Electrolyte injection device for semiconductor production

Abstract

The invention belongs to the technical field of electrolyte injection, and particularly relates to an electrolyte injection device for semiconductor production, the electrolyte injection device comprises a machine body and a circulation part, the circulation part comprises a circulation tank and a first storage tank which are fixedly mounted on the machine body, the circulation tank is communicated with the first storage tank, and the circulation part further comprises a filter assembly mounted in the circulation part; the first injection port is formed in the top of the circulating tank, the first discharge port is formed in the side wall of the circulating tank, used electrolyte enters the middle of the filtering assembly from the first injection port, and the electrolyte enters the first storage tank from the first discharge port after being filtered by the filtering assembly; the rotating plate is rotationally mounted in the circulating tank, and impurities intercepted by the filtering assembly fall on the rotating plate; through the arrangement of the circular filter assembly, impurities can settle to the bottom of the circulation tank through gravity after being intercepted in the circular filter assembly, the problems that a large amount of impurities are deposited on the surface of a filter screen and the circulation area of the filter screen is reduced are solved, and the circulation efficiency of the circulation tank is guaranteed.

Description

Technical Field

[0001] The invention belongs to the field of electrolytic injection, in particular to an electrolyte injection device for semiconductor production. Background Art

[0002] During the processing of semiconductors, it is usually necessary to electroplate the wafers and other components to form a layer of metal electrode to realize the conductive function of the components. When electroplating, an electrolyte injection device is needed to inject clean electrolyte into the electrolytic cell. After the electrolysis is completed, the used electrolyte is extracted for filtration and circulation, waiting for the next use.

[0003] A patent application with publication number CN114369860A discloses a plating liquid circulation filtration device used in an electroplating process, including a temporary storage tank, and also includes an extraction pump installed on the temporary storage tank; support legs installed on the temporary storage tank; a filtering treatment box installed on the support legs; the plating liquid is injected into the filtering treatment box, and impurities in the electrolyte are filtered through a filter mesh cover in the filtering treatment box.

[0004] The electrolyte in the above scheme passes through the filter from top to bottom and enters the filter box, that is, the filtering function of the electrolyte is realized. The filtered electrolyte enters the temporary storage tank, and the electrolyte is injected into the electrolytic cell through the temporary storage tank for electroplating. During the use of the filter, impurities gradually cover the upper surface of the filter, which reduces the flow area of ​​the filter, slows down the speed at which the electrolyte enters the box, and reduces the filtering efficiency of the filter.

[0005] To this end, the present invention provides an electrolyte injection device for semiconductor production. Summary of the invention

[0006] In order to make up for the deficiencies of the prior art, at least one technical problem raised in the background technology is solved.

[0007] The technical solution adopted by the present invention to solve its technical problems is: the electrolyte injection device for semiconductor production described in the present invention includes a body and a circulation part, the circulation part is used to filter impurities in the electrolyte, the circulation part includes a circulation tank and a No. 1 storage tank fixedly installed on the body, the circulation tank and the No. 1 storage tank are connected, and the circulation part also includes: a filter component installed inside the circulation part, the filter component is surrounded in a circle inside the circulation tank; a No. 1 injection port on the top of the circulation tank and a No. 1 discharge port on the side wall, the used electrolyte enters the middle part of the filter component from the No. 1 injection port, and the electrolyte enters the No. 1 storage tank from the No. 1 discharge port after being filtered by the filter component; a rotating plate installed in the circulation tank is rotated, and the impurities intercepted by the filter component fall on the rotating plate.

[0008] Preferably, the circulation part also includes a No. 1 plate fixedly mounted on the top of the circulation tank and a No. 2 plate at the lower end, the rotating plate is mounted on the No. 2 plate, the filtering assembly includes a plurality of No. 1 filter screens and a plurality of sliders slidably mounted on the No. 1 plate, the No. 1 filter screens are rotatably connected to the sliders, an injection pipe is connected to the circulation tank, a waste liquid tank connected to the circulation tank is mounted on the machine body, clean water is injected into the circulation tank through the injection pipe, the clean water passes through the No. 1 filter screen after rotating half a circle, and impurities adhered to the No. 1 filter screen are washed away into the waste liquid tank, warm air enters the circulation tank through the injection pipe to dry the circulation tank, and is discharged from the waste liquid tank.

[0009] Preferably, the circulation part also includes: a stirring assembly installed in the circulation tank, and the stirring assembly includes: a No. 1 rod rotatably installed on the No. 1 plate; a connecting block installed on the No. 1 rod; two T-rods installed on the connecting block; two No. 3 connecting rods installed on the T-rods; and a stirring blade installed on the No. 3 connecting rod.

[0010] Preferably, it also includes: two No. 2 injection ports opened on the top of the circulation tank; two No. 2 storage tanks fixedly installed in the body, the No. 2 storage tanks are connected to the circulation tank through the No. 2 injection ports, and the two No. 2 storage tanks are respectively used to store acidic or alkaline reagents; a detection component installed on the No. 2 storage tank, the detection component including a pH meter for detecting the pH of the electrolyte.

