Control circuit and etching vacuum system

Abstract

The invention provides a control circuit and an etching vacuum system, and the control circuit comprises a power module, an interlocking control module, and a switch module. The interlocking control module comprises a power supply control unit and a connection control unit; the output end of the connection control unit is respectively connected with an inlet load lock of the plasma etching machine and an outlet load lock of the plasma etching machine; the power supply control unit is used for being powered on when the switch module is switched on and sending an electromagnetic signal to the connection control unit. And the connection control unit is used for forming a loop among the output end of the connection control unit, the inlet load lock and the vacuum extraction device of the plasma etching machine under the action of the electromagnetic signal, so that the inlet load lock is connected with the vacuum extraction device of the plasma etching machine, and the outlet load lock is disconnected from the vacuum extraction device of the plasma etching machine. According to the invention, the vacuum extraction process of the plasma etching machine can be controlled, so that the atmosphere recharge phenomenon is effectively avoided.

Description

Technical Field

[0001] The present application relates to the field of process manufacturing control technology, and in particular to a control circuit and an etching vacuum system. Background Art

[0002] In a plasma etcher, the inlet lock and the outlet lock share the same pump and are vacuumed through two isolation valves. Specifically, when the plasma etcher is in remote operation, the isolation valve of the outlet lock will be opened first to vacuumize. If the outlet lock is not pumped to the bottom pressure, the isolation valve of the inlet lock will also be opened. At this time, since the inlet lock is in the atmosphere and the outlet lock is in the vacuum state, there will be a large pressure difference between the two locks, which will cause the atmosphere of the inlet lock to be back-injected into the outlet lock, which may cause the particles in the pipeline to be lifted, resulting in product defects.

[0003] In the prior art, a pump can be added to the plasma etcher so that the inlet carrier lock and the outlet carrier lock each use a pump, thereby effectively avoiding a pressure difference between the two carrier locks and avoiding atmospheric back injection, thereby ensuring product quality.

[0004] However, this method of preventing atmospheric back-injection by adding a pump to the plasma etcher will incur additional operating costs, increase the difficulty of operating and maintaining the plasma etcher, and generate unnecessary noise. Summary of the invention

[0005] The purpose of this application is to provide a control circuit and an etching vacuum system to address the deficiencies in the above-mentioned prior art, so as to solve the problems of high cost, difficulty in operation and maintenance, and high noise in the prior art in preventing atmospheric back injection.

[0006] To achieve the above purpose, the technical solution adopted in the embodiment of the present application is as follows:

[0007] In a first aspect, an embodiment of the present application provides a control circuit, the control circuit comprising: a power supply module, an interlock control module and a switch module;

[0008] The interlock control module includes: a power supply control unit and a connection control unit;

[0009] The first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, and the output end of the switch module is connected to the second end of the power supply control unit;

[0010] The output end of the connection control unit is respectively connected to the entrance carrier lock of the plasma etcher and the exit carrier lock of the plasma etcher;

[0011] The power supply control unit is used to power on when the switch module is turned on, and send an electromagnetic signal to the connection control unit;

[0012] The connection control unit is used to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher under the action of the electromagnetic signal, so as to connect the entrance carrier lock with the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher;

[0013] Alternatively, a loop is formed between the output end of the connection control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher to connect the exit carrier lock to the vacuum extraction device of the plasma etcher and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher.

[0014] In a possible implementation, the connection control unit includes: a first switch and a second switch;

[0015] The first switch and the second switch each have three output terminals;

[0016] The first switch is connected to the entry lock, and the second switch is connected to the exit lock.

[0017] In a possible implementation manner, the connection control unit is specifically configured to:

[0018] Under the action of the electromagnetic signal, the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the second switch;

[0019] Alternatively, under the action of the electromagnetic signal, the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the second switch;

[0020] In a possible implementation, the first switch includes: a first normally-open end, a first normally-closed end, and a first common end;

[0021] The first common end is connected to one end of the entry carrier lock, and the first normally closed end is connected to the other end of the entry carrier lock.

[0022] In a possible implementation, the second switch includes: a second normally-open end, a second normally-closed end, and a second common end;

[0023] The second common end is connected to one end of the exit carrier lock, and the second normally open end is connected to the other end of the entrance carrier lock.

