Substrate processing apparatus and substrate processing method

Abstract

The invention discloses a substrate processing apparatus and a substrate processing method. The disclosed substrate processing apparatus includes: a processing chamber portion including a substrate supporting portion that supports a substrate and a chemical liquid ejecting portion that ejects a chemical liquid onto the substrate; an unused chemical solution supply unit including at least one unused chemical solution chamber for accommodating an unused chemical solution never used during substrate processing, the unused chemical solution supply unit supplying the unused chemical solution to the chemical solution ejection unit; and a recycled chemical solution supply unit that includes a recycled chemical solution chamber into which at least a portion of the chemical solution discharged from the processing chamber unit after being discharged to the substrate flows and accommodates the same, and that supplies the recycled chemical solution accommodated in the recycled chemical solution chamber to the chemical solution discharge unit. According to the invention, the liquid medicine used in the substrate processing process is recycled, so that the consumption of the liquid medicine used in the substrate processing process is reduced, and the working cost can be saved.

Description

Technical Field

[0001] The present invention relates to a substrate processing device and a substrate processing method for processing a substrate used in a semiconductor manufacturing process by using a chemical solution. Background Art

[0002] Semiconductor manufacturing processes may include thin film evaporation, etching and cleaning. The cleaning process is a process for removing particles or foreign matter remaining on the substrate by spraying a chemical solution onto the substrate. However, the waste chemical solution discharged after spraying onto the substrate increases the environmental burden and the operating cost.

[0003] The background technology of the present invention is disclosed in Korean Patent Publication No. 10-2012-0018296 (published on March 2, 2012, the title of the invention is: Semiconductor wafer cleaning method and apparatus). Summary of the invention

[0004] The present invention is proposed to solve the above-mentioned problems. The purpose of the present invention is to provide a substrate processing device and a substrate processing method as follows, which recycle the chemical liquid used in the substrate processing process to reduce the consumption of the chemical liquid used in the substrate processing process.

[0005] The present invention provides a substrate processing device, which includes: a processing chamber portion, including a substrate supporting portion for supporting a substrate and a liquid medicine spraying portion for spraying liquid medicine onto the substrate; an unused liquid medicine supply portion, including at least one unused liquid medicine chamber for accommodating unused liquid medicine that has never been used in the substrate processing process, and for supplying the unused liquid medicine to the liquid medicine spraying portion; and a recycled liquid medicine supply portion, including a recycled liquid medicine chamber for allowing at least a portion of the liquid medicine discharged from the processing chamber portion after being sprayed onto the substrate to flow into and be accommodated, and for supplying the recycled liquid medicine accommodated in the recycled liquid medicine chamber to the liquid medicine spraying portion.

[0006] The chemical liquid spraying unit may include an upper surface nozzle for spraying the chemical liquid onto the upper surface of the substrate and a lower surface nozzle for spraying the chemical liquid onto the lower surface of the substrate, and the recycled chemical liquid supply unit supplies the recycled chemical liquid to the chemical liquid spraying unit so that the recycled chemical liquid is sprayed through the lower surface nozzle.

[0007] The unused chemical liquid supply unit may supply the unused chemical liquid to the chemical liquid spraying unit so that the unused chemical liquid is sprayed through the upper surface nozzle.

[0008] The unused chemical liquid supply unit may include a plurality of unused chemical liquid chambers, and the unused chemical liquid may be supplied to the chemical liquid ejection unit from one of the plurality of unused chemical liquid chambers.

[0009] The recycling chemical liquid supply unit may further include a concentration sensor for determining whether the concentration of the recycling chemical liquid is within a preset reference concentration range.

[0010] When the concentration of the circulating chemical liquid measured by the concentration sensor is not within the reference concentration range, supply of the circulating chemical liquid from the circulating chemical liquid supply unit to the chemical liquid discharge unit may be interrupted.

[0011] The substrate processing device of the present invention may also include a circulating chemical liquid concentration correction unit, which supplies concentration correction chemical liquid to the circulating chemical liquid chamber when the concentration of the circulating chemical liquid measured by the concentration sensor is not within the reference concentration range, so that the concentration of the circulating chemical liquid is within the reference concentration range.

[0012] The circulating chemical liquid supply unit may further include a constant temperature chamber for receiving the circulating chemical liquid received in the circulating chemical liquid chamber before the circulating chemical liquid is supplied to the chemical liquid ejection unit, and for maintaining the temperature of the circulating chemical liquid within a preset reference temperature range.

[0013] The circulating chemical liquid supply unit may further include a circulating chemical liquid water level detection unit including at least one water level detection sensor for measuring the water level of the circulating chemical liquid contained in the circulating chemical liquid chamber.

[0014] When the water level of the circulating chemical liquid measured by the circulating chemical liquid water level detection unit is within a preset appropriate water level range, the circulating chemical liquid may be supplied to the chemical liquid spraying unit.

[0015] When the water level of the circulating chemical liquid measured by the circulating chemical liquid level detection unit reaches a preset dangerous water level, the circulating chemical liquid can be discharged from the circulating chemical liquid chamber, and the chemical liquid discharged from the processing chamber will not flow into the circulating chemical liquid chamber.

