Method and device for generating design pattern of mask, equipment, medium and product

Abstract

The invention discloses a generation method and device for a design graph of a mask, equipment, a medium and a product, and the generation method comprises the steps that a to-be-optimized layout of the mask is obtained, the to-be-optimized layout comprises a first graph and a second graph, the first graph is a main design graph in the to-be-optimized layout, and the second graph is a second design graph in the to-be-optimized layout; the second graphs are a plurality of sub-resolution auxiliary graphs generated based on the main design graph; inputting the first graph and the second graph into a preset graph processing model, and performing graph processing on the first graph and the second graph based on the graph processing model to obtain a design graph of the mask, the graph processing comprises at least one of the following items: graph movement, graph reduction, graph amplification, graph rotation, graph combination, graph deletion, graph edge processing and graph deformation, and the efficiency of processing the graph of the mask plate can be improved.

Description

Technical Field

[0001] The present application belongs to the field of graphic processing technology, and in particular, relates to a method, device, equipment, medium and product for generating a design graphic of a mask. Background Art

[0002] Optical masks are structures that are used to make various functional patterns on thin films, plastics or glass substrates and precisely position them for selective exposure of photoresist coatings. Therefore, masks are widely used, especially in the field of photolithography. Therefore, the design pattern of the mask is particularly important. At present, when generating the design pattern of the mask, it is often necessary to perform pattern processing on the layout to be optimized. However, the existing technology relies on manual pattern processing, which makes the processing efficiency low, and the pattern processing in the existing technology has the problem of simple processing process. Summary of the invention

[0003] The embodiments of the present application provide a method, device, equipment, medium and product for generating a design pattern of a mask, which can improve the efficiency when processing the pattern of the mask.

[0004] In a first aspect, an embodiment of the present application provides a method for generating a design pattern of a mask, comprising:

[0005] Acquire a layout to be optimized of the mask, the layout to be optimized includes a first graphic and a second graphic, the first graphic is a main design graphic in the layout to be optimized, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the main design graphic;

[0006] The first graphic and the second graphic are input into a preset graphic processing model, and the first graphic and the second graphic are processed based on the graphic processing model to obtain a design graphic of the mask, wherein the graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing, and graphic deformation.

[0007] In a second aspect, an embodiment of the present application provides a device for generating a design pattern of a mask, comprising:

[0008] An acquisition module is used to acquire a layout to be optimized of a mask plate, wherein the layout to be optimized includes a first graphic and a second graphic, wherein the first graphic is a main design graphic in the layout to be optimized, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the main design graphic;

[0009] A processing module is used to input the first graphic and the second graphic into a preset graphic processing model, and perform graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain a design graphic of the mask, wherein the graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing, and graphic deformation.

[0010] In a third aspect, an embodiment of the present application provides an electronic device, the device comprising:

[0011] a processor and a memory storing computer program instructions;

[0012] When the processor executes the computer program instructions, it is used to execute the method for generating the design pattern of the mask according to the first aspect.

[0013] In a fourth aspect, an embodiment of the present application provides a computer storage medium having computer program instructions stored thereon, and when the computer program instructions are executed by a processor, the method for generating a design graphic of a mask according to the first aspect is implemented.

[0014] In a fifth aspect, an embodiment of the present application provides a computer program product, including a computer program, which, when processed by a processor, implements the method for generating a design graphic of a mask according to the first aspect.

[0015] The method, device, equipment, medium and product for generating the design graphics of the mask provided in the embodiments of the present application can improve the efficiency of graphics processing by simultaneously performing graphics processing on the main design graphics and sub-resolution auxiliary graphics in the optimized layout through a graphics processing model, and the above-mentioned processing of the graphics covers a variety of processing processes such as graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion and graphic edge processing, which can process the graphics in multiple aspects and improve the collaborative optimization and accuracy of graphic processing. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solution of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0017] Figure 1 A schematic flow chart of a method for generating a design pattern of a mask provided in some embodiments of the present application.

[0018] Figure 2 A schematic diagram of an exemplary mask layout to be optimized.

[0019] Figure 3A flowchart of another method for generating a design pattern of a mask provided in some embodiments of the present application.

[0020] Figure 4 A flowchart of another method for generating a design pattern of a mask provided in some embodiments of the present application.

[0021] Figure 5 A flowchart of another method for generating a design pattern of a mask provided in some embodiments of the present application.

