Vacuum plating machine

Abstract

The invention discloses a vacuum plating machine which comprises two main furnaces and an auxiliary furnace, each main furnace comprises a target material frame and a plurality of placing frames, each target material frame comprises two conductive stand columns, a plurality of electrodes, a plurality of tungsten filaments and a plurality of bearing pieces, and the plurality of electrodes on the two conductive stand columns are respectively a cathode and an anode. During vacuum electroplating, the two electrodes are electrified to the tungsten filament to heat the tungsten filament, the target material is heated by the tungsten filament to be molten, and part of dripping target material liquid is received by the receiving piece, so that the phenomenon that the dripping target material liquid drips to the lower electrode or the lining plate to generate spark splashing is avoided. According to the vacuum plating machine, dripping target liquid is received by arranging the receiving piece, so that the effect of preventing the target liquid from dripping and splashing to scald devices in the machine is achieved; and the two main furnaces are arranged for alternate feeding and are combined with the auxiliary furnace for vacuum electroplating, so that the connection feeding time of electroplating of each batch can be saved, and the production efficiency is improved.

Description

Technical Field

[0001] The invention relates to the technical field of electroplating machines, and in particular to a vacuum electroplating machine. Background Art

[0002] The vacuum plating machine is a device used to coat the surface of a workpiece. During the coating process, the target material needs to be heated by a tungsten wire to change from solid to liquid. The target material will evaporate and settle on the surface of the workpiece to be plated, and then form a thin film through the film forming process. However, when the target material melts from solid to liquid, due to the uneven heating of each tungsten wire, part of the target liquid will drip from above and fall on the electrode or liner below, forming sparks and eventually scalding the machine settings.

[0003] It can be seen that the existing technology still needs to be improved and enhanced. Summary of the invention

[0004] In view of the above-mentioned deficiencies in the prior art, an object of the present invention is to provide a vacuum electroplating machine, aiming to solve the technical problem in the prior art that the target material may drip and splash and burn the device inside the machine due to uneven heating of the tungsten wire.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] A vacuum electroplating machine, comprising: two main furnaces and one auxiliary furnace, the two main furnaces are respectively hinged on both sides of the auxiliary furnace, the two main furnaces alternately load materials and combine with the auxiliary furnace to perform electroplating; the main furnace comprises a target rack, a plurality of placement racks and a driving mechanism, the target rack is arranged at the center of the main furnace and is used to clamp and heat the target material, the plurality of placement racks are arranged around the outer side of the target rack and are used to clamp the workpiece to be electroplated, the driving mechanism drives and connects the plurality of placement racks and drives the plurality of placement racks to rotate simultaneously; the target rack comprises two conductive columns, a plurality of electrodes, a plurality of tungsten wires and a plurality of receiving parts, the two conductive columns are arranged in parallel, the plurality of electrodes are respectively arranged on the two conductive columns from top to bottom, the plurality of electrodes located on the two conductive columns are respectively cathodes and anodes, the plurality of tungsten wires are respectively arranged on the plurality of electrodes, the two ends of each tungsten wire are respectively electrically connected to two electrodes located at the same height on the two conductive columns, the tungsten wire is in a spiral winding structure and is used to wind and heat the target material, the plurality of receiving parts are respectively arranged corresponding to the plurality of tungsten wires and are located below the tungsten wires, and the plurality of receiving parts are used to receive the heated and molten target liquid.

[0007] In the vacuum plating machine, two electrodes adjacent to each other on the same conductive column are arranged perpendicular to each other, and two electrodes at the same height on different conductive columns are arranged parallel to each other.

[0008] The vacuum electroplating machine described above, wherein the main furnace includes a semicircular top plate, an annular top plate, an annular bottom plate and a circular bottom plate, the semicircular top plate is fixedly connected to the inner top wall of the main furnace, the annular top plate is rotatably set on the inner top of the main furnace, the annular bottom plate is rotatably set on the inner bottom of the main furnace, the circular bottom plate is set on the inner bottom wall of the main furnace and is fixed relative to the semicircular top plate, the upper and lower ends of the two conductive columns are respectively connected to the semicircular top plate and the circular bottom plate, and the upper and lower ends of the multiple placement racks are respectively rotatably connected to the annular top plate and the annular bottom plate.