[0016] The present invention provides a substrate processing method, which includes: an unused chemical liquid spraying step, in which unused chemical liquid that has never been used in the substrate processing process is supplied from an unused chemical liquid chamber to a chemical liquid spraying unit and the unused chemical liquid is sprayed onto the substrate; a chemical liquid recovery step, in which at least a portion of the chemical liquid discharged after being used in the substrate processing process flows into a recycled chemical liquid chamber and is accommodated; and a recycled chemical liquid spraying step, in which the recycled chemical liquid accommodated in the recycled chemical liquid chamber is supplied to the chemical liquid spraying unit and the recycled chemical liquid is sprayed onto the substrate.

[0017] In the step of spraying the circulated chemical liquid, the circulated chemical liquid may be sprayed toward a lower surface of the substrate.

[0018] When the circulated chemical solution is sprayed toward the lower surface of the substrate, the unused chemical solution may be sprayed toward the upper surface of the substrate.

[0019] In the substrate processing method of the present invention, before the circulating chemical liquid spraying step, the following circulating chemical liquid concentration correction step may be included. When the concentration of the circulating chemical liquid is not within a preset reference concentration range, the concentration of the circulating chemical liquid is corrected so that the concentration of the circulating chemical liquid is within the reference concentration range.

[0020] When the water level of the circulating chemical liquid contained in the circulating chemical liquid chamber is within a preset appropriate water level range, the circulating chemical liquid spraying step may be performed.

[0021] The substrate processing method of the present invention may further include a circulating liquid medicine chamber discharge step, wherein when the water level of the circulating liquid medicine reaches a preset dangerous water level, the circulating liquid medicine is discharged from the circulating liquid medicine chamber.

[0022] According to the present invention, the chemical liquid used in the substrate processing process can be recycled to reduce the consumption of the chemical liquid used in the substrate processing process, thereby saving working costs.

[0023] According to the present invention, since the discharge amount of waste chemical liquid generated during the substrate processing process is reduced, the burden of environmental pollution can be reduced, and the purification cost of the waste chemical liquid can also be saved. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 FIG. 4 is a structural diagram of a substrate processing device according to an embodiment of the present invention.

[0025] Figure 2 for Figure 1 Structural diagram of a processing chamber portion.

[0026] Figure 3 As an example, Figure 1 A diagram showing the liquid circulation state at the initial stage of operation of a substrate processing device.

[0027] Figure 4 As an example, the Figure 1 A diagram showing a chemical liquid circulation state in a substrate processing apparatus when the water level in a chemical liquid circulation chamber is within an appropriate water level range.

[0028] Figure 5 As an example, the Figure 1 A diagram showing a chemical liquid circulation state in a substrate processing apparatus when a water level in a chemical liquid circulation chamber is at a dangerous water level. DETAILED DESCRIPTION

[0029] Hereinafter, with reference to the accompanying drawings, a substrate processing device and a substrate processing method according to an embodiment of the present invention are described in detail. The terminology used in this specification is used to appropriately describe the preferred embodiments of the present invention, and it can be changed according to the intention of the user or operator or the conventions in the technical field of the present invention. Therefore, the definition of this term should be given based on the entire content of this specification.

[0030] Figure 1 is a structural diagram of a substrate processing device according to an embodiment of the present invention, Figure 2 for Figure 1 The structural diagram of the processing chamber part, Figure 3 As an example, Figure 1 A diagram showing the liquid circulation state of the substrate processing device at the initial stage of operation. Figure 4 As an example, the Figure 1 A diagram of the liquid circulation state in the substrate processing apparatus when the water level in the liquid circulation chamber is within an appropriate water level range, Figure 5 As an example, the Figure 1 A diagram showing a chemical liquid circulation state in a substrate processing apparatus when a water level in a chemical liquid circulation chamber is at a dangerous water level.

[0031] Reference Figures 1 to 5 For example, the substrate processing apparatus 100 according to an embodiment of the present invention may be an apparatus for cleaning the substrate 10 by spraying a chemical solution onto the upper surface 11 and the lower surface 12 of the substrate 10. For example, the substrate 10 may be a disc-shaped semiconductor wafer.

[0032] The substrate processing apparatus 100 may include a processing chamber 101, an unused chemical solution supply unit 130, a recycled chemical solution supply unit 200, a recycled chemical solution concentration correction unit 230, a discharge unit 240, a recovery flow path 250, and a control unit 260. The processing chamber 101 may include a substrate support unit 105, a chemical solution spray unit 110, and a chemical solution discharge unit 116.

[0033] For example, the substrate support part 105 may include a rotating table that supports and rotates the substrate 10 at high speed. The chemical liquid spraying part 110 sprays the chemical liquid onto the substrate 10. The chemical liquid spraying part 110 may include an upper surface nozzle 111 for spraying the chemical liquid onto the upper surface 11 of the substrate 10 and a lower surface nozzle 113 for spraying the chemical liquid onto the lower surface 12 of the substrate 10.

[0034] The chemical liquid discharge portion 116 discharges the chemical liquid sprayed toward the upper surface 11 and the lower surface 12 of the substrate 10 and used to clean the substrate 10 to the outside of the processing chamber 101. The chemical liquid discharge portion 116 may include a guide member surrounding the substrate support portion 105 at the periphery of the substrate support portion 105 and a discharge port for discharging the chemical liquid flowing along the guide member to the outside of the processing chamber 101.

