Method and apparatus for valve assembly

Abstract

Various embodiments of the present technology may provide a valve assembly that activates a chemical using UV light. The valve assembly includes a primary valve manifold connected to a secondary valve manifold. A transparent connector may be disposed between the primary valve manifold and the secondary valve manifold. The UV light may be disposed adjacent to the transparent connector.

Description

Technical Field

[0001] The present disclosure generally relates to methods and apparatus for valve assemblies. More particularly, the present disclosure relates to valve assemblies for use in semiconductor manufacturing tools. Background Art

[0002] The valve assembly can be used to pulse chemicals and / or inert gases into the reaction chamber. The valve assembly can also be configured to mix multiple chemicals before the chemicals flow into the reaction chamber. Some thermal ALD (atomic layer deposition) reactions may be limited or difficult to achieve by thermal means alone. Therefore, it may be necessary to activate the molecules in the chemicals before the chemicals flow into the reaction chamber to enhance the reactivity of the chemicals. It may also be necessary to generate OH radicals to enhance active surface sites on the wafer. Summary of the invention

[0003] Various embodiments of the present technology may provide a valve assembly that uses UV light to activate chemicals. The valve assembly includes a main valve manifold connected to a secondary valve manifold. A transparent connector may be disposed between the main valve manifold and the secondary valve manifold. The UV light may be disposed adjacent to the transparent connector.

[0004] According to one aspect, an apparatus includes: a main valve manifold, including: a main channel; a first sub-channel, including a first end and a second end connected to the main channel at a connection point; and a second sub-channel, including a third end and a fourth end connected to the main channel and the first sub-channel at a connection point; a first connector, connected to the valve manifold and including a first gas channel, wherein the first connector is formed of a transparent material; a first ultraviolet (UV) light source adjacent to the first connector; and a first sub-manifold, connected to the first connector and including a first plurality of inlets connected to the second gas channel.

[0005] In one embodiment of the above device, the first gas channel is connected to the second end of the first sub-channel.

[0006] In one embodiment of the above device, the first gas channel is connected to the second gas channel.

[0007] In one embodiment, the above apparatus further comprises a second connector connected to the main valve manifold and comprising a third gas passage, wherein the second connector is formed of a transparent material.

[0008] In one embodiment, the above apparatus further comprises a second sub-manifold connected to the second connector and comprising a connected fourth gas channel and a second plurality of inlets connected to the fourth gas channel.

[0009] In one embodiment of the above apparatus, an inlet from the first plurality of inlets is configured to couple to a first source container containing a first chemical, and an inlet from the second plurality of inlets is configured to couple to a second source container containing a second chemical, wherein the first chemical is different from the second chemical.

[0010] In one embodiment, the above apparatus further comprises a second UV light source adjacent to the second connector.

[0011] In one embodiment of the above apparatus, the second UV light source is positioned to radiate UV light into the third gas channel.

[0012] In one embodiment of the above apparatus, the first UV light source is positioned to radiate UV light into the first gas channel.

[0013] In one embodiment of the above device, the transparent material is one of quartz or sapphire.

[0014] A device comprises: a main valve manifold, comprising: a main channel; a first sub-channel, including a first end and a second end connected to the main channel at a connection point; and a second sub-channel, including a third end and a fourth end connected to the main channel and the first sub-channel at a connection point; a shield formed of a transparent material and disposed adjacent to the connection point; a light source adjacent to the transparent shield and positioned to radiate light into the connection point; a first connector connected to the valve manifold and including a first plurality of inlets connected to the first sub-channel via a first gas channel; and a first sub-manifold connected to the main valve manifold and including a second plurality of inlets connected to the second sub-channel via a second gas channel.

[0015] In one embodiment, the above device further comprises a third gas channel connected to the main channel at a connection point and adjacent to the transparent shield.

[0016] In one embodiment of the above device, the transparent material is one of quartz or sapphire.

[0017] In one embodiment of the above apparatus, the light source comprises an infrared light source.

[0018] In one embodiment of the above apparatus, the light source comprises an ultraviolet light source.

[0019] A device comprises: a valve manifold including a first gas channel, the first gas channel comprising: a main channel; a first sub-channel, comprising a first end and a second end connected to the main channel at a connection point; and a second sub-channel, comprising: a third end, connected to the main channel and the first sub-channel at a connection point; and a fourth end; a first multi-port valve, coupled to the second end of the first sub-channel; a first unit, having an internal volume and a side wall formed of a transparent material, and the first unit comprises: a first inlet; and a first outlet coupled to the first multi-port valve; and a first ultraviolet light source adjacent to the first unit.