[0011] Preferably, it also includes: two No. 1 connecting rods slidably installed inside the circulation tank; two No. 2 connecting rods rotatably installed on the No. 1 connecting rod; a connecting plate installed on the No. 2 connecting rod, the connecting plate, the No. 2 plate and the rotating plate divide the circulation tank into two spaces: a collection chamber for collecting impurities and a circulation chamber for filtering; a No. 2 filter screen slidably installed between the No. 1 plate and the inner wall of the circulation tank, the T-rod adopts a telescopic structure, the T-rod is slidably connected to the connecting block, the No. 3 connecting rod is rotatably connected to the T-rod, after the T-rod slides and extends and the No. 3 connecting rod rotates, the four stirring blades are spliced, the outer periphery of the stirring blade fits with the inner wall of the No. 1 filter screen, the No. 2 filter screen and the combined stirring blade are used to separate waste liquid from impurities.

[0012] Preferably, the rotating plate is slidably connected to the No. 2 plate, a No. 1 spring is installed between the rotating plate and the No. 2 plate, the connecting plate is slidably connected to the No. 2 connecting rod, and a No. 2 spring is installed between the connecting plate and the No. 2 connecting rod.

[0013] Preferably, a circular ring is slidably mounted on the inner wall of the circulation tank, the No. 1 connecting rod is connected to the circulation tank via the circular ring, and the No. 1 connecting rod is rotatably connected to the circular ring.

[0014] Preferably, the detection component also includes: a container cup installed on the No. 1 plate, the detection head of the pH meter is placed in the container cup; a connecting tube slidably installed in the container cup, the connecting tube is provided with a plurality of No. 1 ports and No. 2 ports, the connecting tube is connected with the interior of the circulation tank through the No. 1 port and the No. 2 port; a suction pump installed on the No. 1 plate, the suction pump draws the electrolyte into the container cup through the No. 1 port of the connecting tube, and after the connecting tube moves downward to below the liquid level of the electrolyte in the container cup, the electrolyte flows back into the circulation tank through the No. 2 port.

[0015] Preferably, the injection pipe is connected to the container, a block is installed on the connecting pipe, the block is used to isolate the injection pipe from the container, a collecting cup is installed on the No. 1 plate, and the collecting cup is connected to the container and the circulation tank.

[0016] Preferably, the body further includes a cache tank for storing unfiltered electrolyte, and the cache tank is connected to the circulation tank.

[0017] The beneficial effects of the present invention are as follows: 1. The electrolyte injection device for semiconductor production described in the present invention has an enclosing filter component. After being trapped inside, impurities can settle to the bottom of the circulation tank by gravity, thereby improving the problem of a large amount of impurities deposited on the surface of the filter and a reduced flow area of ​​the filter, thereby ensuring the circulation efficiency of the circulation tank. In conjunction with the rotatable filter No. 1, when more impurities accumulate on the surface of the filter No. 1, the filter No. 1 is rotated, and the water flow impacts the filter No. 1 from the clean side of the filter in the direction of the impurities accumulated on the filter, thereby improving the cleaning effect of the filter No. 1.

[0018] 2. The electrolyte injection device for semiconductor production described in the present invention detects the pH of the electrolyte during circulation by setting a detection component to adjust the pH of the electrolyte, thereby ensuring the stability of the pH of the electrolyte and the quality of electroplating. When flushing the No. 1 filter, the detection component detects the pH of the waste liquid to adjust the waste liquid to neutral, which is convenient for the subsequent recovery and treatment of the waste liquid and impurities.

[0019] 3. The electrolyte injection device for semiconductor production described in the present invention can stir the electrolyte or wastewater in the circulation tank when pH adjustment is performed by providing a deformable stirring blade. During circulation, the electrolyte in the circulation chamber is stirred to facilitate uniform contact between the electrolyte and each No. 1 filter of the filter component. Before cleaning, the stirring blade stirs the air in the circulation tank to generate vortexes, which facilitates the electrolyte remaining on the impurities to be thrown out of the filter component, thereby reducing the loss of the electrolyte. When cleaning the filter component, the stirring blade is deformed into a polygon, which can separate the waste liquid and impurities. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The present invention will be further described below in conjunction with the accompanying drawings.

[0021] Figure 1 is a three-dimensional diagram of the first embodiment of the present invention; Figure 2 It is a schematic diagram of the internal structure of the body of the present invention; Figure 3 It is a schematic diagram of the internal structure of the circulation tank of the present invention; Figure 4 is a bottom view of the connecting plate of the present invention; Figure 5 It is a structural schematic diagram of the first filter screen and the slider of the present invention; Figure 6 It is a schematic diagram of the structure of the stirring blade of the present invention; Figure 7 It is a structural schematic diagram of the rotating plate of the present invention; Figure 8 It is a cross-sectional view of the No. 1 rod of the present invention.

