Small quartz crystal resonator base cleaning equipment and method

By designing a small quartz crystal resonator base cleaning equipment, the cleaning mechanism and material collection mechanism are used to realize automatic cleaning and loading and unloading of the base, which solves the problem of no guarantee of base cleaning in the prior art and improves the crystal resonator quality and production efficiency.

CN119426270APending Publication Date: 2025-02-14DONGJING DIANZI JINHUA CO LTD
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Patent Information

Application Number
CN202510035403.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-09
Publication Date
2025-02-14

AI Technical Summary

Technical Problem

The prior art lacks effective base cleaning equipment, resulting in the inability to effectively remove base viscera and foreign matter, reducing the quality of small crystal resonators and increasing manufacturing costs.

Method used

A small quartz crystal resonator base cleaning equipment is designed, including a base plate, a cleaning seat, a cleaning mechanism, a material collection mechanism and a material extraction mechanism. The cleaning mechanism is blown and inhaled through the suction pump, the suction pipe and the nitrogen blow pipe. The mesh block covers the cleaning tank. The material collection mechanism realizes automatic loading and unloading of the base through the guide rail and the guide block.

Benefits of technology

Effectively remove dust and foreign matter in the base, ensure the quality of small crystal resonators, reduce manufacturing costs, and achieve more thorough cleaning through PLC control.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a small quartz crystal resonator base cleaning device and method, and relates to the technical field of quartz crystal resonator base cleaning. The cleaning device comprises a bottom plate, a cleaning seat is arranged above the bottom plate, six sets of cleaning grooves are formed in the top of the cleaning seat, a rotating mechanism is arranged at the top of the bottom plate, a cleaning mechanism is arranged at the top of the bottom plate, and a material taking mechanism and a discharging mechanism are arranged at the top of the bottom plate. According to the invention, dust in the base can be effectively removed, the interior of the base is clean, the problem of dust falling and foreign matter falling on the base in the using process is solved, the quality of the small crystal resonator is guaranteed, the manufacturing cost is reduced, and the efficiency is improved.
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Description

Technical Field

[0001] The invention relates to the technical field of cleaning a quartz crystal resonator base, in particular to a small-sized quartz crystal resonator base cleaning device and method. Background Art

[0002] In the production process of quartz crystal resonators, cleanliness is particularly important for the electrical characteristics of the product. However, there are some problems with the current process. The crystal resonator needs to be assembled using a base during the manufacturing process. The base is directly used for dispensing after unpacking. However, there are some problems with the traditional process. When the base is packaged and unpacked, dust, paper scraps and other foreign matter will fall into the base shell, and direct dispensing will affect the electrical characteristics and reliability of the product. The prior art has no base cleaning equipment, the base cleaning is not guaranteed, and the internal dirt and foreign matter of the base cannot be effectively removed, which reduces the quality of the small crystal resonator and increases the manufacturing cost. Therefore, we propose a small quartz crystal resonator base cleaning equipment and method. Summary of the invention

[0003] In order to solve the problem that the prior art has no base cleaning equipment, the base cleaning is not guaranteed, the dirt and foreign matter inside the base cannot be effectively removed, the quality of the small crystal resonator is reduced, and the manufacturing cost is increased; the purpose of the present invention is to provide a small quartz crystal resonator base cleaning equipment and method.

[0004] In order to solve the above technical problems, the present invention adopts the following technical solutions: a small quartz crystal resonator base cleaning device, comprising a bottom plate, a cleaning seat is arranged above the bottom plate, six groups of cleaning slots are opened on the top of the cleaning seat, a rotating mechanism is arranged on the top of the bottom plate, a cleaning mechanism is arranged on the top of the bottom plate, and a material taking mechanism and a material unloading mechanism are arranged on the top of the bottom plate; The cleaning mechanism includes an air suction pump, a first air suction pipe, a first electric telescopic rod and a nitrogen blowing pipe. The first electric telescopic rod is used to drive the baffle plate to move downward to cover the cleaning tank. The first air suction pipe and the nitrogen blowing pipe are used to blow and suck air into the cleaning tank, so as to clean the base in the cleaning tank. The material picking mechanism includes a guide rail and a guide block. The material picking suction cup can suck the base in the base plate. The third electric telescopic rod drives the material picking suction cup to move up and down, and the fourth electric telescopic rod drives the material picking suction cup to extend and retract. The movement of the guide block can drive the second gear to move on the teeth, so that the second gear drives the rotating shaft and the material picking suction cup to rotate, so that the base can be placed in the cleaning tank.

