Spray plate, gas conveying system and thin film deposition equipment

Abstract

The invention discloses a spraying plate, a gas conveying system and thin film deposition equipment, the spraying plate comprises a plate body, the plate body is provided with a front surface and a back surface, the front surface of the plate body is provided with two spraying hole paths, the back surface of the plate body is provided with two groups of spiral flow channels, and the two groups of spiral flow channels are distributed in a double-spiral staggered manner; the paths of the two paths of spraying holes are distributed along the two groups of spiral runners respectively, and at least one group of spiral runners comprises at least two paths of spiral channels; spraying hole interchange points of the two spiral channels are arranged between the center and the edge of the spiral flow channel, and spraying hole paths are spirally arranged from the center of one spiral channel to the spraying hole interchange points and are spirally arranged from the spraying hole interchange points to the edge of the other spiral channel. The first gas source supplies gas to one group of spiral flow channels, and the second gas source supplies gas to the other group of spiral flow channels. And internal and external partition of the central area and the edge area is realized through spraying hole interchange points, so that component and thickness adjustment can be respectively carried out on the internal area and the external area.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a shower plate, a gas delivery system and a thin film deposition device. Background Art

[0002] Atomic layer deposition (ALD) plays an extremely critical role in the field of modern semiconductor manufacturing. In the ALD process, when a spiral spray plate is used, its flow channel extends from the center spiral to the edge, and each flow channel from the center to the edge is controlled by a set of flow meters and valve groups. Usually, the two channels of the dual-channel spiral spray plate are each controlled by a set of flow meters, valve groups and reactant source bottles. However, this traditional control method has obvious limitations. During the pulse injection stage, the pressure, flow rate and pulse injection time of the channel remain unchanged. Due to the special flow channel structure of the spiral spray plate, the distance from the center to the edge is very different. This fixed parameter setting cannot effectively take into account the center and edge areas, and it is difficult to achieve precise control of the thickness and composition of the inner and outer ring films, making it difficult to further improve the uniformity of film formation. As the semiconductor process continues to advance from 28nm to below 7nm, more stringent requirements are put forward for the uniformity of film thickness and composition. The traditional dual-channel spiral spray plate control technology can no longer meet the current process development needs. An innovative technical solution that can significantly improve the uniformity of thickness and composition ratio is urgently needed to break through the bottleneck of existing film uniformity optimization. Summary of the invention

[0003] The embodiments of the present invention provide a spray plate, a gas delivery system and a thin film deposition device, aiming to solve the problem of poor uniformity of film thickness and composition of the existing spiral spray plate.

[0004] In a first aspect, the present invention provides a spray plate, comprising: a plate body, the plate body having a front side and a back side, the front side of the plate body being provided with two spray hole paths, the back side of the plate body being provided with two groups of spiral flow channels, the two groups of spiral flow channels being distributed in a double-helix staggered manner, the two spray hole paths being distributed along the two groups of spiral flow channels respectively, and at least one group of the spiral flow channels comprising at least two spiral channels;

[0005] Among them, a spray hole exchange point of the two spiral channels is set between the center and the edge of the spiral flow channel, and the spray hole path is spirally arranged along the center of one of the spiral channels to the spray hole exchange point, and spirally arranged from the spray hole exchange point to the edge of the other spiral channel.

[0006] Further, one of the spray hole paths is a first spray hole path, one of the spiral flow channels is a first group of spiral flow channels, the first group of spiral flow channels includes a first spiral channel and a second spiral channel, a first spray hole exchange point between the first spiral channel and the second spiral channel is arranged between the center and the edge of the first group of spiral flow channels, the first spray hole path is spirally arranged along the center of the second spiral channel to the first spray hole exchange point, and is spirally arranged from the first spray hole exchange point to the edge of the first spiral channel.

[0007] Further, the width of a section from the center of the second spiral channel to the interchange point of the first spray hole is greater than the width of a section from the center of the first spiral channel to the interchange point of the first spray hole.

[0008] Further, the width of the edge section from the first spray hole exchange point to the first spiral channel is greater than the width of the edge section from the first spray hole exchange point to the second spiral channel.

