Quartz product degreasing and cleaning device

Abstract

The quartz product degreasing and cleaning device comprises a pot body and a cover body arranged on the pot body, a containing cavity is formed in the pot body and comprises a containing space used for containing a quartz product and a supporting space located below the containing space, and a supporting piece used for supporting the quartz product is arranged in the supporting space; the supporting piece is provided with a plurality of supporting parts extending in a strip shape on the bottom wall of the containing cavity, and a collecting area used for collecting grease is formed among the multiple supporting parts. The pot body and the cover body are matched to provide a micro-pressure cleaning environment, the liquid medium in the pot body is heated to be boiled, the cleaning effect on the quartz product is improved, evaporation of the liquid medium is reduced, and diffusion of steam with dissolved lipid substances is reduced. And the supporting piece limits the displacement of the quartz product, so that the structural damage caused by collision between the quartz product and the pot bottom is reduced. Part of pollutants difficult to dissolve fall into the collecting area after being separated from the quartz product, so that the pollutants are prevented from being in contact with the quartz product again, and repeated pollution to the quartz product is avoided.

Description

Technical Field

[0001] The invention belongs to the field of quartz product cleaning, and in particular relates to a quartz product degreasing and cleaning device. Background Art

[0002] With the development of science and technology, the application fields of quartz products are becoming wider and wider. Generally, machined quartz products will contain cutting fluid, adhesive wax and other greases and glues, which will affect the subsequent chemical cleaning process of quartz products. Equipment or tools are needed to degrease and clean quartz products.

[0003] Generally, a heating tank is used to degrease and clean quartz products. However, if the quartz products are directly placed in the heating tank for boiling, the pollutants separated from the quartz products will settle down under the action of gravity and sink to the bottom of the heating tank, where they will mix with the quartz products, which may easily cause re-contamination of the quartz products or require the quartz products to be rinsed again, which increases the cleaning steps of the quartz products.

[0004] In addition, after the liquid medium in the heating tank is heated, the quartz product will produce a large displacement and shaking under the driving effect of the boiling liquid medium. When the quartz product frequently collides with the bottom wall of the heating tank, it may cause structural damage to the quartz product. Moreover, after the liquid medium is heated and boiled in the heating tank, the liquid medium evaporates quickly. When the liquid medium cannot submerge the quartz product, it will cause incomplete cleaning of some areas of the quartz product, or it will be necessary to frequently add liquid medium to the heating tank, which increases the complexity of user operation. Summary of the invention

[0005] The present application provides a quartz product degreasing and cleaning device to solve the problem of re-contamination of the quartz product caused by the mixing of the cleaned pollutants with the quartz product and the need for re-rinsing operations, as well as the problem of structural damage to the quartz product caused by frequent collisions of the quartz product with the bottom wall of the heating tank.

[0006] The technical solution adopted in this application is:

[0007] A quartz product degreasing and cleaning device comprises a pot body and a cover body placed on the pot body, wherein the pot body is provided with a accommodating cavity, wherein the accommodating cavity comprises a accommodating space for accommodating the quartz product and a supporting space located below the accommodating space, wherein a supporting member for supporting the quartz product is arranged in the supporting space, wherein the supporting member comprises a plurality of supporting portions extending in strips on the bottom wall of the accommodating cavity, and a collecting area for collecting fat is formed between the plurality of supporting portions.

[0008] The quartz product degreasing and cleaning device of the present application also has the following additional technical features:

[0009] The support portion extends radially along the pot body, and the cross-sectional height of at least a portion of the support portion gradually increases radially outwardly along the pot body, so as to form an inclined surface on the upper surface of the support portion that is inclined downward toward the axis of the pot body.

[0010] An upward limiting protrusion is arranged at one end of the plurality of support parts away from the axis of the pot body, and the plurality of limiting protrusions surround the quartz product.

[0011] The support portion is provided with a communication port so as to connect the plurality of collection areas.

[0012] The supporting portion includes a fixed end fixed to the bottom wall of the accommodating cavity and a supporting end for supporting the quartz product, the supporting end is located above the fixed end, and the hardness of the supporting end is less than the hardness of the fixed end.

[0013] The radial dimension of the cover body is greater than the radial dimension of the pot body. The cover body comprises a main body and a dripping portion, and the lower edge of the dripping portion is lower than the lower edge of the main body.

[0014] A drainage hole is arranged on the side wall of the support space, the drainage hole is communicated with the collection area, and a drainage valve for controlling the drainage hole is arranged on the pot body at the position of the drainage hole.

[0015] The quartz product degreasing and cleaning device also includes a supporting frame, which has an equipment cavity inside. The top wall of the supporting frame is provided with a placement hole connected to the equipment cavity, and the top wall of the equipment cavity is provided with a heating plate. The pot body passes through the placement hole from top to bottom and abuts against the heating plate.