[0022] In the figure: 1. body; 2. circulation unit; 21. circulation tank; 22. No. 1 storage tank; 23. filter assembly; 231. No. 1 filter screen; 232. slider; 24. No. 1 injection port; 25. No. 1 discharge port; 26. rotating plate; 27. No. 1 plate; 28. No. 2 plate; 29. ​​stirring assembly; 291. No. 1 rod; 292. connecting block; 293. T-bar; 294. No. 3 connecting rod; 295. stirring blade; 3. injection pipe; 4. waste liquid Tank; 5. No. 2 injection port; 6. No. 2 storage tank; 7. Detection component; 71. pH meter; 72. Container; 73. Connecting tube; 731. No. 1 port; 732. No. 2 port; 74. Suction pump; 75. Block; 8. No. 1 connecting rod; 9. No. 2 connecting rod; 10. Connecting plate; 11. Collection chamber; 12. Circulation chamber; 13. No. 2 filter; 14. No. 1 spring; 15. No. 2 spring; 16. Ring; 17. Buffer tank; 18. Collection cup. DETAILED DESCRIPTION

[0023] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further explained below in conjunction with specific implementation methods.

[0024] Embodiment 1 like Figure 1-Figure 8 As shown, an electrolyte injection device for semiconductor production described in an embodiment of the present invention includes a body 1 and a circulation part 2, the circulation part 2 is used to filter impurities in the electrolyte, the circulation part 2 includes a circulation tank 21 and a No. 1 storage tank 22 fixedly installed on the body 1, the circulation tank 21 and the No. 1 storage tank 22 are connected, and the circulation part 2 also includes: a filter component 23 installed inside the circulation part 2, the filter component 23 is surrounded in a circle inside the circulation tank 21; a No. 1 injection port 24 on the top of the circulation tank 21 and a No. 1 discharge port 25 on the side wall, the used electrolyte enters the middle part of the filter component 23 from the No. 1 injection port 24, and the electrolyte enters the No. 1 storage tank 22 from the No. 1 discharge port 25 after being filtered by the filter component 23; a rotating plate 26 rotatably installed in the circulation tank 21, and the impurities intercepted by the filter component 23 fall on the rotating plate 26.

[0025] Specifically, when electroplating semiconductor components, an electrolyte injection device is required to inject clean electrolyte into the electrolytic cell. After the electrolysis is completed, the used electrolyte is pumped away for filtering and circulation, waiting for the next use. The existing device filters the electrolyte by passing the electrolyte through the filter from top to bottom. The filtered electrolyte enters the temporary storage tank, and the electrolyte is injected into the electrolytic cell through the temporary storage tank for electroplating. During the use of the filter, impurities gradually cover the upper surface of the filter, which reduces the flow area of ​​the filter, slows down the speed at which the electrolyte enters the box, and reduces the filtering efficiency of the filter. Before work, the circulation tank 21 and the No. 1 storage tank 22 are connected to the electrolytic cell. During work, the used electrolyte in the electrolytic cell is pumped from the No. 1 injection port 24 into the circulation tank 21. Since the filter component 23 forms a circle inside the No. 1 circulation tank 21 The first filter assembly 23 is a circular shape, and the first injection port 24 is inside the circle, and the first discharge port 25 is outside the circle. Therefore, the electrolyte needs to pass through the filter assembly 23 to be discharged from the first discharge port 25 to the inside of the first storage tank 22. In the process of the electrolyte passing through the filter assembly 23, the filter assembly 23 can intercept the impurities mixed in the electrolyte inside the filter assembly 23, and the impurities will settle on the rotating plate 26 under the action of gravity, that is, the filtering action is realized. The clean electrolyte after filtration is temporarily stored in the first storage tank 22. When the semiconductor needs to be electroplated, the electrolyte in the first storage tank 22 is injected into the electrolytic cell; by setting the circular filter assembly 23, the impurities can be settled to the bottom of the circulation tank 21 by gravity after being trapped inside it, which improves the problem that a large amount of impurities are deposited on the surface of the filter screen and the flow area of ​​the filter screen is reduced, thereby ensuring the circulation efficiency of the circulation tank 21.

[0026] like Figure 3 , 4 As shown in Figure 5, the circulation part 2 also includes a No. 1 plate 27 fixedly mounted on the top of the circulation tank 21 and a No. 2 plate 28 at the lower end, the rotating plate 26 is mounted on the No. 2 plate 28, the filtering assembly 23 includes a plurality of No. 1 filter screens 231 and a plurality of sliders 232 slidably mounted on the No. 1 plate 27, the No. 1 filter screens 231 are rotatably connected to the sliders 232, an injection pipe 3 is connected to the circulation tank 21, a waste liquid tank 4 connected to the circulation tank 21 is mounted on the body 1, clean water is injected into the circulation tank 21 through the injection pipe 3, the clean water passes through the No. 1 filter screen 231 after rotating half a circle, and the impurities adhered to the No. 1 filter screen 231 are washed away into the waste liquid tank 4, and the warm air enters the circulation tank 21 through the injection pipe 3 to dry the circulation tank 21, and is discharged from the waste liquid tank 4.