[0009] The vacuum plating machine, wherein the main furnace further comprises a plurality of connecting columns, the plurality of connecting columns are respectively arranged at intervals with the plurality of placement racks, and the upper and lower ends of the connecting columns are respectively connected to the annular top plate and the annular bottom plate.

[0010] The vacuum plating machine described above, wherein the placement rack includes a support column, an upper mounting rack, a lower mounting rack and a plurality of mounting rods, the upper and lower ends of the support column are rotatably connected to the annular top plate and the annular bottom plate respectively, the upper mounting rack is fixedly installed on the upper end of the support column, and the lower mounting rack is fixedly installed on the lower end of the support column, the plurality of mounting rods are arranged parallel to the support column and the upper and lower ends are detachably connected to the upper mounting rack and the lower mounting rack, and the plurality of mounting rods are provided with a plurality of mounting parts from top to bottom for clamping the workpiece to be electroplated.

[0011] The vacuum plating machine described above has a plurality of mounting holes respectively arranged on the upper mounting frame and the lower mounting frame, and the plurality of mounting holes are arranged in a radial array around the support column. The upper and lower ends of the plurality of mounting rods are respectively detachably arranged in the plurality of mounting holes of the upper mounting frame and the lower mounting frame, and a support plate is arranged at the bottom of the lower mounting frame, and the support plate is used to support the lower end of the mounting rod.

[0012] The vacuum plating machine, wherein the driving mechanism includes a motor, a driving wheel, a driving wheel and a rotating connector, the motor is installed at the bottom of the main furnace and drives the driving wheel, the driving wheel is rotatably installed at the inner bottom of the main furnace and meshes with the driving wheel, the driving wheel is fixedly connected to the rotating connector, the rotating connector is rotatably installed on the annular bottom plate and fixedly connected to the lower end of the support column, the number of driving wheels is equal to the number of rotating connectors and equal to the number of support columns.

[0013] In the vacuum plating machine, the receiving member is in the shape of a bowl or dish, and two receiving members of the same height are respectively installed on one end of one electrode and the other end of another electrode.

[0014] In the vacuum plating machine, a bearing is arranged at the axis of the circular bottom plate, and the bearing is sleeved on the central rotating shaft of the driving wheel so that the driving wheel can rotate relative to the circular bottom plate.

[0015] In the vacuum plating machine, a slide rail coaxial with the circular bottom plate is disposed on the upper surface thereof, and a rotating pulley is disposed on the lower surface of the annular bottom plate, wherein the pulley is slidably accommodated in the slide rail.

[0016] Beneficial effects:

[0017] The present invention provides a vacuum electroplating machine, including two main furnaces and one auxiliary furnace, the main furnace includes a target rack and multiple placement racks, the target rack includes two conductive columns, multiple electrodes, multiple tungsten wires and multiple receiving parts, and the multiple electrodes on the two conductive columns are cathodes and anodes respectively. During vacuum electroplating, the two electrodes are energized to the tungsten wire to heat the tungsten wire, the target material is heated by the tungsten wire and melted, and part of the dripping target liquid is caught by the receiving part to avoid dripping onto the electrode below or the lining plate to cause sparks to splash. The vacuum electroplating machine achieves the effect of preventing the target liquid from dripping and splashing and scalding the internal settings of the machine by arranging a receiving part to catch the dripping target liquid; arranging two main furnaces to alternately load materials and combine with the auxiliary furnace for vacuum electroplating can save the connection and loading time of each batch of electroplating and improve production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 A schematic diagram of the three-dimensional structure of the vacuum plating machine provided by the present invention;

[0019] Figure 2 A schematic diagram of the three-dimensional structure of the main furnace provided by the present invention;

[0020] Figure 3 A schematic diagram of the three-dimensional structure of the target material rack provided by the present invention;

[0021] Figure 4 This is a schematic diagram of the three-dimensional structure of the placement rack provided by the present invention.

