Cleaning device for semiconductor equipment parts

Abstract

The invention discloses a semiconductor equipment part cleaning device which comprises a support, a cleaning box is fixedly connected to the bottom of the support, a sealing plate is slidably connected to the outer surface of the cleaning box, the semiconductor equipment part cleaning device further comprises an air blowing pipe, the air blowing pipe is fixedly connected to the bottom of the cleaning box, and a conveying belt is fixedly connected to the bottom of an inner cavity of the cleaning box; the cleaning assembly is fixedly connected to the top of the cleaning box; and the condensation assembly is fixedly connected to the outer surface of the cleaning box, the outer surface of the condensation assembly is fixedly connected with a fixing plate, and the position, away from the fixing plate, of the condensation assembly communicates with a filtering assembly. According to the cleaning device for the parts of the semiconductor equipment, the situation that gas leaks when the cleaning box is used for cleaning the parts is avoided, the air blowing pipe can conveniently remove dust before and after the equipment is started, the situation that the interior of the cleaning box is dirty due to long-time cleaning is prevented, and the condensation assembly can conduct condensation treatment on the cleaning gas.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and in particular to a cleaning device for semiconductor equipment parts. Background Art

[0002] Semiconductors refer to materials whose electrical conductivity is between that of conductors and insulators at room temperature. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power power conversion and other fields. In chemical vapor deposition processes, especially metal vapor chemical deposition (MOCVD) processes, wafers are generally placed on trays in order to carry and heat wafers. The cleaning of semiconductor equipment parts generally involves placing a component in a relatively closed high-temperature space, introducing a clean gas so that it flows through the tray and reacts with the deposit to clean the component. However, it is difficult to control the temperature inside the equipment during the cleaning process, which makes it easy for the gas to be missed when cleaning the component, resulting in insufficient contact between the gas and the component, thereby reducing the cleaning effect of the component. In addition, the gas inside the equipment is not easy to handle after cleaning, so that the gas is discharged from the equipment when the equipment is taking and placing the component, causing the clean gas to pollute the surrounding area of ​​the equipment. When the equipment is taking and placing the component, air is easily introduced into the interior, causing the air to affect the clean gas during the subsequent cleaning process, increasing the difficulty of cleaning the equipment.

[0003] In summary, it is difficult to control the temperature inside the equipment during the cleaning process, which makes it easy for gas to miss parts when cleaning them, resulting in insufficient contact between the gas and the parts, thereby reducing the cleaning effect of the parts. Air is easily introduced into the equipment when it takes and places parts, increasing the difficulty of cleaning the equipment. Summary of the invention

[0004] In view of the deficiencies of the prior art, the present invention solves the technical problems by adopting the following technical solutions: a cleaning device for semiconductor equipment parts according to the present invention comprises a bracket, a cleaning box is fixedly connected to the bottom of the bracket, an observation window is provided on the side of the cleaning box away from the condensation assembly, a sealing plate is slidably connected to the outer surface of the cleaning box, two sealing plates are arranged on the cleaning box, and the two sealing plates are installed opposite to each other, and further comprises: An air blowing pipe, which is fixedly connected to the bottom of the cleaning box, and is used to clean the conveying gas inside the cleaning box. The bottom end of the air blowing pipe is connected to a blowing box, and the bottom of the blowing box is fixedly connected to the bracket. The bottom of the inner cavity of the cleaning box is fixedly connected to a conveyor belt; A cleaning assembly, which is fixedly connected to the top of the cleaning box and is used to deliver gas to the inside of the cleaning box to clean the parts; A condensation assembly, which is fixedly connected to the outer surface of the cleaning box, and is used to condense and recover the cleaned gas. A fixing plate is fixedly connected to the outer surface of the condensation assembly, and a position of the condensation assembly away from the fixing plate is connected to a filter assembly; The cleaning assembly includes a heater, which is fixedly connected to the top of the cleaning box, and is used to heat the inside of the cleaning box. The inner surface of the heater is fixedly connected to a temporary storage box, and the top of the temporary storage box is connected to an air inlet pipe; An air duct is connected to the bottom of the temporary storage box. The air duct is used to transport the clean gas. Two air ducts are arranged on the temporary storage box. The bottom end of the air duct is connected to a diverter plate. The outer surface of the air duct is fixedly connected to a support plate. The top of the support plate is fixedly connected to an air pressure sensor.

[0005] Preferably, the bottom end of the air guide pipe passes through the clean box and extends to the interior of the clean box, and the bottom of the heater passes through the clean box and extends to the interior of the clean box.

[0006] Preferably, the top of the air pressure sensor is fixedly connected to the cleaning box, and the side of the cleaning box close to the condensation assembly is fixedly connected to the fixing plate.

[0007] Preferably, a side of the filter assembly close to the condensation assembly is fixedly connected to the cleaning box, and a top end of the air blowing pipe passes through the cleaning box and extends to the interior of the cleaning box.

[0008] Preferably, the condensation component includes a vacuum cylinder, which is fixedly connected to a position of the cleaning box near the filter component, and is used to extract gas inside the cleaning box. A vacuum pump is fixedly connected to the inner surface of the vacuum cylinder, and one end of the vacuum cylinder away from the cleaning box is connected to a protective cylinder, and the top of the protective cylinder is fixedly connected to a filter sleeve, and the top of the inner cavity of the protective cylinder is fixedly connected to a fixing ring; The condenser is fixedly connected to the bottom of the inner cavity of the protective tube. The condenser is used to condense the gas inside the protective tube. The top of the condenser is fixedly connected to an internal frame, and the internal frame is fixedly connected to a sensor at a position away from the protective tube.

[0009] Preferably, the outer surface of the condenser is in communication with an exhaust cylinder, and one end of the exhaust cylinder away from the protective cylinder penetrates the clean box and extends into the interior of the clean box.