[0016] A sealing gasket is arranged at the edge of the placement hole, and the upper edge of the sealing gasket is higher than the upper edge of the edge.

[0017] A control component is arranged in the equipment cavity, the control component is electrically connected to the heating plate, the control component is used to control the heating plate, a control button is arranged on the side of the control component, the support frame includes an opening and closing part to realize the opening and closing of the equipment cavity, and the control button faces the opening and closing part.

[0018] Due to the adoption of the above technical solution, the beneficial effects achieved by this application are as follows:

[0019] 1. The quartz product degreasing and cleaning device provided by the present application includes a pot body and a cover body. The quartz product to be cleaned is placed in the accommodation space of the pot body. The pot body and the cover body work together to provide a micro-pressure cleaning environment. The liquid medium in the pot body is heated to boiling, which can not only increase the temperature of the liquid medium, but also the high-temperature liquid medium can improve the dissolution of lipid pollutants such as grease and glue, so as to improve the cleaning effect of the quartz product to be cleaned. In addition, the bubbles generated after the liquid medium is heated to boiling can pass through the structural gaps of the quartz product, thereby comprehensively cleaning the quartz product and reducing the cleaning dead corners. Thirdly, the cover body is covered on the pot body, which can not only provide a micro-pressure environment and increase the boiling temperature of the liquid medium, but also reduce the evaporation of the liquid medium after boiling, thereby reducing the diffusion of steam dissolved with lipid substances, causing pollution to the working environment, and causing cleaning pressure on the working environment, and can avoid the evaporation of the liquid medium in the pot body, resulting in a reduction in the liquid medium, a reduction in the lipid pollutants that can be dissolved, or the problem of being unable to submerge the quartz product and reducing the cleaning efficiency and the deterioration of the cleaning effect of the quartz product.

[0020] On this basis, the accommodating cavity includes an accommodating space for accommodating the quartz product and a supporting space located below the accommodating space, and a supporting member for supporting the quartz product is arranged in the supporting space. The supporting member supports the quartz product to avoid direct contact between the quartz product and the bottom of the pot, thereby avoiding excessive temperature due to heat conduction between the quartz product and the bottom of the pot through the solid medium during heating, and avoiding possible overheating damage to the quartz product. In addition, the supporting member supports the quartz product and imposes a certain displacement restriction on the quartz product, thereby reducing the shaking of the quartz product when the liquid medium boils, and reducing the structural damage caused by the collision between the quartz product and the bottom of the pot.

[0021] In addition, the support member has a plurality of support portions extending in strips on the bottom wall of the accommodating cavity, and a collection area for collecting fat is formed between the plurality of support portions. Some pollutants that are difficult to dissolve separate from the quartz product and settle downward into the collection area. The support portion supports the quartz product, reduces the re-contact between the pollutants in the collection area and the quartz product, avoids repeated contamination of the quartz product, and thereby improves the cleaning effect of the quartz product. In addition, the pollutants are concentrated in the collection area, which also facilitates the re-cleaning of the pot body.

[0022] 2. As a preferred embodiment of the present invention, the support portion extends in the radial direction of the pot body, and the cross-sectional height of at least a part of the support portion gradually increases outward in the radial direction of the pot body, so as to form an inclined surface on the upper surface of the support portion that is inclined downward and faces the axis of the pot body. When placing the quartz product in the accommodating space, the inclined surface of the support portion guides the placement position of the quartz product, and the quartz product can slide along the inclined surface in the direction of the axis of the pot body, pushing the quartz product to the center of the pot body. At the center of the pot body, the heating of the liquid medium is more uniform, thereby improving the uniformity of cleaning the quartz product.

[0023] In addition, during the boiling process of the liquid medium in the pot, the inclined surface that is inclined downward toward the axis of the pot obstructs the horizontal position of the quartz product away from the axis of the pot, thereby reducing the horizontal displacement of the quartz product, thereby reducing the structural damage caused by the collision between the quartz product and the side wall of the pot. Even if the quartz product floats upward and causes position displacement, the quartz product will fall back to the center of the pot under the guidance of the inclined surface during the downward sinking process under the action of gravity.

[0024] 3. As a preferred embodiment of the present invention, a plurality of the support portions are provided with an upward limiting protrusion at one end away from the axis of the pot body, and the plurality of limiting protrusions surround the quartz product. The plurality of limiting protrusions surround the quartz product, limiting the placement position of the quartz product, and pushing the quartz product to be placed in the center of the pot body, thereby improving the uniformity of cleaning the quartz product. The plurality of limiting protrusions limit the horizontal displacement of the quartz product, reduce the horizontal shaking of the quartz product caused by the boiling of the liquid medium, and reduce the displacement of the quartz product along the flow direction of the liquid medium, so that more boiling liquid medium flows through the quartz product, thereby improving the cleaning effect of the quartz product.

