Cleaning throttle valve and foreline using microwave source

Abstract

An exemplary semiconductor processing system may include a processing chamber defining a processing region. The system may include a foreline coupled with the processing chamber, the foreline defining a fluid conduit. The system may include a radical generator having an inlet and an outlet. The outlet may be fluidly coupled with the foreline. The system may include a gas source fluidly coupled with an inlet of the radical generator. The system may include a throttle valve coupled with the foreline downstream of the radical generator.

Description

Technical Field

[0001] The present technology relates to components and equipment for manufacturing semiconductors. More particularly, the present technology relates to processing chamber components and other semiconductor processing equipment.

[0002] background

[0003] The fabrication of integrated circuits is made possible by processes that produce layers of material with intricate patterns on the surface of a substrate. Producing patterned material on a substrate requires controlled methods for forming and removing materials. Precursors are typically delivered to a processing area and distributed to uniformly deposit or etch material on a substrate. Many aspects of a processing chamber can affect process uniformity, such as uniformity of process conditions within the chamber, uniformity of flow through the component, and other process and component parameters. Even small differences in the substrate can affect the formation or removal process.

[0004] Therefore, there is a need for improved systems and methods to produce high quality devices and structures. These and other needs are addressed by the present technology.

[0005] Overview

[0006] An exemplary semiconductor processing system may include a processing chamber defining a processing region. The system may include a foreline coupled to the processing chamber, the foreline defining a fluid conduit. The system may include a free radical generator having an inlet and an outlet. The outlet may be fluidly coupled to the foreline. The system may include a gas source fluidly coupled to the inlet of the free radical generator. The system may include a throttle valve coupled to the foreline downstream of the free radical generator.

[0007] In some embodiments, the free radical generator may include a microwave free radical generator. The free radical generator may be located near the throttle valve. The gas source may include a gas panel. The gas source may include a remote plasma source. The system may include a cooling line coupled to the free radical generator. During operation of the free radical generator, the pressure in the processing chamber is greater than the pressure in the foreline. The foreline may include a J-shaped pipe, the J-shaped pipe defining a first inlet, an outlet and a second inlet, the second inlet being disposed at a bend in the J-shaped pipe. The free radical generator may be coupled to the second inlet.

[0008] Some embodiments of the present technology may encompass semiconductor processing systems. The system may include a processing chamber defining a processing region. The system may include a foreline coupled to the processing chamber. The foreline may define a fluid conduit. The system may include a free radical generator fluidly coupled to the foreline. The system may include a throttle valve coupled to the foreline downstream of the free radical generator.

[0009] In some embodiments, the system may include a gas source, the gas source is coupled to the inlet fluid of the free radical generator. The gas source may include a gas panel. During operation of the free radical generator, the pressure in the processing chamber is greater than the pressure in the foreline. The system may include at least one cooling line, at least one cooling line coupled to the cooling fluid source. The free radical generator may include a fluid inlet and a fluid outlet. At least one cooling line is fluidly coupled to the fluid inlet and the fluid outlet. The free radical generator may include an RF free radical generator or a microwave free radical generator. The foreline may include a J-shaped pipe, the J-shaped pipe defining a first inlet, an outlet and a second inlet, the second inlet being disposed at a bend of the J-shaped pipe. The free radical generator may be coupled to the second inlet.

[0010] Some embodiments of the present technology may include a method of cleaning a throttle valve. The method may include flowing a first gas into a processing chamber. The method may include exhausting the first gas from the processing chamber into a foreline. The method may include flowing a second gas to a free radical generator, the free radical generator coupled to the foreline. The method may include generating a plasma of the second gas within the free radical generator. The method may include flowing a third gas through the free radical generator to force free radicals of the plasma into the foreline. The method may include flowing the first gas, the second gas, and the third gas through a throttle valve, the throttle valve coupled to the foreline downstream of the free radical generator.

[0011] In some embodiments, the first gas may include a precursor for generating plasma. The first gas may include an inert gas or a cleaning gas. The flow rate of the first gas may be greater than the flow rate of the third gas and the flow rate of the second gas. The plasma may include a capacitively coupled microwave plasma.

