Method for spheroidizing ceramic powder through high-energy plasma
High-energy plasma spheroidization technology is used to spheroidize ScYSZ ceramic powder, which solves the problems of low recovery rate, long cycle and high economic cost in traditional processes, and achieves efficient and controllable spherical ceramic powder preparation, which is suitable for plasma spraying thermal barrier coating. Layer preparation.
Patent Information
- Application Number
- CN202411544063.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-31
- Publication Date
- 2025-01-24
AI Technical Summary
The traditional spherical process method has the problems of low recovery rate, long process cycle and high economic cost of industrial powder preparation.
Using high -energy plasma ballization technology, after the SCYSZ ceramic powder is used for ball grinding and screening, the high -energy plasma firing of the plasma spherical device is used for ballization treatment. Coistrise to form spherical ceramic powder.
It achieves the advantages of high bulk density, controllable atmosphere, and high sphericity of spherical ceramic powder, simplifies the process, reduces costs, and solves the problems of low recovery rate and long cycle in traditional processes.
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Figure CN119350019A_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of thermal spraying ceramic powder preparation, and in particular relates to a high-energy plasma spheroidizing ceramic powder and a method thereof. Background Art
[0002] Thermal barrier coatings are widely used to reduce the surface of hot end components such as turbine or engine blades due to their good heat insulation effect, thereby greatly extending the service life of the blades and increasing the operating temperature. At present, thermal barrier coating preparation technologies include plasma spraying preparation technology and electron beam physical vapor deposition preparation technology, but the equipment cost of electron beam physical vapor deposition preparation technology and the working environment (high vacuum) requirements are high, and it is difficult to deposit coatings on complex workpiece surfaces. Therefore, in the current thermal barrier coating process preparation process, plasma spraying preparation technology is widely used, but plasma spraying preparation technology requires spherical powder with good fluidity and high bulk density to meet the process requirements of plasma spraying preparation of thermal barrier coatings.
[0003] In the current plasma spraying ceramic powder preparation process, the powder commonly used is a nano-sized ceramic powder that has not been agglomerated. During the spraying process, it is difficult to form a concentrated beam, and it is easy to diverge, resulting in low deposition efficiency and large powder consumption, making it difficult to effectively deposit and form a coating. Therefore, agglomerating ceramic powders into spherical micron agglomerates with good fluidity is an effective means to solve this problem. The currently commonly used methods for preparing ceramic micron agglomerates are mainly ball milling granulation and spray drying granulation. However, since the bonding strength between the internal particles of the ceramic agglomerates after granulation is poor, and an organic binder is introduced during the granulation process, it is necessary to further perform high-temperature sintering heat treatment and / or subsequent plasma spheroidization process to remove the binder. In addition, the use of plasma spheroidization technology can also be a method for preparing spherical powders.
[0004] The existing patent (CN105689728A) melts the metal alloy powder raw material by plasma heating in a melting furnace, and then relies on the surface tension of the molten metal droplets to turn the particles into spheres, but the coating deposition efficiency prepared by this method is low.
[0005] The existing patent (CN106862562A) generates plasma in a hydrogen-containing, inert atmosphere by applying voltage. It is a closed container and is limited to low melting point materials.
[0006] The plasma torch used in the existing patent (CN110947976A) is a DC plasma torch with a power of only 5kW; the plasma generated by the existing patent (CN108907210A) is low in energy and power of only 10-30kW, and can only melt metal powders with low melting points.
[0007] The existing patent (CN116329560A) uses radio frequency plasma to spheroidize ceramic-reinforced titanium-based composite material powder. The ball milling process is more complicated than this process, and the finished product is limited by the particle size of the original powder, and fine powder feeding is difficult.
[0008] In summary, the traditional spheroidization process preparation process is complicated and has a long powder spheroidization cycle due to the spray granulation and further high-temperature sintering process. In addition, there are prominent problems such as powder loss and low recovery rate in the spray granulation and further plasma spheroidization process, which causes great waste and economic losses in the industrial production process. Summary of the invention
[0009] In order to solve the problems of low recovery rate, long process cycle and high economic cost of industrial powder making in traditional preparation of spherical powder, the purpose of the present invention is to provide a high-energy plasma spheroidized ceramic powder and method, which has simple and controllable process, low cost, short powder making cycle, and can be applied to the preparation process of plasma spray thermal barrier coating.