[0009] Furthermore, another spray hole path is a second spray hole path, another group of spiral flow channels is a second group of spiral flow channels, the second group of spiral flow channels includes a third spiral channel and a fourth spiral channel, a second spray hole exchange point between the third spiral channel and the fourth spiral channel is arranged between the center and the edge of the second group of spiral flow channels, the second spray hole path is spirally arranged along the center of the third spiral channel to the second spray hole exchange point, and is spirally arranged from the second spray hole exchange point to the edge of the fourth spiral channel.

[0010] Furthermore, the width of the section from the center of the third spiral channel to the exchange point of the second spray hole is greater than the width of the section from the center of the fourth spiral channel to the exchange point of the second spray hole.

[0011] Furthermore, the width of the edge section from the second spray hole interchange point to the fourth spiral channel is greater than the width of the edge section from the second spray hole interchange point to the third spiral channel.

[0012] Furthermore, the spray hole interchange point is arranged close to the edge of the plate body.

[0013] Further, the reaction gas enters from the center of the spiral flow channel and flows out from the edge of the spiral flow channel; and / or,

[0014] The reaction gas enters from the edge of the spiral flow channel and flows out from the center of the spiral flow channel.

[0015] Furthermore, each of the spray hole paths includes a plurality of spray holes, and the plurality of spray holes are alternately arranged along a spiral pattern.

[0016] In a second aspect, the present invention further provides a gas delivery system, comprising: a spray plate, a first gas source and a second gas source, wherein the spray plate is the above-mentioned spray plate, the first gas source supplies gas to one group of spiral flow channels, and the second gas source supplies gas to another group of spiral flow channels.

[0017] Furthermore, the first spiral channel and the second spiral channel are connected to the first gas source, and the third spiral channel and the fourth spiral channel are connected to the second gas source; wherein each spiral channel is connected to the gas source according to its corresponding preset gas parameters, and the preset gas parameters include flow rate and pulse injection time.

[0018] Further, the number of spiral channels supplied by the first gas source is equal to or unequal to the number of spiral channels supplied by the second gas source.

[0019] In a third aspect, the present invention further provides a thin film deposition device, comprising the above-mentioned gas delivery system.

[0020] The present invention provides a spray plate, a gas delivery system and a thin film deposition device, wherein the spray plate comprises: a plate body, a front side of the plate body is provided with two spray hole paths, a back side of the plate body is provided with two groups of spiral flow channels, the two groups of spiral flow channels are distributed in a double spiral staggered manner, the two spray hole paths are distributed along the two groups of spiral flow channels respectively, at least one group of spiral flow channels includes at least two spiral channels, relative to the existing spray plate having only one group of double spiral channels, the present application adds one group of double spiral flow channels, and a spray hole interchange point is provided, the spray hole path is at the spray hole interchange point Switching from one spiral channel to another makes it possible that only one spiral channel from the center of the spray plate to the spray hole interchange point is distributed with spray holes, and the other spiral channel is not distributed with spray holes; similarly, only one spiral channel from the spray hole interchange point to the edge is distributed with spray holes, and the other spiral channel is not distributed with spray holes; in this way, the section with spray holes can emit air, and the section without spray holes cannot emit air, and the inner and outer partitions of the center area and the edge area are realized with the spray hole interchange point as the boundary. Then, by equipping the two sets of spiral flow channels with the first gas source and the second gas source respectively, the components and thickness of the inner and outer double zones can be adjusted respectively, thereby achieving better uniformity and component control of the double zones. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying any creative work.

[0022] Figure 1 A schematic diagram of the back side of a shower plate according to an embodiment of the present invention is shown;

[0023] Figure 2 Shown Figure 1 A magnified view of part A;

[0024] Figure 3 A schematic top view of a spray plate according to an embodiment of the present invention is shown;

[0025] Figure 4 Shown Figure 3 A magnified view of part B;

[0026] Figure 5 A front schematic diagram of a spray plate according to an embodiment of the present invention is shown;

[0027] Figure 6 A cross-sectional schematic diagram of a spray plate according to an embodiment of the present invention is shown;

[0028] Figure 7 A schematic diagram showing the spray plate interchange points of the spray plate of an embodiment of the present invention;

[0029] Reference numerals:

[0030] 1. Plate body; 12. Air inlet end; 13. Air outlet end; 21. First spiral channel; 22. Second spiral channel; 23. Third spiral channel; 24. Fourth spiral channel; 31. First spray hole path; 311. First spray hole interchange point; 32. Second spray hole path; 321. Second spray hole interchange point. DETAILED DESCRIPTION

[0031] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0032] The directional terms mentioned in the present invention, such as "upper", "lower", "front", "back", "left", "right", "inner", "outer", "side", etc., are only referenced to the directions of the attached drawings. Therefore, the directional terms used are used to illustrate and understand the present invention, but are not used to limit the present invention. In addition, in the drawings, structures with similar or identical structures are represented by the same reference numerals.