[0005] Preferably, the cleaning mechanism includes an air suction pump provided on the top of the base plate, a first air suction pipe is provided at one end of the air suction pump, a cleaning mechanism is provided on the outer wall of the first air suction pipe, a nitrogen blowing pipe is provided above the first air suction pipe, a baffle mesh is installed on the outer walls of the first air suction pipe and the nitrogen blowing pipe, a supporting sleeve is provided on the top of the base plate, a first electric telescopic rod is provided at the bottom inner of the supporting sleeve, a lifting plate is provided at one end of the first electric telescopic rod, a lifting rod is provided on the top of the lifting plate, and one end of the lifting rod is connected to the top of the baffle mesh.

[0006] Preferably, the cleaning mechanism includes a second suction pipe provided on the outer wall of the first suction pipe, an suction hood is provided at one end of the second suction pipe, a hydraulic rod is provided on the top of the base plate, a support rod is provided at one end of the hydraulic rod, and one end of the support rod is connected to the outer wall of the suction hood.

[0007] Preferably, a second air intake solenoid valve is provided on the outer side wall of the second air intake pipe, and a first air intake solenoid valve is provided on the outer side wall of the first air intake pipe.

[0008] Preferably, the rotating mechanism includes a rotating column connected to the top of the base plate through a bearing, one end of the rotating column is connected to the bottom of the cleaning seat, a first gear is sleeved and installed on the outer wall of the rotating column, a motor is provided on the top of the base plate, a semi-arc gear is connected to the output end of the motor, and a locking mechanism is provided above the semi-arc gear.

[0009] Preferably, the locking mechanism includes a sleeve provided above the semi-arc gear, a support plate provided on the top of the base plate, one end of the support plate is connected to the outer wall of the sleeve, a sliding plate is slidably connected in the sleeve, a movable rod is provided on the right side wall of the sliding plate, one end of the movable rod passes through the right side wall inside the sleeve and is connected to an extrusion plate provided on the outside, a spring is sleeved on the outer wall of the movable rod, one end of the spring is connected to the right side wall of the sliding plate, and the other end of the spring is connected to the right side wall inside the sleeve, an extrusion rod is provided on the left side wall of the sliding plate, one end of the extrusion rod passes through the left side wall inside the sleeve and is connected to a rack provided on the outside, a locking gear meshing with the rack is sleeved on the outer wall of the rotating column, a connecting rod is provided on the top of the semi-arc gear, and a cam is provided at one end of the connecting rod.

[0010] Preferably, the material picking mechanism includes a guide rail provided on the top of the base plate, a guide block is slidably provided on the outer wall of the guide rail, a rotating shaft is provided on the top of the guide block through a bearing, a third electric telescopic rod is provided at one end of the rotating shaft, a fixed rod is provided at one end of the third electric telescopic rod, a fourth electric telescopic rod is provided at one end of the fixed rod, a material picking suction cup is provided at one end of the fourth electric telescopic rod, a second gear is sleeved and installed on the outer wall of the rotating shaft, a mounting plate is provided on the top of the base plate, and a plurality of groups of teeth meshing with the second gear are provided on the side wall of the mounting plate.

[0011] Preferably, the unloading mechanism includes a fixed box provided on the top of the base plate, a rotating rod is connected to the bottom of the fixed box through bearing 2, a driven bevel gear is sleeved and installed on the outer wall of the rotating rod, a driving motor is provided on the outer wall of the fixed box, an active bevel gear meshing with the driven bevel gear is connected to the output end of the driving motor, a second electric telescopic rod is provided at one end of the rotating rod, a mounting rod is provided at one end of the second electric telescopic rod, and a unloading suction cup is provided at one end of the mounting rod.

[0012] Preferably, the cleaning seat and the baffle are both made of stainless steel alloy, and the first suction pipe, nitrogen blowing pipe and second suction pipe are all plastic hoses.