[0024] In a possible implementation, the first switch includes: a first normally-open end, a first normally-closed end, and a first common end;

[0025] The first common end is connected to one end of the entry carrier lock, and the first normally open end is connected to the other end of the entry carrier lock.

[0026] In a possible implementation, the second switch includes: a second normally-open end, a second normally-closed end, and a second common end;

[0027] The second common end is connected to one end of the exit carrier lock, and the second normally closed end is connected to the other end of the entrance carrier lock.

[0028] In a possible implementation, the switch module includes a vacuum switch;

[0029] The vacuum switch is used to be turned on or off when the vacuum degree of the inlet carrier lock of the plasma etcher meets the preset vacuum degree condition;

[0030] Alternatively, the vacuum switch is used to disconnect or connect when the vacuum degree of the outlet carrier lock of the plasma etcher meets a preset vacuum degree condition.

[0031] In a possible implementation manner, the third end of the power module is also connected to a power supply of the plasma etcher.

[0032] In a second aspect, another embodiment of the present application provides an etching vacuum system, and the etching vacuum system includes: a control circuit and a plasma etcher as described in any one of the first aspects.

[0033] The beneficial effects of the present application are as follows: by arranging a power supply module, an interlock control module and a switch module in a control circuit, and arranging a power supply control unit and a connection control unit in the interlock control module, the first output end of the power supply module is connected to the first end of the power supply control unit, the second output end of the power supply module is connected to the input end of the switch module, the output end of the switch module is connected to the second end of the power supply control unit, and the output end of the connection control unit is respectively connected to the entrance lock of the plasma etcher and the exit lock of the plasma etcher, so that the power supply control unit is powered on when the switch module is turned on, and an electromagnetic signal is sent to the connection control unit, so that the connection control unit is connected to the entrance lock under the action of the electromagnetic signal. A loop is formed between the carrier lock and the vacuum extraction device of the plasma etcher to connect the inlet carrier lock to the vacuum extraction device of the plasma etcher and to disconnect the outlet carrier lock from the vacuum extraction device of the plasma etcher; or, a loop is formed between the output end of the control unit and the outlet carrier lock and the vacuum extraction device of the plasma etcher to connect the outlet carrier lock to the vacuum extraction device of the plasma etcher and to disconnect the inlet carrier lock from the vacuum extraction device of the plasma etcher. The vacuum extraction process of the plasma etcher can be controlled, thereby effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the installation of a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0035] Figure 1 A schematic diagram of adding a vacuum extraction device to a plasma etcher in the prior art;

[0036] Figure 2 A schematic diagram of a control circuit provided in an embodiment of the present application;

[0037] Figure 3 A schematic diagram of a structure of a control unit connected in a control circuit provided in an embodiment of the present application;

[0038] Figure 4 A schematic diagram of the structure of a first switch in a control circuit provided in an embodiment of the present application;

[0039] Figure 5 A schematic diagram of the structure of a second switch in a control circuit provided in an embodiment of the present application;

[0040] Figure 6 Another structural schematic diagram of a first switch in a control circuit provided in an embodiment of the present application;

[0041] Figure 7 Another structural schematic diagram of the second switch in the control circuit provided in an embodiment of the present application;

[0042] Figure 8 A schematic diagram of the structure of a switch module in a control circuit provided in an embodiment of the present application;

[0043] Fig. 9 A schematic diagram of the structure of an etching vacuum system provided in an embodiment of the present application. DETAILED DESCRIPTION

[0044] To make the purpose, technical scheme and advantages of the embodiments of the present application clearer, the technical scheme in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. It should be understood that the drawings in the present application only serve the purpose of explanation and description and are not used to limit the scope of protection of the present application. In addition, it should be understood that the schematic drawings are not drawn in real proportion. The flowchart used in this application shows the operations implemented according to some embodiments of the present application. It should be understood that the operations of the flowchart can be implemented out of sequence, and the steps without logical context can be reversed in order or implemented simultaneously. In addition, those skilled in the art can add one or more other operations to the flowchart under the guidance of the content of the present application, or remove one or more operations from the flowchart.

[0045] In addition, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0046] It should be noted that the term "comprising" will be used in the embodiments of the present application to indicate the existence of the features declared thereafter, but does not exclude the addition of other features.