[0035] The substrate processing apparatus 100 exemplarily shown in the figure includes only one processing chamber portion 101 . Different from this, the substrate processing apparatus of the present invention may further include a plurality of processing chamber portions 101 that are evenly arranged.

[0036] For example, the chemical solution may be one of DHF (Diluted Hydrogen Fluoride), DSP (Diluted Sulfate Peroxide), SPM (Sulfate Acid Peroxide Mixture), FPM (Fluoric Acid Peroxide Mixture), SC-1 (Standard Clean 1), SC-2 (Standard Clean 2), or a combination of these.

[0037] The unused liquid supply unit 130 may supply unused liquid NCH to the liquid discharge unit 110. The unused liquid supply unit 130 may include a first unused liquid chamber 131 and a second unused liquid chamber 135, an unused liquid filter 158, and an unused liquid pump 157. The first unused liquid chamber 131 and the second unused liquid chamber 135 may contain unused liquid NCH that has never been used to process the substrate 10.

[0038] The unused liquid pump 157 can suck the unused liquid NCH discharged from the first unused liquid chamber 131 or the second unused liquid chamber 135 to the liquid discharge unit 110. The unused liquid filter 158 can filter impurities in the unused liquid NCH discharged from the first unused liquid chamber 131 or the second unused liquid chamber 135 and supplied to the liquid discharge unit 110.

[0039] The unused drug liquid supply unit 130 may further include: an unused drug liquid supply flow path 140, so that the unused drug liquid NCH flows toward the drug liquid ejection unit 110; a first unused drug liquid discharge flow path 141, connecting the first unused drug liquid chamber 131 and the unused drug liquid supply flow path 140 in a manner that allows fluid to flow; and a second unused drug liquid discharge flow path 142, connecting the second unused drug liquid chamber 135 and the unused drug liquid supply flow path 140 in a manner that allows fluid to flow.

[0040] The unused liquid medicine supply unit 130 may further include a first unused liquid medicine circulation flow path 145 and a second unused liquid medicine circulation flow path 146 for returning the unused liquid medicine NCH to the unused liquid medicine chambers 131 and 135 from which the unused liquid medicine NCH was discharged. For example, when the nozzles 111 and 113 of the liquid medicine ejection unit 110 are not opened, the unused liquid medicine NCH is returned to the unused liquid medicine chambers 131 and 135 from which the unused liquid medicine NCH was discharged through the first unused liquid medicine circulation flow path 145 and the second unused liquid medicine circulation flow path 146.

[0041] The reference numeral "150" refers to a valve for opening and closing the first unused drug liquid discharge flow path 141, the reference numeral "151" refers to a valve for opening and closing the second unused drug liquid discharge flow path 142, the reference numeral "154" refers to a valve for opening and closing the first unused drug liquid circulation flow path 145, and the reference numeral "155" refers to a valve for opening and closing the second unused drug liquid circulation flow path 146.

[0042] In the unused liquid supply unit 130, the unused liquid NCH may be supplied from one of the first unused liquid chamber 131 and the second unused liquid chamber 135 to the liquid ejection unit 110. For example, the unused liquid NCH may be supplied alternately from the first unused liquid chamber 131 and the second unused liquid chamber 135 to the liquid ejection unit 110.

[0043] When the unused chemical solution NCH in the first unused chemical solution chamber 131 is consumed (refer to Figure 4 NV1), without time delay, the unused liquid medicine NCH is supplied from the second unused liquid medicine chamber 135 to the liquid medicine discharge unit 110, during which time the unused liquid medicine NCH can be replenished to the first unused liquid medicine chamber 131 (refer to Figure 5 of "NV1").

[0044] When the unused liquid NCH in the second unused liquid chamber 135 is consumed, the unused liquid NCH can be supplied from the first unused liquid chamber 131 to the liquid discharge unit 110 without any time delay. Meanwhile, the first unused liquid chamber 135 can be replenished with the unused liquid NCH.

[0045] In this way, the substrate 10 processing operation can be continuously performed without time delay. The control unit 260 can control the switch of the unused liquid chamber between the first unused liquid chamber 131 and the second unused liquid chamber 135 and replenish the unused liquid NCH to the first unused liquid chamber 131 and the second unused liquid chamber 135.

[0046] The recycled chemical liquid supply unit 200 includes a recycled chemical liquid chamber 201, a recycled chemical liquid filter 216, and a recycled chemical liquid pump 212. The recycled chemical liquid chamber 201 receives and receives at least a portion of the chemical liquid UCH discharged from the processing chamber unit 101 after being sprayed onto the substrate 10.

[0047] The circulating chemical liquid supply unit 200 supplies the circulating chemical liquid RCH contained in the circulating chemical liquid chamber 201 to the chemical liquid ejection unit 110. The circulating chemical liquid pump 212 can suck the circulating chemical liquid RCH discharged from the circulating chemical liquid chamber 201 to the chemical liquid ejection unit 110. The circulating chemical liquid filter 216 can filter impurities in the circulating chemical liquid RCH discharged from the circulating chemical liquid chamber 201 and supplied to the chemical liquid ejection unit 110.