[0025] In addition, multiple limiting protrusions surround the quartz product and are located between the quartz product and the side wall of the pot body, which can prevent the quartz product from colliding with the side wall of the pot body due to the boiling of the liquid medium, thereby avoiding structural damage caused by the collision between the quartz product and the side wall of the pot body.

[0026] 4. As a preferred embodiment of the present invention, the radial dimension of the cover is greater than the radial dimension of the pot body, and the cover body has a main body and a dripping portion, and the lower edge of the dripping portion is lower than the lower edge of the main body. The radial dimension of the cover body is greater than the radial dimension of the pot body, and the cover body can completely cover the opening of the pot body, thereby providing a micro-pressure environment for degreasing quartz products. In addition, when the user closes the cover body, the restrictions on the closing position of the cover body can be reduced, and the user's repeated closing attempts can be reduced, which is convenient for the user to close the cover and improves the user's operating experience.

[0027] In addition, the cover body has a main body and a dripping portion, and the lower edge of the dripping portion is lower than the lower edge of the main body. The steam generated by the heated liquid medium in the accommodating cavity condenses when it encounters cold water on the lower surface of the cover body, flows downward along the lower surface of the cover body to the dripping portion, and then drips back into the accommodating cavity from the dripping portion. In this way, condensed water is prevented from dripping from the edge of the cover body and falling into the operating platform, thereby reducing the cleaning pressure on the operating platform. Moreover, the dripping portion protrudes downward toward the accommodating cavity, and the lower edge of the dripping portion is also lower than the edge of the pot body. The dripping portion and the side wall of the pot body form a limiting effect, which can reduce the horizontal displacement of the cover body relative to the pot body, and can prevent the cover body from falling off the pot body under the push of boiling gas, thereby improving the stability of the cover body covering the pot body.

[0028] 5. As a preferred embodiment of the present invention, a sealing gasket is provided at the edge of the placement hole, and the upper edge of the sealing gasket is higher than the upper edge of the edge. The sealing gasket forms a seal between the pot body and the placement hole. First, the sealing gasket abuts against the outer wall of the pot body, which limits the displacement of the pot body and can reduce the shaking of the pot body caused by boiling liquid. In addition, the sealing gasket can reduce the entry of water vapor into the interior of the support frame from the placement hole, avoid contamination of the interior of the support frame, and avoid difficulty in cleaning the interior of the support frame.

[0029] Even if some condensed water drips from the edge of the cover, it will not fall directly into the support frame due to the sealing effect of the sealing gasket, but will accumulate on the upper surface of the support frame. The upper edge of the sealing gasket is higher than the upper edge of the mouth edge, which shields the liquid on the upper surface of the support frame and prevents it from flowing into the support frame again. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0031] Figure 1 It is a schematic structural diagram of the pot body and the cover body in one embodiment of the present invention, wherein the support member is fixed in the support space;

[0032] Figure 2 is a top view of the pot body according to an embodiment of the present invention, wherein the support member is fixed in the support space;

[0033] Figure 3 It is a structural schematic diagram of the support member in one embodiment of the present invention;

[0034] Figure 4 A bottom view of the cover body according to an embodiment of the present invention;

[0035] Figure 5 It is a structural schematic diagram of the quartz product degreasing and cleaning device according to one embodiment of the present invention;

[0036] Figure 6 It is a structural schematic diagram of the quartz product degreasing and cleaning device in another embodiment of the present invention;

[0037] Figure 7 A schematic diagram of the connection between the control component and the heating plate in one embodiment of the present invention;

[0038] Figure 8 It is a schematic structural diagram of the sealing gasket in one embodiment of the present invention.

[0039] in:

[0040] 1 pot body; 11 accommodating cavity; 111 supporting space; 112 accommodating space; 113 collecting area; 12 drain hole; 13 drain valve; 14 operating handle;

[0041] 2 cover; 21 body; 22 juice part;

[0042] 3 support member; 31 support portion; 311 inclined slope; 312 limiting protrusion; 313 fixed end; 314 support end; 32 communication port;

[0043] 4 support frame; 41 equipment cavity; 42 placement hole; 421 sealing gasket; 43 opening and closing part;

[0044] 5. Heating plate;

[0045] 6 control parts; 61 control buttons. DETAILED DESCRIPTION

[0046] In order to more clearly illustrate the overall concept of the present invention, a detailed description is given below in an exemplary manner in conjunction with the accompanying drawings.

[0047] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways different from those described herein. Therefore, the protection scope of the present invention is not limited to the specific embodiments disclosed below.

