the bottom wall at a spacing of 5cm.

[0070] On the basis of setting a conical radiation shielding channel in the laser transmission direction in the inner metal target chamber, a conical radiation shielding channel is also set at the detector probe position, one end of the radiation shielding channel is sealed and connected to the inner metal target chamber; the other end is open and extends toward the target material direction and is connected to the inner metal target chamber.

[0071] In this embodiment, the detector is used to measure the X-ray imaging of the laser plasma. The transverse dimension of the detector probe is 10 cm, so a conical radiation shielding channel made of a 1 mm copper plate is used, such as Figure 3 The characteristic frequency of electromagnetic radiation of laser plasma is around 10GHz (wavelength 3cm). The cone cutoff waveguide is set with a head opening diameter of 0.5cm, a tail diameter of 12cm, and a length of 45cm, which can ensure that the shielded coaxial cable used in the detector and the second vacuum flange through which the coaxial cable passes are in the shadow area of ​​the inner metal target chamber and the radiation shielding channel.

[0072] When working, the vacuum pump is connected to the first vacuum flange connected to the bottom of the outer vacuum target chamber, and the entire vacuum target chamber is pumped to the required vacuum degree. The gas in the metal inner shielding layer is pumped out through the threaded holes opened on the bottom plate. The laser beam is converged by the laser focusing mirror, passes through the laser window on the outer vacuum target chamber, and then enters the vacuum, and finally focuses to the position to ablate the target material to generate laser plasma.

[0073] When the generated laser plasma is emitted in all directions, it is blocked by the inner metal target chamber and cannot reach the wall of the outer vacuum target chamber; it is also blocked by the conical radiation shielding channel and cannot reach the space around the target chamber; on the laser path, the electromagnetic radiation is blocked by the conical radiation shielding channel made of 1mm thick copper plate and cannot escape from the inner metal target chamber, thus achieving all-round shielding of electrical radiation.

[0074] The present invention also discloses a pulsed laser deposition coating integrated system and an extreme ultraviolet lithography machine integrated system using the above-mentioned embodiments.

[0075] Finally, it should be noted that the various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other. For the system or device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part description.

[0076] The above embodiments are only used to illustrate the technical solutions disclosed in the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, a person skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments disclosed in the present invention.

Claims

1. A low electromagnetic interference target chamber for laser plasma, characterized in that: include: Outer vacuum target chamber, inner metal target chamber and radiation shielding channel; The inner metal target chamber is fixed inside the outer vacuum target chamber through an insulating support block, and the inner metal target chamber is at zero potential; The outer vacuum target chamber comprises: a first vacuum pipe arranged in the side wall of the outer vacuum target chamber, isolating the cable connected to the inner metal target chamber from the outer vacuum target chamber; The radiation shielding channel is arranged inside the inner metal target chamber, one end of the radiation shielding channel is sealed and connected to the inner metal target chamber; the other end of the radiation shielding channel extends toward the target material and communicates with the inner metal target chamber; The radiation shielding channel is a metal tubular structure with a cutoff frequency.

2. The low electromagnetic interference target chamber according to claim 1, characterized in that: The wall thickness of the inner metal target chamber or the tube wall thickness of the radiation shielding channel is greater than 20 μm.

3. The low electromagnetic interference target chamber according to claim 1, characterized in that: The tube wall of the radiation shielding channel is a mesh metal tube wall, and the diameter of the mesh is less than 0.5 mm and less than 1 / 10 of the wavelength of electromagnetic radiation.

4. The low electromagnetic interference target chamber according to claim 1 or 2, characterized in that: A first vacuum flange is arranged outside the outer vacuum target chamber; The thickness of the bottom wall of the inner metal target chamber close to the first vacuum flange is greater than the thickness of the side wall of the outer vacuum target chamber; A through hole is arranged on the bottom wall so that the inner metal target chamber is in a vacuum state.

5. The low electromagnetic interference target chamber according to claim 1, characterized in that: The axial cross section of the radiation shielding channel is rectangular or trapezoidal.

6. The low electromagnetic interference target chamber according to claim 1, characterized in that: A laser window is arranged outside the outer vacuum target chamber so that the incident direction of the laser coincides with the axial direction of the radiation shielding channel.

7. The low electromagnetic interference target chamber according to claim 1 or 6, characterized in that: The outer vacuum target chamber further comprises: a second vacuum pipeline arranged in the side wall of the outer vacuum target chamber, and a second vacuum flange connected to the second vacuum pipeline; The second vacuum pipe is coaxially arranged with the radiation shielding channel, so that the probe of the detector enters the radiation shielding channel through the second vacuum pipe.

8. The low electromagnetic interference target chamber according to claim 7, characterized in that: A projection area of ​​the second vacuum flange in the laser radiation direction is smaller than a projection area of ​​the radiation shielding channel in the laser radiation direction.

9. A pulsed laser deposition coating integrated system, characterized in that: It comprises the low electromagnetic interference target chamber described in any one of claims 1-8.

10. An extreme ultraviolet lithography machine integrated system, characterized in that: It comprises the low electromagnetic interference target chamber described in any one of claims 1-8.

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