[0033] In the existing double-helix channel spray plate, the spiral channel extends from the center to the edge. The reaction gas first reaches the center of the spray plate, and it takes a relatively long time to reach the edge. This will lead to a higher concentration of reactants in the center area, thus forming a thicker film. In contrast, the concentration of reactants in the edge area is lower, the film formation speed is slower, and the final film is thinner. Each of the two spiral channels is equipped with a set of air intake systems, and the pressure, flow rate and pulse time of the intake are fixed, which cannot take into account the thickness and composition of the center and the edge, thus causing a bottleneck in the optimization of film formation uniformity. Therefore, the thickness and composition of the existing double-helix channel spray plate in the center and edge areas cannot be adjusted separately, and it is impossible to achieve a high thickness uniformity and component control in different areas.

[0034] To this end, the embodiments of the present invention propose a spray plate, a gas delivery system and a thin film deposition device, which solve the problem of poor film thickness and component uniformity of the existing spiral spray plate. By adding a set of double spiral channels and using the interchange points of the spray holes to realize the inner and outer partitions of the center and the edge, the component and thickness of the inner and outer zones can be adjusted respectively, thereby meeting the higher requirements for thickness and component uniformity.

[0035] The embodiments of the present invention solve the above-mentioned problems of thickness and component uniformity, and the specific ideas are as follows:

[0036] Compared with the existing double-helix channel spray plate, another group of double-helix channels is added, that is, four-way spiral channels, two in a group, each two-way spiral channels are provided with a spray hole exchange point, the spray hole exchange point is also the spray hole position exchange point of the two-way spiral channels, the spray hole path is first arranged spirally from the center of one of the spiral channels to the spray hole exchange point, and then arranged spirally from the spray hole exchange point to the edge of the other spiral channel, so that the section with the spray holes can be discharged, and the section without the spray holes cannot be discharged. Then, in the four-way spiral channels, two of the spiral channels are distributed with spray holes from the center to the spray hole exchange point, and no spray holes are distributed from the spray hole exchange point to the edge, so that the central area of ​​the two spiral channels can be discharged but the edge area cannot be discharged; the other two spiral channels are not distributed with spray holes from the center to the spray hole exchange point, and spray holes are distributed from the spray hole exchange point to the edge, so that the central area of ​​the other two spiral channels cannot be discharged but the edge area can be discharged. Therefore, the spray hole interchange point is used as the boundary to realize the inner and outer partition of the center area and the edge area. Based on this, the first set of channels is used for deposition in the center area, and the second set of channels is used for deposition in the edge area. At the same time, two sets of air intake systems are equipped to adjust the composition and thickness of the inner and outer areas respectively, thereby achieving better uniformity and component control in the two areas, meeting the higher requirements for thickness and component uniformity.

[0037] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0038] See also Figure 1-Figure 7 An embodiment of the present invention shows a spray plate, comprising: a plate body 1, wherein the plate body 1 has a front side and a back side, wherein the front side of the plate body 1 is provided with two spray hole paths, and the back side of the plate body 1 is provided with two groups of spiral flow channels, wherein the two groups of spiral flow channels are arranged in a double-helix staggered manner, wherein the two spray hole paths are respectively distributed along the two groups of spiral flow channels, and at least one group of the spiral flow channels comprises at least two spiral channels; wherein a spray hole exchange point of the two spiral channels is arranged between the center and the edge of the spiral flow channel, and the spray hole path is spirally arranged along the center of one of the spiral channels to the spray hole exchange point, and spirally arranged from the spray hole exchange point to the edge of the other spiral channel.