[0013] A method used in a small quartz crystal resonator base cleaning device comprises the following steps: S1. The unpacked base is placed on the outside of the bottom plate, the fourth electric telescopic rod drives the material picking suction cup to move, the third electric telescopic rod drives the material picking suction cup to move downward and adsorb and fix the base, the guide block moves on the outer wall of the guide rail, the guide block drives the second gear to move, the second gear drives the shaft to rotate under the cooperation of the teeth, the shaft drives the third electric telescopic rod and the base to rotate, then the fourth electric telescopic rod drives the material picking suction cup to move to the top of the cleaning tank, and then the third electric telescopic rod drives the base to move downward and place it in the cleaning tank; S2, then the motor drives the semi-arc gear to rotate, the semi-arc gear drives the first gear to rotate, the first gear drives the rotating column and the cleaning seat to rotate, each rotation degree, at this time the protrusion of the cam squeezes the extrusion plate, the extrusion plate squeezes the movable rod and the sliding plate, the sliding plate squeezes the spring, the sliding plate drives the extrusion rod and the rack to move, the rack engages with the locking gear to prevent the rotating column from rotating, when the base rotates to below the baffle, the first electric telescopic rod drives the lifting plate and the lifting rod to move downward, the lifting rod drives the baffle to move downward to cover the base, the function of the baffle is to prevent the base from shifting during the blowing and suction process, then open the first suction solenoid valve and close the second suction solenoid valve, then the nitrogen blowing pipe blows the base, and the suction pump works at the same time, the first suction pipe sucks air, which can clean the dust on the surface of the base, and after the cleaning is completed, the first electric telescopic rod drives the baffle to rise; S3, the rotating mechanism continues to drive the cleaning seat to rotate (the same operation as described in S), and then the cleaned base rotates to the bottom of the unloading suction cup, and then the second electric telescopic rod drives the mounting rod and the unloading suction cup to move downward, and the unloading suction cup can adsorb and fix the base, and then the second electric telescopic rod drives the base to rise, the driving motor drives the active bevel gear to rotate, the active bevel gear drives the driven bevel gear to rotate, and the driven bevel gear drives the rotating rod to rotate, so as to drive the base to rotate, and then the second electric telescopic rod drives the base downward and discharges the material (when the S step is in operation, the base rotates to the bottom of the cleaning mechanism and is cleaned at the same time); S4, then the rotating mechanism continues to drive the cleaning seat to rotate (the same operation as described in S), the cleaning tank of the taken base rotates to under the suction hood, and then the hydraulic rod drives the support rod and the suction hood to move downward and cover the cleaning tank, and then open the second suction solenoid valve, the suction pump can clean the bottom wall of the cleaning tank when working to prevent dust from adhering to the bottom wall of the cleaning tank, and the base is cleaned in this cycle.

[0014] Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention provides a cleaning mechanism, so that the present invention can effectively remove dust from the base, make the inside of the base clean, solve the problem of dust and foreign matter on the base caused by the use process, ensure the quality of the small crystal resonator, reduce manufacturing costs, and improve efficiency; 2. The present invention provides a cleaning mechanism so that after the base of the present application is cleaned and taken away, the inner wall of the cleaning tank is cleaned to prevent dust from adhering to the inner bottom wall of the cleaning tank, so that when the new base is cleaned, the dust on the inner wall of the cleaning tank is prevented from adhering to the new base, thereby further improving the cleaning effect of the base; 3. The present invention provides a rotating mechanism so that the cleaning seat of the present application can rotate. Each time the cleaning seat rotates 60 degrees, the base is cleaned cyclically. At the same time, the rotating column can be locked with the cooperation of the locking mechanism to prevent the cleaning seat from rotating, thereby improving the stability of the cleaning equipment and the cleaning effect. 4. The present invention provides a material taking mechanism and a material discharging mechanism, so that the base of the present application can automatically load and unload materials during cleaning, thereby improving the automation degree of the cleaning equipment and being convenient and fast; 5. The cleaning equipment of the present invention is controlled as a whole by PLC. The cleaning equipment can adjust the blowing and suction time and number of times by setting the parameters in the PLC, so that the base cleaning is more thorough and effective. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0016] Figure 1 It is a schematic diagram of the overall structure of the present invention.

[0017] Figure 2 It is a schematic diagram of the structure of the rotating mechanism of the present invention.

[0018] Figure 3 It is a schematic diagram of the structure of the material taking mechanism of the present invention.

[0019] Figure 4 It is a schematic diagram of the structure of the washing mechanism and the cleaning mechanism of the present invention.

[0020] Figure 5 It is a schematic structural diagram of the material feeding mechanism of the present invention.

[0021] Figure 6 It is a schematic diagram of the internal structure of the sleeve of the present invention.

[0022] Figure 7 It is a schematic diagram of the internal structure of the support sleeve of the present invention.

[0023] Figure 8 For the present invention Figure 4 A schematic diagram of the enlarged structure in the middle.

