The invention discloses an
ion etching device for PVD (
Physical Vapor Deposition)
coating equipment. The
ion etching device comprises an auxiliary
anode, a main and standby double-group
tungsten filament heating module, an
inert gas directional introduction module, a vacuum and electric connection module and a control and protection module. Through the design of the main and standby
tungsten filaments and the automatic overlapping switching strategy, it is ensured that when one
tungsten filament fails, seamless switching to the standby
tungsten filament can be achieved, shutdown caused by filament breakage or degradation is effectively avoided, the service life of the device is prolonged, long-period
continuous production is guaranteed, and the operation efficiency and production continuity of the device are greatly improved. Meanwhile,
electric arc particle
pollution is avoided through
hot electron emission, and the surface cleanliness is high; the matching range of pressure, bias pressure and gas is wide, the method is suitable for multiple materials and complex morphology, and the process
repeatability is good; the
flange and the electric penetration
assembly are modularized, and the
tungsten filament /
anode /
gas supply assembly is quickly replaced, so that the maintenance time is shortened, and the maintenance cost is reduced; the whole
system is simple in structure, does not need a complex
magnetic field and a multi-stage
electrode, and is low in equipment manufacturing cost.