[0022] Figure 6 A schematic diagram of a device for generating a design pattern of a mask provided in some embodiments of the present application.

[0023] Figure 7 A schematic diagram of the hardware structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0024] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain the present application, rather than to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is only to provide a better understanding of the present application by illustrating the examples of the present application.

[0025] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "include..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0026] Before describing the technical solutions provided by the embodiments of the present application, in order to facilitate the understanding of the embodiments of the present application, the present application first specifically describes the problems existing in the related art:

[0027] Generating a mask design pattern usually includes two steps: the first step is to generate a sub-resolution auxiliary pattern based on the main design pattern through inverse lithography technology (ILT) to obtain a mask design pattern including the main design pattern and the sub-resolution auxiliary pattern; the second step is to perform pattern processing on the mask design pattern, such as optical proximity correction (OPC) processing. However, the processing of the above design pattern currently relies on manual processing, which makes the processing efficiency low.

[0028] Based on this, the embodiments of the present application provide a method, device, equipment, medium and product for generating a design pattern of a mask, which can solve the above-mentioned problems.

[0029] Below, a method for generating a design pattern of a mask provided in an embodiment of the present application is described in detail.

[0030] In some embodiments, Figure 1 As shown, the embodiment of the present application provides a method for generating a design pattern of a mask, and the method includes the following steps S110-S120:

[0031] S110: Acquire a layout to be optimized of the mask, the layout to be optimized includes a first graphic and a second graphic, the first graphic is a main design graphic in the layout to be optimized, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the main design graphic.

[0032] Here, you can get Figure 2 The mask layout to be optimized is shown in the figure. Figure 2 is a schematic diagram of an exemplary mask layout to be optimized, such as Figure 2 The layout to be optimized of the mask shown above includes a first graphic 201, the first graphic is the main design graphic of the mask, the second graphic is a sub-resolution auxiliary graphic 202 of the mask, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the first graphic, such as Figure 2 As shown, the second graphic may include multiple second graphics, and the multiple second graphics are distributed around the above-mentioned first graphic.

[0033] S120: Input the first graphic and the second graphic into a preset graphic processing model, perform graphic processing on the first graphic and the second graphic based on the graphic processing model, and obtain a design graphic of the mask, wherein the graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing, and graphic deformation.

[0034] The layout to be optimized including the first and second graphics can be input into a preset graphics processing model, and the first and second graphics can be processed based on the graphics processing model to obtain the design graphics of the mask. The first and second graphics can be OPC processed by the graphics processing model, and the steps of processing the first and second graphics by the graphics processing model include at least one of the following: graphics moving, graphics shrinking, graphics enlarging, graphics rotating, graphics combining, graphics deleting, graphics edge processing, and graphics deformation.

[0035] In some examples, the first graphic or the second graphic may be subjected to graphic edge processing, such as performing an edge interruption operation on the first graphic to obtain a target line segment, and moving the target line segment to a target position.

[0036] In some examples, the first graphic and / or the second graphic may be moved, reduced, enlarged, rotated, combined, deleted, or deformed. For example, the first graphic may be translated to change the distance between the first graphic and the second graphic, the first graphic and / or the second graphic may be enlarged or reduced to change the size of the first graphic, a partial or entire area of ​​the first graphic may be deleted, multiple first graphics may be merged into one first graphic, the shape of the first graphic may be changed, etc. Similarly, similar operations may be performed on the second graphic.

[0037] The embodiment of the present application uses a graphics processing model to simultaneously process the main design graphics and sub-resolution auxiliary graphics in the optimized layout, which can improve the graphics processing efficiency. The above-mentioned processing of graphics covers a variety of processing processes such as graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion and graphic edge processing, which can process graphics in many aspects and improve the coordinated optimization and accuracy of graphics processing.

[0038] In some examples, the above-mentioned graphic processing process may also include deforming the graphic, such as changing the graphic from a polygon to a rectangle, or changing the straight line on the edge of the graphic to a curve.

[0039] When performing graphics processing on the layout to be optimized including the first graphics and the second graphics based on the graphics processing model, graphics processing may be performed on the target area or target graphics that do not meet the preset rules to improve the accuracy of the graphics processing.

[0040] In some embodiments, Figure 3 As shown, the above-mentioned performing graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain the design graphic of the mask may include the following steps S310-S320:

[0041] S310: Detect whether the first graphic and multiple second graphics meet the preset rules through the graphic processing model, and determine the target area that does not meet the preset rules in the first graphic and determine the target graphics that do not meet the preset rules in the second graphics; wherein the preset rules are the geometric parameter rules of the mask graphic.