[0012] This technology can provide several benefits over conventional systems and techniques. For example, embodiments of the present technology can utilize locally generated plasma radicals to actively clean residues that have been deposited in the foreline and / or throttle valve. In addition, the components can allow modification to accommodate any number of chambers or processes. These and other embodiments (and many of their advantages and features) are described in more detail in conjunction with the following description and accompanying drawings.

[0013] BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The nature and advantages of the disclosed technology may be further understood by referring to the remaining portions of the specification and the accompanying drawings.

[0015] Figure 1 A top view of an exemplary processing system according to some embodiments of the present technology is shown.

[0016] Figure 2 A schematic cross-sectional view of an exemplary plasma system according to some embodiments of the present technology is shown.

[0017] Figure 3 A schematic cross-sectional view of an exemplary processing chamber according to some embodiments of the present technology is shown.

[0018] Figure 4 A schematic isometric view of an exemplary foreline assembly is shown in accordance with some embodiments of the present technology.

[0019] Figure 5 Operation of an exemplary method of cleaning a throttle valve in accordance with some embodiments of the present technology is shown.

[0020] Several of the drawings are included as schematic diagrams. It should be understood that the drawings are for illustration purposes and should not be considered to be in actual size proportions unless specifically stated to be so. Furthermore, as schematic diagrams, the drawings are provided to aid understanding and may not include all aspects or information as compared to actual presentation and may include content that is exaggerated for illustration purposes.

[0021] In the drawings, similar components and / or features may have the same reference numeral. Furthermore, components of the same type may be distinguished by a letter following the reference numeral, which distinguishes similar components. If only the first reference numeral is used in the specification, the description thereof may apply to any of the similar components having the same first reference numeral, regardless of the suffix letter.

[0022] Specific description

[0023] Plasma enhanced deposition processes may energize one or more component precursors to facilitate film formation on a substrate. Any number of material films may be produced to develop semiconductor structures, including conductive and dielectric films, as well as films that facilitate material transfer and removal. For example, a hard mask film may be formed to facilitate patterning of a substrate while protecting underlying materials to be retained by other means. In many process chambers, a number of precursors may be mixed in a gas panel and delivered to a processing area of ​​the chamber, where a substrate may be located. While components of the cover stack may affect the flow distribution into the process chamber, many other process variables may similarly affect the uniformity of deposition.

[0024] Precursors and / or other process gases are typically exhausted from the chamber through multiple forelines. The pressure and fluid conductivity of the exhaust gas can be controlled by one or more throttle valves connected to the forelines. As the precursors pass through the forelines and throttle valves, free radicals from the precursors impact the interior of the forelines and throttle valves, causing residues to be deposited on the forelines and throttle valves. This can be particularly problematic for temperature-sensitive deposition processes, as large temperature differences between the processing area and the forelines / throttle valves can cause deposition rates within the forelines and / or throttle valves to be significantly higher than deposition rates in the processing area. As these residues accumulate within the throttle valve, the cross-sectional area of ​​the throttle valve flow path is reduced, effectively changing the flow conductance through the throttle valve, causing the throttle valve to drift. For example, over time, the accumulation of residues requires the throttle valve to open to a greater degree (drift) to maintain the desired flow conductance because the cross-sectional area of ​​the flow path is reduced. This throttle drift changes the cross-sectional area of ​​the flow path associated with each angle of the throttle, and over time, the throttle needs to be opened to a greater angle to account for the reduction in conductance and the change in gas pressure flowing through the throttle. At greater angles, the throttle becomes more difficult to control to provide precise conductance and fluid pressure.

[0025] Typically, to combat the effects of throttle valve drift, the foreline and throttle valve must be flushed with a high temperature purge gas (e.g., NF3) to remove residues and clean the surfaces of the throttle valve. However, these high temperature purge gases can be harmful to chamber components. Therefore, conventional systems must carefully balance the need to reverse and / or reduce throttle valve drift with the need to minimize exposure of chamber components to such high temperature purge gases.

