Rare earth polishing solution for chemical mechanical polishing of single crystal diamond and preparation method of rare earth polishing solution

Abstract

The invention discloses a rare earth polishing solution for chemical mechanical polishing of monocrystal diamond as well as a preparation method and application of the rare earth polishing solution. The rare earth polishing solution comprises a rare earth abrasive, a solvent, a dispersing agent and an oxidizing agent, in the rare earth polishing solution, the mass concentration of the rare earth abrasive is 0.1%-1%, the percentage concentration of the dispersing agent is 1%-2%, the molar concentration of the oxidizing agent is 0.5-1 mol / L, and the solvent is deionized water. The preparation process method is simple, and the product has excellent polishing performance.

Description

Technical Field

[0001] The invention discloses a rare earth polishing liquid for chemical mechanical polishing of single crystal diamond and a preparation method and application thereof, belonging to the technical field of polishing liquid. Background Art

[0002] Single crystal diamond is widely used in many fields such as semiconductors, optoelectronics, precision machinery and jewelry due to its excellent mechanical, thermal and optical properties. However, due to the extremely high hardness of single crystal diamond, high-quality surface processing has always been a difficult problem. Traditional mechanical processing methods are not only time-consuming and labor-intensive, but also difficult to achieve nanoscale surface finish. Therefore, the development of efficient chemical mechanical polishing (CMP) technology has become the key to solving this problem.

[0003] In recent years, with the development of materials science and nanotechnology, many new types of abrasive particles and chemical corrosive agents have been introduced into the research and development of CMP polishing liquids. For example, nano-alumina, silicon dioxide, metal oxides, and organic acids have been proven to have significant effects in improving polishing efficiency and surface quality, and rare earth polishing powders are currently widely used in the polishing of glass and silicon-based materials due to their excellent polishing performance. Summary of the invention

[0004] This patent aims to provide an improved single crystal diamond CMP polishing liquid, which has significant advantages in terms of high removal rate and low surface roughness.

[0005] The purpose of the present invention is to provide a rare earth polishing liquid for chemical mechanical polishing of single crystal diamond and a preparation method and application thereof, the preparation process is simple and the polishing precision is high.

[0006] The technical solution adopted by the present invention is:

[0007] A rare earth polishing liquid for chemical mechanical polishing of single crystal diamond comprises rare earth abrasive, solvent, dispersant and oxidant; wherein the contents of the components are as follows: the mass concentration of the rare earth abrasive is 0.1% to 1%, the percentage concentration of the dispersant is 1% to 2%, the molar concentration of the oxidant is 0.5 to 1 mol / L, and the solvent is deionized water.

[0008] According to the rare earth polishing liquid of the present invention, the rare earth abrasive is one or more of cerium oxide, lanthanum oxide, neodymium oxide, ytterbium oxide and erbium oxide, and the particle size of the abrasive is 50nm-2μm.

[0009] According to the rare earth polishing liquid of the present invention, the dispersant is one of polyethylene glycol, sodium hexametaphosphate and water glass.

[0010] According to the rare earth polishing liquid of the present invention, the oxidant is one or more of H2O2, KMNO4, KNO3, K2FeO4, K2Cr207, HClO, and FeSO4.

[0011] According to the rare earth polishing liquid of the present invention, the pH of the polishing liquid is 2-5, and the pH regulators are H2C2O4 and NaOH.

[0012] A process for preparing a rare earth polishing liquid for chemical mechanical polishing of single crystal diamond comprises the following steps:

[0013] (1) Take a certain amount of deionized water, add the dispersant of the percentage concentration, ultrasonically disperse for 10 minutes, and magnetically stir for 10 minutes;

[0014] (2) weighing the rare earth oxide abrasive of the mass concentration, adding it to the above solution, ultrasonically dispersing it for 20 minutes, and magnetically stirring it for 10 minutes;

[0015] (3) Measure the oxidant of the molar concentration, add it to the above solution, stir it magnetically for 10 minutes, and mix it thoroughly to obtain a rare earth oxide polishing liquid.

[0016] Beneficial effects: The preparation process of the present invention is simple, and the product of the invention has excellent polishing performance. By reasonably selecting and proportioning abrasive particles, chemical corrosive agents and other auxiliary components, the present invention can significantly improve the polishing quality and processing efficiency of single crystal diamond, and provide reliable technical support for applications in related fields. DETAILED DESCRIPTION

[0017] The technical solution of the present invention is further specifically described below through specific embodiments, but the present invention is not limited to these embodiments.