[0047] In a plasma etcher, the inlet lock and the outlet lock share the same pump and are vacuumed through two isolation valves. Specifically, when the plasma etcher is in remote operation, the isolation valve of the outlet lock will be opened first to vacuumize. If the outlet lock is not pumped to the bottom pressure, the isolation valve of the inlet lock will also be opened. At this time, since the inlet lock is in the atmosphere and the outlet lock is in the vacuum state, there will be a large pressure difference between the two locks, which will cause the atmosphere of the inlet lock to be back-injected into the outlet lock, which may cause the particles in the pipeline to be lifted, resulting in product defects.

[0048] In order to prevent the phenomenon of atmospheric backflow in the plasma etcher, Figure 1 A schematic diagram of adding a vacuum extraction device to a plasma etching machine in the prior art, referring to Figure 1 As shown, in the prior art, a pump can be added to the plasma etcher so that the inlet carrier lock and the outlet carrier lock use one pump respectively, thereby effectively avoiding a pressure difference between the two carrier locks and avoiding atmospheric back injection, thereby ensuring product quality.

[0049] However, this method of preventing atmospheric re-injection by adding a vacuum extraction device to the plasma etcher will generate additional operating costs, increase the difficulty of operating and maintaining the plasma etcher, and generate unnecessary noise.

[0050] Based on the above problems, the embodiments of the present application propose a control circuit and an etching vacuum system, wherein a power supply module, an interlock control module and a switch module are arranged in the control circuit, and a power supply control unit and a connection control unit are arranged in the interlock control module, so that a first output end of the power supply module is connected to a first end of the power supply control unit, a second output end of the power supply module is connected to an input end of the switch module, an output end of the switch module is connected to a second end of the power supply control unit, and an output end of the connection control unit is respectively connected to an entrance carrier lock of a plasma etcher and an exit carrier lock of the plasma etcher, so that the power supply control unit is powered on when the switch module is turned on, and an electromagnetic signal is sent to the connection control unit, so that the connection control unit is powered on when the connection control unit is turned on under the action of the electromagnetic signal. A loop is formed between the output end of the control unit and the inlet carrier lock and the vacuum extraction device of the plasma etcher, so as to connect the inlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the outlet carrier lock from the vacuum extraction device of the plasma etcher; or, a loop is formed between the output end of the connection control unit and the outlet carrier lock and the vacuum extraction device of the plasma etcher, so as to connect the outlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the inlet carrier lock from the vacuum extraction device of the plasma etcher. The vacuum extraction process of the plasma etcher can be controlled, thereby effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the installation of a vacuum extraction device in the plasma etcher, reduces the additional operating cost, and has the advantages of simple operation and easy maintenance.

[0051] The control circuit provided in the embodiments of the present application is described in detail below in combination with multiple embodiments.

[0052] Figure 2 A schematic diagram of a control circuit provided in an embodiment of the present application, referring to Figure 2 As shown, the control circuit includes: a power supply module, an interlock control module and a switch module.

[0053] Optionally, the power supply module is used to supply power to the control circuit provided in the embodiment of the present application, and the interlock control module is used to perform interlock control on the vacuum extraction process of the entrance carrier lock and the exit carrier lock of the plasma etcher when the switch module is turned on.

[0054] The interlock control module includes: a power supply control unit and a connection control unit.

[0055] The first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, and the output end of the switch module is connected to the second end of the power supply control unit.

[0056] Optionally, the first output end of the power module can be a positive pole, the positive pole of the power module is connected to the first end of the power supply control unit, and the second output end of the power module can be a negative pole, the negative pole of the power module is connected to the input end of the switch module.

[0057] Optionally, the first output end of the power module can be a negative pole, the negative pole of the power module is connected to the first end of the power supply control unit, and the second output end of the power module can be a positive pole, the positive pole of the power module is connected to the input end of the switch module.

[0058] The output end of the control unit is connected to the entrance lock of the plasma etcher and the exit lock of the plasma etcher respectively.

[0059] Optionally, the output end of the control unit is connected to the entrance chamber in the entrance lock of the plasma etcher and the isolation valve in the entrance lock to turn on or off the vacuum extraction process of the entrance lock of the plasma etcher under the action of the power supply control unit.

[0060] Optionally, the output end of the control unit is connected to the outlet chamber in the outlet carrier lock of the plasma etcher and the isolation valve in the outlet carrier lock to disconnect or connect the vacuum extraction process of the outlet carrier lock of the plasma etcher under the action of the power supply control unit.