[0010] In order to achieve the above object, the present invention provides the following technical solutions:
[0011] A method for high-energy plasma spheroidization of ceramic powders comprises the following steps:
[0012] The ScYSZ ceramic powder is ball-milled and then sieved to obtain irregular ceramic powder;
[0013] The irregular ceramic powder is sent to a plasma spheroidizing device to be spheroidized into spherical ceramic powder; wherein the power of the plasma spheroidizing device is 50-120kW, the powder feeding rate is 10-30g / min, the hydrogen carrier gas flow rate is 14-20L / min, and the argon protection flow rate is 75-90L / min.
[0014] Furthermore, the specific preparation process of ScYSZ ceramic powder is as follows: dissolving ScCl3·6H2O, YCl3·6H2O, ZrOCl2·8H2O and citric acid in deionized water to form a colorless transparent solution, and then heating to obtain a wet gel; calcining the wet gel to obtain the ScYSZ ceramic powder.
[0015] Further, ScCl3·6H2O, YCl3·6H2O, ZrOCl2·8H2O and citric acid are in a molar ratio of 0.14:0.01:0.925:1.075.
[0016] Furthermore, the heating temperature is 60° C. and the heating time is 24 h.
[0017] Furthermore, the calcination temperature is 1100° C. and the calcination time is 4 h.
[0018] Furthermore, during ball milling, the ball-to-material ratio is 3:1-5:1, the ball milling speed is 200 rpm to 300 rpm, and the ball milling time is 10 to 30 min.
[0019] Furthermore, the particle size of the irregular ceramic powder is 10 to 80 μm.
[0020] Furthermore, the power of the plasma spheroidization device is 50 kW, the powder feeding rate is 10 g / min, the hydrogen carrier gas flow rate is 14 L / min, and the argon protection flow rate is 75 L / min.
[0021] A spherical ceramic powder prepared according to the method as described above, wherein the median diameter of the spherical ceramic powder is 49.9 μm.
[0022] Furthermore, the grains inside the spherical ceramic powder are of nanometer scale.
[0023] Compared with the prior art, the present invention has the following beneficial effects:
[0024] The present invention heats and melts the irregular powder after ball milling and collects the powder in deionized water. Due to the heat and mass transfer of the powder in the high-energy plasma jet, and the extremely rapid cooling when the powder is subsequently collected in deionized water, the powder passes through the shrinkage-type Y-channel structure, and undergoes instantaneous melting, edge shearing and crushing in the high-energy plasma jet, and extremely rapid solidification in water, so that the particles solidify into spherical particles. In addition, the extremely rapid cooling in water causes the crystal grains inside to have no time to grow, and the nanostructure inside the powder is retained in the water, thereby achieving control of the crystal structure. The method of the present invention has the advantages of high loose density, controllable atmosphere, fast speed, high sphericity, etc. In the application of traditional powder making process, the method of the present invention is simple, controllable, and low-cost, and solves the outstanding problems of low recovery rate of spheroidized powder and long production cycle, and is expected to be widely used in actual production processes on a large scale.
[0025] Furthermore, the present invention adopts the sol-gel method to prepare the precursor of the ceramic powder, and can directly obtain the oxide ceramic powder with initial grains of nanometer scale through calcination. At the same time, it is conducive to the doping of some multi-principal rare elements into the main lattice, and the composition of the ceramic is directly controlled from the initial end of the powder.
