Shower head assembly and substrate processing apparatus

Abstract

The present invention relates to a showerhead assembly and a substrate processing apparatus, the showerhead assembly according to one embodiment of the present invention comprising: an upper plate; a gas distribution plate disposed below the upper plate and having a plurality of through holes formed therein; a spray plate which is disposed below the gas distribution plate and in which a gas spray hole connected to the through hole is formed; and a fastening unit for fastening the gas distribution plate and the spray plate, the fastening unit including a cam housed in the spray plate and a pinion gear housed in the gas distribution plate, the pinion gear being coupled to the cam by a rack gear inserted through a passage formed in the gas distribution plate.

Description

Technical Field

[0001] The present invention relates to a substrate processing device including a nozzle assembly, and more particularly to a nozzle assembly fastened by a cam, a rack and a pinion. Background Art

[0002] In a manufacturing processor for a semiconductor device or a liquid crystal display device, plasma is generated in a chamber that has been depressurized by a predetermined vacuum pressure, and the plasma is used as an example of a substrate to act on a semiconductor wafer or a glass substrate for a liquid crystal display device, thereby utilizing a substrate processing device that performs predetermined processes such as a vapor deposition process, an etching process, and an ashing process.

[0003] Generally, a showerhead assembly is provided in an apparatus for processing a substrate using plasma, and the showerhead assembly can be supplied with a gas required for a process and uniformly sprayed into a processing space inside a chamber.

[0004] Figure 1 This is a diagram schematically showing a conventional shower head assembly.

[0005] Reference Figure 1 , the conventional nozzle assembly 40 may include an upper plate 42, a gas distribution plate 44, and a spray plate 46. The upper plate 42 may be combined with the chamber 100, the gas distribution plate 44 may be disposed below the upper plate 42, and the spray plate 46 may be disposed below the gas distribution plate 44. The gas supplied by the gas supply unit 300 may be supplied to the processing space inside the chamber 100 through the nozzle assembly 40. In the nozzle assembly 40 constructed as above, the upper plate 42, the gas distribution plate 44, and the spray plate 46 may be fastened by fastening bolts 50. In such a nozzle assembly 40, in the case of the spray plate 46, according to the process using plasma, it is exposed to the plasma the most, and thus, degradation occurs, and therefore, periodic replacement is required.

[0006] In a conventional nozzle assembly 40, in order to replace the spray plate 46, the fastening bolts 50 between the chamber 100 and the upper plate 42 need to be loosened, and the fastening bolts 50 between the gas distribution plate 44 and the spray plate 46 need to be completely loosened before replacing the spray plate 46. Therefore, there is a disadvantage of a long replacement time. Summary of the invention

[0007] The present invention is intended to solve the conventional problems and to provide a substrate processing apparatus including an easily replaceable shower head assembly.

[0008] The problems to be solved by the present invention are not limited to the problems mentioned above, and those skilled in the art can clearly understand other problems not mentioned from the following description.

[0009] It may be that a nozzle assembly according to one embodiment of the present invention includes: an upper plate; a gas distribution plate, which is arranged below the upper plate and formed with a plurality of through holes; a spray plate, which is arranged below the gas distribution plate and formed with gas spray holes connected to the through holes; and a fastening unit, which is used to fasten the gas distribution plate and the spray plate, and the fastening unit includes a cam accommodated in the spray plate and a pinion accommodated in the gas distribution plate, and the pinion is combined with the cam by using a rack inserted through a passage formed in the gas distribution plate.

[0010] In one embodiment, the pinion gear may include: a pinion shaft; a bevel gear formed on one side of the pinion shaft; and a pin formed on the other side of the pinion shaft to penetrate the pinion shaft.

[0011] In one embodiment, the rack may be in the form of a toothed rod formed with a rack gear.

[0012] In one embodiment, the cam may include: a cylindrical body opened at the top; a hole cut in an oblique direction along the circumference of the cylindrical body; and a groove formed on the other side of the hole.