[0061] The power supply control unit is used to power on when the switch module is turned on and send an electromagnetic signal to the connection control unit.

[0062] Optionally, the power supply control unit may be an electromagnetic transmitting unit. Specifically, the power supply control unit may include a transmitting coil, which is powered on after the switch module is turned on, generates an AC electromagnetic signal, converts it into an electromagnetic field, and radiates it outward, so that the connection control unit can receive the electromagnetic signal.

[0063] The connection control unit is used to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher under the action of the electromagnetic signal, so as to connect the entrance carrier lock with the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher; or, to form a loop between the output end of the connection control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher, so as to connect the exit carrier lock with the vacuum extraction device of the plasma etcher and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher.

[0064] Optionally, the connection control unit may include multiple magnetic switches, which can be turned on or off under the action of electromagnetic signals to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher, thereby connecting the entrance carrier lock and the vacuum extraction device of the plasma etcher, and disconnecting the exit carrier lock from the vacuum extraction device of the plasma etcher.

[0065] Optionally, multiple magnetic switches can also be turned on or off under the action of electromagnetic signals, forming a loop between the output end of the control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher, thereby disconnecting the entrance carrier lock from the vacuum extraction device of the plasma etcher and connecting the exit carrier lock to the vacuum extraction device of the plasma etcher.

[0066] The vacuum extraction device may be a pump in a plasma etcher.

[0067] In this embodiment, a power module, an interlock control module and a switch module are arranged in the control circuit, and a power supply control unit and a connection control unit are arranged in the interlock control module, so that the first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, the output end of the switch module is connected to the second end of the power supply control unit, and the output end of the connection control unit is respectively connected to the entrance lock and the exit lock of the plasma etcher, so that the power supply control unit is powered on when the switch module is turned on, and an electromagnetic signal is sent to the connection control unit, so that the connection control unit is connected to the entrance lock under the action of the electromagnetic signal. And a loop is formed between the vacuum extraction device of the plasma etcher to connect the inlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the outlet carrier lock from the vacuum extraction device of the plasma etcher; or, a loop is formed between the output end of the connection control unit and the outlet carrier lock and the vacuum extraction device of the plasma etcher to connect the outlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the inlet carrier lock from the vacuum extraction device of the plasma etcher. The vacuum extraction process of the plasma etcher can be controlled, thereby effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the installation of a vacuum extraction device in the plasma etcher, reduces the additional operating cost, and has the advantages of simple operation and easy maintenance.

[0068] Figure 3 A schematic diagram of a structure connecting a control unit in a control circuit provided in an embodiment of the present application.

[0069] In one possible implementation, referring to Figure 3 As shown, in Figure 2 On the basis of, the connection control unit includes: a first switch and a second switch.

[0070] The first switch and the second switch have three output terminals respectively. The first switch is connected to the entry carrier lock, and the second switch is connected to the exit carrier lock.

[0071] Optionally, both the first switch and the second switch can be magnetic switches, for example, the first switch is a normally closed magnetic switch, and the second switch is a normally open magnetic switch. The first switch is used to turn on or off the vacuum extraction process of the entrance carrier lock of the plasma etcher under the action of the power supply control unit, and the second switch is used to turn on or off the vacuum extraction process of the entrance carrier lock of the plasma etcher under the action of the power supply control unit.

[0072] Optionally, the first switch may have three output ends, two of which are used to connect to the entry carrier lock, and the second switch may have three output ends, two of which are used to connect to the exit carrier lock.

[0073] Exemplarily, two of the three output ends of the first switch are used to connect to the entrance chamber in the entrance load lock and the isolation valve in the entrance load lock, and two of the three output ends of the second switch are used to connect to the exit chamber in the exit load lock and the isolation valve in the exit load lock.

[0074] By setting the first switch and the second switch in the connection control unit, the first switch and the second switch can control the entrance lock and the vacuum extraction process of the outlet of the plasma etcher, effectively avoiding the occurrence of atmospheric re-injection phenomenon, and also has the advantages of simple operation and easy maintenance.

[0075] In one possible implementation, continue to refer to Figure 3 As shown, the connection control unit is specifically used for:

[0076] Under the action of the electromagnetic signal, the entrance carrier lock and the vacuum extraction device of the plasma etcher are connected through the two output ends of the first switch, and the entrance carrier lock and the vacuum extraction device of the plasma etcher are disconnected through the two output ends of the second switch.