[0027] Specifically, the waste liquid tank 4 is of exhaust type. Since some impurities will accumulate on the No. 1 filter screen 231, after long-term use, more impurities will accumulate on the surface of the No. 1 filter screen 231, affecting the filtering efficiency of the No. 1 filter screen 231. Therefore, after a period of use, the electrolyte input into the circulation tank 21 can be stopped, and the slider 232 can be controlled to move radially toward the axis of the circulation tank 21. While moving, the No. 1 filter screen 231 is controlled to rotate so that the side where the impurities are accumulated faces the inner wall of the circulation tank 21. Then, the injection pipe 3 is controlled to discharge the clean water into the circulation tank 21. The clean water is discharged from the No. 1 filter group The circulating tank 21 is filled with hot air, and the circulating tank 21 is filled with hot air. ...

[0028] like Figure 5 , 6 As shown, the circulation part 2 also includes: a stirring assembly 29 installed in the circulation tank 21, and the stirring assembly 29 includes: a No. 1 rod 291 rotatably installed on the No. 1 plate 27; a connecting block 292 installed on the No. 1 rod 291; two T-rods 293 installed on the connecting block 292; two No. 3 connecting rods 294 installed on the T-rods 293; and a stirring blade 295 installed on the No. 3 connecting rod 294.

[0029] Specifically, during the circulation process, the No. 1 rod 291 is controlled to rotate, so that the connecting block 292 and the T-bar 293 rotate synchronously. The rotation of the T-bar 293 causes the No. 3 connecting block 292 and the stirring blade 295 to rotate synchronously. The stirring blade 295 rotates to stir the electrolyte in the circulation tank 21, so that the electrolyte can pass through the surface of the filter component 23 evenly, and the flow rate of the electrolyte from the filter component 23 can be accelerated. At the same time, the electrolyte generates eddy currents, which can gather impurities in the middle of the filter component 23. After the control stops the introduction of the electrolyte, the control The stirring blade 295 is controlled to rotate continuously, and at the same time, the electrolyte is controlled to be discharged into the No. 1 storage tank 22. After the electrolyte is discharged into the No. 1 storage tank 22, the stirring blade 295 continues to rotate, so that the rotation of the air in the circulation tank 21 drives the impurities in the No. 1 filter 231 to rotate synchronously, and the residual electrolyte in the impurities can be thrown out to reduce the loss of the electrolyte. When the surface of the No. 1 filter 231 is cleaned, the stirring blade 295 rotates to stir the clean water, causing the clean water to rotate, and the force generated can better flush the impurities on the No. 1 filter 231.

[0030] like Figure 2 , 3 4, it also includes: two No. 2 injection ports 5 opened on the top of the circulation tank 21; two No. 2 storage tanks fixedly installed in the body 1, the No. 2 storage tanks are connected to the circulation tank 21 through the No. 2 injection ports 5, and the two No. 2 storage tanks are respectively used to store acidic or alkaline reagents; a detection component 7 installed on the No. 2 storage tank, and the detection component 7 includes a pH meter 71 for detecting the pH of the electrolyte.

[0031] Specifically, taking the electrolyte used for nickel plating as an example, its components mainly include nickel sulfate, nickel chloride, boric acid and various additives. The pH value of the electrolyte is controlled between 3.8 and 5.6. After electroplating, the pH of the electrolyte will increase due to factors such as the alkaline by-products produced by the electroplating reaction, and the pH of the electrolyte will decrease due to factors such as the dissolution of nickel salts in the electrolyte. Therefore, when circulating, the pH of the electrolyte needs to be adjusted to maintain the stability of the electrolyte and the quality of electroplating; acidic reagents can be selected from sulfuric acid and hydrochloric acid, and alkaline reagents can be selected from nickel carbonate. During operation, the pH meter 71 in the detection component 7 can intermittently detect the pH in the circulation tank 21. When the pH change is detected, When the temperature changes, the acid or alkaline reagent in the No. 2 storage tank is correspondingly controlled to slowly enter the circulation tank 21 from the No. 2 injection port 5. The stirring component 29 neutralizes and stirs the electrolyte and the acid or alkaline reagent to maintain the pH value of the electrolyte constant to ensure the electroplating effect on the semiconductor. When the circulation tank 21 is filled with water for cleaning, since electrolyte will remain on the surface of the impurities, the pH value of the waste liquid may be acidic during cleaning. Therefore, the pH value of the waste liquid can be detected by the pH meter 71 to control the alkaline solution to enter the tank body from the No. 2 injection port 5 to neutralize the waste liquid until the pH value of the waste liquid is in a neutral state. It can then be discharged into the waste liquid tank 4 to facilitate subsequent treatment of the waste liquid.

