Electroplated part cleaning device

Abstract

The invention relates to the field of electroplating cleaning, in particular to an electroplated part cleaning device which comprises a cleaning pool, a flow dividing supporting assembly and a filtering assembly, a supporting base is arranged at the center of the lower end in the cleaning pool, a rotating mounting disc is horizontally arranged at the upper end of the supporting base through a rotating control assembly, and the rotating control assembly comprises a rotating shaft pipe and a stirring impeller. A rotating mounting disc which is driven by high-pressure water and can rotate slowly is arranged in a cleaning pool, then a moving-out flushing assembly is arranged on the rotating mounting disc and above a water body of the cleaning pool through a flow dividing supporting assembly, and when the rotating mounting disc is driven to rotate through high-pressure cleaning water, the high-pressure cleaning water can be used for flushing the water body of the cleaning pool. The hanger enters the moving-out flushing assembly through the flow dividing supporting assembly, when the hanger with the electroplated workpiece is moved out of the cleaning pool, the hanger and the workpiece above the hanger are flushed, the situation that the cleaning condition of the next pool is excessively polluted is avoided, the production line length of the cleaning procedure and water resource waste are reduced, operation is easy, and use is convenient.

Description

Technical Field

[0001] The invention relates to the field of electroplating cleaning, in particular to an electroplating parts cleaning device. Background Art

[0002] Electroplating is the process of plating a thin layer of other metals or alloys on certain metal surfaces using the principle of electrolysis. It is a process that uses electrolysis to attach a layer of metal film to the surface of metal or other material parts, thereby preventing metal oxidation (such as rust), improving wear resistance, conductivity, reflectivity, corrosion resistance (copper sulfate, etc.) and enhancing aesthetics. Before electroplating, the workpiece needs to be cleaned and dried in advance, otherwise it will lead to poor bonding between the plating layer and the base metal, and the plating layer is prone to peeling, blistering, leakage, roughness, poor corrosion resistance, etc.

[0003] When cleaning existing workpieces before electroplating, the workpieces are mainly hung on the cleaning racks one by one through the hangers, and then the workpieces are passed through the cleaning tanks in sequence with the conveying mechanism to clean the surface of the workpieces. When passing through the cleaning tanks in sequence, they will first come into contact with the chemical solution tank to remove stubborn stains such as surface oil, and then they will be rinsed in the clean water tank in sequence. However, due to the continuous operation of the workpiece hanger, the residual sewage on the surface of the workpiece will be brought into the next clean water tank, resulting in a longer entire cleaning line, affecting the cleaning efficiency and wasting water resources. Summary of the invention

[0004] The object of the present invention is to provide a device for cleaning electroplated parts to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solution: a device for cleaning electroplated parts, comprising:

[0006] A cleaning tank, wherein a support base is provided at the center of the lower end of the cleaning tank, and a rotating mounting plate is horizontally provided at the upper end of the support base through a rotating control component, and the rotating control component includes a self-rotating shaft tube and a toggling impeller;

[0007] A flow splitting support assembly, the flow splitting support assembly includes a plurality of support railing tubes, the plurality of support railing tubes are respectively plugged into the outer peripheral side of the rotating mounting plate, the upper ends of the plurality of support railing tubes are horizontally provided with an annular mounting plate, the upper end of the annular mounting plate is provided with a removal flushing assembly, the removal flushing assembly includes a flushing ring and a plurality of flushing nozzles;

[0008] A filter assembly is vertically plugged into one side of the flushing ring, and the filter assembly includes a quick-release fixing ring and an annular filter element.

[0009] Preferably, the support base has a first inner cavity and a second inner cavity horizontally opened at the upper and lower ends respectively, and the rotating shaft tube is vertically arranged at the center of the lower end of the rotating mounting plate. The lower end of the rotating shaft tube vertically moves through the first inner cavity through a bearing and is inserted into the second inner cavity, and a transfer groove is opened on one side between the first inner cavity and the second inner cavity.