[0013] In one embodiment, the pinion gear may be rotated by the rack gear, and a pin formed on the pinion gear may move along the hole of the cam and be engaged with the groove portion.

[0014] In one embodiment, the cams may be provided in plurality radially with the center of the spray plate as a reference.

[0015] In one embodiment, the pinion gears may be provided in plurality radially with the center of the gas distribution plate as a reference.

[0016] In one embodiment, the pinion shaft may include: an elastic component; and a pinion holder for fixing the elastic component.

[0017] In one embodiment, the gas distribution plate may include a passage for movement of the rack.

[0018] It may be that a substrate processing device according to an embodiment of the present invention includes: a chamber having a processing space therein; a substrate supporting unit, which is arranged in the processing space and is used to support a substrate; a gas supply unit, which is used to supply the gas required for the process to the processing space; and a nozzle assembly, which is used to spray the supplied gas into the processing space; the nozzle assembly includes: an upper plate; a gas distribution plate, which is arranged below the upper plate and is formed with a plurality of through holes; a nozzle plate, which is arranged below the gas distribution plate and is formed with gas injection holes connected to the through holes; and a fastening unit, which is used to fasten the gas distribution plate and the nozzle plate, the fastening unit including a cam accommodated in the nozzle plate and a pinion accommodated in the gas distribution plate, the pinion being coupled to the cam by a rack inserted through a passage formed in the gas distribution plate.

[0019] In one embodiment, the substrate processing apparatus may include a plasma generating unit for generating plasma in the processing space.

[0020] In one embodiment, the upper plate may be fastened to the chamber by fastening bolts.

[0021] In one embodiment, the pinion gear may be formed on the gas distribution plate, and the cam may be formed on the spray plate.

[0022] In one embodiment, the pinion gear and the cam may be provided in plurality radially with the center of the gas distribution plate and the spray plate as reference.

[0023] It may be that a substrate processing device according to an embodiment of the present invention includes: a chamber having a processing space therein; a substrate supporting unit, which is arranged in the processing space and is used to support a substrate; a gas supply unit, which is used to supply the gas required for the process to the processing space; and a nozzle assembly, which is used to spray the supplied gas into the processing space; the nozzle assembly includes: an upper plate; a gas distribution plate, which is arranged below the upper plate and is formed with a plurality of through holes; a nozzle plate, which is arranged below the gas distribution plate and is formed with gas injection holes connected to the through holes; and a fastening unit, which is used to fasten the gas distribution plate and the nozzle plate, the fastening unit includes a cam accommodated in the nozzle plate and a pinion accommodated in the gas distribution plate, the pinion is combined with the cam by a rack inserted through a passage formed in the gas distribution plate, and the cam and the pinion are provided radially in plurality with the center of the nozzle plate and the gas distribution plate as a reference.

[0024] In one embodiment, the pinion gear may include: a pinion shaft; a bevel gear formed on one side of the pinion shaft; and a pin penetrating the pinion shaft on the other side of the pinion shaft.

[0025] In one embodiment, the pinion shaft may include: an elastic component; and a pinion holder for fixing the elastic component.

[0026] In one embodiment, the cam may include: a cylindrical body opened at the top; a hole cut in an oblique direction along the circumference of the cylindrical body; and a groove formed on the other side of the hole.

[0027] In one embodiment, the rack may be in the form of a toothed rod formed with a rack gear.

[0028] In one embodiment, the pinion gear may be rotated by the rack gear, and a pin formed on the pinion gear may move along the hole of the cam and be engaged with the groove portion.

[0029] Through the present invention, the cam, the rack and the pinion can be used to fasten the spray head assembly, thereby shortening the time for replacing the spray plate.

[0030] In addition, the fastening force of the nozzle assembly can be adjusted by using a cam, a rack and a pinion.

[0031] However, the effects of the present invention are not limited to the above-mentioned effects, and those skilled in the art can clearly understand other effects not mentioned from the following drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 This is a diagram schematically showing a conventional shower head assembly.