[0010] Preferably, the bottom of the fixing ring is fixedly connected with adsorption rods, which are distributed in a circular shape on the fixing ring, and the outer surface of the adsorption rods is rotatably connected with a rotating plate; A telescopic rod is fixedly connected to the bottom of the fixed ring. Two telescopic rods are arranged on the fixed ring through the telescopic rod, and the two telescopic rods are installed opposite to each other. A reinforcing plate is fixedly connected to the top of the movable plate.

[0011] Preferably, the inner surface of the reinforcement plate is slidably connected to the telescopic rod, and the top end of the adsorption rod passes through the fixing ring and extends to the inside of the fixing ring.

[0012] Preferably, the filter assembly comprises a filter box, which is fixedly connected to one end of the vacuum cylinder away from the protective cylinder, and is used to filter the gas extracted by the vacuum cylinder. A filter plate is fixedly connected to the top of the inner cavity of the filter box, and a support rod is fixedly connected to the position of the filter box near the filter plate. An auxiliary filter plate is fixedly connected to the inner surface of the filter box, and is used to assist in filtering the gas inside the filter box. A connecting plate is rotatably connected to a position of the filter box near the auxiliary filter plate, and an auxiliary fan is rotatably connected to the inner surface of the connecting plate.

[0013] Preferably, the side of the auxiliary filter plate away from the filter box is fixedly connected to the filter plate, and the bottom of the filter plate is fixedly connected to the support rod.

[0014] Preferably, the top end of the support rod is fixedly connected to a pressing frame, the pressing frame is rotatably connected to a screw rod at a position away from the support rod, and the bottom end of the screw rod is rotatably connected to the filter box; A displacement block is slidably connected to the outer surface of the support rod. Two displacement blocks are set, one displacement block is rotatably connected to the screw rod, and the other displacement block is slidably connected to the support rod. The outer surface of the displacement block is rotatably connected to a movable roller, and the outer surface of the movable roller is fixedly connected to a cleaning plate, which is distributed in a circular shape on the movable roller through the cleaning plate.

[0015] The present invention provides a cleaning device for semiconductor equipment parts. It has the following beneficial effects: 1. The cleaning device for semiconductor equipment parts is provided with an air blowing pipe, a sealing plate, and a cleaning box. The cleaning box can be sealed by the sealing plate, so that the sealing plate and the cleaning box cooperate to maintain the sealing of the parts placement position, avoiding gas leakage when the cleaning box is cleaning the parts, and facilitating the air blowing pipe to remove dust before and after the equipment is started to prevent the inside of the cleaning box from becoming dirty due to long-term cleaning. The suction force delivered by the filter component through the condensation component extracts air from the inside of the cleaning box, which can process the clean gas inside the cleaning box, ensuring that the filter component intercepts the gas, so that the condensation component can condense the clean gas.

[0016] 2. The cleaning device for semiconductor equipment parts heats the cleaning box through a heater, so that the heat assists the cleaning work of the parts in the cleaning box. The installation position of the heater can limit the installation position of the temporary storage box to avoid affecting the heating work of the heater on the cleaning box. The air pump inside the temporary storage box transports the air to the inside of the air duct, so that the air duct can transport the clean gas to different positions for cleaning work, thereby ensuring the cleaning effect of the clean gas.

[0017] 3. The cleaning device for semiconductor equipment parts diverts the transported gas on the air duct through the diverter plate to prevent the parts from being affected during cleaning and causing incomplete cleaning, so that the two diverter plates cooperate with each other to perform secondary cleaning of the parts, further reducing the residue when the parts are cleaned. The support plate is connected to the air pressure sensor, which can increase the bearing capacity of the support plate itself and prevent the support plate from sliding down or breaking on the air duct, thereby ensuring the contact between the air pressure sensor and the air when working.

[0018] 4. The cleaning device for semiconductor equipment parts connects the filter assembly and the protective cylinder through a vacuum pump, and uses the speed of gas extraction to control the gas flow inside the cleaning box, so that the vacuum pump can reinforce the cleaning box and prevent the vacuum pump from sealing the position where the cleaning box is connected. The fixed ring inside the protective cylinder can guide the flow of condensed gas, so that the fixed ring and the filter sleeve can cooperate to reinforce the protective cylinder, thereby increasing the bearing capacity of the protective cylinder itself.

[0019] 5. The cleaning device for semiconductor equipment parts supports the sensor on the condenser through the internal frame, which is convenient for the gas to be discharged through the internal frame to prevent the circulation of the gas from being affected. The filter sleeve is on the protective tube, so that the filter sleeve can filter the gas discharged from the protective tube again, thereby improving the processing quality of the clean gas and preventing the pipeline from falling off the filter sleeve and affecting the gas transportation. The connection between the filter sleeve and the protective tube can limit the circulation position of the gas.

[0020] 6. The cleaning device for semiconductor equipment parts has adsorption rods distributed in a circular shape on the fixed ring, which makes it easy for the adsorption rods to perform adsorption work on different positions on the fixed ring, avoiding omissions in the adsorption of impurities by the adsorption rods on the fixed ring. The rotating plate is rotated by the transmission rod on the adsorption rod under the influence of the airflow, thereby ensuring full contact between the adsorption rod and the fixed ring, so that the contact area of ​​the rotating plate on the adsorption rod can be increased, and the adsorption rod and the rotating plate support each other, preventing the adsorption rod from detaching from the fixed ring and damaging the condenser.

[0021] 7. The cleaning device for semiconductor equipment parts rotates the movable plate on the telescopic rod under the thrust, so that the gas discharged from the condenser can push the movable plate upward to avoid the gas being stuck when flowing inside the protective tube. When the telescopic rod stops the gas flow in the condenser, the reinforcement plate connects the movable plate and the telescopic rod so that the reinforcement plate can protect the movable plate, thereby increasing the stability of the connection position of the movable plate and improving the convenience of the movable plate to rotate.