[0018] Example 1

[0019] This embodiment provides a method for preparing a rare earth polishing liquid for chemical mechanical polishing of single crystal diamond and its application, comprising the following steps:

[0020] Take 320ml of deionized water, add 4ml of polyethylene glycol 600 dispersant, mix well, add 0.8g of cerium oxide, the average particle size of cerium oxide is 50nm, mix well, add 40ml30% H2O2 and 40ml FeSO4 with a concentration of 0.5mol / L, control the pH at about 4, stir magnetically for 10min, and you can get the rare earth polishing liquid. Use a chemical mechanical polisher to fix the single crystal diamond to be polished on the polishing equipment, the polishing pad material is selected from porous polyurethane, the polishing speed is 200rpm, the load is 1.5kg, the dripping speed is 2ml / min, the polishing time is 3h, start the polishing equipment, and perform polishing.

[0021] Example 2

[0022] This embodiment provides a method for preparing a rare earth polishing liquid for chemical mechanical polishing of single crystal diamond and its application, comprising the following steps:

[0023] Take 320ml of deionized water, add 4ml of polyethylene glycol 600 dispersant, mix well, add 0.8g of lanthanum oxide, the average particle size of lanthanum oxide is 50nm, mix well, add 40ml30% H2O2 and 40ml of FeSO4 with a concentration of 0.5mol / L, control the pH at about 4, stir magnetically for 10min, and you can get the rare earth polishing liquid. Use a chemical mechanical polisher to fix the single crystal diamond to be polished on the polishing equipment, the polishing pad material is selected from porous polyurethane, the polishing speed is 200rpm, the load is 1.5kg, the dripping speed is 2ml / min, the polishing time is 3h, start the polishing equipment, and perform polishing.

[0024] Example 3

[0025] This embodiment provides a method for preparing a rare earth polishing liquid for chemical mechanical polishing of single crystal diamond and its application, comprising the following steps:

[0026] Take 320ml of deionized water, add 4ml of polyethylene glycol 600 dispersant, mix well, add 0.8g of erbium oxide, the average particle size of erbium oxide is 50nm, mix well, add 40ml30% H2O2 and 40ml of FeSO4 with a concentration of 0.5mol / L, control the pH at about 4, stir magnetically for 10min, and you can get the rare earth polishing liquid. Use a chemical mechanical polisher to fix the single crystal diamond to be polished on the polishing equipment, the polishing pad material is selected from porous polyurethane, the polishing speed is 200rpm, the load is 1.5kg, the dripping speed is 2ml / min, the polishing time is 3h, start the polishing equipment, and perform polishing.

[0027] The surface roughness results of the single crystal diamond after polishing are shown in Table 1 below.

[0028] Table 1

[0029]

Claims

1. A rare earth polishing liquid for chemical mechanical polishing of single crystal diamond, characterized in that: The rare earth polishing liquid comprises rare earth abrasive, solvent, dispersant and oxidant. In the rare earth polishing liquid, the mass concentration of the rare earth abrasive is 0.1% to 1%, the percentage concentration of the dispersant is 1% to 2%, the molar concentration of the oxidant is 0.5 to 1 mol / L, and the solvent is deionized water.

2. The rare earth polishing liquid according to claim 1, characterized in that: The rare earth abrasive is one or more of cerium oxide, lanthanum oxide, neodymium oxide, ytterbium oxide and erbium oxide, and the particle size of the abrasive is between 50nm and 2μm.

3. The rare earth polishing liquid according to claim 1, characterized in that: The dispersant is one of polyethylene glycol, sodium hexametaphosphate and water glass.

4. The rare earth polishing liquid according to claim 1, characterized in that: The oxidant is one or more of H2O2, KMNO4, KNO3, K2FeO4, K2Cr207, HClO, and FeSO4.

5. The rare earth polishing liquid according to claim 1, characterized in that: The pH value of the polishing liquid is 2-5, and the pH regulators are oxalic acid and NaOH.

6. The rare earth polishing liquid according to claims 1-5, characterized in that: The following steps are involved: (1) Take a certain amount of deionized water, add the dispersant of the percentage concentration, ultrasonically disperse for 10 minutes, and magnetically stir for 10 minutes; (2) weighing the rare earth oxide abrasive of the mass concentration, adding it to the above solution, ultrasonically dispersing it for 20 minutes, and magnetically stirring it for 10 minutes; (3) Measure the oxidant of the molar concentration, add it to the above solution, stir it magnetically for 10 minutes, and mix it thoroughly to obtain a rare earth polishing liquid.

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