[0039] Specifically, the spray plate includes a plate body 1 and a cover body (not shown in the figure), the cover body covers the plate body 1, and the cover body and the plate body 1 enclose the internal space of the spray plate. The side of the plate body 1 facing the internal space is the back side, and the side of the plate body 1 facing away from the internal space is the front side. The plate body 1 has a circular plate body 1 structure. In the internal space, that is, on the back side of the plate body 1, two groups of spiral flow channels are arranged, and the reaction gas enters from the back side of the plate body 1 and flows along the two groups of spiral flow channels. On the front side of the plate body 1, two spray hole paths are arranged, namely the first spray hole path and the second spray hole path, each spray hole path corresponds to a group of spiral flow channels, the first spray hole path 31 is distributed along the first group of spiral flow channels, and the second spray hole path 32 is distributed along the second group of spiral flow channels. In this way, the reaction gas enters from the back side of the plate body 1, and in the process of flowing along the two groups of spiral flow channels, it can be discharged downward through the two spray hole paths to deposit a thin film. Specifically, the two groups of spiral flow channels are distributed in a double helix staggered manner on the front of the plate body 1, and the two spray hole paths on the back of the plate body 1 are distributed along the two groups of spiral flow channels, so the two spray hole paths on the back of the plate body 1 are also distributed in a double helix staggered manner. The spray holes penetrate the plate body 1 and connect the front and back of the plate body 1, so that the reaction gas in the spiral flow channel on the back can be discharged through the spray holes, and then a thin film is deposited. The spray holes can be straight holes, inclined holes, or stepped holes, etc., which are not limited here. Each of the spray hole paths includes a plurality of spray holes, and the plurality of spray holes are alternately arranged along the spiral intervals, so that the spray holes on the back of the plate body 1 are arranged in a double helix alternating hole arrangement along the two spiral flow channels.

[0040] Among them, the reaction gas enters from the center of the spiral flow channel and flows out from the edge of the spiral flow channel; and / or, the reaction gas enters from the edge of the spiral flow channel and flows out from the center of the spiral flow channel. Specifically, the air is injected at the center starting end of the spiral flow channel, and the gas is dumped at the edge end of the spiral flow channel. The reaction gas flows spirally from the center air intake and is discharged from the edge. During the spiral flow process, the gas is discharged downward through the spray hole. It can be understood that it is also possible to intake air at the edge starting end of the spiral flow channel and discharge air at the center end of the spiral flow channel. The reaction gas flows spirally from the edge air intake and is discharged from the center. During the spiral flow process, the gas is discharged downward through the spray hole. This embodiment adopts the method of center air intake and edge air outlet. Of course, it can also be understood that one group of spiral flow channels may be center air intake and edge air outlet, and the other group of spiral flow channels may be edge air intake and center air outlet. Those skilled in the art can set it according to actual process requirements, which is not limited here.

[0041] In this embodiment, at least one group of spiral flow channels includes at least two spiral channels, and the spiral channels are spiral guide groove structures. For example, the two groups of spiral flow channels are respectively the first group of spiral flow channels and the second group of spiral flow channels. The first group of spiral flow channels includes two spiral channels, and the second group of spiral flow channels includes two spiral channels. For another example, the first group of spiral flow channels includes one spiral channel, and the second group of spiral flow channels includes two spiral channels. For another example, the first group of spiral flow channels includes two spiral channels, and the second group of spiral flow channels includes three spiral channels. That is, it is ensured that there is a group of spiral flow channels with at least two spiral channels. The two groups of spiral flow channels in this embodiment both include two spiral channels. The center start end of each spiral channel is provided with an inject air inlet port 12, and the tail end of each group of spiral flow channels is provided with a dump air outlet port 13. Each group of spiral flow channels has a spray hole exchange point. The spray hole exchange point is the spray hole position exchange point of the two spiral channels. The spray hole path switches the path at the spray hole exchange point, switching from one spiral channel to another spiral channel. The spray hole exchange point is set at a certain position in the middle of the entire spiral path from the center to the edge of the spiral flow channel, and the spray hole exchange point serves as the dividing point between the central area and the edge area. Specifically, a group of spiral flow channels includes two spiral channels, namely channel 1 and channel 2, and the spray hole exchange point is swap. The spray hole path first starts from the center of channel 2 and spirally extends to swap. The spray hole path is switched at the swap point, and the spray hole path then extends from swap spirally to the edge of channel 1. That is, in the section from the center to swap, only channel 2 has a spray hole, and channel 1 does not have a spray hole; in the section from swap to the edge, only channel 1 has a spray hole, and channel 2 does not have a spray hole. In this way, the partition between the central area and the edge area is realized through the spray hole exchange point, and the center to swap is the central area, and swap to the edge is the edge area. Similarly, another group of spiral flow channels can also have the same structure, which will not be repeated here.