[0022] 8. The cleaning device for the parts of the semiconductor equipment connects the vacuum pump inside the cleaning box through the filter box, thereby ensuring the filtering effect inside the filter box, and the filter box can play a limiting role inside the cleaning box to prevent the conveyor belt from moving inside the filter box and affecting the circulation of the clean gas, and the filter plate can support the filter box to facilitate maintaining the movable space inside the filter box and avoid clogging of the filter plate during filtering, which causes the circulation of the clean gas to gradually decrease.

[0023] 9. The cleaning device for semiconductor equipment parts cooperates with the filter plate inside the filter box through the auxiliary filter plate, so that the auxiliary filter plate and the filter plate form a filtering space, thereby increasing the strength of the filter box itself, preventing the surface of the filter box from breaking or bending due to pressure, and thus ensuring the filtering effect inside the filter box. The connecting plate can fix the auxiliary fan to keep the auxiliary fan installed horizontally, and the connecting plate can be used to separate the auxiliary filter plate from the inside of the filter box.

[0024] 10. The cleaning device for semiconductor equipment parts connects the support rod and the screw rod respectively through the displacement block, thereby ensuring that the displacement block moves at both ends of the movable roller, and the cleaning plates are evenly distributed on the movable roller, which is convenient for the movable roller to drive the cleaning plates to rotate to clean the filter plates, thereby ensuring the cleanliness of the filter plates themselves, preventing impurities from accumulating on the surface of the filter plates to affect the circulation of gas, and making the movable roller and the cleaning plates cooperate to support the filter plates, thereby improving the stability of the installation position of the filter plates. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a structural schematic diagram of another perspective of the present invention as a whole; Figure 3 It is a schematic diagram of the structure of the cleaning component of the present invention; Figure 4 A schematic structural diagram of the cleaning component of the present invention from another perspective; Figure 5 It is a structural schematic diagram of the condensation component of the present invention; Figure 6 It is a structural schematic diagram of the internal frame of the present invention; Figure 7It is a structural schematic diagram of the auxiliary ring of the present invention; Figure 8 is an enlarged view of the adsorption rod of the present invention; Fig. 9 It is a schematic diagram of the structure of the filter assembly of the present invention; Fig.10 A schematic structural diagram of the filter assembly of the present invention from another perspective; Fig.11 It is a structural schematic diagram of the support rod of the present invention; Fig.12 It is a schematic structural diagram of the movable roller of the present invention.

[0026] In the figure: 1. bracket; 2. cleaning box; 3. air blowing pipe; 4. cleaning component; 41. air inlet pipe; 42. temporary storage box; 43. heater; 44. air guide pipe; 45. diverter plate; 46. support plate; 47. air pressure sensor; 5. condensation component; 51. vacuum tube; 52. condenser; 53. protective tube; 54. internal frame; 55. filter sleeve; 56. fixing ring; 57. sensor; 58. movable plate; 59. telescopic rod; 510. reinforcement plate; 511. adsorption rod; 512. rotating plate; 6. filter component; 61. filter box; 62. filter plate; 63. support rod; 64. auxiliary filter plate; 65. connecting plate; 66. auxiliary fan; 67. pressing frame; 68. displacement block; 69. screw; 610. movable roller; 611. cleaning plate; 7. sealing plate; 8. conveyor belt; 9. fixed plate. DETAILED DESCRIPTION

[0027] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described in order to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