[0022] Reference numerals:

[0023] 1—Main furnace 2—Auxiliary furnace 3—Target rack

[0024] 4—Placement rack 5—Drive mechanism 11—Semi-dome plate

[0025] 12—annular top plate 13—annular bottom plate 14—circular bottom plate

[0026] 15—connecting column 31—conductive column 32—electrode

[0027] 33 - tungsten wire 34 - receiving part 41 - supporting column

[0028] 42 - upper mounting frame 43 - lower mounting frame 44 - mounting rod

[0029] 51 - motor 52 - driving wheel 53 - driven wheel

[0030] 54—rotating connector 131—pulley 141—slide rail

[0031] 431 —mounting hole 432 —support plate 441 —mounting portion. DETAILED DESCRIPTION

[0032] The present invention provides a vacuum plating machine. To make the purpose, technical solution and effect of the present invention clearer and more specific, the present invention is further described in detail with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0033] In the description of the present invention, it should be understood that the terms "upper", "lower", "left", "right", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, and a specific direction structure and operation, and therefore, cannot be understood as a limitation on the present invention. In addition, "first" and "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0034] See also Figures 1 to 4As shown, the present invention provides a vacuum electroplating machine, which includes: two main furnaces 1 and an auxiliary furnace 2, the two main furnaces 1 are respectively hinged on both sides of the auxiliary furnace 2, and the two main furnaces 1 alternately load materials and combine with the auxiliary furnace 2 to perform electroplating work; the main furnace 1 includes a target rack 3, a plurality of placement racks 4 and a driving mechanism 5, the target rack 3 is arranged at the center of the main furnace 1 and is used to clamp and heat the target material, the plurality of placement racks 4 are arranged around the outer side of the target rack 3 and are used to clamp the workpiece to be electroplated, and the driving mechanism 5 drives the connection of the plurality of placement racks 4 and drives the plurality of placement racks 4 to rotate simultaneously; the target rack 3 includes two conductive columns 31, a plurality of electrodes 32, a plurality of tungsten wires 33 and a plurality of receiving parts 34, the two conductive columns 31 are parallel to each other. The plurality of electrodes 32 are arranged in rows, respectively, on the two conductive pillars 31 from top to bottom, the plurality of electrodes 32 located on the two conductive pillars 31 are cathodes and anodes, respectively, that is, the plurality of electrodes 32 on one conductive pillar 31 are cathodes, and the plurality of electrodes 32 on the other conductive pillar 31 are anodes, a plurality of tungsten wires 33 are respectively arranged on the plurality of electrodes 32, and both ends of each tungsten wire 33 are respectively electrically connected to two electrodes 32 located at the same height on the two conductive pillars 31, the tungsten wire 33 is in a spirally wound structure and is used to wind the heated target material, a plurality of receiving parts 34 are respectively arranged corresponding to the plurality of tungsten wires 33 and are located below the tungsten wires 33, and the plurality of receiving parts 34 are used to receive the heated and molten target liquid. In this embodiment, the auxiliary furnace 2 is hinged with the main furnace 1 through a connecting shaft, and the main furnace 1 and the auxiliary furnace 2 are combined to form a large cylinder. The gap between the main furnace 1 and the auxiliary furnace 2 is sealed to achieve vacuum in the furnace; when one main furnace 1 and the auxiliary furnace 2 are combined for vacuum plating, the other main furnace 1 is open, and the worker loads the main furnace 1. After the first main furnace 1 is opened after the electroplating is completed, the second main furnace 1 can be immediately combined with the auxiliary furnace 2 for vacuum plating, so as to achieve rapid connection processing and improve production efficiency. The two conductive columns 31 are respectively energized and insulated from each other, and are only electrically connected to the tungsten wire 33 through the electrode 32. The receiving part 34 needs to be made of a metal or non-metal material that is resistant to high temperature and has a melting point greater than the melting point of the target material to avoid being punctured by the high-temperature target liquid. The target material includes aluminum wire, copper wire, chromium wire, etc.

[0035] During vacuum plating, two electrodes 32 are energized to the tungsten wire 33 to heat the tungsten wire 33, and the target material is heated by the tungsten wire 33 to melt. Part of the dripping target liquid is caught by the receiving part 34 to prevent it from dripping onto the lower electrode 32 or the lining plate and causing sparks to splash. The multiple placement racks 4 are driven by the driving mechanism 5 to rotate, so that the workpieces on the placement racks 4 can be evenly coated. The vacuum plating machine achieves the effect of preventing the target liquid from dripping and splashing and scalding the internal equipment by setting the receiving part 34 to catch the dripping target liquid; setting two main furnaces 1 to alternately load materials and combine with the auxiliary furnace 2 for vacuum plating can save the connection and loading time of each batch of electroplating and improve production efficiency.