[0026] The present technology overcomes these challenges by coupling a radical generator to the foreline, typically near the throttle valve. The radical generator can generate plasma radicals that can clean residues deposited within the foreline and / or throttle valve. Cleaning radicals can be generated during deposition operations, during chamber cleaning operations, and / or during idle chamber time. This can help clean the throttle valve while not impacting the throughput of the processing chamber. Thus, the present technology can reduce the occurrence of throttle valve drift and reduce (or eliminate) the need for high temperature purge of the throttle valve.

[0027] Although the remainder of the disclosure will routinely identify specific deposition processes utilizing the disclosed techniques, it will be readily appreciated that the systems and methods are equally applicable to other deposition and cleaning chambers, and processes that may occur in the chambers. Therefore, the techniques should not be considered limited to use with only these specific cleaning processes or chambers. Prior to describing additional variations and adjustments to the system in accordance with embodiments of the present technology, the present disclosure will discuss a possible system and chamber that may include a cover stack assembly in accordance with embodiments of the present technology.

[0028] Figure 1 A top plan view of one embodiment of a processing system 100 having deposition, etching, baking and curing chambers according to an embodiment is shown. In the figure, a pair of front-opening standard chambers 102 supply substrates of various sizes, which are received by a robot 104 and placed into a low pressure holding area 106 before being placed into one of the substrate processing chambers 108a-f located in the tandem sections 109a-c. A second robot 110 may be used to transport substrate wafers back and forth between the holding area 106 and the substrate processing chambers 108a-f. Each substrate processing chamber 108a-f may be configured to perform a variety of substrate processing operations, including forming stacks of semiconductor materials as described herein, as well as plasma enhanced chemical vapor deposition, atomic layer deposition, physical vapor deposition, etching, pre-cleaning, degassing, guiding, and other substrate processing including annealing, ashing, etc.

[0029] The substrate processing chambers 108a-f may include one or more system components to deposit, anneal, cure, and / or etch dielectric or other films on a substrate. In one configuration, two pairs of processing chambers (e.g., 108c-d and 108e-f) may be used to deposit dielectric material on a substrate, and a third pair of processing chambers (e.g., 108a-b) may be used to etch the deposited dielectric. In another configuration, all three pairs of chambers (e.g., 108a-f) may be configured to etch dielectric films on a substrate. Any one or more of the described processes may be performed in one or more chambers separate from the manufacturing system illustrated in the various embodiments. It will be appreciated that the system 100 contemplates additional configurations of chambers for deposition, etching, annealing, and curing of dielectric films.

[0030] Figure 2 A schematic cross-sectional view of an exemplary plasma system 200 according to some embodiments of the present technology is shown. The plasma system 200 can show a pair of processing chambers 108 that can be assembled in one or more of the series sections 109 described above and can include panels or other components or assemblies according to embodiments of the present technology. The plasma system 200 can generally include a chamber body 202 having sidewalls 212, a bottom wall 216, and an inner sidewall 201 that define a pair of processing regions 220A and 220B. Each processing region 220A-220B can be similarly configured and can include the same components.

[0031] For example, the processing region 220B (components of the processing region 220B may also be included in the processing region 220A) may include a pedestal 228 disposed in the processing region through a channel 222 formed in the bottom wall 216 in the plasma system 200. The pedestal 228 may provide a heater adapted to support a substrate 229 on an exposed surface (e.g., a body portion) of the pedestal. The pedestal 228 may include a heating element 232, such as a resistive heating element, which may heat and control the temperature of the substrate at a desired processing temperature. The pedestal 228 may also be heated by a remote heating element such as a lamp assembly or any other heating device.

[0032] The body of the base 228 can be coupled to the rod 226 by the flange 233. The rod 226 can electrically couple the base 228 to an electrical outlet or power box 203. The power box 203 can include a drive system that controls the elevation and movement of the base 228 within the processing area 220B. The rod 226 can also include an electrical interface to provide power to the base 228. The power box 203 can also include an interface for electrical power and a temperature indicator, such as a thermocouple interface. The rod 226 can include a base assembly 238 suitable for removably coupling with the power box 203. A circumferential ring 235 is shown above the power box 203. In some embodiments, the circumferential ring 235 can be a shoulder suitable for acting as a mechanical stop or platform, and the shoulder is configured to provide a mechanical interface between the base assembly 238 and the upper surface of the power box 203.