[0077] Optionally, when the plasma etcher is in remote operation, when the outlet carrier lock is evacuated, after the outlet carrier lock evacuation process is completed, the connection control unit can, under the action of the electromagnetic signal, connect the entrance carrier lock with the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher through the two output ends of the second switch, thereby realizing the switching from the outlet carrier lock to the entrance carrier lock, so that the entrance carrier lock can be normally evacuated, thereby avoiding the pressure difference between the exit carrier lock and the entrance carrier lock, and avoiding the generation of atmospheric re-injection.

[0078] Alternatively, under the action of the electromagnetic signal, the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the second switch.

[0079] Optionally, after the vacuum pumping process of the entrance carrier lock is completed, the connection control unit can disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher through the two output ends of the first switch under the action of the electromagnetic signal, and connect the entrance carrier lock to the vacuum extraction device of the plasma etcher through the two output ends of the second switch, thereby realizing the switching from the entrance carrier lock to the exit carrier lock, so that the exit carrier lock can be normally vacuumed again, thereby avoiding the pressure difference between the entrance carrier lock and the exit carrier lock, and avoiding the generation of atmospheric re-injection.

[0080] That is to say, the switch module can be turned on or off after the entrance carrier lock or the exit carrier lock is evacuated, so as to switch between the entrance carrier lock and the exit carrier lock, thereby ensuring that the plasma etcher can evacuate the entrance carrier lock and the exit carrier lock in a manner that does not produce atmospheric re-injection, while also ensuring the flexibility of switching between the entrance carrier lock and the exit carrier lock.

[0081] Figure 4 A schematic diagram of the structure of a first switch in a control circuit provided in an embodiment of the present application.

[0082] In one possible implementation, referring to Figure 4 As shown, in Figure 3 On the basis of, the first switch includes: a first normally-open terminal NO1, a first normally-closed terminal NC1 and a first common terminal C1.

[0083] The first common terminal C1 is connected to one end of the entry carrier lock, and the first normally closed terminal NC1 is connected to the other end of the entry carrier lock.

[0084] Optionally, continue to refer to Figure 4 As shown, the first common terminal C1 is connected to the inlet chamber of the inlet carrier lock, and the first normally closed terminal NC1 is connected to the isolation valve of the inlet carrier lock.

[0085] That is to say, in the control circuit provided in the embodiment of the present application, when the first normally closed terminal NC1 and the first common terminal C1 of the first switch are connected to the entrance carrier lock, the entrance carrier lock of the plasma etcher is turned on under the action of the first switch, so that the vacuum extraction device of the plasma etcher can perform vacuum extraction on the entrance carrier lock.

[0086] Figure 5 A schematic diagram of the structure of a second switch in a control circuit provided in an embodiment of the present application.

[0087] In one possible implementation, referring to Figure 5 As shown, in Figure 4 On the basis of, the second switch includes: a second normally-open terminal NO2, a second normally-closed terminal NC2 and a second common terminal C2.

[0088] The second common terminal C2 is connected to one end of the exit carrier lock, and the second normally open terminal NO2 is connected to the other end of the entry carrier lock.

[0089] Optionally, continue to refer to Figure 5 As shown, the second common terminal C2 is connected to the outlet chamber of the outlet carrier lock, and the second normally open terminal NO2 is connected to the isolation valve of the outlet carrier lock.

[0090] That is to say, in the control circuit provided in the embodiment of the present application, when the first normally closed terminal NC1 and the first common terminal C1 of the first switch are connected to the entrance carrier lock, the entrance carrier lock of the plasma etcher is turned on under the action of the first switch, and at the same time, the second common terminal C2 of the second switch is connected to one end of the exit carrier lock, and the second normally open terminal NO2 is connected to the other end of the entrance carrier lock, and the exit carrier lock of the plasma etcher is disconnected under the action of the second switch, so that the vacuum extraction device of the plasma etcher can perform vacuum extraction on the entrance carrier lock without being affected by the exit carrier lock, effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the need to install a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance.

[0091] It can be understood that the above is an exemplary description of the first connection method for connecting the control unit and the plasma etcher, and the following is an exemplary description of the second connection method for connecting the control unit and the plasma etcher.

[0092] Figure 6 Another structural schematic diagram of the first switch in the control circuit provided in an embodiment of the present application.