[0042] The graphic processing model can be used to detect whether the first graphic and the second graphic both comply with preset rules. The preset rules may be artificially set geometric parameter rules of the design graphic of the mask. For example, the geometric parameter rules may include the size of the graphic area, the minimum distance between the graphic itself, that is, the minimum distance between any two points in the graphic, the distance between graphics, the shape of the graphic, the line width of the graphic, and other geometric parameter rules that comply with the mask manufacturing rules.

[0043] A target area that does not conform to the preset rule may be determined in the first graph, and a target graph that does not conform to the preset rule may be determined in the second graph.

[0044] S320: Performing graphics processing on the target area and the target graphics through the graphics processing model to obtain the design graphics of the mask.

[0045] The target area and the target pattern can be processed by the pattern processing model to obtain the design pattern of the mask. For example, the target area in the first pattern can be processed by the pattern processing model to obtain the target line segment by breaking the edge, and then the target line segment can be moved to the target position.

[0046] In some examples, the target preset rules corresponding to the target graphics that do not conform to the preset rules can be determined. For example, if it is determined that the size of the target graphics does not conform to the preset rules, graphic processing such as enlarging or reducing the graphics can be performed on the target graphics, or if it is determined that the distance from the target graphics to the first graphics does not conform to the preset rules, graphic processing such as moving the graphics can be performed on the target graphics. The details will not be repeated here.

[0047] The embodiment of the present application first detects the layout to be optimized including the first graphic and the second graphic through a graphic processing model, determines the target area that does not conform to the preset rules in the first graphic, and determines the target image that does not conform to the preset rules in the second graphic, and performs graphic processing on the target area and the target graphic. It is possible to perform graphic processing on the first graphic and the second graphic at the same time, and can improve the accuracy and coordinated optimization of the processing of the first graphic and the second graphic.

[0048] It can be imagined that after obtaining the design pattern of the mask, it can be tested to determine the deviation value between the exposure profile of the design pattern and the layout to be optimized, and determine whether it can be used as a process pattern of the mask process. Here, the process pattern is a pattern that can be used in the mask manufacturing process.

[0049] In some embodiments, Figure 4 As shown, after the above step S120: performing graphic processing on the target area and the target graphic through the graphic processing model to obtain the design graphic of the mask, the generation method may further include the following steps S410-S430:

[0050] S410: performing exposure processing on the design pattern to obtain an exposure pattern.

[0051] The design pattern may be subjected to exposure processing to obtain an exposure pattern. Here, the design pattern may be subjected to exposure processing to obtain an exposure pattern through an application program for simulating exposure.

[0052] S420: Determine a deviation value of the layout to be optimized and the exposure pattern based on the layout to be optimized and the exposure pattern.

[0053] The deviation value of the layout to be optimized and the exposure pattern can be determined by the layout to be optimized and the exposure pattern. For example, the above deviation value can be determined based on the edge placement error (EPE) of the layout to be optimized and the exposure pattern in different regions. The edge placement error is an indicator used to measure the correction quality. The smaller the edge placement error, the closer the exposure pattern is to the layout to be optimized.

[0054] In some examples, the deviation value may be an average value or a weighted average value of edge placement errors of the layout to be optimized and the exposure pattern in different regions.

[0055] S430: When the deviation value is less than or equal to a preset threshold, determining that the design pattern is a process pattern of the mask.

[0056] When the deviation value is less than or equal to a preset threshold, it indicates that the design pattern can be used as a process pattern of a mask for process production.

[0057] It can be imagined that when it is determined that the above deviation value is greater than the above preset threshold value, the design graphic can be re-input into the above graphic processing model to perform graphic processing on the design graphic to obtain a new design graphic, and then a new exposure graphic is obtained based on the exposure processing of the new design graphic, and then the deviation value between the new exposure graphic and the layout to be optimized is determined to determine whether the new design graphic can be used as a process graphic. This cycle is repeated until a process graphic of the mask that meets the requirements is output. The specific steps refer to the above steps of determining the error value, which will not be repeated here.