[0036] See also Figures 1 to 3 As shown, two electrodes 32 located on the same conductive column 31 and adjacent to each other are arranged perpendicularly to each other, and two electrodes 32 located on different conductive columns 31 and at the same height are arranged parallel to each other. In this embodiment, the multiple electrodes 32 on the conductive column 31 are perpendicular to the conductive column 31. When viewed from above, the electrodes 32 on the same conductive column 31 intersect in a "cross" shape with the conductive column 31 as the intersection point; when viewed from the front or from the side, the electrodes 32 on the same conductive column 31 extend outward from both sides. The two conductive columns 31 are respectively arranged in the empty space between the two electrodes 32 adjacent to each other, so as to avoid the short circuit caused by the staggered interference between the electrodes 32. By staggering the electrodes 32, it is possible to clamp and heat the target material in more positions, make full use of the space, and improve the coating efficiency and uniformity.

[0037] See also Figures 2 to 3 As shown, the main furnace 1 includes a semicircular top plate 11, an annular top plate 12, an annular bottom plate 13 and a circular bottom plate 14. The semicircular top plate 11 is fixedly connected to the inner top wall of the main furnace 1, the annular top plate 12 is rotatably set on the inner top of the main furnace 1, the annular bottom plate 13 is rotatably set on the inner bottom of the main furnace 1, and the circular bottom plate 14 is set on the inner bottom wall of the main furnace 1 and is fixed relative to the semicircular top plate 11. The upper and lower ends of the two conductive columns 31 are respectively connected to the semicircular top plate 11 and the circular bottom plate 14, and the upper and lower ends of the multiple placement racks 4 are respectively rotatably connected to the annular top plate 12 and the annular bottom plate 13. In this embodiment, the diameter of the semicircular top plate 11 is smaller than the outer diameter of the annular top plate 12, the diameter of the circular bottom plate 14 is smaller than the outer diameter of the annular bottom plate 13, the outer diameters of the annular top plate 12 and the annular bottom plate 13 are both smaller than the inner diameter of the main furnace 1, the centers of the circular bottom plate 14, the semicircular top plate 11, the annular bottom plate 13 and the annular top plate 12 are all located on the same axis, and the multiple placement racks 4 can revolve around the target rack 3 with the annular bottom plate 13 and the annular top plate 12, so that the workers can rotate the placement racks 4 to the position of the furnace mouth of the main furnace 1 for loading, the rotation of the multiple placement racks 4 around the target rack 3 is manually realized by the workers, and the workers revolve the multiple placement racks 4 when loading, and the rotation of the multiple placement racks 4 during the electroplating process is driven by the driving mechanism 5.

[0038] See also Figure 3 As shown, the main furnace 1 also includes a plurality of connecting columns 15, and the plurality of connecting columns 15 are respectively arranged at intervals with the plurality of placement racks 4, and the upper and lower ends of the connecting columns 15 are respectively connected to the annular top plate 12 and the annular bottom plate 13. In this embodiment, the number of the connecting columns 15 is four, and the four connecting columns 15 are arranged at intervals of 90° around the center of the annular top plate 12, and at least one placement rack 4 is arranged between every two adjacent connecting columns 15. The number of placement racks 4 can be set in a targeted manner according to production requirements. The connecting columns 15 connect the annular top plate 12 and the annular bottom plate 13, thereby improving the stability of the annular top plate 12 and the annular bottom plate 13, so that the plurality of placement racks 4 can revolve stably.