[0026] The spherical ceramic powder prepared by the invention has uniform composition, compact structure, smooth surface, high sphericity, controllable particle size distribution, and a median diameter of 49.9 μm, and can be applied to the preparation of plasma spray thermal barrier coatings. BRIEF DESCRIPTION OF THE DRAWINGS
[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present application and should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without creative work. In the drawings:
[0028] Figure 1 This is a SEM photo of the microscopic morphology of the original ScYSZ ceramic powder used in the spherical powder of the present invention;
[0029] Figure 2 is a SEM photo of the microscopic morphology of the spherical powder after plasma spheroidization in Example 1 of the present invention;
[0030] Figure 3 is a particle size distribution diagram of the spheroidized powder obtained by testing with a laser particle size analyzer in Example 1 of the present invention;
[0031] Figure 4 This is a TEM photo of the microscopic morphology of the spherical powder after plasma spheroidization in Example 1 of the present invention;
[0032] Figure 5 1 is an XRD diffraction pattern of the spherical powder after plasma spheroidization in Example 1 of the present invention; wherein (a) is a full XRD diffraction spectrum, (b) is a diffraction spectrum of XRD at 27-32°, and (c) is a diffraction spectrum of XRD at 72-76°;
[0033] Figure 6 This is a SEM photo of the microscopic morphology of the spherical powder after plasma spheroidization in Comparative Example 1 of the present invention;
[0034] Figure 7 This is a SEM photo of the microscopic morphology of the spherical powder after plasma spheroidization in Comparative Example 2 of the present invention;
[0035] Figure 8 This is a SEM photo of the microscopic morphology of the spherical powder after plasma spheroidization in Comparative Example 3 of the present invention;
[0036] Fig. 9 Flow chart for preparing ceramic powders for high energy plasma spheroidization;
[0037] Fig.10 This is a schematic diagram of the structure of a high-energy plasma spheroidization preparation device.
[0038] In the figure: 1. power supply; 2. hydrogen and argon; 3. Y-shaped channel; 4. shrinkage hole; 5. nozzle; 6. internal powder delivery port; 7. high-energy plasma jet; 8. flying particles; 9. deionized water; 10. collection device. DETAILED DESCRIPTION
[0039] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the relevant drawings. The preferred embodiments of the present invention are given in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thoroughly and comprehensively understood.
[0040] In the following examples, a high-power planetary ball mill is used for mechanical ball milling, the model of the plasma spheroidization equipment is YASAMA, and the ceramic raw material powder is a precursor synthesized in the laboratory through sol-gel chemical synthesis and then calcined.
[0041] See also Fig.10 The high-energy plasma spheroidization preparation device used in the present invention includes a power supply 1, a spray gun, a powder feeder and a collecting device 10, wherein the powder feeder is connected to the spray gun, and the collecting device 10 is located below the spray gun outlet. The high-energy plasma jet 8 is generated through the nozzle 5, and the ceramic powder is fed into the shrinkage-type Y-shaped channel 3 structure through the powder feeding port, heated and melted by the high-energy plasma rigid jet, and then passed through the shrinkage hole 4, and finally collected by the water-cooled collecting device 10 after the high-energy plasma jet spheroidization, thereby obtaining the powder that can be sprayed.
[0042] The main working principle of the high-energy plasma spheroidization preparation device of the present invention is as follows: hydrogen and argon 2 are introduced into the spray gun, and the powder is transported to the inner powder feeding port 6 through the powder feeder. The inert gas argon is ionized under the magnetic field generated by the external current to form a stable high-energy plasma jet, and the temperature of the plasma jet can exceed 8000°C. The high temperature and high energy of the plasma are used to rapidly heat and melt the flying particles 8 to form molten droplets, which are agglomerated to form spherical droplets under the action of surface tension, and then solidified to form powder for thermal spraying, which is collected by the collecting device 10.
[0043] See also Fig. 9 A method for high-energy plasma spheroidization of ceramic powders of the present invention comprises the following steps:
[0044] Preparation of ScYSZ raw material powder: The ceramic powder used in the present invention is a scandium-yttrium co-doped zirconia powder (ScYSZ ceramic powder for short) with an irregular morphology, which is obtained by calcining a precursor prepared by sol-gel chemical synthesis to an oxide ceramic powder; the specific preparation process of the ScYSZ ceramic powder is as follows: ScCl3·6H2O, YCl3·6H2O, ZrOCl2·8H2O and citric acid are dissolved in deionized water at a molar ratio of 0.14:0.01:0.925:1.075 to form a colorless transparent solution, and the prepared solution is placed in an oil bath at 60°C for reaction for 24 hours to obtain a wet gel, i.e., a sol-gel, and the wet gel is further dried to obtain a dry gel, i.e., a precursor, and then the dry gel is set in a muffle furnace at 1100°C for 4 hours for calcination to obtain a scandium-yttrium co-stabilized zirconia ceramic powder.