[0010] Preferably, the driving impeller is placed in the first inner cavity and sleeved on the rotating shaft tube. An access groove is provided horizontally through the support base on the side of the first inner cavity away from the adapter groove. A pumping joint is provided on the side of the support base located on the access groove, and a pressurized pumping pipe is inserted on one side of the pumping joint.

[0011] Preferably, a diversion cavity is provided at the center of the rotating mounting disk, and the diversion cavity passes through the rotating shaft tube and is connected to the second cavity.

[0012] Preferably, the plurality of support rail tubes are all arranged in an L-shaped structure, the horizontal sections of the support rail tubes are respectively fixedly plugged into the outer periphery of the rotating mounting plate, and the plurality of support rail tubes are respectively communicated with the diversion inner cavity.

[0013] Preferably, the flushing ring is horizontally arranged on the upper end of the annular mounting plate by a plurality of bolts, the upper end of the annular mounting plate is connected to the support railing pipe and is provided with a plurality of sealing access heads, a flushing inner cavity is opened in the flushing ring, and the upper ends of the plurality of sealing access heads are respectively plugged into the flushing ring and connected to the flushing inner cavity.

[0014] Preferably, the lower end of the inner circumference of the flushing ring is arranged as an inclined structure, and a plurality of flushing nozzles are symmetrically arranged on one side of the inclined structure of the flushing ring, and the plurality of flushing nozzles are inclined downward to point toward the center of the cleaning pool.

[0015] Preferably, the diameter of the flushing ring is larger than the diameter of the hanger for electroplating workpieces.

[0016] Preferably, an insertion groove is provided through the upper end of the flushing inner cavity between the sealing access head and the flushing nozzle, an internal thread mounting ring is horizontally provided at the upper end of the flushing ring, a quick-release fixing ring is horizontally inserted into the internal thread mounting ring through threads, an annular filter frame is vertically provided at the lower end of the quick-release fixing ring, the annular filter frame vertically moves through the insertion groove and is inserted into the flushing inner cavity, the annular filter element is arranged on the outer peripheral side of the annular filter frame close to the sealing access head, and a plurality of flow grooves are provided through the annular filter frame.

[0017] Preferably, a sealing gasket is provided at the lower end of the quick-release fixing ring close to the insertion groove, and the lower end of the sealing gasket abuts against the upper end of the flushing ring.

[0018] Compared with the prior art, the present invention has the following beneficial effects:

[0019] A slowly rotating rotating mounting disk driven by high-pressure water is arranged in the cleaning tank, and then a removal and flushing assembly is arranged on the rotating mounting disk above the water body of the cleaning tank through a diversion support assembly. While the rotating mounting disk is driven to rotate by high-pressure cleaning water, the high-pressure cleaning water enters the removal and flushing assembly through the diversion support assembly. When the hanger with the electroplated workpiece is moved out of the cleaning tank, the hanger and the workpiece above it are flushed to avoid excessive contamination of the cleanliness of the next water tank, reduce the production line length and water resource waste of the cleaning process, and the operation is simple and convenient to use. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a schematic diagram of the structure of the present invention;

[0021] Figure 2 For the present invention Figure 1 Schematic diagram of part A;

[0022] Figure 3 It is a schematic diagram of the partial structure cutaway of the present invention;

[0023] Figure 4 For the present invention Figure 3 Schematic diagram of part B;

[0024] Figure 5 For the present invention Figure 3 Schematic diagram of the C part;

[0025] Figure 6 It is a schematic diagram of the support rail pipe connection structure of the present invention.

[0026] In the figure: cleaning tank 1, supporting base 2, first inner cavity 3, second inner cavity 4, rotating shaft tube 5, rotating mounting plate 6, diverter inner cavity 7, toggle impeller 8, pumping joint 9, pressurized pumping pipe 10, adapter groove 11, support railing tube 13, annular mounting plate 14, spoiler 15, flushing ring 16, flushing inner cavity 17, sealing access head 18, internal thread mounting ring 19, quick-release fixing ring 20, annular filter element 21, annular filter frame 22, flushing nozzle 23. DETAILED DESCRIPTION