[0033] Figure 2 FIG. 1 is a diagram showing a substrate processing apparatus according to an embodiment of the present invention.

[0034] Figure 3 FIG. 1 is a diagram showing a nozzle assembly according to an embodiment of the present invention.

[0035] Figure 4 FIG. 1 is a diagram showing a gas distribution plate according to an embodiment of the present invention.

[0036] Figure 5 FIG. 1 is a diagram showing a shower plate according to an embodiment of the present invention.

[0037] Figure 6 FIG. 1 is a diagram showing a fastening unit according to an embodiment of the present invention.

[0038] Figure 7 FIG. 1 is a diagram showing a fastening mechanism of a fastening unit according to an embodiment of the present invention.

[0039] (Explanation of Reference Numerals)

[0040] 10: Substrate processing equipment

[0041] 100: Chamber

[0042] 200: Substrate support unit

[0043] 300: Gas supply unit

[0044] 400: Nozzle assembly

[0045] 500: Fastening unit

[0046] 600: Plasma generating unit

[0047] 700: Control unit DETAILED DESCRIPTION

[0048] Hereinafter, with reference to the attached drawings, the embodiments of the present invention will be described in detail so that a person with ordinary knowledge in the technical field to which the present invention belongs can easily implement it. However, the present invention can be implemented in various forms and is not limited to the embodiments described here.

[0049] When describing the embodiments of the present invention, when it is considered that a detailed description of a related well-known function or structure may unnecessarily obscure the gist of the present invention, the detailed description is omitted and the same symbols are used throughout the drawings for parts having similar functions and effects.

[0050] At least part of the terms used in the specification are defined in consideration of the functions of the present invention, and therefore may differ depending on the intentions of users and operators, conventions, etc. Therefore, the terms should be interpreted based on the entire content of the specification.

[0051] In addition, in this specification, unless otherwise specified, the singular also includes the plural. In the specification, when any constituent element is included, it means that other constituent elements may be included, rather than excluding other constituent elements, unless there is a special description to the contrary.

[0052] On the other hand, in the drawings, the size or shape of components, the thickness of lines, etc. are shown slightly exaggerated for the sake of convenience of explanation.

[0053] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. When describing with reference to the accompanying drawings, the same or corresponding components are given the same reference numerals regardless of the figure numbers, and repeated descriptions thereof are omitted.

[0054] Figure 2 FIG. 1 is a diagram showing a substrate processing apparatus according to an embodiment of the present invention.

[0055] Reference Figure 2The substrate processing apparatus 10 as an apparatus using plasma may include a chamber 100 , a substrate supporting unit 200 , a gas supply unit 300 , a showerhead assembly 400 , a plasma generating unit 600 , and a control unit 700 .

[0056] The chamber 100 has a processing space for performing a plasma process. The chamber 100 may be provided with an exhaust port 102 at its lower portion, and the exhaust port 102 may be connected to an exhaust line equipped with a pump P. The exhaust port 102 may exhaust reaction byproducts generated during the plasma process and gas remaining inside the chamber 100 to the outside of the chamber 100 through the exhaust line. In this case, the internal space of the chamber 100 may be decompressed to a predetermined pressure.

[0057] The chamber 100 may have an opening 104 formed in a side wall thereof. The opening 104 may function as a passage for the substrate W to enter and exit the chamber 100. The opening 104 may be configured to be opened and closed by a door assembly.

[0058] The substrate support unit 200 may be disposed in the lower area of ​​the chamber 100. The substrate support unit 200 may support the substrate W by electrostatic force. However, the present embodiment is not limited thereto, and the substrate W may be supported by various methods such as mechanical clamping, vacuum, etc.

[0059] The substrate support unit 200 may include a support body 210 and an electrostatic chuck 220 disposed above the support body 210. The electrostatic chuck 220 may be configured to electrostatically adsorb the substrate W, and may include a ceramic layer with an electrode.

[0060] Although not shown, a heating member and a cooling member may be provided inside the substrate support unit 200 to maintain the substrate W at a process temperature during the process. The heating member may be provided as a heating wire, and the cooling member may be provided as a cooling wire through which a coolant flows.