[0028] Example 1, please refer to Figure 1-Figure 12The present invention provides a technical solution: a cleaning device for semiconductor equipment parts, comprising a bracket 1, a cleaning box 2 is fixedly connected to the bottom of the bracket 1, the cleaning box 2 is supported by the bracket 1, and a movable space is generated between the bracket 1 and the cleaning box 2 for carrying the equipment, which is convenient for maintaining the stability of the support of the cleaning box 2 by the bracket 1, and the height of the cleaning box 2 is maintained by the support of the bracket 1, so that the cleaning box 2 has an observation window, so that the cleaning of the parts inside the cleaning box 2 can be observed, and the cleaning can be repeated when the parts are not cleaned thoroughly, so as to ensure that the parts inside the cleaning box 2 are cleaned thoroughly and avoid the cleaning of the parts. In case of omission and re-placement, the outer surface of the cleaning box 2 is slidably connected with a sealing plate 7, and two sealing plates 7 are arranged on the cleaning box 2, so that the sealing plate 7 is pushed and slides in the cleaning box 2 to reveal the internal space, so that the parts to be cleaned are placed, ensuring that the parts can be conveniently taken in and out of the cleaning box 2. The sealing plate 7 can seal the cleaning box 2, so that the sealing plate 7 cooperates with the cleaning box 2 to maintain the sealing of the position where the parts are placed, avoiding the situation that gas leakage occurs when the cleaning box 2 cleans the parts, making full use of the cleaning gas inside the cleaning box 2, and preventing the cleaning work of the cleaning box 2 from being affected. It also includes: The air blowing pipe 3 is fixedly connected to the bottom of the cleaning box 2. The air blowing pipe 3 is used to clean the conveying gas inside the cleaning box 2. The wind generated by the blowing box is conveyed to the inside of the cleaning box 2 through the air blowing pipe 3, so that the air blowing pipe 3 can clean the conveyor belt 8 to prevent dust from adhering to the conveyor belt 8 and affecting the parts transported by the conveyor belt 8. It is convenient for the air blowing pipe 3 to remove dust before and after the equipment is started to prevent the inside of the cleaning box 2 from being dirty due to long-term cleaning. The air blowing pipe 3 corresponds to the filter assembly 6 inside the cleaning box 2, so that the air blowing pipe 3 and the filter assembly 6 cooperate with each other to remove impurities from the inside of the cleaning box 2. The bottom of the inner cavity of the cleaning box 2 is fixedly connected with a conveyor belt 8, and the parts can be placed inside the cleaning box 2 through the conveyor belt 8, so that the parts are driven by the conveyor belt 8 to move horizontally inside the cleaning box 2, which is convenient for the conveyor belt 8 to adjust the position of the parts, ensuring that the moving position of the parts inside the cleaning box 2 corresponds to the cleaning component 4, ensuring the cleaning effect of the parts inside the cleaning box 2, and the conveyor belt 8 can transport the parts to the exit position of the cleaning box 2, which is convenient for continuous cleaning of the parts and avoids affecting the cleaning of the parts inside the cleaning box 2; A cleaning assembly 4, which is fixedly connected to the top of the cleaning box 2 and is used to deliver gas to the inside of the cleaning box 2 to clean the parts; A condensation component 5, which is fixedly connected to the outer surface of the cleaning box 2. The condensation component 5 is used to condense and recover the cleaned gas. A fixing plate 9 is fixedly connected to the outer surface of the condensation component 5. The condensation component 5 is fixed on the cleaning box 2 by the fixing plate 9, so that the installation position of the condensation component 5 on the cleaning box 2 is not easy to loosen, thereby ensuring the stability of the installation position of the condensation component 5 on the cleaning box 2, and the fixing plate 9 is located on the side of the cleaning box 2 away from the observation window to prevent the connection position of the condensation component 5 and the filter component 6 from having a gap affecting the processing of the clean gas. The position of the condensation component 5 away from the fixing plate 9 is connected to the filter component 6, and the suction force delivered by the filter component 6 through the condensation component 5 extracts the air inside the cleaning box 2, so that the cleaning component 4 can collect the air after the parts are cleaned, and can process the clean gas inside the cleaning box 2, and the filter component 6 first filters the collected gas, so that the gas after filtering by the filter component 6 is processed, ensuring the interception of the gas by the filter component 6, so that the condensation component 5 can condense the clean gas, which is convenient for the clean gas to be discharged to the outside or transported to the inside of the cleaning component 4 through an external pipeline; The cleaning assembly 4 includes a heater 43, which is fixedly connected to the top of the cleaning box 2. The heater 43 is used to heat the inside of the cleaning box 2. The heater 43 is used to heat the cleaning box 2, so that the heat generated by the heater 43 is transmitted to the inside of the cleaning box 2, so that the heat assists the cleaning work of the parts of the cleaning box 2. The heat generated by the heater 43 can play a role in disinfection inside the cleaning box 2, avoiding the impact on the processing of the parts when the cleaning box 2 is used for a long time. The installation position of the heater 43 can be installed on the temporary storage box 42. The position is limited so that the heater 43 can protect the installation position of the cleaning box 2 to prevent the heating work of the heater 43 on the cleaning box 2 from being affected. The inner surface of the heater 43 is fixedly connected to the temporary storage box 42. The top of the temporary storage box 42 is connected to the air inlet pipe 41. Clean gas can be introduced through the air inlet pipe 41, and the air inlet pipe 41 is connected to the condensation component 5 by an external pipeline, so that the air inlet pipe 41 continuously transports the clean gas to prevent the clean gas from being affected when being transported to the inside of the temporary storage box 42, so as to maintain the sealing of the connection position between the air inlet pipe 41 and the temporary storage box 42; The air guide pipe 44 is connected to the bottom of the temporary storage box 42. The air guide pipe 44 is used to transport the clean gas. The clean gas is transported to the inside of the air guide pipe 44 through the air pump inside the temporary storage box 42. Two air guide pipes 44 are set on the temporary storage box 42, so that the air guide pipe 44 can divert the transported gas, which is convenient for the air guide pipe 44 to transport the clean gas to different positions for cleaning work, thereby ensuring the cleaning effect of the clean gas. The temporary storage box 42 can store the clean gas, so that the clean gas can be cleaned when the equipment is cleaning. The clean gas can be taken at any time to ensure the fast delivery of the clean gas. The bottom end of the air guide pipe 44 is connected to a diverter plate 45, and the delivered gas is diverted on the air guide pipe 44 by the diverter plate 45, so that the clean gas diverted by the diverter plate 45 can accurately clean the parts, preventing the parts from being affected during cleaning and causing incomplete cleaning. Two diverter plates 45 are provided, so that the diverter plates 45 can clean the parts from different positions, which is convenient for the two diverter plates 45 to cooperate with each other to perform secondary cleaning on the parts, further reducing The air pressure sensor 47 is supported by the support plate 46 on the air guide tube 44, so that the support plate 46 can limit the distance between the two air guide tubes 44 and keep the position of the connection between the air guide tube 44 and the temporary storage box 42 firmly, so that the support plate 46 can limit the installation position of the air pressure sensor 47, so that the air pressure sensor 47 can monitor the air pressure inside the cleaning box 2 in real time, and prevent the air pressure inside the cleaning box 2 from changing too much and affecting the cleaning of the parts. The support plate 46 is connected to the air pressure sensor 47, which can increase the bearing capacity of the support plate 46 itself, prevent the support plate 46 from sliding down or breaking on the air guide tube 44, and thus ensure the contact between the air pressure sensor 47 and the air when working. The top of the support plate 46 is fixedly connected with the air pressure sensor 47.

[0029] The bottom end of the air guide tube 44 penetrates the cleaning box 2 and extends to the inside of the cleaning box 2 , and the bottom of the heater 43 penetrates the cleaning box 2 and extends to the inside of the cleaning box 2 .

[0030] The top of the air pressure sensor 47 is fixedly connected to the cleaning box 2 , and the side of the cleaning box 2 close to the condensation assembly 5 is fixedly connected to the fixing plate 9 .

[0031] The filter assembly 6 is fixedly connected to the cleaning box 2 at one side close to the condensation assembly 5 , and the top end of the air blowing pipe 3 passes through the cleaning box 2 and extends to the inside of the cleaning box 2 .