[0042] Through this embodiment, the inner and outer divisions of the central area and the edge area are realized with the spray hole interchange point as the boundary. In this way, the flow rate and pulse time of the reaction gas introduced into each spiral channel can be controlled separately, so that the thickness and composition of the inner and outer double zones can be controlled to achieve better thickness uniformity and composition uniformity.

[0043] Reference Figure 7In one embodiment, the two spray hole paths are respectively a first spray hole path 31 and a second spray hole path 32, the two groups of spiral flow channels are respectively a first group of spiral flow channels and a second group of spiral flow channels, the first group of spiral flow channels include a first spiral channel 21 and a second spiral channel 22, the second group of spiral flow channels include a third spiral channel 23 and a fourth spiral channel 24; a first spray hole exchange point 311 between the first spiral channel 21 and the second spiral channel 22 is arranged between the center and the edge of the first group of spiral flow channels, the first spray hole path 31 is arranged along the first spiral channel 21 and the second spiral channel 22, The center of the second spiral channel 22 is spirally arranged toward the first spray hole interchange point 311, and is spirally arranged from the first spray hole interchange point 311 to the edge of the first spiral channel 21; the second spray hole interchange point 321 of the third spiral channel 23 and the fourth spiral channel 24 is arranged between the center and the edge of the second group of spiral flow channels, and the second spray hole path 32 is spirally arranged along the center of the third spiral channel 23 to the second spray hole interchange point 321, and is spirally arranged from the second spray hole interchange point 321 to the edge of the fourth spiral channel 24.

[0044] Specifically, in this embodiment, the two groups of spiral flow channels are respectively the first group of spiral flow channels and the second group of spiral flow channels. The first group of spiral flow channels includes two spiral channels, namely the first spiral channel 21 and the second spiral channel 22, hereinafter referred to as channel 1 and channel 2. The second group of spiral flow channels also includes two spiral channels, namely the third spiral channel 23 and the fourth spiral channel 24, hereinafter referred to as channel 3 and channel 4. A spray hole swap point swap1 is provided between channel 1 and channel 2, and a spray hole swap point swap2 is provided between channel 3 and channel 4. The two spray hole paths are respectively the first spray hole path and the second spray hole path. The first spray hole path is distributed along channel 1 and channel 2, and the second spray hole path is distributed along channel 3 and channel 4. Specifically, the first spray hole path is distributed with spray holes from the center to swap1 channel 2, and channel 1 is not distributed with spray holes; from swap1 to the edge, channel 1 is distributed with spray holes, and channel 2 is not distributed with spray holes. The second spray hole path has spray holes distributed from the center to swap2 channel 3, and no spray holes distributed in channel 4; from swap2 to the edge, spray holes are distributed in channel 4, and no spray holes are distributed in channel 3. That is, from the center to swap1 and swap2, channel 2 and channel 3 are distributed with spray holes, and from swap1 and swap2 to the edge channel 1 and channel 4, spray holes are distributed. Through the design of the four-way spiral channel and the two spray hole exchange points in this embodiment, the inner and outer partitions of the central area and the edge area are realized, and the component and thickness of the inner and outer areas can be adjusted respectively, thereby achieving better uniformity and controlling the components of the dual areas, meeting the higher requirements for thickness and component uniformity.