[0032] like Figure 3 , 4, 5, and 7, further comprising: two No. 1 connecting rods 8 slidably mounted inside the circulation tank 21; two No. 2 connecting rods 9 rotatably mounted on the No. 1 connecting rods 8; a connecting plate 10 mounted on the No. 2 connecting rods 9, wherein the connecting plate 10, the No. 2 plate 28, and the rotating plate 26 divide the circulation tank 21 into two spaces: a collecting chamber 11 for collecting impurities and a circulation chamber 12 for filtering; and two No. 1 connecting rods 8 slidably mounted between the No. 1 plate 27 and the inner wall of the circulation tank 21. No. 1 filter screen 13, the T-bar 293 adopts a telescopic structure, the T-bar 293 is slidably connected to the connecting block 292, the No. 3 connecting rod 294 is rotatably connected to the T-bar 293, after the T-bar 293 slides and stretches and the No. 3 connecting rod 294 rotates, the four stirring blades 295 are spliced, and the outer periphery of the stirring blade 295 is fitted with the inner wall of the No. 1 filter screen 231, the No. 2 filter screen 13 and the combined stirring blade 295 are used to separate waste liquid from impurities.

[0033] Specifically, after the No. 1 filter screen 231 is filled with water for cleaning, but before the waste liquid is discharged into the waste liquid tank 4, the stirring assembly 29 is controlled to move upward, and then the T-bar 293 is controlled to extend and move, and the No. 3 connecting rod 294 is controlled to rotate, so as to drive the stirring blade 295 to move and rotate until each stirring blade 295 is spliced ​​into a polygon, and each side of the polygon is in contact with the No. 1 filter screen 231, and the stirring blade 295 and the No. 2 filter screen are controlled to move downward. During the movement, impurities in the waste liquid are gathered under the stirring blade 295 and the No. 2 filter screen until the impurities under the stirring blade 295 and the No. 2 filter screen are mixed. The rotating plate 26 and the connecting plate 10 are tightly attached, and then the waste liquid tank 4 can be controlled to extract the waste liquid in the circulation tank 21. After the waste liquid is extracted, the No. 2 filter screen and the stirring blade 295 are controlled to move up, and then the rotating plate 26 is controlled to rotate to transfer the impurities on its surface to the collecting chamber 11, and the No. 1 connecting rod 8 is controlled to move downward to drive the No. 2 connecting rod 9 and the connecting plate 10 to move downward synchronously until the connecting plate 10 enters the collecting chamber 11, and then the No. 2 connecting rod 9 is controlled to rotate to tilt the connecting plate 10, so that the impurities on the connecting plate 10 can be poured into the collecting chamber 11 to realize the solid-liquid separation action, which is more convenient for the post-processing of impurities and waste liquid.

[0034] like Figure 7 As shown, the rotating plate 26 is slidably connected to the No. 2 plate 28, a No. 1 spring 14 is installed between the rotating plate 26 and the No. 2 plate 28, the connecting plate 10 is slidably connected to the No. 2 connecting rod 9, and a No. 2 spring 15 is installed between the connecting plate 10 and the No. 2 connecting rod 9.

[0035] Specifically, a telescopic rotating plate 26 is adopted. When impurities accumulate on the rotating plate 26, the rotating plate 26 moves downward to prevent the impurities from accumulating too much on the rotating plate 26 and interfering with the filtering efficiency of the No. 1 filter 231. The connecting plate 10 moves up and down relative to the No. 2 connecting block 292 to ensure that when the amount of impurities changes, the downward moving distance of the No. 2 filter remains unchanged, and the No. 2 filter is always below the connection between the waste liquid tank 4 and the circulation tank 21.

[0036] like Figure 7 As shown, a ring 16 is slidably mounted on the inner wall of the circulation tank 21 , and the No. 1 connecting rod 8 is connected to the circulation tank 21 via the ring 16 , and the No. 1 connecting rod 8 is rotatably connected to the ring 16 .

[0037] Specifically, by setting the No. 1 connecting rod 8 and the ring 16 to rotate, after the connecting plate 10 is transferred to the collecting chamber 11, the No. 1 connecting rod 8 is controlled to rotate, and the rotation of the No. 1 connecting rod 8 drives the connecting plate 10 to rotate synchronously. The centrifugal force of the rotation of the connecting plate 10 can knock the impurities on the connecting plate 10 off the connecting plate 10, thereby avoiding the problem of impurities remaining on the connecting plate 10 and causing subsequent electrolyte contamination.