[0032] Among them, the condensation component 5 includes a vacuum cylinder 51, which is fixedly connected to the cleaning box 2 near the filter component 6. The vacuum cylinder 51 is used to extract the gas inside the cleaning box 2. The filter component 6 and the protective cylinder 53 are connected through the vacuum cylinder 51, so that the vacuum pump inside the vacuum cylinder 51 extracts the gas inside the cleaning box 2, and the gas flow inside the cleaning box 2 is controlled by the speed of gas extraction, so that the vacuum cylinder 51 can reinforce the cleaning box 2 to prevent the vacuum cylinder 51 from sealing the position where the cleaning box 2 is connected, and the vacuum cylinder 51 can be inserted into the cleaning box 2 so that the vacuum cylinder 51 can transport the gas, ensuring that the suction force generated by the vacuum cylinder 51 continuously transports the clean gas The gas is transported to the inside of the protective cylinder 53. The end of the vacuum cylinder 51 away from the cleaning box 2 is connected to the protective cylinder 53. The top of the protective cylinder 53 is fixedly connected with a filter sleeve 55. The top of the inner cavity of the protective cylinder 53 is fixedly connected with a fixing ring 56. The fixing ring 56 can guide the flow of the condensed gas inside the protective cylinder 53, so that the fixing ring 56 and the filter sleeve 55 can cooperate to reinforce the protective cylinder 53, thereby increasing the bearing capacity of the protective cylinder 53 itself, preventing the top of the protective cylinder 53 from bending or breaking due to pressure, and thus ensuring the integrity of the protective cylinder 53, so that the fixing ring 56 can guide the gas flow of the protective cylinder 53, so that the fixing ring 56 can increase the internal area of ​​the protective cylinder 53; The condenser 52 is fixedly connected to the bottom of the inner cavity of the protective cylinder 53. The condenser 52 is used to condense the gas inside the protective cylinder 53. The clean gas is transported inside the protective cylinder 53 through the condenser 52, so that the condenser 52 condenses the transported gas, keeps the gas condensed by the condenser 52 clean, and facilitates the cleanliness of the subsequent gas when it is discharged from the protective cylinder 53, so that the gas can be recycled as needed after the clean gas is discharged. The condenser 52 is in communication with the exhaust cylinder 51, so that the condenser 52 directly condenses the clean gas, preventing the condenser 52 from being able to fully process the collected gas, ensuring the circulation of gas in the activity space inside the protective cylinder 53, and the condenser 5 2 is fixedly connected with an internal frame 54, and a sensor 57 is supported on the condenser 52 through the internal frame 54, so that the internal frame 54 can divert the gas discharged from the condenser 52, so that the gas is discharged through the internal frame 54 to prevent the circulation of the gas from being affected. The internal frame 54 can be used to protect the condenser 52 to prevent the condenser 52 from being damaged inside the protective tube 53 and affecting its use. The sensor 57 on the internal frame 54 can detect the flow rate of the gas discharged from the condenser 52, so as to timely discover the change of the gas speed discharged from the condenser 52 and ensure that the condenser 52 is not easily affected when discharging the gas. The internal frame 54 is fixedly connected with the sensor 57 at a position away from the protective tube 53.

[0033] The outer surface of the condenser 52 is connected to the vacuum cylinder 51 , and one end of the vacuum cylinder 51 away from the protective cylinder 53 penetrates the cleaning box 2 and extends to the inside of the cleaning box 2 .

[0034] Among them, the bottom of the fixed ring 56 is fixedly connected with an adsorption rod 511, and the adsorption rod 511 is distributed in a circular shape on the fixed ring 56, so that the adsorption rod 511 can adsorb impurities inside the protective tube 53, which is convenient for the adsorption rod 511 to adsorb different positions from the fixed ring 56, avoiding the adsorption of impurities on the fixed ring 56 by the adsorption rod 511. The adsorption rod 511 can increase the contact range, so that the adsorption rod 511 can reinforce the fixed ring 56, ensuring that the adsorption rod 511 is installed vertically to disturb the flow of the turbulent gas, so that the adsorption rod 511 can process the condensed gas inside the protective tube 53. The outer surface of the adsorption rod 511 is rotatably connected with a rotating plate 512, and the transmission rod on the adsorption rod 511 that is subjected to the airflow rotates through the rotating plate 512, so that the rotating plate 512 rotates to stir the work of the adsorption rod 511, so that the gas flows to the adsorption rod 511, thereby ensuring that the adsorption rod 511 is fully in contact with the fixing ring 56, and then the rotation of the rotating plate 512 is used to protect the adsorption rod 511, so that the rotating plate 512 can increase the contact area on the adsorption rod 511, so that the adsorption rod 511 and the rotating plate 512 support each other, and prevent the adsorption rod 511 from breaking away from the fixing ring 56 and damaging the condenser 52; The telescopic rod 59 is fixedly connected to the bottom of the fixed ring 56. When the gas flow in the condenser 52 stops, the telescopic rod 59 extends to push the movable plate 58 down, so that the telescopic rod 59 fixes the movable plate 58 on the fixed ring 56, and the telescopic rod 59 is kept to adjust the position of the movable plate 58, so that the movable plate 58 loses the thrust of the gas and stops rotating. The telescopic range of the telescopic rod 59 is limited to prevent the telescopic rod 59 from driving the movable plate 58 down and affecting the air flow of the protective tube 53. Two telescopic rods 59 are arranged on the fixed ring 56, so that the telescopic rods 59 cooperate with each other to perform telescopic movement. The bottom end of the telescopic rod 59 is rotatably connected with the movable plate 58, and the movable plate 58 is rotated by the thrust on the telescopic rod 59, so that the movable plate 58 rotates and pushes The telescopic rod 59 contracts to facilitate the gas discharged from the condenser 52 to push the movable plate 58 up, ensuring that the rotation of the movable plate 58 can accelerate the circulation of gas and avoid the gas from being stuck when circulating inside the protective tube 53. A reinforcing plate 510 is fixedly connected to the top of the movable plate 58. The movable plate 58 and the telescopic rod 59 are connected by the reinforcing plate 510, so that the reinforcing plate 510 can protect the movable plate 58, which is convenient for increasing the stability of the connection position of the movable plate 58. The reinforcing plate 510 rotates as the movable plate 58 is blown by the gas, so that the reinforcing plate 510 and the movable plate 58 cooperate to increase the contact area. When the reinforcing plate 510 rises to the maximum position along with the telescopic rod 59, the reinforcing plate 510 limits the movement of the movable plate 58, thereby improving the convenience of the movable plate 58 to rotate.