[0033] Rods 230 may be included via channels 224 formed in the bottom wall 216 of the processing region 220B and may be used to position substrate lift pins 261 disposed through the body of the pedestal 228. The substrate lift pins 261 may selectively space the substrate 229 from the pedestal to facilitate replacement of the substrate 229 by a robot for transferring the substrate 229 into and out of the processing region 220B through the substrate transfer port 260.

[0034] The chamber lid 204 can be coupled to the top of the chamber body 202. The lid 204 can house one or more precursor distribution systems 208 coupled to the lid 204. The precursor distribution system 208 can include a precursor inlet channel 240 that can deliver reactants and cleaning precursors through a gas delivery assembly 218 into the processing region 220B. The gas delivery assembly 218 can include a gas box 248 having a baffle plate 244 disposed between a face plate 246. A radio frequency ("RF") source 265 can be coupled to the gas delivery assembly 218, and the RF source 265 can power the gas delivery assembly 218 to facilitate the generation of a plasma region between the face plate 246 and the pedestal 228 of the gas delivery assembly 218, which can be a processing region of the chamber. In some embodiments, the RF source can be coupled to other portions of the chamber body 202, such as the pedestal 228, to facilitate the generation of the plasma. A dielectric isolator 258 may be disposed between the cover 204 and the gas delivery assembly 218 to prevent conduction of RF power to the cover 204. A shadow ring 206 may be disposed on the periphery of the base 228 that engages the base 228.

[0035] An optional cooling channel 247 may be formed in the gas box 248 of the gas distribution system 208 to cool the gas box 248 during operation. A heat transfer fluid, such as water, glycol, gas, etc., may be circulated through the cooling channel 247 so that the gas box 248 may be maintained at a predetermined temperature. The chamber liner assembly 227 is disposed within the processing region 220B and in close proximity to the sidewalls 201, 212 of the chamber body 202 to prevent the sidewalls 201, 212 from being exposed to the processing environment within the processing region 220B. The liner assembly 227 may include a circumferential pumping cavity 225 coupled to a pumping system 264, the circumferential pumping cavity 225 being configured to exhaust gas and byproducts from the processing region 220B and control the pressure within the processing region 220B. A plurality of exhaust ports 231 may be formed on the chamber liner assembly 227. The exhaust port 231 is configured to allow gas to flow from the processing region 220B to the circumferential pumping cavity 225 in a manner that enhances processing within the system 200 .

[0036] Figure 3 A schematic partial cross-sectional view of an exemplary processing system 300 is shown in accordance with some embodiments of the present technology. Figure 3Further details may be described regarding components in system 200. System 300 is understood to include any features or aspects of system 200 previously discussed in some embodiments. System 300 may be used to perform semiconductor processing operations, including deposition of hard mask materials as previously described, as well as other deposition, removal, and cleaning operations. System 300 may show a partial view of the chamber component being discussed, which may be incorporated into a semiconductor processing system, and may show a view through the center of a panel, which may also be of any other size and contain any number of holes. Those skilled in the art will readily appreciate that any aspect of system 300 may also be incorporated into other processing chambers or systems.

[0037] The system 300 may include a processing chamber including a panel 305 through which precursors may be delivered for processing and may be coupled to a power source to generate a plasma within a processing region of the chamber. The chamber may also include a chamber body 310, which may include sidewalls and a bottom as shown. As previously described, a pedestal or substrate support 315 may extend through the bottom of the chamber. The substrate support 315 may include a support plate 320 that may support a semiconductor substrate. The support plate 320 may be coupled to a shaft 325 that may extend through the bottom of the chamber.