[0061] A support member 230 for supporting the support body 210 and the electrostatic chuck 220 may be provided below the support body 210. The support member 230 may have a cylindrical shape having a predetermined height and having a space therein.

[0062] The gas supply unit 300 can supply the gas required for the process to the processing space of the chamber 100. Such a gas supply unit 300 may include a gas supply source 302, a gas supply line 304, and a gas injection nozzle. The gas supply line 304 may connect the gas supply source 302 and the gas injection nozzle. A valve 306 may be provided on the gas supply line 304 to open or close its passage or to adjust the flow rate of the fluid flowing through its passage.

[0063] The gas supplied in the gas supply unit 300 may be supplied to the processing space of the chamber 100 through the showerhead assembly 400. The showerhead assembly 400 according to an embodiment of the present invention may be provided as a material including silicon. The showerhead assembly 400 will be described later.

[0064] The plasma generating unit 600 may generate plasma in the processing space of the chamber 100. Plasma may be formed in the upper region of the substrate supporting unit 200 in the chamber 100. According to an embodiment of the present invention, the plasma generating unit 600 may generate plasma in the processing space inside the chamber 100 using a capacitively coupled plasma (CCP) source.

[0065] However, the present embodiment is not limited thereto, and the plasma generating unit 600 may also use an inductively coupled plasma (ICP) source or a plasma source of other types such as a microwave to generate plasma in the processing space inside the chamber 100 .

[0066] The plasma generating unit 600 may include a high frequency power supply 602 and a matching device 604. The high frequency power supply 602 may supply high frequency power to any one of the upper electrode and the lower electrode in order to generate a potential difference between the upper electrode and the lower electrode. Here, the upper electrode may be the showerhead assembly 400, and the lower electrode may be the substrate supporting unit 200. The high frequency power supply 602 may be connected to the lower electrode, and the upper electrode may be grounded.

[0067] The control unit 700 can fully control the operation of the substrate processing apparatus 10 configured as described above. As an example, the control unit 700 can be a computer, which has a CPU (Central Process Unit), a RAM (Random Access Memory), a ROM (Read Only Memory), an auxiliary memory, etc. The CPU can operate based on the program or process conditions stored in the ROM or the auxiliary memory and control the overall operation of the substrate processing apparatus 10.

[0068] The control unit 700 according to an embodiment of the present invention may control the supply of gas required for a process to the processing space inside the chamber 100 and convert the gas supplied by the plasma generating unit 600 into plasma.

[0069] Figures 3 to 7 FIG. 1 is a diagram showing a nozzle assembly according to an embodiment of the present invention. Figure 3 is a cross-sectional view of the nozzle assembly. Figure 4 is a diagram showing a gas distribution plate, Figure 5is a diagram showing a spray plate, Figure 6 is a diagram of a fastening unit suitable for a nozzle assembly. In addition, Figure 7 is a diagram showing a fastening mechanism of the fastening unit.

[0070] Reference Figure 3 The showerhead assembly 400 may include an upper plate 420 , a gas distribution plate 440 , a shower plate 460 , and a fastening unit 500 .

[0071] The upper plate 420 may be closely disposed with the bottom surface of the chamber 100. The upper plate 420 according to an embodiment of the present invention may be fastened by the chamber 100 and the fastening bolts 50, and may be provided to supply the gas supplied in the gas supply unit 300 to the gas distribution plate 440 and the spray plate 460, and have a predetermined space inside the upper plate 420.

[0072] The gas distribution plate 440 may be disposed below the upper plate 420 and closely attached to the bottom surface of the upper plate 420. At this time, although not shown, the upper plate 420 and a fastening member may be used for fastening, but the invention is not limited thereto. The gas distribution plate 440 may be provided with a plurality of through holes 440a.