[0035] The inner surface of the reinforcing plate 510 is slidably connected to the telescopic rod 59 , and the top end of the adsorption rod 511 passes through the fixing ring 56 and extends to the inside of the fixing ring 56 .

[0036] Among them, the filter assembly 6 includes a filter box 61, which is fixedly connected to one end of the vacuum cylinder 51 away from the protective cylinder 53. The filter box 61 is used to filter the gas extracted by the vacuum cylinder 51. The vacuum cylinder 51 is connected inside the cleaning box 2 through the filter box 61, so that the filter box 61 filters the circulating gas, thereby ensuring the filtering effect inside the filter box 61, so that the filter box 61 is not easy to tilt when the gas circulates and affects the operation of the equipment. The side of the filter box 61 with the groove is close to the conveyor belt 8, so that the filter box 61 extracts the clean gas through the groove, and the filter box 61 can play a limiting role inside the cleaning box 2, so that the filter box 61 and the air blowing pipe 3 cooperate with each other to limit the position of the conveyor belt 8 to prevent the conveyor belt 8 from passing The internal displacement of the filter box 61 affects the circulation of the clean gas. A filter plate 62 is fixedly connected to the top of the inner cavity of the filter box 61. A plurality of filter plates 62 are arranged inside the filter box 61, so that the filter plate 62 filters the clean gas, which is convenient for the filter plate 62 to filter the clean gas for multiple times and then enter the inside of the suction cylinder 51 for transportation. The filter plate 62 can support the filter box 61, which is convenient for maintaining the activity space inside the filter box 61, so that the filter plate 62 cooperates with the filter box 61 to filter the clean gas, and avoids the blockage of the filter plate 62 during filtering, which causes the circulation of the clean gas to gradually decrease, so as to keep the distance between the two filter plates 62 consistent. The filter box 61 is fixedly connected to a support rod 63 near the filter plate 62; The auxiliary filter plate 64 is fixedly connected to the inner surface of the filter box 61. The auxiliary filter plate 64 is used to assist the gas filtration inside the filter box 61. The auxiliary filter plate 64 cooperates with the filter plate 62 inside the filter box 61 to facilitate the auxiliary filter plate 64 and the filter plate 62 to generate a filtering space, so that the auxiliary filter plate 64 assists the filtration of the filter plate 62, and ensures that the auxiliary filter plate 64 cooperates with the filter plate 62 to support the inside of the filter box 61, thereby increasing the strength of the filter box 61 itself, preventing the surface of the filter box 61 from being broken or bent due to pressure, and thus ensuring the filtering effect inside the filter box 61. The filter box 61 is close to the auxiliary filter plate 64. The filter-aiding plate 64 is rotatably connected to a connecting plate 65, and an auxiliary fan 66 is supported inside the filter box 61 through the connecting plate 65, so that the auxiliary fan 66 rotates with the flow of gas, so that the rotation of the auxiliary fan 66 can promote the flow of gas, thereby accelerating the flow of gas and facilitating the gas to be discharged from the filter box 61 for suction. The connecting plate 65 can fix the auxiliary fan 66 to keep the auxiliary fan 66 installed horizontally, ensuring that the auxiliary fan 66 has sufficient space to move when rotating inside the filter box 61, and the connecting plate 65 can be used to separate the auxiliary filter plate 64 from the inside of the filter box 61, and the inner surface of the connecting plate 65 is rotatably connected to the auxiliary fan 66.

[0037] The auxiliary filter plate 64 is fixedly connected to the filter plate 62 at one side away from the filter box 61 , and the bottom of the filter plate 62 is fixedly connected to the support rod 63 .

[0038] The top of the support rod 63 is fixedly connected with a pressing frame 67, and the support rod 63 supports the pressing frame 67 inside the filter box 61, so that the support rod 63 is installed vertically, so that the support rod 63 and the pressing frame 67 cooperate to limit the installation position of the screw 69 to prevent the installation position of the pressing frame 67 from being affected, and two support rods 63 are arranged on the pressing frame 67, and the support rod 63 is located away from the screw 69, so that the support rod 63 cooperates with the screw 69 and the pressing frame 67 to separate the filter plates 62, thereby improving To ensure the stability of the installation position of the support rod 63, the pressing frame 67 is rotatably connected to the position away from the support rod 63, and the screw 69 is driven by the motor to rotate clockwise, so that the screw 69 drives the displacement block 68 to descend, and the displacement block 68 drives the movable roller 610 to move in the vertical direction. The screw 69 rotates counterclockwise to drive the displacement block 68 to rise, so that the displacement block 68 is lifted and lowered in the vertical direction to adjust the position of the movable roller 610, ensuring that the screw 69 moves smoothly, and the bottom end of the screw 69 is rotatably connected to the filter box 61; The displacement block 68 is slidably connected to the outer surface of the support rod 63, and the support rod 63 and the screw 69 are respectively connected through the displacement block 68, so that the displacement block 68 can be lifted and lowered along the support rod 63 and the screw 69, thereby avoiding the problem of jamming or tilting during the movement of the displacement block 68, thereby ensuring that the displacement block 68 moves at both ends of the movable roller 610, so that the displacement block 68 is limited by the distance of the support rod 63 or the screw 69 when it is reciprocatingly lifted and lowered, which is convenient for adjusting the movement of the movable roller 610. The outer surface of the displacement block 68 is rotatably connected to the movable roller 610, and the outer surface of the movable roller 610 is fixedly connected to the cleaning plate 611 , the cleaning plates 611 are evenly distributed on the movable roller 610, so that the movable roller 610 is driven by the movable roller 610 to rotate when the displacement block 68 moves, so that the movable roller 610 drives the cleaning plates 611 to rotate to clean the filter plate 62, thereby ensuring the cleanliness of the filter plate 62 itself and preventing impurities from accumulating on the surface of the filter plate 62 to affect the circulation of gas. The cleaning plates 611 are reciprocated and lifted by the driving of the movable roller 610, so that the cleaning plates 611 can repeatedly clean the filter plate 62, so that the movable roller 610 and the cleaning plates 611 cooperate to support the filter plate 62, thereby improving the stability of the installation position of the filter plate 62.