[0048] In addition, in the description of the present invention, it should be understood that the orientations or positional relationships indicated by the terms "top", "bottom", "inside", "outside", "axial", "radial", "circumferential", etc. are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0049] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0050] In the present invention, unless otherwise clearly specified and limited, the first feature "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. In the description of this specification, the description with reference to the terms "implementation method", "example", "one embodiment", "example" or "specific example" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in an appropriate manner in any one or more embodiments or examples.

[0051] like Figure 1 , Figure 2 and Figure 5 As shown, a quartz product degreasing and cleaning device comprises a pot body 1 and a cover body 2 placed on the pot body 1, the pot body 1 has a accommodating cavity 11, the accommodating cavity 11 comprises a accommodating space 112 for accommodating a quartz product and a supporting space 111 located below the accommodating space 112, a supporting member 3 for supporting the quartz product is arranged in the supporting space 111, the supporting member 3 has a plurality of supporting portions 31 extending in strips on the bottom wall of the accommodating cavity 11, and a collecting area 113 for collecting fat is formed between the plurality of supporting portions 31.

[0052] It is understandable that the accommodating cavity 11 stores a liquid medium, and the liquid medium in the pot body 1 is heated, so that the quartz product in the accommodating space 112 is cleaned by the heated liquid medium. The liquid medium used in the present application can be clean water, so that it can be directly taken from the tap; a medium that is easy to dissolve lipid substances can also be added to improve the cleaning effect.

[0053] It should be noted that the quartz product degreasing and cleaning device in the present application is not limited to cleaning grease pollutants such as cutting fluid, adhesive wax, etc. attached to the quartz product, but is also suitable for cleaning pollutants such as dust.

[0054] like Figure 1 and Figure 5 As shown, the quartz product degreasing and cleaning device includes a pot body 1 and a cover body 2. The quartz product to be cleaned is placed in the accommodating space 112 of the pot body 1. The pot body 1 and the cover body 2 work together to provide a micro-pressure cleaning environment. The liquid medium in the pot body 1 is heated to boiling, which can not only increase the temperature of the liquid medium, but also the high-temperature liquid medium can improve the dissolution of lipid pollutants such as grease and glue, so as to improve the cleaning effect of the quartz product to be cleaned. In addition, the bubbles generated after the liquid medium is heated to boiling can pass through the structural gaps of the quartz product, thereby comprehensively cleaning the quartz product and reducing cleaning dead corners. Thirdly, the cover body 2 covers the pot body 1, which can not only provide a micro-pressure environment to increase the boiling temperature of the liquid medium, but also reduce the evaporation of the liquid medium after boiling, thereby reducing the diffusion of vapor containing dissolved lipid substances, causing pollution to the working environment, and causing cleaning pressure on the working environment, and can also avoid the evaporation of the liquid medium in the pot body 1, which leads to a reduction in the liquid medium and a reduction in the lipid pollutants that can be dissolved, or the inability to submerge the quartz product, thereby reducing the cleaning efficiency of the quartz product and worsening the cleaning effect.

[0055] The present application does not limit the connection method between the pot body 1 and the lid body 2. In one embodiment, Figure 1 and Figure 5 As shown, the cover 2 and the pot body 1 are split structures, and the cover 2 can be detachably placed on the pot body 1. In another embodiment, the cover 2 is hingedly connected to the pot body 1, and the cover 2 can rotate relative to the pot body 1 to realize the opening and closing of the pot body 1.

[0056] like Figure 1 and Figure 2 As shown, the accommodating cavity 11 includes an accommodating space 112 for accommodating a quartz product and a supporting space 111 located below the accommodating space 112, and a supporting member 3 for supporting the quartz product is arranged in the supporting space 111. The supporting member 3 supports the quartz product to avoid direct contact between the quartz product and the bottom of the pot, thereby avoiding excessive temperature due to heat conduction between the quartz product and the bottom of the pot through the solid medium during heating, and avoiding possible overheating damage to the quartz product. In addition, the supporting member 3 supports the quartz product and imposes a certain displacement restriction on the quartz product, thereby reducing the shaking of the quartz product when the liquid medium boils, and reducing the structural damage caused by the collision of the quartz product with the bottom of the pot.

[0057] The present application does not limit the formation method of the support member 3. In one embodiment, the upper surface of the bottom wall of the pot body 1 is raised to form the support member 3. In another embodiment, Figures 1 to 3 As shown, the support member 3 is formed separately and fixed to the upper surface of the bottom wall of the pot body 1 .

[0058] like Figure 1 and Figure 2As shown, the support member 3 has a plurality of support portions 31 extending in strips on the bottom wall of the accommodating cavity 11, and a collection area 113 for collecting fat is formed between the plurality of support portions 31. Some of the pollutants that are difficult to dissolve separate from the quartz product and settle downward, falling into the collection area 113. The support portion 31 supports the quartz product, reduces the re-contact between the pollutants in the collection area 113 and the quartz product, avoids repeated contamination of the quartz product, and thereby improves the cleaning effect of the quartz product. In addition, the pollutants are concentrated in the collection area 113, which also facilitates the re-cleaning of the pot body 1.