[0024] In the figure: 1, bottom plate; 2, cleaning mechanism; 200, suction pump; 201, support sleeve; 202, lifting rod; 203, first suction pipe; 204, nitrogen blowing pipe; 205, baffle; 206, first suction solenoid valve; 207, first electric telescopic rod; 208, lifting plate; 3, cleaning seat; 4, cleaning tank; 5, rotating mechanism; 500, motor; 501, semi-arc gear; 502, locking mechanism; 5020, connecting rod; 5021, cam; 5022, support plate; 5023, sleeve; 5024, locking gear; 5025, extrusion plate; 5026, spring; 5027, sliding plate; 5028, extrusion rod; 5029, rack; 5030, movable rod; 5 03. Rotating column; 504. First gear; 6. Unloading mechanism; 600. Fixed box; 601. Rotating rod; 602. Driven bevel gear; 603. Active bevel gear; 604. Driving motor; 605. Second electric telescopic rod; 606. Mounting rod; 607. Unloading suction cup; 7. Cleaning mechanism; 700. Hydraulic rod; 701. Support rod; 702. Suction hood; 703. Second suction pipe; 704. Second suction solenoid valve; 8. Retrieving mechanism; 800. Mounting plate; 801. Gear; 802. Guide rail; 803. Guide block; 804. Rotating shaft; 805. Second gear; 806. Third electric telescopic rod; 807. Fixed rod; 808. Fourth electric telescopic rod; 809. Retrieving suction cup. DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] Example: Figure 1-Figure 8As shown, the present invention provides a small quartz crystal resonator base cleaning device, including a bottom plate 1, a cleaning seat 3 is provided above the bottom plate 1, six groups of cleaning slots 4 are opened on the top of the cleaning seat 3, a rotating mechanism 5 is provided on the top of the bottom plate 1, a cleaning mechanism 2 is provided on the top of the bottom plate 1, and a material taking mechanism 8 and a material unloading mechanism 6 are provided on the top of the bottom plate 1; The cleaning mechanism 2 includes an air suction pump 200, a first air suction pipe 203, a first electric telescopic rod 207 and a nitrogen blowing pipe 204. The first electric telescopic rod 207 drives the blocking mesh 205 to move downward to cover the cleaning tank 4. The first air suction pipe 203 and the nitrogen blowing pipe 204 blow and suck air into the cleaning tank 4, so as to clean the base in the cleaning tank 4. The material picking mechanism 8 includes a guide rail 802 and a guide block 803. The material picking suction cup 809 can suck the base in the base plate. The third electric telescopic rod 806 drives the material picking suction cup 809 to move up and down. The fourth electric telescopic rod 808 drives the material picking suction cup 809 to extend and retract. The movement of the guide block 803 can drive the second gear 805 to move on the tooth 801, so that the second gear 805 drives the rotating shaft 804 and the material picking suction cup 809 to rotate, so that the base can be placed in the cleaning tank 4.

[0027] The cleaning mechanism 2 includes an air suction pump 200 provided on the top of the base plate 1, a first air suction pipe 203 is provided at one end of the air suction pump 200, a cleaning mechanism 7 is provided on the outer wall of the first air suction pipe 203, a nitrogen blowing pipe 204 is provided above the first air suction pipe 203, and a baffle 205 is installed on the outer walls of the first air suction pipe 203 and the nitrogen blowing pipe 204. The baffle 205 prevents the base from shifting during the blowing and suction process. A supporting sleeve 201 is provided on the top of the base plate 1, and a first electric telescopic rod 207 is provided at the bottom of the supporting sleeve 201. A lifting plate 208 is provided at one end of the first electric telescopic rod 207, and a lifting rod 202 is provided on the top of the lifting plate 208, and one end of the lifting rod 202 is connected to the top of the baffle 205.

[0028] By adopting the above technical solution, the dust in the base can be effectively removed, the inside of the base can be made clean, the problem of dust and foreign matter in the base caused by use can be solved, and the quality of the small crystal resonator can be guaranteed.

[0029] The cleaning mechanism 7 includes a second suction pipe 703 provided on the outer wall of the first suction pipe 203, an suction hood 702 is provided at one end of the second suction pipe 703, a hydraulic rod 700 is provided on the top of the base plate 1, a support rod 701 is provided at one end of the hydraulic rod 700, and one end of the support rod 701 is connected to the outer wall of the suction hood 702.

[0030] By adopting the above technical solution, after the base is cleaned and taken away, the cleaning mechanism 7 can clean the inner bottom wall of the cleaning tank 4 to prevent dust from adhering to the inner bottom wall of the cleaning tank, thereby ensuring the cleanliness of the next cleaning of the new base.

[0031] A second air intake solenoid valve 704 is disposed on the outer side wall of the second air intake pipe 703 , and a first air intake solenoid valve 206 is disposed on the outer side wall of the first air intake pipe 203 .

[0032] By adopting the above technical solution, the first air suction solenoid valve 206 and the second air suction solenoid valve 704 can control the blowing of the second air suction pipe 703 and the first air suction pipe 203 .