[0039] See also Figure 4 As shown, the placement rack 4 includes a support column 41, an upper mounting frame 42, a lower mounting frame 43 and a plurality of mounting rods 44. The upper and lower ends of the support column 41 are rotatably connected to the annular top plate 12 and the annular bottom plate 13 respectively. The upper mounting frame 42 is fixedly installed on the upper end of the support column 41, and the lower mounting frame 43 is fixedly installed on the lower end of the support column 41. The plurality of mounting rods 44 are arranged parallel to the support column 41 and the upper and lower ends are detachably connected to the upper mounting frame 42 and the lower mounting frame 43. The plurality of mounting rods 44 are provided with a plurality of mounting portions 441 from top to bottom for clamping the workpiece to be electroplated. In this embodiment, the upper mounting frame 42 and the lower mounting frame 43 are both circular, and the interior is hollowed out into a plurality of sectors, and two adjacent sectors are separated by a mounting beam. The two ends of the mounting rod 44 are mounted on the mounting beam, and the two ends of the support column 41 are mounted at the center of the upper mounting frame 42 and the lower mounting frame 43. A plurality of mounting portions 441 are arranged on the same side of the mounting rod 44. The layout of the placement frame 4 can clamp more workpieces to be electroplated in a limited space, thereby improving space utilization, thereby improving processing efficiency, and making the workpiece coating more uniform.

[0040] See also Figure 4 As shown, the upper mounting frame 42 and the lower mounting frame 43 are respectively provided with a plurality of mounting holes 431, and the plurality of mounting holes 431 are arranged in a radial array around the support column 41. The upper and lower ends of the plurality of mounting rods 44 are respectively detachably arranged in the plurality of mounting holes 431 of the upper mounting frame 42 and the lower mounting frame 43. A support plate 432 is provided at the bottom of the lower mounting frame 43, and the support plate 432 is used to support the lower end of the mounting rod 44. In this embodiment, multiple mounting holes 431 are provided on the mounting beam, and each mounting beam has multiple mounting holes 431 arranged along its length direction. The mounting rod 44 can be installed in the mounting hole 431 at a suitable position according to the length or volume of the clamped workpiece. The side wall shape of the mounting hole 431 is surrounded by a flower shape to limit the mounting rod 44 and prevent the mounting rod 44 from rotating in the mounting hole 431 and affecting the coating effect; the support plate 432 is fixedly connected to the bottom of the lower mounting frame 43, and after the lower end of the mounting rod 44 extends into the mounting hole 431, the support plate 432 supports the mounting rod 44 to prevent the mounting rod 44 from sliding down due to the heavy weight of clamping multiple workpieces, thereby affecting the coating effect.

[0041] See also Figure 1 to Figure 2As shown, the driving mechanism 5 includes a motor 51, a driving wheel 52, a driving wheel 53 and a rotating connector 54. The motor 51 is installed at the bottom of the main furnace 1 and is driven to connect with the driving wheel 52. The driving wheel 52 is rotatably installed at the inner bottom of the main furnace 1 and is meshed and connected with the driving wheel 53. The driving wheel 53 is fixedly connected to the rotating connector 54. The rotating connector 54 is rotatably installed at the annular bottom plate 13 and is fixedly connected to the lower end of the support column 41. The number of driving wheels 53 is equal to the number of rotating connectors 54 and is equal to the number of support columns 41. In this embodiment, the motor 51 is installed outside the bottom of the main furnace 1. The rotating shaft of the motor 51 penetrates the bottom wall of the main furnace 1 and extends into the interior of the main furnace 1 and is driven to connect with the driving wheel 52. The connection between the bottom wall of the main furnace 1 and the rotating shaft of the motor 51 is sealed, but it cannot affect the normal rotation of the rotating shaft. The lower end of the rotating connector 54 is fixedly connected to the axis of the driving wheel 53, and the upper end of the rotating connector 54 passes through the annular base plate 13 via a bearing, so that the upper end of the rotating connector 54 can be fixedly connected to the support column 41. A silicone sleeve is provided on the upper end of the rotating connector 54, and the silicone sleeve is used to cover the gap between the rotating connector 54 and the annular base plate 13 to prevent debris and dust from falling into it and affecting the rotation.

[0042] In some other embodiments, in order to facilitate the setting of the distance between the placement racks 4, each driving wheel 53 can be configured with a transmission wheel, which is meshed with the driving wheel 52. Compared with directly setting a large-diameter driving wheel 53, this method saves more internal space of the main furnace 1, thereby reducing the overall volume of the equipment and saving factory space.

[0043] See also Figure 3 As shown, the receiving member 34 is in the shape of a bowl. To maintain balance, two receiving members 34 of the same height are respectively installed on one end of one electrode 32 and the other end of the other electrode 32. In this embodiment, the diameter of the receiving member 34 is larger than the distance between the two electrodes, that is, larger than the length of the tungsten wire 33 and the target material, so that the dripping target liquid can be completely received.