[0045] In one embodiment, the width of the section from the center of the second spiral channel 22 to the first spray hole exchange point 311 is greater than the width of the section from the center of the first spiral channel 21 to the first spray hole exchange point 311; the width of the section from the center of the third spiral channel 23 to the second spray hole exchange point 321 is greater than the width of the section from the center of the fourth spiral channel 24 to the second spray hole exchange point 321. Specifically, the spiral channel is not of equal width from the center to the edge, and its width can be adjusted according to actual process requirements. For example, the spiral channel can be wide in the front section and narrow in the back section, or narrow in the front section and wide in the back section. The wide section has a large gas flow rate and a high deposition rate, while the narrow section has a small gas flow rate and a low deposition rate. Due to the space limitation of the spray plate, each spiral channel needs to occupy a certain space. Due to the partition design of the spray hole exchange point, the spiral channel of some sections does not have spray holes distributed but also occupies space. Therefore, the spiral channel of this section can be designed to be narrower, while the spiral channel of the section with spray holes distributed can be designed to be wider. While making reasonable use of space, it ensures that the reaction gas flow is sufficient, the reaction is sufficient, and the film deposition effect is improved. Specifically, from the center to swap1, since channel 2 is provided with spray holes while channel 1 is not provided with spray holes, this section of channel 2 outputs reaction gas while channel 1 does not output reaction gas, so the width of channel 2 can be designed to be larger than the width of channel 1, and channel 1 is reduced in width in this section, and the width it occupies is given to channel 2, which reasonably saves space, so that channel 2 has more sufficient gas flow, and improves the film deposition effect. Similarly, from the center to swap2, since channel 3 is provided with spray holes while channel 4 is not provided with spray holes, this section of channel 3 outputs reaction gas while channel 4 does not output reaction gas, so the width of channel 3 can be designed to be larger than the width of channel 4, and channel 4 is reduced in width in this section, and the width it occupies is given to channel 3, which reasonably saves space, so that channel 3 has more sufficient gas flow, and improves the film deposition effect.

[0046] In this embodiment, the width of the edge section from the first spray hole swap point 311 to the first spiral channel 21 is greater than the width of the edge section from the first spray hole swap point 311 to the second spiral channel 22; the width of the edge section from the second spray hole swap point 321 to the fourth spiral channel 24 is greater than the width of the edge section from the second spray hole swap point to the third spiral channel 23. Specifically, from swap1 to the edge, since channel 1 is distributed with spray holes while channel 2 is not distributed with spray holes, this section of channel 1 outputs reaction gas while channel 2 does not output reaction gas, so the width of channel 1 can be designed to be greater than the width of channel 2, and channel 2 reduces its width in this section, giving the width it occupies to channel 1, reasonably saving space, so that channel 1 has more sufficient gas flow, and improves the film deposition effect. Similarly, from swap2 to the edge, since channel 4 is provided with spray holes while channel 3 is not, this section of channel 4 outputs reaction gas while channel 3 does not output reaction gas. Therefore, the width of channel 4 can be designed to be larger than the width of channel 3. Channel 3 reduces its width in this section and gives the width it occupies to channel 4, which reasonably saves space, enables channel 4 to have more sufficient gas flow, and improves the thin film deposition effect.

[0047] In one embodiment, the first spray hole exchange point 311 and the second spray hole exchange point 321 are arranged near the edge of the plate body 1. Specifically, the position of the spray hole exchange point and the width of the spiral channel can be adjusted according to the actual process requirements. In this embodiment, the positions of swap1 and swap2 are designed to be close to the edge of the spray plate, and channel 2 and channel 3 are designed to be wider from the center to swap1 and swap2 and lead to the front, that is, the central area is expanded, so that the central area is expanded to near the edge, so that it can be ensured that the gas flow is large enough before the swap, and sufficient reactants are provided for the subsequent edge area deposition. The swap position is designed to be closer to the edge, which means that more gas flow will be deposited in the edge area. This ensures that the edge area obtains enough reactants to avoid the problem of insufficient deposition. The dump section from swap1 and swap2 to the edge exhaust of channel 1 and channel 4 is designed to be wider and lead to the front. The wider channel can significantly increase the gas flow in the edge area, and more reactants can reach the edge area, thereby increasing the deposition rate in the edge area. By designing the spray hole interchange point closer to the edge, the gas flow in the edge area can be significantly increased, thereby improving the deposition rate in the edge area. This structure can effectively solve the problem of thin thickness in the edge area and ensure that the thickness of the film is more uniform over the entire substrate surface.

[0048] The embodiment of the present invention further provides a gas delivery system, including: a spray plate, a first gas source, and a second gas source, wherein the spray plate is the spray plate of the above embodiment, the first gas source supplies gas to one group of spiral flow channels, and the second gas source supplies gas to another group of spiral flow channels. Specifically, the spray plate has been described in detail in the above embodiment, and for the sake of brevity of the specification, it will not be repeated here.

[0049] In this embodiment, the two groups of spiral flow channels are respectively equipped with two groups of gas sources, namely the first gas source and the second gas source. The gas source can be a pure carrier gas or a purge gas, such as Ar or N2, or a gas carrying a reactant. Each spiral channel of the first group of spiral flow channels is connected to the first gas source, and each spiral channel of the second group of spiral flow channels is connected to the second gas source. The gas sources connected to each spiral channel are independently controlled, and the parameters such as the pressure, flow rate and pulse time of the gas in different spiral channels can be adjusted.