[0058] In the embodiment of the present application, after generating a design graphic, the design graphic is exposed to obtain an exposure graphic, and a deviation value between the exposure graphic and the layout to be optimized is determined to determine whether it can be used as a process graphic. When it is determined that the deviation value is less than or equal to a preset threshold, it is determined that the above-mentioned design graphic can be used as a process graphic, and a process graphic with a relatively optimized exposure profile can be obtained.

[0059] In some embodiments, the deviation value includes an edge placement error or a square value of the Euler distance between a pixel matrix of the exposure pattern and a pixel matrix of the layout to be optimized.

[0060] The deviation value may be an edge placement error. In some examples, the deviation value may be an average value or a weighted average value of edge placement errors of the layout to be optimized and the exposure pattern in different regions. Or

[0061] The above deviation value may be the square value of the Euler distance between the pixel matrix of the exposure pattern and the pixel matrix of the layout to be optimized. Here, the first pixel value of each pixel point in the exposure pattern may be determined to determine the first pixel matrix, and the second pixel value of each pixel point in the layout to be optimized may be determined to determine the second pixel matrix. The square value of the Euler distance is determined based on the first pixel matrix and the second pixel matrix.

[0062] In some examples, the above deviation values ​​satisfy the following conditions:

[0063]

[0064] Wherein, F is the deviation value, M and N represent the number of rows and columns of the target graphic respectively, i and j are the row index and column index respectively, a is the first pixel value, and b is the second pixel value.

[0065] The embodiment of the present application can improve the accuracy of the determined deviation value by including the edge placement error or the square value of the Euler distance in the above-mentioned deviation value, which is beneficial to the accuracy of determining whether the above-mentioned design figure can be used as a process figure and improves the process level.

[0066] It can be imagined that when processing graphics based on the above-mentioned graphics processing model, the initial model can be trained first to obtain the above-mentioned graphics processing model.

[0067] In some embodiments, before the above step S120: inputting the first graphic and the second graphic into a preset graphic processing model, and performing graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain the design graphic of the mask, the generation method may further include the following steps:

[0068] Obtain training samples, including sample design graphics and sample process graphics generated based on the sample design graphics; input the sample design graphics into the initial model, perform graphic processing on the sample design graphics based on the initial model to obtain an adjustment graphic, wherein the initial model is a model built based on a deep learning algorithm; based on the deviation between the sample process graphics and the adjustment graphics, train the initial model to obtain a graphic processing model. Here, the initial module is a model built based on a supervised learning algorithm.

[0069] A training sample may be obtained, the training sample including a plurality of sample design graphics and a sample process graphics generated based on the sample design graphics, wherein one sample design graphic corresponds to one sample process graphic. The sample design graphics and the sample process graphics may be input into an initial model as a pre-training set, and the sample design graphics may be subjected to a graphic processing by the initial model to obtain an adjusted graphic, wherein the step of the initial model subjecting the sample design graphics to graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, and graphic edge processing. The initial model may be trained based on the deviation between the sample process graphics and the adjusted graphics to obtain the above-mentioned graphic processing model.

[0070] The embodiment of the present application obtains a graphics processing model by training the initial model based on training samples, which can improve the accuracy of graphics processing by the graphics processing model and further improve the accuracy of the generated design graphics.

[0071] Before acquiring the layout to be optimized, a second graphic may be generated based on acquiring the first graphic.

[0072] In some embodiments, Figure 5 As shown, before the above step S110: obtaining the mask layout to be optimized, the generation method may further include:

[0073] S510: Acquire a first pattern and operating condition information, where the operating condition information includes the type of photoresist, light source information, and geometric parameter rules of the mask pattern input by a user.

[0074] A first graphic and operating condition information may be obtained, where the first graphic is a main design graphic of a mask input by a user, and the operating condition information may include the type of photoresist, light source information, and geometric parameter rules of the mask. The types of photoresist may include positive photoresist and negative photoresist, the light source information may include the number of light sources and the relative position information between the light source and the mask in the photolithography process, and the geometric parameter rules may include parameter rules such as the number, size, shape, and distance of the second graphic from the first graphic.

[0075] S520: Generate a second graphic by using inversion lithography technology based on the first graphic, the type of photoresist, light source information and geometric parameter rules.

[0076] The second pattern may be generated through ILT based on the first pattern, the type of photoresist, light source information and geometric parameter rules.

[0077] In some embodiments, the first graph and operating condition information may be input into a graph generation model to obtain the second graph.