[0033] The rotating mechanism 5 includes a rotating column 503 connected to the top of the base plate 1 through a bearing, one end of the rotating column 503 is connected to the bottom of the cleaning seat 3, and a first gear 504 is installed on the outer wall of the rotating column 503. A motor 500 is provided on the top of the base plate 1, and a semi-arc gear 501 is connected to the output end of the motor 500. A locking mechanism 502 is provided above the semi-arc gear 501.

[0034] By adopting the above technical solution, the cleaning seat 3 can be driven to rotate, and the cleaning seat can be driven to rotate 60 degrees each time, which is convenient for cleaning and loading and unloading operations, and the base can be cleaned in this cycle.

[0035] The locking mechanism 502 includes a sleeve 5023 disposed above the semi-arc gear 501, a support plate 5022 disposed on the top of the bottom plate 1, one end of the support plate 5022 is connected to the outer wall of the sleeve 5023, a sliding plate 5027 is slidably connected in the sleeve 5023, a movable rod 5030 is disposed on the right side wall of the sliding plate 5027, one end of the movable rod 5030 penetrates the right side wall of the sleeve 5023 and is connected to the extrusion plate 5025 disposed on the outside, a spring 5026 is sleeved on the outer wall of the movable rod 5030, and the spring 5026 is sleeved on the outer wall of the movable rod 5030. 6 is connected to the right side wall of the sliding plate 5027, and the other end of the spring 5026 is connected to the right side wall of the sleeve 5023. The left side wall of the sliding plate 5027 is provided with an extrusion rod 5028, and one end of the extrusion rod 5028 penetrates the left side wall of the sleeve 5023 and is connected to the rack 5029 provided on the outside. The outer wall of the rotating column 503 is sleeved and installed with a locking gear 5024 meshing with the rack 5029. A connecting rod 5020 is provided on the top of the semi-arc gear 501, and a cam 5021 is provided at one end of the connecting rod 5020.

[0036] By adopting the above technical solution, the rotating column is locked when it does not need to rotate, so as to avoid the cleaning seat from rotating automatically and improve the stability of the cleaning equipment.

[0037] The material picking mechanism 8 includes a guide rail 802 provided on the top of the base plate 1, a guide block 803 is slidably provided on the outer wall of the guide rail 802, a rotating shaft 804 is provided on the top of the guide block 803 through a bearing, a third electric telescopic rod 806 is provided at one end of the rotating shaft 804, a fixed rod 807 is provided at one end of the third electric telescopic rod 806, a fourth electric telescopic rod 808 is provided at one end of the fixed rod 807, a material picking suction cup 809 is provided at one end of the fourth electric telescopic rod 808, a second gear 805 is sleeved and installed on the outer wall of the rotating shaft 804, a mounting plate 800 is provided on the top of the base plate 1, and a plurality of groups of teeth 801 meshing with the second gear 805 are provided on the side wall of the mounting plate 800.

[0038] By adopting the above technical solution, the base can be adsorbed and fixed and placed in the cleaning tank 4.

[0039] The unloading mechanism 6 includes a fixed box 600 provided on the top of the base plate 1, a rotating rod 601 is connected to the bottom of the fixed box 600 through a second bearing, a driven bevel gear 602 is sleeved and installed on the outer wall of the rotating rod 601, a driving motor 604 is provided on the outer wall of the fixed box 600, an active bevel gear 603 meshing with the driven bevel gear 602 is connected to the output end of the driving motor 604, a second electric telescopic rod 605 is provided at one end of the rotating rod 601, a mounting rod 606 is provided at one end of the second electric telescopic rod 605, and a unloading suction cup 607 is provided at one end of the mounting rod 606.

[0040] By adopting the above technical solution, the base can be automatically unloaded after cleaning.

[0041] The cleaning seat 3 and the baffle plate 205 are both made of stainless steel alloy, and the first suction pipe 203, the nitrogen blowing pipe 204 and the second suction pipe 703 are all plastic hoses.

[0042] By adopting the above technical solution, the use of stainless steel, alloy steel and plastic hoses will not cause pollution The base cleaning equipment of the present invention is controlled by PLC. The cleaning equipment can adjust the blowing and suction time and number of times by setting the parameters in the PLC, so that the base cleaning is more thorough and effective. The PLC can control the opening and closing of the first suction solenoid valve 206 and the second suction solenoid valve 704. During the cleaning process, the PLC can control the next action.