[0038] like Figure 3 , 5 As shown in FIG. 8 , the detection component 7 also includes: a container 72 installed on the No. 1 plate 27, and the detection head of the pH meter 71 is placed in the container 72; a connecting tube 73 slidably installed in the container 72, and a plurality of No. 1 ports 731 and No. 2 ports 732 are provided on the connecting tube 73, and the connecting tube 73 is connected with the interior of the circulation tank 21 through the No. 1 ports 731 and the No. 2 ports 732; a suction pump 74 installed on the No. 1 plate 27, and the suction pump 74 draws the electrolyte into the container 72 through the No. 1 port 731 of the connecting tube 73, and after the connecting tube 73 moves downward to below the liquid level of the electrolyte in the container 72, the electrolyte flows back into the circulation tank 21 through the No. 2 ports 732.

[0039] Specifically, in the initial state, the No. 1 port 731 and the No. 2 port 732 of the connecting tube 73 are not connected to the interior of the circulation tank 21, the No. 1 port 731 is located below the liquid surface of the electrolyte, and the No. 2 port 732 is located above the liquid surface of the electrolyte. When performing detection, the connecting tube 73 is controlled to move downward until the No. 1 port 731 is connected to the interior of the circulation tank 21, and then the pump is controlled to work so that the electrolyte in the circulation tank 21 is pumped from the No. 1 port 731 to the container 72, and the pH meter 71 can be controlled to perform detection. After the detection is completed, the connecting tube 73 is controlled to continue to move downward until the upper end of the connecting tube 73 is below the liquid surface of the electrolyte in the container 72, and the electrolyte in the container 72 flows back to the circulation tank 21 through the No. 2 port 732, thereby realizing the action of detecting the pH value of the electrolyte.

[0040] like Figure 3 , 8 As shown, the injection pipe 3 is connected to the container 72, a block 75 is installed on the connecting pipe 73, and the block 75 is used to isolate the injection pipe 3 from the container 72. A collecting cup 18 is installed on the No. 1 plate 27, and the collecting cup 18 is connected to the container 72 and the circulation tank 21.

[0041] Specifically, while the connecting tube 73 moves downward, the blocking block 75 moves downward synchronously, and the blocking block 75 blocks the connection position between the container 72 and the injection tube 3. At this time, the electrolyte in the circulation tank 21 can be sucked. After the detection is completed, the connecting tube 73 is controlled to move up one end until the No. 1 port 731 and the No. 2 port 732 of the connecting tube 73 are both connected to the circulation tank 21, and the blocking block 75 does not block the injection tube 3. At this time, the suction pump 74 is controlled to work, and clean water can be poured into the container 72 through the injection tube 3 to rinse the pH meter 71 in the container 72 to avoid the electrolyte remaining on the pH meter 71 from interfering with the subsequent detection results. The waste water after rinsing can be discharged into the collection cup 18 for storage. When the filter assembly 23 is cleaned, the waste water in the collection cup 18 can be discharged back to the circulation tank 21 for treatment.

[0042] like Figure 2 As shown, the body 1 also includes a buffer tank 17 for storing unfiltered electrolyte, and the buffer tank 17 is connected to the circulation tank 21.

[0043] Specifically, when the filter assembly 23 is cleaned, the unfiltered electrolyte may be cached in the cache tank 17 . After the filter assembly 23 is cleaned, the electrolyte in the cache tank 17 is injected into the circulation tank 21 .