[0073] Figure 4 As a diagram showing the bottom surface of the gas distribution plate, the surface fastened to the shower plate is shown. Figure 4 , a receiving groove 442 may be formed in the gas distribution plate 440 according to an embodiment of the present invention so as to be able to receive the pinion 540 described later. A plurality of receiving grooves 442 may be provided radially with the center of the gas distribution plate 440 as a reference. According to an embodiment of the present invention, a bevel gear 541, a pinion shaft 542, an elastic member 544, and a pinion holder 545 may be provided in the gas distribution plate 440, and a pin 543 may be provided in a state protruding from the gas distribution plate 440. In addition, the gas distribution plate 440 may include a passage 444 for moving the rack 520 described later, and the passage 444 may be provided to be slightly larger than the size of the rack 520. An opening portion 446 connected to the passage 444 may be formed on the outer peripheral surface of the gas distribution plate 440.

[0074] The spray plate 460 may be disposed below the gas distribution plate 440. The spray plate 460 may have a circular plate shape. The spray plate 460 may be provided with a plurality of gas spray holes 460a connected to the through holes 440a formed in the gas distribution plate 440.

[0075] Figure 5 As a diagram showing the top surface of the shower plate, this is a diagram showing the surface fastened to the gas distribution plate. Figure 5The nozzle plate 460 according to one embodiment of the present invention may be formed with a receiving groove 462 to receive the cam 560 described later. The receiving groove 462 may be provided in plurality in a radial pattern with the center of the nozzle plate 460 as a reference.

[0076] The gas distribution plate 440 and the spray plate 460 according to an embodiment of the present invention may be fastened by using a fastening unit 500 . The fastening unit 500 according to an embodiment of the present invention may be a rack 520 , a pinion 540 , and a cam 560 .

[0077] Figure 6 (a) The rack 520 may be in the form of a rack rod 524 forming a rack gear 522. The rack gear 522 may also be formed on a portion of the rack rod 524 or on the entire surface of the rack rod 524. The rack 520 according to an embodiment of the present invention may be introduced into an opening portion 446 formed on the outer peripheral surface of the gas distribution plate 440 and move along the passage 444 inside the gas distribution plate 440. If the rack 520 is fully introduced into the gas distribution plate 440, a cover for fixing the rack 520 may be inserted into the opening portion 446 of the gas distribution plate 440.

[0078] Figure 6 (b) As the pinion 540, a bevel gear 541, a pinion shaft 542, a pin 543, an elastic component 544, and a pinion holder 545 may be included. The bevel gear 541 is provided on one side of the pinion shaft 542, and a pinion 543 formed by penetrating the pinion shaft 542 may be provided on the other side of the pinion shaft 542. An elastic component 544 may be provided on the pinion shaft 542, and the elastic component 544 is a spring according to one embodiment of the present invention, but is not limited thereto. According to the present invention, the receiving groove 442 of the gas distribution plate 440 may receive the bevel gear 541, the pinion shaft 542, and the elastic component 544, and the elastic component 544 may be fixed by the pinion holder 545. In the present invention, the elastic component 544 and the pinion holder 545 are shown separately, but are not limited thereto, and the elastic component 544 and the pinion holder 545 may be provided as a whole. In addition, a hole 545a for inserting the pinion 543 may be formed in the pinion holder 545, but the present invention is not limited thereto. As the bevel gear 541 rotates, a rotational force is provided to the pinion shaft 542, thereby rotating the pinion shaft 542. The size and shape of the pinion 540 can be changed. For example, the bevel gear 541 can have various shapes such as circular and semicircular as required.

[0079] Figure 6(c) The cam 560 has a cylindrical body 562 with an open top, and may include a hole 564 cut in an oblique direction along the circumference of the cylindrical body 562 with the open surface as a reference. A groove 566 may be formed at the end of the hole 564. The size of this cam 560 can be changed.