[0027] In order to make the purpose and technical solution of the present invention clearly and completely described, and the advantages more clearly understood, the embodiments of the present invention are further described in detail with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are part of the embodiments of the present invention, rather than all of the embodiments, and are only used to explain the embodiments of the present invention, and are not used to limit the embodiments of the present invention. All other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0028] See also Figure 1-Figure 6 , the present invention provides the following technical solutions:

[0029] Embodiment 1: A device for cleaning electroplated parts, comprising a cleaning pool 1, a support base 2 is provided at the center of the lower end of the cleaning pool 1, a rotating mounting disk 6 is horizontally provided at the upper end of the support base 2 through a rotating control component, the rotating control component comprises a rotating shaft tube 5 and a shifting impeller 8, a first inner cavity 3 and a second inner cavity 4 are horizontally opened at the upper and lower ends of the support base 2, the rotating shaft tube 5 is vertically arranged at the center of the lower end of the rotating mounting disk 6, the lower end of the rotating shaft tube 5 is vertically movable through the first inner cavity 3 through a bearing and is inserted into the second inner cavity 4, and a transfer groove 11 is opened on one side between the first inner cavity 3 and the second inner cavity 4, when high-pressure liquid is fed into the first inner cavity 3, the high-pressure liquid can enter the second inner cavity 4 through the transfer groove 11.

[0030] The toggle impeller 8 is placed in the first inner cavity 3 and sleeved on the rotating shaft tube 5. An access groove is provided in the first inner cavity 3 on the side away from the adapter groove 11, and the support base 2 is provided with a pumping joint 9 on the side of the access groove, and a pressurized pumping pipe 10 is inserted on one side of the pumping joint 9. A diverter cavity 7 is provided in the center of the rotating mounting plate 6. The diverter cavity 7 passes through the rotating shaft tube 5 and is connected to the second inner cavity 4. When the pressurized liquid of the pressurized pumping pipe 10 is sent into the first inner cavity 3, the high-pressure liquid toggles the toggle impeller 8 to control the rotating shaft tube 5 and the rotating mounting plate 6 to rotate. After the high-pressure liquid flows to the position of the adapter groove 11 in the first inner cavity 3, it enters the second inner cavity 4 from the adapter groove 11, and then enters the rotating mounting plate 6 through the rotating shaft tube 5;

[0031] The high-pressure liquid delivered by the pressure pumping pipe 10 can be clean water connected from the outside, and the pressure pumping pipe 10 is a common pressure water pump in the prior art for high-pressure delivery.

[0032] A diversion support assembly is provided to divert and lift the high-pressure liquid in the rotating mounting plate 6. The diversion support assembly includes a plurality of support fence tubes 13. The plurality of support fence tubes 13 are respectively plugged into the outer peripheral side of the rotating mounting plate 6. An annular mounting plate 14 is horizontally provided at the upper ends of the plurality of support fence tubes 13. A removal flushing assembly is provided at the upper end of the annular mounting plate 14. The removal flushing assembly includes a flushing ring 16 and a plurality of flushing nozzles 23. The plurality of support fence tubes 13 are all arranged in an L-shaped structure. The horizontal sections of the support fence tubes 13 are respectively fixedly plugged into the rotating mounting plate 6, and a plurality of support rail tubes 13 are respectively connected with the diversion inner cavity 7, a flushing ring 16 is horizontally arranged on the upper end of the annular mounting plate 14 through a plurality of bolts, and a plurality of sealing access heads 18 are arranged at the upper end of the annular mounting plate 14 in communication with the support rail tube 13, a flushing inner cavity 17 is opened in the flushing ring 16, and the upper ends of the plurality of sealing access heads 18 are respectively plugged with the flushing ring 16 and connected with the flushing inner cavity 17, and the liquid containing pressure in the rotating mounting plate 6 enters the flushing ring 16 under the diversion and lifting action of the plurality of support rail tubes 13;

[0033] A spoiler 15 is provided on the outer side of the support rail tube 13. When the rotating mounting plate 6 drives the support rail tube 13 to rotate, the water in the cleaning tank 1 can be stirred to clean the rack and the workpiece. In addition, the cleaning principle in the cleaning tank 1 can be ultrasonic cleaning.