[0059] The present application does not limit the extension direction of the support portion 31. In one embodiment, Figures 1 to 3 As shown, the support portion 31 extends radially of the pot body 1 and is fixed to the inner surface of the bottom wall of the pot body 1 to form the support member 3. In another embodiment, the support portion 31 extends circumferentially of the pot body 1, and a plurality of support portions 31 are arranged radially of the pot body 1 at intervals to form the support member 3.

[0060] As a preferred embodiment of the present application, Figures 1 to 3 As shown, the support portion 31 extends radially along the pot body 1, and the cross-sectional height of at least a portion of the support portion 31 gradually increases radially outward along the pot body 1, so as to form an inclined surface 311 on the upper surface of the support portion 31 that is inclined toward the axis of the pot body 1 and downward.

[0061] It should be noted that the support portion 31 may extend in a straight line along the radial direction of the pot body 1 , or may extend in a curved manner along the radial direction of the pot body 1 , and the present application does not impose any limitation on this.

[0062] When the quartz product is placed in the accommodation space 112, the inclined surface 311 of the support portion 31 guides the placement of the quartz product, and the quartz product can slide along the inclined surface 311 toward the axis of the pot body 1, pushing the quartz product to the center of the pot body 1. At the center of the pot body 1, the liquid medium is heated more evenly, thereby improving the uniformity of cleaning the quartz product.

[0063] In addition, during the boiling process of the liquid medium in the pot body 1, the inclined surface 311, which is inclined downward and faces the axis of the pot body 1, blocks the horizontal position of the quartz product away from the axis of the pot body 1, thereby reducing the horizontal displacement of the quartz product, thereby reducing the structural damage caused by the collision between the quartz product and the side wall of the pot body 1. Even if the quartz product is displaced due to the upward floating, the quartz product will fall back to the center of the pot body 1 under the guidance of the inclined surface 311 during the downward sinking process under the action of gravity.

[0064] Specifically, Figures 1 to 3As shown, the support part 31 extends in a straight line along the radial direction of the pot body 1, and extends from the axis of the pot body 1 to the inner surface of the side wall of the pot body 1. This increases the support area for supporting the quartz product, improves the full utilization of the space of the pot body 1 accommodating cavity 11, and improves the applicability of the quartz product degreasing and cleaning device to the size of quartz products. Multiple support parts 31 intersect at the center of the pot body 1, and after being assembled into a complete support part 3, they are fixed to the inner surface of the bottom wall of the pot body 1. This facilitates the fixing of the support part 31 in the pot body 1.

[0065] Alternatively, the support portion 31 extends in a straight line along the radial direction of the pot body 1 and extends radially outward from the axis of the pot body 1, and a gap exists between the end of the support portion 31 away from the axis of the pot body 1 and the inner wall of the pot body 1. This makes it easier to fix the support member 3 to the pot body 1.

[0066] As an example of this implementation, Figure 3 As shown, the ends of the multiple support parts 31 away from the axis of the pot body 1 are provided with upward limiting protrusions 312, and the multiple limiting protrusions 312 surround the quartz product. The multiple limiting protrusions 312 surround the quartz product, limit the placement position of the quartz product, and push the quartz product to be placed in the center position of the pot body 1, thereby improving the uniformity of cleaning the quartz product. The multiple limiting protrusions 312 limit the horizontal displacement of the quartz product, reduce the horizontal shaking of the quartz product caused by the boiling of the liquid medium, and reduce the displacement of the quartz product along the flow direction of the liquid medium, so that the boiling liquid medium flows more through the quartz product, improving the cleaning effect of the quartz product.

[0067] In addition, multiple limiting protrusions 312 surround the quartz product and are located between the quartz product and the side wall of the pot body 1, which can prevent the quartz product from colliding with the side wall of the pot body 1 due to the boiling of the liquid medium, and avoid structural damage caused by the collision between the quartz product and the side wall of the pot body 1.

[0068] As another example of this implementation, Figure 3 As shown, the support portion 31 is provided with a communication port 32 to connect the plurality of collection areas 113. The communication port 32 connects the plurality of collection areas 113, which facilitates the discharge of the liquid medium in the plurality of collection areas 113, and also facilitates the cleaning of the pollutants in the plurality of collection areas 113, thereby avoiding the cumbersome operation caused by the discharge of the liquid medium in the collection area 113 and the cleaning of the pollutants.

[0069] Specifically, the support member 3 is composed of a plurality of support portions 31 . There are gaps between the plurality of support portions 31 and the support portions 31 do not contact each other, and the gaps form the communication openings 32 .