[0044] Working steps: Step 1: Before operation, connect the buffer tank 17 and the No. 1 storage tank 22 to the electrolytic cell. During operation, the used electrolyte in the electrolytic cell is pumped from the No. 1 injection port 24 to the circulation tank 21 through the buffer tank 17. The No. 1 rod 291 is controlled to rotate so that the connecting block 292 and the T-bar 293 rotate synchronously. The rotation of the T-bar 293 causes the No. 3 connecting block 292 and the stirring blade 295 to rotate synchronously. The stirring blade 295 rotates to stir the electrolyte in the circulation tank 21. Since the filter assembly 23 is surrounded by a circle inside the No. 1 circulation tank 21, and the No. 1 injection port 24 is inside the circle, The first outlet 25 is outside the circle, so the electrolyte needs to pass through the filter component 23 to be discharged from the first outlet 25 to the inside of the first storage tank 22. During the electrolyte passing through the filter component 23, the filter component 23 can retain the impurities mixed in the electrolyte inside the filter component 23. The impurities will settle on the rotating plate 26 under the action of gravity, thus achieving the filtering action. The clean electrolyte after filtration is temporarily stored in the first storage tank 22. When the semiconductor needs to be electroplated, the electrolyte in the first storage tank 22 is injected into the electrolytic cell, thus achieving the action of injecting the electrolyte. Step 2: During operation, the pH meter 71 in the detection component 7 can intermittently detect the pH in the circulation tank 21. When a pH change is detected, the acid-base reagent in the No. 2 storage tank is correspondingly controlled to slowly enter the circulation tank 21 from the No. 2 injection port 5. The stirring component 29 neutralizes and stirs the electrolyte and the acid-base reagent to maintain a constant pH of the electrolyte to ensure the electroplating effect on the semiconductor. Step 3: Since some impurities will gather on the No. 1 filter 231, after long-term use, more impurities will gather on the surface of the No. 1 filter 231, affecting the filtering efficiency of the No. 1 filter 231. Therefore, after a period of use, the electrolyte input into the circulation tank 21 can be stopped, and the stirring blade 295 can be controlled to rotate continuously, and the electrolyte can be controlled to be discharged into the No. 1 storage tank 22. After the electrolyte is discharged into the No. 1 storage tank 22, the stirring blade 295 continues to rotate, so that the air in the circulation tank 21 rotates and drives the impurities in the No. 1 filter 231 to rotate synchronously, and the electrolyte remaining in the impurities can be thrown out to reduce the loss of the electrolyte; Step 4, control the slider 232 to move radially toward the axis of the circulation tank 21, and control the No. 1 filter screen 231 to rotate while moving, so that the side where impurities are gathered faces the inner wall of the circulation tank 21, and then control the injection pipe 3 to discharge the clean water into the circulation tank 21. The clean water enters from the middle of the No. 1 filter component 23, and is stirred by the stirring blade 295 to make the clean water rotate. The force generated can wash away the impurities on the No. 1 filter screen 231. When the impurities on the No. 1 filter screen 231 are washed away, control the stirring component 29 to move upward, and then control the T-bar 293 to extend and move, and control the No. 3 connecting rod 294 to rotate, so as to drive the stirring blade 295 to move and rotate until each stirring blade 295 is spliced ​​into a polygon, and each side of the polygon is in contact with the No. 1 filter screen 231, and control the stirring blade 295 and the No. 2 filter screen to move downward. During the movement, impurities in the waste liquid are gathered below the stirring blade 295 and the No. 2 filter screen until the stirring blade 295 and the No. 2 filter screen The impurities below are in close contact with the rotating plate 26 and the connecting plate 10, and then the waste liquid tank 4 can be controlled to extract the waste liquid in the circulation tank 21. After the waste liquid is extracted, the No. 2 filter screen and the stirring blade 295 are controlled to move up, and then the rotating plate 26 is controlled to rotate to transfer the impurities on its surface to the collecting chamber 11, and the No. 1 connecting rod 8 is controlled to move downward to drive the No. 2 connecting rod 9 and the connecting plate 10 to move downward synchronously until the connecting plate 10 enters the collecting chamber 11, and then the No. 2 connecting rod 9 is controlled to rotate so that the connecting plate 10 is tilted, and the impurities on the connecting plate 10 can be poured into the collecting chamber 11, and at the same time, the No. 1 connecting rod 8 is controlled to rotate, and the rotation of the No. 1 connecting rod 8 drives the connecting plate 10 to rotate synchronously. The centrifugal force of the rotation of the connecting plate 10 can knock the impurities on the connecting plate 10 away from the connecting plate 10, avoiding the impurities remaining on the connecting plate 10, and solving the problem of subsequent electrolyte contamination, that is, the action of cleaning the No. 1 filter screen 231 is realized, and at the same time, the wastewater and impurities are separated, which is convenient for the subsequent treatment of the wastewater and impurities; Step 5: During cleaning, the pH of the waste liquid may be acidic, so the pH of the waste liquid can be detected by a pH meter 71 to control the alkaline solution to enter the tank body from the second injection port 5 to neutralize the waste liquid until the pH of the waste liquid is in a neutral state, and then it can be discharged into the waste liquid tank 4 to facilitate subsequent treatment of the waste liquid; Step 6: Inject warm air into the circulation tank 21 through the injection pipe 3 to facilitate the rapid drying of the circulation tank 21. After drying, step 1 can be repeated to circulate the electrolyte in the electrolytic cell.

[0045] The above shows and describes the basic principles, main features and advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. An electrolyte injection device for semiconductor production, comprising a body (1) and a circulation part (2), wherein the circulation part (2) is used to filter impurities in the electrolyte, and the circulation part (2) comprises a circulation tank (21) and a first storage tank (22) fixedly mounted on the body (1), and the circulation tank (21) and the first storage tank (22) are connected, wherein the device is characterized in that: The circulation unit (2) further comprises: a filter assembly (23) installed inside the circulation part (2), wherein the filter assembly (23) forms a circle inside the circulation tank (21); A No. 1 injection port (24) is provided on the top of the circulation tank (21) and a No. 1 discharge port (25) is provided on the side wall, and the used electrolyte enters the middle part of the filter assembly (23) from the No. 1 injection port (24), and after being filtered by the filter assembly (23), the electrolyte enters the No. 1 storage tank (22) from the No. 1 discharge port (25); A rotating plate (26) installed in the circulation tank (21) is rotated, and impurities intercepted by the filter assembly (23) fall onto the rotating plate (26).