[0050] Through this embodiment, the spray plate realizes the inner and outer division of the central area and the edge area by exchanging the spray hole points, and the two groups of spiral flow channels are respectively equipped with the first gas source and the second gas source, so that the composition and thickness of the inner and outer double areas can be adjusted respectively, thereby achieving better uniformity and component control of the double areas.

[0051] In one embodiment, the first spiral channel 21 and the second spiral channel 22 are connected to the first gas source, and the third spiral channel 23 and the fourth spiral channel 24 are connected to the second gas source; wherein each spiral channel is connected to the gas source according to its corresponding preset gas parameters, and the preset gas parameters include flow rate and pulse injection time.

[0052] In the present embodiment, the two groups of spiral flow channels respectively include two spiral channels, namely the first spiral channel 21, the second spiral channel 22, the third spiral channel 23 and the fourth spiral channel 24, hereinafter referred to as channel 1, channel 2, channel 3 and channel 4. Channel 1 and channel 2 are a group, both of which are connected to the first gas source. Channel 3 and channel 4 are a group connected to the second gas source. Each channel controls the gas source through preset gas parameters, that is, the four channels are controlled by four groups of preset gas parameters, and the preset gas parameters may include the flow rate and pulse injection time of the gas. By controlling the flow rate and pulse injection time of channels 1-4 respectively, the thickness and composition of the inner and outer double zones can be controlled to achieve better thickness uniformity and composition uniformity.

[0053] In a specific example, the shower plate can deliver gas according to the following Table 1.

[0054] item pulse1 dump1 purge1 pulse2 dump2 purge2 Gasline1 Chemical1 Ar Ar Ar Ar Ar Gasline2 Chemical1 Ar Ar Ar Ar Ar Gasline3 Ar Ar Ar Chemical2 Ar Ar Gasline4 Ar Ar Ar Chemical2 Ar Ar Dumpline1 close open close close open close Dumpline2 close open close close open close

[0055] Among them, gasline is the gas path of the gas source, gasline1-4 are connected to channels 1-4 respectively. Dumpline is the discharge channel used to connect the dump of the spiral flow channel of the spray plate and the pump of the exhaust system. Dumpline1 connects the dump of the first group of spiral flow channels (channels 1 and 2), and Dumpline2 connects the dump of the second group of spiral flow channels (channels 3 and 4). Purge is purging, pulse is pulse injection, and dump is exhaust.

[0056] Channel 1, channel 2 and Dumpline 1 are a group, channel 3, channel 4 and Dumpline 2 are a group. The gas in each group is the same, the gas enters from channel 1 / 2 or channel 3 / 4, and is discharged from Dumpline 1 or Dumpline 2 and the pump. The table lists the gas state of each group at different times, which can be pure carrier gas or purge gas, such as Ar or N2, or gas carrying reactants.

[0057] In one embodiment, the number of spiral channels supplied by the first gas source is equal to or unequal to the number of spiral channels supplied by the second gas source. Specifically, the number of spiral channels corresponding to the two components may be the same or different, so that the distribution of a certain component in the region can be adjusted. For example, the number of spiral channels of one component is 1, and the number of spiral guide grooves of the other component is 2 or more, for example, one spiral channel leads to Chemical 1, and three spiral channels lead to Ar. By designing the number of spiral channels corresponding to different components, the distribution of each component in different areas of the substrate surface can be flexibly adjusted. This design can significantly improve the thickness uniformity and component control accuracy of the film, and is particularly suitable for advanced processes with extremely high uniformity requirements. For example, by increasing the number of spiral channels of a certain component, more refined regional division and control can be achieved during the deposition process of the component, thereby optimizing its deposition rate and component ratio in different areas.

[0058] The embodiment of the present invention further provides a thin film deposition device, comprising the gas delivery system of the above embodiment. Specifically, the gas delivery system has been described in detail in the above embodiment, and for the sake of brevity of the description, it will not be repeated here.