[0044] Furthermore, a bearing (not shown in the figure) is arranged at the axis of the circular bottom plate 14, and the bearing is sleeved on the central rotating shaft of the driving wheel 52 so that the driving wheel 52 can rotate relative to the circular bottom plate 14. The circular bottom plate 14 is fixedly connected via the conductive column 31. Even if it is suspended in the air by the central rotating shaft support of the driving wheel 52, the arrangement of the bearing ensures that the circular bottom plate 14 will not affect the rotation of the driving wheel 52. In this embodiment, an annular track is arranged on the upper surface of the circular bottom plate 14, and the inner edge of the annular bottom plate 13 is convex downward to form an annular baffle, which is slidably arranged in the annular track. The annular baffle can support the annular bottom plate 13 and shield the driving mechanism 5 to prevent the target material from falling into the driving mechanism 5 and affecting the operation.

[0045] See also Figure 3As shown, the upper surface of the circular bottom plate 14 is provided with a slide rail 141 which is concentric with the circular bottom plate 14, and the lower surface of the annular bottom plate 13 is provided with a rotating pulley 131, and the pulley 131 is slidably accommodated in the slide rail 141. In this embodiment, the annular bottom plate 13 can rotate relative to the circular bottom plate 14, and the slide rail 141 and the pulley 131 are provided to assist the rotation of the annular bottom plate 13, thereby reducing the labor required for workers to rotate the annular bottom plate 13 when loading and unloading materials, which is conducive to improving production efficiency.

[0046] In this embodiment, universal wheels are provided at the bottom of the main furnace 1 to facilitate easy movement of the main furnace 1 when opening and closing, and to provide certain support to the main furnace 1, thereby reducing the stress on the connecting shaft and reducing stress fatigue of the connecting shaft. To match the height of the main furnace 1, support feet are provided at the bottom of the auxiliary furnace 2 to support the auxiliary furnace 2.

[0047] In summary, the present invention achieves the effect of preventing the target liquid from dripping and scalding the internal equipment of the machine by arranging a receiving part 34 to catch the dripping target liquid; arranging two main furnaces 1 to alternately load materials and combine with the auxiliary furnace 2 to perform vacuum electroplating can save the connection and loading time of each batch of electroplating and improve production efficiency.

[0048] It is understandable that those skilled in the art can make equivalent substitutions or changes based on the technical solution and inventive concept of the present invention, and all these changes or substitutions should fall within the protection scope of the claims attached to the present invention.

Claims

1. A vacuum plating machine, characterized in that: include: Two main furnaces (1) and one auxiliary furnace (2), the two main furnaces (1) are respectively hinged to the two sides of the auxiliary furnace (2), the two main furnaces (1) alternately load materials and combine with the auxiliary furnace (2) to perform electroplating work; the main furnace (1) comprises a target rack (3), a plurality of placement racks (4) and a driving mechanism (5), the target rack (3) is arranged at the center of the main furnace (1) and is used to clamp and heat the target material, the plurality of placement racks (4) are arranged around the outside of the target rack (3) and are used to clamp the workpiece to be electroplated, and the driving mechanism (5) drives the plurality of placement racks (4) to connect and drive the plurality of placement racks (4) to rotate simultaneously; the target rack (3) comprises two conductive columns (31), a plurality of electrodes (32), a plurality of tungsten wires (33) and a plurality of A receiving member (34), two conductive columns (31) are arranged in parallel, a plurality of electrodes (32) are arranged on the two conductive columns (31) from top to bottom, the plurality of electrodes (32) located on the two conductive columns (31) are cathodes and anodes, respectively, a plurality of tungsten wires (33) are arranged on the plurality of electrodes (32), two ends of each tungsten wire (33) are respectively electrically connected to two electrodes (32) located at the same height on the two conductive columns (31), the tungsten wire (33) is in a spiral winding structure and is used to wind a heated target material, a plurality of receiving members (34) are respectively arranged corresponding to the plurality of tungsten wires (33) and are located below the tungsten wires (33), and the plurality of receiving members (34) are used to receive the heated and molten target material liquid.

