The invention discloses a method for measuring trace elements such as 
arsenic and 
selenium in industrial electro-deposit 
copper according to the 
atomic fluorescence spectrometry. The method comprises the following steps: A, preparing a solution of an industrial electro-deposit 
copper fine sample; B, preparing a standard 
arsenic solution and a standard 
selenium solution; C, preparing a working curve solution with the standard 
arsenic solution and the standard 
selenium solution; D, measuring the 
atomic fluorescence strengths of arsenic and selenium in the working curve solution with an 
atomic fluorescence photometer, and drawing working curves by taking the 
mass concentrations of arsenic and selenium as X axes, and taking the 
fluorescence strengths of arsenic and selenium are Y axes; E, measuring the atomic 
fluorescence strengths of arsenic and selenium in the sample solution with the atomic 
fluorescence photometer, and finding out corresponding 
mass concentrations of arsenic and selenium on corresponding working curves with the atomic fluorescence strengths. As a 
nitric acid, 
hydrochloric acid, 
potassium iodide and thiocarbamide-
ascorbic acid treating sample is adopted, not only can the 
impact of interfering ions such as Cu, Fe, Ag, Bi and Se and the combination of the interfering ions be effectively screened, but also the 
impact of the 
copper base body on arsenic and selenium measure can be eliminated.