[0048] The recycled drug solution supply unit 200 may further include: a recycled drug solution supply flow path 210, which allows the recycled drug solution RCH to flow toward the drug solution ejection unit 110; and a recycled drug solution circulation flow path 220, which allows the recycled drug solution RCH to return to the recycled drug solution chamber 201 for discharging it.

[0049] For example, when the nozzles 111 and 113 of the chemical liquid ejection unit 110 are not opened, the chemical liquid RCH returns to the chemical liquid chamber 201 through the chemical liquid circulation passage 220. Reference numeral 214 indicates a valve for opening and closing the chemical liquid supply passage 210.

[0050] The circulating chemical liquid supplier 200 may supply the circulating chemical liquid RCH to the chemical liquid ejector so that the circulating chemical liquid RCH is ejected toward the substrate 10 through the lower surface nozzle 113 . The circulating chemical liquid RCH may not be ejected toward the substrate 10 through the upper surface nozzle 111 .

[0051] The quality of the recycled chemical solution RCH is slightly inferior to that of the unused chemical solution NCH, so when the recycled chemical solution RCH is used to clean the upper surface 11 of the substrate 10, for example, the yield of the final product such as a semiconductor may be reduced. However, the lower surface 12 of the substrate 10 does not require the same high precision as the upper surface 11, so even if the recycled chemical solution RCH is used to clean the lower surface 12 of the substrate 10, the yield of the final product may not be reduced.

[0052] When the circulated chemical liquid RCH is ejected toward the substrate 10 through the lower surface nozzle 113, the unused chemical liquid supply unit 130 may supply the unused chemical liquid NCH to the chemical liquid ejection unit 110, so that the unused chemical liquid NCH is ejected through the upper surface nozzle 111. The supply period of the circulated chemical liquid RCH by the circulated chemical liquid supply unit 200 and the supply period of the unused chemical liquid NCH by the unused chemical liquid supply unit 130 may be controlled by the control unit 260.

[0053] The recycling liquid supply unit 200 may further include a recycling liquid water level detection unit 207, a constant temperature chamber 223, and a concentration sensor 227. The recycling liquid water level detection unit 207 is used to measure the water level RV of the recycling liquid RCH contained in the recycling liquid chamber 201, and may include a plurality of water level detection sensors (202 to 206).

[0054] A plurality of water level detection sensors (202 to 206) can be arranged in a vertically spaced manner in the recycling liquid chamber 201. Among the plurality of water level detection sensors, the first water level detection sensor 202 is arranged at a position closest to the bottom of the recycling liquid chamber 201, and the second water level detection sensor 203 can be arranged at a position slightly higher than the first water level detection sensor 202.

[0055] The fifth water level detection sensor 206 is disposed at a position closest to the top guard plate of the recycled liquid medicine chamber 201 , and the fourth water level detection sensor 205 may be disposed at a position slightly lower than the fifth water level detection sensor 205 .

[0056] The third water level detection sensor 204 is disposed at a height between the second water level detection sensor 203 and the fourth water level detection sensor 205, closer to the fourth water level detection sensor 205 than the second water level detection sensor 203. For example, each water level detection sensor (202 to 206) may be a photo level sensor.

[0057] The control unit 260 may control the supply of the circulating chemical solution RCH and the supply of the unused chemical solution NCH based on the water level RV of the circulating chemical solution RCH detected by the plurality of circulating chemical solution water level detection units 207 .

[0058] The constant temperature chamber 223 may be disposed on the circulating chemical liquid supply passage 210. The constant temperature chamber 223 is a chamber for receiving the circulating chemical liquid RCH received in the circulating chemical liquid chamber 201 before being supplied to the chemical liquid ejection unit 110, and can maintain the temperature of the circulating chemical liquid RCH within a preset reference temperature range.

[0059] Depending on the type of chemical liquid, there may be a chemical liquid that needs to be put in at room temperature to process the substrate 10. After the chemical liquid that needs to be put in at room temperature is put into the substrate 10 for processing, the temperature may rise due to the exothermic reaction. In this case, the constant temperature chamber 223 can cool the circulating chemical liquid RCH having a temperature higher than room temperature to a room temperature state. The constant temperature chamber 223 may include a cooler or a heat exchanger to have a cooling function.

[0060] The concentration sensor 227 may be disposed on the recycling liquid supply flow path 210. The concentration sensor 227 may determine whether the concentration of the recycling liquid RCH supplied to the liquid ejection unit 110 is within a preset reference concentration range. When the concentration of the recycling liquid RCH ejected to the substrate 10 by the liquid ejection unit 110 is greater than the reference concentration range, the yield of the final product made with the substrate 10 as the raw material may be reduced, and therefore, the concentration sensor 227 may be disposed to prevent the occurrence of the above phenomenon.

[0061] When the concentration of the circulating chemical solution RCH measured by the concentration sensor 227 is not within the reference concentration range, the supply of the circulating chemical solution RCH from the circulating chemical solution supply unit 200 to the chemical solution discharge unit 110 may be interrupted.