[0020] In one embodiment of the above device, the transparent material is one of quartz or sapphire.

[0021] In one embodiment, the above device also includes: a second multi-port valve coupled to the fourth end of the second subchannel; a second unit formed of a transparent material and including: a second inlet; and a second outlet coupled to the second multi-port valve; and a second ultraviolet light source adjacent to the second unit.

[0022] In one embodiment of the above apparatus, one port of the first multi-port valve is coupled to the inert gas source; and one port of the second multi-port valve is coupled to the inert gas source.

[0023] In one embodiment, the apparatus further comprises: a first container coupled to the first unit, wherein the first container is configured to contain a first chemical substance; and a second container coupled to the second unit, wherein the second unit is configured to contain a second chemical substance different from the first chemical substance. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] A more complete understanding of the present technology may be obtained by referring to the detailed description when considered in conjunction with the following illustrative drawings.In the following drawings, like reference numerals refer to like elements and steps throughout the drawings.

[0025] Figure 1 is a block diagram of various embodiments according to the present technology;

[0026] Figure 2 representatively illustrates a cross-sectional view of a valve assembly according to various embodiments of the present technology;

[0027] Figure 3 representatively illustrating a cross-sectional view of a valve assembly according to an alternative embodiment of the present technology; and

[0028] Figure 4 A cross-sectional view of a showerhead assembly according to an embodiment of the present technology is representatively shown. DETAILED DESCRIPTION

[0029] The present technology can be described in terms of functional block components and various processing steps. Such functional blocks can be implemented by any number of components configured to perform a specified function and achieve various results. For example, the present technology can use various reaction chambers, bases, valves, containers, precursors, showerhead trays, and transfer lines.

[0030] refer to Figure 1, the exemplary system 100 may include a reactor 105 and a valve assembly 115. The reactor 105 may be configured to process a substrate (e.g., a wafer 125). For example, the reactor 105 may be configured to deposit a film on a wafer, perform etching, etc. The reactor 105 may include a showerhead assembly 130 and a reaction chamber 110. The showerhead assembly 130 may be disposed above the reaction chamber 130 and above the wafer 125.

[0031] The system 100 may further include a first container 135 configured to contain or hold a first chemical substance (e.g., a precursor or reactant) used in a semiconductor manufacturing process. The first chemical substance in the first container 135 may initially be a solid, liquid, or gas phase. In the case of a solid or liquid chemical substance, the solid or liquid may be converted to a gas phase. For example, the first container 135 may include various devices and / or systems for converting a solid or liquid to a gas. The conversion to a gas phase may occur within the first container 135.

[0032] The system 100 may further include a second container 155 configured to contain or hold a second chemical substance (e.g., a precursor or reactant) used in the semiconductor manufacturing process. The second chemical substance may be different from the first chemical substance. The second chemical substance in the second container 155 may initially be a solid, liquid, or gas phase. In the case of a solid or liquid chemical substance, the solid or liquid may be converted to a gas phase. For example, the second container 155 may include various devices and / or systems for converting a solid or liquid into a gas. The conversion to the gas phase may occur within the second container 155.

[0033] The system 100 may further include a third container 140 configured to contain or hold an inert gas.

[0034] In addition, the system 100 may further include a first gas line 145 to deliver gas from the first container 135 to the reactor 105 through the valve assembly 115. For example, the gas line 145 may be coupled to the first container 135 at a first end and coupled to the valve assembly 115 at a second end.

[0035] In addition, the system 100 may further include a second gas line 150 to deliver gas from the second container 155 to the reactor 105 through the valve assembly 115. For example, the gas line 150 may be coupled to the second container 155 at a first end and coupled to the valve assembly 115 at a second end.

[0036] In addition, the system 100 may further include a third gas line 160 to deliver gas from the third container 140 to the reactor 105 through the valve assembly 115. For example, the third gas line 160 may be coupled to the third container 140 at a first end and coupled to the valve assembly 115 at a second end.

[0037] In various embodiments, system 100 may further include a susceptor 120 disposed within reaction chamber 110 and configured to support wafer 125. In some embodiments, susceptor 120 may be configured to move up and down within reaction chamber 110. In other embodiments, susceptor 120 may be fixed.