[0039] Example 2, please refer to Figure 1-Figure 12On the basis of Example 1, the present invention provides a technical solution: a method for using a cleaning device for semiconductor equipment parts, step 1: the sealing plate 7 is pushed on the cleaning box 2 to slide horizontally, so that the cleaning box 2 creates a space for placing parts, and then the parts are placed on the conveyor belt 8, and then the sealing plate 7 is pushed in the opposite direction to return to the initial position on the cleaning box 2 for sealing, and the conveyor belt 8 works to transport the parts to the position to be cleaned, and the fixing plate 9 fixes the protective cylinder 53 on the cleaning box 2, so that the vacuum cylinder 51 on the protective cylinder 53 is connected to the cleaning box 2; Step 2: Use the vacuum pump inside the vacuum cylinder 51 to generate suction, so that the suction generated by the vacuum cylinder 51 extracts air from the inside of the cleaning box 2 through the filter box 61, and the gas extracted by the vacuum pump is transported to the inside of the condenser 52 through the vacuum cylinder 51, so that the condenser 52 works to condense the gas, and the gas condensed by the condenser 52 is discharged toward the inner frame 54 and the sensor 57. The sensor 57 detects the flow rate of the circulating gas on the inner frame 54, and the gas is transported to the inside of the filter sleeve 55 through the protective cylinder 53, so that the filter sleeve 55 filters the discharged gas and then discharges it. When the air pressure sensor 47 senses on the support plate 46 that the air pressure reaches the set value, the vacuum pump stops working; Step 3: Use the air inlet pipe 41 to inject clean gas into the temporary storage box 42, the heater 43 works to heat the inside of the cleaning box 2, the air pump inside the temporary storage box 42 works to transport the clean gas to the diverter plate 45 through the air guide pipe 44, so that the diverter plate 45 transports the clean gas to the parts for cleaning, the support plate 46 fixes the two air guide pipes 44, so that the two air guide pipes 44 cooperate with each other to clean the parts, and the air pump inside the temporary storage box 42 stops working when the air guide pipe 44 completes the cleaning of the parts with gas; Step 4: The air inside the cleaning box 2 is extracted by the air pump inside the air pump 51. As the air is sucked into the filter box 61, the filter plate 62 inside the filter box 61 filters the air. The auxiliary filter plate 64 cooperates with the filter plate 62 to assist in filtering the air flow. After filtering, the air flow gradually flows to the position where the filter box 61 is connected to the air pump 51, so that the auxiliary fan 66 rotates when the connecting plate 65 is pushed by the air flow, and the auxiliary fan 66 rotates to boost the air flow inside the filter box 61. Step 5: Use the pressing frame 67 to connect the support rod 63 and the screw rod 69, so that the screw rod 69 is driven by the micro motor to rotate clockwise, so that the screw rod 69 rotates clockwise to drive the displacement block 68 to descend, and the movable roller 610 on the displacement block 68 moves with the displacement block 68, so that the movable roller 610 drives the cleaning plate 611 to descend along the filter plate 62, and the movable roller 610 drives the cleaning plate 611 to rotate when it descends, so that the rotating cleaning plate 611 cleans the filter plate 62, and when the movable roller 610 is driven by the displacement block 68 near the position of the screw rod 69 to move, the movable roller 610 drives the displacement block 68 near the position of the support rod 63 to move together, so that the displacement block 68 near the position of the support rod 63 moves along the support rod 63, and when the screw 69 rotates counterclockwise, it drives the displacement block 68 to rise, so that the displacement block 68 drives the movable roller 610 to rotate and rise, so that the movable roller 610 drives the cleaning plate 611 to clean the filter plate 62 again; Step 6: The gas extracted by the vacuum cylinder 51 is condensed by the condenser 52 and then discharged into the protective cylinder 53, so that the sensor 57 on the internal frame 54 detects the flow rate of the airflow. As the gas circulates inside the protective cylinder 53, it contacts the movable plate 58, so that the movable plate 58 drives the reinforcement plate 510 to rotate on the telescopic rod 59 with the flow of gas. The telescopic rod 59 is pushed from bottom to top by the gas to shrink, and the adsorption rod 511 adsorbs the gas when it contacts the gas on the fixed ring 56. The rotating plate 512 is pushed by the gas to rotate along the adsorption rod 511, so that the gas flows through the circular opening corresponding to the fixed ring 56 and the filter sleeve 55. The filter sleeve 55 can be connected to the air inlet pipe 41 on the protective cylinder 53 to recycle the clean gas inside the cleaning box 2. After cleaning, the sealing plate 7 is pushed to take out the inside of the cleaning box 2, and then the air blowing pipe 3 works to generate an airflow to push the conveyor belt 8 position to blow, so that the airflow blown by the air blowing pipe 3 cleans the stopped conveyor belt 8.