[0070] Or, if Figure 3As shown, the support member 3 is composed of a plurality of support parts 31, and the plurality of support parts 31 are spliced ​​to form the support part 31. A connecting notch is provided on the support part 31. The upper edge height of the connecting notch is lower than the upper edge height of the support part 31 body. The plurality of collecting areas 113 are connected through the connecting notch.

[0071] As another embodiment of this implementation mode, Figure 3 As shown, the support portion 31 includes a fixed end 313 fixed to the bottom wall of the accommodating cavity 11 and a support end 314 for supporting the quartz product, the support end 314 is located above the fixed end 313, and the hardness of the support end 314 is less than the hardness of the fixed end 313. The fixed end 313 fixed to the bottom wall of the pot body 1 has a high hardness, so it is easy to fix with the bottom wall of the pot body 1 and avoid tilting caused by deformation during the fixing process. The support end 314 supporting the quartz product has a relatively low hardness. The quartz product is pushed by the boiling liquid medium and shakes. In the process of colliding with the support end 314, the quartz product can be protected from structural damage.

[0072] Specifically, Figure 3 As shown, the support part 31 is a two-layer splicing structure, the lower layer structure is a structure made of metal materials such as stainless steel, forming a fixed end 313. The lower layer structure is a structure made of materials such as nylon and heat-resistant rubber, forming a support end 314.

[0073] As a preferred embodiment of the present application, Figure 1 and Figure 5 As shown, the radial dimension of the cover body 2 is larger than the radial dimension of the pot body 1, and the cover body 2 has a body 21 and a dripping portion 22, and the lower edge of the dripping portion 22 is lower than the lower edge of the body 21. The radial dimension of the cover body 2 is larger than the radial dimension of the pot body 1, and the cover body 2 can completely cover the opening of the pot body 1, thereby providing a micro-pressure environment for degreasing quartz products. In addition, when the user closes the cover body 2, the restrictions on the closing position of the cover body 2 can be reduced, and the user's repeated closing attempts can be reduced, which is convenient for the user to close the cover, and improves the user's operating experience.

[0074] In addition, if Figure 4As shown, the cover 2 has a body 21 and a dripping portion 22, and the lower edge of the dripping portion 22 is lower than the lower edge of the body 21. The liquid medium in the accommodating cavity 11 generates steam after heating, and condenses when it encounters cold water on the lower surface of the cover 2, flows downward along the lower surface of the cover 2 to the dripping portion 22, and then drips back to the accommodating cavity 11 from the dripping portion 22. In this way, condensed water is prevented from dripping from the edge of the cover 2 and falling into the operating platform, reducing the cleaning pressure on the operating platform. Moreover, the dripping portion 22 protrudes downward toward the accommodating cavity 11, and the lower edge of the dripping portion 22 is also lower than the edge of the pot body 1. The dripping portion 22 and the side wall of the pot body 1 form a limiting effect, which can reduce the horizontal displacement of the cover 2 relative to the pot body 1, and can prevent the cover 2 from falling off the pot body 1 under the push of boiling gas, thereby improving the stability of the cover 2 covering the pot body 1.

[0075] As a preferred embodiment of the present application, Figure 1 and Figure 2 As shown, a drain hole 12 is provided on the side wall of the support space 111, and the drain hole 12 is connected to the collection area 113. The pot body 1 is provided with a drain valve 13 for controlling the drain hole 12 at the position of the drain hole 12. The drain hole 12 is provided on the side wall of the support space 111, and is located on the lower side of the side wall of the pot body 1, so that the liquid medium in the accommodating cavity 11 can be discharged through the drain hole 12, and the operation of lifting and tipping the pot body 1 can be avoided, so that the operation of the quartz product degreasing cleaning device is more labor-saving. The drain hole 12 is connected to the collection area 113, so that the drain hole 12 is not blocked by the support part 31, resulting in poor drainage. The drain hole 12 is controlled by the drain valve 13, so that the user can set the drainage time and drainage speed, so as to avoid the liquid medium dripping down along the drain hole 12 to the operating platform and causing cleaning troubles. The water flow splashing caused by excessive drainage speed can also be avoided by controlling the drainage speed.

[0076] Specifically, Figure 2 and Figure 5 As shown, operating handles 14 are provided on both sides of the side wall of the pot body 1 along the radial direction. In the downward projection, the drain hole 12 and the two operating handles 14 are arranged at intervals, that is, the drain hole 12 and the two operating handles 14 are not located in the same radial direction. Preferably, the two operating handles 14 are arranged opposite to each other along the first radial direction of the pot body 1, and the drain hole 12 is located on any one side of the two opposite sides of the second radial direction of the pot body 1, and the first radial direction is perpendicular to the second radial direction. In this way, it is convenient for the user to lift the pot body 1 through the operating handle 14 and tilt the pot body 1 toward the drain hole 12, so as to facilitate the discharge of the liquid medium through the drain hole 12, which is more in line with the user's operating habits and can prevent the discharged liquid medium from splashing onto the user's clothes.