[0038] In various embodiments, the valve assembly 115 can be configured to mix multiple gas sources before flowing into the reactor 105. For example, the valve assembly 115 can have multiple inlets. The valve assembly 115 can be directly coupled to the reactor 105 and can be coupled to the first and second gas lines 145, 150 and configured to receive gas from the first and second containers 135, 140.

[0039] In various embodiments, reference Figure 2 , the valve assembly 115 may include a main valve manifold 280, which includes a plurality of gas channels. For example, the valve assembly 115 may include a main channel 245, a first sub-channel 250, and a second sub-channel 255. In various embodiments, the main channel 245 and the first sub-channel 250 may be connected to each other at a connection point 285. In addition, the second sub-channel 255 may be connected to the main channel 245 at the connection point 285. Therefore, the main channel 245, the first sub-channel 250, and the second sub-channel may be fluidically connected to each other through the connection point 285. The main channel 245 may be fluidically connected to the showerhead assembly 130. The main valve manifold 280 may be formed of a metal material, such as aluminum, stainless steel, a nickel-based alloy, such as Hastelloy-C22, Inconel, etc.

[0040] In an exemplary embodiment, the valve assembly 115 may further include a first connector 205 including a first gas channel 265 extending through the first connector 205. The first connector 205 may be formed of a transparent material, such as quartz, sapphire, etc. Therefore, the entire first connector 205 may be completely transparent, allowing the third gas channel 270 to be seen through the outer wall of the first connector 205. The first connector 205 may be connected to the main valve manifold 280, and the first gas channel 265 may be fluidly connected to the first sub-channel 250.

[0041] The valve assembly may further include a first sub-manifold 215 including a second gas channel 260 and a first plurality of inlets connected to the second gas channel 260. The first sub-manifold 215 may be formed of a metal material, such as aluminum, stainless steel, a nickel-based alloy, such as Hastelloy-C22, Inconel, etc. In various embodiments, a first inlet from the first plurality of inlets may be configured to receive a first chemical substance (chemical substance 1), and a second inlet from the first plurality of inlets may be configured to receive an inert gas. The first sub-manifold 215 may be connected to the first connector 205, and the second gas channel 260 may be fluidically connected to the first gas channel 265.

[0042] The valve assembly 115 may also include a second connector 210 including a third gas channel 270 extending through the second connector 210. The second connector 210 may be formed of a transparent material, such as quartz, sapphire, etc. Therefore, the entire second connector 210 may be completely transparent, allowing the third gas channel 270 to be seen through the outer wall of the second connector 210. The second connector 210 may be connected to the main valve manifold 280, and the third gas channel 270 may be fluidly connected to the second sub-channel 255.

[0043] The valve assembly 115 may further include a second sub-manifold 220, which includes a fourth gas channel 275 and a second plurality of inlets connected to the fourth gas channel 275. The second sub-manifold 220 can be formed of a metal material, such as aluminum, stainless steel, nickel-based alloys, such as Hastelloy-C22, Inconel, etc. In various embodiments, the first inlet from the second plurality of inlets can be configured to receive a second chemical substance (chemical substance 2), wherein the second chemical substance is different from the first chemical substance. The second inlet from the second plurality of inlets can be configured to receive an inert gas. The second sub-manifold 220 can be connected to the second connector 210, and the fourth gas channel 275 can be fluidically connected to the third gas channel 270.

[0044] refer to Figure 3In an exemplary embodiment, the valve assembly 115 may include a first unit 300 and a second unit 305, each having an internal volume defined by the sidewalls of a corresponding container and configured to contain a gas. The first unit 300 may be connected to the main valve manifold 280 via a first valve 310. For example, the first unit 300 may include an outlet connected to the first valve 310, and the first valve 310 may be connected to the first subchannel 250. The first valve 310 may include a diaphragm valve or any other suitable valve. The first unit 300 may include a plurality of inlets, one of which is configured to receive a first chemical substance and another inlet is configured to receive an inert gas. The first unit 300, in particular the sidewalls, may be formed of a transparent material, such as quartz, sapphire, etc. Therefore, the first unit 300 may be transparent, allowing the internal volume to be seen through the sidewalls.