[0034] The lower end of the inner circumference of the flushing ring 16 is arranged in an inclined structure, and a plurality of flushing nozzles 23 are symmetrically arranged on one side of the inclined structure of the flushing ring 16, and the plurality of flushing nozzles 23 are inclined downward to point to the center of the cleaning pool 1. The diameter of the flushing ring 16 is larger than the diameter of the hanger for the electroplated workpiece. The pressurized clean water entering the flushing ring 16 is ejected toward the center of the cleaning pool 1 through a plurality of flushing nozzles 23 with smaller diameters. When the hanger for hanging the workpiece passes through the inner circumference of the flushing ring 16, the hanger and the workpiece can be cleaned to avoid rapid contamination of the next cleaning pool.

[0035] In this embodiment, the pressurized pumping pipe 10 pressurizes clean water into the first inner cavity 3 through a pressurized water pump. The pressurized clean water drives the impeller 8 and the rotating shaft tube 5 to rotate, and then the rotating shaft tube 5 controls the rotating mounting disk 6 to rotate slowly in the cleaning tank 1. At this time, the water passing through the impeller 8 enters the rotating mounting disk 6 from the adapter groove 11, and then enters the flushing ring 16 under the lifting effect of the pressure and the support fence tube 13, and is ejected to the hanger and workpiece passing through the center of the flushing ring 16 under the pressurized effect of several flushing nozzles 23, so as to avoid excessive pollution of the next cleaning pool by the polluted water of the previous pool remaining on the hanger and the workpiece, thereby reducing the length of the cleaning production line and the waste of water resources.

[0036] Embodiment 2: On the basis of embodiment 1, a filter assembly is provided to filter the clean water ejected from the flushing nozzle 23. The filter assembly is vertically plugged into one side of the flushing ring 16, and the filter assembly includes a quick-release fixing ring 20 and an annular filter element 21. An insertion groove is provided through the upper end of the flushing inner cavity 17 between the sealing access head 18 and the flushing nozzle 23. An internal thread mounting ring 19 is horizontally provided at the upper end of the flushing ring 16. The quick-release fixing ring 20 is horizontally plugged into the internal thread mounting ring 19 through a thread. An annular filter frame 22 is vertically provided at the lower end of the quick-release fixing ring 20. The annular filter frame 22 is vertically movable. The annular filter element 21 is mounted on the outer peripheral side of the annular filter frame 22 close to the sealing access head 18, and a number of flow grooves are penetrated on the annular filter frame 22. Water entering the flushing cavity 17 needs to pass through the annular filter element 21 and the annular filter frame 22 before flowing out from the flushing nozzle 23. At this time, the annular filter element 21 can filter the water. In order to further reduce the waste of water resources and utilize clean water, the water of the next water pool can be pumped by a water pump (in principle, the cleanliness of the water in the next water pool should be higher than that of the previous water pool).

[0037] A sealing gasket is provided at the lower end of the quick-release fixing ring 20 near the insertion groove, and the lower end of the sealing gasket is abutted against the upper end of the flushing ring 16. The threaded connection between the quick-release fixing ring 20 and the internal thread mounting ring 19 facilitates the maintenance and replacement of the annular filter element 21. At the same time, the setting of the sealing gasket can prevent the pressurized water in the flushing cavity 17 from appearing or excessively overflowing.

[0038] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A device for cleaning electroplated parts, characterized in that: include: A cleaning pool (1), wherein a support base (2) is provided at the center of the lower end of the cleaning pool (1), and a rotating mounting plate (6) is horizontally provided at the upper end of the support base (2) through a rotating control component, and the rotating control component includes a rotating shaft tube (5) and a shifting impeller (8); A flow distribution support assembly, the flow distribution support assembly comprising a plurality of support rail tubes (13), the plurality of support rail tubes (13) being respectively plugged into the outer peripheral side of the rotating mounting plate (6), the upper ends of the plurality of support rail tubes (13) being horizontally provided with an annular mounting plate (14), the upper end of the annular mounting plate (14) being provided with a removal flushing assembly, the removal flushing assembly comprising a flushing ring (16) and a plurality of flushing nozzles (23); A filter assembly is vertically plugged into one side of a flushing ring (16), and the filter assembly comprises a quick-release fixing ring (20) and an annular filter element (21).