[0062] When the concentration sensor 227 determines that the concentration of the circulating chemical solution RCH is not within the reference concentration range, the circulating chemical solution concentration correction unit 230 may supply concentration correction chemical solution to the circulating chemical solution chamber 201 to bring the concentration of the circulating chemical solution RCH within the reference concentration range.

[0063] The circulating drug concentration correction unit 230 may include a concentration correction drug chamber 231, a concentration correction drug supply path 233, and a concentration correction drug pump 235. The concentration correction drug chamber 231 may contain a concentration correction drug. The concentration correction drug supply path 233 may guide the concentration correction drug flowing out of the concentration correction drug chamber 231 to the circulating drug chamber 201.

[0064] The concentration correction chemical solution pump 235 may be provided on the concentration correction chemical solution supply flow path 233 to pump the concentration correction chemical solution discharged from the concentration correction chemical solution chamber 231 toward the circulating chemical solution chamber 201. Reference numeral 234 denotes a valve for opening and closing the concentration correction chemical solution supply flow path 233.

[0065] The following operations can be controlled by the control unit 260: based on the concentration of the recycled drug liquid RCH measured by the concentration sensor 227, the supply of the recycled drug liquid RCH to the drug liquid ejection unit 110 is interrupted, the concentration correction drug liquid in the concentration correction drug liquid chamber 231 is supplied to the recycled drug liquid chamber 201, and the supply of the recycled drug liquid RCH to the drug liquid ejection unit 110 is restarted.

[0066] The discharge unit 240 may include a used chemical liquid discharge passage 242 and a recycled chemical liquid discharge passage 246. The used chemical liquid discharge passage 242 may guide the used chemical liquid UCH discharged to the outside of the processing chamber 101 through the chemical liquid discharge unit 116 to the outside of the substrate processing apparatus 100.

[0067] The recycled chemical liquid discharge passage 246 can guide the recycled chemical liquid RCH discharged to the outside of the recycled chemical liquid chamber 201 to the outside of the substrate processing apparatus 100. Reference numeral "244" denotes a valve for opening and closing the used chemical liquid discharge passage 242, and reference numeral "248" denotes a valve for opening and closing the recycled chemical liquid discharge passage 246.

[0068] The used chemical liquid UCH and the circulating chemical liquid RCH discharged to the outside of the substrate processing apparatus 100 through the used chemical liquid discharge passage 242 and the circulating chemical liquid discharge passage 246 may be discharged through the purification device.

[0069] The recovery flow path 250 can guide the used chemical liquid UCH discharged through the used chemical liquid discharge flow path 242 to the circulated used chemical liquid chamber 201. Reference numeral 252 denotes a valve for opening and closing the recovery flow path 250.

[0070] When the valve 244 provided in the used chemical liquid discharge flow path 242 is closed and the valve 252 of the recovery flow path 250 is opened, the used chemical liquid UCH discharged from the processing chamber portion 101 can all flow into the circulating chemical liquid chamber 201 .

[0071] On the contrary, when the valve 244 set in the used chemical liquid discharge flow path 242 is opened and the valve 252 of the recovery flow path 250 is closed, the used chemical liquid UCH discharged from the processing chamber part 101 is directly discharged to the outside of the substrate processing device 100 and does not flow into the circulating chemical liquid chamber 201.

[0072] When the valve 244 set in the used chemical liquid discharge flow path 242 is partially opened and the valve 252 of the recovery flow path 250 is partially opened, a part of the used chemical liquid UCH discharged from the processing chamber part 101 can flow into the recycling chemical liquid chamber 201, and the remaining part is discharged to the outside of the substrate processing device 100.

[0073] Hereinafter, a substrate processing method performed by using the substrate processing apparatus 100 will be described. The substrate processing method may include an unused chemical liquid ejecting step (S100), a chemical liquid recovery step (S200), and a recycled chemical liquid ejecting step (S400).

[0074] The unused chemical liquid ejecting step (S100) is a step of supplying unused chemical liquid NCH that has not been used during the processing of the substrate 10 from the unused chemical liquid chambers 131 and 135 to the chemical liquid ejecting unit 110 and ejecting the unused chemical liquid onto the substrate 10. The unused chemical liquid ejecting step (S100) may be performed by the unused chemical liquid supply unit 130 of the substrate processing apparatus 100.

[0075] The unused chemical liquid ejecting step (S100) may be performed when the substrate processing apparatus 100 starts to operate. Figure 3 As shown, before the substrate processing apparatus 100 starts to operate, the water levels NV1 and NV2 of the first unused chemical liquid chamber 131 and the second unused chemical liquid chamber 135 are filled to a sufficiently high state, and the circulating chemical liquid chamber 201 is in an empty state.

[0076] When the substrate processing apparatus 100 starts to operate, the control unit 260 may supply the unused chemical liquid NCH from one of the first unused chemical liquid chamber 131 and the second unused chemical liquid chamber 135 to the chemical liquid ejection unit 110 and eject the unused chemical liquid NCH onto the substrate 10. In this case, the unused chemical liquid NCH may be ejected from the upper surface nozzle 111 and the lower surface nozzle 113 at the same time.

[0077] The chemical solution recovery step ( S200 ) is a step of causing at least a portion of the used chemical solution UCH discharged from the processing chamber 101 after being used in the processing of the substrate 10 to flow into the circulating chemical solution chamber 201 and be stored therein.