[0038] The panel 305 may be supported directly or indirectly by the chamber body 310. As just one example, the panel 305 may be supported on top of a pumping pad 330 and / or an isolator or other pad 335. For example, the pumping pad 330 may be seated on a baffle formed by the top of the chamber body 310, with additional pads 335 and / or the panel 305 seated on top of the pumping pad 330. The pumping pad 330 may define one or more exhaust ports 340 that enable gas to flow from the processing region to one or more forelines 350 coupled to the processing chamber. For example, each exhaust port 340 may be fluidly coupled to the top end of one or more exhaust lumens 345 formed in the sidewalls and / or bottom of the chamber body 310. Although the exhaust lumens 345 extending through the sidewalls are shown, it should be understood that other arrangements are possible in various embodiments. The bottom end of the exhaust lumen 345 may be coupled to a corresponding foreline 350. Each foreline 350 may define a fluid conduit for flowing process gases out of the processing chamber and directing the process gases through a throttle valve 355 , which may control fluid conductance through the foreline 350 .

[0039] The foreline 350 can be coupled to a free radical generator 360, which can be disposed near the inlet of the throttle valve 355. The free radical generator 360 can include at least one inlet 365 connected to a gas source 375, which can supply one or more gases to the free radical generator 360. In some embodiments, the gas source 375 can be a remote plasma unit that delivers gas to the processing chamber. For example, a transfer line can be included to allow a portion of the gas from the remote plasma unit to bypass the chamber and enter the free radical generator 360. In other embodiments, the free radical generator 360 can include a dedicated gas source 375. For example, the gas source 375 can include one or more gas rods from a gas panel, and the gas rods have one or more fluid delivery lines that introduce gas from the gas source 375 to the inlet 365 of the free radical generator 360. An outlet 370 of the radical generator 360 may be fluidly coupled to the foreline 350 upstream of the throttle valve 355 such that any gas and / or plasma exiting the outlet 370 passes through the throttle valve 355 .

[0040] In certain embodiments, each foreline 350 may be and / or include a J-shaped conduit 357 including a first inlet and an outlet, and a second inlet disposed at a bend and / or other intermediate location of the J-shaped conduit 357, i.e., disposed between the first inlet and the outlet. The first inlet may be coupled to an inlet portion of the foreline 350 and / or one of the exhaust lumens 345, and the outlet may be coupled to an outlet portion of the foreline 350 and / or a throttle valve 355. The second inlet may be coupled to an outlet 370 of a free radical generator 360, such that the throttle valve 355 is disposed downstream of the free radical generator 360. Although shown with the J-shaped conduit 357, it should be understood that other embodiments may utilize other foreline configurations to fluidly couple the free radical generator 360 proximate to and upstream of the throttle valve 355.

[0041] The free radical generator 360 can take various forms. For example, the free radical generator 360 can be a microwave free radical generator, an RF free radical generator, or other free radical generators. In a specific embodiment, the free radical generator 360 can be a microwave free radical generator that uses a magnetron to generate microwave energy, which can then be brought to a hollow coaxial electrode through a coaxial waveguide. The microwave power can be coupled into the plasma gas through the electrode capacitance. Due to the use of a microwave free radical generator instead of an RF free radical generator, a smaller free radical generator can be used. In addition, a microwave free radical generator can generate a greater number of free radicals per unit power, which can enable the use of a lower power level to generate enough free radicals to effectively clean the foreline 350 and / or the throttle valve 355.

[0042] In some embodiments, the free radical generator 360 may include a fluid inlet 380 and a fluid outlet 385, which may be fluidically coupled to a cooling fluid source 390 via one or more cooling lines 395. A cooling fluid source 390, such as a process cooling water source, may supply a circulating fluid to the fluid inlet 380 of the free radical generator 360 via the fluid line 395. In this way, a heat transfer path may be established that may reduce the temperature of at least a portion of the free radical generator 360. For example, the free radical generator 360 may include circuitry that controls the operation of the free radical generator 360. This circuitry, typically near the fluid inlet 380 and / or the fluid outlet 385, may need to be maintained at or below a predetermined temperature to ensure that the circuitry continues to operate as designed. The predetermined temperature may vary based on the free radical generator 360, but may typically be less than or about 100° C., less than or about 90° C., less than or about 80° C., less than or about 75° C., less than or about 70° C., or less. In order to maintain the temperature of the circuit system at such a level, a cooling fluid, which may be water, ethylene glycol and / or other coolant, may be provided at a temperature of less than or approximately 100°C, less than or approximately 90°C, less than or approximately 80°C, less than or approximately 75°C, less than or approximately 70°C, less than or approximately 65°C, less than or approximately 60°C, less than or approximately 55°C, less than or approximately 50°C, or lower.