[0093] In one possible implementation, referring to Figure 6 As shown, in Figure 3 On the basis of, the first switch includes: a first normally-open terminal NO1, a first normally-closed terminal NC1 and a first common terminal C1.

[0094] The first common terminal C1 is connected to one end of the entry carrier lock, and the first normally open terminal NO1 is connected to the other end of the entry carrier lock.

[0095] Optionally, continue to refer to Figure 6 As shown, the first common terminal C1 is connected to the inlet chamber of the inlet carrier lock, and the first normally open terminal NO1 is connected to the isolation valve of the inlet carrier lock.

[0096] Optionally, in the control circuit provided in the embodiment of the present application, when the first normally-open terminal NO1 and the first common terminal C1 of the first switch are connected to the entrance carrier lock, the entrance carrier lock of the plasma etcher is disconnected under the action of the first switch, so that the vacuum extraction device of the plasma etcher can perform vacuum extraction on the exit carrier lock.

[0097] Figure 7 Another structural schematic diagram of the second switch in the control circuit provided in an embodiment of the present application.

[0098] In one possible implementation, referring to Figure 7 As shown, in Figure 6 On the basis of, the second switch includes: a second normally-open terminal NO2, a second normally-closed terminal NC2 and a second common terminal C2.

[0099] The second common terminal C2 is connected to one end of the exit carrier lock, and the second normally closed terminal NC2 is connected to the other end of the entry carrier lock.

[0100] Optionally, continue to refer to Figure 7 As shown, the second common terminal C2 is connected to the outlet chamber of the outlet carrier lock, and the second normally closed terminal NC2 is connected to the isolation valve of the outlet carrier lock.

[0101] That is to say, in the control circuit provided in the embodiment of the present application, when the second normally closed terminal NC2 and the second common terminal C2 of the second switch are connected to the exit carrier lock, the exit carrier lock of the plasma etcher is turned on under the action of the second switch, and at the same time, the first common terminal C1 of the first switch is connected to one end of the entrance carrier lock, and the first normally open terminal NO1 is connected to the other end of the entrance carrier lock, and the entrance carrier lock of the plasma etcher is disconnected under the action of the first switch, so that the vacuum extraction device of the plasma etcher can perform vacuum extraction on the exit carrier lock without being affected by the entrance carrier lock, effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the need to install a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance.

[0102] Figure 8 A schematic diagram of the structure of a switch module in a control circuit provided in an embodiment of the present application.

[0103] In one possible implementation, referring to Figure 8 As shown, in Figure 2 On the basis of the switch module comprises a vacuum switch.

[0104] The vacuum switch is used to open or close the inlet carrier lock of the plasma etcher when the vacuum degree meets the preset vacuum degree condition; or, the vacuum switch is used to open or close the outlet carrier lock of the plasma etcher when the vacuum degree meets the preset vacuum degree condition.

[0105] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the entrance carrier lock of the plasma etcher, the vacuum switch can detect the vacuum degree of the entrance carrier lock of the plasma etcher, and disconnect when the vacuum degree of the entrance carrier lock of the plasma etcher meets a preset first vacuum degree condition, thereby enabling the exit carrier lock of the plasma etcher to perform vacuum extraction.

[0106] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the outlet carrier lock of the plasma etcher, the vacuum switch can detect the vacuum degree of the entrance carrier lock of the plasma etcher, and be turned on when the vacuum degree of the entrance carrier lock of the plasma etcher meets a preset second vacuum degree condition, thereby enabling the entrance carrier lock of the plasma etcher to perform vacuum extraction.

[0107] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the outlet carrier lock of the plasma etcher, the vacuum switch can also detect the vacuum degree of the outlet carrier lock of the plasma etcher, so as to disconnect when the vacuum degree of the outlet carrier lock of the plasma etcher meets a preset first vacuum degree condition, thereby allowing the entrance carrier lock of the plasma etcher to perform vacuum extraction.

[0108] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the entrance carrier lock of the plasma etcher, the vacuum switch can also detect the vacuum degree of the exit carrier lock of the plasma etcher, so as to be turned on when the vacuum degree of the exit carrier lock of the plasma etcher meets a preset first vacuum degree condition, thereby allowing the exit carrier lock of the plasma etcher to perform vacuum extraction.