[0078] In some examples, a first initial model may be pre-set, and the first initial model may be trained using a first training sample to obtain the graphic generation model. Here, the step of generating the graphic generation model may include:

[0079] A first training sample is obtained, the first training sample includes a sample pattern, sample operating condition information and a third pattern, the third pattern is a sub-resolution auxiliary pattern, and the sample operating condition information includes a sample type of photoresist, sample information of a light source and a sample geometric parameter rule; the sample pattern, sample type, sample information of a light source and a sample geometric parameter rule are input into a first initial model to generate a pattern, and the first initial model is trained based on the deviation of the third pattern and the pattern to obtain the above-mentioned pattern generation model. The above-mentioned method of obtaining a pattern generation model by training the first initial model can improve the accuracy of the second pattern generated by the above-mentioned pattern generation model.

[0080] In some examples, in the absence of special geometric parameter rules, the graphics generation model can satisfy the requirement of outputting universal sub-resolution auxiliary graphics by inputting only the main design graphics and working condition information.

[0081] The embodiment of the present application can improve the accuracy and efficiency of the generated second graphic by generating the second graphic based on the first graphic and the operating condition information before acquiring the layout to be optimized.

[0082] In some embodiments, a design model including the above-mentioned graphic generation model and the graphic processing model can be set to realize the situation where the first graphic and working condition information are input into the above-mentioned design model, and the process graphic of the mask is output through the design model to improve the efficiency of generating the process graphic.

[0083] Based on the same inventive concept, an embodiment of the present application also provides a device for generating a design pattern of a mask.

[0084] In some embodiments, Figure 6 As shown, an embodiment of the present application provides a device for generating a design pattern of a mask, and the generating device may include:

[0085] An acquisition module 601 is used to acquire a layout to be optimized of a mask plate, wherein the layout to be optimized includes a first graphic and a second graphic, wherein the first graphic is a main design graphic in the layout to be optimized, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the main design graphic;

[0086] The processing module 602 is used to input the first graphic and the second graphic into a preset graphic processing model, and perform graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain a design graphic of the mask, wherein the graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing, and graphic deformation.

[0087] The embodiment of the present application obtains the layout to be optimized through an acquisition module, and inputs the above-mentioned initial actual graphics into the graphics processing model through the processing module to simultaneously perform graphics processing on the main design graphics and sub-resolution auxiliary graphics in the layout to be optimized, which can improve the graphics processing efficiency, and the above-mentioned processing of the graphics covers a variety of processing processes such as graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing and graphic deformation, which can process the graphics in many aspects and improve the accuracy of graphics processing.

[0088] In some embodiments, the second graphic includes a plurality of:

[0089] Processing modules can be used to:

[0090] Detecting whether the first graphic and the plurality of second graphics all meet the preset rules through the graphic processing model, and determining the target area that does not meet the preset rules in the first graphic and determining the target graphics that do not meet the preset rules in the second graphics; wherein the preset rules are geometric parameter rules of the mask graphic;

[0091] The target area and the target pattern are processed by the pattern processing model to obtain the design pattern of the mask.

[0092] In some embodiments, the processing module may also be used to:

[0093] Performing exposure processing on the design pattern to obtain an exposure pattern;

[0094] Determine the deviation value of the layout to be optimized and the exposure pattern based on the layout to be optimized and the exposure pattern;

[0095] When the deviation value is less than or equal to the preset threshold, the design pattern is determined to be a process pattern of the mask.

[0096] In some embodiments, the deviation value includes an edge placement error or a square value of the Euler distance between a pixel matrix of the exposure pattern and a pixel matrix of the layout to be optimized.

[0097] In some embodiments, the acquisition module may also be used to:

[0098] Acquire training samples, the training samples including sample design graphics and sample process graphics generated based on the sample design graphics;

[0099] Inputting the sample design graph into the initial model, performing graphic processing on the sample design graph based on the initial model to obtain an adjusted graph, wherein the initial model is a model built based on a deep learning algorithm;

[0100] Based on the deviation between the sample process graph and the adjustment graph, the initial model is trained to obtain a graph processing model.

[0101] In some embodiments, the acquisition module may also be used to:

[0102] Acquire a first graphic and working condition information, wherein the working condition information includes a type of photoresist, light source information, and a geometric parameter rule of a mask graphic input by a user;

[0103] The second graphic is generated by inversion lithography based on the first graphic, the type of photoresist, light source information and geometric parameter rules.