[0078] Reference Figure 3 For example, the unused chemical solution NCH sprayed onto the substrate 10 cleans the upper surface 11 and the lower surface 12 of the substrate 10, and after use, it becomes a used chemical solution UCH state, which can be discharged to the outside of the processing chamber 101 through the chemical solution discharge portion 116. The used chemical solution UCH discharged from the processing chamber 101 can flow into the recycling chemical solution chamber 201 through the recovery flow path 250 and be accommodated.

[0079] As a specific example, when the first water level detection sensor 202 detects the circulating medicinal liquid RCH, and the second water level detection sensor 203, the third water level detection sensor 204, and the fourth water level detection sensor 205 do not detect the circulating medicinal liquid RCH, the circulating medicinal liquid water level detection unit 207 can determine that the water level RV of the circulating medicinal liquid RCH in the circulating medicinal liquid chamber 201 is higher than or equal to the height of the first water level detection sensor 202 or lower than the height of the second water level detection sensor 203.

[0080] When the water level RV of the recyclable liquid RCH in the recyclable liquid chamber 201 is higher than or equal to the height of the first water level detection sensor 202 and lower than the height of the second water level detection sensor 203, the control unit 260 may determine that the water level RV of the recyclable liquid RCH contained in the recyclable liquid chamber 201 is in the preset too low water level range. In this case, the unused liquid spraying step (S100) and the liquid recovery step (S200) may be performed together, and the recyclable liquid spraying step (S400) may not be performed.

[0081] The circulating chemical liquid ejecting step (S400) is a step of supplying the circulating chemical liquid RCH contained in the circulating chemical liquid chamber 201 to the chemical liquid ejecting unit 110 and ejecting the circulating chemical liquid onto the substrate 10. As described above, the substrate processing apparatus 100 is described, and in the circulating chemical liquid ejecting step (S400), the circulating chemical liquid RCH may be ejected onto the lower surface 12 of the substrate 10 through the lower surface nozzle 113. When the circulating chemical liquid RCH is ejected onto the lower surface 12 of the substrate 10, the unused chemical liquid NCH may be ejected onto the upper surface 11 of the substrate 10 through the upper surface nozzle 111.

[0082] Reference Figure 4 For example, when the first water level detection sensor 202 and the second water level detection sensor 203 detect the recycled medicinal liquid RCH, and the third water level detection sensor 204, the fourth water level detection sensor 205, and the fifth water level detection sensor 206 do not detect the recycled medicinal liquid RCH, the recycled medicinal liquid water level detection unit 207 can determine that the water level RV of the recycled medicinal liquid RCH in the recycled medicinal liquid chamber 201 is higher than or equal to the height of the second water level detection sensor 203 and lower than the height of the third water level detection sensor 204.

[0083] When the water level RV of the recyclable liquid RCH in the recyclable liquid chamber 201 is higher than or equal to the height of the second water level detection sensor 203 and lower than the height of the third water level detection sensor 204, the control unit 260 can determine that the water level RV of the recyclable liquid RCH contained in the recyclable liquid chamber 201 is within the preset appropriate water level range. In this case, the unused liquid spraying step (S100), the liquid recovery step (S200) and the recyclable liquid spraying step (S400) can be performed together.

[0084] On the other hand, when the first water level detection sensor 202, the second water level detection sensor 203, and the third water level detection sensor 204 detect the recycled medicinal liquid RCH, and the fourth water level detection sensor 205 and the fifth water level detection sensor 206 do not detect the recycled medicinal liquid RCH, the recycled medicinal liquid water level detection unit 207 can determine that the water level RV of the recycled medicinal liquid RCH in the recycled medicinal liquid chamber 201 is higher than or equal to the height of the third water level detection sensor 204 and lower than the height of the fourth water level detection sensor 205.

[0085] When the water level RV of the circulating liquid medicine RCH in the circulating liquid medicine chamber 201 is higher than or equal to the height of the third water level detection sensor 204 and lower than the height of the fourth water level detection sensor 205, the control unit 260 can determine that the water level RV of the circulating liquid medicine RCH contained in the circulating liquid medicine chamber 201 is in the preset excessively high water level range. In this case, the control unit 260 can open the valve 248 provided in the circulating liquid medicine discharge flow path 246, so that the water level RV of the circulating liquid medicine RCH is restored to the preset appropriate water level range.

[0086] The substrate processing method of the embodiment of the present invention may further include a circulating chemical liquid chamber discharge step (S500). The circulating chemical liquid chamber discharge step (S500) is a step of discharging the circulating chemical liquid RCH from the circulating chemical liquid chamber 201 when the water level RV of the circulating chemical liquid RCH reaches a preset dangerous water level.

[0087] exist Figures 1 to 5 In the substrate processing apparatus 100 shown, the dangerous water level measured by the circulating chemical liquid level detection unit 207 can be divided into an initial dangerous water level and an emergency dangerous water level. When the water level RV of the circulating chemical liquid RCH is determined to be the initial dangerous water level or the emergency dangerous water level by the control unit 260, the valve 248 provided in the circulating chemical liquid discharge flow path 246 can be opened to discharge the circulating chemical liquid RCH to the outside of the substrate processing apparatus 100.