[0043] A method used in a small quartz crystal resonator base cleaning device comprises the following steps: S1. The unpacked base is placed on the outside of the bottom plate 1. The PCL controls the fourth electric telescopic rod 808 to drive the material-retrieving suction cup 809 to move. The third electric telescopic rod 806 drives the material-retrieving suction cup 809 to move downward and adsorb and fix the base. Then, the PCL controls the guide block 803 to move on the outer wall of the guide rail 802. The guide block 803 drives the second gear 805 to move. With the cooperation of the teeth 801, the second gear 805 drives the rotating shaft 804 to rotate. The rotating shaft 804 drives the third electric telescopic rod 806 and the base to rotate 180 degrees. Then, the fourth electric telescopic rod 808 drives the material-retrieving suction cup 809 to move to the top of the cleaning tank 4. Then, the third electric telescopic rod 806 drives the base to move downward and place it in the cleaning tank 4. S2, then the motor 500 drives the semi-arc gear 501 to rotate, the semi-arc gear 501 drives the first gear 504 to rotate, the first gear 504 drives the rotating column 503 and the cleaning seat 3 to rotate, each time rotating 60 degrees, at this time the protrusion of the cam 5021 squeezes the squeezing plate 5025, the squeezing plate 5025 squeezes the movable rod 5030 and the sliding plate 5027, the sliding plate 5027 squeezes the spring 5026, the sliding plate 5027 drives the squeezing rod 5028 and the rack 5029 to move, the rack 5029 meshes with the locking gear 5024 to prevent the rotating column 503 from rotating, and the base rotates to the block When the mesh 205 is below, the first electric telescopic rod 207 drives the lifting plate 208 and the lifting rod 202 to move downward, and the lifting rod 202 drives the blocking mesh 205 to move downward to cover the base. The function of the blocking mesh 205 is to prevent the base from shifting during the blowing and suction process. Then the first suction solenoid valve 206 is opened and the second suction solenoid valve 704 is closed. Then the nitrogen blowing pipe 204 blows air to the base, and the suction pump 200 works at the same time. The first suction pipe 203 sucks air to clean the dust on the surface of the base. After the cleaning is completed, the first electric telescopic rod 207 drives the blocking mesh 205 to rise; S3, the rotating mechanism 5 continues to drive the cleaning seat 3 to rotate 60 degrees (the same operation as S2), and then the cleaned base rotates to the bottom of the unloading suction cup 607, and then the second electric telescopic rod 605 drives the mounting rod 606 and the unloading suction cup 607 to move downward, and the unloading suction cup 607 can adsorb and fix the base, and then the second electric telescopic rod 605 drives the base to rise, and the driving motor 604 drives the active bevel gear 603 to rotate, and the active bevel gear 603 drives the driven bevel gear 602 to rotate, and the driven bevel gear 602 drives the rotating rod 601 to rotate, so as to drive the base to rotate, and then the second electric telescopic rod 605 drives the base downward and discharges the material (when the S3 step is in operation, the base rotates to the bottom of the cleaning mechanism 2 and is cleaned at the same time); S4, then the rotating mechanism 5 continues to drive the cleaning seat 3 to rotate 60 degrees (the same operation as S2), the cleaning tank 4 of the taken base is rotated to the bottom of the suction hood 702, and then the hydraulic rod 700 drives the support rod 701 and the suction hood 702 to move downward and cover the cleaning tank 4, and then open the second suction solenoid valve 704, and the suction pump 200 can clean the inner bottom wall of the cleaning tank 4 when working to prevent dust from adhering to the inner bottom wall of the cleaning tank, and the base is cleaned in this cycle.

[0044] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A small quartz crystal resonator base cleaning device, comprising a bottom plate (1), characterized in that: A cleaning seat (3) is provided above the bottom plate (1), six groups of cleaning slots (4) are provided on the top of the cleaning seat (3), a rotating mechanism (5) is provided on the top of the bottom plate (1), a cleaning mechanism (2) is provided on the top of the bottom plate (1), and a material taking mechanism (8) and a material unloading mechanism (6) are provided on the top of the bottom plate (1); The cleaning mechanism (2) comprises an air suction pump (200), a first air suction pipe (203), a first electric telescopic rod (207) and a nitrogen blowing pipe (204); the first electric telescopic rod (207) is used to drive the blocking mesh (205) to move downward to cover the cleaning tank (4); the first air suction pipe (203) and the nitrogen blowing pipe (204) are used to blow and suck air into the cleaning tank (4), thereby cleaning the base in the cleaning tank (4); The material picking mechanism (8) comprises a guide rail (802) and a guide block (803); the material picking suction cup (809) can suck the base in the base plate; the third electric telescopic rod (806) drives the material picking suction cup (809) to move up and down; the fourth electric telescopic rod (808) drives the material picking suction cup (809) to extend and retract; the movement of the guide block (803) can drive the second gear (805) to move on the teeth (801), so that the second gear (805) drives the rotating shaft (804) and the material picking suction cup (809) to rotate, so that the base can be placed in the cleaning tank (4).