[0109] By arranging a vacuum switch in the switch module, the vacuum switch can be turned on or off when the vacuum degree of the entrance carrier lock of the plasma etcher meets the preset vacuum degree condition; or, the vacuum switch can be turned off or on when the vacuum degree of the exit carrier lock of the plasma etcher meets the preset vacuum degree condition, thereby ensuring that the plasma etcher can evacuate the entrance carrier lock and the exit carrier lock in a manner that does not generate atmospheric re-injection, and at the same time, can ensure the flexibility of switching between the entrance carrier lock and the exit carrier lock.

[0110] In a possible implementation, the third end of the power module is also connected to a power supply of the plasma etcher.

[0111] Optionally, the third end of the power module is also connected to the power supply of the plasma etcher so that the power supply of the plasma etcher can supply power to the power module in the control circuit provided in the embodiment of the present application, which can simplify the wiring and reduce the need for additional power conversion or isolation components, thereby reducing the total cost of the control circuit provided in the embodiment of the present application to a certain extent.

[0112] Based on the same inventive concept, the embodiment of the present application also provides an etching vacuum system. Fig. 9 A schematic diagram of the structure of the etching vacuum system provided in the embodiment of the present application, referring to Fig. 9 As shown, the etching vacuum system includes: the above-mentioned control circuit and a plasma etcher.

[0113] Optionally, the control circuit is connected to the plasma etcher.

[0114] For the description of the processing flow of each module in the control circuit and the interaction flow between each module, reference can be made to the relevant description in the above control circuit embodiment, which will not be described in detail here.

[0115] The above are only specific implementation methods of the present application, but the protection scope of the present application is not limited thereto. Any technician familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be covered by the protection scope of the present application.

Claims

1. A control circuit, characterized in that: include: Power module, interlock control module and switch module; The interlock control module includes: a power supply control unit and a connection control unit; The first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, and the output end of the switch module is connected to the second end of the power supply control unit; The output end of the connection control unit is respectively connected to the entrance lock of the plasma etcher and the exit lock of the plasma etcher; The power supply control unit is used to power on when the switch module is turned on, and send an electromagnetic signal to the connection control unit; The connection control unit is used to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher under the action of the electromagnetic signal, so as to connect the entrance carrier lock with the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher; Alternatively, a loop is formed between the output end of the connection control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher to connect the exit carrier lock to the vacuum extraction device of the plasma etcher and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher.

2. The control circuit according to claim 1, characterized in that: The connection control unit includes: a first switch and a second switch; The first switch and the second switch each have three output terminals; The first switch is connected to the entry lock, and the second switch is connected to the exit lock.

3. The control circuit according to claim 2, characterized in that: The connection control unit is specifically used for: Under the action of the electromagnetic signal, the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the second switch; Alternatively, under the action of the electromagnetic signal, the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the second switch.

4. The control circuit according to claim 2, characterized in that: The first switch includes: a first normally open end, a first normally closed end and a first common end; The first common end is connected to one end of the entry carrier lock, and the first normally closed end is connected to the other end of the entry carrier lock.

5. The control circuit according to claim 4, characterized in that: The second switch includes: a second normally open end, a second normally closed end and a second common end; The second common end is connected to one end of the exit carrier lock, and the second normally open end is connected to the other end of the entrance carrier lock.

6. The control circuit according to claim 2, characterized in that: The first switch includes: a first normally open end, a first normally closed end and a first common end; The first common end is connected to one end of the entry carrier lock, and the first normally open end is connected to the other end of the entry carrier lock.

7. The control circuit according to claim 6, characterized in that: The second switch includes: a second normally open end, a second normally closed end and a second common end; The second common end is connected to one end of the exit carrier lock, and the second normally closed end is connected to the other end of the entrance carrier lock.

8. The control circuit according to claim 1, characterized in that: The switch module includes a vacuum switch; The vacuum switch is used to be turned on or off when the vacuum degree of the inlet carrier lock of the plasma etcher meets the preset vacuum degree condition; Alternatively, the vacuum switch is used to disconnect or connect when the vacuum degree of the outlet carrier lock of the plasma etcher meets a preset vacuum degree condition.

9. The control circuit according to claim 1, characterized in that: The third end of the power module is also connected to the power supply of the plasma etcher.

10. An etching vacuum system, comprising: The control circuit and plasma etcher according to any one of claims 1 to 9.

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