2. The electrolyte injection device for semiconductor production according to claim 1, characterized in that: The circulation section (2) further comprises a first plate (27) fixedly mounted on the top of the circulation tank (21) and a second plate (28) at the lower end, the rotating plate (26) being mounted on the second plate (28), the filtering assembly (23) comprising a plurality of first filter screens (231) and a plurality of sliders (232) slidably mounted on the first plate (27), the first filter screens (231) being rotatably connected to the sliders (232), and the circulation tank (21) being connected to an injection pipe (3). The machine body (1) is provided with a waste liquid tank (4) connected to the circulation tank (21); clean water is injected into the circulation tank (21) through the injection pipe (3); the clean water passes through the first filter screen (231) after rotating half a circle, and impurities adhering to the first filter screen (231) are washed away into the waste liquid tank (4); warm air is passed into the circulation tank (21) through the injection pipe (3) to dry the circulation tank (21), and then discharged from the waste liquid tank (4).

3. The electrolyte injection device for semiconductor production according to claim 2, characterized in that: The circulation unit (2) further comprises: a stirring assembly (29) installed in the circulation tank (21), wherein the stirring assembly (29) comprises: Rotating a No. 1 rod (291) mounted on the No. 1 plate (27); A connecting block (292) mounted on the first rod (291); Two T-bars (293) mounted on the connecting block (292); Two No. 3 connecting rods (294) mounted on the T-rods (293); A stirring blade (295) is mounted on the third connecting rod (294).

4. The electrolyte injection device for semiconductor production according to claim 3, characterized in that: Also includes: Two No. 2 injection ports (5) opened on the top of the circulation tank (21); Two No. 2 storage tanks (6) fixedly installed in the body (1), the No. 2 storage tanks (6) being connected to the circulation tank (21) via the No. 2 injection port (5), the two No. 2 storage tanks (6) being used to store acidic or alkaline reagents respectively; A detection assembly (7) installed on the second storage tank, the detection assembly (7) comprising a pH meter (71) for detecting the pH of the electrolyte.

5. The electrolyte injection device for semiconductor production according to claim 4, characterized in that: Also includes: Two No. 1 connecting rods (8) slidably mounted inside the circulation tank (21); Two second connecting rods (9) rotatably mounted on the first connecting rod (8); a connecting plate (10) mounted on the second connecting rod (9), wherein the connecting plate (10), the second plate (28) and the rotating plate (26) divide the circulation tank (21) into two spaces: a collection chamber (11) for collecting impurities and a circulation chamber (12) for filtering; A No. 2 filter screen (13) is slidably mounted between the No. 1 plate (27) and the inner wall of the circulation tank (21); the T-bar (293) is of a telescopic structure; the T-bar (293) is slidably connected to the connecting block (292); the No. 3 connecting rod (294) is rotatably connected to the T-bar (293); after the T-bar (293) slides and stretches and the No. 3 connecting rod (294) rotates, the four stirring blades (295) are spliced; the outer periphery of the stirring blade (295) is in contact with the inner wall of the No. 1 filter screen (231); the No. 2 filter screen (13) and the combined stirring blade (295) are used to separate waste liquid from impurities.

6. The electrolyte injection device for semiconductor production according to claim 5, characterized in that: The rotating plate (26) is slidably connected to the No. 2 plate (28), a No. 1 spring (14) is installed between the rotating plate (26) and the No. 2 plate (28), the connecting plate (10) is slidably connected to the No. 2 connecting rod (9), and a No. 2 spring (15) is installed between the connecting plate (10) and the No. 2 connecting rod (9).

7. The electrolyte injection device for semiconductor production according to claim 6, characterized in that: A circular ring (16) is slidably mounted on the inner wall of the circulation tank (21); the first connecting rod (8) is connected to the circulation tank (21) via the circular ring (16); and the first connecting rod (8) is rotatably connected to the circular ring (16).

8. The electrolyte injection device for semiconductor production according to claim 4, characterized in that: The detection component (7) further comprises: a container (72) mounted on the first plate (27), wherein the detection head of the pH meter (71) is placed in the container (72); a connecting tube (73) slidably mounted in the container (72), the connecting tube (73) being provided with a plurality of first ports (731) and second ports (732), the connecting tube (73) being in communication with the interior of the circulation tank (21) through the first ports (731) and the second ports (732); A suction pump (74) is installed on the No. 1 plate (27), and the suction pump (74) draws electrolyte into the container (72) through the No. 1 port (731) of the connecting tube (73). After the connecting tube (73) moves downward to below the liquid level of the electrolyte in the container (72), the electrolyte flows back into the circulation tank (21) through the No. 2 port (732).

9. The electrolyte injection device for semiconductor production according to claim 8, characterized in that: The injection pipe (3) is in communication with the container (72); a block (75) is installed on the connecting pipe (73); the block (75) is used to isolate the injection pipe (3) from the container (72); a collecting cup (18) is installed on the first plate (27); the collecting cup (18) is in communication with the container (72) and the circulation tank (21).

10. The electrolyte injection device for semiconductor production according to claim 1, characterized in that: The machine body (1) also includes a buffer tank (17) for storing unfiltered electrolyte, and the buffer tank (17) is connected to the circulation tank (21).

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