[0045] Similarly, the second unit 305 can be connected to the main valve manifold 280 via a second valve 315. For example, the second unit 305 can include an outlet connected to the second valve 315, and the second valve 315 can be connected to the second subchannel 255. The second valve 315 can include a diaphragm valve or any other suitable valve. The second unit 305 can include a plurality of inlets, one of which is configured to receive a second chemical substance and another inlet is configured to receive an inert gas. The second unit 305, in particular the sidewall, can be formed of a transparent material, such as quartz, sapphire, etc. Therefore, the second unit 305 can be transparent, thereby allowing the internal volume to be seen through the sidewall.

[0046] In various embodiments, the first and second valves 310, 315 can be responsive to and operated by a controller (not shown), a processor, or other suitable control system. Thus, the controller can be configured to generate and transmit control signals to the valves 310, 315 to open or close the valves.

[0047] In various embodiments, reference Figure 2 and Figure 3 , the main valve manifold 280 may further include a shield 235 disposed directly adjacent to the connection point 285. For example, the shield 235 may form a boundary of the connection point 285. In an exemplary embodiment, the shield 235 may be disposed at or within a top surface of the main valve manifold 280. For example, the shield 235 may be embedded within the main valve manifold 280. The shield 235 may be formed of a transparent material, such as quartz, sapphire, etc.

[0048] In various embodiments, reference Figure 2 and Figure 3, the main valve manifold 280 may further include a fifth gas channel 200 and a sixth gas channel 202, which are configured to receive an inert gas, such as argon, nitrogen, or other inert rare gas, and flow the inert gas into the main valve manifold 280. The fifth and sixth gas channels 200, 202 may be fluidly connected to the connection point 285, thereby being fluidly connected to the main channel 245. The fifth and sixth gas channels 200, 202 may be disposed directly adjacent to the shield 235 so that the inert gas flows through the bottom surface of the shield 235. The amount and pressure of the gas flowing through the fifth and sixth channels 200, 202 may be selected to create a gas curtain on the bottom surface of the shield 235, thereby preventing the chemical from being deposited on the bottom surface of the shield 235. In an exemplary embodiment, at least a portion of the fifth gas channel 200 is arranged horizontally and parallel to the bottom surface of the shield 235. For example, the inlet of the fifth gas channel 200 may be disposed on the top surface of the main valve manifold 280 so that the fifth gas channel 200 is L-shaped, and the inlet of the sixth gas channel may be disposed on the top surface of the main valve manifold 280 so that the sixth gas channel is L-shaped. In another embodiment, the fifth and sixth gas channels may extend radially outward from the connection point 285. Thus, the inlet of the fifth gas channel 200 may be disposed along a first sidewall of the main valve manifold 280, and the inlet of the sixth gas channel 202 may be disposed along an opposite second sidewall of the main valve manifold 280. It should be understood that the main valve manifold 280 may include additional gas channels that are on the same plane as the fifth and sixth gas channels and extend radially outward to the sidewalls.

[0049] In various embodiments, the valve assembly 115 may further include a light source configured to radiate ultraviolet (UV) light or infrared (IR) light. Thus, the light source may include a UV light source or an IR light source. For example, the valve assembly 115 may include a first light source 225 and a second light source 230. In one embodiment, referring to Figure 2 , the first light source 225 can be disposed adjacent to the first connector 205 and positioned to radiate light into the first gas channel 265. Similarly, the second light source 230 can be disposed adjacent to the second connector 210 and positioned to radiate light into the third gas channel 270.

[0050] In an alternative embodiment, reference Figure 3 , the first light source 225 may be disposed adjacent to the first unit 300 and positioned to radiate light into the first unit 300 .

[0051] Similarly, the second light source 230 may be disposed adjacent to the second unit 305 and positioned to radiate light into the second unit 305 .

[0052] In various embodiments, the valve assembly 115 may also include a third light source 240 disposed adjacent to the shroud 235 and positioned to radiate light into the connection point 285 .

[0053] In various embodiments, each light source 225, 230, 240 can be coupled to and controlled according to a controller (not shown), a processor, or any other suitable control system. The controller can operate (e.g., turn on and off) the light source. For example, in some operations, one light source may be on while the other light sources are off. In addition, the controller can be configured to pulse the light source from off to on and then back to off according to a desired pulse scheme.

[0054] In various embodiments, reference Figure 4 The showerhead assembly 130 may include a cover 400 and a showerhead disk 405. The showerhead assembly 130 may further include a plenum 410 defined by the cover 400 and the showerhead disk 405. The cover 400 may include a main inlet configured to allow gas from the valve assembly 115 to enter the plenum 410.