[0045] Mechanical ball milling: ball mill the ScYSZ ceramic powder with a ball-to-material ratio of 3:1-5:1, a ball milling speed of 200 rpm to 300 rpm, and a ball milling time of 10 to 30 min;
[0046] Mechanical screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of 10 to 80 μm is obtained to facilitate perfect sphering.
[0047] Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder and then sent to a plasma spheroidization device. The plasma spraying parameters are adjusted until all irregular ceramic powders can be spheroidized into spherical powders with a particle size of 10 to 80 μm.
[0048] Plasma spraying parameters of the plasma spheroidizing device: the preferred power is 50-120kW, the powder feeding rate is 10-30g / min, the hydrogen carrier gas flow rate is 14-20L / min, and the argon protection flow rate is 75-90L / min.
[0049] The median diameter of the spheroidized powder prepared in the present invention is 49.9 μm; the crystal grains inside the spheroidized powder are of nanometer scale.
[0050] Example 1
[0051] A method for preparing ceramic powder by high-energy plasma spheroidization comprises the following steps:
[0052] (1) Preparation of ScYSZ raw material powder: The ceramic powder used in the present invention is a scandium-yttrium co-doped zirconia powder (abbreviated as ScYSZ) having an irregular morphology, which is obtained by calcining a precursor prepared by sol-gel chemical synthesis into an oxide ceramic powder;
[0053] from Figure 1It can be observed that the ceramic powder particles present an irregular morphology and the particle size ranges roughly from 10 to 80 μm.
[0054] (2) Mechanical ball milling: The prepared ScYSZ ceramic powder is ball milled with a ball-to-material ratio of 3:1, a ball milling speed of 200 rpm to 300 rpm, and a ball milling time of 10 to 30 min;
[0055] (3) Screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of less than 80 μm is obtained to facilitate perfect sphering.
[0056] (4) Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder. The preferred power of the plasma spheroidization device is 50 kW, the powder feeding rate is 10 g / min, the hydrogen carrier gas flow rate is 14 L / min, and the argon protection flow rate is 75 L / min to achieve spheroidization of the ceramic powder.
[0057] Figure 2 The SEM photo of the spherical powder after plasma spheroidization in this example shows that the powder after spheroidization has completely shown a good sphericity and a smooth surface. The particle size range is about 10 to 80 μm. The powder flowability is 6.22 s / 50 g and the bulk density is 2.75 g / cm 3 .
[0058] from Figure 3 It can be seen that the powder particle size distribution reaches 10% (D 10 ) has a particle size of 14.7 μm and a powder particle size distribution of 50% (D 50 ) has a particle size of 49.9 μm, and the powder particle size distribution reaches 90% (D 90 ) has a particle size of 77.4 μm, which meets the spraying requirements.
[0059] from Figure 4 It can be observed that the grain size of the powder particles after spheroidization still remains at the nanometer level, and the grain size is roughly in the range of 10 to 30 nm.
[0060] from Figure 5 It can be seen from (a), (b) and (c) that after plasma spheroidization, the ceramic powder has no other impurities and phase changes, and maintains a good tetragonal phase stable structure.
[0061] Comparative Example 1
[0062] The method in Example 1 is adopted, except that the power of the plasma spheroidization device used in step (4) is 20 kW.
[0063] Comparative Example 2
[0064] The method in Example 1 is adopted, except that the power of the high-energy plasma spheroidization device used in step (4) is 30 kW.
[0065] Comparative Example 3
[0066] The method in Example 1 is adopted, except that the power of the high-energy plasma spheroidization device used in step (4) is 40 kW.