[0104] The device of the above embodiment is used to implement the method for generating the design pattern of the corresponding mask in any of the above embodiments, and has the beneficial effects of the corresponding method embodiment, which will not be described in detail here.

[0105] Figure 7 A schematic diagram of the hardware structure of an electronic device provided in an application embodiment.

[0106] The electronic device 700 may include a processor 701 and a memory 702 storing computer program instructions.

[0107] Specifically, the processor 701 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0108] The memory 702 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 702 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive or a combination of two or more of these. In appropriate cases, the memory 702 may include a removable or non-removable (or fixed) medium. In appropriate cases, the memory 702 may be inside or outside the integrated gateway disaster recovery device. In a specific embodiment, the memory 702 is a non-volatile solid-state memory.

[0109] In certain embodiments, memory 702 includes a read-only memory (ROM). The ROM may be a mask-programmed ROM, a programmable ROM (PROM), an erasable PROM (EPROM), an electrically erasable PROM (EEPROM), an electrically alterable ROM (EAROM), or flash memory, or a combination of two or more of the above, where appropriate.

[0110] The memory may include a read-only memory (ROM), a random access memory (RAM), a magnetic disk storage medium device, an optical storage medium device, a flash memory device, an electrical, optical or other physical / tangible memory storage device. Thus, typically, the memory includes one or more tangible (non-transitory) computer-readable storage media (e.g., a memory device) encoded with software including computer-executable instructions, and when the software is executed (e.g., by one or more processors), it is operable to perform the operations described with reference to the method according to the first aspect of the present application.

[0111] The processor 701 reads and executes the computer program instructions stored in the memory 702 to implement any one of the methods for generating a design pattern of a mask in the above embodiments.

[0112] In one example, the electronic device may further include a communication interface 703 and a bus 704. Figure 7 The processor 701, the memory 702, and the communication interface 703 are connected via a bus 704 and communicate with each other.

[0113] The communication interface 703 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0114] Bus 704 includes hardware, software or both, and the parts of online data flow billing equipment are coupled to each other. For example, but not limitation, bus may include accelerated graphics port (AGP) or other graphics bus, enhanced industrial standard architecture (EISA) bus, front-end bus (FSB), hypertransport (HT) interconnection, industrial standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations. In appropriate cases, bus 704 may include one or more buses. Although the present application embodiment describes and shows a specific bus, the present application considers any suitable bus or interconnection.

[0115] The electronic device of the above embodiment is used to implement the method for generating the design pattern of the corresponding mask in any of the above embodiments, and has the beneficial effects of the corresponding method embodiment, which will not be described in detail here.

[0116] In addition, in combination with the method for generating the design pattern of the mask in the above embodiment, the embodiment of the present application can provide a computer storage medium for implementation. The computer storage medium stores computer program instructions; when the computer program instructions are executed by the processor, the method for generating the design pattern of any mask in the above embodiment is implemented.

[0117] In addition, in combination with the method for generating the design pattern of the mask in the above embodiment, the embodiment of the present application can provide a computer program product to implement. When the computer program product instructions are executed by a processor of an electronic device, any method for generating the design pattern of the mask in the above embodiment is implemented.

[0118] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present application (including the claims) is limited to these examples. In line with the concept of the present application, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the embodiments of the present application as described above, which are not provided in detail for the sake of simplicity.

[0119] The functional blocks shown in the above-described block diagram can be implemented as hardware, software, firmware or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in, a function card, etc. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. The program or code segment can be stored in a machine-readable medium, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable medium" can include any medium capable of storing or transmitting information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. The code segment can be downloaded via a computer network such as the Internet, an intranet, etc.

[0120] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or devices based on a series of steps or devices. However, this application is not limited to the order of the above steps, that is, the steps can be performed in the order mentioned in the embodiment, or in a different order from the embodiment, or several steps can be performed simultaneously.

[0121] The above reference is according to the method of the embodiment of the present application, the flow chart of the device (device) and the computer program product and / or the block diagram described various aspects of the present application.It should be understood that each square box in the flow chart and / or the block diagram and the combination of each square box in the flow chart and / or the block diagram can be realized by computer program instructions.These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer or other programmable data processing device to produce a machine so that these instructions executed by the processor of the computer or other programmable data processing device enable the realization of the function / action specified in one or more square boxes of the flow chart and / or the block diagram.Such a processor can be but is not limited to a general-purpose processor, a special-purpose processor, a special application processor or a field programmable logic circuit.It can also be understood that each square box in the block diagram and / or the flow chart and the combination of the square boxes in the block diagram and / or the flow chart can also be realized by the dedicated hardware that performs the specified function or action, or can be realized by the combination of dedicated hardware and computer instructions.