[0055] The showerhead disk 405 may be located directly above the susceptor 120 or the wafer 125 ( Figure 1 ), and may be configured to allow gas to pass through it and enter the reaction chamber 110. For example, the showerhead disk 405 may include a plurality of through holes extending from a first surface (e.g., a top surface) of the showerhead disk 405 to an opposite second surface (e.g., a bottom surface) of the showerhead disk 405. Each through hole may be configured to allow gas to flow out of the showerhead disk 405, i.e., from the top surface to the bottom surface.

[0056] In an exemplary embodiment, the cover 400 may be configured to provide UV and / or IR light to the plenum space 410. For example, the cover 400 may include a plurality of windows 420 embedded within the cover 400. The windows 420 may be formed of a transparent material, such as quartz, sapphire, or the like.

[0057] The showerhead assembly 130 can further include a plurality of light sources 415. The light sources 415 can be disposed along an outer surface of the cover 400 opposite the plenum space 410. In some embodiments, the light sources 415 can be adhered to the outer surface of the cover 400. Alternatively, the light sources 415 can be proximate to the outer surface of the cover 400. In some embodiments, each light source 415 can be aligned with a corresponding window 420 such that light from the light source 415 radiates through the window 420 and into the plenum space 410.

[0058] In some embodiments, the cover 400 may further include a plurality of channels 425 extending through the cover 400 and in fluid communication with the plenum space 410. The channels 425 may be connected to a gas source (e.g., the third container 140), wherein the gas source delivers an inert gas (e.g., argon) into the plenum space 410 through the channels 425. In an exemplary embodiment, the gas channels 425 may be disposed adjacent to the corresponding windows 420.

[0059] In operation, refer to Figure 1 and 2 , the first chemical substance from the first container 135 can flow into the valve assembly 115 through the first sub-manifold 215 and the first connector 205. When the first chemical substance flows through the first gas channel 265 of the first connector 205, the first light source 225 can be turned on to radiate light into the first gas channel 265, thereby radiating into the flowing first chemical substance. The light from the first light source 225 can activate the first chemical substance. In particular, the light can trigger a chemical reaction, such as photodissociation, photolysis, photodissociation, in which the molecules of the compound interact with the photons to produce highly reactive free radicals / molecules and / or simpler more reactive molecules / fragments. Activating the molecules in the chemical substance before the chemical substance flows into the reaction chamber 110 can enhance the reactivity of the chemical substance and / or enhance the active surface sites on the wafer 125, thereby providing improved film properties on the wafer 125.

[0060] Similarly, at the same time or at a different time as the first chemical flows, the second chemical from the second container 155 can flow into the valve assembly 115 via the second connector 210 and the second sub-manifold 220. When the second chemical flows through the third gas channel 270 of the second connector 210, the second light source 230 can be turned on to radiate light into the third gas channel 270, thereby radiating the flowing second chemical. The light from the second light source 230 can activate the second chemical in the same manner as described above. The activated chemical can then flow through the main channel 245 and enter the showerhead assembly 130. Activating the molecules in the chemical before the chemical flows into the reaction chamber 110 can enhance the reactivity of the chemical and / or enhance the active surface sites on the wafer 125, thereby providing improved film properties on the wafer 125.

[0061] Alternatively, the first and second chemicals can flow simultaneously, thereby mixing together at the connection point 285. When the two chemicals flow together, the third light source 240 can be turned on to radiate light through the shield 235 and into the gas channel and the connection point 285, thereby radiating the flowing chemicals. In the present case, when the first and second chemicals flow, the first and second lights 225, 230 can be turned off. The activated chemicals can then flow through the main channel 245 and enter the showerhead assembly 130.

[0062] Alternatively, the first and second chemicals can be activated by multiple light sources. For example, when the first and second chemicals flow, the first and second lights 225, 230 can be turned on to activate the corresponding chemicals when the chemicals flow through the first and second connectors 205, 210, respectively. In addition, the third light 240 can also be turned on to activate the combination of chemicals. The activated chemicals can then flow through the main channel 245 and enter the showerhead assembly 130.