2. The vacuum plating machine according to claim 1, characterized in that: Two electrodes (32) located on the same conductive column (31) and adjacent to each other are arranged perpendicular to each other, and two electrodes (32) located on different conductive columns (31) and at the same height are arranged parallel to each other.

3. The vacuum plating machine according to claim 1, characterized in that: The main furnace (1) comprises a semicircular top plate (11), an annular top plate (12), an annular bottom plate (13) and a circular bottom plate (14); the semicircular top plate (11) is fixedly connected to the inner top wall of the main furnace (1); the annular top plate (12) is rotatably arranged on the inner top of the main furnace (1); the annular bottom plate (13) is rotatably arranged on the inner bottom of the main furnace (1); the circular bottom plate (14) is arranged on the inner bottom wall of the main furnace (1) and is fixed relative to the semicircular top plate (11); the upper and lower ends of two conductive columns (31) are respectively connected to the semicircular top plate (11) and the circular bottom plate (14); and the upper and lower ends of a plurality of placement racks (4) are respectively rotatably connected to the annular top plate (12) and the annular bottom plate (13).

4. The vacuum plating machine according to claim 3, characterized in that: The main furnace (1) also includes a plurality of connecting columns (15), the plurality of connecting columns (15) are respectively arranged at intervals with the plurality of placement racks (4), and the upper and lower ends of the connecting columns (15) are respectively connected to the annular top plate (12) and the annular bottom plate (13).

5. The vacuum plating machine according to claim 3, characterized in that: The placement rack (4) comprises a support column (41), an upper mounting frame (42), a lower mounting frame (43) and a plurality of mounting rods (44); the upper and lower ends of the support column (41) are rotatably connected to the annular top plate (12) and the annular bottom plate (13), respectively; the upper mounting frame (42) is fixedly mounted on the upper end of the support column (41); the lower mounting frame (43) is fixedly mounted on the lower end of the support column (41); the plurality of mounting rods (44) are arranged parallel to the support column (41) and the upper and lower ends are detachably connected to the upper mounting frame (42) and the lower mounting frame (43); and the plurality of mounting rods (44) are provided with a plurality of mounting portions (441) for clamping workpieces to be electroplated from top to bottom.

6. The vacuum plating machine according to claim 5, characterized in that: The upper mounting frame (42) and the lower mounting frame (43) are respectively provided with a plurality of mounting holes (431), and the plurality of mounting holes (431) are arranged in a radial array around the support column (41). The upper and lower ends of the plurality of mounting rods (44) are respectively detachably arranged in the plurality of mounting holes (431) of the upper mounting frame (42) and the lower mounting frame (43). A support plate (432) is provided at the bottom of the lower mounting frame (43), and the support plate (432) is used to abut against the lower end of the mounting rod (44).

7. The vacuum plating machine according to claim 6, characterized in that: The driving mechanism (5) comprises a motor (51), a driving wheel (52), a driving wheel (53) and a rotating connector (54); the motor (51) is mounted on the bottom of the main furnace (1) and is driven to connect to the driving wheel (52); the driving wheel (52) is rotatably mounted on the inner bottom of the main furnace (1) and is meshed to connect to the driving wheel (53); the driving wheel (53) is fixedly connected to the rotating connector (54); the rotating connector (54) is rotatably mounted on the annular bottom plate (13) and is fixedly connected to the lower end of the support column (41); the number of the driving wheels (53) is equal to the number of the rotating connectors (54) and is equal to the number of the support columns (41).

8. The vacuum plating machine according to claim 1, characterized in that: The receiving member (34) is in the shape of a bowl or dish. Two receiving members (34) of the same height are respectively installed on one end of one electrode (32) and the other end of another electrode (32).

9. The vacuum plating machine according to claim 7, characterized in that: A bearing is arranged at the bottom axis of the circular bottom plate (14), and the bearing is sleeved on the central rotation axis of the driving wheel (52) so that the driving wheel (52) can rotate relative to the circular bottom plate (14).

10. The vacuum plating machine according to claim 9, characterized in that: The upper surface of the circular bottom plate (14) is provided with a slide rail (141) which is coaxial with the circular bottom plate (14), and the lower surface of the annular bottom plate (13) is provided with a rotating pulley (131), which is slidably accommodated in the slide rail (141).

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