[0077] Specifically, the pot body 1 is 300 mm high, and the center of the drain hole 12 is 50 mm away from the bottom wall of the pot body 1, so that it is convenient to replace the liquid medium.

[0078] As a preferred embodiment of the present application, Figure 5 and Figure 6 As shown, the quartz product degreasing and cleaning device also includes a support frame 4, wherein the support frame 4 has an equipment cavity 41, and the top wall of the support frame 4 is provided with a placement hole 42 connected to the equipment cavity 41, and the top wall of the equipment cavity 41 is provided with a heating plate 5, and the pot body 1 passes through the placement hole 42 from top to bottom and abuts against the heating plate 5. The support frame 4 can raise the pot body 1, so as to facilitate the user to operate and observe the pot body 1. The support frame 4 has an equipment cavity 41, and the top wall of the equipment cavity 41 is provided with a heating plate 5, which can prevent the user from misoperating or miscontacting the heating plate 5, and can also prevent the heating plate 5 from being damaged by collision with external structures.

[0079] The pot body 1 passes through the placement hole 42 from top to bottom and abuts against the heating plate 5. The placement hole 42 limits the placement position of the pot body 1. The pot body 1 is placed at the position corresponding to the placement hole 42, so that the abutment heating of the pot body 1 and the heating plate 5 can be achieved. This avoids the problem that the heating plate 5 cannot fully exert the heating efficiency due to the misalignment of the pot body 1 and the heating area of ​​the heating plate 5. It can also avoid the problem of uneven cleaning of the quartz product caused by the uneven heating of the pot body 1 by the heating plate 5.

[0080] Specifically, the heating plate 5 is an integrated heating plate. This can not only prevent damage caused by objects colliding with the upper surface of the heating plate 5 through the placement hole 42, but also reduce the damage caused by water vapor invading the circuit part of the heating plate 5, making the heating plate 5 more durable and waterproof. Thirdly, when the heating plate 5 is damaged, it is also convenient to replace and repair the heating plate 5 as a whole.

[0081] As an example of this implementation, Figure 5 , Figure 6 and Figure 8 As shown, a sealing gasket 421 is provided at the edge of the placement hole 42, and the upper edge of the sealing gasket 421 is higher than the upper edge of the edge. The sealing gasket 421 forms a seal between the pot body 1 and the placement hole 42. First, the sealing gasket 421 abuts against the outer wall of the pot body 1, which limits the displacement of the pot body 1 and can reduce the shaking of the pot body 1 caused by the boiling liquid. In addition, the sealing gasket 421 can reduce the water vapor from entering the interior of the support frame 4 from the placement hole 42, avoiding contamination of the interior of the support frame 4 and avoiding difficulty in cleaning the interior of the support frame 4.

[0082] Even if some condensed water drips from the edge of the cover body 2, it will not directly fall into the interior of the support frame 4 due to the sealing effect of the sealing gasket 421, but will accumulate on the upper surface of the support frame 4. The upper edge of the sealing gasket 421 is higher than the upper edge of the rim, which shields the liquid on the upper surface of the support frame 4 and prevents it from flowing into the interior of the support frame 4 again.

[0083] Specifically, Figure 8 As shown, the upper surface of the sealing gasket 421 forms an inclined surface that is radially outward and downwardly inclined. This increases the contact area between the sealing gasket 421 and the pot body 1, improves the support effect on the pot body 1, and prevents the pot body 1 from shaking due to boiling liquid. In addition, the condensed water dripping onto the upper surface of the sealing gasket 421 can also flow outward along the inclined surface and flow into the upper surface of the support frame 4, instead of flowing into the support frame 4 through the placement hole 42.

[0084] The sealing gasket 421 is a structure made of heat-resistant rubber material. Under the extrusion of the pot body 1, the heat-resistant rubber can be deformed, so that the pot body 1 can pass through the placement hole 42 from top to bottom, avoiding the structural collision between the pot body 1 and the pot body 1. In addition, after the pot body 1 is placed in place, the heat-resistant rubber squeezes toward the pot body 1 under the action of elastic force, thereby improving the sealing effect of the placement hole 42. Moreover, the heat-resistant rubber can withstand high temperatures, avoiding aging caused by contact with the heated pot body 1, thereby improving the service life of the sealing gasket 421.