[0040] Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field and related fields without creative work should fall within the scope of protection of the present invention. The structures, devices and operating methods not specifically described and explained in the present invention are implemented according to the conventional means in the field unless otherwise specified and limited.

Claims

1. A cleaning device for semiconductor equipment parts, comprising a bracket (1), a cleaning box (2) fixedly connected to the bottom of the bracket (1), a sealing plate (7) slidably connected to the outer surface of the cleaning box (2), characterized in that: Also includes: An air blowing pipe (3), the air blowing pipe (3) being fixedly connected to the bottom of the cleaning box (2), the air blowing pipe (3) being used to clean the conveying gas inside the cleaning box (2), and a conveyor belt (8) being fixedly connected to the bottom of the inner cavity of the cleaning box (2); A cleaning component (4), the cleaning component (4) being fixedly connected to the top of the cleaning box (2), the cleaning component (4) being used to convey gas into the cleaning box (2) to clean parts; A condensation component (5), the condensation component (5) being fixedly connected to the outer surface of the cleaning box (2), the condensation component (5) being used to condense and recover the cleaned gas, the outer surface of the condensation component (5) being fixedly connected to a fixing plate (9), and a position of the condensation component (5) away from the fixing plate (9) being connected to a filter component (6); The cleaning component (4) comprises a heater (43), the heater (43) being fixedly connected to the top of the cleaning box (2), the heater (43) being used to heat the interior of the cleaning box (2), the inner surface of the heater (43) being fixedly connected to a temporary storage box (42), the top of the temporary storage box (42) being connected to an air inlet pipe (41); An air guide pipe (44) is connected to the bottom of the temporary storage box (42), the air guide pipe (44) is used to transport the clean gas, the bottom end of the air guide pipe (44) is connected to a diverter plate (45), the outer surface of the air guide pipe (44) is fixedly connected to a support plate (46), and the top of the support plate (46) is fixedly connected to an air pressure sensor (47).

2. A semiconductor equipment parts cleaning device according to claim 1, characterized in that: The bottom end of the air guide pipe (44) penetrates the cleaning box (2) and extends to the interior of the cleaning box (2), and the bottom of the heater (43) penetrates the cleaning box (2) and extends to the interior of the cleaning box (2).

3. The semiconductor equipment parts cleaning device according to claim 1, characterized in that: The top of the air pressure sensor (47) is fixedly connected to the cleaning box (2), and the side of the cleaning box (2) close to the condensation assembly (5) is fixedly connected to the fixing plate (9).

4. The semiconductor equipment component cleaning device according to claim 1, characterized in that: The side of the filter assembly (6) close to the condensation assembly (5) is fixedly connected to the cleaning box (2), and the top end of the air blowing pipe (3) penetrates the cleaning box (2) and extends to the interior of the cleaning box (2).

5. The semiconductor equipment component cleaning device according to claim 1, characterized in that: The condensation assembly (5) comprises a vacuum cylinder (51), the vacuum cylinder (51) being fixedly connected to a position of the cleaning box (2) close to the filter assembly (6), the vacuum cylinder (51) being used to extract gas from the inside of the cleaning box (2), one end of the vacuum cylinder (51) away from the cleaning box (2) being connected to a protective cylinder (53), the top of the protective cylinder (53) being fixedly connected to a filter sleeve (55), and the top of the inner cavity of the protective cylinder (53) being fixedly connected to a fixing ring (56); A condenser (52) is fixedly connected to the bottom of the inner cavity of the protective tube (53), and the condenser (52) is used to condense the gas inside the protective tube (53). The top of the condenser (52) is fixedly connected to an internal frame (54), and the internal frame (54) is fixedly connected to a sensor (57) at a position away from the protective tube (53).

6. The semiconductor equipment component cleaning device according to claim 5, characterized in that: The outer surface of the condenser (52) is in communication with the vacuum cylinder (51); one end of the vacuum cylinder (51) away from the protective cylinder (53) penetrates the cleaning box (2) and extends into the interior of the cleaning box (2).

7. The cleaning device for semiconductor equipment parts according to claim 5, characterized in that: The bottom of the fixed ring (56) is fixedly connected to a suction rod (511), and the outer surface of the suction rod (511) is rotatably connected to a rotating plate (512); A telescopic rod (59) is fixedly connected to the bottom of the fixed ring (56); the bottom end of the telescopic rod (59) is rotatably connected to a movable plate (58); and the top of the movable plate (58) is fixedly connected to a reinforcement plate (510).

8. The semiconductor equipment parts cleaning device according to claim 7, characterized in that: The inner surface of the reinforcing plate (510) is slidably connected to the telescopic rod (59), and the top end of the adsorption rod (511) penetrates the fixing ring (56) and extends to the inside of the fixing ring (56).

9. The semiconductor equipment component cleaning device according to claim 5, characterized in that: The filter assembly (6) comprises a filter box (61), the filter box (61) being fixedly connected to one end of the air pump (51) away from the protective cylinder (53), the filter box (61) being used to filter the gas extracted by the air pump (51), a filter plate (62) being fixedly connected to the top of the inner cavity of the filter box (61), and a support rod (63) being fixedly connected to a position of the filter box (61) close to the filter plate (62); An auxiliary filter plate (64) is fixedly connected to the inner surface of the filter box (61), and the auxiliary filter plate (64) is used to assist in filtering the gas inside the filter box (61). A connecting plate (65) is rotatably connected to a position of the filter box (61) close to the auxiliary filter plate (64), and an auxiliary fan (66) is rotatably connected to the inner surface of the connecting plate (65).

10. The semiconductor equipment component cleaning device according to claim 9, characterized in that: The side of the auxiliary filter plate (64) away from the filter box (61) is fixedly connected to the filter plate (62), and the bottom of the filter plate (62) is fixedly connected to the support rod (63).

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