[0043] Although discussed primarily in the context of placing a radical generator near a throttle valve, it should be understood that the invention is not so limited. Embodiments of the invention may implement a radical generator anywhere within a processing system where localized cleaning is desired. For example, a specific chamber / system component may be identified as being able to benefit from cleaning using locally generated radicals, and a radical generator may be connected close to the component interface at a location upstream of the component so that any plasma radicals generated can reach the desired component before the lifetime of the radicals expires.

[0044] Figure 4 A schematic isometric view of an exemplary foreline assembly 400 according to some embodiments of the present technology is shown. The foreline assembly 400 can be included in any chamber or system previously described, as well as any other chamber or system that can benefit from insertion. For example, the foreline assembly 400 can include components similar to the foreline 350 and the free radical generator 360 and can include components related to Figure 3Any of the features described in these features. For example, the foreline assembly 400 may include at least a portion of one or more forelines 405. Each foreline 405 may include an inlet 410 and an outlet 415, wherein the inlet 410 may be directly or indirectly coupled to an exhaust lumen (e.g., exhaust lumen 345) of the processing chamber, and the outlet 415 may be directly or indirectly coupled to a throttle valve (e.g., throttle valve 355). In some embodiments, each foreline 405 may be in the form of a J-shaped pipe, and the foreline 405 includes an additional inlet 420 disposed at an elbow or other intermediate position of the J-shaped pipe. The additional inlet 420, which may be located downstream of the inlet 410 and upstream of the outlet 415, may be coupled to a free radical generator 425.

[0045] The free radical generator 425 can be similar to the free radical generator 360 and can include any of the features described with respect to the free radical generator 360. For example, the free radical generator 425 can include at least one inlet 430 that can be coupled to a gas source, such as the gas source 375. For example, the inlet 430 can include a gas weldment that can be coupled to a gas panel to transfer gas from the gas panel to the free radical generator 425. An outlet 435 of the free radical generator 425 can be fluidly coupled to the foreline 405 upstream of the outlet 415 so that any gas and / or plasma generated by and / or passing through the free radical generator 425 exits the outlet 415. In some embodiments, the free radical generator 425 may include a fluid inlet 440 and a fluid outlet 445, which may be fluidically coupled to a cooling fluid source (e.g., cooling fluid source 390), which may be used to circulate cooling fluid to the free radical generator 425 to cool the circuit system and / or other electrical components of the free radical generator 425.

[0046] Figure 5 Operations of an exemplary method 500 for cleaning a throttle valve according to some embodiments of the present technology are shown. The method can be performed in various processing chambers, including the processing systems 200 and / or 300 described above, which may include forelines and / or free radical generators according to embodiments of the present technology, such as forelines 350, 405 and / or free radical generators 360 and / or 425. The method 500 may include a number of optional operations that may or may not be specifically related to some specific embodiments of the method according to the present technology.

[0047] The method may include optional operations before the method 500 is started, or the method may include additional operations. For example, the method 500 may include operations performed in a different order than that shown. The method 500 may include flowing a first gas into the processing chamber at operation 505. The first gas may generate a positive flow through the processing chamber and, when exhausted, through the foreline. The first gas may be a precursor to generate plasma, an inert gas, a cleaning gas, and / or other gas. For example, if the throttle valve is cleaned during a deposition operation, the first gas may be a processing gas, such as but not limited to a precursor to generate plasma. If the throttle valve is cleaned during a chamber cleaning process, the first gas may be a cleaning gas and / or a plasma generating gas that generates plasma radicals, which are used to clean residues from chamber components. If the throttle valve is cleaned during an idle period of the chamber (i.e., not during a processing operation or a cleaning operation), the first gas may be an inert gas that flows only to generate a positive flow and pressure in the foreline.