[0088] Reference Figure 5 For example, when the first water level detection sensor 202, the second water level detection sensor 203, the third water level detection sensor 204, and the fourth water level detection sensor 205 detect the recycled medicinal liquid RCH, and the fifth water level detection sensor 206 does not detect the recycled medicinal liquid RCH, the recycled medicinal liquid water level detection unit 207 can determine that the water level RV of the recycled medicinal liquid RCH in the recycled medicinal liquid chamber 201 is higher than or equal to the height of the fourth water level detection sensor 205 and lower than the height of the fifth water level detection sensor 206.

[0089] When the water level RV of the circulating liquid medicine RCH in the circulating liquid medicine chamber 201 is higher than or equal to the height of the fourth water level detection sensor 205 and lower than the height of the fifth water level detection sensor 206, the control unit 260 can determine that the water level RV of the circulating liquid medicine RCH contained in the circulating liquid medicine chamber 201 belongs to the preset initial dangerous water level range. In this case, the control unit 260 can open the valve 248 provided in the circulating liquid medicine discharge flow path 246 and close the valve 252 provided in the recovery flow path 250, so that the water level RV of the circulating liquid medicine RCH is restored to the preset appropriate water level range.

[0090] When the first water level detection sensor 202, the second water level detection sensor 203, the third water level detection sensor 204, the fourth water level detection sensor 205, and the fifth water level detection sensor 206 detect the recycled medicinal liquid RCH, the recycled medicinal liquid water level detection unit 207 can determine that the water level RV of the recycled medicinal liquid RCH in the recycled medicinal liquid chamber 201 is higher than or equal to the height of the fifth water level detection sensor 206.

[0091] When the water level RV of the circulating liquid medicine RCH in the circulating liquid medicine chamber 201 is higher than or equal to the height of the fifth water level detection sensor 206, the control unit 260 can determine that the water level RV of the circulating liquid medicine RCH contained in the circulating liquid medicine chamber 201 is within the preset emergency danger water level range.

[0092] In this case, the control unit 260 can open the valve 248 provided in the circulating chemical liquid discharge flow path 246, close the valve 252 provided in the recovery flow path 250, and stop the pump 212 provided in the circulating chemical liquid supply flow path 210, thereby disconnecting the supply of the circulating chemical liquid RCH to the chemical liquid ejection unit 110. In this case, the unused chemical liquid NCH can be supplied from the unused chemical liquid supply unit 130 to the upper surface nozzle 111 and the lower surface nozzle 113 of the chemical liquid ejection unit 110, so that the processing of the substrate 10 can be continued in the substrate processing unit 101.

[0093] On the other hand, when the first water level detection sensor 202, the second water level detection sensor 203, the third water level detection sensor 204, the fourth water level detection sensor 205, and the fifth water level detection sensor 206 do not detect the circulating medicinal liquid RCH, the circulating medicinal liquid water level detection unit 207 can determine that the water level RV of the circulating medicinal liquid RCH in the circulating medicinal liquid chamber 201 is higher than the height of the first water level detection sensor 202.

[0094] When the water level RV of the circulating liquid medicine RCH in the circulating liquid medicine chamber 201 is lower than the height of the first water level detection sensor 202, the control unit 260 can determine that the water level RV of the circulating liquid medicine RCH contained in the circulating liquid medicine chamber 201 is within the preset bottom water level range.

[0095] In this case, the control unit 260 can stop the pump 212 provided in the circulating liquid supply flow path 210 to disconnect the supply of the circulating liquid RCH to the liquid spraying unit 110, and can control the unused liquid supply unit 130 so that the unused liquid NCH is supplied to the upper surface nozzle 111 and the lower surface nozzle 113 of the liquid spraying unit 110.

[0096] The substrate processing method of the embodiment of the present invention may further include a liquid concentration correction step (S300). The circulating liquid concentration correction step (S300) is to correct the concentration of the circulating liquid RCH when the concentration of the circulating liquid RCH is not within the preset reference concentration range, so that the concentration of the circulating liquid RCH is within the reference concentration range.

[0097] The concentration of the circulating chemical solution RCH may be measured by the concentration sensor 227. The concentration of the circulating chemical solution RCH may be corrected by the circulating chemical solution concentration correction unit 230. During the execution of the circulating chemical solution concentration correction step (S300), the circulating chemical solution ejection step (S400) may be interrupted.

[0098] According to the present invention as described above, the chemical solution used in the process of processing the substrate 10 can be recycled to reduce the consumption of the chemical solution used in the process of processing the substrate 10, thereby saving working costs. In addition, since the discharge amount of waste chemical solution generated in the process of processing the substrate 10 can be reduced, the burden of environmental pollution can be reduced, and the purification cost of the waste chemical solution can also be saved.

[0099] The present invention has been described with reference to an embodiment shown in the drawings, but this is only an example, and a person skilled in the art of the present invention can make various modifications and other equivalent embodiments.