[0059] Through this embodiment, the inner and outer partitions of the central area and the edge area are realized by using the interchange points of the spray holes. The first group of channels is used for deposition in the central area, and the second group of channels is used for deposition in the edge area. At the same time, two groups of air intake systems are equipped to perform dual adjustments of component and thickness on the inner and outer areas respectively, thereby achieving better uniformity and component control of the dual areas, meeting higher requirements for thickness and component uniformity.

[0060] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed by the present invention, and these modifications or replacements should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention shall be based on the protection scope of the claims.

Claims

1. A spray plate, characterized in that: The invention comprises: a plate body, wherein the plate body has a front side and a back side, the front side of the plate body is provided with two spray hole paths, the back side of the plate body is provided with two groups of spiral flow channels, the two groups of spiral flow channels are distributed in a double-helix staggered manner, the two spray hole paths are distributed along the two groups of spiral flow channels respectively, and at least one group of the spiral flow channels includes at least two spiral channels; Among them, a spray hole exchange point of the two spiral channels is set between the center and the edge of the spiral flow channel, and the spray hole path is spirally arranged along the center of one of the spiral channels to the spray hole exchange point, and spirally arranged from the spray hole exchange point to the edge of the other spiral channel.

2. The shower plate according to claim 1, characterized in that: One of the spray hole paths is the first spray hole path, one of the spiral flow channels is the first group of spiral flow channels, the first group of spiral flow channels includes a first spiral channel and a second spiral channel, a first spray hole exchange point between the first spiral channel and the second spiral channel is arranged between the center and the edge of the first group of spiral flow channels, the first spray hole path is spirally arranged along the center of the second spiral channel to the first spray hole exchange point, and spirally arranged from the first spray hole exchange point to the edge of the first spiral channel.

3. The shower plate according to claim 2, characterized in that: The width of a section from the center of the second spiral channel to an interchange point of the first spray hole is greater than the width of a section from the center of the first spiral channel to an interchange point of the first spray hole.

4. The shower plate according to claim 2, characterized in that: The width of the edge section from the first spray hole exchange point to the first spiral channel is greater than the width of the edge section from the first spray hole exchange point to the second spiral channel.

5. The shower plate according to any one of claims 1 to 4, characterized in that: Another spray hole path is a second spray hole path, another group of spiral flow channels is a second group of spiral flow channels, the second group of spiral flow channels includes a third spiral channel and a fourth spiral channel, a second spray hole exchange point between the third spiral channel and the fourth spiral channel is arranged between the center and the edge of the second group of spiral flow channels, the second spray hole path is spirally arranged along the center of the third spiral channel to the second spray hole exchange point, and spirally arranged from the second spray hole exchange point to the edge of the fourth spiral channel.

6. The shower plate according to claim 5, characterized in that: The width of the section from the center of the third spiral channel to the second spray hole interchange point is greater than the width of the section from the center of the fourth spiral channel to the second spray hole interchange point.

7. The shower plate according to claim 5, characterized in that: The width of the edge section from the second spray hole interchange point to the fourth spiral channel is greater than the width of the edge section from the second spray hole interchange point to the third spiral channel.

8. The shower plate according to claim 1, characterized in that: The spray hole interchange point is arranged close to the edge of the plate body.

9. The shower plate according to claim 1, characterized in that: The reaction gas enters from the center of the spiral flow channel and flows out from the edge of the spiral flow channel; and / or, The reaction gas enters from the edge of the spiral flow channel and flows out from the center of the spiral flow channel.

10. The shower plate according to claim 1, characterized in that: Each of the spray hole paths comprises a plurality of spray holes, and the plurality of spray holes are alternately arranged along a spiral interval.

11. A gas delivery system, characterized in that: include: A spray plate, a first gas source and a second gas source, wherein the spray plate is the spray plate according to any one of claims 1 to 10, the first gas source supplies gas to one group of spiral flow channels, and the second gas source supplies gas to another group of spiral flow channels.

12. The gas delivery system according to claim 11, characterized in that The first spiral channel and the second spiral channel are connected to the first gas source, and the third spiral channel and the fourth spiral channel are connected to the second gas source; wherein each spiral channel is connected to the gas source according to its corresponding preset gas parameters, and the preset gas parameters include flow rate and pulse injection time.

13. The gas delivery system according to claim 11, characterized in that The number of spiral channels supplied by the first gas source is equal to or unequal to the number of spiral channels supplied by the second gas source.

14. A thin film deposition device, characterized in that: Comprising a gas delivery system as described in any one of claims 11-13.

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