[0048] In operation 510, the method may include exhausting a first gas from a processing chamber into a foreline. While the first gas flows through the foreline, the method 500 may include flowing a second gas to a radical generator coupled to the foreline in operation 515. In operation 520, a plasma of the second gas may be generated in the radical generator. The flow of the second gas and the generation of plasma radicals may be adjusted based on a desired throttle angle (and a current throttle angle). In other words, the generation of radicals may be based on the amount of residues that need to be cleaned to achieve the desired throttle angle. In some embodiments, the second gas may include a plasma generating gas for cleaning operations, such as argon. After striking the plasma, a third gas may flow through the radical generator in operation 525 to force the radicals of the plasma into the foreline. In a particular embodiment, the third gas may include a mixture of argon, NF3, and O2, however many other gases may be used as the third gas. The flow rate of the first gas may be greater than the flow rates of the second gas (and free radicals) and the third gas, so that the first gas, the second gas (and free radicals), and the third gas flow downstream of the free radical generator and are connected to the foreline through the throttle valve. The flowing free radicals can then react with residues deposited on the foreline and / or the throttle valve to help remove residues from the surface of the component. In order to ensure that the flow rate of the first gas is greater than the flow rates of the second and third gases, the volume and / or rate of the first gas may be greater than the combined rate and / or volume of the second and third gases, which can maintain a positive pressure flow through the foreline in the direction of the throttle valve and can help prevent backflow of the second and third gases. By preventing backflow, embodiments can help deliver plasma radicals to the throttle valve before the end of the life of the free radicals, which can help improve the cleaning efficiency of the free radicals.

[0049] As described above, in some embodiments, the cleaning method can be performed during a processing operation of the processing chamber. In this case, the flow of the first gas can include flowing one or more precursors or other processing gases into the processing chamber before the precursor is delivered to the processing area of ​​the processing chamber, such as through one or more of a gas box, a baffle or a panel. Plasma can be generated by the precursor in the processing area, such as by providing RF power to the panel to generate plasma and / or plasma generated by a remote plasma unit can be delivered to the processing area. The material formed in the plasma can be deposited on the substrate. The precursor (i.e., the first gas) can be discharged from the processing chamber via a foreline, wherein the first gas flow is mixed with the second and third gas flows before passing through the throttle valve.

[0050] In some embodiments, method 500 can be performed to clean components other than a throttle valve. For example, one or more components can be identified as benefiting from a targeted cleaning operation. One or more free radical generators can be connected to the gas flow path upstream and near the one or more components. A positive gas flow can be introduced into the flow path upstream of the free radical generator, and then a plasma can be generated in the free radical generator. A third gas can flow through the free radical generator to push plasma radicals into the flow path and downstream to the one or more components.

[0051] In the above description, for the purpose of explanation, various details are set forth in order to provide a thorough understanding of various embodiments of the present technology. However, it will be apparent to those skilled in the art that the practice of a particular embodiment may not require some of these specific details (or may require additional details).

[0052] After several embodiments have been disclosed, it will be understood by those skilled in the art that various modifications, alternative structures, and equivalent scopes may be used without departing from the spirit of the disclosed embodiments. In addition, some well-known processes and elements are not described to avoid unnecessarily obscuring the present technology. Therefore, the above description should not be considered to limit the scope of the technology.

[0053] Where a range of values ​​is provided, it is understood that, unless the context clearly dictates otherwise, each intermediate value between the upper and lower limits of the range is also specifically disclosed, to the smallest fraction of the lower limit unit. Any narrower range between any stated value or unstated intervening value in the range and any other stated or intervening value in the range is included. The upper and lower limits of these smaller ranges may be independently included or excluded in this range, and each range in the smaller range that includes one, both, or neither of the upper and lower limits is also included in the present technology, and is subject to any specifically excluded limitations in the stated range. When the stated range includes one or both of the upper and lower limits, the range that excludes either or both of these upper and lower limits is also included.