[0122] The above is only a specific implementation of the present application. Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working processes of the above-described devices, modules and units can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the protection scope of the present application is not limited to this. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present application, and these modifications or replacements should be included in the protection scope of the present application.

Claims

1. A method for generating a design pattern of a mask, characterized in that: include: Acquire a layout to be optimized of a mask, wherein the layout to be optimized includes a first graphic and a second graphic, wherein the first graphic is a main design graphic in the layout to be optimized, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the main design graphic; The first graphic and the second graphic are input into a preset graphic processing model, and graphic processing is performed on the first graphic and the second graphic based on the graphic processing model to obtain a design graphic of the mask, wherein the graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing, and graphic deformation.

2. The method for generating a design pattern of a mask according to claim 1, characterized in that: Performing graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain a design graphic of a mask plate includes: Detecting whether the first graphic and the plurality of second graphics all conform to preset rules through a graphic processing model, and determining a target area in the first graphic that does not conform to the preset rules and a target graphic in the second graphic that does not conform to the preset rules; wherein the preset rules are geometric parameter rules of the mask graphic; The target area and the target pattern are processed by a pattern processing model to obtain the design pattern of the mask.

3. The method for generating a design pattern of a mask according to claim 2, characterized in that: After the target area and the target graphic are processed by the graphic processing model to obtain the design graphic of the mask, the generation method further includes: Performing exposure processing on the design pattern to obtain an exposure pattern; Based on the layout to be optimized and the exposure pattern, determining a deviation value between the layout to be optimized and the exposure pattern; When the deviation value is less than or equal to a preset threshold, it is determined that the design pattern is a process pattern of a mask.

4. The method for generating a design pattern of a mask according to claim 3, characterized in that: The deviation value includes an edge placement error or a square value of the Euler distance between a pixel matrix of the exposure pattern and a pixel matrix of the layout to be optimized.

5. The method for generating a design pattern of a mask according to claim 1, characterized in that: Before inputting the first graphic and the second graphic into a preset graphic processing model and performing graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain a design graphic of a mask, the generating method further includes: Acquire a training sample, wherein the training sample includes a sample design graphic and a sample process graphic generated based on the sample design graphic; Inputting the sample design graph into an initial model, and performing graphic processing on the sample design graph based on the initial model to obtain an adjusted graph, wherein the initial model is a model constructed based on a deep learning algorithm; Based on the deviation between the sample process pattern and the adjustment pattern, the initial model is trained to obtain the pattern processing model.

6. The method for generating a design pattern of a mask according to claim 1, characterized in that: Before obtaining the layout to be optimized of the mask, the generation method further includes: Acquire the first graphic and working condition information, wherein the working condition information includes the type of photoresist, light source information, and geometric parameter rules of the mask graphic input by the user; The second graphic is generated based on the first graphic, the type of photoresist, light source information and geometric parameter rules through inversion lithography technology.

7. A device for generating a design pattern of a mask, characterized in that: include: An acquisition module, used for acquiring a layout to be optimized of a mask, wherein the layout to be optimized includes a first graphic and a second graphic, wherein the first graphic is a main design graphic in the layout to be optimized, and the second graphic is a plurality of sub-resolution auxiliary graphics generated based on the main design graphic; A processing module is used to input the first graphic and the second graphic into a preset graphic processing model, and perform graphic processing on the first graphic and the second graphic based on the graphic processing model to obtain a design graphic of the mask, wherein the graphic processing includes at least one of the following: graphic movement, graphic reduction, graphic enlargement, graphic rotation, graphic combination, graphic deletion, graphic edge processing, and graphic deformation.

8. An electronic device, characterized in that: The device includes: a processor, and a memory storing computer program instructions; The processor reads and executes the computer program instructions to implement the method for generating a design pattern of a mask according to any one of claims 1 to 6.

9. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer program instructions, and when the computer program instructions are executed by a processor, the method for generating a design pattern of a mask according to any one of claims 1 to 6 is implemented.

10. A computer program product, comprising a computer program, characterized in that When the computer program is processed by a processor, the method for generating a design pattern of a mask according to any one of claims 1 to 6 is implemented.

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