[0067] See the microscopic morphology SEM images of the spheroidized powders corresponding to Comparative Examples 1, 2 and 3. Figure 6 , Figure 7 , Figure 8 It can be seen that the original irregular ceramic powder is not completely spheroidized under the power of 20kW, 30kW, and 40kW. Therefore, it can be concluded that with the increase of power, the higher the sphericity of the high-energy plasma spheroidized powder, the better the spheroidization effect.
[0068] Example 2
[0069] A method for preparing ceramic powder by high-energy plasma spheroidization comprises the following steps:
[0070] (1) Preparation of ScYSZ raw material powder: The ceramic powder with irregular morphology used in the present invention is scandium-yttrium co-doped zirconia powder (abbreviated as ScYSZ);
[0071] (2) Mechanical ball milling: The prepared YSZ ceramic powder was ball milled with a ball-to-powder ratio of 4:1, a ball milling speed of 200 rpm, and a ball milling time of 30 min;
[0072] (3) Screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of less than 80 μm is obtained to facilitate perfect sphering.
[0073] (4) Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder. The preferred power of the plasma spheroidization device is 120 kW, the powder feeding rate is 30 g / min, the hydrogen carrier gas flow rate is 16 L / min, and the argon protection flow rate is 80 L / min to achieve spheroidization of the ceramic powder.
[0074] Example 3
[0075] A method for preparing ceramic powder by high-energy plasma spheroidization comprises the following steps:
[0076] (1) Preparation of ScYSZ raw material powder: The ceramic powder with irregular morphology used in the present invention is scandium-yttrium co-doped zirconia powder (abbreviated as ScYSZ), which is obtained by calcining a precursor prepared by sol-gel chemical synthesis into an oxide ceramic powder;
[0077] (2) Mechanical ball milling: The prepared YSZ ceramic powder was ball milled with a ball-to-powder ratio of 5:1, a ball milling speed of 300 rpm, and a ball milling time of 10 min;
[0078] (3) Screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of less than 80 μm is obtained to facilitate perfect sphering.
[0079] (4) Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder. The preferred power of the plasma spheroidization device is 50 kW, the powder feeding rate is 20 g / min, the hydrogen carrier gas flow rate is 20 L / min, and the argon protection flow rate is 75 L / min to achieve spheroidization of the ceramic powder.
[0080] Example 4
[0081] A method for preparing ceramic powder by high-energy plasma spheroidization comprises the following steps:
[0082] (1) Preparation of ScYSZ raw material powder: The ceramic powder with irregular morphology used in the present invention is scandium-yttrium co-doped zirconia powder (abbreviated as ScYSZ), which is obtained by calcining a precursor prepared by sol-gel chemical synthesis into an oxide ceramic powder;
[0083] (2) Mechanical ball milling: The prepared YSZ ceramic powder was ball milled with a ball-to-powder ratio of 3:1, a ball milling speed of 250 rpm, and a ball milling time of 20 min;
[0084] (3) Screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of less than 80 μm is obtained to facilitate perfect sphering.
[0085] (4) Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder. The optimal power of the plasma spheroidization device is 70 kW, the powder feeding rate is 10 g / min, the hydrogen carrier gas flow rate is 14 L / min, and the argon protection flow rate is 90 L / min to achieve spheroidization of the ceramic powder.
[0086] Example 5
[0087] A method for preparing ceramic powder by high-energy plasma spheroidization comprises the following steps:
[0088] (1) Preparation of ScYSZ raw material powder: The ceramic powder with irregular morphology used in the present invention is scandium-yttrium co-doped zirconia powder (abbreviated as ScYSZ), which is obtained by calcining a precursor prepared by sol-gel chemical synthesis into an oxide ceramic powder;
[0089] (2) Mechanical ball milling: The prepared YSZ ceramic powder was ball milled with a ball-to-material ratio of 4.5:1, a ball milling speed of 270 rpm, and a ball milling time of 15 min;
[0090] (3) Screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of less than 80 μm is obtained to facilitate perfect sphering.
[0091] (4) Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder. The optimal power of the plasma spheroidization device is 100 kW, the powder feeding rate is 15 g / min, the hydrogen carrier gas flow rate is 17 L / min, and the argon protection flow rate is 85 L / min to achieve spheroidization of the ceramic powder.