[0063] In another operation, refer to Figure 3 , the first chemical substance can flow into and be contained in the first unit 300. The inert gas can also flow into the first unit 300 at the same time or at a different time as the first chemical substance. Once the first unit 300 is filled with the first chemical substance (gas) to the desired pressure or amount, the first light source 225 can be turned on. Alternatively, the first light source 225 can be turned on when the first unit 300 is being filled with the chemical substance. The light from the first light source 225 can activate the first chemical substance. In particular, the light can trigger a chemical reaction, such as photodissociation, photolysis, photodissociation, in which the molecules of the compound interact with the photons to produce highly reactive free radicals / molecules and / or simpler more reactive molecules / fragments. Activating the molecules in the chemical substance before the chemical substance flows into the reaction chamber 110 can enhance the reactivity of the chemical substance and / or enhance the active surface sites on the wafer 125, thereby providing improved film properties on the wafer 125. Once the chemical substance is activated, the first valve 310 can be opened to allow the chemical substance to flow into the main valve manifold 280 through the first subchannel 250. For example, a controller (not shown) can transmit a signal or otherwise operate the first valve 310 to open it. Once the chemical reaches the connection point 285, the chemical can be further activated and / or combined with a second chemical.For example, the third light source 240 can be turned on.

[0064] Similarly, a second chemical substance can flow into and be contained in the second cell 305. An inert gas can also flow into the second cell 305 at the same or different time as the first chemical substance. Once the second cell 305 is filled with the second chemical substance (gas) to a desired pressure or amount, the second light source 230 can be turned on. Alternatively, the second light source 230 can be turned on when the second cell 305 is being filled with the chemical substance. The light from the second light source 230 can activate the second chemical substance. In particular, the light can trigger a chemical reaction, such as photodissociation, photolysis, photodissociation, in which the molecules of the compound interact with the photons to produce highly reactive free radicals / molecules and / or simpler more reactive molecules / fragments. Activating the molecules in the chemical substance before the chemical substance flows into the reaction chamber 110 can enhance the reactivity of the chemical substance and / or enhance the active surface sites on the wafer 125, thereby providing improved film properties on the wafer 125. Once the chemical substance is activated, the second valve 315 can be opened to allow the chemical substance to flow into the main valve manifold 280 through the first subchannel 250. For example, a controller (not shown) may transmit a signal or otherwise operate the second valve 315 to open it. Once the chemical reaches the connection point 285, the chemical may be further activated and / or combined with the first chemical. For example, the third light source 240 may be turned on.

[0065] In another operation, refer to Figure 4, when the chemical flows from the valve assembly 115 into the pressurized space 410, the light source 415 can be turned on. The light from the light source 415 can pass through the corresponding window 420 and enter the pressurized space 410, and activate the chemical in the pressurized space. Activating the molecules in the chemical can enhance the reactivity of the chemical and / or enhance the active surface sites on the wafer 125, thereby providing improved film properties on the wafer 125. At the same time, the gas can flow through the channel 425. The amount and pressure of the gas flowing through the channel 425 can be selected to create a gas curtain on the window 420, thereby preventing the chemical from being deposited on the window 420.

[0066] In the foregoing description, the technology has been described with reference to specific exemplary embodiments. The specific embodiments shown and described are illustrations of the technology and its best mode and are not intended to limit the scope of the technology in any way. In fact, for the sake of brevity, the conventional manufacturing, connection, preparation and other functional aspects of the method and system may not be described in detail. In addition, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and / or steps between the various elements. In actual systems, there may be many alternative or additional functional relationships or physical connections.

[0067] The technology has been described with reference to specific exemplary embodiments. However, various modifications and changes may be made without departing from the scope of the technology. The description and drawings are to be regarded as illustrative rather than restrictive, and all such modifications are intended to be included within the scope of the technology. Therefore, the scope of the technology should be determined by the general embodiments described and their legal equivalents, rather than solely by the specific examples described above. For example, the steps described in any method or process embodiment may be performed in any order unless otherwise expressly specified, and are not limited to the explicit order presented in the specific examples. In addition, the components and / or elements described in any device embodiment may be assembled or otherwise operably configured in various arrangements to produce substantially the same results as the technology, and are therefore not limited to the specific configurations described in the specific examples.

[0068] Benefits, other advantages, and solutions to problems have been described above with respect to specific embodiments. However, any benefit, advantage, solution to a problem, or any element that may cause any particular benefit, advantage, or solution to occur or become more significant should not be construed as a critical, required, or essential feature or component.