Claims

1. A substrate processing device, characterized in that: include: A processing chamber portion, comprising a substrate supporting portion for supporting a substrate and a liquid spraying portion for spraying a liquid onto the substrate; An unused liquid supply unit includes at least one unused liquid chamber for accommodating unused liquid that is never used in the processing of the substrate, and is used to supply the unused liquid to the liquid spray unit; as well as The circulating chemical liquid supply unit includes a circulating chemical liquid chamber for receiving and receiving at least a portion of the chemical liquid discharged from the processing chamber unit after being sprayed onto the substrate, and is used for supplying the circulating chemical liquid received in the circulating chemical liquid chamber to the chemical liquid spraying unit.

2. The substrate processing device according to claim 1, characterized in that: The chemical liquid ejecting unit includes an upper surface nozzle for ejecting the chemical liquid toward the upper surface of the substrate and a lower surface nozzle for ejecting the chemical liquid toward the lower surface of the substrate. The circulating chemical liquid supply unit supplies the circulating chemical liquid to the chemical liquid spraying unit so that the circulating chemical liquid is sprayed out through the lower surface nozzle.

3. The substrate processing device according to claim 2, characterized in that: The unused chemical liquid supply unit supplies the unused chemical liquid to the chemical liquid ejection unit so that the unused chemical liquid is ejected through the upper surface nozzle.

4. The substrate processing device according to claim 1, characterized in that: The unused liquid medicine supply unit includes a plurality of unused liquid medicine chambers. The unused chemical liquid is supplied from one of the plurality of unused chemical liquid chambers to the chemical liquid ejection portion.

5. The substrate processing apparatus according to claim 1, wherein: The circulating chemical liquid supply unit further includes a concentration sensor for determining whether the concentration of the circulating chemical liquid is within a preset reference concentration range.

6. The substrate processing device according to claim 5, characterized in that: When the concentration of the circulating chemical liquid measured by the concentration sensor is not within the reference concentration range, supply of the circulating chemical liquid from the circulating chemical liquid supply unit to the chemical liquid discharge unit is interrupted.

7. The substrate processing apparatus according to claim 5, characterized in that: It also includes a circulating drug liquid concentration correction unit, which supplies concentration correction drug liquid to the circulating drug liquid chamber to make the concentration of the circulating drug liquid fall within the reference concentration range when the concentration of the circulating drug liquid measured by the concentration sensor is not within the reference concentration range.

8. The substrate processing apparatus according to claim 1, wherein: The circulating chemical liquid supply unit further includes a constant temperature chamber, which receives the circulating chemical liquid received in the circulating chemical liquid chamber before it is supplied to the chemical liquid ejection unit, and maintains the temperature of the circulating chemical liquid within a preset reference temperature range.

9. The substrate processing apparatus according to claim 1, wherein: The circulating chemical liquid supply unit further includes a circulating chemical liquid water level detection unit including at least one water level detection sensor for measuring the water level of the circulating chemical liquid contained in the circulating chemical liquid chamber.

10. The substrate processing apparatus according to claim 9, wherein: When the water level of the circulating chemical liquid measured by the circulating chemical liquid water level detection unit is within a preset appropriate water level range, the circulating chemical liquid is supplied to the chemical liquid discharge unit.

11. The substrate processing apparatus according to claim 9, wherein: When the water level of the circulating chemical liquid measured by the circulating chemical liquid water level detection unit reaches a preset dangerous water level, the circulating chemical liquid is discharged from the circulating chemical liquid chamber, and the chemical liquid discharged from the processing chamber will not flow into the circulating chemical liquid chamber.

12. A substrate processing method, characterized in that: include: An unused chemical liquid ejecting step of supplying unused chemical liquid that has not been used in the process of processing the substrate from an unused chemical liquid chamber to a chemical liquid ejecting portion and ejecting the unused chemical liquid onto the substrate; A liquid medicine recovery step, wherein at least a portion of the liquid medicine discharged after being used in the processing of the substrate flows into a recycling liquid medicine chamber for storage; as well as The circulating chemical liquid discharge step supplies the circulating chemical liquid contained in the circulating chemical liquid chamber to the chemical liquid discharge unit and discharges the circulating chemical liquid toward the substrate.

13. The substrate processing method according to claim 12, characterized in that: In the circulating chemical liquid ejecting step, the circulating chemical liquid is ejected toward the lower surface of the substrate.

14. The substrate processing method according to claim 13, characterized in that: When the circulated chemical solution is sprayed toward the lower surface of the substrate, the unused chemical solution is sprayed toward the upper surface of the substrate.

15. The substrate processing method according to claim 12, characterized in that: Before the step of spraying the recycled drug liquid, the step of correcting the concentration of the recycled drug liquid is also included: when the concentration of the recycled drug liquid is not within a preset reference concentration range, the concentration of the recycled drug liquid is corrected so that the concentration of the recycled drug liquid is within the reference concentration range.

16. The substrate processing method according to claim 12, characterized in that: When the water level of the circulating chemical liquid contained in the circulating chemical liquid chamber is within a preset appropriate water level range, the circulating chemical liquid spraying step is performed.

17. The substrate processing method according to claim 12, characterized in that: The method also includes a circulating liquid medicine chamber discharge step: when the water level of the circulating liquid medicine reaches a preset dangerous water level, the circulating liquid medicine is discharged from the circulating liquid medicine chamber.

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