[0092] Example 6
[0093] A method for preparing ceramic powder by high-energy plasma spheroidization comprises the following steps:
[0094] (1) Preparation of ScYSZ raw material powder: The ceramic powder with irregular morphology used in the present invention is scandium-yttrium co-doped zirconia powder (abbreviated as ScYSZ), which is obtained by calcining a precursor prepared by sol-gel chemical synthesis into an oxide ceramic powder;
[0095] (2) Mechanical ball milling: The prepared YSZ ceramic powder was ball milled with a ball-to-material ratio of 3.5:1, a ball milling speed of 280 rpm, and a ball milling time of 12 min;
[0096] (3) Screening: The ceramic powder after ball milling is screened with a sieve aperture of 180 mesh. After screening, irregular powder with a particle size of less than 80 μm is obtained to facilitate perfect sphering.
[0097] (4) Plasma spheroidization treatment: The screened ceramic powder is placed in a powder feeder. The optimal power of the plasma spheroidization device is 110 kW, the powder feeding rate is 25 g / min, the hydrogen carrier gas flow rate is 15 L / min, and the argon protection flow rate is 87 L / min. , to achieve spheroidization of ceramic powder
[0098] The above description is only for the best embodiment of the present invention, but it should not be understood as limiting the claims. The present invention is not limited to the above embodiments, and its specific structure is allowed to be changed. However, all changes made within the protection scope of the independent claims of the present invention are within the protection scope of the present invention.
[0099] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.
Claims
1. A method for high-energy plasma spheroidized ceramic powder, characterized in that The steps include: ScYSZ ceramic powder was subjected to ball milling and sieved to obtain irregular ceramic powder; The irregular ceramic powder is sent to a plasma spheroidizing device, spheroidized into a sphere, and cooled in water to obtain a spherical ceramic powder; wherein the power of the plasma spheroidizing device is 50-120kW, the powder feeding rate is 10-30g / min, the hydrogen carrier gas flow rate is 14-20L / min, and the argon protection flow rate is 75-90L / min.
2. The method of high-energy plasma spheroidized ceramic powder according to claim 1, characterized in that The specific preparation process of ScYSZ ceramic powder is as follows: ScCl3·6H2O, YCl3·6H2O, ZrOCl2·8H2O and citric acid are dissolved in deionized water to form a colorless transparent solution, which is then heated to obtain a wet gel; the wet gel is calcined to obtain the ScYSZ ceramic powder.
3. The method of high-energy plasma spheroidized ceramic powder according to claim 2, characterized in that The molar ratio of ScCl3·6H2O, YCl3·6H2O, ZrOCl2·8H2O and citric acid is 0.14:0.01:0.925:1.
075.
4. The method of high-energy plasma spheroidized ceramic powder according to claim 2, characterized in that The heating temperature is 60°C and the heating time is 24h.
5. The method of high-energy plasma spheroidized ceramic powder according to claim 2, characterized in that The calcination temperature is 1100°C and the time is 4 hours.
6. The method of high-energy plasma spheroidized ceramic powder according to claim 1, characterized in that When grinding, the ball-material ratio is 3:1-5:1, the ball-mill speed is 200rpm to 300rpm, and the ball-milling time is 10 to 30 minutes.
7. The method of high-energy plasma spheroidized ceramic powder according to claim 1, characterized in that The particle size of the irregular ceramic powder is 10 to 80 μm.
8. The method of preparing spherical ceramic powder of high-energy plasma spheroidization according to claim 1, characterized in that The power of the plasma spheroidization device is 50kW, the powder feed rate is 10g / min, the hydrogen carrier gas flow rate is 14L / min, and the argon protection flow rate is 75L / min.
9. A spherical ceramic powder prepared by the method of any one of claims 1-8, characterized in that The median diameter of the spherical ceramic powder is 49.9 μm.
10. The spherical ceramic powder according to claim 9, characterized in that The grains inside the spherical ceramic powder are nanometer-sized.
Citation Information
Patent Citations
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