[0069] The terms "comprises," "comprising," or any variations thereof, are intended to refer to non-exclusive inclusion, such that a process, method, article, composition, or apparatus that includes a list of elements includes not only those elements listed, but may also include other elements not expressly listed or inherent to such process, method, article, composition, or apparatus. Other combinations and / or modifications of the above-described structures, arrangements, applications, proportions, elements, materials, or components used in the practice of the present technology, except those not specifically recited, may be changed or otherwise specially adapted to a particular environment, manufacturing specifications, design parameters, or other operating requirements without departing from the general principles thereof.

[0070] The present technology has been described above with reference to exemplary embodiments. However, changes and modifications may be made to the exemplary embodiments without departing from the scope of the present technology. These and other changes or modifications are intended to be included within the scope of the present technology, as expressed in the following claims.

Claims

1. A device comprising: Main valve manifold, including: Main channel; a first subchannel comprising a first end connected to the main channel at a connection point and a second end; and a second subchannel including a third end and a fourth end connected to the main channel and the first subchannel at a connection point; a first connector connected to the valve manifold and including a first gas passage, wherein the first connector is formed of a transparent material; a first ultraviolet (UV) light source adjacent to the first connector; and A first secondary manifold is connected to the first connector and includes a first plurality of inlets connected to the second gas channel.

2. The device according to claim 1, wherein: The first gas channel is connected to the second end of the first sub-channel.

3. The device according to claim 2, wherein: The first gas channel is connected to the second gas channel. 4 . The apparatus of claim 1 , further comprising a second connector connected to the master valve manifold and comprising a third gas passage, wherein the second connector is formed of a transparent material.

5. The apparatus of claim 4, further comprising a second sub-manifold connected to the second connector and comprising a connected fourth gas channel and a second plurality of inlets connected to the fourth gas channel.

6. The device according to claim 5, wherein: An inlet from the first plurality of inlets is configured to couple to a first source container containing a first chemical, and an inlet from the second plurality of inlets is configured to couple to a second source container containing a second chemical, wherein the first chemical is different from the second chemical.

7. The apparatus of claim 4, further comprising a second UV light source adjacent to the second connector.

8. The device according to claim 7, wherein: The second UV light source is positioned to radiate UV light into the third gas channel.

9. The device according to claim 1, wherein: The first UV light source is positioned to radiate UV light into the first gas channel.

10. The device according to claim 1, wherein: The transparent material is one of quartz or sapphire.

11. An apparatus comprising: Main valve manifold, including: Main channel; a first subchannel comprising a first end connected to the main channel at a connection point and a second end; and a second subchannel including a third end and a fourth end connected to the main channel and the first subchannel at a connection point; a shield formed of a transparent material and disposed adjacent to the connection point; a light source adjacent to the transparent shield and positioned to radiate light into the connection point; a first connector connected to the valve manifold and comprising a first plurality of inlets connected to the first subchannels via the first gas channels; and A first secondary manifold is connected to the main valve manifold and includes a second plurality of inlets connected to the second secondary channel via a second gas channel.

12. The device of claim 11, further comprising a third gas channel connected to the main channel at the connection point and adjacent to the transparent shield.

13. The device according to claim 11, wherein: The transparent material is one of quartz or sapphire.

14. The device according to claim 11, wherein: The light source includes an infrared light source.

15. The device according to claim 11, wherein The light source includes an ultraviolet light source.

16. An apparatus comprising: A valve manifold comprising a first gas channel, the first gas channel comprising: Main channel; a first subchannel comprising a first end connected to the main channel at a connection point and a second end; and The second sub-channel includes: a third end connected to the main channel and the first sub-channel at a connection point; and The fourth end; a first multi-port valve coupled to the second end of the first subchannel; A first unit having an interior volume and a side wall formed of a transparent material, and the first unit comprises: First entrance; and coupled to a first outlet of a first multi-port valve; and A first ultraviolet light source is adjacent to the first unit.

17. The device according to claim 16, wherein: The transparent material is one of quartz or sapphire.

18. The apparatus according to claim 16, further comprising: a second multi-port valve coupled to a fourth end of the second subchannel; A second unit is formed of a transparent material and includes: Second entrance; and coupled to a second outlet of a second multi-port valve; and A second ultraviolet light source is adjacent to the second unit.

19. The device according to claim 18, wherein One port of the first multi-port valve is coupled to an inert gas source; and one port of the second multi-port valve is coupled to the inert gas source.

20. The apparatus of claim 16, further comprising: a first container coupled to the first unit, wherein the first container is configured to contain a first chemical; as well as A second container is coupled to the second cell, wherein the second cell is configured to contain a second chemical substance different from the first chemical substance.

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