[0080] Figure 7 1 is a diagram showing a fastening mechanism of a fastening unit according to an embodiment of the present invention. Figure 7 (a), as described above, is a state where the pin 543 of the pinion 540 in the gas distribution plate 440 protrudes from the gas distribution plate 440, and therefore, a state where the pin 543 is engaged with the upper end portion of the hole 564 of the cam 560 formed in the spray plate 460 can be provided. If the rack 520 is introduced into the opening 446 formed on the outer peripheral surface of the gas distribution plate 440, the rack gear 522 of the rack 520 and the bevel gear 541 can be rotated in conjunction therewith. Figure 7 As shown in (b), as the bevel gear 541 rotates through the rack gear 522, the elastic member 544 formed on the pinion shaft 542 can be compressed and fixed by the pinion holder 545. The pin 543 formed on the pinion shaft 542 can move along the hole 564 to be formed in the cam 560 and be engaged with the groove portion 566. In this process, the rack 520 can be completely introduced into the passage 444 formed inside the gas distribution plate 440.

[0081] When a plurality of pinions 540 are radially provided on the gas distribution plate 440 as in one embodiment of the present invention, the rack 520 can be introduced into the opening 446 connected to the passage 444 formed inside the gas distribution plate 440 to rotate the bevel gear 541. Thus, one or more pinions 540 and the cam 560 can be fastened or released at a time, so that the time required for replacement of the spray plate 460 can be shortened.

[0082] According to the present invention, the fastening force between the gas distribution plate 440 and the spray plate 460 can be adjusted according to the size and form of the pinion 540, the type of the elastic member 544, and the size of the cam 560. In more detail, the fastening force between the gas distribution plate 440 and the spray plate 460 can be adjusted according to the number of rotations of the bevel gear 541, the type of the elastic member 544, and the length of the hole 564 formed in the cam 560 to which the pin 543 formed on the pinion shaft 542 is coupled.

[0083] As described above, the gas distribution plate and the spray plate of the spray head assembly can be fastened by using a cam, a rack and a pinion. In more detail, the cam can be provided on the spray plate, and the pinion can be provided on the gas distribution plate. The pinion can be coupled to the cam by a rack inserted through a passage formed in the gas distribution plate. Thus, the spray plate can be replaced by only releasing the connection between the gas distribution plate and the spray plate without releasing the fastening bolts that are coupled between the upper plate and the chamber, thereby shortening the time for replacing the spray plate.

[0084] In addition, a plurality of pinions and cams are provided radially with the center of the gas distribution plate and the spray plate as a reference. Therefore, one or more pinions can be fastened to the cam or released, thereby shortening the time required for replacing the spray plate. Moreover, when the gas distribution plate and the spray plate are fastened according to the size and form of the bevel gear provided to the pinion, the type of the elastic member, and the size of the cylindrical body of the cam, the fastening force can be adjusted.

[0085] The above description is only an example of the technical concept of the present invention. Anyone with common knowledge in the technical field to which the present invention belongs can make various modifications and deformations without departing from the essential characteristics of the present invention. Therefore, the embodiments recorded in the present invention are not intended to limit the technical concept of the present invention, but to illustrate the technical concept of the present invention, and the technical concept of the present invention is not limited to these embodiments. The protection scope of the present invention should be interpreted according to the attached claims, and all technical concepts within the equivalent scope should be interpreted as included in the scope of the rights of the present invention.

Claims

1. A nozzle assembly, characterized in that: include: upper plate; A gas distribution plate, disposed below the upper plate and formed with a plurality of through holes; a spray plate, disposed below the gas distribution plate and formed with gas spray holes connected to the through holes; as well as A fastening unit, used for fastening the gas distribution plate and the spray plate, The fastening unit includes a cam received in the spray plate and a pinion received in the gas distribution plate. The pinion gear is coupled to the cam using a rack inserted through a passage formed in the gas distribution plate.

2. The nozzle assembly according to claim 1, characterized in that: The pinion gear comprises: Pinion shaft; a bevel gear formed on one side of the pinion shaft; and A pin is formed on the other side of the pinion shaft so as to penetrate the pinion shaft.

3. The nozzle assembly according to claim 1, characterized in that: The rack is in the form of a toothed bar formed with a rack gear.