2. A small quartz crystal resonator base cleaning device as claimed in claim 1, characterized in that: The cleaning mechanism (2) comprises an air suction pump (200) provided on the top of the base plate (1); a first air suction pipe (203) is provided at one end of the air suction pump (200); a cleaning mechanism (7) is provided on the outer wall of the first air suction pipe (203); a nitrogen blowing pipe (204) is provided above the first air suction pipe (203); a baffle (205) is sleeved and installed on the outer walls of the first air suction pipe (203) and the nitrogen blowing pipe (204); a supporting sleeve (201) is provided on the top of the base plate (1); a first electric telescopic rod (207) is provided at the bottom of the supporting sleeve (201); a lifting plate (208) is provided at one end of the first electric telescopic rod (207); a lifting rod (202) is provided on the top of the lifting plate (208); and one end of the lifting rod (202) is connected to the top of the baffle (205).

3. A small quartz crystal resonator base cleaning device as claimed in claim 2, characterized in that: The cleaning mechanism (7) comprises a second air suction pipe (703) provided on the outer side wall of the first air suction pipe (203), an air suction hood (702) being provided at one end of the second air suction pipe (703), a hydraulic rod (700) being provided on the top of the bottom plate (1), a support rod (701) being provided at one end of the hydraulic rod (700), and one end of the support rod (701) being connected to the outer side wall of the air suction hood (702).

4. A small quartz crystal resonator base cleaning device as claimed in claim 3, characterized in that: A second air suction solenoid valve (704) is provided on the outer wall of the second air suction pipe (703), and a first air suction solenoid valve (206) is provided on the outer wall of the first air suction pipe (203).

5. A small quartz crystal resonator base cleaning device as claimed in claim 1, characterized in that: The rotating mechanism (5) comprises a rotating column (503) connected to the top of the base plate (1) via a bearing, one end of the rotating column (503) being connected to the bottom of the cleaning seat (3), a first gear (504) being sleeved and mounted on the outer wall of the rotating column (503), a motor (500) being provided at the top of the base plate (1), a semi-arc gear (501) being connected to the output end of the motor (500), and a locking mechanism (502) being provided above the semi-arc gear (501).

6. A small quartz crystal resonator base cleaning device as claimed in claim 5, characterized in that: The locking mechanism (502) comprises a sleeve (5023) disposed above the semi-arc gear (501); a support plate (5022) is disposed on the top of the bottom plate (1); one end of the support plate (5022) is connected to the outer wall of the sleeve (5023); a sliding plate (5027) is slidably connected inside the sleeve (5023); a movable rod (5030) is disposed on the right side wall of the sliding plate (5027); one end of the movable rod (5030) passes through the right side wall of the sleeve (5023) and is connected to an extrusion plate (5025) disposed outside; a spring (5026) is sleeved on the outer wall of the movable rod (5030); and the spring (5026) is sleeved on the outer wall of the movable rod (5030). 026) is connected to the right side wall of the sliding plate (5027), the other end of the spring (5026) is connected to the right side wall inside the sleeve (5023), the left side wall of the sliding plate (5027) is provided with an extrusion rod (5028), one end of the extrusion rod (5028) penetrates the left side wall inside the sleeve (5023) and is connected to the rack (5029) provided on the outside, the outer wall of the rotating column (503) is sleeved and installed with a locking gear (5024) meshing with the rack (5029), the top of the semi-arc gear (501) is provided with a connecting rod (5020), and one end of the connecting rod (5020) is provided with a cam (5021).

7. A small quartz crystal resonator base cleaning device as claimed in claim 1, characterized in that: The material taking mechanism (8) comprises a guide rail (802) provided at the top of the base plate (1); a guide block (803) is slidably provided on the outer wall of the guide rail (802); a rotating shaft (804) is provided at the top of the guide block (803) via a bearing; a third electric telescopic rod (806) is provided at one end of the rotating shaft (804); a fixing rod (807) is provided at one end of the third electric telescopic rod (806); a fourth electric telescopic rod (808) is provided at one end of the fixing rod (807); a material taking suction cup (809) is provided at one end of the fourth electric telescopic rod (808); a second gear (805) is sleeved and mounted on the outer wall of the rotating shaft (804); a mounting plate (800) is provided at the top of the base plate (1); and a plurality of groups of teeth (801) meshing with the second gear (805) are provided on the side wall of the mounting plate (800).