2. The electroplating parts cleaning device according to claim 1, characterized in that: The support base (2) has a first inner cavity (3) and a second inner cavity (4) respectively formed horizontally at the upper and lower ends thereof, a self-rotating shaft tube (5) being vertically arranged at the center of the lower end of the rotating mounting plate (6), the lower end of the self-rotating shaft tube (5) vertically movably passing through the first inner cavity (3) through a bearing and being inserted into the second inner cavity (4), and a transfer groove (11) being formed on one side of the first inner cavity (3) and the second inner cavity (4) so ​​as to be connected.

3. The electroplating parts cleaning device according to claim 2, characterized in that: The driving impeller (8) is placed in the first inner cavity (3) and sleeved on the rotating shaft tube (5); an access groove is provided in the first inner cavity (3) on a side away from the adapter groove (11) and horizontally penetrates the support base (2); a pumping joint (9) is provided on the side of the support base (2) located at the access groove, and a pressurized pumping pipe (10) is inserted on one side of the pumping joint (9).

4. The electroplating parts cleaning device according to claim 3, characterized in that: A flow-dividing inner cavity (7) is provided at the center of the rotating mounting plate (6), and the flow-dividing inner cavity (7) penetrates the rotating shaft tube (5) and is connected to the second inner cavity (4).

5. The electroplating parts cleaning device according to claim 4, characterized in that: The plurality of support rail tubes (13) are all arranged in an L-shaped structure, the horizontal sections of the support rail tubes (13) are respectively fixedly plugged into the outer periphery of the rotating mounting plate (6), and the plurality of support rail tubes (13) are respectively connected to the diversion inner cavity (7).

6. The electroplating parts cleaning device according to claim 5, characterized in that: The flushing ring (16) is horizontally arranged on the upper end of the annular mounting plate (14) through a plurality of bolts; the upper end of the annular mounting plate (14) is connected to the support railing pipe (13) and is provided with a plurality of sealing access heads (18); a flushing inner cavity (17) is provided in the flushing ring (16), and the upper ends of the plurality of sealing access heads (18) are respectively plugged into the flushing ring (16) and are connected to the flushing inner cavity (17).

7. The electroplating parts cleaning device according to claim 6, characterized in that: The lower end of the inner circumference of the flushing ring (16) is arranged in an inclined structure, and a plurality of flushing nozzles (23) are symmetrically arranged on one side of the inclined structure of the flushing ring (16), and the plurality of flushing nozzles (23) are inclined downward and point toward the center of the cleaning pool (1).

8. The electroplating parts cleaning device according to claim 7, characterized in that: The diameter of the flushing ring (16) is greater than the diameter of the hanger for the electroplating workpiece.

9. The electroplating parts cleaning device according to claim 8, characterized in that: An insertion groove is provided through the upper end of the flushing inner cavity (17) between the sealing access head (18) and the flushing nozzle (23); an internal thread mounting ring (19) is horizontally provided on the upper end of the flushing ring (16); a quick-release fixing ring (20) is horizontally plugged into the internal thread mounting ring (19) through threads; an annular filter frame (22) is vertically provided on the lower end of the quick-release fixing ring (20); the annular filter frame (22) vertically movably passes through the insertion groove and is inserted into the flushing inner cavity (17); an annular filter element (21) is sleeved on the outer peripheral side of the annular filter frame (22) close to the sealing access head (18), and a plurality of flow grooves are provided through the annular filter frame (22).

10. The electroplating parts cleaning device according to claim 9, characterized in that: The lower end of the quick-release fixing ring (20) close to the insertion groove is provided with a sealing gasket, and the lower end of the sealing gasket abuts against the upper end of the flushing ring (16).

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