4. The nozzle assembly according to claim 1, characterized in that: The cam comprises: The main body is cylindrical and open at the top; a hole cut in an oblique direction along the circumference of the cylindrical body; and A groove portion is formed on the other side of the hole.

5. The nozzle assembly according to claim 4, characterized in that: The pinion is rotated by the rack, A pin formed on the pinion gear moves along the hole of the cam and is engaged with the groove portion.

6. The nozzle assembly according to claim 1, characterized in that: A plurality of cams are provided radially with the center of the spray plate as a reference.

7. The nozzle assembly according to claim 1, characterized in that: A plurality of pinions are provided radially with the center of the gas distribution plate as a reference.

8. The nozzle assembly according to claim 2, characterized in that: The pinion shaft comprises: elastic member; and The pinion holder is used to fix the elastic component.

9. The nozzle assembly according to claim 1, characterized in that: The gas distribution plate includes a passage for movement of the rack.

10. A substrate processing device, characterized in that: include: a chamber having a processing space therein; A substrate supporting unit, disposed in the processing space and used to support a substrate; A gas supply unit, used for supplying the gas required for the process to the processing space; as well as a spray head assembly for spraying the supplied gas into the processing space; The nozzle assembly comprises: upper plate; A gas distribution plate, disposed below the upper plate and formed with a plurality of through holes; a spray plate disposed below the gas distribution plate and having a gas spray hole connected to the through hole; and A fastening unit, used for fastening the gas distribution plate and the spray plate, The fastening unit includes a cam received in the spray plate and a pinion received in the gas distribution plate. The pinion gear is coupled to the cam using a rack inserted through a passage formed in the gas distribution plate.

11. The substrate processing apparatus according to claim 10, wherein: The substrate processing apparatus includes a plasma generating unit for generating plasma in the processing space.

12. The substrate processing apparatus according to claim 10, wherein: The upper plate is fastened to the chamber using fastening bolts.

13. The substrate processing apparatus according to claim 10, wherein: The pinion gear is formed on the gas distribution plate, The cam is formed on the spray plate.

14. The substrate processing apparatus according to claim 13, wherein: A plurality of the pinions and the cams are provided radially based on the centers of the gas distribution plate and the spray plate.

15. A substrate processing device, characterized in that: include: a chamber having a processing space therein; A substrate supporting unit, disposed in the processing space and used to support a substrate; A gas supply unit, used for supplying the gas required for the process to the processing space; as well as a spray head assembly for spraying the supplied gas into the processing space; The nozzle assembly comprises: upper plate; A gas distribution plate, disposed below the upper plate and formed with a plurality of through holes; a spray plate disposed below the gas distribution plate and having a gas spray hole connected to the through hole; and A fastening unit, used for fastening the gas distribution plate and the spray plate, The fastening unit includes a cam received in the spray plate and a pinion received in the gas distribution plate. The pinion gear is coupled to the cam using a rack inserted through a passage formed in the gas distribution plate, A plurality of the cams and the pinions are provided radially with the centers of the spray plate and the gas distribution plate as reference.

16. The substrate processing apparatus according to claim 15, wherein: The pinion gear comprises: Pinion shaft; a bevel gear formed on one side of the pinion shaft; and A pin penetrates the pinion shaft at the other side of the pinion shaft.

17. The substrate processing apparatus according to claim 16, wherein: The pinion shaft comprises: elastic member; and The pinion holder is used to fix the elastic component.

18. The substrate processing apparatus according to claim 15, wherein: The cam comprises: The main body is cylindrical and open at the top; a hole cut in an oblique direction along the circumference of the cylindrical body; and A groove portion is formed on the other side of the hole.

19. The substrate processing apparatus according to claim 15, wherein: The rack is in the form of a toothed bar formed with a rack gear.

20. The substrate processing apparatus according to claim 18, wherein: The pinion is rotated by the rack, A pin formed on the pinion gear moves along the hole of the cam and is engaged with the groove portion.

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