8. A small quartz crystal resonator base cleaning device as claimed in claim 1, characterized in that: The unloading mechanism (6) comprises a fixed box (600) provided on the top of the bottom plate (1); a rotating rod (601) is connected to the bottom of the fixed box (600) via a second bearing; a driven bevel gear (602) is sleeved and mounted on the outer wall of the rotating rod (601); a driving motor (604) is provided on the outer wall of the fixed box (600); an active bevel gear (603) meshing with the driven bevel gear (602) is connected to the output end of the driving motor (604); a second electric telescopic rod (605) is provided at one end of the rotating rod (601); a mounting rod (606) is provided at one end of the second electric telescopic rod (605); and a unloading suction cup (607) is provided at one end of the mounting rod (606).

9. A small quartz crystal resonator base cleaning device as claimed in claim 8, characterized in that: The cleaning seat (3) and the baffle (205) are both made of stainless steel alloy material, and the first air suction pipe (203), the nitrogen blowing pipe (204) and the second air suction pipe (703) are all plastic hoses.

10. The method used in a small quartz crystal resonator base cleaning device as claimed in any one of claims 1 to 9, characterized in that: The following steps are involved: S1. The unpacked base is placed on the outside of the bottom plate (1), the fourth electric telescopic rod (808) drives the material picking suction cup (809) to move, the third electric telescopic rod (806) drives the material picking suction cup (809) to move downward and adsorb and fix the base, the guide block (803) moves on the outer wall of the guide rail (802), the guide block (803) drives the second gear (805) to move, the second gear (805) drives the rotating shaft (804) to rotate with the cooperation of the teeth (801), the rotating shaft (804) drives the third electric telescopic rod (806) and the base to rotate (180) degrees, then the fourth electric telescopic rod (808) drives the material picking suction cup (809) to move to the top of the cleaning tank (4), then the third electric telescopic rod (806) drives the base to move downward and place it in the cleaning tank (4); S2. Then the motor (500) drives the semi-arc gear (501) to rotate, the semi-arc gear (501) drives the first gear (504) to rotate, and the first gear (504) drives the rotating column (503) and the cleaning seat (3) to rotate, and each time the rotation is (60) degrees, the protrusion of the cam (5021) squeezes the squeezing plate (5025), the squeezing plate (5025) squeezes the movable rod (5030) and the sliding plate (5027), the sliding plate (5027 squeezes the spring (5026), the sliding plate (5027) drives the squeezing rod (5028) and the rack (5029) to move, and the rack (5029) meshes with the locking gear (5024) to prevent the rotating column (503) from rotating. When the base rotates to below the blocking mesh (205), the first electric telescopic rod (207) drives the lifting plate (208) and the lifting rod (202) to move downward, and the lifting rod (202) drives the blocking mesh (205) to move downward to cover the base. The function of the blocking mesh (205) is to prevent the base from shifting during the blowing and suction process. Then, the first suction solenoid valve (206) is opened and the second suction solenoid valve (704) is closed. Then, the nitrogen blowing pipe (204) blows air to the base. At the same time, the suction pump (200) works and the first suction pipe (203) sucks air to clean the dust on the surface of the base. After the cleaning is completed, the first electric telescopic rod (207) drives the blocking mesh (205) to rise; S3, the rotating mechanism (5) continues to drive the cleaning seat (3) to rotate (60) degrees (the same operation as described in S2), and then the cleaned base is rotated to the bottom of the unloading suction cup (607), and then the second electric telescopic rod (605) drives the mounting rod (606) and the unloading suction cup (607) to move downward, and the unloading suction cup (607) can adsorb and fix the base, and then the second electric telescopic rod (605) drives the base to rise, and the driving motor (604) drives the active bevel gear (603) to rotate, and the active bevel gear (603) drives the driven bevel gear (602) to rotate, and the driven bevel gear (602) drives the rotating rod (601) to rotate, thereby driving the base to rotate, and then the second electric telescopic rod (605) drives the base downward and discharges the material (when the step S3 is operated, the base rotates to the bottom of the cleaning mechanism (2) and is cleaned at the same time); S4, then the rotating mechanism (5) continues to drive the cleaning seat (3) to rotate 60 degrees (the same operation as described in S2), and the cleaning tank (4) of the taken base is rotated to the bottom of the suction cover (702), and then the hydraulic rod (700) drives the support rod (701) and the suction cover (702) to move downward and cover the cleaning tank (4), and then the second suction solenoid valve (704) is opened. When the suction pump (200) is working, it can clean the inner bottom wall of the cleaning tank (4) to prevent dust from adhering to the inner bottom wall of the cleaning tank. In this cycle, the base is cleaned.

Citation Information

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