[0085] As another example of this implementation, Figures 5 to 7 As shown, a control member 6 is provided in the equipment cavity 41, and the control member 6 is electrically connected to the heating plate 5. The control member 6 is used to control the heating plate 5. A control button 61 is provided on the side of the control member 6. The support frame 4 includes an opening and closing portion 43 to realize the opening and closing of the equipment cavity 41, and the control button 61 faces the opening and closing portion 43. The heating plate 5 is controlled by the control member 6, and the heating temperature, heating time, constant temperature control, timed reminder, etc. are set, thereby improving the quantitative control of the degreasing and cleaning of the quartz product and reducing the error of human judgment on the cleaning effect. When judging the cleaning effect manually, it is not only inconvenient to observe the surface of the quartz product due to the obstruction of the liquid medium, but also because of the obstruction of the quartz product itself, the cleaning effect of the lower surface of the quartz product and the internal structure gap cannot be observed at all, and the probability of human observation and judgment of the cleaning effect is relatively high.

[0086] The control member 6 is disposed in the equipment cavity 41, which can avoid the accidental contact operation of the control member 6 and reduce the interruption of the degreasing and cleaning process caused by the error. The control button 61 faces the opening and closing portion 43. When the opening and closing portion 43 is closed, the equipment cavity 41 is closed. When the opening and closing portion 43 is opened, the open position faces the control button 61, so that the user can observe and operate the operation button conveniently.

[0087] It should be noted that the quartz product degreasing and cleaning device in the application heats the pot body 1 through the heating plate 5 and the control unit 6 which are separate from the pot body 1, thereby achieving degreasing and cleaning of the quartz product. When using the quartz product degreasing and cleaning device, the user can arbitrarily select an ordinary pot body 1 for use.

[0088] The present application may also integrate the heating plate 5 and the control component 6 into the pot body 1, and realize heating and heating control of the internal liquid medium through the integrated pot body 1. The support frame 4 only serves to provide an operating platform and support the integrated pot body 1. The present application does not limit this implementation method.

[0089] Anything not described in the present invention can be achieved by adopting or drawing on existing technologies.

[0090] The various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referenced to each other, and each embodiment focuses on the differences from other embodiments.

[0091] The above description is only an embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent substitution, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.

Claims

1. A quartz product degreasing and cleaning device, characterized in that: The invention comprises a pot body and a cover body placed on the pot body, wherein the pot body is provided with a accommodating cavity, wherein the accommodating cavity comprises a accommodating space for accommodating a quartz product and a supporting space located below the accommodating space, wherein a supporting member for supporting the quartz product is arranged in the supporting space, wherein the supporting member comprises a plurality of supporting portions extending in strips on the bottom wall of the accommodating cavity, and a collecting area for collecting fat is formed between the plurality of supporting portions.

2. The quartz product degreasing and cleaning device according to claim 1, characterized in that: The support portion extends radially along the pot body, and the cross-sectional height of at least a portion of the support portion gradually increases radially outwardly along the pot body, so as to form an inclined surface on the upper surface of the support portion that is inclined downward toward the axis of the pot body.

3. The quartz product degreasing and cleaning device according to claim 2, characterized in that: An upward limiting protrusion is arranged at one end of the plurality of support parts away from the axis of the pot body, and the plurality of limiting protrusions surround the quartz product.

4. The quartz product degreasing and cleaning device according to claim 1, characterized in that: The support portion is provided with a communication port so as to connect the plurality of collection areas.

5. The quartz product degreasing and cleaning device according to claim 1, characterized in that: The supporting portion includes a fixed end fixed to the bottom wall of the accommodating cavity and a supporting end for supporting the quartz product, the supporting end is located above the fixed end, and the hardness of the supporting end is less than the hardness of the fixed end.

6. The quartz product degreasing and cleaning device according to claim 1, characterized in that: The radial dimension of the cover body is greater than the radial dimension of the pot body. The cover body comprises a main body and a dripping portion, and the lower edge of the dripping portion is lower than the lower edge of the main body.

7. The quartz product degreasing and cleaning device according to claim 1, characterized in that: A drainage hole is arranged on the side wall of the support space, the drainage hole is communicated with the collection area, and a drainage valve for controlling the drainage hole is arranged on the pot body at the position of the drainage hole.

8. The quartz product degreasing and cleaning device according to claim 1, characterized in that: The quartz product degreasing and cleaning device also includes a supporting frame, which has an equipment cavity inside. The top wall of the supporting frame is provided with a placement hole connected to the equipment cavity, and the top wall of the equipment cavity is provided with a heating plate. The pot body passes through the placement hole from top to bottom and abuts against the heating plate.

9. The quartz product degreasing and cleaning device according to claim 8, characterized in that: A sealing gasket is arranged at the edge of the placement hole, and the upper edge of the sealing gasket is higher than the upper edge of the edge.

10. The quartz product degreasing and cleaning device according to claim 8, characterized in that: A control component is arranged in the equipment cavity, the control component is electrically connected to the heating plate, the control component is used to control the heating plate, a control button is arranged on the side of the control component, the support frame includes an opening and closing part to realize the opening and closing of the equipment cavity, and the control button faces the opening and closing part.

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