[0054] As used in the specification and the appended claims, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to "a well" includes a plurality of such wells and reference to "the plate" includes reference to one or more plates and equivalents thereof known to those skilled in the art, and so forth.

[0055] Furthermore, the words “comprise(s)”, “comprising”, “contain(s)”, “containing”, “include(s)” and “including” as used in the present specification and the following claims are meant to specify the presence of stated features, integers, components, or operations, but they do not exclude the presence or addition of one or more other features, integers, components, operations, steps, or groups.

Claims

1. A semiconductor processing system comprising: a processing chamber defining a processing area; a foreline coupled to the processing chamber, the foreline defining a fluid conduit; a free radical generator having an inlet and an outlet, wherein the outlet is fluidically coupled to the foreline; a gas source fluidly coupled to the inlet of the free radical generator; and A throttle valve is coupled to the foreline downstream of the free radical generator.

2. The semiconductor processing system of claim 1, wherein: The free radical generator comprises a microwave free radical generator.

3. The semiconductor processing system of claim 1, wherein: The free radical generator is located near the throttle valve.

4. The semiconductor processing system of claim 1, wherein: The gas source includes a gas panel.

5. The semiconductor processing system of claim 1, wherein: The gas source comprises a remote plasma source.

6. The semiconductor processing system of claim 1, further comprising: A cooling line is coupled to the free radical generator.

7. The semiconductor processing system of claim 1, wherein: During operation of the free radical generator, the pressure in the processing chamber is greater than the pressure in the foreline.

8. The semiconductor processing system of claim 1, wherein: The foreline includes a J-shaped pipe, the J-shaped pipe defines a first inlet, an outlet, and a second inlet, the second inlet is disposed at a bend of the J-shaped pipe; and The free radical generator is coupled to the second inlet.

9. A semiconductor processing system comprising: a processing chamber defining a processing area; a foreline coupled to the processing chamber, the foreline defining a fluid conduit; a free radical generator, the free radical generator being fluidically coupled to the foreline; and A throttle valve is coupled to the foreline downstream of the free radical generator.

10. The semiconductor processing system of claim 9, further comprising: A gas source is coupled to the inlet of the free radical generator.

11. The semiconductor processing system of claim 10, wherein: The gas source includes a gas panel.

12. The semiconductor processing system of claim 9, wherein: During operation of the free radical generator, the pressure in the processing chamber is greater than the pressure in the foreline.

13. The semiconductor processing system of claim 9, further comprising: at least one cooling line coupled to a cooling fluid source, wherein: The free radical generator comprises a fluid inlet and a fluid outlet; and The at least one cooling line is fluidly coupled to the fluid inlet and the fluid outlet.

14. The semiconductor processing system of claim 9, wherein: The free radical generator comprises an RF free radical generator or a microwave free radical generator.

15. The semiconductor processing system of claim 9, wherein: The foreline includes a J-shaped pipe, the J-shaped pipe defines a first inlet, an outlet, and a second inlet, the second inlet is disposed at a bend of the J-shaped pipe; and The free radical generator is coupled to the second inlet.

16. A method for cleaning a throttle valve, the method comprising the following steps: flowing a first gas into the processing chamber; exhausting the first gas from the processing chamber into a foreline; flowing a second gas to a free radical generator coupled to the foreline; generating a plasma of the second gas in the free radical generator; flowing a third gas through the radical generator to force radicals of the plasma into the foreline; and The first gas, the second gas, and the third gas are flowed through a throttle valve coupled to the foreline downstream of the free radical generator.

17. The method for cleaning a throttle valve according to claim 16, wherein: The first gas includes a plasma generation precursor.

18. The method for cleaning a throttle valve according to claim 16, wherein: The first gas includes an inert gas or a cleaning gas.

19. The method for cleaning a throttle valve according to claim 16, wherein: The flow rate of the first gas is greater than the flow rates of the third gas and the second gas.

20. The method for cleaning a throttle valve of claim 16, wherein: The plasma comprises a capacitively coupled microwave plasma.

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